Display panel and display device

Abstract

The invention relates to the technical field of display, and provides a display panel and a display device.The display panel comprises a substrate, a pixel definition layer, an isolation structure and a light-emitting unit, the pixel definition layer is provided with a pixel opening, the isolation structure is arranged on the side, away from the substrate, of the pixel definition layer, and the isolation opening is defined by the isolation structure; the light emitting unit comprises a light emitting layer and a second electrode which are sequentially arranged in the direction away from the substrate, at least part of the light emitting layer is arranged in the pixel opening, the second electrode is connected with the isolation structure and covers the light emitting layer, and the edge, away from one side of the substrate, of the side wall face of the pixel opening is a first edge. The edge, facing the center of the isolation opening, of the surface of the side, facing the substrate, of the isolation structure is a second edge, and the second edge is located on the side, facing the center of the isolation opening, of the first edge. According to the display panel provided by the invention, the use performance of the display device can be improved.

Description

Technical Field

[0001] This application belongs to the field of display technology, and more specifically, relates to a display panel and a display device. Background Technology

[0002] Currently, flat panel displays have advantages such as high image quality, energy saving, small thickness and wide application range, and are widely used in various consumer electronic products such as mobile phones, televisions, laptops, and desktop computers.

[0003] In traditional display panel manufacturing, a fine metal mask (FMM) is typically used to pattern the light-emitting pixels. FMM technology is mature and has extensive mass production experience. However, FMM technology also suffers from limitations in precision, high development costs, and long development cycles. Fine metal mask-less technology eliminates the limitations of traditional OLED processes on display size, resolution, and other screen performance aspects, offering advantages such as high performance, full-size display, and agile delivery. Patents CN118251982A, CN116648095A, CN117062489A, CN118742138A, CN118678783A, CN118660598A, CN118675450A, CN118824188A, and CN118781966A describe relevant content regarding fine metal mask-less technology and are provided for reference.

[0004] However, the performance and manufacturing process of current display devices need to be improved. Summary of the Invention

[0005] The purpose of this application is to provide a display panel and a display device to improve the performance of the display device.

[0006] To achieve the above objectives, the technical solution adopted in this application is as follows:

[0007] In a first aspect, a display panel is provided, the display panel including a substrate, a pixel definition layer, an isolation structure and a light-emitting unit, the pixel definition layer having a pixel opening, the isolation structure being disposed on the side of the pixel definition layer away from the substrate, and the isolation structure enclosing to form an isolation opening, the isolation opening communicating with the pixel opening; The light-emitting unit includes a light-emitting layer and a second electrode arranged sequentially along a direction away from the substrate. At least a portion of the light-emitting layer is disposed within the pixel opening, and the second electrode is connected to an isolation structure and covers the light-emitting layer. The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the edge of the side surface of the isolation structure facing the substrate towards the center of the isolation opening is the second edge. The second edge is located on the side of the first edge facing the center of the isolation opening.

[0008] With the above technical solution, the second edge is located on the side of the first edge facing the center of the isolation opening. The isolation structure extends beyond the first edge of the pixel opening toward the center of the isolation opening. The part of the isolation structure that extends beyond the first edge can block the light-emitting layer from climbing up the side wall of the isolation structure. This can increase the connection area between the second electrode and the isolation structure, improve the connection effect, thereby improve the light-emitting effect of the light-emitting unit, and thus improve the display effect.

[0009] Therefore, the display panel provided in this application can improve the performance of the display device.

[0010] In some embodiments, the edge of the light-emitting layer is provided with a first connecting portion, which is the area of ​​the light-emitting layer that contacts the side surface of the isolation structure facing the substrate.

[0011] In this way, the light-emitting layer makes contact with the side of the isolation structure facing the substrate through the first connection portion, which helps to prevent it from climbing to the connection point between the second electrode and the isolation structure, thereby avoiding affecting the connection effect between the second electrode and the isolation structure, and thus improving the light-emitting effect of the light-emitting unit.

[0012] Optionally, the first connecting part is a closed ring, which can improve the uniformity of the connection between the first connecting part and the isolation structure, and the light-emitting layer can leak current evenly, thereby improving the light emission uniformity of the light-emitting unit and thus improving the display effect.

[0013] In some embodiments, a second connection portion is provided at the edge of the second electrode. The second connection portion is the area of ​​the second electrode that contacts the isolation structure. The orthogonal projection area of ​​the second connection portion on the substrate is larger than the orthogonal projection area of ​​the first connection portion on the substrate.

[0014] In this way, the connection between the second electrode and the isolation structure is better than that between the light-emitting layer and the light-emitting unit, which helps to improve the light-emitting effect of the light-emitting unit and thus improve the display effect.

[0015] Optionally, the orthographic projection of the first connecting portion on the substrate is located within the orthographic projection of the second connecting portion on the substrate.

[0016] In some embodiments, the isolation structure includes a base, a support, and an eaves arranged sequentially along a direction away from the substrate. The orthographic projection of the side surface of the support facing the substrate onto the substrate is located within the orthographic projection of the side surface of the base away from the substrate onto the substrate. The second electrode is attached to a portion of the side surface of the base away from the substrate.

[0017] In this way, the second electrode and the base of the isolation structure have a good connection effect, which is conducive to improving the light emission effect of the light-emitting unit, and thus to improving the display effect of the display panel.

[0018] Optionally, the second electrode is attached to the sidewall of the base portion facing the center of the isolation opening. This helps to further improve the connection effect between the second electrode and the base portion of the isolation structure.

[0019] In some embodiments, the orthographic projection of the second electrode onto the substrate does not overlap with the orthographic projection of the side surface of the support portion facing the substrate onto the substrate. This reduces the deposition angle of the second electrode, which is beneficial for the fabrication of the second electrode and reduces the fabrication difficulty.

[0020] Optionally, the second electrode is spaced apart from the sidewall of the support portion facing the center of the isolation opening. This can further reduce the deposition angle of the second electrode.

[0021] In some embodiments, the light-emitting layer is attached to the surface of the base portion facing the substrate. This helps to prevent the light-emitting layer from climbing to the side of the base portion away from the substrate, thereby helping to avoid affecting the connection effect between the second connection portion and the isolation structure, and thus improving the light-emitting effect of the light-emitting unit.

[0022] In some embodiments, the edge of the side surface of the support portion facing the substrate and toward the center of the isolation opening is the third edge, the edge of the side surface of the base portion away from the substrate and toward the center of the isolation opening is the fourth edge, the distance between the first edge and the second edge is the first distance, the distance between the third edge and the fourth edge is the second distance, the ratio of the first distance to the second distance is K1, and the range of the ratio of the first distance to the second distance K1 is: 0 < K1 < 1.

[0023] In this way, the area of ​​the connection between the base and the light-emitting layer is smaller than the area of ​​the connection between the base and the second electrode, which is beneficial to improving the connection effect between the second electrode and the isolation structure, thereby improving the light-emitting effect of the light-emitting unit.

[0024] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.9.

[0025] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.8.

[0026] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.7.

[0027] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.6.

[0028] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.5.

[0029] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.4.

[0030] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.3.

[0031] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.2.

[0032] Optionally, the ratio K1 of the first distance to the second distance can be in the range of: 0 < K1 ≤ 0.1.

[0033] In some embodiments, the orthographic projection of the side surface of the support portion away from the substrate onto the substrate is located within the orthographic projection of the side surface of the eaves portion facing the substrate onto the substrate. The edge of the side surface of the support portion facing the substrate toward the center of the isolation opening is the third edge, and the edge of the side surface of the support portion away from the substrate toward the center of the isolation opening is the fifth edge. The orthographic projection of the third edge onto the substrate is located on the side of the orthographic projection of the fifth edge onto the substrate toward the center of the isolation opening.

[0034] Optionally, the orthographic projection of the base portion on the substrate is located within the orthographic projection of the eaves portion on the substrate.

[0035] Optionally, the base material may include molybdenum.

[0036] Alternatively, the support may be made of aluminum.

[0037] Alternatively, the eaves may be made of titanium.

[0038] In some embodiments, the edge of the surface of the base portion facing away from the substrate and towards the center of the isolation opening is designated as the fourth edge, and the edge of the surface of the eaves portion facing the substrate and towards the center of the isolation opening is designated as the sixth edge. The distance between the third and fourth edges is designated as the second distance, and the distance between the fifth and sixth edges is designated as the third distance. The ratio of the second distance to the third distance is K2, and the value of K2 satisfies the condition: 0 < K2 < 0.5. This increases the extension dimension of the eaves portion towards the isolation opening, which is beneficial for increasing the encapsulation area during the subsequent fabrication of the first inorganic encapsulation layer, thereby improving the encapsulation effect.

[0039] Optionally, the ratio K2 of the second distance to the third distance can be in the range of: 0 < K2 ≤ 0.4.

[0040] Optionally, the ratio K2 of the second distance to the third distance can be in the range of: 0 < K2 ≤ 0.3.

[0041] Optionally, the ratio K2 of the second distance to the third distance can be in the range of: 0 < K2 ≤ 0.2.

[0042] Optionally, the ratio K2 of the second distance to the third distance can be in the range of: 0 < K2 ≤ 0.1.

[0043] In some embodiments, the edge of the side surface of the support portion facing the substrate and towards the center of the isolation opening is designated as the third edge; the edge of the side surface of the base portion facing away from the substrate and towards the center of the isolation opening is designated as the fourth edge; and the edge of the side surface of the eaves portion facing the substrate and towards the center of the isolation opening is designated as the sixth edge. The distance between the third and fourth edges is designated as the second distance, and the distance between the orthographic projection of the fourth edge onto the substrate and the orthographic projection of the sixth edge onto the substrate is designated as the fourth distance. The ratio of the second distance to the fourth distance is K3, and the value of K3 satisfies the condition: 0 < K3 < 1. This increases the extension dimension of the eaves portion towards the isolation opening, which is beneficial for increasing the encapsulation area during the subsequent fabrication of the first inorganic encapsulation layer, thereby improving the encapsulation effect.

[0044] Optionally, the ratio K3 of the second distance to the fourth distance can be in the range of 0.5 ≤ K3 < 1.

[0045] Optionally, the ratio K3 of the second distance to the fourth distance can be in the range of 0.6 ≤ K3 < 1.

[0046] Optionally, the ratio K3 of the second distance to the fourth distance can be in the range of 0.7 ≤ K3 < 1.

[0047] Optionally, the ratio K3 of the second distance to the fourth distance can be in the range of 0.8 ≤ K3 < 1.

[0048] Optionally, the ratio K3 of the second distance to the fourth distance can be in the range of 0.9 ≤ K3 < 1.

[0049] In some embodiments, the first electrode is located between the pixel definition layer and the substrate, the pixel opening exposes at least a portion of the first electrode, and the first electrode is connected to the light-emitting layer.

[0050] Optionally, the display panel further includes a first inorganic encapsulation layer, which is disposed on the side of the light-emitting unit away from the substrate and covers the light-emitting unit.

[0051] Optionally, the display panel further includes an organic encapsulation layer located on the side of the first inorganic encapsulation layer away from the substrate and covering the first inorganic encapsulation layer.

[0052] Optionally, the display panel further includes a second inorganic encapsulation layer, which is disposed on the side of the organic encapsulation layer away from the substrate and covers the organic encapsulation layer.

[0053] Secondly, this application provides another display panel, which includes a substrate, a pixel definition layer, an isolation structure, and a light-emitting unit. The pixel definition layer has a pixel opening. The isolation structure is disposed on the side of the pixel definition layer away from the substrate and surrounds the isolation opening, which communicates with the pixel opening. The isolation structure includes a base, a support, and an eaves portion arranged sequentially along the direction away from the substrate. The light-emitting unit includes a light-emitting layer and a second electrode arranged sequentially along the direction away from the substrate. At least a portion of the light-emitting layer is disposed within the pixel opening. The second electrode is connected to the isolation structure and covers the light-emitting layer. The edge of the support portion facing the substrate and towards the center of the isolation opening is a third edge. The edge of the base portion facing the substrate and towards the center of the isolation opening is a fourth edge. The edge of the eaves portion facing the substrate and towards the center of the isolation opening is a sixth edge. The orthographic projection of the fourth edge onto the substrate is located between the orthographic projections of the third edge and the sixth edge onto the substrate. The distance between the third edge and the fourth edge is a second distance. The distance between the orthographic projections of the fourth edge and the sixth edge onto the substrate is a fourth distance. The second distance is less than the fourth distance.

[0054] Through the above technical solution, the display panel provided by this application can increase the size of the eaves extending toward the isolation opening, which is beneficial to increasing the encapsulation area when preparing the first inorganic encapsulation layer in the subsequent process, thereby improving the encapsulation effect.

[0055] In some embodiments, the edge of the sidewall of the pixel aperture away from the substrate is the first edge, and the edge of the surface of the base portion facing the substrate toward the center of the isolation opening is the second edge. The orthographic projection of the first edge on the substrate is located on the side of the orthographic projection of the second edge on the substrate toward the center of the isolation opening.

[0056] In this way, the light-emitting layer is less likely to come into contact with the base, which helps to prevent leakage of the light-emitting layer.

[0057] In some embodiments, the edge of the sidewall of the pixel opening away from the substrate is the first edge, and the orthographic projection of the sixth edge on the substrate is located on the side of the orthographic projection of the first edge on the substrate toward the center of the isolation opening.

[0058] This increases the size of the portion of the eaves extending towards the isolation opening, which helps to increase the encapsulation area during the subsequent preparation of the first inorganic encapsulation layer, thereby improving the encapsulation effect.

[0059] In some embodiments, the edge of the sidewall of the pixel opening away from the substrate is designated as the first edge, and the orthographic projection of the first edge onto the substrate is located on the side where the orthographic projection of the sixth edge onto the substrate faces the center of the isolation opening. That is, the orthographic projection of the eaves onto the substrate is spaced apart from the orthographic projection of the pixel opening onto the substrate, which helps to avoid blocking the light emitted by the light-emitting layer and improves the light-emitting effect.

[0060] Secondly, this application provides a method for manufacturing a display panel, the method comprising: Provide substrates; A pixel-defining material layer is fabricated on one side of the substrate. An isolation structure material layer is prepared on one side of the substrate. A graphic isolation structure material layer is used to form an isolation structure, which encloses and forms an isolation opening; A graphical pixel definition material layer is used to form pixel openings, isolating the openings from the pixel openings; A light-emitting unit is fabricated, comprising a light-emitting layer and a second electrode sequentially disposed along a direction away from the substrate, wherein at least a portion of the light-emitting layer is disposed within a pixel opening, and the second electrode is connected to an isolation structure and covers the light-emitting layer; The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the edge of the side surface of the isolation structure facing the substrate towards the center of the isolation opening is the second edge. The second edge is located on the side of the first edge facing the center of the isolation opening.

[0061] Through the above technical solution, the method for manufacturing the display panel provided in this application can make the isolation structure extend beyond the first edge of the pixel opening toward the center of the isolation opening. The part of the isolation structure that extends beyond the first edge can block the light-emitting layer from climbing toward the side wall of the isolation structure. This can increase the connection area between the second connection and the isolation structure, improve the connection effect, thereby improve the light-emitting effect of the light-emitting unit, and thus improve the display effect.

[0062] Therefore, the method for manufacturing the display panel provided in this application can improve the performance of the display device.

[0063] In some implementations, the graphical pixel defines the material layer, including: The pixel-defined material layer is first graphicalized; The pixel-defined material layer is then graphically visualized a second time.

[0064] This improves the graphic representation of the pixel-defined material layer, thereby increasing the area of ​​the pixel opening. The isolation structure extends beyond the first edge of the pixel opening toward the center of the isolation opening. The portion of the isolation structure that extends beyond the first edge can prevent the light-emitting layer from climbing up the sidewall of the isolation structure. This increases the connection area between the second connection and the isolation structure, improving the connection effect, thereby improving the light-emitting effect of the light-emitting unit, and ultimately improving the display effect.

[0065] Thirdly, this application provides a display device comprising a display panel according to any of the above embodiments, or a display panel prepared by the preparation method of any of the above embodiments. The display device provided by this application has the same or similar technical effects as the display panel or preparation method of any of the above embodiments, and will not be elaborated further here. Attached Figure Description

[0066] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0067] Figure 1 This is a schematic diagram of the planar structure of the display panel provided in an embodiment of this application; Figure 2 for Figure 1 A magnified view of a portion of point A in the middle; Figure 3 For along Figure 2 One of the cross-sectional structural diagrams of the middle BB line; Figure 4 For along Figure 2 Sectional view of the middle BB line, part two; Figure 5 for Figure 4 One of the magnified views of a section at point C; Figure 6 for Figure 4 Second magnified view of a section at point C; Figure 7 for Figure 4 The view from direction D in the image shows that the second electrode and the first inorganic encapsulation layer are not displayed. Figure 8 For along Figure 2 Sectional view of the middle BB line, Part 3; Figure 9 for Figure 8 A magnified view of a portion of point E in the middle; Figure 10 For along Figure 2 Sectional view of the middle BB line, part four; Figure 11 for Figure 10 A magnified view of a section at point F; Figure 12 This is one of the structural schematic diagrams of the display panel during the manufacturing process provided in the embodiments of this application; Figure 13 This is the second schematic diagram of the structure of the display panel provided in the embodiments of this application during the manufacturing process; Figure 14 This is the third schematic diagram of the structure of the display panel provided in the embodiments of this application during the manufacturing process; Figure 15 This is the fourth schematic diagram of the structure of the display panel provided in the embodiment of this application during the manufacturing process.

[0068] The following are the labeling elements in the figure: Display panel 100; substrate 10; first electrode 20; pixel definition layer 30; pixel opening 301; isolation structure 40; isolation opening 401; base part 41; first protrusion 411; support part 42; eaves part 43; second protrusion 431; light-emitting layer 50; first connecting part 51; second electrode 60; second connecting part 61; first inorganic encapsulation layer 70; Pixel definition material layer 3; Isolation structure material layer 4; Base material layer 4-1; Support material layer 4-2; Eaves material layer 4-3; First edge 01; Second edge 02; Third edge 03; Fourth edge 04; Fifth edge 05; Sixth edge 06; First distance L1; Second distance L2; Third distance L3; Fourth distance L4. Detailed Implementation

[0069] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0070] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0071] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0072] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0073] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. It should be noted that, unless otherwise specified, different features in the embodiments of this application can be combined with each other.

[0074] For ease of understanding, the accompanying diagram shows the mutually orthogonal X-axis, Y-axis, and Z-axis. The direction along the X-axis is called the X-direction, the direction along the Y-axis is called the Y-direction, and the direction along the Z-axis is called the Z-direction. The Z-direction is the normal direction relative to the plane containing the X and Y directions. Furthermore, a view where various elements are observed parallel to the plane containing the X and Y directions is called a top view. Alternatively, the planes in the X and Y directions can be planes parallel to the display surface of the display panel, and the Z-direction can be a direction parallel to the thickness direction of the display panel.

[0075] For certain elements, terms like "above" or "overhead" are sometimes used when describing the position of an element in the Z direction, and "below" or "under" are used when describing the position of an element in the opposite direction. Furthermore, when using terms like "above," "overhead," "below," "under," or "relative" to define the positional relationship between two elements, this includes not only the state where the two elements are directly adjacent, but also the state where the two elements are separated by gaps or other elements. Additionally, terms like "first," "second," and "third" are used only for distinguishing descriptions and should not be interpreted as indicating or implying relative importance.

[0076] Please refer to the following: Figure 1 , Figure 2 and Figure 3 , Figure 1 This is a schematic diagram of the structure of the display panel 100 provided in the embodiments of this application. Figure 2 This is a magnified view of a portion of point A in the diagram. Figure 3 This is one of the cross-sectional structural views along line BB in the figure. This application embodiment provides a display panel 100, which can be an organic light-emitting diode (OLED). OLED (Emitting Diode) display panel 100 or Micro LED / μLED (Micro Light Emitting Diode) display panel 100.

[0077] The display panel 100 provided in this embodiment further includes a substrate 10, which includes a display area AA and a non-display area NA, with the non-display area NA surrounding at least a portion of the display area AA. The shape of the display area AA of the display panel 100 can be rectangular, or it can be a square, a circle, an ellipse, or other shapes.

[0078] Please continue reading. Figure 2 and Figure 3 The display panel 100 provided in this embodiment further includes multiple light-emitting units. These light-emitting units are located on one side of the substrate 10 along its thickness direction, and can be fabricated in batches according to a process flow. For example, the multiple light-emitting units may include a first light-emitting unit, a second light-emitting unit, and a third light-emitting unit, which can emit light of different colors. For example, the first light-emitting unit can emit red light, the second light-emitting unit can emit green light, and the third light-emitting unit can emit blue light.

[0079] It is understood that the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit are sequentially vapor-deposited and patterned. That is, when the display panel 100 provided in this application embodiment is manufactured, the first light-emitting unit can be vapor-deposited and patterned first, the second light-emitting unit can be vapor-deposited and patterned second, and the third light-emitting unit can be vapor-deposited and patterned last.

[0080] In some embodiments, the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit can be patterned using a photomask.

[0081] In some embodiments, the display panel 100 provided in this application further includes a pixel-defined layer (PDL) 30 and an isolation structure 40. The isolation structure 40 and the pixel-defined layer 30 are disposed on the same side of the substrate 10 along the thickness direction, and the isolation structure 40 is disposed on the side of the pixel-defined layer 30 facing away from the substrate 10, and the isolation structure 40 encloses a plurality of isolation openings 401. The orthographic projection of the light-emitting unit on the substrate 10 can be located within the orthographic projection of the corresponding isolation opening 401 on the substrate 10. Optionally, the pixel-defined layer 30 and the isolation structure 40 can be located in the display area AA. It is understood that the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit can be patterned using the isolation structure 40 instead of a photomask. The pixel-defined layer 30 has a plurality of pixel openings 301, which communicate with the corresponding isolation openings 401, and at least a portion of the light-emitting unit is disposed within the corresponding pixel opening 301.

[0082] The plurality of isolation openings 401 may include a first isolation opening 401, a second isolation opening 401, and a third isolation opening 401. A first light-emitting unit corresponds to the first isolation opening 401, a second light-emitting unit corresponds to the second isolation opening 401, and a third light-emitting unit corresponds to the third isolation opening 401. The plurality of pixel openings 301 may include a first pixel opening 301, a second pixel opening 301, and a third pixel opening 301. The first pixel opening 301 is connected to the first isolation opening 401, the second pixel opening 301 is connected to the second isolation opening 401, and the third pixel opening 301 is connected to the third isolation opening 401. At least a portion of the first light-emitting unit is disposed within the corresponding first pixel opening 301, at least a portion of the second light-emitting unit is disposed within the corresponding second pixel opening 301, and at least a portion of the third light-emitting unit is disposed within the corresponding third pixel opening 301.

[0083] Generally, the area of ​​the orthographic projection of the isolation opening 401 onto the substrate 10 is larger than the area of ​​the orthographic projection of the pixel opening 301 connected to the isolation opening 401 onto the substrate 10. The orthographic projections of the pixel opening 301 of the light-emitting unit onto the substrate 10 overlap with the orthographic projections of the isolation opening 401 onto the substrate 10. The pixel defining layer is made of an inorganic material, such as an inorganic insulating material formed using at least one of silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiON).

[0084] In another embodiment, the isolation structure 40 is disposed within the groove of the pixel defining layer. Alternatively, the display panel 100 may not have a pixel defining layer, and the isolation structure 40 may be disposed on one side of the substrate 10, with the isolation structure 40 in contact with one side of the substrate 10.

[0085] The display panel 100 provided in this application embodiment further includes a first electrode 20 layer. A portion of the first electrode 20 layer is located between the pixel definition layer 30 and the substrate 10. The first electrode 20 layer includes a plurality of spaced first electrodes 20. The pixel opening 301 is connected to the isolation opening 401. The pixel opening 301 exposes a portion of the first electrode 20. The light-emitting layer 50 can pass through the pixel opening 301 and connect to the first electrode 20.

[0086] It is understood that the first electrode 20 of the light-emitting unit is located on the side of the pixel definition layer 30 facing the substrate 10. The light-emitting unit includes a light-emitting layer 50 and a second electrode 60 located on the side of the light-emitting layer 50 away from the substrate 10. The light-emitting layer 50 and the second electrode 60 of the light-emitting unit are located within the isolation opening 401, and the light-emitting layer 50 is located between the first electrode 20 and the second electrode 60.

[0087] Optionally, the first electrode 20 can be an anode, and the second electrode 60 can be a cathode.

[0088] It is understandable that the light-emitting layer 50 of the first light-emitting unit is the first light-emitting layer 50, the light-emitting layer 50 of the second light-emitting unit is the second light-emitting layer 50, and the light-emitting layer 50 of the third light-emitting unit is the third light-emitting layer 50.

[0089] The display panel 100 provided in this embodiment further includes a first encapsulation layer. The first encapsulation layer is disposed on the side of the pixel definition layer 30 opposite to the substrate 10 and is located on the side of the light-emitting unit opposite to the substrate 10. The first encapsulation layer is adjacent to the light-emitting unit. The first encapsulation layer includes a plurality of encapsulation portions, which cover the corresponding isolation opening 401 and the light-emitting unit. In other words, the orthographic projection of the isolation opening 401 on the substrate 10 lies within the orthographic projection of the corresponding encapsulation portion on the substrate 10, and the orthographic projection of the light-emitting unit on the substrate 10 lies within the orthographic projection of the corresponding encapsulation portion on the substrate 10.

[0090] The multiple encapsulation portions may include a first encapsulation portion, a second encapsulation portion, and a third encapsulation portion. The first encapsulation portion corresponds to the first light-emitting unit and is also formed by patterning. The second encapsulation portion corresponds to the second light-emitting unit and is also formed by patterning. The third encapsulation portion corresponds to the third light-emitting unit and is also formed by patterning. Optionally, the fabrication order of the first, second, and third encapsulation portions is consistent with the fabrication order of the first, second, and third light-emitting units.

[0091] It is understood that the isolation opening 401 and pixel opening 301 corresponding to the light-emitting units of different light-emitting colors can be prepared in different processes (for example, the first isolation opening 401 corresponding to the first light-emitting unit and the second isolation opening 401 corresponding to the second light-emitting unit are prepared in different processes). The first encapsulation layer is usually used to encapsulate the light-emitting unit after it is formed. After the first encapsulation layer encapsulates the light-emitting unit (e.g., the first light-emitting unit) prepared first, the isolation opening 401 (e.g., the second isolation opening 401 and / or the third isolation opening 401) corresponding to the subsequent light-emitting units is prepared.

[0092] When preparing the isolation opening 401 corresponding to the subsequent light-emitting unit, it is necessary to use an adhesive layer (e.g., photoresist) to cover the already prepared first encapsulation layer (e.g., the first encapsulation part) in order to pattern the isolation structure 40 to prepare the isolation opening 401 corresponding to the subsequent light-emitting unit.

[0093] It should be noted that, in addition to covering the first encapsulation layer that has already been prepared, the adhesive layer also needs to cover the location of the isolation structure 40 where no isolation opening 401 needs to be made.

[0094] For example, after the first encapsulation part is prepared and before the second isolation opening 401 is prepared, the first adhesive layer covers the encapsulation part and the isolation structure 40 at the position where the isolation opening 401 does not need to be opened.

[0095] For example, after the first encapsulation portion is prepared, but before the second isolation opening 401 and the third isolation opening 401 are prepared, the first adhesive layer covers the first encapsulation portion and the isolation structure 40 at the locations where the isolation opening 401 does not need to be formed. The second isolation opening 401 and the third isolation opening 401 can be prepared simultaneously.

[0096] For example, after the first encapsulation portion and the second encapsulation portion are fabricated, and before the third isolation opening 401 is fabricated, the second adhesive layer covers the first encapsulation portion and the location of the isolation structure 40 where the isolation opening 401 does not need to be formed. The first isolation opening 401 and the second isolation opening 401 can be fabricated simultaneously. Optionally, the second isolation opening 401 can also be fabricated after the first isolation opening 401.

[0097] However, the inventor discovered that... Please continue reading Figure 3 During fabrication, the light-emitting layer 50 will rise onto the isolation structure 40 and will rise between the second electrode 60 and the isolation structure 40. The light-emitting layer 50 will affect the connection between the second electrode 60 and the isolation structure 40, causing the second electrode 60 to be unable to conduct electricity effectively, resulting in abnormal light emission of the light-emitting layer 50, producing dark spots, and thus affecting the light emission effect.

[0098] In order to at least partially solve the above-mentioned technical problems, this application provides a display panel 100, a method for manufacturing the same, and a display device.

[0099] Please refer to the following: Figure 4 , Figure 5 and Figure 6 , Figure 4 For along Figure 2 Sectional view of the middle BB line, part two. Figure 5 for Figure 4 One of the magnified views of a section at point C. Figure 6 for Figure 4 The second magnified view at point C shows that the display panel 100 provided in this embodiment includes a substrate 10, a pixel definition layer 30, an isolation structure 40, and a light-emitting unit. The pixel definition layer 30 has a pixel opening 301. The isolation structure 40 is disposed on the side of the pixel definition layer 30 away from the substrate 10, and the isolation structure 40 surrounds and forms the isolation opening 401, which is connected to the pixel opening 301.

[0100] The light-emitting unit includes a light-emitting layer 50 and a second electrode 60 arranged sequentially along a direction away from the substrate 10. At least a portion of the light-emitting layer 50 is disposed within the pixel opening 301. The second electrode 60 is connected to the isolation structure 40 and covers the light-emitting layer 50.

[0101] Furthermore, the edge of the sidewall of the pixel opening 301 away from the substrate 10 is the first edge 01, and the edge of the side surface of the isolation structure 40 facing the substrate 10 and facing the center of the isolation opening 401 is the second edge 02. The second edge 02 is located on the side of the first edge 01 facing the center of the isolation opening 401.

[0102] It is understandable that the second edge 02 is located on the side of the first edge 01 facing the center of the isolation opening 401. That is, the isolation structure 40 extends beyond the first edge 01 of the pixel opening 301 towards the center of the isolation opening 401. The part of the isolation structure 40 that extends beyond the first edge 01 can block the light-emitting layer 50 from climbing up the side wall of the isolation structure 40. This helps to prevent the light-emitting layer 50 from affecting the connection between the second electrode 60 and the isolation structure 40. This can increase the connection area between the second electrode 60 and the isolation structure 40, improve the connection effect, thereby improve the light-emitting effect of the light-emitting unit, and thus improve the display effect.

[0103] Therefore, the display panel 100 provided in this application embodiment can improve the performance of the display device.

[0104] In some embodiments, the edge of the light-emitting layer 50 is provided with a first connecting portion 51, which is connected to the side surface of the isolation structure 40 facing the substrate 10. The first connecting portion 51 is the area of ​​the light-emitting layer 50 that contacts the side surface of the isolation structure 40 facing the substrate 10.

[0105] Optionally, the first edge 01 coincides with the edge of the first connecting portion 51 away from the center of the isolation opening 401, and the second edge 02 coincides with the edge of the first connecting portion 51 toward the center of the isolation opening 401.

[0106] In this way, the light-emitting layer 50 is connected to the side surface of the isolation structure 40 facing the substrate 10 through the first connection portion 51, which helps to prevent it from climbing to the connection point between the second electrode 60 and the isolation structure 40, thereby helping to avoid affecting the connection effect between the second electrode 60 and the isolation structure 40, and thus improving the light-emitting effect of the light-emitting unit.

[0107] Please see Figure 7 , Figure 7 for Figure 4 In the D-direction view, the second electrode 60 and the first inorganic encapsulation layer 70 are not shown. Optionally, the first connection portion 51 is a closed ring. Although the light-emitting layer 50 will leak current, this can improve the uniformity of the connection between the first connection portion 51 and the isolation structure 40, so that the light-emitting layer 50 can leak current evenly, thereby improving the light emission uniformity of the light-emitting unit and thus improving the display effect.

[0108] Please continue reading. Figure 5 and Figure 6 In some embodiments, a second connecting portion 61 is provided at the edge of the second electrode 60. The second connecting portion 61 is connected to the isolation structure 40, and the orthographic projection area of ​​the second connecting portion 61 on the substrate 10 is larger than the orthographic projection area of ​​the first connecting portion 51 on the substrate 10. The second connecting portion 61 is the area of ​​the second electrode 60 that contacts the isolation structure 40.

[0109] In this way, the connection between the second electrode 60 and the isolation structure 40 is better than that between the light-emitting layer 50, which helps to improve the light-emitting effect of the light-emitting unit and thus improve the display effect.

[0110] Optionally, the orthographic projection of the first connecting portion 51 on the substrate 10 is located within the orthographic projection of the second connecting portion 61 on the substrate 10.

[0111] Please continue reading. Figure 5 Optionally, the second connecting part 61 is a closed ring, which can improve the uniformity of the connection between the second connecting part 61 and the isolation structure 40, and make the second electrode 60 and the isolation structure 40 uniformly connected, thereby improving the uniformity of light emission of the light-emitting unit and thus improving the display effect.

[0112] Please continue reading. Figure 5In some embodiments, the isolation structure 40 includes a base portion 41, a support portion 42, and an eaves portion 43 arranged sequentially along the direction away from the substrate 10. The orthographic projection of the side surface of the support portion 42 facing the substrate 10 onto the substrate 10 is located within the orthographic projection of the side surface of the base portion 41 away from the substrate onto the substrate 10. The second electrode 60 is attached to a portion of the side surface of the base portion 41 away from the substrate 10.

[0113] The second electrode 60 does not contact the support portion 42.

[0114] In this way, there is no obstruction between the second electrode 60 and the base part 41, and the second electrode 60 and the base part 41 of the isolation structure 40 have a good connection effect, which is conducive to improving the light emission effect of the light-emitting unit, and thus conducive to improving the display effect of the display panel 100.

[0115] Please continue reading. Figure 5 Optionally, the second electrode 60 is attached to the sidewall of the base 41 facing the center of the isolation opening 401. In this way, the light-emitting layer 50 will not affect the connection between the second electrode 60 and the base 41, which is beneficial to further improve the connection effect between the second electrode 60 and the base 41 of the isolation structure 40.

[0116] Please continue reading. Figure 5 and Figure 6 In some embodiments, the orthographic projection of the second electrode 60 on the substrate 10 does not overlap with the orthographic projection of the side surface of the support portion 42 facing the substrate 10 on the substrate 10. This reduces the deposition angle of the second electrode 60, which is beneficial for the fabrication of the second electrode 60 and reduces the fabrication difficulty.

[0117] Optionally, the second electrode 60 and the support portion 42 are spaced apart on the sidewall surface facing the center of the isolation opening 401. This can further reduce the deposition angle of the second electrode 60, which is beneficial to the fabrication of the second electrode 60 and can reduce the fabrication difficulty.

[0118] Please continue reading. Figure 5 In some embodiments, the light-emitting layer 50 is attached to the surface of the base portion 41 facing the substrate 10. This helps to prevent the light-emitting layer 50 from climbing to the side of the base portion 41 away from the substrate 10, thereby helping the light-emitting layer 50 avoid affecting the connection effect between the second connecting portion 61 and the isolation structure 40, and thus improving the light-emitting effect of the light-emitting unit.

[0119] Please continue reading. Figure 6Optionally, the light-emitting layer 50 is attached to the sidewall surface of the base portion 41 facing the center of the isolation opening 401. It is understood that the light-emitting layer 50 can adhere to the sidewall surface of the base portion 41 facing the center of the isolation opening 401 during vapor deposition, which is beneficial to increasing the vapor deposition angle of the light-emitting layer 50, thereby facilitating the preparation of the light-emitting layer 50.

[0120] Please continue reading. Figure 5 , Figure 6 and Figure 7 In some embodiments, the edge of the side surface of the support portion 42 facing the substrate 10 and toward the center of the isolation opening 401 is the third edge 03, the edge of the side surface of the base portion 41 away from the substrate 10 and toward the center of the isolation opening 401 is the fourth edge 04, the distance between the first edge 01 and the second edge 02 is the first distance L1, the distance between the third edge 03 and the fourth edge 04 is the second distance L2, the ratio of the first distance L1 to the second distance L2 is K1, and the range of the ratio K1 of the first distance L1 to the second distance L2 is: 0 < K1 < 1.

[0121] Wherein, the edge of the second connection portion 61 of the second electrode 60 away from the center of the isolation opening 401 is located on the side of the third edge 03 facing the center of the isolation opening 401. That is, the orthographic projection of the second electrode 60 on the substrate 10 does not overlap with the orthographic projection of the side surface of the support portion 42 facing the substrate 10 on the substrate 10.

[0122] Optionally, the edge of the side surface of the base portion 41 facing the substrate 10 that faces the center of the isolation opening 401 is designated as the second edge 02. The orthographic projections of the second edge 02 and the fourth edge 04 on the substrate 10 can coincide. Alternatively, the orthographic projections of the second edge 02 and the fourth edge 04 on the substrate 10 can be spaced apart.

[0123] It is understood that the first distance L1 can be the dimension of the first connecting portion 51 of the light-emitting layer 50 in the direction from the center of the isolation opening 401 to the edge of the isolation opening 401. The base portion 41 can be provided with a first protrusion 411, which extends from the support portion 42 toward one side edge of the substrate 10 toward the center of the isolation opening 401.

[0124] In this way, the area of ​​the connection between the base part 41 and the light-emitting layer 50 is smaller than the area of ​​the connection between the base part 41 and the second electrode 60. That is, the area of ​​the connection between the first protrusion 411 and the light-emitting layer 50 is smaller than the area of ​​the connection between the first protrusion 411 and the second electrode 60. This is beneficial to improving the connection effect between the second electrode 60 and the isolation structure 40, thereby improving the light-emitting effect of the light-emitting unit.

[0125] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0 < K1 ≤ 0.9.

[0126] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.8.

[0127] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.7.

[0128] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.6.

[0129] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0 < K1 ≤ 0.5.

[0130] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.4.

[0131] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.3.

[0132] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.2.

[0133] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of: 0 < K1 ≤ 0.1.

[0134] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.1 ≤ K1 < 1.

[0135] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.2 ≤ K1 < 1.

[0136] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.3 ≤ K1 < 1.

[0137] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.4 ≤ K1 < 1.

[0138] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.5 ≤ K1 < 1.

[0139] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.6 ≤ K1 < 1.

[0140] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.7 ≤ K1 < 1.

[0141] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.8 ≤ K1 < 1.

[0142] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.9 ≤ K1 < 1.

[0143] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.8 < K1 ≤ 0.9.

[0144] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.7 < K1 ≤ 0.8.

[0145] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.6 < K1 ≤ 0.7.

[0146] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.5 < K1 ≤ 0.6.

[0147] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.4 < K1 ≤ 0.5.

[0148] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.3 < K1 ≤ 0.4.

[0149] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.2 < K1 ≤ 0.3.

[0150] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can be in the range of 0.1 < K1 ≤ 0.2.

[0151] Optionally, the ratio K1 of the first distance L1 to the second distance L2 can take the following values: 0.05, 0.75, 0.1, 0.125, 0.15, 0.175, 0.2, 0.225, 0.25, 0.275, 0.3, 0.325, 0.35, 0.375, 0.4, 0.425, 0.45, 0.475, 0.5, 0.525, 0.55, 0.575, 0.6, 0.625, 0.65, 0.675, 0.7, 0.725, 0.75, 0.775, 0.8, 0.825, 0.85, 0.875, 0.9, 0.925, 0.95, 0.975, etc.

[0152] Please continue reading. Figure 5and Figure 6 In some embodiments, the orthographic projection of the side surface of the support portion 42 facing away from the substrate 10 onto the substrate 10 lies within the orthographic projection of the side surface of the eaves portion 43 facing the substrate 10 onto the substrate 10. Specifically, the orthographic projection of the support portion 42 onto the substrate 10 lies within the orthographic projection of the eaves portion 43 onto the substrate 10, meaning the width of the eaves portion 43 is greater than the width of the support portion 42. Therefore, the two ends of the eaves portion 43 protrude compared to the sides of the support portion 42, and this shape of the isolation structure 40 is also referred to as a cantilever shape. The support portion 42 and the eaves portion 43 are made of different materials, and the etching rate of the eaves portion 43 is lower than that of the support portion 42.

[0153] Among them, the edge of the side surface of the support portion 42 facing the substrate 10 and toward the center of the isolation opening 401 is the third edge 03, and the edge of the side surface of the support portion 42 away from the substrate 10 and toward the center of the isolation opening 401 is the fifth edge 05. The orthographic projection of the third edge 03 on the substrate 10 is located on the side of the orthographic projection of the fifth edge 05 on the substrate 10 toward the center of the isolation opening 401. That is, the orthographic projection of the side surface of the support portion 42 away from the substrate 10 on the substrate 10 is located within the orthographic projection of the side surface of the support portion 42 facing the substrate 10 on the substrate 10.

[0154] Optionally, the orthographic projection of the support portion 42 on the substrate 10 is located within the orthographic projection of the base portion 41 on the substrate 10, and the orthographic projection of the base portion 41 on the substrate 10 is located within the orthographic projection of the eaves portion 43 on the substrate 10.

[0155] The base portion 41 protrudes relative to the support portion 42 in the direction toward the isolation opening 401. The material of the base portion 41 may include at least one of molybdenum (Mo), titanium (Ti), titanium nitride (TiN), molybdenum-tungsten alloy (MoW), or molybdenum-niobium alloy (MoNb). It is understood that the isolation structure 40 is used to connect with the second electrode 60 to electrically conduct the second electrode 60.

[0156] The support portion 42 is made of a conductive material, specifically including at least one of aluminum (Al) and aluminum alloys, where the aluminum alloys include at least one of aluminum-neodymium alloy (AlNd), aluminum-yttrium alloy (AlY), or aluminum-silicon alloy (AlSi). The eaves portion 43 can be a single-layer or multi-layer structure. If the eaves portion 43 is a single-layer structure, its material can include at least one of titanium, titanium nitride, molybdenum, tungsten, molybdenum-tungsten alloy, or molybdenum-niobium alloy. If the eaves portion 43 is a multi-layer structure, one layer of the eaves portion 43 is made of at least one of titanium, titanium nitride, molybdenum, tungsten, molybdenum-tungsten alloy, or molybdenum-niobium alloy, and another layer of the eaves portion 43 can be made of a conductive oxide or an inorganic insulating material, such as indium tin oxide (ITO) or indium zinc oxide (IZO).

[0157] Please continue reading. Figure 5 and Figure 6 In some embodiments, the edge of the surface of the base portion 41 facing away from the substrate 10 and towards the center of the isolation opening 401 is designated as the fourth edge 04, and the edge of the surface of the eaves portion 43 facing the substrate 10 and towards the center of the isolation opening 401 is designated as the sixth edge 06. The distance between the third edge 03 and the fourth edge 04 is designated as the second distance L2, and the distance between the fifth edge 05 and the sixth edge 06 is designated as the third distance L3. The ratio of the second distance L2 to the third distance L3 is K2, and the value of K2 satisfies the condition: 0 < K2 < 0.5. This increases the extension dimension of the eaves portion 43 towards the isolation opening 401, which is beneficial for increasing the encapsulation area during the subsequent fabrication of the first inorganic encapsulation layer 70, thereby improving the encapsulation effect.

[0158] It is understood that the eaves portion 43 includes a second protrusion 431, which extends from the edge of the support portion 42 away from the substrate 10 toward the center of the isolation opening 401. The fifth edge 05 may coincide with the edge of the second protrusion 431 away from the center of the isolation opening 401, and the sixth edge 06 may coincide with the edge of the second protrusion 431 toward the center of the isolation opening 401.

[0159] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0 < K2 ≤ 0.4.

[0160] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0 < K2 ≤ 0.3.

[0161] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of: 0 < K2 ≤ 0.2.

[0162] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of: 0 < K2 ≤ 0.1.

[0163] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.1 ≤ K2 < 0.5.

[0164] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.2 ≤ K2 < 0.5.

[0165] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.3 ≤ K2 < 0.5.

[0166] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.4 ≤ K2 < 0.5.

[0167] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.3 < K1 ≤ 0.4.

[0168] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.2 < K1 ≤ 0.3.

[0169] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can be in the range of 0.1 < K1 ≤ 0.2.

[0170] Optionally, the ratio K2 of the second distance L2 to the third distance L3 can take values ​​of 0.05, 0.75, 0.1, 0.125, 0.15, 0.175, 0.2, 0.225, 0.25, 0.275, 0.3, 0.325, 0.35, 0.375, 0.4, 0.425, 0.45, 0.475, etc.

[0171] Please continue reading. Figure 5 and Figure 6In some embodiments, the edge of the support portion 42 facing the substrate 10 and towards the center of the isolation opening 401 is designated as the third edge 03; the edge of the base portion 41 facing away from the substrate 10 and towards the center of the isolation opening 401 is designated as the fourth edge 04; and the edge of the eaves portion 43 facing the substrate 10 and towards the center of the isolation opening 401 is designated as the sixth edge 06. The distance between the third edge 03 and the fourth edge 04 is designated as the second distance L2; the distance between the orthographic projection of the fourth edge 04 onto the substrate 10 and the orthographic projection of the sixth edge 06 onto the substrate 10 is designated as the fourth distance L4; and the ratio of the second distance L2 to the fourth distance L4 is K3. The value of K3 satisfies the condition that 0 < K3 < 1. This increases the extension dimension of the eaves portion 43 towards the isolation opening 401, which is beneficial for increasing the encapsulation area during the subsequent fabrication of the first inorganic encapsulation layer 70, thereby improving the encapsulation effect.

[0172] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.1 ≤ K3 < 1.

[0173] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.2 ≤ K3 < 1.

[0174] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.3 ≤ K3 < 1.

[0175] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0.4 ≤ K3 < 1.

[0176] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0.5 ≤ K3 < 1.

[0177] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.6 ≤ K3 < 1.

[0178] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.7 ≤ K3 < 1.

[0179] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0.8 ≤ K3 < 1.

[0180] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.9 ≤ K3 < 1.

[0181] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.9.

[0182] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of: 0 < K3 ≤ 0.8.

[0183] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.7.

[0184] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.6.

[0185] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.5.

[0186] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.4.

[0187] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of: 0 < K3 ≤ 0.3.

[0188] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.2.

[0189] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be set to the following range: 0 < K3 ≤ 0.1.

[0190] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.1 ≤ K3 < 0.2.

[0191] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.2 ≤ K3 < 0.3.

[0192] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.3 ≤ K3 < 0.4.

[0193] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.4 ≤ K3 < 0.5.

[0194] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.5 ≤ K3 < 0.6.

[0195] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.6 ≤ K3 < 0.7.

[0196] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.7 ≤ K3 < 0.8.

[0197] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can be in the range of 0.8 ≤ K3 < 0.9.

[0198] Optionally, the ratio K3 of the second distance L2 to the fourth distance L4 can take the following values: 0.05, 0.75, 0.1, 0.125, 0.15, 0.175, 0.2, 0.225, 0.25, 0.275, 0.3, 0.325, 0.35, 0.375, 0.4, 0.425, 0.45, 0.475, 0.5, 0.525, 0.55, 0.575, 0.6, 0.625, 0.65, 0.675, 0.7, 0.725, 0.75, 0.775, 0.8, 0.825, 0.85, 0.875, 0.9, 0.925, 0.95, 0.975, etc.

[0199] Please continue reading. Figure 5 and Figure 6 In some embodiments, the first electrode 20 is located between the pixel definition layer 30 and the substrate 10, and the pixel opening 301 exposes at least a portion of the first electrode 20. The first electrode 20 is connected to the light-emitting layer 50.

[0200] The first electrode 20 may include a multilayer structure, such as a reflective layer and a pair of conductive oxide layers covering the upper and lower surfaces of the reflective layer, respectively. The reflective layer can be formed, for example, using silver, a metal with excellent light reflectivity. Each conductive oxide layer can be formed, for example, from a transparent conductive oxide such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), or IGZO (Indium Gallium Zinc Oxide). The second electrode 60 is formed, for example, from a metallic material such as an alloy of magnesium and silver (MgAg).

[0201] The light-emitting layer 50 of at least one of the first, second, and third light-emitting units includes a hole injection layer HIL, a hole transport layer HTL, an electron blocking layer EBL, a light-emitting material layer EML, a hole blocking layer HBL, an electron transport layer ETL, and an electron injection layer EIL stacked along a direction away from the substrate 10 (i.e., the Z direction). The light-emitting layer 50 may include a single light-emitting material layer EML, or a stacked light-emitting layer 50 including multiple light-emitting material layers EML.

[0202] In order for the light-emitting layer 50 to emit light, a pixel voltage is provided to the first electrode 20 and a common voltage is provided to the second electrode 60, forming a potential difference between the first electrode 20 and the second electrode 60, causing the light-emitting layer 50 disposed between the first electrode 20 and the second electrode 60 to emit light. In one embodiment, if a potential difference is formed between the first electrode 20 and the second electrode 60 of the first light-emitting unit, the light-emitting material layer EML of the light-emitting layer 50 emits blue light; if a potential difference is formed between the first electrode 20 and the second electrode 60 of the second light-emitting unit, the light-emitting material layer EML of the light-emitting layer 50 emits green light; and if a potential difference is formed between the first electrode 20 and the second electrode 60 of the third light-emitting unit, the light-emitting material layer EML of the light-emitting layer 50 emits red light.

[0203] In this configuration, the pixel voltage of the first electrode 20 is provided by the pixel circuit, and the common voltage of the second electrode 60 is provided by the isolation structure 40. Specifically, the second electrode 60 is electrically connected to the isolation structure 40, and the common voltage is supplied to the second electrode 60 by providing the isolation structure 40. That is, the isolation structure 40 has the function of supplying a common voltage to the second electrode 60.

[0204] Optionally, the display panel 100 further includes a first inorganic encapsulation layer 70, which is disposed on the side of the light-emitting unit away from the substrate 10 and covers the light-emitting unit.

[0205] Optionally, the display panel 100 further includes an organic encapsulation layer located on the side of the first inorganic encapsulation layer away from the substrate 10 and covering the first inorganic encapsulation layer 70.

[0206] Optionally, the display panel 100 further includes a second inorganic encapsulation layer, which is disposed on the side of the organic encapsulation layer away from the substrate 10 and covers the organic encapsulation layer.

[0207] Optionally, the first encapsulation layer may be an inorganic encapsulation layer formed by chemical vapor deposition (CVD) and patterning.

[0208] Alternatively, the organic encapsulation layer can be an organic encapsulation layer made by inkjet printing (IJP).

[0209] Optionally, the second inorganic encapsulation layer can be an inorganic encapsulation layer formed by chemical vapor deposition (CVD2).

[0210] The materials of the first inorganic encapsulation layer 70 and the second inorganic encapsulation layer include at least one of silicon nitride (SiN), silicon oxide (SiO), and silicon oxynitride (SiON). The organic encapsulation layer is an organic insulating material, such as epoxy resin, acrylic resin, or other resin materials. The first inorganic encapsulation layer 70 and the second inorganic encapsulation layer are continuously disposed at least over the entire display area AA, with a portion of them also disposed in the bezel area NA.

[0211] Optionally, the display panel 100 provided in this embodiment may further include other film layers located on the side of the second inorganic encapsulation layer facing away from the substrate 10. These other film layers may include at least one layer such as a touch layer, a polarizer, a color filter substrate, or a protective cover. These film layers may also be bonded to the display panel 100 via an adhesive layer such as optically clear adhesive (OCA).

[0212] Please refer to the following: Figure 8 and Figure 9 , Figure 8 For along Figure 2 Sectional view of the middle BB line, part three. Figure 9 for Figure 8 A magnified view of a portion at point E. This application also provides another display panel 100, which includes a substrate 10, a pixel definition layer 30, an isolation structure 40, and a light-emitting unit. The pixel definition layer 30 has a pixel opening 301. The isolation structure 40 is disposed on the side of the pixel definition layer 30 facing away from the substrate 10, and the isolation structure 40 encloses and forms the isolation opening 401, which communicates with the pixel opening 301.

[0213] The isolation structure 40 includes a base portion 41, a support portion 42, and an eaves portion 43 arranged sequentially in a direction away from the substrate 10. The light-emitting unit includes a light-emitting layer 50 and a second electrode 60 arranged sequentially in a direction away from the substrate 10. At least a portion of the light-emitting layer 50 is disposed within the pixel opening 301. The second electrode 60 is connected to the isolation structure 40 and covers the light-emitting layer 50.

[0214] Furthermore, the edge of the support portion 42 facing the substrate 10 and towards the center of the isolation opening 401 is the third edge 03; the edge of the base portion 41 facing away from the substrate 10 and towards the center of the isolation opening 401 is the fourth edge 04; and the edge of the eaves portion 43 facing the substrate 10 and towards the center of the isolation opening 401 is the sixth edge 06. The orthographic projection of the fourth edge 04 onto the substrate 10 lies between the orthographic projections of the third edge 03 and the sixth edge 06 onto the substrate 10. The distance between the third edge 03 and the fourth edge 04 is the second distance L2, and the distance between the orthographic projections of the fourth edge 04 and the sixth edge 06 onto the substrate 10 is the fourth distance L4. The second distance L2 is less than the fourth distance L4. That is, the ratio K3 of the second distance L2 to the fourth distance L4 satisfies the condition: 0 < K3 < 1.

[0215] Through the above technical solution, the display panel provided in this application embodiment can increase the size of the eaves extending toward the isolation opening, which is beneficial to increasing the encapsulation area when preparing the first inorganic encapsulation layer in the future, thereby improving the encapsulation effect.

[0216] Please see Figure 9 The main difference between the display panel 100 of this embodiment and the display panel 100 of the previous embodiment is that the edge of the sidewall of the pixel opening 301 away from the substrate 10 is the first edge 01, and the edge of the side surface of the isolation structure 40 (base part 41) facing the substrate 10 and towards the center of the isolation opening 401 is the second edge 02. The first edge 01 is located on the side facing the center of the isolation opening 401 towards the second edge 02. In this way, the light-emitting layer 50 is less likely to come into contact with the base part 41, which helps to avoid contact between the light-emitting layer 50 and the base part 41, and thus helps to avoid leakage of the light-emitting layer.

[0217] For example, the light-emitting layer 50 is disposed within the pixel opening 301.

[0218] Please continue reading. Figure 9 In some embodiments, the orthographic projection of the sixth edge 06 on the substrate 10 is located on the side of the orthographic projection of the first edge 01 on the substrate 10 toward the center of the isolation opening 401.

[0219] In this way, the size of the portion of the eaves 43 extending toward the isolation opening 401 (the second extension 431) is increased, which is beneficial to increasing the encapsulation area when the first inorganic encapsulation layer 70 is subsequently prepared, thereby improving the encapsulation effect.

[0220] Please refer to the following: Figure 10 and Figure 11 , Figure 10 For along Figure 2Sectional view of the middle BB line, part four. Figure 11 for Figure 10 A magnified view at point F. In some embodiments, the orthographic projection of the first edge 01 on the substrate 10 is located on the side where the orthographic projection of the sixth edge 06 on the substrate 10 faces the center of the isolation opening 401. That is, the orthographic projection of the eaves 43 on the substrate 10 is spaced apart from the orthographic projection of the pixel opening 401 on the substrate 10, which helps to avoid blocking the light emitted by the light-emitting layer 50 and improves the light-emitting effect.

[0221] Please continue reading. Figure 10 and Figure 11 In some embodiments, the pixel definition layer 30 includes multiple sub-layers, including a first sub-layer 31 and a second sub-layer 32 stacked sequentially along the direction away from the substrate 10, that is, the pixel definition layer 30 can adopt a dual-layer design.

[0222] For example, the first sublayer 31 has better film-forming properties than the second sublayer 32. That is, under the same thickness conditions, the first sublayer 31 can better cover the stepped structure formed by the first electrode than the second sublayer 32, without producing cracks. Conversely, to obtain the same stepped coverage effect, the thickness of the first sublayer 31 needs to be thinner than that of the second sublayer 32. That is, the thickness requirement for the first sublayer 31 is relatively low, which is conducive to product thinning. In addition, the better film-forming properties are reflected in the better coverage of the film formed, which is denser and more conducive to the isolation of water vapor.

[0223] For example, the second sub-layer 32 has better etching resistance than the first sub-layer 31. Since the side of the pixel definition layer 30 facing away from the substrate 10 will be etched during the display panel manufacturing process, by selecting a material with stronger etching resistance as the second sub-layer 32, the etching resistance of the pixel definition layer 30 can be improved, further enhancing the reliability of the display panel.

[0224] For example, the first sublayer 31 and the second sublayer 32 are made of different materials. For instance, the first sublayer 31 is made of silicon nitride, and the second sublayer 32 is made of silicon oxide.

[0225] For example, the thickness of the first sublayer 31 is greater than or equal to 1000 micrometers and less than or equal to 5000 micrometers. For example, the thickness of the first sublayer 31 is 1000 micrometers, 2000 micrometers, 3000 micrometers, 4000 micrometers, 5000 micrometers, etc.

[0226] For example, the thickness of the second sublayer 32 is greater than or equal to 500 micrometers and less than or equal to 3000 micrometers. For instance, the thickness of the second sublayer 32 is 500 micrometers, 1000 micrometers, 2000 micrometers, 3000 micrometers, etc.

[0227] It should be noted that the similarities between the display panel 100 in this embodiment and the display panel 100 in the previous embodiment are as described above, and will not be repeated here.

[0228] Please refer to the following: Figure 12 , Figure 13 , Figure 14 and Figure 15 , Figure 12 This is one of the structural schematic diagrams of the display panel 100 provided in the embodiments of this application during the manufacturing process. Figure 13 This is the second schematic diagram of the structure of the display panel 100 provided in the embodiments of this application during the manufacturing process. Figure 14 This is the third schematic diagram of the structure of the display panel 100 provided in the embodiments of this application during the manufacturing process. Figure 15 This is the fourth schematic diagram of the structure of the display panel 100 provided in the embodiment of this application during the manufacturing process. The embodiment of this application also provides a method for manufacturing the display panel 100.

[0229] The preparation method provided in this application includes: S100, provides a substrate 10; S200, a pixel definition material layer 3 is prepared on one side of the substrate 10; S300, an isolation structure material layer 4 is prepared on one side of the substrate 10; S400, a graphic isolation structure material layer 4 to form an isolation structure 40, the isolation structure 40 enclosing an isolation opening 401; S500, a graphical pixel definition material layer 3 is formed to create a pixel opening 301, and an isolation opening 401 is connected to the pixel opening 301; S600, prepare a light-emitting unit. The light-emitting unit includes a light-emitting layer 50 and a second electrode 60 arranged sequentially along a direction away from the substrate 10. At least a portion of the light-emitting layer 50 is disposed in the pixel opening 301. The second electrode 60 is connected to the isolation structure 40 and covers the light-emitting layer 50. The edge of the sidewall of the pixel opening 301 away from the substrate 10 is the first edge 01, and the edge of the side surface of the isolation structure 40 facing the substrate 10 and facing the center of the isolation opening 401 is the second edge 02. The second edge 02 is located on the side of the first edge 01 facing the center of the isolation opening 401.

[0230] Through the above technical solution, the method for preparing the display panel 100 provided in this application embodiment can make the isolation structure 40 extend beyond the first edge 01 of the pixel opening 301 toward the center of the isolation opening 401. The part of the isolation structure 40 that extends beyond the first edge 01 can block the light-emitting layer 50 from climbing toward the side wall of the isolation structure 40. This can increase the connection area between the second connection and the isolation structure 40, improve the connection effect, thereby improve the light-emitting effect of the light-emitting unit, and thus improve the display effect.

[0231] Therefore, the method for manufacturing the display panel 100 provided in this application embodiment can improve the performance of the display device.

[0232] Please refer to Figure 12 In step S300, an isolation structure material layer 4 is prepared on one side of the substrate 10, including: S310, a base material layer 4-1 is prepared on the side of the pixel definition material layer 3 facing away from the substrate 10; S320, a support material layer 4-2 is prepared on the side of the base material layer 4-1 that is away from the substrate 10; S330, an eaves material layer 4-3 is prepared on the side of the support material layer 4-2 away from the substrate 10.

[0233] In this way, the method for preparing the display panel 100 provided in this application embodiment can prepare the isolation structure material layer 4, which facilitates the subsequent preparation of the isolation structure 40.

[0234] Please see Figure 12 and Figure 13 Optionally, in step S400, the patterned isolation structure material layer 4 includes: S410, Dry engraving is performed on the eaves material layer 4-3 and the support material layer 4-2. The dry engraving process can pattern the eaves material layer 4-3, prepare the support 42, and also pattern part of the support material layer 4-2 to prepare for wet engraving. S420, wet etching is performed on the base material layer 4-1 and the support material layer 4-2, so that the support 42 and the second protrusion 431 can be formed; S430, wet etching is performed on the support material layer 4-2. The method for preparing the display panel 100 provided in this application embodiment can prepare the isolation opening 401, the support 42, the base 41 and the first protrusion 411.

[0235] Please see Figure 14 and Figure 15 Optionally, in step S500, the graphical pixel definition of material layer 3 includes: S510, perform the first graphical representation of pixel definition material layer 3; S520 performs a second patterning of the pixel definition material layer 3.

[0236] It is understood that the manufacturing method of the display panel 100 provided in this application embodiment can improve the patterning degree of the pixel definition material layer 3, thereby increasing the area of ​​the pixel opening 301. This allows the isolation structure 40 to extend beyond the first edge 01 of the pixel opening 301 toward the center of the isolation opening 401. The portion of the isolation structure 40 that extends beyond the first edge 01 can block the light-emitting layer 50 from climbing toward the sidewall of the isolation structure 40. This can increase the connection area between the second connection and the isolation structure 40, improve the connection effect, thereby improve the light-emitting effect of the light-emitting unit, and further improve the display effect.

[0237] The display device provided in this application includes the display panel 100 of any of the above embodiments, or the display panel 100 prepared by the preparation method of any of the above embodiments. The display device provided in this application has the same or similar technical effects as the display panel 100 or the preparation method of any of the above embodiments, and will not be described further here.

[0238] Optionally, the display device can be a mobile phone, television, tablet computer, laptop computer, desktop computer, in-vehicle display terminal, wearable device, advertising display device, etc.

[0239] The above description is merely a specific embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A display panel, characterized in that, include: Substrate; A pixel definition layer having pixel openings. An isolation structure is disposed on the side of the pixel definition layer opposite to the substrate, and encloses an isolation opening, the isolation opening being in communication with the pixel opening; A light-emitting unit includes a light-emitting layer and a second electrode arranged sequentially along a direction away from the substrate. At least a portion of the light-emitting layer is disposed within the pixel opening. The second electrode is connected to the isolation structure and covers the light-emitting layer. The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the edge of the side surface of the isolation structure facing the substrate and towards the center of the isolation opening is the second edge. The second edge is located on the side of the first edge facing the center of the isolation opening.

2. The display panel as described in claim 1, characterized in that, The edge of the light-emitting layer is provided with a first connecting portion, which is the area of ​​the light-emitting layer that contacts the side surface of the isolation structure facing the substrate. Preferably, the first connecting portion is a closed ring.

3. The display panel as described in claim 2, characterized in that, The edge of the second electrode is provided with a second connection portion, which is the area of ​​the second electrode that contacts the isolation structure. The orthographic projection area of ​​the second connection portion on the substrate is greater than the orthographic projection area of ​​the first connection portion on the substrate.

4. The display panel as described in claim 1, characterized in that, The isolation structure includes a base, a support, and an eaves arranged sequentially along a direction away from the substrate. The orthographic projection of the side surface of the support facing the substrate onto the substrate is located within the orthographic projection of the side surface of the base away from the substrate onto the substrate. The second electrode is attached to a portion of the side surface of the base away from the substrate. Preferably, the second electrode is attached to the sidewall of the base portion facing the center of the isolation opening.

5. The display panel as described in claim 4, characterized in that, The orthographic projection of the second electrode on the substrate does not overlap with the orthographic projection of the side surface of the support portion facing the substrate on the substrate. Preferably, the second electrode is spaced apart from the sidewall surface of the support portion facing the center of the isolation opening.

6. The display panel as described in claim 4, characterized in that, The light-emitting layer is attached to the side surface of the base portion facing the substrate.

7. The display panel as described in claim 4, characterized in that, The edge of the side surface of the support portion facing the substrate and towards the center of the isolation opening is the third edge, and the edge of the side surface of the base portion facing away from the substrate and towards the center of the isolation opening is the fourth edge. The distance between the first edge and the second edge is the first distance, and the distance between the third edge and the fourth edge is the second distance. The ratio of the first distance to the second distance is K1, and the value range of the ratio K1 is: 0 < K1 < 1. Preferably, the ratio K1 of the first distance to the second distance has a range of values ​​that satisfy: 0 < K1 ≤ 0.

9.

8. The display panel as described in claim 4, characterized in that, The orthographic projection of the side surface of the support portion facing away from the substrate onto the substrate is located within the orthographic projection of the side surface of the eaves portion facing the substrate onto the substrate. The edge of the side surface of the support portion facing the substrate toward the center of the isolation opening is the third edge. The edge of the side surface of the support portion facing away from the substrate toward the center of the isolation opening is the fifth edge. The orthographic projection of the third edge onto the substrate is located on the side of the orthographic projection of the fifth edge onto the substrate toward the center of the isolation opening. Preferably, the orthographic projection of the base portion on the substrate is located within the orthographic projection of the eaves portion on the substrate.

9. The display panel as described in claim 8, characterized in that, The edge of the base portion facing away from the substrate and toward the center of the isolation opening is the fourth edge; the edge of the eaves portion facing the substrate and toward the center of the isolation opening is the sixth edge; the distance between the third edge and the fourth edge is the second distance; the distance between the fifth edge and the sixth edge is the third distance; the ratio of the second distance to the third distance is K2; and the value of the ratio K2 satisfies the condition: 0 < K2 < 0.

5.

10. The display panel as claimed in claim 4, characterized in that, The edge of the side surface of the support portion facing the substrate and towards the center of the isolation opening is the third edge; the edge of the side surface of the base portion facing away from the substrate and towards the center of the isolation opening is the fourth edge; the edge of the side surface of the eaves portion facing the substrate and towards the center of the isolation opening is the sixth edge; the distance between the third edge and the fourth edge is the second distance; the distance between the orthographic projection of the fourth edge on the substrate and the orthographic projection of the sixth edge on the substrate is the fourth distance; the ratio of the second distance to the fourth distance is K3; and the value of the ratio K3 satisfies the condition: 0 < K3 < 1.

11. A display panel, characterized in that, include: Substrate; A pixel definition layer having pixel openings. An isolation structure is disposed on the side of the pixel definition layer away from the substrate and encloses an isolation opening, the isolation opening being connected to the pixel opening, and the isolation structure comprising a base, a support, and an eaves portion arranged sequentially along the direction away from the substrate. A light-emitting unit includes a light-emitting layer and a second electrode arranged sequentially along a direction away from the substrate. At least a portion of the light-emitting layer is disposed within the pixel opening. The second electrode is connected to the isolation structure and covers the light-emitting layer. The edge of the side surface of the support portion facing the substrate and towards the center of the isolation opening is the third edge; the edge of the side surface of the base portion facing away from the substrate and towards the center of the isolation opening is the fourth edge; and the edge of the side surface of the eaves portion facing the substrate and towards the center of the isolation opening is the sixth edge. Wherein, the orthographic projection of the fourth edge on the substrate is located between the orthographic projection of the third edge on the substrate and the orthographic projection of the sixth edge on the substrate, the distance between the third edge and the fourth edge is a second distance, the distance between the orthographic projection of the fourth edge on the substrate and the orthographic projection of the sixth edge on the substrate is a fourth distance, and the second distance is less than the fourth distance.

12. The display panel as claimed in claim 11, characterized in that, The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the edge of the surface of the base portion facing the substrate towards the center of the isolation opening is the second edge. The orthographic projection of the first edge on the substrate is located on the side of the orthographic projection of the second edge on the substrate towards the center of the isolation opening.

13. The display panel as claimed in claim 11, characterized in that, The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the orthographic projection of the sixth edge on the substrate is located on the side of the first edge on the substrate that faces the center of the isolation opening.

14. The display panel as claimed in claim 11, characterized in that, The edge of the sidewall of the pixel opening away from the substrate is the first edge, and the orthographic projection of the first edge on the substrate is located on the side of the sixth edge on the substrate that faces the center of the isolation opening.

15. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 14.

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