Light source unit, illumination unit, exposure device, and exposure method

Abstract

The purpose of the present invention is to provide a fixing method capable of suppressing positional displacement of a lens provided corresponding to an LED in a light source unit of an exposure device using the LED as a light source. A light source unit is provided with: a fixed object (21); first and second light source arrays each including a plurality of light source elements (23), the first and second light source arrays being provided in first and second regions arranged in a first direction on the fixed object (21); and a lens holder that holds first and second lens arrays (30) provided in the first and second regions, respectively, the first side surface of the first lens array and the first side surface of the second lens array being in contact with each other in the first direction, and the second side surface of the second lens array being in contact with each other in the second direction. The lens holder is provided with a first wall section (41) that defines the positions of the first lens array and the second lens array in the first direction, and a first biasing member (45) that biases the first lens array and the second lens array toward the first wall section.

Description

Technical Field

[0001] This invention relates to a light source unit, an illumination unit, an exposure apparatus, and an exposure method. Background Technology

[0002] In recent years, liquid crystal display panels have been widely used as display elements in personal computers, televisions, and other devices. Liquid crystal display panels are manufactured by forming the circuit pattern of thin-film transistors on a substrate (glass substrate) using photolithography. As the apparatus for this photolithography process, an exposure apparatus is used to project the original pattern formed on a mask onto a photoresist layer on the substrate via a projection optics system. As such an exposure apparatus, an exposure apparatus using an LED (Light Emitting Diode) as a light source has been proposed (for example, Patent Document 1).

[0003] In exposure apparatuses that use LEDs as light sources, lenses are positioned corresponding to the LEDs. If the lens shifts position, the desired optical characteristics will not be obtained; therefore, a method for fixing the lens to suppress this positional shift is sought. Existing technical documents Patent documents

[0004] Patent Document 1: Japanese Patent Application Publication No. 2016-184127 Summary of the Invention

[0005] According to the first disclosed embodiment, the light source unit comprises: a fixed object; a first light source array and a second light source array comprising multiple light source elements, respectively disposed on the fixed object in a first region and a second region arranged along a first direction; a first lens array disposed in a manner corresponding to the first region; a second lens array disposed in a manner corresponding to the second region; and a lens holder for holding the first lens array and the second lens array, wherein a first side surface of the first lens array contacts a first side surface of the second lens array in the first direction, the lens holder comprising a first wall portion and a first force-applying member, the first wall portion defining the position of the first lens array and the second lens array in the first direction, and the first force-applying member applying force to the first lens array and the second lens array toward the first wall portion.

[0006] According to the second disclosed embodiment, the lighting unit includes the aforementioned light source unit and an lighting optical system that guides the light emitted from the light source unit to the irradiated object.

[0007] According to the third disclosed embodiment, the illumination unit includes: a plurality of the aforementioned light source units; and an illumination optical system comprising a synthesizing optical element that synthesizes light emitted from the plurality of light source units and guides the synthesized light emitted from the synthesizing optical element to the irradiated object.

[0008] According to the fourth disclosed embodiment, the exposure apparatus includes the aforementioned illumination unit and a projection optical system that projects a pattern image of a mask illuminated by the illumination unit onto a photosensitive substrate.

[0009] According to the fifth disclosed scheme, the exposure method is an exposure method using the above-described exposure apparatus, comprising: illuminating the mask using the illumination unit; and projecting a pattern image of the mask onto a photosensitive substrate using the projection optics system.

[0010] It should be noted that the structure of the embodiments described below can be appropriately modified, and at least a portion can be replaced by other structures. Furthermore, the constituent elements, whose configuration is not particularly limited, are not limited to the configuration disclosed in the embodiments and can be configured to achieve their functions. Attached Figure Description

[0011] Figure 1 This is a schematic diagram showing the structure of the exposure apparatus according to the first embodiment. Figure 2 This is a schematic diagram showing the structure of the lighting unit in the first embodiment. Figure 3 middle, Figure 3 (A) is a three-dimensional view of the light source unit. Figure 3 (B) is a top view illustrating an array of multiple light sources mounted on a heat sink. Figure 4 middle, Figure 4 (A) is a top view that roughly represents the structure of the light source array. Figure 4 (B) is a diagram that roughly represents the internal structure of the light source unit. Figure 5 middle, Figure 5 (A) is a diagram used to illustrate the shape of the lens array. Figure 5 (B) is a diagram illustrating the configuration of the first lens array, the second lens array, and the third lens array. Figure 6 middle, Figure 6 (A) is the front view of the light source unit. Figure 6 (B) is a side view of the light source unit. Figure 7 middle, Figure 7 (A) is Figure 6 Sectional view of line AA in (A), Figure 7 (B) is Figure 6 (A) BB line section view, Figure 7 (C) is in Figure 7 An enlarged view of PP1, enclosed by a dashed line in (B). Figure 7 (D) is in Figure 7 Enlarged view of PP2, which is surrounded by a dashed line in (B). Figure 8 middle, Figure 8 (A) is Figure 6 (B) CC line section view, Figure 8 (B) is Figure 6 (B) DD line section view, Figure 8 (C) is Figure 6 (B) EE line section view. Figure 9 middle, Figure 9 (A) is a top view of the spacer from the +Z1 side. Figure 9 (B) is Figure 9 Sectional view of line AA in (A), Figure 9 (C) is a top view of the other spacers as seen from the +Z1 side. Figure 9 (D) is Figure 9 AA-line section view of (C). Figure 10 This is a cross-sectional view illustrating the case where the spacer is integrated with the third and fourth wall portions. Figure 11 middle, Figure 11 (A) is a front view illustrating the state in which the first wall portion and the second wall portion are mounted on the mounting plate. Figure 11 (B) is a side view of the light source unit viewed from the +X1 side. Figure 11 (C) is Figure 11 (A) BB line section view. Figure 12 middle, Figure 12 (A) is the front view of the light source unit in Modified Example 1. Figure 12 (B) is a diagram showing the light source unit with the cooling mechanism removed, viewed from the -Y1 side. Figure 13 middle, Figure 13 (A) is the front view of the light source unit in variant example 2. Figure 13 (B) is a diagram showing the light source unit with the cooling mechanism removed, viewed from the +X1 side. Figure 14 middle, Figure 14 (A) is a cross-sectional view of the light source unit in variant example 3. Figure 14 (B) is a cross-sectional view of the light source unit in variant example 4. Figure 15This is a schematic diagram showing the structure of the lighting unit in the second embodiment. Figure 16 This is a schematic diagram showing the structure of the exposure apparatus according to the third embodiment. Detailed Implementation

[0012] Implementation Method 1 based on Figures 1-10 The exposure apparatus 10 of the first embodiment will be described.

[0013] (Structure of the exposure device) Figure 1 This is a diagram that schematically illustrates the structure of the exposure apparatus 10 according to the first embodiment.

[0014] The exposure apparatus 10 uses a scanning stepper (scanner) to transfer a pattern formed on the mask MSK onto the glass substrate (hereinafter referred to as "substrate") P by driving the mask MSK and the glass substrate (hereinafter referred to as "substrate") P in the same direction and at the same speed relative to the projection optical system PL. The substrate P is, for example, a rectangular glass substrate used in a liquid crystal display device (flat panel display), with at least one side length or diagonal length of 500 mm or more.

[0015] Hereinafter, the direction (scanning direction) driving the mask MSK and the substrate P during scanning exposure will be set as the X-axis direction, the direction orthogonal to the X-axis direction in the horizontal plane will be set as the Y-axis direction, the direction orthogonal to both the X-axis and Y-axis will be set as the Z-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis and Z-axis will be set as θx, θy and θz directions respectively.

[0016] The exposure apparatus 10 includes an illumination optics system IOP, a mask stage MST for holding the mask MSK, a projection optics system PL, a main body 70 supporting them, a substrate stage PST for holding the substrate P, and a control system for them. The control system controls all structural parts of the exposure apparatus 10.

[0017] The main body 70 includes a base (vibration damping platform) 71, columns 72A and 72B, an optical platform 73, a support body 74, and a sliding guide 75. The base (vibration damping platform) 71 is mounted on the floor F, damping vibrations from the floor F and supporting columns 72A and 72B. Columns 72A and 72B are each frame-shaped, with column 72A positioned inside column 72B. The optical platform 73 is flat and fixed to the top of column 72A. The support body 74 is supported on the top of column 72B via the sliding guide 75. The sliding guide 75 includes an air ball lifter and a positioning mechanism, positioning the support body 74 (i.e., the mask stage MST described later) relative to the optical platform 73 at an appropriate position in the X-axis direction.

[0018] The illumination optics system IOP is positioned above the main body 70. The illumination optics system IOP illuminates the mask MSK with illumination light IL. The detailed structure of the illumination optics system IOP will be described later.

[0019] The mask stage MST is supported on the support body 74. It has a patterned surface with a loop pattern ( Figure 1 The mask MSK (lower surface of the mask) is fixed to the mask stage MST, for example, by vacuum adsorption (or electrostatic adsorption). The mask stage MST is driven by a drive system including a linear motor in a specified stroke in the scanning direction (X-axis direction) and is slightly driven in the non-scanning directions (Y-axis direction and θz direction).

[0020] An interferometer system is used to measure the position information (including rotation information in the θz direction) of the mask stage MST in the XY plane. The interferometer system illuminates a measuring beam onto a moving mirror (or a mirror-processed reflective surface (not shown)) located at one end of the mask stage MST, and receives the reflected light from the moving mirror, thereby measuring the position of the mask stage MST. The measurement result is supplied to the control unit CNT, which drives the mask stage MST via a drive system based on the measurement results from the interferometer system.

[0021] The projection optical system PL is supported on the optical platform 73 below (on the -Z side) the mask stage MST. The projection optical system PL is configured similarly to, for example, the projection optical system disclosed in U.S. Patent No. 5,729,331, comprising a plurality (e.g., seven) of projection optical units 100 (multi-lens projection optical units) arranged in an alternating pattern to form an image field with the Y-axis as its long side. Here, four projection optical units 100 are arranged at predetermined intervals in the Y-axis direction, and the remaining three projection optical units 100 are separated from the four projection optical units 100 towards the +X side and arranged at predetermined intervals in the Y-axis direction. Each of the plurality of projection optical units 100 may, for example, use a projection optical unit that forms an upright image using a telecentric system. Furthermore, the plurality of projection areas of the alternatingly arranged projection optical units 100 are collectively referred to as the exposure area.

[0022] When the illumination area on the mask MSK is illuminated by the illumination light IL from the illumination optics system IOP, a projected image (partially upright image) of the loop pattern of the mask MSK is formed in the illumination area (exposure area (conjugate with the illumination area)) on the substrate P located on the image plane side of the projection optics system PL using the illumination light IL that has passed through the mask MSK. Here, a photoresist is coated on the surface of the substrate P. By synchronously driving the mask stage MST and the substrate stage PST, that is, by driving the mask MSK in the scanning direction (X-axis direction) relative to the illumination area (illumination light IL) and driving the substrate P in the same scanning direction relative to the exposure area (illumination light IL), the substrate P is exposed and the pattern of the mask MSK is transferred onto the substrate P.

[0023] The substrate stage PST is positioned on a base (vibration damping platform) 71 below (on the -Z side) of the projection optical system PL. The substrate P is held on the substrate stage PST via a substrate holder (not shown).

[0024] An interferometer system measures the position information (including rotation information, including deflection (θz rotation in the θz direction), pitch (θy rotation in the θy direction), and roll (θx rotation in the θx direction)) of the substrate stage PST in the XY plane. The interferometer system projects a measuring beam from the optical platform 73 onto a moving mirror (or a mirror-finished reflective surface (not shown)) located at the end of the substrate stage PST, and receives the reflected light from the moving mirror, thereby measuring the position of the substrate stage PST. The measurement result is supplied to the control device CNT, which drives the substrate stage PST based on the measurement results of the interferometer system.

[0025] In the exposure apparatus 10, alignment measurements (e.g., EGA) are performed before exposure. Using the results, the substrate P is exposed in the following sequence: First, the mask stage MST and substrate stage PST are synchronously driven in the X-axis direction according to the instructions of the control device CNT. This scans and exposes the first exposure area (shot area) on the substrate P. When the scan exposure of the first exposure area is finished, the control device CNT moves the substrate stage PST to the position corresponding to the second exposure area (stepping). Then, the second exposure area is scanned and exposed. The control device CNT similarly repeats the stepping between exposure areas of the substrate P and the scan exposure of the exposure areas, thereby transferring the pattern of the mask MSK to all exposure areas on the substrate P.

[0026] (Structure of the Illumination Optical System (IOP)) Next, the structure of the illumination optical system IOP in this embodiment will be described. The illumination optical system IOP includes multiple illumination units 90, each corresponding to a multiple projection optical unit 100 included in the projection optical system PL.

[0027] Figure 2 This is a diagram that roughly represents the structure of the lighting unit 90. (For example...) Figure 2 As shown, the lighting unit 90 includes a light source unit OPU and an lighting optical system 80.

[0028] (Structure of the light source unit, OPU) Figure 3 (A) is a 3D view of the light source unit (OPU). Figure 3 (B) is a top view illustrating a plurality of light source arrays 20 disposed on a heat sink 21. It should be noted that, in the following description, the two directions in which the plurality of LED packages 23 of each light source array 20 are arranged are designated as the X1 direction and the Y1 direction. The X1 direction is orthogonal to the Y1 direction. Furthermore, the direction orthogonal to both the X1 and Y1 directions is designated as the Z1 direction.

[0029] The light source unit (OPU) includes a heat sink 21, multiple (three in this embodiment) light source arrays 20, multiple (three in this embodiment) magnifying optical systems 30 corresponding to the multiple light source arrays 20, and lens holding members 40 for holding the multiple magnifying optical systems 30. It should be noted that the number of light source arrays 20 included in the light source unit (OPU) is not limited to three, but can be two or more, or even four or more.

[0030] like Figure 3 As shown in (B), the plurality of light source arrays 20 include a first light source array 20a, a second light source array 20b, and a third light source array 20c, respectively disposed in a first region R1, a second region R2, and a third region R3 arranged along the X1 direction on the heat sink 21. It should be noted that, in the following description, unless otherwise specified, the first to third light source arrays 20a to 20c will be referred to as light source array 20.

[0031] The plurality of magnifying optical systems 30 includes a first magnifying optical system 30a, a second magnifying optical system 30b, and a third magnifying optical system 30c, which are respectively arranged to correspond to the first region R1, the second region R2, and the third region R3. It should be noted that, in the following description, unless otherwise specified, the first to third magnifying optical systems 30a to 30c will be referred to as magnifying optical system 30.

[0032] Figure 4(A) is a top view that schematically shows the structure of the light source array 20. The light source array 20, for example, includes multiple light sources arranged in an array on a heat sink 21 (a fixed object). Figure 4 (A) contains 5×5 LED (Light Emitting Diode) packages 23. That is, the light source unit OPU is an LED light source. The number of LED packages 23 can be changed as needed.

[0033] Each of the multiple LED packages 23 has a light-emitting portion 231, and the peak wavelength of the light emitted from the light-emitting portion 231 is, for example, in the range of 360~370nm, 380~390nm, or 400~410nm. That is, the light-emitting portion 231 is an ultraviolet LED (UV LED). The light-emitting surface of the light-emitting portion 231 is square, and the length of one side is L. The LED packages 23 are arranged at a spacing P1. The spacing P1 is the distance between the centers of adjacent LED packages 23. In addition, the LED packages 23 may also be arranged in an array on a substrate fixed to the heat sink 21.

[0034] Figure 4 (B) is a diagram that roughly shows the internal structure of the light source unit OPU. The Z1 direction is approximately parallel to the optical axis OA of the light emitted from the light-emitting part 231.

[0035] like Figure 4 As shown in (B), the magnifying optical system 30 is a magnifying optical system used to form magnified images of the light-emitting parts 231 of each LED package 23 onto a predetermined surface PP.

[0036] The magnifying optical system 30 includes multiple lens arrays 301, 302, 303, and 304 separately arranged in the Z1 direction. Multiple lens sections 31 are formed by the lens elements of each of the multiple lens arrays 301, 302, 303, and 304, arranged in a manner corresponding to the arrangement of the multiple LED packages 23. Each lens section 31 is a biaxially telecentric optical system that magnifies the projection of the light-emitting section 231 at a magnification of at least (the arrangement spacing P1 of the LED packages 23) / (the length L of one side of the light-emitting surface of the light-emitting section 231). It should be noted that in the following description, the multiple lens arrays of the first magnifying optical system 30a may be referred to as the first lens arrays 30a1, 30a2, 30a3, and 30a4; the multiple lens arrays of the second magnifying optical system 30b may be referred to as the second lens arrays 30b1, 30b2, 30b3, and 30b4; and the multiple lens arrays of the third magnifying optical system 30c may be referred to as the third lens arrays 30c1, 30c2, 30c3, and 30c4.

[0037] It should be noted that in this embodiment, each magnifying optical system 30 includes lens arrays 301 to 304 with plano-convex lenses as lens elements, but is not limited to this. For example, the magnifying optical system 30 may include two lens arrays with biconvex lenses as lens elements, or it may include three lens arrays with biconvex lenses as lens elements. In addition, the magnifying optical system 30 may also include lens arrays with plano-convex lenses as lens elements and lens arrays with biconvex lenses as lens elements.

[0038] If the first to third magnifying optical systems 30a to 30c, which are respectively arranged corresponding to the first to third light source arrays 20a to 20c, experience positional shifts, there is a possibility that the desired optical characteristics will not be obtained. In this embodiment, the positional shifts of the first to third magnifying optical systems 30a to 30c are suppressed by the shape and arrangement of the lens arrays 301 to 304 and the structure of the lens holding member 40 that holds the lens arrays 301 to 304. The shape and arrangement of the lens arrays 301 to 304 and the structure of the lens holding member 40 will be described below.

[0039] First, refer to Figure 5 (A) The shapes of lens arrays 301 to 304 will be described. In this embodiment, lens arrays 301 to 304 have the same external shape, so lens array 301 will be described.

[0040] like Figure 5 As shown in (A), the lens array 301 has a generally rectangular shape, and the two first side surfaces 32 parallel to the Y1 direction each have a protrusion 32a protruding in the X1 direction. The surface of the protrusion 32a parallel to the Y1 direction has high flatness. The two second side surfaces 33 parallel to the X1 direction do not have protrusions.

[0041] Next, refer to Figure 5 (B) describes the configuration of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4.

[0042] The configurations of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 are the same, therefore the first to third lens arrays 30a1 to 30c1 will be described.

[0043] like Figure 5As shown in (B), the first lens array 30a1, the second lens array 30b1, and the third lens array 30c1 are arranged in the X1 direction in a manner corresponding to the first region R1, the second region R2, and the third region R3, respectively. The first side surface 32 of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 at the protrusion 32a, but does not contact it at other parts. The first side surface 32 of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 at the protrusion 32a, but does not contact it at other parts.

[0044] Next, the structure of the lens holding member 40 that holds the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 in this configuration will be described.

[0045] (Structure of lens holder 40) Figure 6 (A) is the front view of the light source unit OPU. Figure 6 (B) is a side view of the light source unit (OPU). Additionally, Figure 7 (A) is Figure 6 Sectional view of line AA in (A), Figure 7 (B) is Figure 6 (A) BB line section view, Figure 7 (C) is Figure 7 An enlarged view of PP1, enclosed by a dashed line in (B). Figure 7 (D) is Figure 7 An enlarged view of PP2, the portion enclosed by the dashed line in (B). Additionally, Figure 8 (A) is Figure 6 (B) CC line section view, Figure 8 (B) is Figure 6 (B) DD line section view, Figure 8 (C) is Figure 6 (B) EE line section view.

[0046] The lens holder 40 includes a first wall portion 41, a second wall portion 42, a third wall portion 43, and a fourth wall portion 44.

[0047] The first wall portion 41 defines the positions of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 in the X1 direction. The first wall portion 41 has a protrusion 411 that protrudes in the X1 direction and contacts the protrusion 32a of the first side surface 32 of the third lens arrays 30c1 to 30c4.

[0048] The second wall portion 42 is opposite to the first wall portion 41 in the X1 direction. Multiple first force-applying members 45 (see reference) are installed on the second wall portion 42, which apply force to the first to third lens arrays 30a1~30c1, 30a2~30c2, 30a3~30c3, and 30a4~30c4 respectively towards the first wall portion 41. Figure 7 (B) and Figure 7 (C)). The first force-applying member 45 is, for example, a leaf spring, but is not limited thereto.

[0049] like Figure 8 As shown in (A), the first side surface 32 of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 at the protrusion 32a, but not at other parts. The first side surface 32 of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 at the protrusion 32a, but not at other parts. The surface of the protrusion 32a parallel to the Y1 direction has high flatness. By applying force to the first to third lens arrays 30a1 to 30c1 toward the first wall portion 41 using the first force-applying member 45, the third lens array 30c1 is pushed against the protrusion 411 of the first wall portion 41, the second lens array 30b1 is pushed against the third lens array 30c1, and the first lens array 30a1 is pushed against the second lens array 30b1. Therefore, the protrusions 32a of the first lens array 30a1, the second lens array 30b1, and the third lens array 30c1 are in close contact with each other, thus suppressing the positional shift of the first to third lens arrays 30a1 to 30c1 in the X1 direction. Furthermore, although the first lens array 30a1, the second lens array 30b1, and the third lens array 30c1 have been described, the same applies to the first to third lens arrays 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4.

[0050] The third wall portion 43 defines the positions of the first lens arrays 30a1-30a4, the second lens arrays 30b1-30b4, and the third lens arrays 30c1-30c4 in the Y1 direction. The third wall portion 43 has a protrusion 431 that protrudes in the Y1 direction and contacts the second side surface 33 of the first lens arrays 30a1-30a4, the second lens arrays 30b1-30b4, and the third lens arrays 30c1-30c4.

[0051] The fourth wall portion 44 is opposite to the third wall portion 43 in the Y1 direction. In this embodiment, the fourth wall portion 44 includes a fourth wall portion 44a corresponding to the first lens arrays 30a1-30a4, a fourth wall portion 44b corresponding to the second lens arrays 30b1-30b4, and a fourth wall portion 44c corresponding to the third lens arrays 30c1-30c4. It should be noted that in this embodiment, the fourth wall portion 44 is divided into fourth wall portions 44a-44c, but it can also be a single unit. In addition, unless there is a need for special distinction, there may be cases where the fourth wall portions 44a-44c are referred to as the fourth wall portion 44.

[0052] A second force-applying member 46 is installed on the fourth wall portion 44a-44c to apply force to the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4 respectively toward the third wall portion 43. The second force-applying member 46 is, for example, a leaf spring, but is not limited thereto.

[0053] By applying force toward the third wall portion 43 using the second force-applying member 46, the second side surfaces 33 of the first lens arrays 30a1~30a4, the second side surfaces 33 of the second lens arrays 30b1~30b4, and the second side surfaces 33 of the third lens arrays 30c1~30c4 are pressed against the protrusions 431 of the third wall portion 43, thereby suppressing the positional shift of the first lens arrays 30a1~30a4, the second lens arrays 30b1~30b4, and the third lens arrays 30c1~30c4 in the Y1 direction. Furthermore, since the second side surface 33 of the first lens array 30a1~30a4, the second side surface 33 of the second lens array 30b1~30b4, and the second side surface 33 of the third lens array 30c1~30c4 are in contact with the protrusion 431 of the third wall portion 43, compared to the case where the entire side surface of the third wall portion 43 is in contact, the first lens array 30a1~30a4, the second lens array 30b1~30b4, and the third lens array 30c1~30c4 can be positioned with high precision in the Y1 direction.

[0054] Additionally, third force-applying members 47 are installed on the fourth wall portions 44a-44c to apply force to the first lens arrays 30a1-30a4, the second lens arrays 30b1-30b4, and the third lens arrays 30c1-30c4 respectively toward the heat sink 21. Furthermore, a third force-applying member 47 is also installed on the third wall portion 43 to apply force to the first lens arrays 30a1-30a4, the second lens arrays 30b1-30b4, and the third lens arrays 30c1-30c4 respectively toward the heat sink 21. The third force-applying member 47 is, for example, a leaf spring, but is not limited to this.

[0055] like Figure 7 (A) and Figure 7As shown in (B), for example, a spacer SP1 is disposed between the heat sink 21 and the first lens array 30a1, a spacer SP2 is disposed between the first lens array 30a1 and the first lens array 30a2, a spacer SP3 is disposed between the first lens array 30a2 and the first lens array 30a3, and a spacer SP4 is disposed between the first lens array 30a3 and the first lens array 30a4.

[0056] Because the third force-applying member 47 applies force to the first lens arrays 30a1~30a4 and the spacers SP1~SP4 toward the heat sink 21, the first lens arrays 30a1~30a4 and the spacers SP1~SP4 are in close contact in the Z1 direction, thereby suppressing the positional displacement of the first lens arrays 30a1~30a4 in the Z1 direction. The same applies to the second lens arrays 30b1~30b4 and the third lens arrays 30c1~30c4.

[0057] The spacer will be explained next. Figure 9 (A) is a top view of spacer SP1 viewed from the +Z1 side. Figure 9 (B) is Figure 9 A sectional view along line AA of (A). Additionally... Figure 9 (C) is a top view of spacer SP2 viewed from the +Z1 side. Figure 9 (D) is Figure 9 AA-line section view of (C).

[0058] like Figure 9 As shown in (A), in this embodiment, the spacer SP1 has an opening OP1 at a position corresponding to the first region R1 to the third region R3. Figure 9 As shown in (B), the spacer SP1 has a base material 200 and a functional layer 201 formed on the base material 200. In this embodiment, the functional layer 201 is a black chromium layer. That is, a black chromium layer is formed on the inner peripheral surface of the opening OP1 of the spacer SP1, which can absorb unwanted light and suppress stray light.

[0059] like Figure 9 As shown in (C), spacer SP2 has a frame shape. Spacer SP2 has a base material 202 and a functional layer 203 formed on the base material 202. In this embodiment, the functional layer 203 is a black chromium layer. That is, a black chromium layer is formed on the inner peripheral surface of spacer SP2, which can absorb unwanted light and suppress stray light. Furthermore, spacers SP3 and SP4 also have the same structure as spacer SP2.

[0060] During the use of the light source unit OPU, the temperature of the spacers SP1 to SP4 rises due to the irradiation heat from the LED package 23. Depending on the heat resistance of the lens array held by the spacers SP1 to SP4, there is a concern that the lens array 301 to 304 may break due to the illumination of the LED package 23, and that the thermal expansion of the spacers SP1 to SP4 may cause interference between components within the lens holder, reducing the force-applying effect of the force-applying components. In such cases, functional layers 201 and 203 can be configured as reflective layers with a reflectivity higher than that of black chrome. With this configuration, the temperature rise of the spacers SP1 to SP4 is suppressed compared to the case where the base materials 200 and 202 are covered with black chrome. Therefore, damage to the lens array 301 to 304 can be prevented.

[0061] Furthermore, when reflective layers are formed as functional layers 201 and 203, they only need to have a reflectivity that is at least higher than that of the base materials 200 and 202, respectively. Therefore, compared to directly using the base materials 200 and 202, the temperature rise of the spacers SP1 to SP4 can be suppressed. This, in turn, can suppress the breakage of the lens arrays 301 to 304.

[0062] Furthermore, this embodiment describes an example where functional layers 201 and 203 are provided on the base materials 200 and 202, but functional layers 201 and 203 may not be provided. Additionally, the spacers SP1 to SP4 can be made of glass. In this case, since the temperature rise of the spacers SP1 to SP4 is suppressed, damage to the lens arrays 301 to 304 can be suppressed.

[0063] Furthermore, the shape of the spacer SP1 is not limited to this embodiment; for example, it may have a frame shape like the spacer SP2. Additionally, one or more force-applying members may be provided on the second wall portion 42 to apply force to any one or more of the spacers SP2 to SP4 toward the first wall portion 41. This force-applying member may be, for example, a leaf spring. The leaf spring may have a... Figure 8 The first force-applying member 45 shown in (A) has the same shape and can also be installed with a convex shape facing the -X direction.

[0064] (Structure of the illumination optical system 80) Refer again Figure 2 The structure of the illumination optical system 80 will be described below. The illumination optical system 80 includes an imaging optical system 81, a compound eye lens FEL, an aperture stop 85, a condenser optical system 86, and an illuminance correction filter 87.

[0065] The imaging optical system 81 is a bilaterally telecentric optical system that projects the image of the light source unit OPU (multiple light source arrays 20) onto the incident end of the compound eye lens FEL at an equal magnification.

[0066] A compound eye lens (FEL) is constructed, for example, by arranging multiple lens elements with positive optical power in a longitudinal and dense manner with their optical axes parallel to the reference optical axis AX. Each lens element constituting the compound eye lens (FEL) has a rectangular cross-section similar to the shape of the illumination field to be formed on the mask MSK (and consequently the shape of the exposure area to be formed on the substrate P).

[0067] Therefore, the light beam incident on the compound eye lens FEL is split by the wavefront through multiple lens elements, forming a light source image at or near the rear focal plane (emission surface) of each lens element. That is, a substantial surface light source, i.e., a secondary light source, composed of multiple light source images, is formed at or near the rear focal plane (emission surface) of the compound eye lens FEL. The light beam from the secondary light source formed at or near the rear focal plane (emission surface) of the compound eye lens FEL is incident on the aperture stop 85 disposed nearby. Furthermore, in this embodiment, the rear focal plane (emission surface) of the compound eye lens FEL is optically conjugate to the light source array 20.

[0068] The aperture stop 85 is positioned approximately conjugate optically to the entrance pupil plane of the projection optical system PL, and has a variable opening portion for defining a range that facilitates illumination of the secondary light source. Furthermore, by varying the opening diameter of the variable opening portion, the aperture stop 85 sets the σ value (the ratio of the aperture of the secondary light source image on the pupil plane of the projection optical system to the opening diameter of the pupil plane) that determines the illumination conditions to a desired value. Light from the secondary light source passing through the aperture stop 85 is focused by the condenser optical system 86, and its illuminance is corrected by the illuminance correction filter 87, thereby illuminating the mask MSK, on ​​which a predetermined pattern is formed, in an overlapping manner.

[0069] Furthermore, the wavelength of the light emitted by the light source unit OPU is not limited to the wavelengths mentioned above. Alternatively, LED packages that emit light with peak wavelengths in the range of 360~440nm can be appropriately combined to form the light source unit OPU.

[0070] As described in the detailed description above, according to this embodiment, the light source unit OPU includes: a heat sink 21; a first light source array 20a to a third light source array 20c, which are respectively disposed on the heat sink 21 in the first region R1 to the third region R3 arranged in the X1 direction and include a plurality of LED packages 23; a first lens array 30a1 to 30a4 to a third lens array 30c1 to 30c4 respectively, which are respectively configured to correspond to the first region R1 to the third region R3; and a lens holding member 40 for holding the first lens array 30a1 to 30a4 to the third lens array 30c1 to 30c4. The first side surface 32 of each of the first lens arrays 30a1-30a4 to the third lens arrays 30c1-30c4 has a protrusion 32a protruding in the X1 direction. The first side surface 32 of the first lens arrays 30a1-30a4 and the first side surface 32 of the second lens arrays 30b1-30b4 respectively contact each other in the X1 direction at the protrusion 32a, but do not contact each other at other parts. The lens holding member 40 includes: a first wall portion 41 that defines the position of the first lens arrays 30a1-30a4 to the third lens arrays 30c1-30c4 in the X1 direction; and a first force-applying member 45 that applies force to the first wall portion 41 towards the first lens arrays 30a1-30a4 to the third lens arrays 30c1-30c4. Therefore, the protrusions 32a of the first wall portion 41, the first lens array 30a1~30a4, the second lens array 30b1~30b4, and the third lens array 30c1~30c4 are in close contact with each other, thus suppressing the positional shift of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 in the X1 direction.

[0071] Furthermore, in this embodiment, the lens holding member 40 includes: a third wall portion 43 that defines the positions of the first lens arrays 30a1~30a4 to the third lens arrays 30c1~30c4 in the Y1 direction, wherein the Y1 direction is orthogonal to the X1 direction in a plane parallel to the surface on which the plurality of LED packages 23 are arranged; and a second force-applying member 46 that applies force to the first lens arrays 30a1~30a4 to the third lens arrays 30c1~30c4 toward the third wall portion 43. This suppresses positional shifts of the first lens arrays 30a1~30a4, the second lens arrays 30b1~30b4, and the third lens arrays 30c1~30c4 in the Y1 direction.

[0072] Furthermore, in this embodiment, the third wall portion 43 has a protrusion 431 that protrudes in the Y1 direction and contacts the second side surface 33 of the first lens array 30a1~30a4 to the third lens array 30c1~30c4. Therefore, compared to the case where the entire side surface of the third wall portion 43 contacts the second side surface 33 of the first lens array 30a1~30a4 to the third lens array 30c1~30c4, the first lens array 30a1~30a4 to the third lens array 30c1~30c4 can be positioned with high precision in the Y1 direction.

[0073] Furthermore, in this embodiment, the lens holding member 40 includes a third force-applying member 47 that applies force to the first lens array 30a1~30a4 to the third lens array 30c1~30c4 toward the heat sink 21. This suppresses positional shift of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 in the Z1 direction.

[0074] Furthermore, in this embodiment, spacers SP2 to SP4 are provided between the plurality of first lens arrays 30a1 to 30a4 to separate the plurality of first lens arrays 30a1 to 30a4 from each other; spacers SP2 to SP4 are provided between the plurality of second lens arrays 30b1 to 30b4 to separate the plurality of second lens arrays 30b1 to 30b4 from each other; and spacers SP2 to SP4 are provided between the plurality of third lens arrays 30c1 to 30c4 to separate the plurality of third lens arrays 30c1 to 30c4 from each other. This allows the magnified image of the light-emitting portion 231 of each LED package 23 to be formed on a predetermined surface PP.

[0075] Furthermore, in this embodiment, each of the spacers SP2 to SP4 has a base material 202 and a functional layer 203 formed on the base material 202. When the functional layer 203 is a black chromium layer, stray light can be suppressed. In addition, when the functional layer 203 is a reflective layer with a reflectivity higher than that of black chromium, the temperature rise of the spacers SP2 to SP4 can be suppressed compared to when the base material 202 is covered with black chromium. Therefore, heat-induced damage to the lens arrays 301 to 304 can be suppressed, and interference between components in the lens holder due to thermal expansion of the spacers can also be suppressed.

[0076] Furthermore, in the first embodiment described above, each of the first lens arrays 30a1-30a4 to the third lens arrays 30c1-30c4 has two first side surfaces 32 each having a protrusion 32a protruding in the X1 direction. However, it is also possible that either of the two first side surfaces 32 has a protrusion 32a. In this case, for example, the protrusion 32a of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 that does not have a protrusion 32a, and the protrusion 32a of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 that does not have a protrusion 32a. Alternatively, neither of the two first side surfaces 32 of the first lens arrays 30a1-30a4 to the third lens arrays 30c1-30c4 may have a protrusion 32a. That is, the first side surface 32 may also be flat. Even under such circumstances, the positional displacement of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 in the X1 direction can be suppressed by applying force to the first lens array 30a1~30a4 to the third lens array 30c1~30c4 toward the first wall portion 41 using the first force-applying member 45.

[0077] Alternatively, in the first embodiment described above, the spacer SP1 may be integrated with the third wall portion 43 and the fourth wall portion 44. Figure 10 This is a cross-sectional view illustrating the integration of spacer SP1 with the third wall portion 43 and the fourth wall portion 44. Figure 10 cross section and Figure 7 The AA line section of (A) corresponds to this. For example... Figure 10 As shown, by integrating the spacer SP1 with the third wall portion 43 and integrating the spacer SP1 with the fourth wall portion 44, the number of parts can be reduced.

[0078] In addition, in the first embodiment described above, the first wall portion 41 and the second wall portion 42 are mounted on the radiator 21, but the first wall portion 41 and the second wall portion 42 may also be mounted on the mounting plate. Figure 11 (A) is a front view of the light source unit OPU viewed from the +Z1 side with the first wall portion 41 and the second wall portion 42 mounted on the mounting plate 400. Figure 11 (B) is a side view of the light source unit OPU viewed from the +X1 side. Figure 11 (C) is Figure 11 (B) BB line section view.

[0079] like Figure 11As shown in (C), the first wall portion 41 and the second wall portion 42 respectively have notches 415 and 425 for inserting the radiator 21. This allows the radiator 21 to be sandwiched between the mounting plate 400 and the first wall portion 41 and the second wall portion 42. By mounting the first wall portion 41 and the second wall portion 42 onto the mounting plate 400, the radiator 21 can be fixed to the mounting plate 400. This reduces the number of parts compared to fixing the radiator 21 to the mounting plate 400 without using the first wall portion 41 and the second wall portion 42; however, the radiator 21 can also be fixed to the mounting plate 400 by screws. Furthermore, if the width of the radiator 21 in the X1 direction is short, the notches in the first wall portion 41 and the second wall portion 42 can be omitted, and the radiator 21 can be directly fixed to the mounting plate 400. In this case, the radiator 21 can also be fixed to the mounting plate 400 by screws.

[0080] (Variation Example 1) Figure 12 (A) is a front view of the light source unit OPU-A of Modified Example 1 as viewed from the +Z1 side.

[0081] The light source unit OPU-A in Modified Example 1 differs from the light source unit OPU in that it includes a cooling mechanism 300A. The cooling mechanism 300A has a gas inlet 310. Gas flowing in from the inlet 310 is discharged from an outlet (not shown) located on the opposite side of the inlet 310 in the Y1 direction. Furthermore, in Figure 12 In (A), there are three inlets 310, but the number of inlets 310 can be less than two or more than four.

[0082] Figure 12 (B) is a view from the -Y1 side showing the light source unit OPU-A with the cooling mechanism 300A removed. In Modified Example 1, the third wall portion 43A of the lens holder 40A has an opening 432 through which gas discharged from the outlet of the cooling mechanism 300A passes. Additionally, although not shown, the fourth wall portion 44A of the lens holder 40A also has an opening through which gas passes.

[0083] Furthermore, in Modified Example 1, the spacers SP2A, SP3A, and SP4A have openings OP2 through which gas discharged from the outlet of the cooling mechanism 300A passes. The openings OP2 are provided on at least two surfaces intersecting the Y1 direction.

[0084] Therefore, as Figure 12 In (A), as indicated by arrow A1, gas flows between the first lens array 30a1~30a4, the second lens array 30b1~30b4, and the third lens array 30c1~30c4.

[0085] During the use of the light source unit OPU-A, the temperature of the spacers SP1, SP2A, SP3A, and SP4A rises due to the irradiation heat from the LED package 23. Therefore, depending on the heat resistance of the lenses held by the spacers SP1, SP2A, SP3A, and SP4A, there is a concern that the lens arrays 301-304 may break when the LED package 23 is lit. By circulating gas between the lens arrays 301-304, the spacers SP1-SP4 and the lens arrays 301-304 are cooled, suppressing the temperature rise. This prevents breakage of the lens arrays 301-304 and also suppresses interference between components within the lens holders caused by the thermal expansion of the spacers. Furthermore, a cooling mechanism 300A can be provided on the fourth wall portion 44A side.

[0086] (Variation Example 2) Figure 13 (A) is a front view of the light source unit OPU-B of Modified Example 2 as viewed from the +Z1 side.

[0087] The light source unit OPU-B in Modified Example 2 differs from the light source unit OPU in that it has a cooling mechanism 300B. The cooling mechanism 300B has a gas inlet 310. Gas flowing in from the inlet 310 is discharged from an outlet located on the opposite side of the inlet 310 in the X1 direction.

[0088] Figure 13 (B) is a view from the +X1 side showing the light source unit OPU-B with the cooling mechanism 300B removed. In Modified Example 2, the first wall portion 41B of the lens holder 40B has an opening 412 through which gas discharged from the outlet of the cooling mechanism 300B passes. Additionally, although not shown, the second wall portion 42B of the lens holder 40B also has an opening for gas passage.

[0089] Furthermore, in Modified Example 2, the spacers SP2B, SP3B, and SP4B have openings OP3 through which gas discharged from the outlet of the cooling mechanism 300B passes. The openings OP3 are provided on at least two surfaces intersecting the X1 direction.

[0090] Thus, as indicated by arrow A2, gas flows between the first lens array 30a1~30a4, the second lens array 30b1~30b4, and the third lens array 30c1~30c4.

[0091] During the use of the light source unit OPU-B, the temperatures of spacers SP1, SP2B, SP3B, and SP4B rise due to the irradiation heat from the LED package 23. Given the heat resistance of the lenses held by spacers SP1-SP4, there is a concern that the lens arrays 301-304 may break when the LED package 23 is lit. By circulating gas between the lens arrays 301-304, the spacers SP1, SP2B, SP3B, SP4B, and lens arrays 301-304 are cooled, suppressing the temperature rise. This prevents breakage of the lens arrays 301-304 and also suppresses interference between components within the lens holders caused by the thermal expansion of the spacers.

[0092] (Variation Example 3) Figure 14 (A) is a cross-sectional view of the light source unit OPU-C of variant example 3. Figure 14 The cross section of (A) and Figure 6 The cross section of line AA of (A) is equivalent.

[0093] In Modification 3, the third wall portion 43C and the fourth wall portion 44C respectively have flow paths 433 and 442 for refrigerant flow. Flow paths 433 and 442 can be optimized to match the structure of the third wall portion 43C and the fourth wall portion 44C.

[0094] During the use of the light source unit OPU-B, the temperature of the spacers SP1 to SP4 rises due to the irradiation heat from the LED package 23. Given the heat resistance of the lenses held by the spacers SP1 to SP4, there is a concern that the lens arrays 301 to 304 may break when the LED package 23 is lit. By circulating refrigerant inside the third wall portion 43C and the fourth wall portion 44C, the spacers SP1 to SP4 and the lens arrays 301 to 304 are cooled, suppressing the temperature rise. This prevents breakage of the lens arrays 301 to 304 and also suppresses interference between components within the lens holder caused by the thermal expansion of the spacers.

[0095] (Variation Example 4) Figure 14 (B) is a cross-sectional view of the light source unit OPU-D in variant example 4. Figure 14 The cross section of (A) and Figure 6 The cross section of line AA of (A) is equivalent.

[0096] In Modification 4, the third wall portion 43D and the fourth wall portion 44D respectively have flow paths 434 and 443 for refrigerant flow. Flow paths 434 and 443 are connected to the flow path 211 of the radiator 21. Flow paths 434 and 443 can be optimized to match the structure of the third wall portion 43D, the fourth wall portion 44D, and the radiator 21.

[0097] By connecting the flow paths 434 and 443 of the third wall portion 43D and the fourth wall portion 44D to the flow path 211 of the radiator 21, the refrigerant of the radiator 21 can be used to cool the spacers SP1 to SP4 and the lens arrays 301 to 304. Therefore, there is no need to separately provide a mechanism for allowing the refrigerant to flow in the flow paths of the third wall portion 43D and the fourth wall portion 44D, thus simplifying the structure.

[0098] Furthermore, variations 1 to 4 can be appropriately combined. For example, the light source unit may also include a cooling mechanism 300A and a cooling mechanism 300B. Additionally, for example, the light source unit may also include a cooling mechanism 300A, and have a third wall portion 43C having a flow path 433 for refrigerant flow and a fourth wall portion 44C having a flow path 442 for refrigerant flow.

[0099] Implementation Method 2 The illumination unit of the light source unit applicable to the first embodiment and its variations is not limited to the illumination unit 90 of the first embodiment described above. Figure 15 This is a schematic diagram showing the structure of the lighting unit 90A in the second embodiment.

[0100] The illumination unit 90A includes a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80A. The first light source unit OPU1 includes a light source array 20A and a magnifying optical system 30A, and the second light source unit OPU2 includes a light source array 20B and a magnifying optical system 30B. The structures of the light source arrays 20A and 20B are the same as those of the light source array 20 described above, so detailed descriptions are omitted. Similarly, the structures of the magnifying optical systems 30A and 30B are the same as those of the magnifying optical system 30 described above, so detailed descriptions are omitted. The plurality of lens arrays in the magnifying optical system 30A and the plurality of lens arrays in the magnifying optical system 30B are held in a lens holding member of the first embodiment and its variations.

[0101] The illumination optical system 80A includes a first condenser optical system 83A comprising a first dichroic mirror DM1, a second condenser optical system 83B, a second dichroic mirror DM2, an imaging optical system 81A, a compound eye lens FEL, an aperture stop 85, a condenser optical system 86, and an illuminance correction filter 87.

[0102] The first condensing optical system 83A forms the pupil of the magnified image of the light-emitting part 231 formed by the magnifying optical system 30A. That is, the rear focal position of the first condensing optical system 83A becomes the position of the pupil. The first condensing optical system 83A has a first dichroic mirror DM1 midway through the optical path, reflecting at least a portion of the light with a peak wavelength of 385nm. Thus, the light beam is incident on the second dichroic mirror DM2. Alternatively, the first condensing optical system 83A can be configured without the first dichroic mirror DM1. In this case, the configuration of the first light source unit OPU1 and the configuration of each lens in the first condensing optical system 83A can be appropriately adjusted to ensure that the light beam is incident on the second dichroic mirror DM2. Furthermore, the first condensing optical system 83A can be composed of a single lens or a lens group containing multiple lenses.

[0103] The second condensing optical system 83B forms the pupil of the magnified image of the light-emitting part 231 formed by the magnifying optical system 30B. That is, the position of the rear focal point of the second condensing optical system 83B becomes the position of the pupil. The second condensing optical system 83B can be composed of a single lens or a lens group containing multiple lenses.

[0104] The second dichroic mirror DM2 transmits at least a portion of light with a peak wavelength of 385 nm and reflects at least a portion of light with a peak wavelength of 365 nm. This forms a composite image that overlaps the pupil image formed by the first focusing optical system 83A and the pupil image formed by the second focusing optical system 83B.

[0105] The imaging optical system 81A is a bilaterally telecentric optical system that projects the composite image synthesized by the second dichroic mirror DM2 onto the incident end of the compound eye lens FEL at an equal magnification. Furthermore, the imaging optical system 81A can also reduce the size of the composite image synthesized by the second dichroic mirror DM2 and project it onto the incident end of the compound eye lens FEL.

[0106] The other structures are the same as those described in the above embodiments, so detailed descriptions are omitted. Thus, in an exposure apparatus having multiple light source units, the light source units of the first embodiment and its variations can be applied.

[0107] Third Implementation Method Figure 16 This is a schematic diagram showing the structure of the exposure apparatus 10B according to the third embodiment.

[0108] In the exposure apparatus 10B, the illumination unit 90B includes a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80B. The first light source unit OPU1 and the second light source unit OPU2 are the same as in the second embodiment, so detailed descriptions are omitted.

[0109] The illumination optical system 80B includes a first condenser optical system 83A1, a second condenser optical system 83B1, a third dichroic mirror DM3, an imaging optical system 81B, a compound eye lens FEL, an aperture stop 85, a condenser optical system 86B, and an illuminance correction filter 87.

[0110] The first condensing optical system 83A1 is disposed on or near the aforementioned specified surface PP, forming a pupil of the magnified image of the light-emitting portion 231 formed by the magnifying optical system 30A. The first condensing optical system 83A1 may be composed of a single lens or a lens group comprising multiple lenses.

[0111] The second focusing optical system 83B1 is disposed on or near the aforementioned specified surface PP, forming a pupil of the magnified image of the light-emitting portion 231 formed by the magnifying optical system 30B. The second focusing optical system 83B1 may be composed of a single lens or a lens group comprising multiple lenses.

[0112] The third dichroic mirror DM3 transmits at least a portion of light with a peak wavelength of 385 nm and reflects at least a portion of light with a peak wavelength of 365 nm. This forms a composite image that overlaps the pupil image formed by the first focusing optical system 83A1 and the pupil image formed by the second focusing optical system 83B1.

[0113] The imaging optical system 81B is a bilaterally telecentric optical system that projects the composite image synthesized by the third dichroic mirror DM3 onto the incident end of the compound eye lens FEL at an equal magnification. Furthermore, the imaging optical system 81B can also reduce the size of the composite image synthesized by the third dichroic mirror DM3 and project it onto the incident end of the compound eye lens FEL.

[0114] The light beam incident on the compound eye lens FEL is split by the wavefront through multiple lens elements, forming a light source image at or near the rear focal plane of each lens element. The light beam from the secondary light source formed at or near the rear focal plane of the compound eye lens FEL is incident on the aperture stop 85 disposed nearby.

[0115] Light from a secondary light source that has passed through aperture stop 85 is focused by condenser optical system 86B and its illuminance is corrected by illuminance correction filter 87, thereby illuminating the mask MSK with a specified pattern.

[0116] In the exposure apparatus 10B, the projection optical system PL is an Offner-type optical system supported on the optical platform 73 below (on the -Z side) the mask stage MST. The projection optical system PL forms, for example, an image field in the shape of an arc with the Y-axis as its long side.

[0117] When the illumination area on the mask MSK is illuminated by illumination light IL from the illumination optics system IOP, the illumination light IL transmitted through the mask MSK is used to project a partial upright image (the loop pattern of the mask MSK) onto the plate material P, which is located on the image plane side of the projection optics system PL, through the illumination area (exposure area (conjugate with the illumination area)) of the plate material P. Thus, the plate material P is exposed, and the pattern of the mask MSK is transferred onto the plate material P.

[0118] As shown in the third embodiment, in the exposure apparatus 10B equipped with an Ovner-type projection optical system PL, the light source unit of any of the first embodiment and its variations can be used.

[0119] Furthermore, the wavelengths of the light emitted by the first light source unit OPU1 and the second light source unit OPU2 are not limited to the wavelengths mentioned above. Alternatively, LED packages that emit light with peak wavelengths in the range of 360~440nm can be appropriately combined to form the first light source unit OPU1 and the second light source unit OPU2.

[0120] For example, the peak wavelength of the light emitted from the light-emitting portion 231 of the LED package 23 can also be in the range of 400 to 410 nm. For example, it can be configured such that the first light source unit OPU1 emits light with a peak wavelength of 405 nm, and the second light source unit OPU2 emits light with a peak wavelength of 365 nm. Alternatively, it can be configured such that the first light source unit OPU1 emits light with a peak wavelength of 395 nm, and the second light source unit OPU2 emits light with a peak wavelength of 385 nm. The combination of the wavelengths of the light emitted from the first light source unit OPU1 and the second light source unit OPU2 is not limited to these examples. Furthermore, when the combination of the wavelengths of the light emitted from the first light source unit OPU1 and the second light source unit OPU2 is set to a combination other than that in this embodiment, it is preferable to appropriately change the material of the dichroic mirror according to the wavelength used.

[0121] In the above embodiments and their variations, the exposure apparatus was described as being used in the manufacture of liquid crystal display devices (flat panel displays), but the exposure apparatus can also be used to expose silicon wafers to manufacture semiconductors.

[0122] The above-described embodiments are suitable examples of the present invention. However, they are not limited thereto, and various modifications can be made without departing from the spirit of the present invention. Explanation of reference numerals in the attached figures

[0123] 10, 10B Exposure Device 20, 20A, 20B Light Source Array 20a~20c Array of Light Sources 1 to 3 21 Radiator 23 LED Packaging Lens arrays 301-304 30a1~30a4 First Lens Array 30b1~30b4 Second Lens Array 32 First side view 32a Protrusion 40 Lens retainer 41 First wall section 42 Second wall section 43 Third wall section 44 Fourth wall section 45 First force-applying component 46 Second force-applying component 47 Third force-applying component 80, 80A, 80B Illumination Optical Systems Lighting units 90, 90A, and 90B 100 projection optical units 211 flow path 300A and 300B cooling mechanisms 433, 434, 442, 443 flow path DM2 Second Dichroic Mirror DM3 Third Dichroic Mirror MSK mask OPU, OPU-A, OPU-B, OPU-C, OPU-D light source unit OPU1 First Light Source Unit OPU2 Second Light Source Unit PL projection optical system P glass substrate R1~R3 ​​Region 1 to Region 3.

Claims

1. A light source unit, comprising: Fixed object; A first light source array and a second light source array, each containing multiple light source elements, are respectively disposed on the fixed object in a first region and a second region arranged along a first direction; A first lens array is arranged in a manner corresponding to the first region; A second lens array is arranged in a manner corresponding to the second region; as well as Lens holders that hold the first lens array and the second lens array, The first side surface of the first lens array contacts the first side surface of the second lens array in the first direction. The lens holder includes a first wall portion and a first force-applying member. The first wall portion defines the positions of the first lens array and the second lens array in the first direction. The first force-applying member applies force to the first lens array and the second lens array toward the first wall portion.

2. The light source unit according to claim 1, wherein, At least one of the first side surface of the first lens array and the first side surface of the second lens array has a protrusion protruding in the first direction.

3. The light source unit according to claim 1, wherein, The first side surface of the first lens array and the first side surface of the second lens array each have a protrusion protruding in the first direction. The first side surface of the first lens array contacts the first side surface of the second lens array at the protrusion, but does not contact each other at other parts.

4. The light source unit according to any one of claims 1 to 3, wherein, The lens holder includes a second wall portion and a second force-applying member. The second wall portion defines the positions of the first lens array and the second lens array in a second direction, wherein the second direction is orthogonal to the first direction in a plane parallel to the plane in which the plurality of light source elements are arranged. The second force-applying member applies force to the first lens array and the second lens array toward the second wall portion.

5. The light source unit according to claim 4, wherein, The second wall portion has a protrusion that protrudes in the second direction and contacts the second side surface of the first lens array and the second side surface of the second lens array.

6. The light source unit according to claim 4 or 5, wherein, The lens holder includes a third wall portion that is positioned in the second direction, separated from the first lens array and the second lens array, and opposite to the second wall portion. At least one of the second and third wall portions has an internal flow path for refrigerant flow.

7. The light source unit according to any one of claims 1 to 6, wherein, The fixed object is a heat sink.

8. The light source unit according to claim 6, wherein, The fixed object is a heat sink. The flow path is connected to the flow path of the heat sink.

9. The light source unit according to any one of claims 1 to 8, wherein, When viewed from above, the first lens array and the second lens array have a rectangular shape.

10. The light source unit according to any one of claims 1 to 9, wherein, The lens holder includes a third force-applying member that applies force to the first lens array and the second lens array toward the fixed object.

11. The light source unit according to any one of claims 1 to 10, wherein, Along a third direction orthogonal to the surface where the plurality of light source elements are arranged, a plurality of first lens arrays and a plurality of second lens arrays are respectively provided. A first frame is provided between the plurality of first lens arrays to separate the plurality of first lens arrays from each other. A second frame is provided between the plurality of said second lens arrays to separate the plurality of said second lens arrays from each other.

12. The light source unit according to claim 11, wherein, The inner circumferential surfaces of the first frame and the second frame have a higher reflectivity than black chrome.

13. The light source unit according to claim 11, wherein, The first frame and the second frame each have a base material and a black chromium layer formed on the base material.

14. The light source unit according to claim 11, wherein, The first frame and the second frame each have a base material and a reflective layer formed on the base material. The reflective layer has a higher reflectivity than the base material.

15. The light source unit according to claim 11, wherein, The first frame and the second frame are made of glass.

16. The light source unit according to any one of claims 11 to 15, wherein, The lens holder includes a fourth force-applying member that applies force to at least one of the first frame and the second frame toward the first wall portion.

17. The light source unit according to any one of claims 11 to 16, wherein, It has a gas flow mechanism that allows gas to flow between the plurality of first lens arrays and between the plurality of second lens arrays.

18. The light source unit according to any one of claims 1 to 17, wherein, The multiple light source elements are multiple LED elements.

19. The light source unit according to any one of claims 1 to 18, wherein, The peak wavelength of the light emitted from the plurality of light source elements is in the range of 360~370nm.

20. The light source unit according to any one of claims 1 to 18, wherein, The peak wavelength of the light emitted from the plurality of light source elements is in the range of 380~390nm.

21. The light source unit according to any one of claims 1 to 18, wherein, The peak wavelength of the light emitted from the plurality of light source elements is in the range of 400~410nm.

22. The light source unit according to any one of claims 1 to 21, wherein, The light source unit is used in the exposure device.

23. A lighting unit comprising: The light source unit according to any one of claims 1 to 22; and The illumination optical system guides the light emitted from the light source unit to the irradiated object.

24. A lighting unit comprising: The light source unit according to any one of claims 1 to 22; and An illumination optical system comprising a synthesizing optical element that synthesizes light emitted from a plurality of said light source units and guides the synthesized light emitted from said synthesizing optical element to an irradiated object.

25. An exposure apparatus comprising: The lighting unit as described in claim 23 or 24; and A projection optics system that projects a patterned image of a mask illuminated by the illumination unit onto a photosensitive substrate.

26. The exposure apparatus according to claim 25, wherein, The photosensitive substrate has at least one side with a length or diagonal length of 500 mm or more.

27. An exposure method using the exposure apparatus of claim 25 or 26, comprising: The mask is illuminated using the lighting unit; as well as The pattern image of the mask is projected onto the photosensitive substrate using the projection optics system.

Images