Splash-proof liquid crystal round chuck supporting structure

Abstract

The invention discloses a splash-proof liquid crystal round chuck supporting structure in the field of semiconductor cleaning, and the splash-proof liquid crystal round chuck supporting structure comprises a horizontal rotating substrate and four integrated supporting pieces distributed in the tangential direction, one end of each supporting piece is provided with a sharp-corner-shaped flow dividing part to guide tangential liquid flow to flow around, and the upper half part of each supporting piece is provided with a V-shaped positioning groove formed by two regular cone parts; supporting and self-centering are achieved through line or point contact of the conical wall and the chamfered face of a cleaned piece, and the top end is coaxially provided with an inverted conical part for lateral limiting. Through streamline integrated design, the incident flow area is reduced, the droplet sputtering rate is reduced from 2.1% to 0.21%, cross contamination of liquid medicine is effectively prevented, meanwhile, traditional surface contact is optimized into line contact through a conical tangent interface, the particle contamination risk and the capillary adsorption effect are greatly reduced, and the clamping stability under high-speed rotation is enhanced.

Description

A splash-proof liquid crystal circular chuck support structure Technical Field

[0001] This invention relates to the field of semiconductor cleaning, and more specifically to a splash-proof liquid crystal circular chuck support structure. Background Technology

[0002] In the semiconductor and flat panel display manufacturing industry, single-wafer cleaning equipment is the core device to ensure the cleanliness of the substrate surface. It uses a rotating chuck to drive the substrate to rotate at high speed and uses centrifugal force to make the cleaning fluid carry away surface impurities.

[0003] To prevent cross-contamination of chemical solutions between different process steps, as shown in Figures 1 and 2, the cleaning chamber is usually equipped with an inner baffle 5 and an outer baffle 6, which enable the graded recycling of waste liquid.

[0004] As shown in Figures 3 to 5, the existing chuck support mechanism usually adopts a split support component 1, which is composed of an independent first support body 1a and a second support body 1d. This traditional support mechanism has exposed many technical defects in practical applications.

[0005] First, the split cylindrical structure exhibits obvious blunt body characteristics on a macroscopic scale. Its large frontal area and gaps between components cause strong air turbulence during rotation and hinder the smooth discharge of cleaning fluid.

[0006] This structure has an extremely severe mechanical impact effect on the fluid. Simulation data shows that in a very short time, about 2.1% of the cleaning fluid will be splashed and enter the restricted area between the inner and outer baffles. This not only damages the purity of the chemicals and makes them unrecoverable, but also easily generates aerosols that cause secondary pollution to the substrate.

[0007] Secondly, the existing support body uses two flat inclined surfaces formed by cutting, such as the first support inclined surface 1b on the first support body 1a and the second support inclined surface 1e on the second support body 1d, to make surface contact support with the chamfer at the bottom of the photomask. The lateral support of the photomask is achieved by the vertical limiting plane 1c on the first support body 1a.

[0008] Such large-area surface contact is prone to trapping and accumulating tiny particles, causing significant particulate contamination. At the same time, due to the installation accuracy of the split components and the sensitivity of the surface contact to installation errors, the substrate often cannot achieve precise self-alignment when rotating at high speed, resulting in insufficient clamping stability and increasing the risk of vibration or even fragmentation. Summary of the Invention

[0009] The purpose of this invention is to provide a splash-proof liquid crystal circular chuck support structure to solve the problems of excessive splashing of cleaning fluid due to the large flow-facing area of ​​the existing split support structure and the easy generation of particulate contamination due to surface contact support.

[0010] To solve the above-mentioned technical problems, the present invention specifically provides the following technical solution: a splash-proof liquid crystal circular chuck support structure, comprising: a rotating substrate, horizontally arranged; four integrated support members, all of which are uniformly arranged on the top of the rotating substrate along a circumferential direction, each integrated support member being perpendicular to the top surface of the rotating substrate; wherein, the integrated support member has a length extension direction on the horizontal plane, the length extension being tangential to the rotation direction of the rotating substrate; a flow divider is formed at one end of the integrated support member along the rotation direction of the rotating substrate in its length extension direction, the flow divider... The shape gradually tapers to a pointed tip in the direction of rotation towards the rotating substrate. The diversion section is used to guide the cleaning fluid flowing through the integrated support to flow around to both sides. The upper half of each integrated support has two conical portions distributed front and back along its length. A V-shaped positioning groove is formed between the two conical portions on the side where their conical walls are close to each other, which supports the chamfered surface of the part being cleaned in a line contact or point contact manner. The top of each conical portion has an inverted conical portion coaxially formed at the top. The large ends of the two inverted conical portions laterally limit the sidewall of the part being cleaned in a line contact or point contact manner.

[0011] Furthermore, a flow channel is formed at the connection root between the integrated support and the rotating substrate, which runs radially through the rotating substrate and is located at the middle position in the length direction of the integrated support.

[0012] Furthermore, both vertical walls of the guide channel are arc-shaped walls, with the apexes of the two arc-shaped walls facing each other to form a narrow opening in the middle of the guide channel.

[0013] Furthermore, except for the right conical part and the inverted conical part, the side walls of the integrated support are all vertical flat surfaces perpendicular to the rotating base plate.

[0014] Furthermore, the radial inner wall of the integrated support is an inclined surface that slopes from top to bottom away from the center, so as to guide the cleaning fluid on the radial inner wall of the integrated support downward during rotation.

[0015] Furthermore, the radial outer sidewall of the integrated support is parallel to the radial inner sidewall, so that the radial outer sidewall of the integrated support forms a downwardly inclined guide surface relative to the radial direction of the rotating substrate, so as to guide the cleaning fluid on the radial outer sidewall of the integrated support downward in the rotating state.

[0016] Furthermore, the integrated support has a semi-cylindrical wall formed at the other end of its length relative to the diversion section. The semi-cylindrical wall and the arc wall corresponding to the guide channel form a first ridge at their intersection. The first ridge near the center of the rotating substrate uses the tip effect to forcibly peel off the cleaning fluid flowing through it, so as to guide the cleaning fluid to be thrown radially away along the outlet direction of the guide channel. The first ridge away from the center of the rotating substrate is used to form a geometric abrupt section that breaks the fluid adhesion effect, so as to reduce the adhesion resistance of the cleaning fluid on the surface of the integrated support and cause the cleaning fluid to be peeled off from the geometric abrupt section and thrown outward by centrifugal force.

[0017] Furthermore, a second ridge is formed at the intersection of the two side walls of the diversion section and the arc wall corresponding to the guide channel. The second ridge is used to interrupt the path of the diverted cleaning fluid to the tail of the integrated support. The second ridge closer to the center of the rotating substrate is used to guide the cleaning fluid flowing through this area to enter the guide channel along the arc wall. The second ridge further away from the center of the rotating substrate is used to create a fluid separation boundary, so as to reduce the adhesion area of ​​the cleaning fluid at the second ridge, making it the starting point for the cleaning fluid to be peeled off by centrifugal force and directionally thrown out.

[0018] Furthermore, the sidewall of the diversion section and the main sidewall of the integrated support are smoothly transitioned by rounded corners.

[0019] Furthermore, the cone angle of the right circular cone is matched with the chamfer angle of the part being cleaned, so that a line contact is formed between the conical wall of the right circular cone and the bottom chamfer surface of the part being cleaned.

[0020] The beneficial effects of this invention are as follows: By setting an integrated support component with a streamlined flow divider, this invention significantly reduces the cross-sectional area facing the flow and the momentum of fluid impact under high-speed rotation conditions, effectively suppressing uncontrolled splashing of cleaning fluid into the baffle gap; This invention, together with the V-shaped tangent interface jointly constructed by the upper conical part and the top inverted conical part, optimizes the support and limiting of the cleaned part from the traditional surface contact to high-precision self-centering line or point contact, which significantly improves the clamping stability under high-speed rotation, greatly reduces the risk of particulate contamination at the contact points, and eliminates the impact of capillary adsorption on cleaning and drying efficiency. Attached Figure Description

[0021] To more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are merely exemplary, and those skilled in the art can derive other embodiments based on the provided drawings without creative effort.

[0022] Figure 1 is a three-dimensional structural diagram of a traditional cleaning chamber; Figure 2 is a planar structural diagram of a traditional cleaning chamber; Figure 3 is a three-dimensional structural diagram of a traditional split support component; Figure 4 is a top view of a traditional split support component; Figure 5 is a top view of a traditional chuck structure; Figure 6 is a three-dimensional structural diagram of an integrated support component according to an embodiment of the present invention; Figure 7 is a top view of a chuck structure according to an embodiment of the present invention; Figure 8 is a front view of an integrated support component according to an embodiment of the present invention; Figure 9 is a schematic diagram of the inclined structure of the inner and outer side walls of the integrated support component according to an embodiment of the present invention; Figure 10 is a bottom schematic diagram of the integrated support component according to an embodiment of the present invention. The labels in the figure represent the following: 1-Separate support component; 1a-First support body; 1b-First support inclined surface; 1c-Vertical limiting plane; 1d-Second support body; 1e-Second support inclined surface; 2-Item to be cleaned; 3-Rotating substrate; 4-Integral support component; 4a-Flow divider; 4b-Right circular cone; 4c-V-shaped positioning groove; 4d-Inverted cone; 4e-Guide groove; 4f-Circular arc wall; 4g-Radial inner wall; 4h-Radial outer wall; 4i-Semi-cylindrical wall; 4j-First ridge line; 4k-Second ridge line; 4m-Rounded corner; 5-Inner baffle; 6-Outer baffle; 7-Liquid inlet pipe. Detailed Implementation

[0023] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0024] This embodiment provides a splash-proof liquid crystal circular chuck support structure, aiming to solve the problems of excessive cleaning fluid splashing due to the large surface area of ​​existing split support structures and the easy generation of particulate contamination from surface contact supports. Specifically, this support device includes a horizontally arranged rotating base plate 3 and four integrated support members 4.

[0025] All integrated support members 4 are evenly arranged on the top of the rotating base plate 3 along the circumferential direction, and each integrated support member 4 is perpendicular to the top surface of the rotating base plate 3. The integrated support member 4 has a length extension direction on the horizontal plane, and the length extension is tangent to the rotation direction of the rotating base plate 3.

[0026] By adopting an integrated structural design instead of the original separate fixed supports, the volume of the fixed supports was reduced while ensuring the strength of the supports.

[0027] The integrated support member 4 has a flow divider 4a at one end along the direction of rotation of the rotating substrate 3 in the length extension direction. The flow divider 4a gradually tapers to a pointed shape in the direction of rotation of the rotating substrate 3, which is used to guide the high-speed tangential liquid flow generated during rotation to flow around to both sides. This drag reduction design for tangential liquid flow effectively reduces the violent turbulence generated when the fluid impacts the support member.

[0028] Each integral support 4 has two conical portions 4b distributed front to back along its length on the upper half. A V-shaped positioning groove 4c for supporting the chamfered surface of the part 2 to be cleaned is formed between the two conical portions 4b on the side where their conical walls are close to each other.

[0029] When the cone angle of the right circular cone 4b matches the chamfer angle of the part being cleaned 2, a line contact support is formed between the cone wall of the right circular cone 4b and the bottom chamfer surface of the part being cleaned 2. If the V angle does not match, a point contact support is formed.

[0030] Compared to existing flat inclined supports, this line contact or point contact method greatly reduces the contact area and inhibits particle accumulation.

[0031] Each right conical part 4b has an inverted conical part 4d coaxially formed at its top end. The large ends of the two inverted conical parts 4d laterally limit the side wall of the part being cleaned 2 by line contact or point contact. Line contact limit is achieved when the large end of the inverted conical part 4d is machined with a cylindrical wall, and point contact limit is achieved when the large end has a sharp contour.

[0032] By combining an integrated streamlined design with a conical support structure, this structure reduces the proportion of droplets splashing between the inner and outer baffles from 2.1% to 0.21%.

[0033] Although the diversion section 4a optimizes the tangential liquid flow, the liquid accumulated on the surface of the rotating substrate 3 is still obstructed by the root of the support when it diffuses outward. Under normal circumstances, the liquid that is not obstructed by the support can be thrown out radially with higher kinetic energy, while the obstructed liquid is more likely to float upward or atomize after being thrown out due to the loss of kinetic energy.

[0034] To compensate for the liquid kinetic energy blocked by the support, a guide groove 4e is formed at the root of the integral support 4 and the rotating base plate 3, which runs radially through the rotating base plate 3. Furthermore, the two vertical groove walls of the guide groove 4e are both set as arc walls 4f, and the arc apexes of the two arc walls 4f are close to each other, forming a narrow opening in the middle of the guide groove 4e.

[0035] This design utilizes the principle of flow area variation in fluid mechanics, which significantly increases the instantaneous flow velocity of liquid as it flows through the narrow central opening. This kinetic energy compensation effect allows the obstructed liquid to regain its radial velocity at the outlet of the guide channel 4e, ensuring a smooth liquid ejection and reducing the possibility of the liquid floating and splashing due to insufficient kinetic energy.

[0036] When dealing with the sidewall flow field, the sidewalls of the integrated support member 4, except for the right conical part 4b and the inverted conical part 4d, are set as vertical flat surfaces perpendicular to the rotating substrate 3. In high-speed rotation application scenarios, in order to overcome the tendency of liquid to climb up along the sidewall, as shown in Figure 9, the radial inner sidewall 4g of the integrated support member 4 is set as an inclined surface that slopes from top to bottom away from the center. The inclined angle is used to guide the cleaning liquid on the radial inner sidewall 4g downward in the rotation state.

[0037] Furthermore, the radial outer wall 4h is set to be parallel to the radial inner wall 4g, so that the radial outer wall 4h forms a downward inclined guiding surface relative to the radial direction of the rotating substrate 3. In the rotating state, the normal reaction force of the inclined surface on the fluid is used to guide the cleaning liquid on the radial outer wall 4h to flow downward and be thrown away.

[0038] In order to eliminate uncontrolled splashing caused by fluid flowing around the support due to the wall effect, the integrated support 4 has a semi-cylindrical wall 4i formed at the other end of the flow divider 4a in the length direction. The semi-cylindrical wall 4i and the arc wall 4f corresponding to the flow guide 4e form a first ridge line 4j at the intersection.

[0039] Among them, the first ridge 4j near the center of the rotating substrate 3 uses the tip effect to forcibly peel off the cleaning fluid flowing through it. By establishing a geometric curvature change point, the cleaning fluid is guided to be thrown radially away along the outlet direction of the guide channel 4e. The first ridge 4j away from the center of the rotating substrate 3 is used to form a geometric change part that breaks the fluid adhesion effect. By reducing the adhesion resistance of the cleaning fluid on the surface of the integrated support 4, the cleaning fluid is peeled off from the geometric change part and thrown outward by centrifugal force.

[0040] Meanwhile, a second ridge line 4k is formed at the intersection of the two side walls of the diversion section 4a and the arc wall 4f corresponding to the guide groove 4e. This second ridge line 4k is used to interrupt the path of the cleaning fluid diverted by the diversion section 4a to the tail of the integrated support member 4.

[0041] The second ridge 4k near the center of the rotating substrate 3 guides the cleaning fluid flowing through it to enter the guide groove 4e along the arc wall 4f. The second ridge 4k away from the center of the rotating substrate 3 creates a fluid detachment boundary, reducing the adhesion area of ​​the cleaning fluid at the second ridge 4k, making it the starting point for the cleaning fluid to be peeled off by centrifugal force.

[0042] Because the second ridge 4k disrupts the continuity of the liquid sliding on the outer wall, this part of the liquid can be momentum-coupled with the high-speed radial liquid flow flowing out of the guide channel 4e at the moment of separation, thereby achieving the merging of the fluids and throwing them away with higher momentum, thus reducing the probability of the liquid entering the baffle gap.

[0043] In addition, to eliminate the risk of stress concentration caused by the sharp corners of the structure and to smooth the local flow field, the side wall of the diversion section 4a and the main body side wall of the integrated support 4 are smoothly transitioned by a rounded corner 4m.

[0044] Finally, simulation data were used to verify the optimization effect of the present invention. In the simulation settings, the cleaning fluid flow rate was 1.5 L / min, and the rotation speed of the rotating mechanism was 400 rpm.

[0045] Comparative Example: Based on the traditional split support component, the support component adopts a split cylindrical structure, and its large frontal cross-sectional area causes the tangential airflow and liquid flow to collide violently.

[0046] According to simulation statistics, when the flow time is 0.406 seconds (corresponding to 2.7 rotations of the rotating mechanism), the total volume of cleaning fluid flowing into the system is 10,150 cubic millimeters, while the volume of cleaning fluid splashing into the restricted area between the inner and outer baffles reaches 212 cubic millimeters.

[0047] This means that within a very short operating time, the splashing rate is as high as 2.1%. If we calculate based on a single droplet volume of 30 cubic millimeters, approximately 7 drops of cleaning fluid will splash into the non-recycling restricted area in the initial stage, which can easily cause serious cross-contamination of the cleaning fluid.

[0048] Embodiment of the present invention: Based on an integrated support component, by reducing the volume of the support component and adopting a streamlined design, and with the addition of a flow guide groove at the root, the mechanical impact of the mechanism on the fluid flow is greatly reduced.

[0049] Simulation data shows that, under the same rotation speed and flow rate conditions, even if the flow time is extended to 2.017 seconds (corresponding to 13.5 rotations of the rotating mechanism), and the total volume of cleaning liquid flowing into the system reaches 50,425 cubic millimeters, the volume of splashing liquid entering the restricted area is only 108 cubic millimeters.

[0050] Calculations show that the droplet splashing rate of this scheme is only 0.21%. Even with a 5-fold increase in the number of rotations, the number of splashing droplets actually decreases to about 3 drops.

[0051] Thus, the experimental results demonstrate that the present invention, through the synergistic effect of the integrated streamlined structure and the root guide groove, reduces the splash rate from 2.1% to 0.21%, achieving an order-of-magnitude optimization.

[0052] The above embodiments are merely exemplary embodiments of the present invention and are not intended to limit the present invention. The scope of protection of the present invention is defined by the claims. Those skilled in the art can make various modifications or equivalent substitutions to the present invention within its spirit and scope of protection, and such modifications or equivalent substitutions should also be considered as falling within the scope of protection of the embodiments of the present invention.

Claims

1. A splash-proof liquid crystal circular chuck support structure, characterized in that, include: A rotating base plate (3) is horizontally positioned. Four integrated support members (4) are uniformly arranged on the top of the rotating base plate (3) along a circumferential direction, each member perpendicular to the top surface of the rotating base plate (3). Each integrated support member (4) has a length extension direction on the horizontal plane, tangent to the rotation direction of the rotating base plate (3). A diversion section (4a) is formed at one end of the integrated support member (4) along the rotation direction of the rotating base plate (3), the diversion section (4a) being oriented towards the rotation direction of the rotating base plate (3). The diversion section (4a) is gradually tapered to a pointed shape and is used to guide the cleaning fluid flowing through the integrated support to flow around to both sides. The upper half of each integrated support (4) is formed with two conical sections (4b) distributed front and back along its length. A V-shaped positioning groove (4c) is formed between the two conical sections (4b) on the side where their conical walls are close to each other, which supports the chamfered surface of the cleaned part (2) in a line contact or point contact manner. An inverted conical section (4d) is formed coaxially at the top of each conical section (4b). The large ends of the two inverted conical sections (4d) laterally limit the side wall of the cleaned part (2) in a line contact or point contact manner.

2. The splash-proof liquid crystal circular chuck support structure according to claim 1, characterized in that, The connection root of the integrated support member (4) and the rotating base plate (3) forms a guide groove (4e) that runs radially through the rotating base plate (3), and the guide groove (4e) is located at the middle position in the length direction of the integrated support member (4).

3. The splash-proof liquid crystal circular chuck support structure according to claim 2, characterized in that, The two vertical walls of the guide channel (4e) are both arc walls (4f), and the apexes of the two arc walls (4f) are close to each other to form a narrow opening in the middle of the guide channel (4e).

4. The splash-proof liquid crystal circular chuck support structure according to claim 1, characterized in that, Except for the right conical part (4b) and the inverted conical part (4d), the sidewalls of the integrated support member (4) are all vertical flat surfaces perpendicular to the rotating base plate (3).

5. The splash-proof liquid crystal circular chuck support structure according to claim 1, characterized in that, The radial inner wall (4g) of the integrated support (4) is an inclined surface that slopes from top to bottom away from the center, so that the cleaning fluid on the radial inner wall (4g) of the integrated support (4) can be guided downward in the rotating state.

6. The splash-proof liquid crystal circular chuck support structure according to claim 5, characterized in that, The radial outer sidewall (4h) of the integrated support (4) is parallel to the radial inner sidewall (4g) so that the radial outer sidewall (4h) of the integrated support (4) forms a downward inclined guide surface relative to the radial direction of the rotating substrate (3) so that the cleaning fluid on the radial outer sidewall (4h) of the integrated support (4) flows downward in the rotating state.

7. A splash-proof liquid crystal circular chuck support structure according to claim 1 or 3, characterized in that, The integrated support member (4) has a semi-cylindrical wall (4i) formed at the other end of its length relative to the diversion section (4a). The semi-cylindrical wall (4i) and the arc wall (4f) corresponding to the guide channel (4e) form a first ridge (4j) at their intersection. The first ridge (4j) near the center of the rotating substrate (3) uses the tip effect to forcibly peel off the cleaning fluid flowing through it, so as to guide the cleaning fluid to be thrown radially away along the outlet direction of the guide channel (4e). The first ridge (4j) away from the center of the rotating substrate (3) is used to form a geometric abrupt part that breaks the fluid adhesion effect, so as to reduce the adhesion resistance of the cleaning fluid on the surface of the integrated support member (4), and cause the cleaning fluid to be peeled off from the geometric abrupt part and thrown outward by centrifugal force.

8. The splash-proof liquid crystal circular chuck support structure according to claim 3, characterized in that, The two side walls of the diversion section (4a) and the arc wall (4f) corresponding to the guide groove (4e) form a second ridge (4k) at the intersection. The second ridge (4k) is used to interrupt the path of the cleaning fluid diverted by the diversion section (4a) to the tail of the integrated support (4). The second ridge (4k) near the center of the rotating substrate (3) is used to guide the cleaning fluid flowing through this point to enter the guide groove (4e) in accordance with the arc wall (4f). The second ridge (4k) away from the center of the rotating substrate (3) is used to construct a fluid separation boundary so as to reduce the adhesion area of ​​the cleaning fluid at the second ridge (4k) and make it the starting point for the cleaning fluid to be peeled off by centrifugal force and thrown out in a direction.

9. The splash-proof liquid crystal circular chuck support structure according to claim 1, characterized in that, The sidewall of the diversion section (4a) and the main body sidewall of the integral support (4) are smoothly transitioned by a rounded corner (4m).

10. The splash-proof liquid crystal circular chuck support structure according to claim 1, characterized in that, The conical inclination angle of the right circular cone (4b) matches the chamfer inclination angle of the part to be cleaned (2) so that the conical wall of the right circular cone (4b) and the bottom chamfered surface of the part to be cleaned (2) form a line contact.

Images