Loudspeaker diaphragm and coating method
By alternately depositing titanium oxide and silicon oxide films on the surface of the speaker diaphragm to form a multi-layer interference film structure, the problems of strong low-frequency sound reflection and monotonous sound caused by conventional diaphragm materials are solved, and richer sound quality and visual effects are achieved.
Patent Information
- Application Number
- CN202610229386.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-02-26
- Publication Date
- 2026-05-12
AI Technical Summary
Conventional speaker diaphragm materials result in strong low-frequency sound reflection, lack of diffusion, monotonous sound, and a lack of layering, failing to produce rich harmonics.
Titanium oxide and silicon oxide films are alternately deposited on the surface of the speaker diaphragm to form a multilayer interference film structure. The thickness and content of the film layers are controlled to achieve gradient colors and enhance sound wave absorption.
It improves the strength and visual appeal of the speaker diaphragm, enhances the clarity and smoothness of the sound, reduces distortion, and improves sound quality.
Smart Images
Figure CN122027952A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of electronic product technology, and in particular to a loudspeaker diaphragm and a coating method. Background Technology
[0002] The speaker diaphragm is the core component of electroacoustic conversion. It generates sound waves by vibrating the air, and its material and structural design directly affect the sound quality.
[0003] Conventional speaker diaphragms are monochromatic and lack color gradation. Conventional aluminum diaphragms are a high-density metal material with a smooth surface and high density, which limits their ability to absorb sound, especially in the low-frequency range. Ordinary aluminum diaphragms cannot effectively absorb sound wave energy, resulting in strong reflectivity of low-frequency sounds, which cannot produce rich harmonics and a sense of layering. Strong reflectivity makes the sound lack diffusion, easily forming an uneven distribution of the sound field, and exacerbating the monotony of the sound. Summary of the Invention
[0004] In view of this, the purpose of this application is to overcome the shortcomings of the prior art and provide a loudspeaker diaphragm and a coating method.
[0005] In a first aspect, this application provides a loudspeaker diaphragm, comprising: A diaphragm, the surface of which is covered with a titanium oxide film layer and a silicon oxide film layer, the titanium oxide film layer and the silicon oxide film layer are alternately arranged, the number of alternations being N, where N is a positive integer greater than 3.
[0006] In some embodiments, the thickness of the titanium oxide film is H1, wherein the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm; The thickness of the silicon oxide film is H2, where the value of H2 is in the range of 75nm ≤ H2 ≤ 160 nm.
[0007] In some embodiments, the thickness H1 of the titanium oxide film and the thickness H2 of the silicon oxide film satisfy the following relationship: 750 nm ≤ N. (H1+H2)≤850 nm.
[0008] In some embodiments, at least two of the multilayer titanium dioxide films have different thicknesses; And / or at least two of the multilayer silicon oxide films have different thicknesses.
[0009] In some embodiments, the titanium oxide content in the titanium oxide film is not less than 99.99%; The silicon oxide film contains no less than 99.99% silicon oxide.
[0010] Secondly, this application provides a coating method for a loudspeaker diaphragm, applied to the loudspeaker diaphragm, comprising the following steps: Obtain the loudspeaker diaphragm; Obtain titanium oxide and silicon oxide; Titanium oxide is used to coat the surface of the speaker diaphragm to form a titanium oxide film layer. A silicon oxide film is formed by depositing silicon oxide on the surface of a titanium oxide film. The deposition of titanium oxide film and silicon oxide film is repeated N times alternately, where N is a positive integer greater than 3.
[0011] In some embodiments, the thickness of the titanium oxide film is H1, wherein the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm; The thickness of the silicon oxide film is H2, where the value of H2 is in the range of 75nm ≤ H2 ≤ 160 nm.
[0012] In some embodiments, the thickness H1 of the titanium oxide film and the thickness H2 of the silicon oxide film satisfy the following relationship: 750 nm ≤ N. (H1+H2)≤850 nm.
[0013] In some embodiments, at least two of the multilayer titanium dioxide films have different thicknesses; And / or at least two of the multilayer silicon oxide films have different thicknesses.
[0014] In some embodiments, before forming the titanium oxide film layer, the process includes: placing the speaker diaphragm into the coating chamber of the coating equipment, cleaning foreign matter from the surface of the speaker diaphragm, and evacuating the coating chamber.
[0015] In some embodiments, prior to forming the titanium oxide film, the process includes: evaporating titanium oxide into a gaseous state and flowing it into a coating chamber, and depositing it on the surface of a speaker diaphragm to form a titanium oxide film.
[0016] In some embodiments, prior to forming the titanium dioxide film, the process includes: evaporating silicon dioxide into a gaseous state and flowing it into a coating chamber, and depositing it on the surface of a speaker diaphragm to form a silicon dioxide film.
[0017] The embodiments of this application have the following advantages: by depositing alternating titanium oxide and silicon oxide film layers on the surface of the diaphragm, a multi-layer interference film structure is formed by alternating silicon oxide and titanium oxide film layers, making the diaphragm surface display various gradient color effects. This not only increases the strength of the diaphragm and enhances the visual effect, but also enhances the sound output of the speaker, highlighting the soft and clear sound, reducing distortion, effectively suppressing unnecessary vibration modes, making the sound purer and more accurate, reducing harshness and muddiness, and making the listening experience smoother and more natural.
[0018] To make the above-mentioned objectives, features and advantages of this application more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description
[0019] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.
[0020] Figure 1 This application provides a schematic diagram of the structure of a loudspeaker diaphragm from one perspective, based on some embodiments thereof. Figure 2 A cross-sectional view of a loudspeaker diaphragm provided in some embodiments of this application is shown from one perspective; Figure 3 It shows Figure 2 Enlarged view of section A; Figure 4 The frequency response curve of a conventional loudspeaker diaphragm is shown; Figure 5 The following diagram illustrates the frequency response curves of a loudspeaker diaphragm provided in some embodiments of this application; Figure 6 The present application illustrates a process for a loudspeaker diaphragm according to some embodiments. Figure 1 ; Figure 7 The present application illustrates a process for a loudspeaker diaphragm according to some embodiments. Figure 2 ; Figure 8 The present application illustrates a process for a loudspeaker diaphragm according to some embodiments. Figure 3 ; Figure 9 The present application illustrates a process for a loudspeaker diaphragm according to some embodiments. Figure 4 .
[0021] Explanation of key component symbols: 100 - Diaphragm; 200 - Titanium oxide film; 300 - Silicon oxide film. Detailed Implementation
[0022] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.
[0023] It should be noted that when an element is said to be "fixed" to another element, it can be directly on the other element or there may be an intervening element. When an element is said to be "connected" to another element, it can be directly connected to the other element or there may be an intervening element. Conversely, when an element is said to be "directly" on another element, there is no intervening element. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.
[0024] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0025] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.
[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the template description is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.
[0027] like Figures 1 to 3As shown, this application provides a speaker diaphragm, mainly used in speakers, to improve the strength of the speaker diaphragm, extend its service life, enhance its dazzling visual effects, and improve the clarity and smoothness of the sound.
[0028] The loudspeaker diaphragm includes a diaphragm 100. In this embodiment, the surface of the diaphragm 100 is covered with a titanium oxide film layer 200 and a silicon oxide film layer 300, which are alternately arranged for a number of times N, where N is a positive integer greater than 3.
[0029] It should be noted that, in some embodiments, a titanium oxide film layer 200 is formed on the surface of the diaphragm 100 by physical vapor deposition, that is, the titanium source is vaporized in a vacuum environment by physical means (such as evaporation or sputtering), and then deposited on the surface of the diaphragm 100 and reacted with oxygen to form TiO2. Secondly, a silicon oxide film layer 300 can also be formed on the surface of the diaphragm 100 by physical vapor deposition, that is, SiO2 is transferred from the target material to the surface of the diaphragm 100 by physical means (such as evaporation or sputtering).
[0030] Optionally, in other embodiments, a titanium oxide film 200 is formed on the surface of the diaphragm 100 by chemical vapor deposition, wherein a titanium-containing precursor gas (such as TiCl4) undergoes a chemical reaction on a heated substrate surface to decompose or oxidize and generate a TiO2 film. Alternatively, a silicon oxide film 300 is formed on the surface of the diaphragm 100 by chemical vapor deposition, wherein a silicon- and oxygen-containing precursor gas undergoes a chemical reaction in a reaction chamber to generate solid SiO2, which is then deposited on the surface of the diaphragm 100.
[0031] In this embodiment, by depositing alternating titanium oxide film layers 200 and silicon oxide film layers 300 on the surface of diaphragm 100, a multilayer interference film structure is formed by alternating silicon oxide film layers 300 and titanium oxide film layers 200. This allows the surface of diaphragm 100 to display various gradient color effects, which not only increases the strength of diaphragm 100 and enhances the visual effect, but also enhances the sound output of the speaker, highlighting the soft and clear sound.
[0032] Furthermore, by increasing the rigidity-to-mass ratio of the diaphragm 100, high-frequency split vibration is suppressed, resulting in better high-frequency response extension and a clearer, brighter, and more delicate sound. Secondly, the high rigidity allows the diaphragm 100 to start and stop faster, making sound details (such as percussion and sibilance in vocals) crisper and less sluggish, with a stronger sense of rhythm. In addition, it can also reduce distortion, effectively suppressing unnecessary vibration patterns, making the sound purer and more accurate, reducing harshness and muddiness, and resulting in a smoother and more natural listening experience.
[0033] It should be noted that when light shines on the titanium oxide film layer 200 and the silicon oxide film layer 300, different reflectivities are formed on the surfaces of the titanium oxide film layer 200 and the silicon oxide film layer 300, thereby forming rich colors on the surface of the diaphragm 100 through interference effect. Different color effects can be reflected according to different viewing angles of the user, thereby enhancing the aesthetics of the diaphragm 100 and improving the user's experience.
[0034] Secondly, the titanium dioxide film 200 possesses characteristics of corrosion resistance, wear resistance, and high hardness. The titanium dioxide film 200 provides protection for the diaphragm 100, not only enhancing its strength but also effectively extending its service life. Furthermore, the silicon dioxide film 300 exhibits stable chemical properties, effectively improving the wear resistance and surface hardness of the diaphragm 100, thereby increasing its strength and service life.
[0035] In some embodiments of this application, the thickness of the titanium oxide film 200 is H1, wherein the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm.
[0036] It is understandable that the thickness H1 of the titanium dioxide film 200 can be any of the following ranges: 60nm≤H1≤85 nm, 65nm≤H1≤85 nm, 70nm≤H1≤85 nm, 75nm≤H1≤85 nm, or 80nm≤H1≤85 nm, and can be set according to the actual situation.
[0037] It should be noted that by controlling the thickness of the titanium oxide film 200, the titanium oxide film 200 deposited on the surface of the diaphragm 100 can generate rich structural colors (such as gold, blue, and purple) through interference under the action of light, thereby enhancing the diversity of colors on the surface of the diaphragm 100.
[0038] In addition, the thickness of the silicon oxide film 300 is H2, wherein the value of H2 is in the range of 75nm≤H2≤160nm.
[0039] It is understood that the thickness H2 of the silicon oxide film layer 300 can be any of the following ranges: 75nm≤H2≤160nm, 80nm≤H2≤160 nm, 85nm≤H2≤160 nm, 90nm≤H2≤160 nm, 95nm≤H2≤160 nm, 100nm≤H2≤160 nm, 105nm≤H2≤160 nm, 110nm≤H2≤160 nm, 115nm≤H2≤160 nm, 120nm≤H2≤160 nm, 125nm≤H2≤160 nm, 130nm≤H2≤160 nm, 135nm≤H2≤160 nm, 140nm≤H2≤160 nm, and 145nm≤H2≤160 nm, and can be specifically set according to the actual situation.
[0040] It should be noted that by controlling the thickness of the silicon oxide film 300, the silicon oxide film 300 deposited on the surface of the diaphragm 100 can generate rich structural colors through interference under the action of light, thereby enhancing the diversity of colors on the surface of the diaphragm 100.
[0041] In some embodiments of this application, the thickness H1 of the titanium oxide film 200 and the thickness H2 of the silicon oxide film 300 satisfy the relationship that 750nm ≤ N. (H1+H2)≤850 nm.
[0042] It is understood that the thickness H1 of the titanium oxide film layer 200 and the thickness H2 of the silicon oxide film layer 300 satisfy the relationship: 750nm ≤ N (H1+H2)≤850 nm, 760nm≤N (H1+H2)≤850 nm, 770nm≤N (H1+H2)≤850 nm, 780nm≤N (H1+H2)≤850 nm, 790nm≤N (H1+H2)≤850 nm, 800nm≤N (H1+H2)≤850 nm, 810nm≤N (H1+H2)≤850 nm, 820nm≤N (H1+H2)≤850 nm, 830nm≤N (H1+H2)≤850 nm, 840nm≤N Any range of (H1+H2)≤850 nm can be specifically set according to the actual situation.
[0043] In some embodiments of this application, at least two of the multilayer titanium oxide film layers 200 have different thicknesses, and / or at least two of the multilayer silicon oxide film layers 300 have different thicknesses.
[0044] It is understood that in some embodiments, at least two of the multilayer titanium oxide film layers 200 have different thicknesses, or at least two of the multilayer silicon oxide film layers 300 have different thicknesses. In other embodiments, at least two of the multilayer titanium oxide film layers 200 and at least two of the multilayer silicon oxide film layers 300 have different thicknesses.
[0045] In some embodiments, the thickness of each layer in the multilayer titanium oxide film 200 is not the same, or the thickness of each layer in the multilayer silicon oxide film 300 is not the same. In other embodiments, the thickness of each layer in the multilayer titanium oxide film 200 is not the same, and the thickness of each layer in the multilayer silicon oxide film 300 is not the same.
[0046] It should be noted that by setting titanium oxide film layers 200 and silicon oxide film layers 300 of different thicknesses, the colors of the light reflected by each titanium oxide film layer 200 and each silicon oxide film layer 300 are different, thereby achieving a dazzling effect.
[0047] In some embodiments of this application, the titanium oxide content in the titanium oxide film 200 is not less than 99.99%, and the silicon oxide content in the silicon oxide film 300 is not less than 99.99%, to ensure the purity of the titanium oxide film 200 and the silicon oxide film 300, thereby improving the high transmittance of the titanium oxide film 200 and the silicon oxide film 300, and thus improving the uniformity of the color reflected by the titanium oxide film 200 and the silicon oxide film 300.
[0048] like Figure 6 As shown, some embodiments of this application provide a coating method for a loudspeaker diaphragm, applied to the loudspeaker diaphragm described in any of the above embodiments, comprising the following steps: Step S100: Obtain the speaker diaphragm.
[0049] Step S200: Obtain titanium oxide and silicon oxide.
[0050] In some embodiments, titanium oxide and silicon oxide are obtained by physical vapor deposition.
[0051] In step S300, titanium oxide is used to coat the surface of the speaker diaphragm to form a titanium oxide film layer 200.
[0052] Specifically, a titanium oxide film 200 is formed on the surface of the diaphragm 100 by physical vapor deposition. That is, the titanium source is vaporized in a vacuum environment by physical means (such as evaporation or sputtering), and then deposited on the surface of the diaphragm 100 and reacted with oxygen to form TiO2.
[0053] In step S400, silicon oxide is deposited on the surface of the titanium oxide film 200 to form a silicon oxide film 300.
[0054] In this embodiment, a silicon oxide film 300 is formed on the surface of the diaphragm 100 by physical vapor deposition, that is, SiO2 is transferred from the target material to the surface of the diaphragm 100 by physical means (such as evaporation or sputtering).
[0055] Step S500: Alternately repeat the deposition of titanium oxide film layer 200 and silicon oxide film layer 300 N times, where N is a positive integer greater than 3.
[0056] Specifically, steps S300 and S400 are executed alternately to alternately deposit a titanium oxide film layer 200 and a silicon oxide film layer 300 on the surface of the diaphragm 100.
[0057] In some embodiments of this application, the thickness of the titanium oxide film 200 is H1, wherein the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm.
[0058] It is understandable that the thickness H1 of the titanium dioxide film 200 can be any of the following ranges: 60nm≤H1≤85 nm, 65nm≤H1≤85 nm, 70nm≤H1≤85 nm, 75nm≤H1≤85 nm, or 80nm≤H1≤85 nm, and can be set according to the actual situation.
[0059] It should be noted that by controlling the thickness of the titanium oxide film 200, the titanium oxide film 200 deposited on the surface of the diaphragm 100 can generate rich structural colors (such as gold, blue, and purple) through interference under the action of light, thereby enhancing the diversity of colors on the surface of the diaphragm 100.
[0060] In addition, the thickness of the silicon oxide film 300 is H2, wherein the value of H2 is in the range of 75nm≤H2≤160nm.
[0061] It is understood that the thickness H2 of the silicon oxide film layer 300 can be any of the following ranges: 75nm≤H2≤160nm, 80nm≤H2≤160 nm, 85nm≤H2≤160 nm, 90nm≤H2≤160 nm, 95nm≤H2≤160 nm, 100nm≤H2≤160 nm, 105nm≤H2≤160 nm, 110nm≤H2≤160 nm, 115nm≤H2≤160 nm, 120nm≤H2≤160 nm, 125nm≤H2≤160 nm, 130nm≤H2≤160 nm, 135nm≤H2≤160 nm, 140nm≤H2≤160 nm, and 145nm≤H2≤160 nm, and can be specifically set according to the actual situation.
[0062] It should be noted that by controlling the thickness of the silicon oxide film 300, the silicon oxide film 300 deposited on the surface of the diaphragm 100 can generate rich structural colors through interference under the action of light, thereby enhancing the diversity of colors on the surface of the diaphragm 100.
[0063] In some embodiments of this application, the thickness H1 of the titanium oxide film 200 and the thickness H2 of the silicon oxide film 300 satisfy the relationship that 750nm ≤ N. (H1+H2)≤850 nm.
[0064] It is understood that the thickness H1 of the titanium oxide film layer 200 and the thickness H2 of the silicon oxide film layer 300 satisfy the relationship: 750nm ≤ N (H1+H2)≤850 nm, 760nm≤N (H1+H2)≤850 nm, 770nm≤N (H1+H2)≤850 nm, 780nm≤N (H1+H2)≤850 nm, 790nm≤N (H1+H2)≤850 nm, 800nm≤N (H1+H2)≤850 nm, 810nm≤N (H1+H2)≤850 nm, 820nm≤N (H1+H2)≤850 nm, 830nm≤N (H1+H2)≤850 nm, 840nm≤N Any range of (H1+H2)≤850 nm can be specifically set according to the actual situation.
[0065] In some embodiments of this application, at least two of the multilayer titanium oxide film layers 200 have different thicknesses, and / or at least two of the multilayer silicon oxide film layers 300 have different thicknesses.
[0066] It is understood that in some embodiments, at least two of the multilayer titanium oxide film layers 200 have different thicknesses, or at least two of the multilayer silicon oxide film layers 300 have different thicknesses. In other embodiments, at least two of the multilayer titanium oxide film layers 200 and at least two of the multilayer silicon oxide film layers 300 have different thicknesses.
[0067] In some embodiments, the thickness of each layer in the multilayer titanium oxide film 200 is not the same, or the thickness of each layer in the multilayer silicon oxide film 300 is not the same. In other embodiments, the thickness of each layer in the multilayer titanium oxide film 200 is not the same, and the thickness of each layer in the multilayer silicon oxide film 300 is not the same.
[0068] It should be noted that by setting titanium oxide film layers 200 and silicon oxide film layers 300 of different thicknesses, the colors of the light reflected by each titanium oxide film layer 200 and each silicon oxide film layer 300 are different, thereby achieving a dazzling effect.
[0069] from Figure 4 and Figure 5 The comparison shows that conventional speaker diaphragms exhibit rapid and significant fluctuations in their frequency response curves within the 60-80dB range, indicating that greater fluctuations result in poorer sound quality. In contrast, the speaker diaphragm provided in this application exhibits a smaller and smoother frequency response curve within the 60-80dB range, indicating less fluctuations and better sound quality.
[0070] like Figure 7 As shown, in some embodiments of this application, before the step of forming the titanium oxide film layer 200, the following steps are included: step S210, placing the speaker diaphragm into the coating chamber of the coating equipment, cleaning foreign objects from the surface of the speaker diaphragm, and evacuating the coating chamber.
[0071] In this embodiment, foreign matter on the surface of the speaker diaphragm is bombarded and expelled by an ion source. Specifically, high-energy ions (typically inert gas ions, such as argon ions) are used. + The kinetic energy is carried by the impact on the surface of the diaphragm 100, and the energy is transferred to the atoms or pollutant molecules on the surface. When the energy transferred exceeds the surface binding energy, these atoms or molecules will be "blown" off the surface of the diaphragm 100 and removed into the vacuum, achieving atomic-level physical stripping and cleaning, thereby improving the cleanliness of the diaphragm 100 surface and thus improving the quality of the coating.
[0072] like Figure 8 As shown, in some embodiments of this application, before forming the titanium oxide film layer 200, the following steps are included: step S310, in which titanium oxide is evaporated into a gaseous state and flows into a coating chamber, and is deposited on the surface of the speaker diaphragm to form the titanium oxide film layer 200.
[0073] In this embodiment, under vacuum conditions, solid titanium oxide is directly sublimated by heating or partially evaporated by high-energy beams such as electron beams. Then, gaseous titanium oxide is deposited on the surface of the diaphragm 100 by physical vapor deposition to form a titanium oxide film layer 200.
[0074] like Figure 9 As shown, in some embodiments of this application, before forming the titanium oxide film layer 200, the following steps are included: step S410, in which silicon oxide is evaporated into a gaseous state and flows into a coating chamber, and deposited on the surface of the speaker diaphragm to form a silicon oxide film layer 300.
[0075] In this embodiment, under vacuum conditions, solid silicon oxide is directly sublimated by heating or partially evaporated by high-energy beams such as electron beams. Then, gaseous silicon oxide is deposited on the surface of the diaphragm 100 by physical vapor deposition to form a silicon oxide film layer 300.
[0076] In this embodiment, the time for depositing the titanium oxide film 200 is T1, where the value of T1 ranges from 7.5 min to 8.5 min.
[0077] It should be noted that the time T1 for depositing the titanium oxide film layer 200 refers to the time T1 for depositing one layer of titanium oxide film layer 200 on the surface of the diaphragm 100. That is, the time T1 is 2 for depositing two layers of titanium oxide film layer 200 on the surface of the diaphragm 100. T1, the time for depositing N layers is N. T1.
[0078] In addition, the time for depositing the silicon oxide film layer 300 is T2, where the value of T2 is in the range of 6.5min≤T2≤7.5min.
[0079] It should be noted that the time T2 for depositing the silicon oxide film layer 300 refers to the time T2 for depositing one layer of silicon oxide film layer 300 on the surface of the diaphragm 100. In other words, the time T2 is 2 for depositing two layers of silicon oxide film layer 300 on the surface of the diaphragm 100. T2, the time for depositing N layers is N. T2.
[0080] It is understandable that by controlling the coating time of the first titanium oxide film 200 and the coating time of the first silicon oxide film 300, it is possible not only to ensure that the titanium oxide content in the titanium oxide film 200 is not less than 99.99% after each coating, but also to effectively control the coating time, thereby improving the overall coating efficiency and controlling costs.
[0081] In this embodiment, the time T1 of the titanium oxide film layer 200 and the time T2 of the silicon oxide film layer 300 satisfy the relationship that 85min≤N (T1+T2)≤95min. It is understandable that by controlling the overall coating time, the coating efficiency can be improved.
[0082] like Figure 8 As shown, in this embodiment, titanium oxide is placed in the first evaporation chamber. The titanium oxide film 200 further includes step S320: when the coating time T1 is less than a first preset time and n1 is greater than a first preset concentration, the first evaporation chamber is closed. That is, at this time, the concentration of gaseous titanium oxide in the first evaporation chamber reaches the coating requirement, so the first evaporation chamber is closed to avoid an increase in the concentration of titanium oxide, thereby ensuring the stability of the current titanium oxide concentration in the first evaporation chamber, and thus effectively controlling the thickness of the titanium oxide film 200 deposited on the surface of the diaphragm 100.
[0083] In addition, in this embodiment, the titanium oxide film layer 200 further includes: step S330, obtaining the concentration n1 of gaseous titanium oxide in the coating chamber. When the coating time T1 is greater than the first preset time and n1 is less than the first preset concentration, the titanium oxide coating is completed. At this time, the silicon oxide film layer 300 can be coated, i.e., step S400 is executed.
[0084] like Figure 9 As shown, in this embodiment, silicon oxide is placed in the second evaporation chamber. The silicon oxide film 300 deposition further includes step S420: when the deposition time T2 is less than a first preset time and n2 is greater than a first preset concentration, the second evaporation chamber is closed. That is, at this time, the concentration of gaseous titanium oxide in the second evaporation chamber reaches the deposition requirements, so the second evaporation chamber is closed to avoid an increase in silicon oxide concentration, thereby ensuring the stability of the current silicon oxide concentration in the second evaporation chamber, and thus effectively controlling the thickness of the silicon oxide film 300 deposited on the surface of the diaphragm 100.
[0085] In addition, in this embodiment, the silicon oxide film 300 further includes: step S430, obtaining the concentration n2 of gaseous silicon oxide in the coating chamber, and when the coating time T2 is greater than the second preset time and n2 is less than the second preset concentration, the silicon oxide coating is completed.
[0086] It is understood that steps S300, S310, S410 and S420 are executed sequentially to form alternating coatings of titanium oxide film layer 200 and silicon oxide film layer 300 on the surface of diaphragm 100.
[0087] In all examples shown and described herein, any specific values should be interpreted as merely exemplary and not as limitations; therefore, other examples of exemplary embodiments may have different values.
[0088] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0089] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these modifications and improvements all fall within the protection scope of this application.
Claims
1. A loudspeaker diaphragm, characterized in that, include: A diaphragm, the surface of which is covered with a titanium oxide film layer and a silicon oxide film layer, the titanium oxide film layer and the silicon oxide film layer are alternately arranged, the number of alternations being N, where N is a positive integer greater than 3.
2. The loudspeaker diaphragm according to claim 1, characterized in that, The thickness of the titanium oxide film is H1, wherein the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm; the thickness of the silicon oxide film is H2, wherein the value of H2 is in the range of 75 nm ≤ H2 ≤ 160 nm.
3. The loudspeaker diaphragm according to claim 2, characterized in that, The thickness H1 of the titanium oxide film and the thickness H2 of the silicon oxide film satisfy the following relationship: 750nm ≤ N. (H1+H2)≤850 nm.
4. The loudspeaker diaphragm according to claim 1, characterized in that, In the multilayer titanium dioxide film, at least two layers have different thicknesses; And / or at least two of the multilayer silicon oxide films have different thicknesses.
5. The loudspeaker diaphragm according to claim 1, characterized in that, The titanium dioxide film contains no less than 99.99% titanium dioxide. The silicon oxide film contains no less than 99.99% silicon oxide.
6. A coating method for a loudspeaker diaphragm, characterized in that, Applied to the loudspeaker diaphragm according to any one of claims 1-5, comprising the steps of: Obtain the loudspeaker diaphragm; Obtain titanium oxide and silicon oxide; Titanium oxide is used to coat the surface of the speaker diaphragm to form a titanium oxide film layer. A silicon oxide film is formed by depositing silicon oxide on the surface of a titanium oxide film. The deposition of titanium oxide film and silicon oxide film is repeated N times alternately, where N is a positive integer greater than 3.
7. The coating method for a loudspeaker diaphragm according to claim 6, characterized in that, The thickness of the titanium oxide film is H1, where the value of H1 is in the range of 60 nm ≤ H1 ≤ 85 nm. The thickness of the silicon oxide film is H2, where the value of H2 is in the range of 75nm ≤ H2 ≤ 160 nm.
8. The coating method for a loudspeaker diaphragm according to claim 7, characterized in that, The thickness H1 of the titanium oxide film and the thickness H2 of the silicon oxide film satisfy the following relationship: 750nm ≤ N. (H1+H2)≤850 nm.
9. The coating method for a loudspeaker diaphragm according to claim 6, characterized in that, In the multilayer titanium dioxide film, at least two layers have different thicknesses; And / or at least two of the multilayer silicon oxide films have different thicknesses.
10. The method for coating a loudspeaker diaphragm according to claim 6, characterized in that, Before forming the titanium oxide film layer, the process includes: placing the speaker diaphragm into the coating chamber of the coating equipment, cleaning foreign matter from the surface of the speaker diaphragm, and evacuating the coating chamber.
11. The coating method for a loudspeaker diaphragm according to claim 10, characterized in that, Before forming the titanium oxide film, the process includes: evaporating titanium oxide into a gaseous state and flowing it into a coating chamber, where it is deposited on the surface of the speaker diaphragm to form a titanium oxide film.
12. The coating method for a loudspeaker diaphragm according to claim 10, characterized in that, Prior to forming the titanium dioxide film, the process includes: evaporating silicon dioxide into a gaseous state and flowing it into a coating chamber, where it is deposited on the surface of the speaker diaphragm to form a silicon dioxide film.