High-power x-ray light source apparatus and high-power x-ray generation method

Abstract

This invention discloses a high-power X-ray source device and a high-power X-ray generation method, relating to the field of X-ray source technology. The device includes: an electron generation component that generates an initial electron beam based on the field emission principle and amplifies the initial electron beam using an avalanche multiplication method; an electron acceleration component that performs gradient acceleration and radial confinement on the amplified initial electron beam to form a focused electron beam; and an X-ray generation component including a rotating anode target disk, a cooling circulation base, and a drive motor. The flow channels within the cooling circulation base are connected to an external cooling device. The drive motor drives the rotating anode target disk to rotate. The rotating anode target disk is mounted on the cooling circulation base and generates X-ray photons when bombarded by the focused electron beam. The rotating anode target disk has a microchannel array layer connected to the flow channels within the cooling circulation base to remove associated heat generated by the bombardment. Thus, high-power, high-stability, and long-life X-ray output can be achieved.

Description

Technical Field

[0001] This invention relates to the field of X-ray source technology, and in particular to a high-power X-ray source device and a high-power X-ray generation method. Background Technology

[0002] High-power X-ray sources, as core devices for synchrotron radiation experiments and high-end industrial testing, often suffer from performance bottlenecks rooted in the physical limitations of their hardware structure. The fixed target structure commonly used in related technologies has inherent defects in its heat dissipation mechanism: traditional fixed anode targets typically rely solely on a cooling water jacket on their back for passive heat exchange. Because the target material is fixed in position, the electron beam continuously bombards the same microscopic point, leading to a rapid accumulation of localized heat. This point-like heat load far exceeds the heat dissipation capacity of conventional water-cooling structures, severely limiting the increase in input power and thus restricting the brightness and stability of the light source.

[0003] Meanwhile, mainstream electron emission systems—thermionic electron guns—also face severe challenges in terms of structural reliability and energy efficiency. These electron guns rely on electric current to heat a filament to excite electrons, and their internal structure contains a complex filament heating mechanism. Under prolonged high-temperature operation, the filament is prone to deformation, evaporation, and deterioration, leading to a shortened electron gun lifespan. Furthermore, additional preheating time is required, which not only increases system energy consumption but also introduces additional heat sources that may interfere with the thermal stability of surrounding precision components.

[0004] In the electron beam acceleration and focusing stage, the electron beam is easily diverged due to the space charge effect during transmission, failing to form a high-density focused beam, resulting in low energy utilization and further limiting the generation efficiency and output intensity of X-rays. In addition, traditional high-power X-ray sources often adopt a separate design of the high-voltage generator and the X-ray generator, resulting in large and heavy equipment, which is not conducive to miniaturization and integrated applications.

[0005] In summary, X-ray source devices in related technologies have significant shortcomings in terms of heat dissipation management, electron emission mechanisms, and beam control. The dual constraints at the hardware level—the point-like heat load accumulation of the fixed target and the structural energy efficiency defects of the hot cathode—jointly limit the development of X-ray sources towards higher power, longer lifespan, and more stable operation. Summary of the Invention

[0006] The purpose of this invention is to propose a high-power X-ray source device and a high-power X-ray generation method to overcome the dual hardware constraints of point-like heat load accumulation in the fixed target structure and energy efficiency defects in the hot cathode electron gun structure, thereby achieving high power, high stability, long life and compact integration of the X-ray source.

[0007] In a first aspect, embodiments of the present invention propose a high-power X-ray source device, comprising: an electron generating component for generating an initial electron beam based on the field emission principle and amplifying the initial electron beam through avalanche multiplication; an electron accelerating component, the inlet of which is connected to the outlet of the electron generating component, for gradient acceleration and radial confinement of the amplified initial electron beam to form a focused electron beam; and an X-ray generating component, comprising a rotating anode target disk, a cooling circulation base, a drive motor, and a rotary joint, wherein the flow channel within the cooling circulation base is sealed and connected to an external cooling device through the rotary joint, the drive motor is used to drive the rotating anode target disk to rotate, the rotating anode target disk is mounted on the cooling circulation base and is positioned opposite to the outlet of the electron accelerating component to generate X-ray photons upon receiving bombardment from the focused electron beam; the rotating anode target disk has a microchannel array layer inside that communicates with the flow channel within the cooling circulation base, the microchannel array layer being used to remove associated heat generated by bombardment through a cooling medium flowing inside.

[0008] In some embodiments, the electron generating component includes a metal housing and a glow discharge amplification cold cathode electron gun disposed within the metal housing, wherein the outlet of the metal housing is sealed and connected to the inlet of the electron acceleration component; the glow discharge amplification cold cathode electron gun includes a nanoparticle array emitter and a glow discharge chamber arranged sequentially along the electron beam transmission direction, wherein the nanoparticle array emitter is used to generate the initial electron beam based on the field emission principle, and the glow discharge chamber is used to amplify the initial electron beam through avalanche multiplication, and the amplified initial electron beam enters the electron acceleration component through the outlet of the metal housing.

[0009] In some embodiments, the glow discharge amplified cold cathode electron gun further includes a gate control network disposed between the nanoneedle array emitter and the glow discharge chamber, for guiding the initial electron beam into the glow discharge chamber.

[0010] In some embodiments, the electron acceleration assembly includes a tubular housing, a magnetic focusing coil, and a plurality of annular accelerating electrodes. The inlet of the tubular housing is sealed to the outlet of the electron generating assembly. The plurality of annular accelerating electrodes are disposed inside the tubular housing and spaced apart along the electron beam transmission direction to generate a gradient electric field with an increasing electric field intensity along the electron beam transmission direction, thereby accelerating the amplified initial electron beam. The magnetic focusing coil is wrapped around the tubular housing and generates an axisymmetric magnetic field with an increasing and then stabilizing magnetic field intensity along the electron beam transmission direction, thereby radially confining the initial electron beam.

[0011] In some embodiments, the microchannel array layer is located between the target material layer and the target substrate of the rotating anode target disk, and includes a plurality of parallel microchannels distributed radially or circumferentially along the rotating anode target disk.

[0012] In some embodiments, the X-ray generating assembly further includes a vacuum chamber, in which the rotating anode target, the cooling circulation base, and the rotary joint are all disposed. The drive motor is disposed outside the vacuum chamber and is driven by the rotating anode target through a magnetohydrodynamic sealing device that passes through the vacuum chamber.

[0013] In some embodiments, the X-ray generating assembly further includes an X-ray exit window disposed on the side wall of the vacuum cavity for guiding the X-ray photons to an external experimental station.

[0014] In some embodiments, the rotary joint includes a stationary end and a rotating end, the stationary end being sealed to the rotating end and rotatably coupled to it; the stationary end is provided with an inlet for connecting to the inlet of the external cooling device and an outlet for connecting to the outlet of the external cooling device; the rotating end is connected to a flow channel in the cooling circulation base for guiding the flowing cooling medium into the flow channel and exporting the returning cooling medium to the stationary end.

[0015] In some embodiments, the target layer is made of tungsten or molybdenum material and has a thickness of 10 μm-50 μm.

[0016] In a second aspect, embodiments of the present invention propose a high-power X-ray generation method for use in the high-power X-ray source device described in the first aspect embodiment. The method includes: activating a cooling cycle through the external cooling device to allow the cooling medium to circulate in the microchannel array layer, and controlling the drive motor to drive the rotating anode target disk to a preset rotation speed; controlling the electron generation component to generate an initial electron beam based on the field emission principle, and amplifying the initial electron beam through avalanche multiplication; and controlling the electron acceleration component to perform gradient acceleration and radial constraint on the amplified initial electron beam to form a focused electron beam, which bombards the surface of the rotating anode target disk to generate X-ray photons.

[0017] The high-power X-ray source device and high-power X-ray generation method of this invention generate an initial electron beam based on the field emission principle through an electron generation component, and amplify the initial electron beam through avalanche multiplication. Then, the amplified initial electron beam is accelerated by gradient and radially constrained by an electron acceleration component to form a focused electron beam. The X-ray generation component includes a rotating anode target disk, a cooling circulation base, a drive motor, and a rotary joint. The flow channel in the cooling circulation base is sealed and connected to an external cooling device through the rotary joint. The drive motor is used to drive the rotating anode target disk to rotate. The rotating anode target disk is mounted on the cooling circulation base and is positioned opposite to the outlet of the electron acceleration component to generate X-ray photons when bombarded by the focused electron beam. The rotating anode target disk has a microchannel array layer inside that communicates with the flow channel in the cooling circulation base. The microchannel array layer is used to remove the associated heat generated by the bombardment through the internally flowing cooling medium. Therefore, field emission and multiplication technology are used to achieve rapid start-up and high-density electron beam output. A high-density focused electron beam is formed through gradient acceleration and radial confinement. The composite heat dissipation structure composed of rotating anode and microchannel array is used to disperse and efficiently remove point heat load. This breaks through the technical bottlenecks of traditional fixed target power density limit and hot cathode preheating delay and high temperature degradation, and realizes high power, high stability, long life and compact X-ray output.

[0018] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of a high-power X-ray source device according to an embodiment of the present invention;

[0020] Figure 2 This is a schematic diagram of the structure of an electron generating component according to an embodiment of the present invention;

[0021] Figure 3 This is a schematic diagram of the structure of an X-ray generating assembly according to an embodiment of the present invention;

[0022] Figure 4 This is a flowchart of a high-power X-ray generation method according to an embodiment of the present invention.

[0023] Figure label:

[0024] 100. High-power X-ray source device;

[0025] 1. Electron generating assembly; 2. Electron accelerating assembly; 3. X-ray generating assembly; 4. Metal corrugated tube; 5a. First flange; 5b. Second flange; 6. Vacuum chamber end cap.

[0026] 11. Metal casing; 12. Glow discharge cold cathode electron gun; 121. Nanoparticle tip array emitter; 121a. Conductive substrate; 121b. Molybdenum nanoparticle tip array; 122. Glow discharge chamber; 123. Grid control network.

[0027] 21. Tubular outer shell; 22. Magnetic focusing coil; 23. Ring-shaped accelerating electrode;

[0028] 31. Rotating anode target disk; 32. Cooling circulation base; 33. Drive motor; 34. Rotary joint; 35. Vacuum chamber; 36. Magnetohydrodynamic sealing device; 37. X-ray exit window; 311. Microchannel array layer; 312. Target material layer; 313. Target disk substrate; 341. Stationary end; 342. Rotating end. Detailed Implementation

[0029] Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0030] The following is a reference appendix. Figure 1 To be continued Figure 4 This invention describes a high-power X-ray source device and a high-power X-ray generation method according to embodiments of the present invention.

[0031] Figure 1 This is a schematic diagram of a high-power X-ray source device according to an embodiment of the present invention.

[0032] like Figure 1 As shown, the high-power X-ray source device 100 includes: an electron generating component 1, an electron accelerating component 2, and an X-ray generating component 3.

[0033] See Figure 1 Electron generation component 1 is used to generate an initial electron beam based on the field emission principle and amplify the initial electron beam through avalanche multiplication. The inlet of electron acceleration component 2 is connected to the outlet of electron generation component 1, and is used to perform gradient acceleration and radial confinement on the amplified initial electron beam to form a focused electron beam. Field emission refers to the quantum tunneling emission phenomenon where electrons penetrate the potential barrier on the cathode surface under a strong electric field, generating electrons without heating.

[0034] like Figure 1 , Figure 3As shown, the X-ray generating assembly 3 includes a rotating anode target disk 31, a cooling circulation base 32, a drive motor 33, and a rotary joint 34. The flow channel inside the cooling circulation base 32 is sealed and connected to an external cooling device through the rotary joint 34. The drive motor 33 is used to drive the rotating anode target disk 31 to rotate. The rotating anode target disk 31 is mounted on the cooling circulation base 32 and is positioned opposite to the outlet of the electron acceleration assembly 2 to generate X-ray photons when bombarded by a focused electron beam. The rotating anode target disk 31 has a microchannel array layer 311 inside that communicates with the flow channel inside the cooling circulation base 32. The microchannel array layer 311 is used to remove the associated heat generated by the bombardment through the cooling medium flowing inside.

[0035] The rotating anode target disk 31 is a high-speed rotating composite target that can disperse the heat load through the movement of the target surface and achieve high heat flux removal in conjunction with the internal heat dissipation structure. Optionally, there can be a certain angle between the target surface normal of the rotating anode target disk 31 and the electron beam transmission direction, such as 6°-20°, so that the focused electron beam bombards the target surface in an oblique incidence manner, while the generated X-ray photons are emitted from the side.

[0036] In this embodiment, when the focused electron beam bombards the surface of the rotating anode target disk 31, X-ray photons can be generated through two mechanisms: first, bremsstrahlung, where electrons decelerate in the Coulomb field of the target atomic nucleus, and some of their kinetic energy is converted into continuous-spectrum bremsstrahlung photons. This process conforms to the differential cross-section law of the Bethe-Heitler formula, and the radiation energy is distributed between zero and the electron kinetic energy; second, characteristic radiation, where electrons with energy higher than the K-shell binding energy of the target atom (approximately 69.5 keV for the K-side of tungsten) eject inner-shell electrons to form vacancies. When outer-shell electrons jump to fill these vacancies, they release discrete-spectrum characteristic X-ray photons (Kα, Kβ lines), with energy obeying Moseley's law (…). The two types of radiation together constitute a high-power X-ray output, with the final source power reaching 20 kW, and the power density being more than 100 times higher than that of a traditional fixed target.

[0037] Specifically, see Figure 1The high-power X-ray source device 100 has a linear layout and can adopt a modular coaxial integrated architecture. Its core components can be coaxially arranged from left to right within a high-vacuum sealed cavity, namely, the electron generation component 1, the electron acceleration component 2, and the X-ray generation component 3. Each module can be precisely docked within the high-vacuum sealed cavity to form a closed-loop system of "electron generation - acceleration and focusing - X-ray conversion - efficient heat dissipation". Among them, the electron generation component 1 includes an electron emission source (such as a glow discharge amplified cold cathode electron gun 12), which is used to generate an initial electron beam based on the field emission principle and achieve avalanche amplification. The inlet of the electron acceleration component 2 is sealed and docked with the outlet of the electron generation component 1 (such as through a metal corrugated tube 4), and the outlet of the electron acceleration component 2 is sealed and docked with the inlet of the X-ray generation component 3 (such as through direct welding), thus forming a straight electron beam transmission path. The electron acceleration component 2 enhances the kinetic energy of electrons through a gradient electric field and confines the beam diameter with the help of a magnetic field. The X-ray generating component 3 adopts a composite heat dissipation design of "rotating anode dispersing heat load + microchannel enhanced heat exchange". Energy conversion is achieved by bombarding the rotating anode target disk 31 with high-energy electrons. At the same time, the composite heat dissipation system removes the associated heat energy in real time to ensure the continuous high-power operation of the system.

[0038] Specifically, the high-power X-ray source device 100 effectively overcomes the performance bottlenecks and application limitations of high-power X-ray sources in related technologies through the following structural innovations and principle optimizations:

[0039] First, the electron generation component 1 abandons the traditional filament heating structure of the hot cathode and adopts a design based on the field emission principle and avalanche multiplication effect, achieving an order-of-magnitude increase in instantaneous electron emission and beam current density at room temperature. This design reduces system energy consumption, extends device lifetime, and optimizes electron beam energy dissipation and emissivity, providing a high-quality electron source for the generation of high-brightness X-rays.

[0040] Secondly, the X-ray generating assembly 3 employs a composite heat dissipation structure combining a rotating anode target disk 31 and a microchannel array layer 311 for medium cooling. Driven by a motor 33, the rotating anode target disk 31 rotates at high speed, dispersing the point-like heat load generated by the focused electron beam bombardment into a ring-shaped distribution. The turbulent cooling medium flowing within the microchannel array layer 311 has an extremely high forced convection heat transfer coefficient, enabling rapid removal of associated heat. This composite heat dissipation design transforms the spatially concentrated distribution of the heat load into a spatiotemporally uniform distribution, significantly improving the heat transfer coefficient and effective heat dissipation area. It effectively overcomes the core contradiction of "power-heat dissipation," avoiding target material melting and thermal stress damage, and achieving a significant increase in power density.

[0041] Furthermore, the electron accelerator assembly 2 employs a synergistic design of a gradient accelerating electric field and an axisymmetric magnetic field. The accelerating electric field, which gradually increases along the electron beam propagation direction, continuously enhances the electron kinetic energy; the axisymmetric magnetic field, which first strengthens and then stabilizes, applies a Lorentz force to the electron beam, causing it to move in a helical path, effectively suppressing beam divergence caused by the space charge effect. This design improves the energy utilization and focusing density of the electron beam, enhancing the X-ray generation efficiency and intensity.

[0042] Finally, based on the above technical solutions, the high-power X-ray source device 100 can achieve a compact design. In one specific embodiment, the overall length of the device can be controlled within 2 meters, enabling the X-ray source to reach a light intensity level close to that of a large synchrotron radiation source. This provides a high-performance, easily accessible, high-throughput X-ray excitation source for desktop spectroscopy applications, high-end industrial detection, trace element analysis, and other fields, while taking into account the application requirements of high power, high stability, and compactness.

[0043] In some embodiments of the present invention, see Figure 1 The electron generating component 1 includes a metal housing 11 and a glow discharge amplified cold cathode electron gun 12 disposed within the metal housing 11. The outlet of the metal housing 11 is sealed and connected to the inlet of the electron accelerating component 2. The glow discharge amplified cold cathode electron gun 12 refers to a room temperature electron emission device that generates initial electrons based on field emission and achieves beam avalanche multiplication through glow discharge.

[0044] like Figure 2 As shown, the glow discharge amplified cold cathode electron gun 12 includes a nano-needle array emitter 121 and a glow discharge chamber 122 arranged sequentially along the electron beam transmission direction. The nano-needle array emitter 121 serves as an electron source that concentrates the electric field and triggers field emission, and is used to generate an initial electron beam based on the field emission principle. The glow discharge chamber 122 is used to amplify the initial electron beam in an avalanche-like manner. The amplified initial electron beam enters the electron acceleration component 2 through the outlet of the metal shell 11.

[0045] Specifically, see Figure 1 The metal outer shell 11 can be fixed to the vacuum chamber end cap 6 via the first flange 5a, and its outlet can be sealed and connected to the inlet of the electron acceleration component 2 via the metal corrugated tube 4. The glow discharge amplified cold cathode electron gun 12, as the core of the electron generation component 1, includes a nano-needle array emitter 121 and a glow discharge chamber 122, which are arranged coaxially along the electron beam transmission direction to realize the function of "electron excitation-beam amplification".

[0046] See Figure 2One end of the glow discharge amplified cold cathode electron gun 12 is tightly attached to the metal casing 11, serving as the starting point for electron emission. A nanoparticle-tip array emitter 121 is fixed thereon. This nanoparticle-tip array emitter 121 includes a conductive substrate 121a and a molybdenum nanoparticle-tip array 121b grown on its surface via chemical vapor deposition. The nanoparticle-tip array emitter 121 adopts a composite structure of "conductive substrate + nanoparticle-tip array". The conductive substrate 121a can be made of oxygen-free copper material with high conductivity. Several molybdenum nanoparticle-tip arrays are grown on its surface via chemical vapor deposition to form the molybdenum nanoparticle-tip array 121b. The cone angle of each molybdenum nanoparticle-tip can be controlled between 30° and 60°, and the radius of curvature of its tip is less than 100 nm. This structure allows the electric field intensity on the surface of the nanoparticle-tip array emitter 121 to be concentrated to 10 nm. 9 -10¹ 0 The value is on the order of V / m, satisfying the quantum tunneling condition for field-induced emission.

[0047] The glow discharge chamber 122 can be a hollow cylindrical structure with a microporous structure on its wall, connected to an external gas path to maintain an optimal glow discharge environment. Specifically, the hollow cylindrical shape has an inner diameter of 10-20 mm and a length of 30-50 mm. The cylinder wall can be made of alumina ceramic material and machined with micropores of 1-2 μm in diameter, allowing 10 μm of gas to be introduced into the chamber through the external gas path. - ²-10 - ¹ Pa of argon or neon gas, upon initial electrons entering the chamber, collides and ionizes with gas molecules, triggering an avalanche multiplication effect that increases the electron beam density by 1-2 orders of magnitude, ultimately forming a stable, high-density electron beam. This process requires no external heat source and is completed entirely at room temperature, with energy efficiency approximately 3 orders of magnitude higher than that of traditional thermionic cathodes. Thus, after the initial electron beam is efficiently emitted from the nanoneedle array emitter 121, it enters the glow discharge chamber 122 for avalanche multiplication, forming a stable, high-intensity initial electron beam, thereby avoiding the preheating delay and energy consumption defects of traditional thermionic cathodes.

[0048] For example, see Figure 2 The glow discharge amplified cold cathode electron gun 12 also includes a gate control network 123, which is disposed between the nanoneedle array emitter 121 and the glow discharge chamber 122 to guide the initial electron beam into the glow discharge chamber 122.

[0049] Specifically, see Figure 2 The nano-needle array emitter 121, the gate control network 123, and the glow discharge chamber 122 are arranged coaxially along the direction of the electron beam to realize the integrated function of "electron excitation-switching control-beam amplification".

[0050] The gate control network 123, adjacent to the molybdenum nanoparticle array 121b, employs a porous structure and is fabricated from a molybdenum sheet by laser etching. This gate control network 123 can be insulated and fixed to the metal casing 11 via ceramic insulators. Specifically, the gate control network 123 can be fabricated from a molybdenum sheet with a thickness of 50-100 μm by laser etching, with a pore size of 10-20 μm and a porosity of 40%-60%. This ensures high electron beam penetration while enabling precise switching control of the initial electron beam emission by applying a 0-5 kV extraction voltage. When a positive extraction voltage is applied, the surface barrier of the molybdenum nanoparticles is compressed to the nanoscale, and electrons near the Fermi level penetrate the barrier and enter the glow discharge chamber 122 according to the tunneling probability of the Fowler-Nordheim equation. When the extraction voltage is cut off, the initial electron beam guidance process immediately terminates, achieving a picosecond-level response speed.

[0051] Compared to not providing the gate control network 123, providing the gate control network 123 has the following advantages:

[0052] First, it achieves precise switching control of electron beam generation with a response speed at the picosecond level. Second, by adjusting the extracted voltage, the intensity and density of the initial electron beam can be flexibly controlled. Third, it avoids beam instability and energy waste caused by the continuous emission of electrons by the nanoneedle array emitter 121 without control. Fourth, it provides a controllable and stable electron beam input for the subsequent avalanche multiplication amplification of the glow discharge chamber 122, thereby significantly improving the control accuracy and operational reliability of the entire electron generation component.

[0053] In some embodiments of the present invention, see Figure 1 The electron acceleration assembly 2 includes a tubular housing 21, a magnetic focusing coil 22, and multiple annular accelerating electrodes 23. The inlet of the tubular housing 21 is sealed to the outlet of the electron generating assembly 1. The multiple annular accelerating electrodes 23 are disposed inside the tubular housing 21 and spaced apart along the electron beam propagation direction to generate a gradient electric field with increasing electric field intensity along the electron beam propagation direction, thereby accelerating the amplified initial electron beam. The magnetic focusing coil 22 is wrapped around the tubular housing 21 and generates an axisymmetric magnetic field along the electron beam propagation direction, with its magnetic field intensity first increasing and then stabilizing, to radially confine the initial electron beam.

[0054] In this embodiment, the electron acceleration component 2 adopts a gradient electric field and magnetic focusing synergistic design. Its core function is to increase the kinetic energy of the electron beam after glow discharge amplification to hundreds of keV and ensure high-density focusing of the beam through magnetic field confinement, providing an energy basis for the efficient generation of subsequent X-rays. Its structure can adopt an integrated design of "tubular shell + ring acceleration electrode + magnetic focusing coil" to achieve synergistic optimization of acceleration and focusing.

[0055] Specifically, the tubular outer shell 21 can be made of oxygen-free copper material, with an inner diameter of 20-30 mm and a length of 500-800 mm. Its inner wall is precision polished to reduce the collision loss between the electron beam and the tube wall. The inlet can be vacuum sealed to the electron generating component 1 through the metal corrugated tube 4, and the outlet can be directly welded to the inlet of the X-ray generating component 3 to achieve a seal. The annular accelerating electrodes 23 are spaced apart inside the tubular shell 21 along the electron beam transmission direction. There can be 8-12 electrodes. The thickness of each electrode can be 5-10 mm, and the spacing between electrodes can be 30-50 mm. The electrode material can be tungsten copper alloy to ensure high conductivity and high temperature resistance. Each annular accelerating electrode 23 is connected to an external DC high voltage power supply through a high voltage lead. The power supply output voltage increases in a gradient along the electron beam transmission direction, forming a gradient accelerating electric field of 0-300 kV. When the electron beam moves along the axial direction in this electric field, the electric field force continuously does work on the electrons, increasing the electron kinetic energy from the initial several keV to hundreds of keV. Finally, the electron beam power reaches an ultra-high power level of ≥50 kW. The magnetic focusing coil 22 can be a water-cooled copper coil, and 4-6 groups can be set up and evenly wrapped around the outside of the tubular shell 21. The number of turns of each group of coils can be 500-800 turns. After passing a DC current of 10-20A, an axial axisymmetric magnetic field is generated. The magnetic field strength is distributed along the electron beam transmission direction in a way that first increases and then stabilizes. Its core function is to constrain the radial divergence of the electron beam through the Lorentz force: when the electron moves in the magnetic field, the Lorentz force provides the centripetal force, causing the electron to move in a spiral, thereby counteracting the beam current expansion caused by the space charge effect, compressing the normalized emittance of the electron beam to below 0.5 mm·mrad, and finally forming a high-density focused electron beam with a diameter ≤1mm, ensuring that the electron beam energy acts efficiently on the target surface of the rotating anode target disk 31.

[0056] In some embodiments of the present invention, see Figure 3 The microchannel array layer 311 is located between the target material layer 312 and the target substrate 313 of the rotating anode target disk 31, and includes multiple parallel microchannels distributed radially or circumferentially along the rotating anode target disk 31.

[0057] For example, the target layer 312 is made of tungsten or molybdenum material and has a thickness of 10 μm-50 μm.

[0058] Specifically, see Figure 3The rotating anode target disk 31 is driven by a drive motor 33 via an alloy steel shaft at its center. The working surface of the rotating anode target disk 31 is coated with a target material layer 312, which is used to withstand electron beam bombardment and generate X-ray photons. Inside the rotating anode target disk 31, directly below the target material layer 312, a microchannel array layer 311 is integrated using precision machining technology. This microchannel array layer 311 can consist of hundreds of parallel microchannels distributed radially or circumferentially along the rotating anode target disk 31. The rotating anode target disk 31 also includes a target disk substrate 313, meaning the rotating anode target disk 31 adopts a three-layer composite structure of "target material layer - microchannel array layer - target disk substrate". The target substrate 313 can be made of oxygen-free copper to ensure high thermal conductivity, with a diameter of 80-120 mm and a thickness of 20-30 mm. The target layer 312 covers the working surface of the target substrate 313 and can be made of tungsten or molybdenum through magnetron sputtering. The thickness is strictly controlled between 10-50 μm. If the thickness is less than 10 μm, the electron beam may penetrate the target layer 312 and bombard the low-melting-point target substrate 313, causing structural damage. If the thickness is greater than 50 μm, the low thermal conductivity of tungsten / molybdenum will cause "thermal blockage", resulting in heat accumulation. The microchannel array layer 311 is integrated inside the target disk substrate 313 below the target material layer 312. Hundreds of parallel microchannels are processed by laser etching. The cross-sectional width of the channels can be 50-200μm (this size range can ensure that the cooling medium is in a transitional or turbulent state, taking into account both flow resistance and heat transfer efficiency). The channels are distributed radially or circumferentially along the rotating anode target disk 31, and the total heat transfer area can reach 0.5-1.0 m². The two ends of the channels are connected to the internal channels of the cooling circulation base 32.

[0059] The cooling circulation base 32 is connected to an external cooling device via a rotary joint 34, a rotary dynamic seal assembly. This allows the cooling medium to flow in from the center of the rotating anode target disk 31 at high speed, filling the entire microchannel array layer 311 and efficiently removing heat before flowing out from the edge of the rotating anode target disk 31. This achieves real-time and efficient removal of ultra-high power density heat loads. The flow direction of the cooling medium is as follows: Figure 3 As indicated by the middle arrow.

[0060] For example, the cooling medium can be deionized water or gallium indium tin liquid metal (thermal conductivity of approximately 30 W / (m·K), which is 60 times that of water), which can pass through the microchannel array layer 311 at a flow rate of 1-10 m / s driven by a high-pressure circulating pump of an external cooling device, achieving a Reynolds number Re of 10³-10⁻¹⁰. 4 Once it enters the turbulent state, the thermal boundary layer is greatly disrupted, and according to the Dittus-Boelter equation, the forced convection heat transfer coefficient h increases to 10. 5With a temperature on the order of W / (m²·K), it is two orders of magnitude better than traditional oil cooling, and can control the peak temperature of the target surface within a safe range of 800-1000℃, thus avoiding target material melting.

[0061] In some embodiments of the present invention, see Figure 1 , Figure 3 The X-ray generating assembly 3 also includes a vacuum chamber 35, a rotating anode target disk 31, a cooling circulation base 32, and a rotary joint 34, all of which are disposed inside the vacuum chamber 35. The drive motor 33 is disposed outside the vacuum chamber 35 and is connected to the rotating anode target disk 31 through a magnetohydrodynamic sealing device 36.

[0062] Specifically, the drive motor 33 can be a high-speed brushless DC motor with a rated speed ≥6000 rpm. Its output shaft passes through the magnetic fluid sealing device 36 into the vacuum chamber 35 and is fixedly connected to the rotating shaft of the rotating anode target disk 31. The magnetic fluid sealing device 36 can ensure the airtightness of the vacuum chamber 35 (vacuum degree ≤10). -4 While achieving stable torque transmission, the electron beam bombardment point forms a ring trajectory on the surface of the target layer 312 when the rotating anode target disk 31 rotates, with a linear velocity of over 31.4 m / s, dispersing the instantaneous concentrated heat load to the entire ring area, reducing the average power density to 1 / 100 of the instantaneous peak value.

[0063] In some embodiments of the present invention, see Figure 1 The X-ray generating assembly 3 also includes an X-ray emission window 37, which is disposed on the side wall of the vacuum chamber 35 and is used to guide X-ray photons to an external experimental station.

[0064] Specifically, the X-ray exit window 37 can adopt a thin beryllium window structure, as beryllium has a low atomic number and low X-ray absorption. The thickness of the beryllium window is controlled between 0.1-0.5 mm; for example, 0.2 mm ensures mechanical strength while reducing the absorption rate of X-rays above 10 keV to less than 5%. Based on the anode tilt angle of the rotating anode target disk 31 (i.e., the angle between the target surface normal of the rotating anode target disk 31 and the electron beam transmission direction, such as 6°-20°), the line connecting the centerline of the X-ray exit window 37 and the target focal point can form an angle of 90°-110° with the electron beam incident direction to maximize X-ray collection efficiency. The X-ray exit window 37 and the sidewall of the vacuum chamber 35 can be sealed with oxygen-free copper or indium wire to ensure a vacuum degree ≤10. -4 Pa. A protective cover or filter slot can be added to the outside to meet different application requirements.

[0065] In some embodiments of the present invention, see Figure 3The rotary joint 34 includes a stationary end 341 and a rotating end 342. The stationary end 341 and the rotating end 342 are sealed and rotatably fitted together. The stationary end 341 is provided with an inlet for connecting to the inlet of an external cooling device and an outlet for connecting to the outlet of an external cooling device. The rotating end 342 is connected to the flow channel in the cooling circulation base 32 and is used to guide the flowing cooling medium into the flow channel and to discharge the returning cooling medium to the stationary end 341.

[0066] Specifically, the cooling circulation base 32 can be made of stainless steel, with its inner side tightly fitted to the target plate base 313, and its outer side connected to an external cooling device via a rotary joint 34. The rotary joint 34 is a core component for dynamic sealing, including a stationary end 341 and a rotating end 342. The stationary end 341 is fixedly connected to the inlet and outlet of the external cooling device, and the rotating end 342 can communicate with the flow channel of the cooling circulation base 32 through the second flange 5b. Its sealing performance can withstand a pressure of 1-5 MPa, ensuring that the cooling medium does not leak when the rotating anode target plate 31 rotates at high speed.

[0067] It should be noted that the specific embodiments of the present invention are not limited to the above-described embodiments. Based on the same inventive concept, the following modifications can also be made: the electron generating component 1 can be replaced by a photoelectric acceleration structure, which generates a pulsed electron beam through laser induction; the rotating anode target disk 31 can be replaced by a high-speed liquid metal jet target, which utilizes high-speed fluid renewal to achieve heat convection removal; the microchannel array layer 311 can be replaced by a porous metal foam structure or heat pipe technology. All of the above modifications are based on the core technical path of "modular high-power electron beam bombardment + enhanced heat dissipation", and can all achieve high-brightness X-ray output.

[0068] The high-power X-ray source device 100 of this invention combines the mechanical motion structure of the rotating anode target disk 31 with the microchannel structure of the microchannel array layer 311, enabling it to withstand power densities two orders of magnitude higher than those of traditional fixed targets (up to 20kW), effectively preventing target material melting and significantly improving heat dissipation performance. Simultaneously, the cold cathode structure eliminates the fragile heating filament, simplifies the internal structure of the electron gun, enables room temperature start-up, extends device lifespan, and features a compact structure, facilitating integration into desktop devices. Furthermore, the structural constraints of the magnetic focusing coil and the ring accelerating electrode ensure efficient electron beam transmission and focusing, resulting in high energy utilization.

[0069] Figure 4 This is a flowchart of a high-power X-ray generation method according to an embodiment of the present invention.

[0070] In this embodiment, the high-power X-ray generation method is used in the high-power X-ray source device 100 of the above embodiment, following the timing logic of "heat dissipation and preheating - electronic excitation - beam amplification - acceleration and focusing - X-ray conversion - continuous heat dissipation".

[0071] like Figure 4 As shown, methods for generating high-power X-rays include:

[0072] S1, the cooling cycle is started by an external cooling device to allow the cooling medium to circulate in the microchannel array layer, and the drive motor is controlled to drive the rotating anode target disk to reach the preset speed.

[0073] Specifically, the external cooling device is activated to start the external cooling circulation system. The high-pressure circulation pump pressurizes the cooling medium (such as deionized water or gallium indium tin liquid metal) to 1-5 MPa. The cooling medium enters the rotating end through the stationary end of the rotary joint, and then flows into the internal flow channel of the cooling circulation base, eventually filling the microchannel array layer of the rotating anode target disk to form a closed loop. At this time, the flow rate of the cooling medium is stable at 1-10 m / s. At the same time, the drive motor is started, and the target disk shaft is driven to rotate through the magnetohydrodynamic sealing device. The motor frequency is controlled to gradually increase the target disk speed to a preset value (such as ≥6000 rpm), and the speed fluctuation is maintained at ≤±1% to ensure the uniformity of heat load distribution. This step lasts for 30-60 seconds until the target disk temperature stabilizes in the range of room temperature to 50°C, preparing for heat dissipation in the subsequent high-power electron beam bombardment.

[0074] S2 controls the electron generation component to generate an initial electron beam based on the field emission principle, and amplifies the initial electron beam through avalanche multiplication.

[0075] Specifically, a positive extraction voltage (3-5kV) is applied to the gate control network of the electron generation component. This voltage is output through a precision high-voltage power supply with a voltage ripple of ≤±0.5%, ensuring the stability of electron emission. Under the strong electric field formed by the extraction voltage, the barrier width on the surface of the nanoneedle array emitter is compressed to the nanoscale. Electrons near the Fermi level penetrate the barrier and enter the glow discharge chamber according to the quantum tunneling effect. The current density of the electron beam entering the glow discharge chamber is 10-100 A / m², and the beam diameter is controlled at 2-3 mm. This process does not require preheating, and the response time from voltage application to electron emission is ≤100 picoseconds, achieving instantaneous start-up.

[0076] 10 pre-filled into the glow discharge chamber - ²-10 - ¹ Argon / neon molecules collide with the high-speed initial electron beam, causing ionization and generating a large number of secondary electrons. These secondary electrons then collide with other gas molecules, creating an avalanche multiplication effect that increases the electron beam density from the initial 10-100 A / m² to 1-10 kA / m², achieving self-sustaining amplification of the electron beam. The microporous structure of the chamber wall maintains the stability of the gas pressure, preventing beam jitter caused by pressure fluctuations, ultimately forming a stable high-density electron beam with a beam uniformity ≥90%.

[0077] S3 controls the electron acceleration component to perform gradient acceleration and radial confinement on the amplified initial electron beam to form a focused electron beam, which bombards the surface of the rotating anode target disk to generate X-ray photons.

[0078] The amplified initial electron beam enters the electron acceleration assembly, where a gradient-distributed high voltage (0-300kV) is applied through a ring-shaped accelerating electrode, forming a gradient accelerating electric field that increases along the direction of the electron beam. Electrons continuously gain kinetic energy in the electric field, eventually reaching an energy of 200-300keV and increasing the electron beam power to ≥50kW. Simultaneously, a 10-20A DC current is passed through the magnetic focusing coil outside the tubular shell, generating an axially symmetric magnetic field. The magnetic field strength reaches its maximum value (0.1-0.2T) in the middle section of the channel. Under the action of the Lorentz force of the magnetic field, the electrons undergo helical motion, and the beam diameter is continuously compressed, ultimately forming a high-density focused electron beam with a diameter ≤1mm and a normalized emittance ≤0.5 mm·mrad, ensuring that the electron energy is concentrated on a small area on the surface of the target material.

[0079] A focused electron beam bombards the target material layer on the surface of a high-speed rotating anode target disk along a coaxial direction. Electrons interact with the target atomic nuclei and inner-shell electrons: on the one hand, electrons decelerate in the Coulomb field of the atomic nuclei, and some of their kinetic energy is converted into continuous-spectrum bremsstrahlung X-rays; on the other hand, electrons with energy higher than the binding energy of the K-shell of the target atoms eject inner-shell electrons, and when outer-shell electrons jump to fill the vacancies, they release characteristic X-rays of a discrete spectrum (Kα line energy of about 59.3 keV for tungsten targets, Kβ line energy of about 67.2 keV). The two types of radiation superimpose to form a high-power X-ray beam. Since the target disk rotates at a high speed of ≥6000 rpm, the electron beam bombardment point moves along a circular trajectory on the surface of the target material layer, avoiding heat accumulation at a single point and providing a structural basis for high-power output. The generated X-ray photons are guided to an external experimental station through a thin beryllium window (thickness 0.1-0.2 mm, X-ray absorption rate ≤5%) on the side of the target disk, realizing the effective utilization of X-ray illumination.

[0080] While electron beam bombardment generates X-rays, over 99% of the electron kinetic energy is converted into heat energy and transferred to the target layer. The heat is then rapidly transferred to the microchannel array layer below via thermal conduction. At this time, the high-speed flowing turbulent cooling medium in the microchannel undergoes intense heat exchange with the channel wall, quickly carrying away the heat. After absorbing heat, the cooling medium's temperature rises by 5-10°C, and it then flows back to the external cooling device through the cooling circulation base channel and rotary joint. After being cooled by the external cooling device's heat dissipation tower or refrigeration unit, it re-enters the circulation. The high-speed rotation of the rotating anode target disk causes the hot spot to sweep rapidly, while the microchannel cooling constructs an isothermal boundary near the target surface. The two work together to form a spatiotemporally coupled thermal self-purification mechanism, strictly controlling the peak temperature of the target surface at 800-1000°C, far below the melting point of tungsten target material at 3422°C. This ensures that the light source can continuously output 20kW-level high-power X-rays for a long time, without damage such as melting or thermal cracking of the target material.

[0081] In summary, the high-power X-ray source device and high-power X-ray generation method of the present invention can achieve the following beneficial effects:

[0082] 1) Power density and output intensity are significantly improved.

[0083] This invention employs a glow discharge amplified cold cathode electron gun as the electron source. Based on the principles of field emission and avalanche multiplication, a high-density electron beam can be generated at room temperature. Combined with a gradient acceleration and magnetic focusing synergistic design of the electron acceleration components, an ultra-high-power electron beam output of ≥50kW is achieved within a 2m-long miniaturized electron accelerator. After the electron beam bombards the rotating anode target disk, high-brightness X-rays are generated through bremsstrahlung and characteristic radiation. The output power density is more than 100 times higher than that of traditional fixed-target schemes, and the photon flux can reach 10-10. 9 The photon flux is on the order of -10¹² photons / s, effectively overcoming the limitation of shot noise on detection sensitivity and providing sufficient photon flux for trace analysis and ultrafast dynamics research.

[0084] 2) Breakthrough in heat dissipation performance, enabling continuous high-power operation

[0085] This invention addresses the core contradiction of "high power - high heat dissipation" through a composite design of the mechanical motion structure of the rotating anode target disk and the microchannel structure of the microchannel array layer, synergistically from two dimensions: spatial dispersion and enhanced heat transfer. The rotating anode rotates at a high speed of ≥6000 rpm, dispersing the point-like heat load generated by electron beam bombardment into a ring-shaped distribution, reducing the average power density to 1 / 100 of the instantaneous peak value. The high-speed turbulent cooling medium (flow velocity 1-10 m / s) within the microchannel array layer achieves forced convection heat transfer, with a heat transfer coefficient reaching 10. 5The target surface peak temperature is controlled within a safe range of 800-1000℃, with a power density on the order of W / (m²·K). This design allows the device to withstand power densities two orders of magnitude higher than traditional fixed targets (up to 20kW), effectively preventing target material melting and achieving continuous, stable, and high-power X-ray output.

[0086] 3) Fast response and long service life

[0087] This invention abandons the traditional hot cathode filament heating structure and adopts the cold cathode field emission principle, generating electrons at room temperature with a response time ≤100 picoseconds. It requires no preheating, significantly reducing system energy consumption and startup delay. Simultaneously, the cold cathode structure eliminates the fragile heating filament, avoiding cathode evaporation and degradation caused by high temperatures, simplifying the internal structure of the electron gun, and extending the device's lifespan. The synergistic design of the rotating anode target disk and the microchannel heat dissipation structure further avoids thermal stress damage and melting risks to the target material, ensuring the long-term reliability of the device.

[0088] 4) High energy utilization and excellent beam quality

[0089] This invention utilizes the synergistic design of a gradient accelerating electric field and an axisymmetric magnetic field in the electron accelerator assembly to achieve gradient acceleration and helical motion constraint of the electron beam, effectively suppressing beam divergence caused by the space charge effect. The diameter of the focused electron beam can be controlled within 1 mm, and the normalized emittance is ≤0.5 mm·mrad, ensuring efficient energy transfer and focusing of the electron beam and improving energy utilization and X-ray generation efficiency.

[0090] 5) Compact structure, easy to integrate and popularize

[0091] This invention employs a modular coaxial integrated architecture, with the electron generation component, electron acceleration component, and X-ray generation component sequentially connected in series within a high-vacuum sealed cavity. The overall structure is compact, with a length of only 2m, achieving miniaturization of a high-power X-ray source. The device's performance approaches the light intensity level of large synchrotron radiation sources, but with significantly reduced size and cost. It can be integrated into desktop equipment, providing a high-performance, easily accessible, high-throughput X-ray excitation foundation for desktop spectroscopic experiments, high-end industrial detection, trace element analysis, and material structure analysis. This effectively promotes the transformation of X-ray sources from large-scale scientific facilities to desktop laboratory applications.

[0092] 6) Strong technological universality and scalability

[0093] The fundamental inventive concept of this invention—namely, the core technical path of "modular high-power electron beam bombardment + enhanced heat dissipation"—has broad technical applicability. The electron generating component can be replaced by a photoelectric acceleration structure to achieve a pulsed electron beam; the rotating anode target disk can be replaced by a high-speed liquid metal jet target to further improve the heat dissipation limit; and the microchannel array layer can be replaced by a porous metal foam structure or heat pipe technology to achieve equivalent heat dissipation performance. All the above variations are equivalent embodiments of this invention and can be flexibly configured according to different application scenarios, exhibiting strong technical scalability and market adaptability.

[0094] In the description of this specification, references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0095] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0096] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0097] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0098] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0099] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A high-power X-ray source device, characterized in that, include: An electron generating component is used to generate an initial electron beam based on the field emission principle and to amplify the initial electron beam through avalanche multiplication. An electron acceleration component, the inlet of which is connected to the outlet of the electron generating component, is used to perform gradient acceleration and radial confinement on the amplified initial electron beam to form a focused electron beam; The X-ray generating assembly includes a rotating anode target disk, a cooling circulation base, a drive motor, and a rotary joint. The flow channels within the cooling circulation base are sealed and connected to an external cooling device through the rotary joint. The drive motor drives the rotating anode target disk to rotate. The rotating anode target disk is mounted on the cooling circulation base and is positioned opposite to the outlet of the electron acceleration assembly to generate X-ray photons upon receiving bombardment from the focused electron beam. The rotating anode target disk has a microchannel array layer inside that communicates with the flow channels within the cooling circulation base. The microchannel array layer is used to remove the associated heat generated by the bombardment through a cooling medium flowing inside.

2. The high-power X-ray source device according to claim 1, characterized in that, The electron generating component includes a metal housing and a glow discharge amplified cold cathode electron gun disposed within the metal housing, wherein the outlet of the metal housing is sealed and connected to the inlet of the electron acceleration component. The glow discharge amplified cold cathode electron gun includes a nano-tip array emitter and a glow discharge chamber arranged sequentially along the electron beam transmission direction. The nano-tip array emitter is used to generate the initial electron beam based on the field emission principle. The glow discharge chamber is used to amplify the initial electron beam in an avalanche multiplication manner. The amplified initial electron beam enters the electron acceleration component through the outlet of the metal shell.

3. The high-power X-ray source device according to claim 2, characterized in that, The glow discharge amplified cold cathode electron gun also includes a gate control network, which is disposed between the nanoneedle array emitter and the glow discharge chamber to guide the initial electron beam into the glow discharge chamber.

4. The high-power X-ray source device according to claim 1, characterized in that, The electron acceleration assembly includes a tubular housing, a magnetic focusing coil, and multiple annular accelerating electrodes. The inlet of the tubular housing is sealed and connected to the outlet of the electron generating assembly. The plurality of annular accelerating electrodes are disposed inside the tubular shell and are spaced apart along the electron beam transmission direction to generate a gradient electric field with an increasing electric field intensity along the electron beam transmission direction, so as to accelerate the amplified initial electron beam by gradient. The magnetic focusing coil, enclosed in the tubular outer shell, is used to generate an axisymmetric magnetic field along the electron beam propagation direction, which first increases in magnetic field strength and then stabilizes, in order to radially constrain the initial electron beam.

5. The high-power X-ray source device according to claim 1, characterized in that, The microchannel array layer is located between the target material layer and the target substrate of the rotating anode target disk, and includes multiple parallel microchannels distributed radially or circumferentially along the rotating anode target disk.

6. The high-power X-ray source device according to claim 1, characterized in that, The X-ray generating assembly also includes a vacuum chamber. The rotating anode target, the cooling circulation base, and the rotary joint are all disposed within the vacuum chamber. The drive motor is disposed outside the vacuum chamber and is driven and connected to the rotating anode target through a magnetohydrodynamic sealing device that passes through the vacuum chamber.

7. The high-power X-ray source device according to claim 6, characterized in that, The X-ray generating assembly also includes an X-ray emission window, which is disposed on the side wall of the vacuum cavity and is used to guide the X-ray photons to an external experimental station.

8. The high-power X-ray source device according to claim 1, characterized in that, The rotary joint includes a stationary end and a rotating end, wherein the stationary end and the rotating end are sealed and rotatably coupled. The stationary end is provided with an inlet for connecting to the inlet of the external cooling device and an outlet for connecting to the outlet of the external cooling device; the rotating end is connected to the flow channel in the cooling circulation base, and is used to guide the flowing cooling medium into the flow channel and to export the returning cooling medium to the stationary end.

9. The high-power X-ray source device according to claim 5, characterized in that, The target layer is made of tungsten or molybdenum and has a thickness of 10μm-50μm.

10. A method for generating high-power X-rays, characterized in that, The method for a high-power X-ray source apparatus as described in any one of claims 1 to 9 comprises: The external cooling device is used to start the cooling cycle so that the cooling medium can circulate in the microchannel array layer, and the drive motor is controlled to drive the rotating anode target disk to a preset speed. The electron generating component is controlled to generate an initial electron beam based on the field emission principle, and the initial electron beam is amplified by avalanche multiplication. The electron acceleration component is controlled to perform gradient acceleration and radial confinement on the amplified initial electron beam to form a focused electron beam, which bombards the surface of the rotating anode target disk to generate X-ray photons.

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