Deposition method and apparatus

By using an indirect transfer method and combining a transfer plate with a heat supply device, the problems of long process time and misalignment of patterns in thermally induced deposition were solved, achieving efficient and accurate functional material deposition.

CN122138909APending Publication Date: 2026-06-02FRONTEK HOLDINGS LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
FRONTEK HOLDINGS LTD
Filing Date
2024-09-12
Publication Date
2026-06-02

AI Technical Summary

Technical Problem

In existing thermally induced deposition techniques, when functional materials are directly transferred from the donor plate to the target surface, there are problems such as long processing time and misalignment and pattern distortion caused by shear force during high-resolution pattern deposition.

Method used

An indirect transfer method is adopted, in which functional materials are indirectly transferred from the donor plate to the target surface through a transfer plate. The positioning of the transfer plate and the heat supply equipment are used to achieve accurate deposition of functional materials, avoiding the influence of shear force during direct transfer.

Benefits of technology

It achieves higher throughput and more efficient functional material deposition, reduces process time, and improves the accuracy and consistency of high-resolution patterns.

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Abstract

Deposition Method and Apparatus. This paper provides an improved deposition method for depositing a functional material (FM) onto a target surface (TS) of a target (T). The method includes: providing (S1) a functional material type (FM') of the functional material (FM) to a donor plate surface (21s) of a donor plate (21); supplying heat (S2) to the donor plate surface to expel the functional material type (FM') from the donor plate surface; characterized in that: receiving (S3) the expelled functional material type (FM') on a transfer surface (41s) of a transfer plate (41); and supplying heat (S4) to the transfer surface (41s) of the transfer plate (41) to transfer the functional material type (FM') thereby depositing it onto the target surface (TS) of the target (T). An improved deposition system and a recording medium are also provided, the recording medium containing a computer program having instructions for performing the method.
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