An anti-glare glass and a method of manufacturing the same

Abstract

The present application relates to a kind of anti-glare glass and its manufacturing method, anti-glare glass includes glass substrate, scattering surface is provided on the first surface of glass substrate, scattering surface is by the first concave-convex particle layer and the second concave-convex particle layer of mutual overlap, second concave-convex particle layer is on the surface of first concave-convex particle layer, first concave-convex particle layer is by multiple first concave-convex units periodically arranged on the first surface of glass substrate, first concave-convex unit is by the first convex part and the first concave part of mutual arrangement, second concave-convex particle layer is by multiple second concave-convex units distributed on the surface of each first concave-convex unit, second concave-convex unit is by the second convex part and the second concave part of mutual arrangement. It not only can solve AG flicker problem, and can effectively improve the scattering effect of scattering surface, improve the uniformity of pixel luminous intensity at different angles, to solve with the change of viewing screen angle display picture appears color spot, color change and other problems.

Description

Technical Field

[0001] This invention relates to the field of glass products technology, specifically to an anti-glare glass and its manufacturing method. Background Technology

[0002] To achieve anti-glare (AG) effects in monitors, reduce light pollution, improve visual comfort, and enhance the tactile feel of the monitor surface, anti-glare glass can be used. This anti-glare glass undergoes a special treatment to transform its surface from a smooth mirror to a grainy, diffusing surface, thus eliminating specular reflections. However, when the monitor's resolution is high, the light emitted by different primary color sub-pixels (such as R, G, and B sub-pixels) may be affected by the random refraction of these grainy particles. When displaying certain images (especially mid-grayscale or monochrome images), randomly distributed and flickering color noise may occur; this phenomenon is known in the industry as AG flicker (AGSparkle).

[0003] Currently, to address the AG flickering problem, some have proposed reducing the size of the coarse particles, so that each primary color subpixel corresponds to more coarse particles to achieve a uniform effect. However, after reducing the size of the coarse particles, the scattering effect of the scattering surface will also be significantly reduced. Others have proposed solutions for patterned AG, such as... Figure 1 As shown, photoresist is pre-coated onto the glass surface of the display. A patterned barrier film 01 is formed through exposure and development. Subsequently, the surface is etched to form patterned rough particles 02. These rough particles 02 are periodically arranged and overlapped with each primary color sub-pixel 03 (e.g., R, G, B sub-pixels) (e.g., each sub-pixel 03 overlaps with several rough particles 02) to reduce AG flicker caused by random refraction of light emitted from the pixel by the rough particles 02. However, in this patterned AG solution, due to limitations in pattern precision, a sub-pixel 03 can only overlap with a small number (e.g., 1-5) of rough particles 02. This results in inconsistent light intensity at different angles after refraction by these rough particles 02. Therefore, as the viewing angle of the display screen changes, problems such as color spots and color variations can still easily appear on the displayed image. Summary of the Invention

[0004] The technical problem to be solved by this invention is to provide an anti-glare glass and its manufacturing method, which not only solves the AG flicker problem, but also effectively improves the scattering effect of the scattering surface and enhances the uniformity of pixel emission intensity at different angles, thereby solving problems such as color spots and color changes in the displayed image as the viewing angle changes. The technical solution adopted is as follows: An anti-glare glass includes a glass substrate, characterized in that: a scattering surface is provided on a first surface of the glass substrate, the scattering surface being composed of an overlapping first and second concave-convex particle layer, the second concave-convex particle layer being located on the surface of the first concave-convex particle layer, the first concave-convex particle layer being composed of a plurality of first concave-convex units periodically arranged on the first surface of the glass substrate, the first concave-convex unit being composed of alternating first protrusions and first concave portions, the second concave-convex particle layer being composed of a plurality of second concave-convex units distributed on the surface of each first concave-convex unit, the second concave-convex unit being composed of alternating second protrusions and second concave portions, the size of the second protrusion and the depth of the second concave portion being smaller than the size of the first protrusion and the depth of the first concave portion.

[0005] Generally, the size of the second protrusion and the depth of the second recess are much smaller than the size of the first protrusion and the depth of the first recess. As a preferred embodiment of the present invention, the size of the first protrusion and the depth of the first recess are 10 to 100 μm, the size of the second protrusion and the depth of the second recess are 0.5 to 5 μm, and the surface of the first concave-convex unit is uniformly covered by a plurality of second concave-convex units.

[0006] In the aforementioned anti-glare glass, the glass substrate can be transparent ordinary glass or tempered glass, with a thickness generally ranging from 0.1 to 5 mm. The first and second uneven particle layers refer to surfaces with a granular texture and uneven morphology (which can be considered as a morphology composed of numerous tiny bumps and depressions). Multiple first uneven units constituting the first uneven particle layer are arranged periodically. Generally, their shape can be random and uncertain, but their positions on the scattering surface are periodically arranged. For example, when the anti-glare glass is used in conjunction with a display, its multiple first uneven units are arranged in a periodic pattern consistent with or multiples of the sub-pixels of that display in the X and Y directions. The size of the second protrusion and the depth of the second concave are much smaller than the size of the first protrusion and the depth of the first concave, and they are distributed on the surface of each first uneven unit, making the surface of each first uneven unit a rougher surface with lower roughness.

[0007] When this anti-glare glass is placed in front of the monitor, the first concave-convex particle layer can make the scattering surface have a high roughness, which has a significant scattering effect on ambient light, ensuring that it can reduce light pollution, improve visual comfort, and improve the tactile feel of the monitor surface. At the same time, since the multiple first concave-convex units constituting the first concave-convex particle layer are arranged periodically, they can overlap with each sub-pixel of the monitor, so that each sub-pixel corresponds to the same number of first concave-convex units. This avoids some sub-pixels corresponding to more first concave-convex units and some sub-pixels corresponding to fewer first concave-convex units, thereby reducing the AG flicker problem caused by random refraction of pixel light by rough particles. Moreover, since the multiple second protrusions and second concavities constituting the second concave-convex particle layer can make the surface of each first concave-convex unit a rougher surface with lower roughness, it has a more uniform distribution at all angles when refracting and scattering the light emitted by the pixel, improving the uniformity of the intensity of pixel light emitted at different angles. This can solve the problems of color spots and color changes in the display screen as the viewing angle changes.

[0008] The present invention also provides a method for manufacturing anti-glare glass, characterized by comprising the following steps: S1. Provide a glass substrate, and provide a barrier film on the first surface of the glass substrate; S2. Pattern the barrier film to form micron-scale periodically arranged blocking and hollowed-out areas on the barrier film. S3. The first surface of the glass substrate is etched using a high-flowability etchant. The high-flowability etchant can only be etched into the cut-out portion of the barrier film due to the obstruction of the barrier film, so as to form a plurality of first recesses on the first surface of the glass substrate. Then, the barrier film is peeled off and a plurality of first protrusions are formed by lateral erosion through each first recess. At this time, the first recesses and the first protrusions are arranged alternately to form a first concave-convex unit. Each first concave-convex unit is arranged periodically on the first surface of the glass substrate to form a first concave-convex particle layer. S4. The first uneven particle layer is etched using a low-flow etchant. Due to the low flowability and low permeability of the low-flow etchant, it only acts on the shallow surface of the first uneven unit. Multiple second uneven units are formed on the surface of each first uneven unit to form a second uneven particle layer. The second uneven unit is composed of alternating second convex parts and second concave parts. The size of the second convex part and the depth of the second concave part are smaller than the size of the first convex part and the depth of the first concave part. The overlapping first uneven particle layer and second uneven particle layer form a scattering surface.

[0009] In the above-mentioned method for manufacturing anti-glare glass, in steps S1-S2, a barrier film is first set on the first surface of the glass substrate, and then the barrier film is patterned. The resulting pattern includes micron-level periodically arranged blocking parts and hollowed-out parts, so that they overlap with each sub-pixel of a display, so that each sub-pixel corresponds to the same number of first concave-convex units. In steps S3-S4, a method of etching using high-fluidity etchants and low-fluidity etchants with different fluidities is proposed to successfully etch first convex and second convex parts of different sizes and first concave and second concave parts of different depths, forming a first concave-convex particle layer and a second concave-convex particle layer that are superimposed to form a scattering surface. Among them, the first concave-convex particle layer is formed by etching the first surface of the glass substrate with a high-fluidity etchant and forming multiple first concave and multiple first convex parts according to the patterned barrier layer. It has a designable periodicity and can be used on the glass substrate. The first surface of the glass substrate is formed with a plurality of periodically arranged first concave-convex units, which can be interlocked with each sub-pixel of the display. The second concave-convex particle layer is formed by etching the first concave-convex particle layer with a low-flow etchant. Based on the low flowability of the low-flow etchant, a smaller second concave-convex unit can be formed on the surface of each first concave-convex unit. The second concave-convex unit is composed of alternating second protrusions and second concavities. The size of the second protrusion and the depth of the second concavity are smaller than the size of the first protrusion and the depth of the first concavity, so that the surface of each first concave-convex unit is a rougher surface with lower roughness, which makes the scattering surface have a better scattering effect. When refracting and scattering the light emission of the pixel, it has a more uniform distribution at all angles, which improves the uniformity of the intensity of the pixel light emission at different angles and can solve the problems of color spots and color changes in the display screen as the viewing angle changes.

[0010] As a preferred embodiment of the present invention, the barrier film in step S1 is a silicon nitride (Si3N4) thin film. It can be formed by deposition on the surface of a glass substrate through methods such as PVD and CVD, and its thickness is generally controlled to be about 1 μm; the silicon nitride thin film can effectively block the front etching of highly fluid etchants (such as hydrofluoric acid).

[0011] To form micron-level patterns, in a preferred embodiment of the present invention, in step S2, the barrier film is patterned using a photolithography process. The photolithography process includes: first, coating the barrier film surface with photoresist; then, exposing it with a mask having a micron-level pattern; then developing and etching the barrier film; finally, removing the photoresist to form hollow and masking areas on the barrier film. The mask is pre-patterned with a pattern including periodically arranged masking and hollow areas at the micron level. Through the photolithography patterning process, this pattern is finally transferred onto the barrier film. The pattern can be a mesh pattern (such as a hexagonal mesh with hollow areas at the mesh openings) or a dot matrix pattern (such as a hexagonal dot matrix with each dot masking an area). The mesh spacing or dot spacing can be 10–100 μm. When the barrier film is a silicon nitride thin film, it can be wet-etched with phosphoric acid (H3PO4) or dry-etched with plasma of fluorine-based gases (CF4, CHF4, SF3, NF6, etc.).

[0012] As a preferred embodiment of the present invention, in step S3, the high-fluidity etchant is a hydrofluoric acid or buffered ammonium bifluoride aqueous solution (such as a solution prepared by mixing ammonium bifluoride and hydrofluoric acid in a certain proportion). Because the aqueous solution has extremely high fluidity and permeability, it can pre-etch into the glass substrate surface from the cut-out portion to form a first recess, followed by transverse etching from the recess, ultimately causing the barrier film to peel off and form a first convex portion. The first recess and the first convex portion are arranged alternately to form a first concave-convex unit.

[0013] As a further preferred embodiment of the present invention, the viscosity of the high-flowability etchant is no higher than 5 centipoise. This ensures that it has sufficient flowability and penetration.

[0014] In a preferred embodiment of the present invention, the low-flow etchant in step S4 is a paste-like etchant. Specifically, the low-flow etchant can be a paste with ammonium fluoride or ammonium bifluoride as the main component. To form a paste-like texture, hydrochloric acid, water, and starch or powdered cryolite are generally added as thickeners and additives. In step S4, the low-flow etchant can be coated or printed over a large area onto the first surface of the glass substrate, and then removed by cleaning after a certain period of time, thereby forming the desired second uneven particle layer.

[0015] Different sizes of second protrusions and different depths of second recesses can be formed by adjusting the viscosity of the low-flow etchant. As a preferred embodiment of the invention, the viscosity of the low-flow etchant is not less than 30,000 centipoise. This ensures that the low-flow etchant has low flowability, so that the size of the second protrusion and the depth of the second recess do not exceed 5 μm.

[0016] The present invention also provides another method for manufacturing anti-glare glass, characterized by comprising the following steps: S1. Provide a glass substrate, and provide an etching barrier film on the first side of the glass substrate; S2. A patterned photoresist layer is disposed on the barrier film, the photoresist layer having a periodically arranged blocking area and a hollow area at the micron level; S3. A low-flow etchant is applied to the first surface of the glass substrate. The low-flow etchant can only etch into the hollow area of ​​the photoresist layer under the obstruction of the photoresist layer. It then etches away the barrier film and the shallow surface of the glass substrate in sequence. The photoresist layer is then removed. The remaining barrier film replicates the micron-scale periodic arrangement of the obstruction area and the hollow area of ​​the photoresist layer. The barrier film forms obstruction and hollow areas, and the glass substrate surface exposed by the hollow areas forms a preliminary uneven morphology. S4. A high-flowability etchant is used to etch the first surface of the glass substrate. The high-flowability etchant can only etch into the cut-out portion of the barrier film due to the obstruction of the barrier film, so as to form multiple first recesses on the first surface of the glass substrate. Then, lateral erosion is performed through the first recesses to peel off the barrier film and form first protrusions. The first recesses and first protrusions are arranged alternately to form a first concave-convex unit. Each first concave-convex unit is arranged periodically on the first surface of the glass substrate to form a first concave-convex particle layer. During this process, the initial concave-convex morphology will spread to the first concave-convex particle layer and a second concave-convex unit will be distributed on the surface of each first concave-convex unit, thereby forming a second concave-convex particle layer superimposed on the first concave-convex particle layer. The first concave-convex particle layer and the second concave-convex particle layer constitute a scattering surface.

[0017] In the above-mentioned method for manufacturing anti-glare glass, in steps S1-S2, a barrier film is first set on the first surface of the glass substrate, and then a patterned photoresist layer is set on the barrier film. The pattern of the photoresist layer includes micron-sized periodically arranged blocking areas and hollow areas, so that they overlap with each sub-pixel of a display, so that each sub-pixel corresponds to the same number of first concave-convex units. In step S3, the patterning of the barrier film is achieved by using a low-flow etchant that can etch into the hollow areas of the photoresist layer under the obstruction of the blocking areas. This allows the pattern of the barrier film to replicate the micron-sized periodically arranged blocking areas and hollow areas of the photoresist layer, forming corresponding blocking and hollow areas. The shallow surface of the glass substrate is etched away through the hollow areas of the barrier film, forming a preliminary concave-convex morphology on the glass substrate surface exposed by the hollow areas of the barrier film. In step S4, based on the high flowability of the high-flow etchant, and in conjunction with the hollow areas of the barrier film, a pattern is formed on the first surface of the glass substrate. Multiple first concave portions are formed, and then lateral erosion is performed through the first concave portions to peel off the barrier film and form first convex portions. Each first concave portion and each first convex portion forms a number of periodically arranged first concave-convex units, thereby forming a first concave-convex particle layer on the first surface of the glass substrate. During this process, the initial concave-convex morphology will spread to the first concave-convex units and form multiple second concave-convex units on the surface of each first concave-convex unit, thereby forming a second concave-convex particle layer superimposed on the first concave-convex particle layer to form a scattering surface. The second concave-convex units can have smaller sizes and are distributed on the surface of each first concave-convex unit, so that the surface of each first concave-convex unit has a certain roughness, so that the scattering surface has a better scattering effect. When refracting and scattering the light emission of the pixels, there is a more uniform distribution at all angles, which improves the uniformity of the intensity of the pixel light emission at different angles and can solve the problems of color spots and color changes in the display screen as the viewing angle changes.

[0018] As a preferred embodiment of the present invention, the barrier film in step S1 is a silicon nitride (Si3N4) thin film. It can be formed by deposition on the surface of a glass substrate through methods such as PVD and CVD, and its thickness is generally controlled to be about 1 μm; the silicon nitride thin film can effectively block the front etching of highly fluid etchants (such as hydrofluoric acid).

[0019] In a preferred embodiment of the present invention, in step S2, the photoresist layer is formed by photoresist coated on the surface of a barrier film, which is exposed using a micron-scale patterned mask and then developed. The mask is pre-formed with a pattern including micron-scale periodically arranged blocking areas and cutout areas. Through the above process, the pattern is finally transferred onto the photoresist layer. The pattern can be a mesh pattern (such as a hexagonal mesh with cutout areas at the mesh openings) or a dot matrix pattern (such as a hexagonal dot matrix with each dot blocking an area). The mesh spacing or dot spacing can be 10–100 μm.

[0020] In a preferred embodiment of the present invention, in step S3, the low-flow etchant is a paste-like etchant. Specifically, the low-flow etchant can be a paste with ammonium fluoride or ammonium bifluoride as the main component. To form a paste-like texture, hydrochloric acid, water, and starch or powdered cryolite are generally added as thickeners and additives. The low-flow etchant can be coated or printed over a large area on the first surface of the glass substrate and then removed by cleaning after a certain period of time. When the barrier film is silicon nitride (Si3N4), although the etching rate of the low-flow etchant with ammonium fluoride or ammonium bifluoride as the main component is low, by extending its etching time and increasing the etching temperature, it can still etch a barrier film with a thickness of about 1 μm through the cutout positions of the photoresist layer, and further form a preliminary uneven surface on the shallow surface of the glass substrate.

[0021] The size of the second uneven unit can be adjusted by changing the viscosity of the low-flowability etchant. In a preferred embodiment of the invention, the viscosity of the low-flowability etchant is not less than 30,000 centipoise. This ensures that the low-flowability etchant has low flowability, so that the size of the second uneven unit does not exceed 5 μm.

[0022] In a preferred embodiment of the present invention, the high-flowability etchant in step S5 is a hydrofluoric acid or buffered ammonium bifluoride aqueous solution (such as a solution prepared by mixing ammonium bifluoride and hydrofluoric acid in a certain proportion). Because the aqueous solution has extremely high fluidity and permeability, it can pre-etch into the glass substrate surface from the cutout portion to form a first recess, followed by lateral etching from the recess, ultimately causing the barrier film to peel off and form a first convex portion, thus forming a first concave-convex particle layer composed of the first concave-convex units. In the above process, the initial concave-convex morphology extends onto the first concave-convex units to form a second concave-convex unit superimposed thereon, thereby forming a second concave-convex particle layer superimposed on the first concave-convex particle layer.

[0023] Compared with the prior art, the present invention has the following advantages: The anti-glare glass and its manufacturing method provided by this invention can not only solve the AG flicker problem, but also effectively improve the scattering effect of the scattering surface and improve the uniformity of pixel emission intensity at different angles, thereby solving problems such as color spots and color changes in the display image as the viewing angle changes. Attached Figure Description

[0024] Figure 1 This is a schematic diagram showing how light from different primary color sub-pixels in a patterned AG solution proposed in the prior art is emitted in different directions after being refracted by these rough particles.

[0025] Figure 2This is a schematic diagram of light scattering by the anti-glare glass provided in the preferred embodiment of the present invention.

[0026] Figure 3 This is a schematic diagram of steps S1-S4 in the manufacturing method provided in the preferred embodiment of the present invention.

[0027] Figure 4 yes Figure 3 The diagram shows the structure of the barrier membrane in step S2.

[0028] Figure 5 This is a schematic diagram of steps S1-S4 in the manufacturing method provided in the preferred embodiment of the present invention. Detailed Implementation

[0029] Example 1: As Figures 2-4 As shown, the anti-glare glass 100 provided in this embodiment includes a glass substrate 1. A scattering surface 2 is provided on the first surface of the glass substrate 1. The scattering surface 2 is composed of a first concave-convex particle layer 21 and a second concave-convex particle layer 22 that overlap each other. The second concave-convex particle layer 22 is located on the surface of the first concave-convex particle layer 21. The first concave-convex particle layer 21 is composed of a plurality of first concave-convex units 211 periodically arranged on the first surface of the glass substrate 1. The first concave-convex unit 211 is composed of alternating first protrusions 2111 and first concave portions 2112. The second concave-convex particle layer 22 is composed of a plurality of second concave-convex units 221 distributed on the surface of each first concave-convex unit 211. The second concave-convex unit 221 is composed of alternating second protrusions 2211 and second concave portions 2212. The size of the second protrusion 2211 and the depth of the second concave portion 2212 are both smaller than the size of the first protrusion 2111 and the depth of the first concave portion 2112.

[0030] In this embodiment, the glass substrate 1 is transparent ordinary glass or tempered glass with a thickness of 0.1 to 5 mm.

[0031] In this embodiment, the size of the first protrusion 2111 and the depth of the first recess 2112 are 10–100 μm, and the size of the second protrusion 2211 and the depth of the second recess 2212 are 0.5–5 μm. The surface of the first protrusion-recession unit 211 is uniformly covered by multiple second protrusion-recession units 221. The size of the second protrusion 2211 and the depth of the second recess 2212 are much smaller than the size of the first protrusion 2111 and the depth of the first recess 2112. They are distributed on the surface of each first protrusion-recession unit 211, making the surface of each first protrusion-recession unit 211 a rougher surface with lower roughness.

[0032] When this anti-glare glass 100 is placed in front of the display, the first uneven particle layer 21 can give the scattering surface 2 a high roughness, which has a significant scattering effect on ambient light, ensuring that it can reduce light pollution, improve visual comfort, and improve the tactile feel of the display surface. Meanwhile, since the multiple first uneven units 211 constituting the first uneven particle layer 21 are arranged periodically, for example, when the anti-glare glass 100 is used with a certain display, its multiple first uneven units 211 and the sub-pixels 200 of the display are arranged in a periodic pattern consistent with or multiples thereof in the X and Y directions, it can overlap with each sub-pixel 200 of the display, so that each sub-pixel 200... The number of first concave-convex units 211 corresponds to the same number of sub-pixels 200, avoiding the situation where some sub-pixels 200 correspond to more first concave-convex units 211 and some sub-pixels 200 correspond to fewer first concave-convex units 211. This reduces the AG flicker problem caused by random refraction of pixel light by rough particles. Moreover, since the multiple second protrusions 2211 and second concaves 2212 constituting the second concave-convex particle layer 22 can make the surface of each first concave-convex unit 211 a rougher surface with lower roughness, it has a more uniform distribution at all angles when refracting and scattering the light emitted by the pixel. This improves the uniformity of the intensity of pixel light emitted at different angles and can solve the problems of color spots and color changes that easily appear on the display screen as the viewing angle changes.

[0033] The manufacturing method of the anti-glare glass 100 provided in this embodiment includes the following steps: S1. Provide a glass substrate 1, and provide a barrier film 3 on the first surface of the glass substrate 1; S2. Pattern the barrier film 3 to form micron-scale periodically arranged blocking portions 31 and hollow portions 32 on the barrier film 3. S3. The first surface of the glass substrate 1 is etched using a high-flowability etchant 4. The high-flowability etchant 4 can only be etched into the cutout portion 32 of the barrier film 3 under the obstruction of the shielding portion 31, so as to form a plurality of first recesses 2112 on the first surface of the glass substrate 1. Then, the barrier film 3 is peeled off and a plurality of first protrusions 2111 are formed by transverse erosion through each first recess 2112. At this time, the first recesses 2112 and the first protrusions 2111 are arranged alternately to form a first concave-convex unit 211. Each first concave-convex unit 211 is arranged periodically on the first surface of the glass substrate 1 to form a first concave-convex particle layer 21. S4. The first uneven particle layer 21 is etched using a low-flow etchant 5. Due to the low flowability and low permeability of the low-flow etchant 5, it only acts on the shallow surface of the first uneven unit 211. Multiple second uneven units 221 are formed on the surface of each first uneven unit 211 to form a second uneven particle layer 22. The second uneven unit 221 is composed of alternating second protrusions 2211 and second concave portions 2212. The size of the second protrusion 2211 and the depth of the second concave portion 2212 are smaller than the size of the first protrusion 2111 and the depth of the first concave portion 2112. The overlapping first uneven particle layer 21 and second uneven particle layer 22 form a scattering surface 2.

[0034] In the manufacturing method of the anti-glare glass 100 described above, in steps S1-S2, a barrier film 3 is first formed on the first surface of the glass substrate 1, and then the barrier film 3 is patterned. The formed pattern includes micron-level periodically arranged blocking portions 31 and hollow portions 32, so that they overlap with each sub-pixel 200 of a display, so that each sub-pixel 200 corresponds to the same number of first concave-convex units 211; in steps S3-S4, it is proposed to use a high-fluidity etchant 4 and a low-fluidity etchant 5 with different fluidity to perform etching. The etching method successfully etched first protrusions 2111 and second protrusions 2211 of different sizes, and first recesses 2112 and second recesses 2212 of different depths, forming a first concave-convex particle layer 21 and a second concave-convex particle layer 22 that are superimposed to form a scattering surface 2. The first concave-convex particle layer 21 is formed by etching the first surface of the glass substrate 1 with a high-flowability etchant 4, and by forming multiple first recesses 2112 and multiple first protrusions 2111 according to a patterned barrier layer. It has a designable periodicity and can be used on glass substrates. The first surface of the glass substrate 1 is formed with a plurality of periodically arranged first concave-convex units 211, which can be interlocked with each sub-pixel 200 of the display. The second concave-convex particle layer 22 is formed by etching the first concave-convex particle layer 21 with a low-flow etchant 5. Based on the low flow of the low-flow etchant 5, a smaller second concave-convex unit 221 can be formed on the surface of each first concave-convex unit 211. The second concave-convex unit 221 is composed of alternating second protrusions 2211 and second concavities 2212. The size of the second protrusion 2211 and the depth of the second concavity 2212 are smaller than the size of the first protrusion 2111 and the depth of the first concavity 2112, so that the surface of each first concave-convex unit 211 is a rougher surface with lower roughness, so that the scattering surface 2 has a better scattering effect. When refracting and scattering the light emission of the pixel, it has a more uniform distribution at all angles, which improves the uniformity of the intensity of the pixel light emission at different angles and can solve the problems of color spots and color changes in the display screen as the viewing angle changes.

[0035] In this embodiment, in step S1, the barrier film 3 is a silicon nitride (Si3N4) thin film. It can be formed by depositing a film on the surface of the glass substrate 1 through methods such as PVD and CVD, and its thickness is generally controlled to be about 1 μm; the silicon nitride thin film can effectively block the front etching of highly fluid etchant 4 (such as hydrofluoric acid).

[0036] To form micron-level patterns, in this embodiment, in step S2, a photolithography process is used to pattern the barrier film 3. The photolithography process includes: first, coating the surface of the barrier film 3 with photoresist; then, exposing it with a mask having a micron-level pattern; then developing and etching the barrier film 3; removing the photoresist to form cutouts 32 and masking portions 31 on the barrier film 3. The mask is pre-formed with a pattern including periodically arranged masking portions 31 and cutouts 32 at the micron level. Through the photolithography patterning process, the pattern is finally transferred onto the barrier film 3. The pattern can be a mesh pattern (such as a hexagonal mesh with cutouts 32 at the mesh openings) or a dot matrix pattern (such as a hexagonal dot matrix with each dot masking portion 31). The mesh spacing or dot spacing can be 10–100 μm. When the barrier film 3 is a silicon nitride thin film, it can be wet-etched with phosphoric acid (H3PO4) or dry-etched with plasma of fluorine-based gases (CF4, CHF4, SF3, NF6, etc.).

[0037] In this embodiment, in step S3, the high-flowability etchant 4 is a hydrofluoric acid or buffered ammonium bifluoride aqueous solution (such as a solution prepared by ammonium bifluoride and hydrofluoric acid in a certain proportion). Due to the extremely high fluidity and permeability of the aqueous solution, it can be pre-etched into the surface of the glass substrate 1 from the cutout portion 32 to form a first recess 2112, and then etched laterally from the recess, eventually causing the barrier film 3 to peel off to form a first protrusion 2111. The first recess 2112 and the first protrusion 2111 are arranged alternately to form a first concave-convex unit 211.

[0038] In this embodiment, the viscosity of the high-flowability etchant 4 is no higher than 5 centipoise. This ensures that it has sufficient flowability and penetration.

[0039] In this embodiment, in step S4, the low-flow etchant 5 is a paste-like etchant. Specifically, the low-flow etchant 5 can be a paste with ammonium fluoride or ammonium bifluoride as the main components. To form a paste-like texture, hydrochloric acid, water, and starch or powdered cryolite are generally added as thickeners and additives. In step S4, the low-flow etchant 5 can be coated or printed over a large area onto the first surface of the glass substrate 1, and then removed by cleaning after a certain period of time, thereby forming the desired second uneven particle layer 22.

[0040] The second protrusion 2211 of different sizes and the second recess 2212 of different depths can be formed by adjusting the viscosity of the low-flow etchant 5. In this embodiment, the viscosity of the low-flow etchant 5 is not less than 30,000 centipoise. This ensures that the low-flow etchant 5 has low flowability, so that the size of the second protrusion 2211 and the depth of the second recess 2212 do not exceed 5 μm.

[0041] Example 2: Reference Figure 5 While all other parts are the same as in Embodiment 1, the difference lies in the manufacturing method of the anti-glare glass 100 provided in this embodiment, which includes the following steps: S1. Provide a glass substrate 1, and provide an etching barrier film 3 on the first surface of the glass substrate 1; S2. A patterned photoresist layer 6 is provided on the barrier film 3. The photoresist layer 6 has a periodically arranged shielding area 61 and a hollow area 62 at the micron level. S3. The low-flow etchant 5 is applied to the first surface of the glass substrate 1. The low-flow etchant 5 can only be etched into the hollow area 62 of the photoresist layer 6 under the blocking area 61. It etches away the barrier film 3 and the shallow surface of the glass substrate 1 in sequence. Then the photoresist layer 6 is removed. The remaining barrier film 3 replicates the micron-level periodic arrangement of the blocking area 61 and the hollow area 62 of the photoresist layer 6. The blocking part 31 and the hollow part 32 are formed on the barrier film 3. The surface of the glass substrate 1 exposed by the hollow part 32 forms a preliminary uneven morphology 10. S4. The first surface of the glass substrate 1 is etched using a high-flowability etchant 4. The high-flowability etchant 4 can only be etched into the cutout portion 32 of the barrier film 3 under the obstruction of the shielding area 61, so as to form a plurality of first recesses 2112 on the first surface of the glass substrate 1. Then, the first recesses 2112 are etched laterally to peel off the barrier film 3 and form a first protrusion 2111. Thus, the first recesses 2112 and the first protrusions 2111 are arranged alternately to form a first concave-convex unit 211. Each first concave-convex unit 211 is periodically arranged on the first surface of the glass substrate 1 to form a first concave-convex particle layer 21. During this process, the initial concave-convex morphology 10 will spread to the first concave-convex particle layer 21 and a second concave-convex unit 221 will be distributed on the surface of each first concave-convex unit 211, thereby forming a second concave-convex particle layer 22 superimposed on the first concave-convex particle layer 21. The first concave-convex particle layer 21 and the second concave-convex particle layer 22 constitute a scattering surface 2.

[0042] In the manufacturing method of the anti-glare glass 100 described above, in steps S1-S2, a barrier film 3 is first set on the first surface of the glass substrate 1, and then a patterned photoresist layer 6 is set on the barrier film 3. The pattern of the photoresist layer 6 includes micron-level periodically arranged blocking areas 61 and hollow areas 62, so that it overlaps with each sub-pixel 200 of a display, so that each sub-pixel 200 corresponds to the same number of first concave-convex units 211. In steps S3-S4, a method of etching using a high-fluidity etchant 4 and a low-fluidity etchant 5 with different fluidity is proposed, which successfully etches concave-convex particles of different sizes. The second uneven particle layer 22 and the first uneven particle layer 21 are stacked; wherein, in step S3, the patterning of the barrier film 3 is achieved by using a low-flow etchant 5 to etch into the cutout area 62 of the photoresist layer 6 under the obstruction of the obstruction area 61, thereby making the pattern of the barrier film 3 replicate the micron-level periodic arrangement of the obstruction area 61 and the cutout area 62 of the photoresist layer 6 to form the obstruction area 31 and the cutout area 32, and the shallow surface of the glass substrate 1 is etched away through the cutout area 32 of the barrier film 3, forming a preliminary uneven morphology 10 on the surface of the glass substrate 1 exposed by the cutout area 32 of the barrier film 3; in step S4 Based on the high fluidity of the high-fluidity etchant 4, and in conjunction with the hollowed-out portions 32 of the barrier film 3, a plurality of first recesses 2112 are formed on the first surface of the glass substrate 1. Lateral erosion is then performed through the first recesses 2112 to peel off the barrier film 3 and form first protrusions 2111. Each first recess 2112 and each first protrusion 2111 forms a plurality of periodically arranged first concave-convex units 211, thereby forming a first concave-convex particle layer 21 on the first surface of the glass substrate 1. During this process, the initial concave-convex morphology 10 spreads onto the first concave-convex units 211, forming a plurality of first concave-convex particles 211 on the surface of each first concave-convex unit 211. Two concave-convex units 221 are formed, thereby creating a second concave-convex particle layer 22 superimposed on the first concave-convex particle layer 21 to constitute a scattering surface 2. The second concave-convex units 221 can have a smaller size and are distributed on the surface of each first concave-convex unit 211, so that the surface of each first concave-convex unit 211 has a certain roughness, so that the scattering surface 2 has a better scattering effect. It has a more uniform distribution at all angles when refracting and scattering the light emission of the pixel, which improves the uniformity of the intensity of the pixel light emission at different angles and can solve the problems of color spots and color changes in the display screen as the viewing angle changes.

[0043] In this embodiment, in step S1, the barrier film 3 is a silicon nitride (Si3N4) thin film. It can be formed by depositing a film on the surface of the glass substrate 1 through methods such as PVD and CVD, and its thickness is generally controlled to be about 1 μm; the silicon nitride thin film can effectively block the front etching of highly fluid etchant 4 (such as hydrofluoric acid).

[0044] In this embodiment, in step S2, the photoresist layer 6 is formed by coating a photoresist layer on the surface of the barrier film 3, exposing it using a micron-scale patterned mask, and then developing it. The mask is pre-formed with a pattern including micron-scale periodically arranged blocking areas and cutout areas. Through the above process, the pattern is finally transferred onto the photoresist layer 6. The pattern can be a mesh pattern (such as a hexagonal mesh with cutouts 32 at the mesh openings) or a dot matrix pattern (such as a hexagonal dot matrix with each dot blocking an area). The mesh spacing or dot spacing can be 10–100 μm.

[0045] In this embodiment, in step S3, the low-flow etchant 5 is a paste-like etchant. Specifically, the low-flow etchant 5 can be a paste with ammonium fluoride or ammonium bifluoride as the main components. To form a paste-like texture, hydrochloric acid, water, and starch or powdered cryolite are generally added as thickeners and additives. The low-flow etchant 5 can be coated or printed on the first surface of the glass substrate 1 over a large area and then removed by cleaning after a certain period of time. When the barrier film 3 is silicon nitride (Si3N4), although the etching rate of the low-flow etchant 5 with ammonium fluoride or ammonium bifluoride as the main components is low, by extending its etching time and increasing the etching temperature, it can still etch a barrier film 3 with a thickness of about 1 μm at the cutout position of the photoresist layer 6, and further form a preliminary uneven surface on the shallow surface of the glass substrate 1.

[0046] The size of the second uneven unit 221 can be adjusted by changing the viscosity of the low-flowability etchant 5. In this embodiment, the viscosity of the low-flowability etchant 5 is not less than 30,000 centipoise. This ensures that the low-flowability etchant 5 has low flowability, so that the size of the second uneven unit 221 does not exceed 5 μm.

[0047] In this embodiment, in step S5, the high-flowability etchant 4 is a hydrofluoric acid or buffered ammonium bifluoride aqueous solution (such as a solution prepared by mixing ammonium bifluoride and hydrofluoric acid in a certain proportion). Because the aqueous solution has extremely high fluidity and permeability, it can pre-etch into the surface of the glass substrate 1 from the cutout portion 32 to form a first recess 2112, followed by lateral erosion from the recess, ultimately causing the barrier film 3 to peel off and form a first protrusion 2111, thus forming a first uneven particle layer 21 composed of the first uneven unit 211. In the above process, the initial uneven morphology 10 extends onto the first uneven unit 211 to form a second uneven unit 221 superimposed thereon, thereby forming a second uneven particle layer 22 superimposed on the first uneven particle layer 21.

[0048] Furthermore, it should be noted that the names of the various parts of the specific embodiments described in this specification may differ. All equivalent or simple variations made based on the structure, features, and principles of this invention are included within the scope of protection of this invention. Those skilled in the art can make various modifications or additions to the described specific embodiments or use similar methods to replace them, as long as they do not deviate from the structure of this invention or exceed the scope defined by the claims, all of which should fall within the scope of protection of this invention.

Claims

1. An anti-glare glass, comprising a glass substrate, characterized in that: A scattering surface is provided on the first surface of the glass substrate. The scattering surface is composed of an overlapping first and second convex-concave particle layer. The second convex-concave particle layer is located on the surface of the first convex-concave particle layer. The first convex-concave particle layer is composed of a plurality of first convex-concave units arranged periodically on the first surface of the glass substrate. The first convex-concave unit is composed of alternating first protrusions and first concave portions. The second convex-concave particle layer is composed of a plurality of second convex-concave units distributed on the surface of each first convex-concave unit. The second convex-concave unit is composed of alternating second protrusions and second concave portions. The size of the second protrusion and the depth of the second concave portion are both smaller than the size of the first protrusion and the depth of the first concave portion.

2. The anti-glare glass according to claim 1, characterized in that: The size of the first protrusion and the depth of the first concave portion are 10 to 100 μm, the size of the second protrusion and the depth of the second concave portion are 0.5 to 5 μm, and the surface of the first concave-convex unit is uniformly covered by multiple second concave-convex units.

3. A method for manufacturing anti-glare glass, characterized in that... Includes the following steps: S1. Provide a glass substrate, and provide a barrier film on the first surface of the glass substrate; S2. Pattern the barrier film to form micron-scale periodically arranged blocking and hollowed-out areas on the barrier film. S3. The first surface of the glass substrate is etched using a high-flowability etchant. The high-flowability etchant can only be etched into the cut-out portion of the barrier film due to the obstruction of the barrier film, so as to form a plurality of first recesses on the first surface of the glass substrate. Then, the barrier film is peeled off and a plurality of first protrusions are formed by lateral erosion through each first recess. At this time, the first recesses and the first protrusions are arranged alternately to form a first concave-convex unit. Each first concave-convex unit is arranged periodically on the first surface of the glass substrate to form a first concave-convex particle layer. S4. The first uneven particle layer is etched using a low-flow etchant. Due to the low flowability and low permeability of the low-flow etchant, it only acts on the shallow surface of the first uneven unit. Multiple second uneven units are formed on the surface of each first uneven unit to form a second uneven particle layer. The second uneven unit is composed of alternating second convex parts and second concave parts. The size of the second convex part and the depth of the second concave part are smaller than the size of the first convex part and the depth of the first concave part. The overlapping first uneven particle layer and second uneven particle layer form a scattering surface.

4. The method for manufacturing an anti-glare glass according to claim 3, characterized in that: In step S1, the barrier film is a silicon nitride (Si3N4) thin film.

5. The method for manufacturing an anti-glare glass according to claim 3, characterized in that: In step S2, the barrier film is patterned using a photolithography process. The photolithography process includes: first, coating the barrier film surface with photoresist, then exposing it with a mask having a micron-level pattern, then developing and etching the barrier film; removing the photoresist to form hollow areas and masking areas on the barrier film.

6. The method for manufacturing an anti-glare glass according to claim 3, characterized in that: In step S3, the high-flowability etchant is hydrofluoric acid or a buffered ammonium bifluoride aqueous solution.

7. A method for manufacturing an anti-glare glass according to claim 6, characterized in that: The viscosity of the high-flowability etchant is not higher than 5 centipoise.

8. A method for manufacturing an anti-glare glass according to claim 3, characterized in that: In step S4, the low-flow etchant is a paste-like etchant.

9. A method for manufacturing an anti-glare glass according to claim 8, characterized in that: The viscosity of the low-flow etchant is not less than 30,000 centipoise.

10. A method for manufacturing anti-glare glass, characterized in that... Includes the following steps: S1. Provide a glass substrate, and provide an etching barrier film on the first side of the glass substrate; S2. A patterned photoresist layer is disposed on the barrier film, the photoresist layer having a periodically arranged blocking area and a hollow area at the micron level; S3. A low-flow etchant is applied to the first surface of the glass substrate. The low-flow etchant can only etch into the hollow area of ​​the photoresist layer under the obstruction of the photoresist layer. It then etches away the barrier film and the shallow surface of the glass substrate in sequence. The photoresist layer is then removed. The remaining barrier film replicates the micron-scale periodic arrangement of the obstruction area and the hollow area of ​​the photoresist layer. The barrier film forms obstruction and hollow areas, and the glass substrate surface exposed by the hollow areas forms a preliminary uneven morphology. S4. A high-flowability etchant is used to etch the first surface of the glass substrate. The high-flowability etchant can only etch into the cut-out portion of the barrier film due to the obstruction of the barrier film, so as to form multiple first recesses on the first surface of the glass substrate. Then, lateral erosion is performed through the first recesses to peel off the barrier film and form first protrusions. The first recesses and first protrusions are arranged alternately to form a first concave-convex unit. Each first concave-convex unit is arranged periodically on the first surface of the glass substrate to form a first concave-convex particle layer. During this process, the initial concave-convex morphology will spread to the first concave-convex particle layer and a second concave-convex unit will be distributed on the surface of each first concave-convex unit, thereby forming a second concave-convex particle layer superimposed on the first concave-convex particle layer. The first concave-convex particle layer and the second concave-convex particle layer constitute a scattering surface.

11. A method for manufacturing an anti-glare glass according to claim 10, characterized in that: In step S1, the barrier film is a silicon nitride (Si3N4) thin film.

12. The method for manufacturing an anti-glare glass according to claim 10, characterized in that: In step S2, the photoresist layer is formed by coating a barrier film with photoresist, which is exposed using a micron-scale patterned mask and then developed.

13. A method for manufacturing an anti-glare glass according to claim 10, characterized in that: In step S3, the low-flow etchant is a paste-like etchant.

14. A method for manufacturing an anti-glare glass according to claim 13, characterized in that: The viscosity of the low-flow etchant is not less than 30,000 centipoise.

15. A method for manufacturing an anti-glare glass according to claim 10, characterized in that: In step S5, the high-flowability etchant is hydrofluoric acid or a buffered ammonium bifluoride aqueous solution.

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