A magnetron sputtering device target rapid dismounting system

By designing a rapid target disassembly system for magnetron sputtering equipment, an electric telescopic rod and gear rack structure are used to automatically unlock and remove the target support, solving the problem of complex traditional target disassembly and assembly processes, and improving operational convenience and equipment stability.

CN122147274APending Publication Date: 2026-06-05SHENZHEN XUANTENG INTELLIGENT EQUIPMENT CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHENZHEN XUANTENG INTELLIGENT EQUIPMENT CO LTD
Filing Date
2026-05-07
Publication Date
2026-06-05

AI Technical Summary

Technical Problem

Traditional magnetron sputtering equipment has a complex and time-consuming target assembly and disassembly process, and its operation is limited in cleanrooms, resulting in cumbersome processes and poor adaptability.

Method used

A rapid target disassembly system for magnetron sputtering equipment was designed. The system utilizes an electric telescopic rod and a gear rack structure to automatically unlock and remove the target support. Combined with an inner and outer locking plate structure, it ensures the stability of equipment operation and operational safety.

Benefits of technology

It enables rapid disassembly and installation of the target material, reduces manual intervention, improves operational convenience and safety, and ensures coating quality and equipment stability.

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Abstract

The application relates to the technical field of magnetron sputtering equipment, and discloses a magnetron sputtering equipment target material quick dismounting system which comprises a target material support, the bottom of the target material support is provided with a support moving sliding rail, the inner wall of the support moving sliding rail is provided with a cross beam, the periphery of the support moving sliding rail is provided with a magnetron sputtering equipment body, the outer wall of the magnetron sputtering equipment body is provided with a side plate, the top of the side plate is provided with a control box; the target material support comprises a dismounting assembly, and the bottom of the dismounting assembly is provided with a fixing assembly. The operation of an electric telescopic rod drives a lifting support and a target material body to descend, so that the target material height is lower than the equipment body; meanwhile, a limiting rod drives a first rack to move downwards, a middle gear and a second rack are linked to rotate, a hollow bolt is separated from an inner locking hole, automatic unlocking of the target material support is realized, then the target material support can be moved out of the equipment along the support moving sliding rail, and the whole unlocking and moving-out process does not need additional tools, and the operation is convenient and efficient.
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Description

Technical Field

[0001] This invention relates to the field of magnetron sputtering equipment technology, specifically to a rapid disassembly system for magnetron sputtering targets. Background Technology

[0002] Magnetron sputtering, as an important branch of physical vapor deposition, is widely used in the coating of various materials such as metals, semiconductors, and insulators due to its advantages such as simple equipment, ease of control, large coating area, and strong film adhesion. Its core principle is to introduce a magnetic field onto the target cathode surface. This magnetic field confines charged particles, increasing plasma density and thus sputtering efficiency. This allows for the deposition of target atoms or molecules onto the substrate surface, forming a uniform thin film. The target material, as a core consumable component of magnetron sputtering equipment, gradually wears down under long-term high-speed ion bombardment, requiring regular inspection, maintenance, or replacement to ensure coating quality and equipment operational stability.

[0003] Traditional sputtering targets rely on external mobile equipment such as hydraulic trucks and forklifts. Components such as the substrate holder and reflow mechanism under the equipment must be removed in advance. This preparatory process is complex, time-consuming, and can easily damage precision parts. Furthermore, magnetron sputtering equipment needs to operate in a cleanroom, which has strict restrictions on forklift use. It requires prior application, cleaning, and standardized operation, resulting in cumbersome processes and poor adaptability. Summary of the Invention

[0004] This invention provides a rapid disassembly system for magnetron sputtering targets, which solves the problems mentioned in the background art.

[0005] The present invention provides the following technical solution: a rapid disassembly system for magnetron sputtering equipment targets, including a target support, a support moving slide rail installed at the bottom of the target support, a crossbeam installed on the inner wall of the support moving slide rail, a magnetron sputtering equipment body arranged around the support moving slide rail, a side plate installed on the outer wall of the magnetron sputtering equipment body, and a control box installed on the top of the side plate; The target support includes a disassembly assembly, and a fixing assembly is installed at the bottom of the disassembly assembly; The disassembly assembly includes a support frame, a connecting bracket mounted on the top of the support frame, an electric telescopic rod mounted on the bottom of the connecting bracket, a lifting bracket mounted on the power output shaft of the electric telescopic rod, a target body mounted on the top of the lifting bracket, a limit rod mounted on the bottom of the lifting bracket, and the limit rod is slidably connected to the connecting bracket. The fixing component includes a first rack, a central gear meshing with the outer edge of the first rack, a second rack meshing with the outer edge of the central gear, a hollow pin installed on the outer wall of the second rack, an inner locking plate at the bottom of the hollow pin, an inner locking hole at the top of the inner locking plate, and the inner locking plate is installed on the crossbeam.

[0006] As a preferred embodiment of the present invention, the target support is slidably connected to the support sliding rail, the first rack is installed on the outer wall of the limiting rod, the outer wall of the support frame is equipped with a baffle, and the outer wall of the baffle is equipped with a control button.

[0007] As a preferred embodiment of the present invention, the outer wall of the limiting rod is slidably connected to a limiting cylinder, the outer wall of the limiting cylinder is fitted with a base plate, the top of the base plate is fitted with a fixed bracket, and the base plate is mounted on a support frame.

[0008] As a preferred embodiment of the present invention, a connecting shaft is installed on the inner wall of the fixed bracket, and the central gear is movably connected to the connecting shaft.

[0009] As a preferred embodiment of the present invention, a connecting screw is threaded to the inner wall of the top of the hollow pin, a limiting plate is installed on the top of the connecting screw, a sliding hole is opened on the top of the limiting plate, a sliding rod is slidably connected to the inner wall of the sliding hole, and the sliding rod is installed on a fixed bracket.

[0010] As a preferred embodiment of the present invention, the hollow pin has an inner pin slidably connected to its inner cavity, and the outer wall of the hollow pin has a connecting groove, with a long groove and a short groove respectively provided on the left and right sides of the connecting groove.

[0011] As a preferred embodiment of the present invention, the height of the long groove is higher than the height of the short groove, and a pin handle is installed on the inner wall of the inner pin.

[0012] As a preferred embodiment of the present invention, the pin handle is slidably connected to the short slot, the connecting slot and the long slot, and a support spring is provided between the connecting screw and the inner pin.

[0013] As a preferred embodiment of the present invention, an outer locking plate is provided on the right side of the inner locking plate, and an outer locking hole is provided on the top of the outer locking plate.

[0014] As a preferred embodiment of the present invention, the diameter of the outer locking hole is the same as the diameter of the inner pin, and the diameter of the outer locking hole is smaller than the diameter of the inner locking hole.

[0015] The present invention has the following beneficial effects: 1. The target quick disassembly system of this magnetron sputtering equipment uses the operation of an electric telescopic rod to drive the lifting bracket and the target body to descend, so that the height of the target is lower than that of the equipment body. At the same time, the limit rod drives the first rack to move down, which in turn drives the central gear and the second rack to rotate, so that the hollow pin disengages from the inner locking hole, completing the automatic unlocking of the target bracket. Then, the target bracket can be moved out of the equipment as a whole along the bracket moving slide rail. The entire unlocking and removal process does not require any additional tools, making the operation convenient and efficient.

[0016] 2. The target rapid disassembly system of this magnetron sputtering equipment unlocks the support simultaneously when the target descends and locks it simultaneously when the target rises, reducing manual intervention. The locking structure prevents the target support from shaking during equipment operation, ensuring the quality of sputtering coating. On the other hand, the system features a double locking structure with an inner and outer locking plate. During equipment operation, a hollow pin is inserted into the inner locking hole to stably fix the target support and prevent it from moving during operation. After the target is removed from the equipment, the inner pin can be inserted into the outer locking hole to temporarily fix the target support, preventing it from shaking during maintenance and replacement, and ensuring the safety of operators. Attached Figure Description

[0017] Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a schematic diagram of the beam position structure of the present invention; Figure 3 This is a schematic diagram of the disassembly component structure of the present invention; Figure 4 For the present invention Figure 3 Enlarged structural diagram at point A in the diagram; Figure 5 This is a schematic diagram of the fixed component position structure of the present invention; Figure 6 This is a schematic diagram of the disassembly and fixing components of the present invention; Figure 7 This is a schematic diagram of the fixed support structure of the present invention; Figure 8 For the present invention Figure 7 Enlarged structural diagram at point B in the diagram; Figure 9 This is a schematic cross-sectional view of the fixing component of the present invention.

[0018] In the diagram: 1. Target support; 2. Support sliding rail; 21. Crossbeam; 3. Magnetron sputtering equipment body; 4. Side plate; 5. Control box; 11. Disassemble the components; 12. Secure the components; 1101. Support frame; 1102. Connecting bracket; 1103. Electric telescopic rod; 1104. Lifting bracket; 1105. Target body; 1106. Limiting rod; 1107. Baffle; 1108. Control button; 1201, First rack; 1202, Middle gear; 1203, Second rack; 1204, Hollow pin; 1205, Inner pin; 1206, Pin handle; 1207, Short slot; 1208, Connecting slot; 1209, Long slot; 1210, Support spring; 1211, Connecting screw; 1212, Limiting plate; 1213, Sliding hole; 1214, Sliding rod; 1215, Fixed bracket; 1216, Connecting shaft; 1217, Base plate; 1218, Limiting cylinder; 1219, Inner locking plate; 1220, Inner locking hole; 1221, Outer locking plate; 1222, Outer locking hole. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0020] Please see Figures 1-9 A rapid disassembly system for a magnetron sputtering target includes a target support 1, a support sliding rail 2 installed at the bottom of the target support 1, a crossbeam 21 installed on the inner wall of the support sliding rail 2, a magnetron sputtering equipment body 3 arranged around the support sliding rail 2, a side plate 4 installed on the outer wall of the magnetron sputtering equipment body 3, and a control box 5 installed on the top of the side plate 4. The target support 1 includes a disassembly assembly 11, and a fixing assembly 12 is installed at the bottom of the disassembly assembly 11; In the above structure, the disassembly component 11 supports the target body 1105, allowing it to be located within the inner cavity of the magnetron sputtering equipment body 3. The disassembly component 11 can also remove the target body 1105 from the magnetron sputtering equipment body 3, facilitating its inspection and replacement. The fixing component 12 moves the disassembly component 11, locking and unlocking it. When locked, the disassembly component 11 cannot move; when unlocked, it can move.

[0021] The disassembly assembly 11 includes a support frame 1101, a connecting bracket 1102 is installed on the top of the support frame 1101, an electric telescopic rod 1103 is installed on the bottom of the connecting bracket 1102, a lifting bracket 1104 is installed on the power output shaft of the electric telescopic rod 1103, a target body 1105 is installed on the top of the lifting bracket 1104, and a limiting rod 1106 is installed on the bottom of the lifting bracket 1104. The limiting rod 1106 is slidably connected to the connecting bracket 1102. In the above structure, the electric telescopic rod 1103 drives the lifting bracket 1104 to rise and fall, so that the target body 1105 on the lifting bracket 1104 can be raised and lowered. When the target body 1105 needs to be inspected or replaced, the electric telescopic rod 1103 drives the lifting bracket 1104 and the target body 1105 to move downward, so that the height of the target body 1105 is lower than the height of the magnetron sputtering equipment body 3. At this time, the disassembly component 11 can be moved out of the magnetron sputtering equipment body 3. Before the disassembly component 11 is moved, the side plate 4 can be removed from the magnetron sputtering equipment body 3.

[0022] The fixing assembly 12 includes a first rack 1201, a middle gear 1202 meshing with the outer edge of the first rack 1201, a second rack 1203 meshing with the outer edge of the middle gear 1202, a hollow pin 1204 installed on the outer wall of the second rack 1203, an inner locking plate 1219 provided at the bottom of the hollow pin 1204, an inner locking hole 1220 opened at the top of the inner locking plate 1219, and the inner locking plate 1219 is installed on the crossbeam 21.

[0023] In the above structure, when the first rack 1201 moves downward, the support spring 1210 drives the middle gear 1202 to rotate. When the middle gear 1202 rotates, it drives the second rack 1203 to move upward. When the second rack 1203 moves upward, the hollow pin 1204 installed on the second rack 1203 also moves upward, gradually causing the hollow pin 1204 to disengage from the inner locking hole 1220 on the inner locking plate 1219. At this time, the disassembly assembly 11 can be moved.

[0024] In a preferred embodiment: the target support 1 is slidably connected to the support moving slide rail 2, the first rack 1201 is installed on the outer wall of the limiting rod 1106, the outer wall of the support frame 1101 is equipped with a baffle 1107, and the outer wall of the baffle 1107 is equipped with a control button 1108.

[0025] In the above structure, the target support 1 is slidably supported by the support sliding rail 2, allowing the target support 1 to slide on the support sliding rail 2 and move out and in from the magnetron sputtering equipment body 3. When the lifting support 1104 is raised or lowered, the limiting rod 1106 installed on the lifting support 1104 moves accordingly. When the lifting support 1104 moves downward, the limiting rod 1106 also moves downward. The downward movement of the limiting rod 1106 will drive the first rack 1201 to move downward, so that the movement of the first rack 1201 can drive the second rack 1203 and the hollow pin 1204 to move through the central gear 1202. When the target body 1105 descends, the support frame 1101 can also be unlocked. The output end of the control button 1108 is electrically connected to the input end of the controller, and the output end of the controller is electrically connected to the electric telescopic rod 1103. The controller is installed in the control box 5.

[0026] In a preferred embodiment: the outer wall of the limiting rod 1106 is slidably connected to the limiting cylinder 1218, the outer wall of the limiting cylinder 1218 is equipped with a base plate 1217, the top of the base plate 1217 is equipped with a fixed bracket 1215, and the base plate 1217 is mounted on the support frame 1101.

[0027] In the above structure, the limiting cylinder 1218 and the connecting bracket 1102 can both limit the limiting rod 1106, so that the head and tail of the limiting rod 1106 can be limited, which improves the stability of the limiting rod 1106 when it moves up and down. By installing the base plate 1217 on the support frame 1101, when the support frame 1101 moves, the support frame 1101 can drive the base plate 1217 and the fixed bracket 1215 to move, so that the inner pin 1205 installed on the fixed bracket 1215 can be moved, so that the inner pin 1205 can move towards the outer locking plate 1221 and then be inserted into the outer locking hole 1222 on the outer locking plate 1221.

[0028] In a preferred embodiment: a connecting shaft 1216 is installed on the inner wall of the fixed bracket 1215, and the central gear 1202 is movably connected to the connecting shaft 1216.

[0029] In the above structure, the connecting shaft 1216 mainly serves to limit the position of the middle gear 1202, so that the middle gear 1202 can always be located between the first rack 1201 and the second rack 1203, thereby improving the stability of the device operation.

[0030] In a preferred embodiment: a connecting screw 1211 is threaded to the inner wall of the top of the hollow pin 1204, a limiting plate 1212 is installed on the top of the connecting screw 1211, a sliding hole 1213 is provided on the top of the limiting plate 1212, a sliding rod 1214 is slidably connected to the inner wall of the sliding hole 1213, and the sliding rod 1214 is installed on the fixed bracket 1215.

[0031] In the above structure, the limiting plate 1212 slides on the sliding rod 1214. The sliding rod 1214 mainly serves to limit the limiting plate 1212 and the hollow pin 1204, so that the limiting plate 1212 and the hollow pin 1204 can move up and down stably, thus improving the stability of the device.

[0032] In a preferred embodiment: the inner cavity of the hollow pin 1204 is slidably connected to an inner pin 1205, and the outer wall of the hollow pin 1204 is provided with a connecting groove 1208. The left and right sides of the connecting groove 1208 are respectively provided with a long groove 1209 and a short groove 1207.

[0033] In the above structure, by setting the inner pin 1205, when the disassembly component 11 is removed from the magnetron sputtering equipment body 3, it is necessary to fix the disassembly component 11 so that it cannot move, which facilitates the maintenance and replacement of the target body 1105. When the disassembly component 11 is removed from the magnetron sputtering equipment body 3, the lifting bracket 1104 is in a lowered state. Therefore, the hollow pin 1204 does not correspond to the inner locking plate 1219, so the hollow pin 1204 cannot contact the outer locking plate 1221. At this time, the inner pin 1205 can be extended from the hollow pin 1204 so that the inner pin 1205 can contact the outer locking plate 1221. At this time, the support frame 1101 can be locked, which improves the flexibility and stability of the device.

[0034] In a preferred embodiment, the height of the long slot 1209 is higher than the height of the short slot 1207, and the inner wall of the inner pin 1205 is fitted with a pin handle 1206.

[0035] In the above structure, the latch handle 1206 drives the inner latch 1205 to move. By lifting the latch handle 1206, the inner latch 1205 is moved, causing the latch handle 1206 to disengage from the short slot 1207. Then, the latch handle 1206 is moved towards the connecting slot 1208, so that the latch handle 1206 enters the connecting slot 1208. Then, the latch handle 1206 is moved towards the long slot 1209, so that the latch handle 1206 enters the long slot 1209. At this time, the elastic force of the support spring 1210 moves the inner latch 1205 and the latch handle 1206 downward, so that the inner latch 1205 extends out of the hollow latch 1204.

[0036] In a preferred embodiment, the pin handle 1206 is slidably connected to the short groove 1207, the connecting groove 1208 and the long groove 1209, and a support spring 1210 is provided between the connecting screw 1211 and the inner pin 1205.

[0037] In the above structure, the pin handle 1206, the short groove 1207, and the connecting groove 1208 can limit the pin handle 1206, so that the pin handle 1206 can only move along the trajectory formed by the combination of the short groove 1207, the connecting groove 1208, and the long groove 1209, which facilitates stable operation by the operator; the support spring 1210 mainly supports the inner pin 1205, so that the pin handle 1206 on the inner pin 1205 can be stably locked in the short groove 1207 and the long groove 1209.

[0038] In a preferred embodiment, an outer locking plate 1221 is provided on the right side of the inner locking plate 1219, and an outer locking hole 1222 is provided on the top of the outer locking plate 1221.

[0039] In the above structure, by setting the outer locking plate 1221, the inner pin 1205 extends out from the hollow pin 1204, so that the hollow pin 1204 is inserted into the outer locking hole 1222 on the outer locking plate 1221. At this time, the support frame 1101 cannot move, which improves the stability of the device during maintenance and replacement.

[0040] In a preferred embodiment, the diameter of the outer locking hole 1222 is the same as the diameter of the inner pin 1205, and the diameter of the outer locking hole 1222 is smaller than the diameter of the inner locking hole 1220.

[0041] In the above structure, the hollow pin 1204 can be inserted into the inner locking hole 1220 on the inner locking plate 1219. At this time, the hollow pin 1204 is blocked by the inner locking plate 1219, so that the hollow pin 1204 cannot wobble in the inner locking hole 1220. The inner pin 1205 is also fully inserted into the outer locking hole 1222. At this time, the inner pin 1205 cannot move in the outer locking hole 1222. Therefore, when the equipment is running, the support frame 1101 cannot be moved during maintenance and replacement, thus improving the stability of the device.

[0042] Working principle: In use, the side plate 4 is removed from the magnetron sputtering equipment body 3. Then, by pressing the control button 1108, the control button 1108 controls the electric telescopic rod 1103 through the controller. At this time, the electric telescopic rod 1103 moves, causing the lifting bracket 1104 to move downward. The target body 1105 on the lifting bracket 1104 also moves downward. At the same time, the limiting rod 1106 on the lifting bracket 1104 also moves downward, gradually bringing the lifting bracket 1104 into contact with the support frame 1101. When the limiting rod 1106 moves downward, it will drive the first rack 1201 to move downward. When rack 1201 moves downward, it drives the central gear 1202 to rotate. The rotation of the central gear 1202 drives the second rack 1203 to move upward. The hollow pin 1204, inner pin 1205, support spring 1210, connecting screw 1211, and limiting plate 1212 mounted on the second rack 1203 also move upward, gradually causing the hollow pin 1204 to disengage from the inner locking hole 1220 on the inner locking plate 1219. At this time, the support frame 1101 can be pulled, causing it to disengage from the magnetron sputtering equipment body 3. When the inner pin 1205 aligns with the outer locking plate 1221... By lifting the pin handle 1206 and then rotating it towards the connecting groove 1208, the pin handle 1206 enters the long groove 1209, causing the inner pin 1205 to extend from the hollow pin 1204 and gradually enter the outer locking hole 1222 on the outer locking plate 1221. At this time, the support frame 1101 can be fixed and cannot move. When the target body 1105 is replaced, by lifting the pin handle 1206, the pin handle 1206 moves from the long groove 1209 into the short groove 1207, at which point the support frame 1101 is unlocked. Then, the support frame 1101 is pushed into the magnetron sputtering equipment body 3. The electric telescopic rod 1103 drives the lifting bracket 1104 and the target body 1105 to move upward. At this time, the limiting rod 1106 also moves upward. The first rack 1201 installed on the limiting rod 1106 moves upward. The first rack 1201 drives the middle gear 1202 to rotate. The rotation of the middle gear 1202 drives the second rack 1203 and the hollow pin 1204 to move downward. Gradually, the hollow pin 1204 is inserted into the inner locking hole 1220 on the inner locking plate 1219. At this time, the support frame 1101 cannot move.

[0043] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0044] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended technical solutions and their equivalents.

Claims

1. A rapid disassembly system for a magnetron sputtering target, comprising a target support (1), characterized in that: The bottom of the target support (1) is equipped with a support moving slide rail (2), the inner wall of the support moving slide rail (2) is equipped with a crossbeam (21), the periphery of the support moving slide rail (2) is provided with a magnetron sputtering equipment body (3), the outer wall of the magnetron sputtering equipment body (3) is equipped with a side plate (4), and the top of the side plate (4) is equipped with a control box (5). The target support (1) includes a disassembly assembly (11), and a fixing assembly (12) is installed at the bottom of the disassembly assembly (11). The disassembly assembly (11) includes a support frame (1101), a connecting bracket (1102) is installed on the top of the support frame (1101), an electric telescopic rod (1103) is installed on the bottom of the connecting bracket (1102), a lifting bracket (1104) is installed on the power output shaft of the electric telescopic rod (1103), a target body (1105) is installed on the top of the lifting bracket (1104), and a limiting rod (1106) is installed on the bottom of the lifting bracket (1104). The limiting rod (1106) is slidably connected to the connecting bracket (1102). The fixing component (12) includes a first rack (1201), the outer edge of the first rack (1201) meshes with a central gear (1202), the outer edge of the central gear (1202) meshes with a second rack (1203), the outer wall of the second rack (1203) is fitted with a hollow pin (1204), the bottom of the hollow pin (1204) is provided with an inner locking plate (1219), the top of the inner locking plate (1219) is provided with an inner locking hole (1220), and the inner locking plate (1219) is mounted on the crossbeam (21).

2. The rapid disassembly system for a magnetron sputtering target as described in claim 1, characterized in that: The target support (1) is slidably connected to the support moving slide rail (2), the first rack (1201) is installed on the outer wall of the limiting rod (1106), the outer wall of the support frame (1101) is equipped with a baffle (1107), and the outer wall of the baffle (1107) is equipped with a control button (1108).

3. The rapid disassembly system for a magnetron sputtering target as described in claim 1, characterized in that: The outer wall of the limiting rod (1106) is slidably connected to the limiting cylinder (1218), the outer wall of the limiting cylinder (1218) is equipped with a base plate (1217), the top of the base plate (1217) is equipped with a fixed bracket (1215), and the base plate (1217) is mounted on the support frame (1101).

4. A rapid target disassembly system for magnetron sputtering equipment according to claim 3, characterized in that: The inner wall of the fixed bracket (1215) is equipped with a connecting shaft (1216), and the central gear (1202) is movably connected to the connecting shaft (1216).

5. A rapid target disassembly system for magnetron sputtering equipment according to claim 1, characterized in that: The inner wall of the top of the hollow pin (1204) is threaded with a connecting screw (1211). A limiting plate (1212) is installed on the top of the connecting screw (1211). A sliding hole (1213) is opened on the top of the limiting plate (1212). A sliding rod (1214) is slidably connected to the inner wall of the sliding hole (1213). The sliding rod (1214) is installed on the fixed bracket (1215).

6. A rapid target disassembly system for magnetron sputtering equipment according to claim 5, characterized in that: The hollow pin (1204) has an inner pin (1205) slidably connected to its inner cavity. The outer wall of the hollow pin (1204) has a connecting groove (1208). The left and right sides of the connecting groove (1208) have a long groove (1209) and a short groove (1207) respectively.

7. A rapid target disassembly system for magnetron sputtering equipment according to claim 6, characterized in that: The height of the long groove (1209) is higher than the height of the short groove (1207), and the inner wall of the inner pin (1205) is equipped with a pin handle (1206).

8. A rapid target disassembly system for magnetron sputtering equipment according to claim 7, characterized in that: The pin handle (1206) is slidably connected to the short groove (1207), the connecting groove (1208) and the long groove (1209), and a support spring (1210) is provided between the connecting screw (1211) and the inner pin (1205).

9. A rapid target disassembly system for magnetron sputtering equipment according to claim 1, characterized in that: An outer locking plate (1221) is provided on the right side of the inner locking plate (1219), and an outer locking hole (1222) is provided on the top of the outer locking plate (1221).

10. A rapid disassembly system for a magnetron sputtering target according to claim 9, characterized in that: The diameter of the outer locking hole (1222) is the same as the diameter of the inner pin (1205), and the diameter of the outer locking hole (1222) is smaller than the diameter of the inner locking hole (1220).