Cantilever microscope and wafer reliability parallel test equipment for wafer reliability parallel test

Abstract

The application provides a cantilever microscope and wafer reliability parallel test equipment for wafer reliability parallel test, and relates to the technical field of wafer test. The cantilever microscope comprises a first sliding mechanism, a second sliding mechanism, a third sliding mechanism and a microscope. The first sliding mechanism comprises a first guide rail and a first sliding block, the first guide rail is fixedly connected with a base and extends along a first direction; the fixed end of the second sliding mechanism is fixedly connected with the first sliding block, the moving end reciprocates along a second direction, and the second direction is perpendicular to the first direction; the third sliding mechanism comprises a guide rail assembly, the guide rail assembly comprises at least two second guide rails which are sequentially and slidably connected, the second guide rails extend along a third direction, the third direction is perpendicular to the first direction and the second direction respectively, one of the two outermost second guide rails is fixedly connected with the moving end of the second sliding mechanism, and the other is connected with the microscope. The cantilever microscope can meet the application requirement of large stroke of the microscope in the horizontal direction.

Description

Technical Field

[0001] This application relates to the technical field of wafer testing, and more specifically, to a cantilever microscope for parallel wafer reliability testing and a parallel wafer reliability testing device. Background Art

[0002] In the semiconductor chip manufacturing and processing process, electrical parameter testing is a key core link to ensure chip quality and performance and screen out defective products. As the core testing equipment in this link, the performance of the displacement mechanism supporting the probe station directly affects the testing efficiency and accuracy. With the rapid development of the semiconductor industry towards high integration and small size, the density of wafer test points has increased significantly, posing higher requirements for positioning accuracy and operation flexibility during testing. During testing, it is necessary to use a microscope to accurately observe and position the test points. Most of the existing technologies use the XYZ stage配套 with the microscope to complete the XYZ three-coordinate displacement operation, and then achieve the alignment and detection of wafer test points.

[0003] However, due to the limitations of the structural layout and rigidity of the existing microscope stage design, its displacement stroke is strictly restricted, and it can only be applied to small-range stroke displacement or fine adjustment scenarios, and it is difficult to meet the large-stroke movement requirements. With the diversification of wafer sizes and the increasing requirements for stroke in batch testing, the application demand for large-stroke detection scenarios is becoming increasingly urgent. The existing microscope stage has become the core bottleneck restricting the testing efficiency and application range of wafer testing devices. Summary of the Invention

[0004] The purpose of this application is to provide a cantilever microscope for parallel wafer reliability testing and a parallel wafer reliability testing device, which can meet the large-stroke application requirements of the microscope in the horizontal direction, aiming at the deficiencies in the above-mentioned existing technologies.

[0005] To achieve the above purpose, the technical solutions adopted in the embodiments of this application are as follows: In one aspect of this application, a cantilever microscope for parallel wafer reliability testing is provided, configured on a base. The cantilever microscope is used to observe the positions of wafer particles at multiple wafer testing stations set on the base. The cantilever microscope includes: a first sliding mechanism, a second sliding mechanism, a third sliding mechanism, and a microscope. The first sliding mechanism includes a first guide rail and a first slider slidably disposed on the first guide rail. The first guide rail is fixedly connected to the base and extends along a first direction. The fixed end of the second sliding mechanism is fixedly connected to the first slider, and the moving end reciprocates along a second direction, which is perpendicular to the first direction. The third sliding mechanism includes a guide rail assembly, which includes at least two second guide rails that slide in sequence. The second guide rails extend along a third direction, which is perpendicular to the first and second directions, respectively. One of the two outermost second guide rails is fixedly connected to the moving end of the second sliding mechanism, and the other is connected to the microscope.

[0006] Optionally, there are at least two first guide rails, which are arranged in parallel. Each first guide rail is provided with at least one first slider, and the fixed end of the second sliding mechanism is fixedly connected to at least two first sliders.

[0007] Optionally, the first sliding mechanism further includes a gantry frame, which is mounted on the base, and the first guide rail is mounted on the gantry frame.

[0008] Optionally, the surface of the second guide rail connected to the microscope is further provided with a third guide rail, which extends in a third direction. The third guide rail is provided with a second slider, and the second slider is provided with a bracket for fixing the microscope.

[0009] Optionally, the third sliding mechanism further includes a fixed seat and a fixed plate disposed on the fixed seat. The fixed seat is disposed on the moving end of the second sliding mechanism, and the fixed plate extends in a third direction. A second guide rail, which is fixedly connected to the moving end of the second sliding mechanism, is fitted onto the surface of the fixed plate.

[0010] Optionally, one of two adjacent second guide rails is provided with a glass bead, and the other is provided with multiple bead grooves that can cooperate with the glass bead. The multiple bead grooves are evenly distributed along a third direction. The glass bead is connected to a spring. The glass bead can extend out of the second guide rail and be inserted into the bead groove under the drive of the spring, or retract into the second guide rail under the pressure of the surface of the adjacent second guide rail.

[0011] Optionally, the second sliding mechanism includes a frame, a linear drive member mounted on the frame, and a sliding plate connected to the output end of the linear drive member. The frame is fixedly connected to the first slider, and the sliding plate moves along a second direction under the drive of the linear drive member.

[0012] Optionally, the vertical slide includes a horizontal part and a vertical part connected to the horizontal part. The horizontal part is connected to the output end of the linear drive, and the vertical part is connected to the guide rail assembly. A fourth guide rail is provided on the side of the vertical part facing the frame. The fourth guide rail extends along a second direction, and a third slider that cooperates with the fourth guide rail is provided on the frame.

[0013] Optionally, the second sliding mechanism is provided with a first fixed frame and a first locking member that is threadedly engaged with the first fixed frame. After the first locking member is rotated, it can abut against the first sliding mechanism to fix the second sliding mechanism.

[0014] Another aspect of the embodiments of this application provides a wafer reliability parallel testing device, including a base, a plurality of wafer testing stations disposed on the base, and a cantilever microscope for wafer reliability parallel testing as described above, wherein the microscope of the cantilever microscope is connected to the second guide rail of a third sliding mechanism.

[0015] The beneficial effects of this application include: This application provides a cantilever microscope for parallel wafer reliability testing, configured on a base. The cantilever microscope is used to observe the positions of wafer particles at multiple wafer testing stations set on the base. The cantilever microscope includes: a first sliding mechanism, a second sliding mechanism, a third sliding mechanism, and a microscope. The first sliding mechanism includes a first guide rail and a first slider slidably disposed on the first guide rail. The first guide rail is fixedly connected to the base and extends along a first direction. The fixed end of the second sliding mechanism is fixedly connected to the first slider, and the moving end reciprocates along a second direction, which is perpendicular to the first direction. The third sliding mechanism includes a guide rail assembly, which includes at least two second guide rails that slide in sequence. The second guide rails extend along a third direction, which is perpendicular to both the first and second directions. One of the two outermost second guide rails is fixedly connected to the moving end of the second sliding mechanism, and the other is connected to the microscope. This cantilever microscope achieves a large stroke movement in the first direction through the first guide rail extending along the first direction and the first slider that slides in sequence with the first guide rail; and achieves a large stroke movement in the second direction through the at least two second guide rails that slide in sequence with each other extending along the third direction. After being mounted on the base, the cantilever microscope is horizontal in both the first and third directions. Therefore, the cantilever microscope can meet the application requirements of a microscope with a large stroke in the horizontal direction. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 One of the structural schematic diagrams of a cantilever microscope for parallel testing of wafer reliability provided in an embodiment of this application; Figure 2 A second schematic diagram of a cantilever microscope for parallel testing of wafer reliability provided in an embodiment of this application; Figure 3 for Figure 2 A magnified view of a portion of point A in the middle; Figure 4 One of the partial structural schematic diagrams of the third sliding mechanism in a cantilever microscope for parallel testing of wafer reliability provided in an embodiment of this application; Figure 5 This is a second partial structural schematic diagram of the third sliding mechanism in a cantilever microscope used for parallel wafer reliability testing, provided as an embodiment of this application. Figure 6 The third partial structural schematic diagram of the third sliding mechanism in the cantilever microscope for parallel testing of wafer reliability provided in the embodiments of this application; Figure 7 One of the schematic diagrams of the second slide rail and glass bead in a cantilever microscope for parallel testing of wafer reliability provided in the embodiments of this application; Figure 8 This is a second schematic diagram of the second slide rail and glass bead in a cantilever microscope for parallel wafer reliability testing provided in an embodiment of this application. Figure 9 A schematic diagram of the second and third sliding mechanisms in a cantilever microscope for parallel testing of wafer reliability provided in an embodiment of this application; Figure 10 for Figure 9 A schematic diagram of the local structure at point B; Figure 11 This is a schematic diagram of the structure of the parallel wafer reliability testing equipment provided in the embodiments of this application.

[0018] Icons: 10-Cantilever microscope; 11-First sliding mechanism; 111-First guide rail; 112-First slider; 113-Gantry frame; 12-Second sliding mechanism; 121-Standing frame; 122-Linear drive; 123-Vertical slide plate; 1231-Horizontal section; 1232-Vertical section; 124-Fourth guide rail; 125-Third slider; 13-Third sliding mechanism; 131-Second guide rail; 1311-Slide groove; 132-Third guide rail ; 133-Second slider; 134-Bracket; 1341-Adjusting knob; 135-Connecting plate; 136-Fixed base; 137-Fixed plate; 141-First fixed frame; 142-First locking element; 143-Glass bead; 144-Bead groove; 145-Mounting cylinder; 146-Second fixed frame; 147-Second locking element; 20-Base; 30-Microscope; 40-Probe stage; X-First direction; Z-Second direction; Y-Third direction. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0020] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. It should be noted that, unless otherwise specified, the various features in the embodiments of this application can be combined with each other, and the combined embodiments are still within the protection scope of this application.

[0021] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0022] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this application is in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0023] In the description of this application, it should also be noted that, unless otherwise expressly specified and limited, the terms "set up," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0024] Please refer to Figure 1 This application provides a cantilever microscope 10 for parallel wafer reliability testing, configured on a base 20. The cantilever microscope 10 is used to observe the positions of wafer particles at multiple wafer testing stations set on the base 20. The cantilever microscope 10 includes: a first sliding mechanism 11, a second sliding mechanism 12, a third sliding mechanism 13, and a microscope 30. The sliding output end of the third sliding mechanism 13 is used to mount the microscope 30. The first sliding mechanism 11, the second sliding mechanism 12, and the third sliding mechanism 13 respectively complete movements in a first direction X, a second direction Z, and a third direction Y. The first direction X, the second direction Z, and the third direction Y are perpendicular to each other, so that the microscope 30 can stop at any position within a preset space.

[0025] Specifically, please refer to the following: Figure 2 and Figure 3 The first sliding mechanism 11 includes a first guide rail 111 and a first slider 112 slidably disposed on the first guide rail 111. The first guide rail 111 is fixedly connected to the base 20 and extends along the first direction X. The fixed end of the second sliding mechanism 12 is fixedly connected to the first slider 112, and the moving end reciprocates along the second direction Z, which is perpendicular to the first direction X. The third sliding mechanism 13 includes a guide rail assembly, which includes at least two second guide rails 131 that slide in sequence. The second guide rails 131 extend along a third direction Y, which is perpendicular to the first direction X and the second direction Z, respectively. One of the two outermost second guide rails 131 is fixedly connected to the moving end of the second sliding mechanism 12, and the other is connected to the microscope 30.

[0026] It should be noted that the first slider 112 slides along the extension direction of the first guide rail 111 (i.e., the first direction X) on the first guide rail 111, and the first slider 112 can be manually driven by the operator. The first guide rail 111 can be set to be relatively long to achieve a large stroke movement of the microscope 30 in the first direction X.

[0027] The fixed end of the second sliding mechanism 12 is fixedly mounted on the first slider 112 and moves with the first slider 112. The moving segment of the second sliding mechanism 12 reciprocates along the second direction Z, thereby realizing the movement of the microscope 30 in the second direction Z.

[0028] Please refer to the reference. Figure 4 The guide rail assembly of the third sliding mechanism 13 includes at least two second guide rails 131 that slide in sequence. Sliding in sequence means that the second guide rails 131 are stacked, with adjacent second guide rails 131 sliding in contact with each other. For example, there are three second guide rails 131 stacked, with the first second guide rail 131 sliding in contact with the second second guide rail 131, and the second second guide rail 131 sliding in contact with the third second guide rail 131. Please refer to the reference. Figure 5 One approach to achieve a sliding fit is to provide a groove 1311 on one of the second guide rails 131, with the other second guide rail 131 embedded within the groove 1311 and sliding back and forth along it. In the guide rail assembly, the two outermost second guide rails 131 are connected to the second sliding mechanism 12 and the microscope 30, respectively. The second guide rails 131 can be manually driven by the operator; by extending and shortening the guide rail assembly, the microscope 30 can achieve a large stroke in the third direction Y. It is understood that each second guide rail 131 in the guide rail assembly extends along the third direction Y, but their lengths can be equal or unequal. The longer and more numerous the second guide rails 131, the greater the stroke of the microscope 30 in the third direction Y. However, excessively long or numerous second guide rails 131 can lead to structural instability; those skilled in the art must design the number and length of the second guide rails 131 reasonably according to actual needs. A limiting structure can be provided on two adjacent second guide rails 131 to prevent them from separating due to excessive sliding distance.

[0029] After the cantilever microscope 10 is mounted on the base 20, the first direction X and the third direction Y are horizontal, and the second direction Z is vertical.

[0030] The aforementioned cantilever microscope 10 achieves a large stroke movement in the first direction X through a first guide rail 111 extending along the first direction X and a first slider 112 that slides in cooperation with the first guide rail 111; and achieves a large stroke movement in the third direction Y through at least two second guide rails 131 that slide in cooperation with each other extending along the third direction Y. After the cantilever microscope 10 is installed on the base 20, both the first direction X and the third direction Y are horizontal. Therefore, the aforementioned cantilever microscope 10 can meet the application requirements of the microscope 30 for a large stroke in the horizontal direction.

[0031] Alternatively, please refer to Figure 2 and Figure 3 The number of first guide rails 111 is at least two, and the at least two first guide rails 111 are arranged in parallel. Each first guide rail 111 is provided with at least one first slider 112. The fixed end of the second sliding mechanism 12 is fixedly connected to at least two first sliders 112 at the same time.

[0032] Two or more first guide rails 111 are provided, and the fixed end of the second sliding mechanism 12 is simultaneously fixedly connected to all the first sliders 112. The two or more first sliders 112 jointly drive the second sliding mechanism 12 to move. This configuration can improve the displacement accuracy of the microscope 30 in the first direction X.

[0033] Optionally, the first sliding mechanism 11 further includes a gantry frame 113, which is mounted on the base 20, and the first guide rail 111 is mounted on the gantry frame 113.

[0034] The gantry 113 can lift the first guide rail 111 to a certain height, so that there is a certain distance between the microscope 30 and the base 20, preventing interference between the microscope 30 and other structures on the base 20. At the same time, the gantry 113 can also support the first guide rail 111, so that the first sliding mechanism 11 as a whole has sufficient rigidity and stability.

[0035] Optionally, the second sliding mechanism 12 is provided with a first fixing frame 141 and a first locking member 142 that is threadedly engaged with the first fixing frame 141. After the first locking member 142 is rotated, it can abut against the first sliding mechanism 11 to fix the second sliding mechanism 12.

[0036] The first fixing bracket 141 is fixedly mounted on the second sliding mechanism 12 and moves along the first guide rail 111 following the second sliding mechanism 12. The first fixing bracket 141 has a threaded hole, and a first locking member 142 is disposed within the threaded hole. Rotating the first locking member 142 allows its end to move closer to or further away from the first sliding mechanism 11. When the first locking member 142 abuts against the first sliding mechanism 11, the fixed end of the second sliding mechanism 12 is fixed, ensuring stable positioning of the microscope 30 in the first direction X. It can be understood that at this time, the microscope 30 is only fixed in the first direction X, but can still move along the second direction Z and the third direction Y. The first locking member 142 can abut against the first guide rail 111 or the gantry 113 of the first sliding mechanism 11. The direction of movement of the first locking member 142 can be parallel to the third direction Y.

[0037] Alternatively, please refer to Figure 2 and Figure 4 There are three second guide rails 131, with the middle second guide rail 131 being embedded in the second guide rails 131 on both sides respectively.

[0038] By setting up three second guide rails 131, the length of a single second guide rail 131 can be minimized while achieving a large stroke movement of the microscope 30 in the third direction Y, thus ensuring the stability of the structure.

[0039] The two second guide rails 131 on both sides are provided with grooves. The two opposite sides of the middle second guide rail 131 are respectively embedded into the grooves of the other two second guide rails 131, thereby realizing a sliding fit between adjacent second guide rails 131. Of course, the two second guide rails 131 on both sides can also be embedded into the middle second guide rail 131, that is, grooves are provided on the opposite sides of the middle second guide rail 131 for the two second guide rails 131 to be embedded. However, this solution requires two grooves to be machined on the middle second guide rail 131, and in order to ensure the reliability of the sliding fit, the depth of the grooves should not be too small. Therefore, the thickness of the middle second guide rail 131 is required to be relatively large, which is not conducive to the miniaturization design of the guide rail assembly.

[0040] Optionally, please refer to the following: Figure 5 The surface of the second guide rail 131 connected to the microscope 30 is also provided with a third guide rail 132. The third guide rail 132 extends along the third direction Y. A second slider 133 is provided on the third guide rail 132. A bracket 134 is provided on the second slider 133. The bracket 134 is used to fix the microscope 30.

[0041] The third guide rail 132 is fixedly connected to the second guide rail 131. A second slider 133 is mounted on the third guide rail 132, and a support 134 for fixing the microscope 30 is mounted on the second slider 133. The microscope 30 can move along the third direction Y following the second slider 133. Please refer to the reference for this configuration. Figure 6 When all the second guide rails 131 in the guide rail assembly are retracted, the second slider 133 can also be driven to slide in the direction of the second moving mechanism, thereby retracting the microscope 30.

[0042] An adjustment knob 1341 can be installed on the support 134 to fine-tune the movement stroke of the microscope 30 in the second direction Z.

[0043] Furthermore, a connecting plate 135 is provided between the second guide rail 131 and the third guide rail 132 connected to the microscope 30. The second guide rail 131 and the third guide rail 132 are both fixed on the connecting plate 135, thereby realizing a fixed connection between the third guide rail 132 and the second guide rail 131, and also improving the overall rigidity and stability of the guide rail assembly.

[0044] Alternatively, please refer to Figure 2 and Figure 4 The third sliding mechanism 13 also includes a fixed seat 136 and a fixed plate 137 disposed on the fixed seat 136. The fixed seat 136 is disposed on the moving end of the second sliding mechanism 12. The fixed plate 137 extends along the third direction Y. The second guide rail 131, which is fixedly connected to the moving end of the second sliding mechanism 12, is fitted onto the surface of the fixed plate 137.

[0045] The fixed base 136 is fixedly connected to the moving end of the second sliding mechanism 12 and reciprocates along the second direction Z following the moving end. A fixed plate 137 is provided on the fixed base 136, extending along the third direction Y, and is used to fix the second guide rail 131, which is fixedly connected to the moving end of the second sliding mechanism 12. The fixed plate 137 can support the second guide rail 131, thereby improving the overall rigidity and stability of the guide rail assembly.

[0046] Alternatively, please refer to Figure 7 and Figure 8 One of the two adjacent second guide rails 131 is provided with a glass bead 143, and the other is provided with a plurality of bead grooves 144 that can cooperate with the glass bead 143. The plurality of bead grooves 144 are evenly distributed along the third direction Y. The glass bead 143 is connected to a spring. The glass bead 143 can extend out of the second guide rail 131 and be inserted into the bead groove 144 under the drive of the spring, or retract into the second guide rail 131 under the pressure of the surface of the adjacent second guide rail 131.

[0047] When the bead groove 144 on the other second guide rail 131 moves to the position of the glass bead 143, the glass bead 143 pops out and gets stuck in the bead groove 144, thus achieving relative fixation between the two adjacent second guide rails 131. When the operator pulls the second guide rail 131, the pulling force can overcome the spring force, causing the two adjacent second guide rails 131 to be released from fixation, and the glass bead 143 retracts into its respective second guide rail 131 under the pressure of the surface of the adjacent second guide rail 131.

[0048] Furthermore, both the glass bead 143 and the spring are disposed inside the mounting cylinder 145. One end of the spring abuts against the inner wall of the mounting cylinder 145, and the other end abuts against the glass bead 143. The second guide rail 131 is provided with a through hole, and the mounting cylinder 145 is fixed inside the through hole.

[0049] Optionally, the bracket 134 is provided with a second fixing bracket 146 and a second locking member 147 that is threadedly engaged with the second fixing bracket 146. After the second locking member 147 is rotated, it can abut against the guide rail assembly to fix the microscope 30.

[0050] The second mounting bracket 146 is fixedly mounted on the support 134 and moves along the third guide rail 132 with the support 134. The second mounting bracket 146 has a threaded hole, and a second locking member 147 is disposed within the threaded hole. Rotating the second locking member 147 allows its end to move closer to or further away from the guide rail assembly. When the second locking member 147 abuts against the guide rail assembly, the support 134 is fixed, ensuring stable positioning of the microscope 30 in the third direction Y. It can be understood that at this time, the microscope 30 is only fixed in the third direction Y, but can still move along the first direction X and the second direction Z. The second locking member 147 can abut against the third guide rail 132 or the connecting plate 135 of the guide rail assembly. The direction of movement of the second locking member 147 can be selected to be parallel to the second direction Z.

[0051] Alternatively, please refer to Figure 2 and Figure 3 The second sliding mechanism 12 includes a frame 121, a linear drive 122 mounted on the frame 121, and a sliding plate 123 connected to the output end of the linear drive 122. The frame 121 is fixedly connected to the first slider 112, and the sliding plate 123 moves along the second direction Z under the drive of the linear drive 122.

[0052] It can be understood that the support frame 121 is the fixed end of the second sliding mechanism 12, and the sliding plate 123 is the moving end of the second sliding mechanism 12. The support frame 121 is fixedly mounted on the first slider 112, the linear drive 122 is fixedly mounted on the support frame 121, and the sliding plate 123 is fixedly connected to the output end of the linear drive 122. The support frame 121 moves with the first slider 112, driving the linear drive 122 and the sliding plate 123 to move along the first direction X. The output end of the linear drive 122 reciprocates along the second direction Z, thereby driving the sliding plate 123 to reciprocate along the second direction Z, realizing the movement of the microscope 30 in the second direction Z. The linear drive 122 can be an electric cylinder, a pneumatic cylinder, or a linear module, a ball screw assembly, etc.

[0053] Optionally, the vertical slide plate 123 includes a horizontal portion 1231 and a vertical portion 1232 connected to the horizontal portion 1231. The horizontal portion 1231 is connected to the output end of the linear drive member 122, and the vertical portion 1232 is connected to the guide rail assembly. Please refer to the reference. Figure 9 and Figure 10 A fourth guide rail 124 is provided on the side of the vertical part 1232 facing the support frame 121. The fourth guide rail 124 extends along the second direction Z. A third slider 125 is provided on the support frame 121 to cooperate with the fourth guide rail 124.

[0054] When the linear drive 122 drives the vertical slide plate 123 to move along the second direction Z, the fourth guide rail 124, which is fixedly connected to the vertical slide plate 123, slides within the third slider 125. The fourth guide rail 124 and the third slider 125 guide the movement of the vertical slide plate 123, ensuring the guiding accuracy of the vertical slide plate 123.

[0055] In summary, the cantilever microscope 10 provided in this application embodiment has a simple and stable structure, which can meet the application requirements of the microscope 30 in the horizontal direction with a large stroke, and can also reduce space occupation.

[0056] This embodiment also provides a parallel wafer reliability testing device; please refer to [reference needed]. Figure 11 and Figure 2 It includes a base 20, multiple wafer testing stations set on the base 20, and a cantilever microscope 10 for parallel wafer reliability testing as described above. The microscope 30 of the cantilever microscope is connected to the second guide rail 131 of the third sliding mechanism 13.

[0057] This parallel wafer reliability testing equipment includes the same structure and beneficial effects as the cantilever microscope 10 in the foregoing embodiments. The structure and beneficial effects of the cantilever microscope 10 have been described in detail in the foregoing embodiments and will not be repeated here.

[0058] Optionally, the base 20 is provided with multiple probe stations 40, which are distributed in a stepped manner on the base 20.

[0059] The first sliding mechanism 11 of the cantilever microscope 10 satisfies the observation range of the multiple probe stations 40 placed in the first direction X, the second sliding mechanism 12 satisfies the observation range of the multiple probe stations 40 at different heights, and the third sliding mechanism 13 satisfies the observation range of the multiple probe stations 40 placed in the second direction Z.

[0060] Optionally, the third sliding mechanism 13 of the cantilever microscope 10 includes a support 134 for fixing the microscope 30. The support 134 is provided with an adjustment knob 1341 to finely adjust the range of the microscope in the second direction Z.

[0061] The above description is merely an optional embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A cantilever microscope for parallel wafer reliability testing, configured on a base (20), the cantilever microscope being used to observe the positions of wafer particles at multiple wafer testing stations set on the base; characterized in that, The cantilever microscope includes: a first sliding mechanism (11), a second sliding mechanism (12), a third sliding mechanism (13), and a microscope (30). The first sliding mechanism (11) includes a first guide rail (111) and a first slider (112) slidably disposed on the first guide rail (111). The first guide rail (111) is fixedly connected to the base (20) and extends along the first direction (X). The fixed end of the second sliding mechanism (12) is fixedly connected to the first slider (112), and the moving end reciprocates along the second direction (Z), which is perpendicular to the first direction (X). The third sliding mechanism (13) includes a guide rail assembly, which includes at least two second guide rails (131) that slide in sequence. The second guide rails (131) extend along a third direction (Y), which is perpendicular to the first direction (X) and the second direction (Z). One of the two outermost second guide rails (131) is fixedly connected to the moving end of the second sliding mechanism (12), and the other is connected to the microscope (30).

2. The cantilever microscope for parallel wafer reliability testing as described in claim 1, characterized in that, The number of the first guide rails (111) is at least two, and the at least two first guide rails (111) are arranged in parallel. Each first guide rail (111) is provided with at least one first slider (112), and the fixed end of the second sliding mechanism (12) is fixedly connected to at least two first sliders (112) at the same time.

3. The cantilever microscope for parallel wafer reliability testing as described in claim 1, characterized in that, The first sliding mechanism (11) further includes a gantry frame (113), which is mounted on the base (20), and the first guide rail (111) is mounted on the gantry frame (113).

4. The cantilever microscope for parallel wafer reliability testing as described in claim 1, characterized in that, The surface of the second guide rail (131) connected to the microscope (30) is also provided with a third guide rail (132), the third guide rail (132) extends along the third direction (Y), the third guide rail (132) is provided with a second slider (133), the second slider (133) is provided with a bracket (134), and the bracket (134) is used to fix the microscope (30).

5. The cantilever microscope for parallel wafer reliability testing as described in claim 1, characterized in that, The third sliding mechanism (13) further includes a fixed seat (136) and a fixed plate (137) disposed on the fixed seat (136). The fixed seat (136) is disposed on the moving end of the second sliding mechanism (12). The fixed plate (137) extends along the third direction (Y). The second guide rail (131) fixedly connected to the moving end of the second sliding mechanism (12) is attached to the surface of the fixed plate (137).

6. The cantilever microscope for parallel wafer reliability testing as described in claim 1, characterized in that, One of the two adjacent second guide rails (131) is provided with a glass bead (143), and the other is provided with a plurality of bead grooves (144) that can cooperate with the glass bead (143). The plurality of bead grooves (144) are evenly distributed along the third direction (Y). The glass bead (143) is connected to a spring. The glass bead (143) can extend out of the second guide rail (131) and be inserted into the bead groove (144) under the drive of the spring, or retract into the second guide rail (131) under the pressure of the surface of the adjacent second guide rail (131).

7. The cantilever microscope for parallel testing of wafer reliability as described in claim 1, characterized in that, The second sliding mechanism (12) includes a stand (121), a linear drive (122) disposed on the stand (121), and a sliding plate (123) connected to the output end of the linear drive (122). The stand (121) is fixedly connected to the first slider (112), and the sliding plate (123) moves along the second direction (Z) under the drive of the linear drive (122).

8. The cantilever microscope for parallel testing of wafer reliability as described in claim 7, characterized in that, The vertical slide plate (123) includes a horizontal part (1231) and a vertical part (1232) connected to the horizontal part (1231). The horizontal part (1231) is connected to the output end of the linear drive (122). The vertical part (1232) is connected to the guide rail assembly. A fourth guide rail (124) is provided on the side of the vertical part (1232) facing the frame (121). The fourth guide rail (124) extends along the second direction (Z). A third slider (125) is provided on the frame (121) to cooperate with the fourth guide rail (124).

9. The cantilever microscope for parallel testing of wafer reliability as described in claim 1, characterized in that, The second sliding mechanism (12) is provided with a first fixing frame (141) and a first locking member (142) that is threadedly engaged with the first fixing frame (141). After the first locking member (142) is rotated, it can abut against the first sliding mechanism (11) to fix the second sliding mechanism (12).

10. A parallel testing device for wafer reliability, characterized in that, The device includes a base (20), multiple wafer testing stations disposed on the base (20), and a cantilever microscope for parallel wafer reliability testing as described in any one of claims 1 to 9, wherein the microscope of the cantilever microscope is connected to the second guide rail (131) of the third sliding mechanism (13).

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