Electromagnetic regulation and control method for improving formation of glial scar layer around implantable electrode
By applying low-frequency pulsed currents at different stages to the implanted electrode array, microglia and astrocytes were modulated, thus solving the problem of glial scar formation around the implanted electrodes and achieving long-term stability of electrode function and continuous improvement of nerve signals.
Patent Information
- Application Number
- CN202610596131.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-30
- Publication Date
- 2026-06-09
AI Technical Summary
Existing technologies cannot simultaneously provide a controllable, non-pharmacological, and long-term safe method to improve the formation of glial scars around implanted electrodes, leading to electrode function decline and signal quality degradation.
By selecting electrode channels on an implantable brain-computer interface electrode array and applying low-frequency pulsed stimulation currents at different stages, including early, mid, and late low-frequency pulsed stimulation currents, the activity of microglia and astrocytes can be modulated to control the formation and stability of glial scar layers.
It achieves controllable, non-pharmacological, and long-term safe electromagnetic modulation of the glial scar layer, maintains the stability of the electrode-tissue interface, extends the lifespan of the electrode, and improves the quality of nerve signal recording.