Deposition apparatus for differential deposition of coating thickness and method of deposition thereof

By forming independent sub-chambers on the workpiece surface and individually adjusting the process parameters, the problem of uneven silicon carbide coating thickness on different surfaces of the workpiece was solved, achieving a high-precision coating deposition effect.

CN122169047APending Publication Date: 2026-06-09湖南德智新材料股份有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
湖南德智新材料股份有限公司
Filing Date
2026-03-30
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

When depositing silicon carbide coatings on different surfaces of the same workpiece, existing technologies cannot meet the requirements for high deposition accuracy, resulting in large differences in coating thickness, which cannot meet the requirements for high protection, reduced thermal resistance and enhanced strength in practical applications.

Method used

Multiple mask assemblies are detachably connected to the workpiece to form independent sub-chambers. The aperture ratio and process parameters of each sub-chamber are individually adjusted by the control component to ensure that each surface to be processed is deposited to the preset thickness. Combined with the thickness detection component, the parameters are adjusted in real time to improve the deposition accuracy.

Benefits of technology

This achieves uniformity and stability of coating thickness on each surface, avoids airflow crosstalk and incomplete coating, improves deposition accuracy, and ensures that the coating thickness on each surface meets the preset requirements.

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Abstract

This application provides a deposition apparatus and method for differential coating thickness deposition, relating to the field of coating deposition technology. The deposition apparatus includes a process furnace, multiple mask assemblies, multiple process assemblies, and a control assembly. The mask assemblies and the surfaces to be processed enclose sub-chambers, each sub-chamber being independent. The aperture ratio of multiple through-holes in each mask assembly is individually controlled. Each set of process assemblies corresponds one-to-one with a sub-chamber, and the process parameters for supplying gas to each sub-chamber are individually controlled. The control assembly is configured to dynamically adjust the aperture ratio and / or process parameters corresponding to each sub-chamber based on the difference between the thickness of the coating deposited on each surface and a preset thickness. Since the deposition accuracy for depositing coatings of different thicknesses on multiple surfaces of a workpiece cannot meet the requirements, the deposition apparatus and method for differential coating thickness deposition of this application can improve the deposition accuracy when depositing coatings of different thicknesses on multiple surfaces of a workpiece.
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