Reticle pattern-down reticle transfer device

Abstract

The application discloses a mask pattern downward mask transfer device, comprising a base, an X-direction moving table, a Y-direction moving table, a clamping jaw group with two clamping units, a pushing positioning group with a fixed unit and a pushing unit, a lifting rotating table and a receiving table with four receiving frames. The receiving table has a receiving position, a clamping position and a bottom position in the up-down moving position. When the receiving table is in the clamping position, the two clamping units can clamp or release the mask on the receiving table, and the pushing unit can push or not push the mask.

Description

Technical Field

[0001] This invention relates to photomask transfer technology, and in particular to a photomask transfer device with the patterned side facing down. Background Technology

[0002] When inspecting photomasks, there is a need to move the photomask on the machine. Taiwan Patent No. I609235 discloses a photomask inspection device and method. In this patent, the photomask transfer technology discloses a moving platform displaced in a first direction, a rotating platform displaced in a second direction, and a support platform for carrying the photomask. Therefore, this patent only discloses the movement of the photomask between the first direction and the perpendicular second direction, equivalent to movement in the X or Y direction, but does not disclose the specific technical details of movement in other directions.

[0003] Furthermore, in the aforementioned cases, the patterned side of the photomask was placed facing upwards during testing. This practice has its drawbacks. While most photomasks have a protective film on the patterned side, some are exposed without it. Crucially, the pattern itself must not be contaminated by dust. The protective film is also a relatively expensive component and should be protected from dust contamination as much as possible. However, even in cleanrooms, dust accumulation is unavoidable. The upward-facing patterned side or protective film is highly susceptible to dust contamination during testing, leading to the need for cleaning and subsequent drying, or interference during testing and flawed results.

[0004] As can be seen from the above, the problem to be solved in this case is how to transfer the photomask with its patterned side facing down, and how to make it structurally different from or even superior to the aforementioned technologies. Summary of the Invention

[0005] The main objective of this invention is to provide a photomask transfer device with the patterned side facing down, which allows the photomask to be transferred with its patterned side facing down.

[0006] Another object of the present invention is to provide a photomask transfer device with the patterned face down, which can transfer a photomask with the patterned face down without having a structure different from the prior art.

[0007] To achieve the above objectives, the present invention provides a photomask transfer device with the patterned surface facing downwards, comprising: a base; an X-axis movable stage disposed on the base and driven to move in the X direction of the base; a Y-axis movable stage disposed on the X-axis movable stage and driven to move in the Y direction of the X-axis movable stage; a gripper assembly having two facing gripping units disposed on the Y-axis movable stage, the two gripping units being capable of gripping two opposite sides of a rectangular photomask, thereby gripping the photomask; a push positioning assembly having a stationary unit and a push unit disposed on the Y-axis movable stage, the push unit having a push block to push the photomask against the stationary unit for positioning; a lifting and rotating stage disposed on the base and driven to move in the Z direction of the base; and A receiving platform is provided on the lifting and rotating platform, and moves up and down or rotates horizontally in the Z direction with the lifting and rotating platform. The receiving platform has four receiving frames and can accommodate the photomask. The photomask has a patterned side facing down, and the four receiving frames respectively receive and abut against the four sides of the bottom of the photomask. Among the positions in which the receiving platform moves up and down, there is a receiving position, a clamping position, and a bottom position. When the receiving platform is in the receiving position, the four receiving frames are higher than the two clamping units. When the receiving platform is in the clamping position, the photomask is located between the two clamping units, and the two clamping units can clamp or release the photomask located on the receiving platform, and the pushing unit can push or not push the photomask. When the receiving platform is in the bottom position, the four receiving frames are lower than the two clamping units.

[0008] Therefore, the present invention allows photomasks to be transferred with their patterned side facing down. Furthermore, the present invention allows for the transfer of photomasks with their patterned side facing down, even with a structure different from that of the prior art.

[0009] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments, but this is not intended to limit the present invention. Attached Figure Description

[0010] Figure 1 This is a perspective view of the first preferred embodiment of the present invention.

[0011] Figure 2 This is a partially cutaway perspective view of the first preferred embodiment of the present invention.

[0012] Figure 3 This is a partially cut-away perspective view of another preferred embodiment of the present invention, showing... Figure 2 The viewing angles are approximately 90 degrees apart.

[0013] Figure 4 This is a partial cutaway perspective view of the first preferred embodiment of the present invention, showing an upward view.

[0014] Figure 5This is a partial component configuration diagram of the first preferred embodiment of the present invention, showing the relationship between the gripper assembly and the push positioning assembly.

[0015] Figure 6 This is a partial component assembly diagram of the first preferred embodiment of the present invention, showing the Z-axis moving platform and the receiving platform.

[0016] Figure 7 This is another component configuration diagram of the first preferred embodiment of the present invention, showing the relationship between the receiving platform, the gripper assembly, and the push positioning assembly.

[0017] Figure 8 This is an action diagram of the first preferred embodiment of the present invention.

[0018] Figure 9 This is another action diagram of the first preferred embodiment of the present invention.

[0019] Figure 10 This is another action diagram of the first preferred embodiment of the present invention.

[0020] Figure 11 This is another action diagram of the first preferred embodiment of the present invention.

[0021] Figure 12 This is yet another action diagram of the first preferred embodiment of the present invention.

[0022] Figure 13 This is yet another action diagram of the first preferred embodiment of the present invention.

[0023] Figure 14 This is a further action diagram of the first preferred embodiment of the present invention.

[0024] Figure 15 This is another action diagram for the first preferred embodiment of the present invention.

[0025] Figure 16 This is a partial component configuration diagram of the second preferred embodiment of the present invention.

[0026] In the attached figures, the following labels are used:

[0027] 10: Photomask transfer device with the pattern face down

[0028] 11: Base

[0029] 21: X-axis mobile station

[0030] 31: Y-axis mobile station

[0031] 41: Gripper Assembly

[0032] 42: Clamping unit

[0033] 43: Clamping Driver

[0034] 44: Gripper

[0035] 441: Upper clip

[0036] 442: Lower clip

[0037] 443: Opening

[0038] 46: Low-level gripper

[0039] 51: Promoting the Positioning Group

[0040] 52: Fixed Unit

[0041] 56: Propulsion Unit

[0042] 57: Push Block

[0043] 58: Drive the driver

[0044] 61: Lifting and Rotating Platform

[0045] 71: Receiving Platform

[0046] 72: Support frame

[0047] 721: Inclined Wall

[0048] 91: Light Mask

[0049] P1: Receiving position

[0050] P2: Clamping position

[0051] P3: Lower layer clamping position

[0052] P4: Bottom Position

[0053] 10': Photomask transfer device with the pattern face down

[0054] 71': Receiving Platform Detailed Implementation

[0055] To illustrate the technical features of the present invention in detail, the following preferred embodiments are described below with reference to the accompanying drawings, wherein:

[0056] like Figures 1 to 7 As shown, the present invention, through a first preferred embodiment, describes a photomask transfer device 10 with the photomask pattern facing downwards, mainly composed of a base 11, an X-axis moving stage 21, a Y-axis moving stage 31, a gripper assembly 41, a push and positioning assembly 51, a lifting and rotating stage 61, and a receiving stage 71, wherein:

[0057] The X-axis moving stage 21 is located on the base 11 and is driven to move in the X direction of the base 11. In practice, existing linear guides or ball screws can be used in conjunction with a drive motor, but since this is not the focus of this case, it will not be described in detail.

[0058] The Y-axis moving stage 31 is disposed on the X-axis moving stage 21 and is driven to move in the Y direction of the X-axis moving stage 21. In actual embodiments, the components used in the Y-axis moving stage 31 are similar to those in the X-axis moving stage 21, and are not the focus of this case, so they will not be described in detail.

[0059] The gripper assembly 41 has two opposing gripping units 42 disposed on the Y-axis moving stage 31. The two gripping units 42 are used to grip a rectangular photomask 91 (shown in the figure). Figure 10 The photomask 91 is held in place by two opposite sides of the clamping unit 42. In this first embodiment, each clamping unit 42 has a clamping driver 43 and two clamping jaws 44. The clamping driver 43 drives the two clamping jaws 44 to move forward or backward toward another clamping unit 42, and the two clamping jaws 44 of one clamping unit 42 face each other. In addition, in this first embodiment, each clamping jaw 44 has an upper clamping piece 441 and a lower clamping piece 442. The upper clamping piece 441 and the lower clamping piece 442 are vertically opposite each other, and an outwardly opening 443 is formed between the upper clamping piece 441 and the lower clamping piece 442.

[0060] Furthermore, the gripper assembly 41 also has two lower grippers 46, which are lower than the two grippers 44. The two lower grippers 46 of one gripping unit 42 are opposite to the two lower grippers 46 of the other gripping unit 42, and the structure of each lower gripper 46 is similar to that of each gripper 44. The two lower grippers 46 on each gripping unit 42 are configured not to overlap with the two grippers 44 above them in a vertical relationship. This arrangement allows each gripper 44 or each lower gripper 46 to adjust its horizontal position independently, making adjustments more convenient.

[0061] The push positioning assembly 51 includes a stationary unit 52 and a push unit 56 disposed on the Y-axis moving stage 31. The push unit 56 has a push block 57 for pushing the photomask 91 to abut against the stationary unit 52 for positioning. In this first embodiment, the push unit 56 has a push driver 58 that drives the push block 57 to abut against the photomask 91, and the stationary unit 52 consists of two fixed protrusions.

[0062] The lifting rotary table 61 is mounted on the base 11 and is driven to move in the Z direction of the base 11. In practical embodiments, the components used in the lifting rotary table 61 may also be linear guides, servo motors, or other known components, and therefore will not be described in detail. Here, the X and Y directions refer to two directions perpendicular to the horizontal plane, while the Z direction refers to a direction perpendicular to the horizontal plane.

[0063] The receiving platform 71 is disposed on the lifting and rotating platform 61, and moves up and down in the Z direction or rotates horizontally with the lifting and rotating platform 61. The receiving platform 71 has four receiving frames 72. The receiving platform 71 is used to place the photomask 91. The surface of the photomask 91 has a patterned surface (not shown in the figure) facing downwards, and there is an inclined wall 721 opposite to two of the receiving frames 72. The two receiving frames 72 use their inclined walls 721 to support and abut against the four sides of the bottom of the photomask 91. The function of the inclined wall 721 is to contact the photomask 91 with an inclined surface, so as to minimize the contact area. In this first embodiment, the two grippers 44 of each clamping unit 42 will not interfere with the receiving frames 72 of the receiving platform 71. In addition, the patterned surface of the photomask 91 is generally protected by a protective film, but in some embodiments, the patterned surface is not provided with a protective film.

[0064] The receiving platform 71 has several vertically movable positions, including a receiving position P1, a clamping position P2, a lower clamping position P3, and a bottom position P4. When the receiving platform 71 is in the receiving position P1, the four receiving frames 72 are higher than the two clamping units 42. When the receiving platform 71 is in the clamping position P2, the photomask 91 is located between the two clamping units 42. The two clamping units 42 can clamp or release the photomask 91 located on the receiving platform 71, and the pushing unit 56 can push or not push the photomask. 91, and the two grippers 44 of each clamping unit 42 are located on both sides of a receiving frame 72; when the receiving platform 71 is located at the bottom position P4, the four receiving frames 72 are lower than the two clamping units 42; when the receiving platform 71 is located at the low clamping position P3, the two clamping units 42 can clamp or release the photomask 91 located on the receiving platform 71. In addition, when the receiving platform 71 is located at the low clamping position P3, the two low-level grippers 46 of each clamping unit 42 are located on both sides of a receiving frame 72.

[0065] The structure of this first embodiment has been described above. Next, the operational state of this first embodiment will be described.

[0066] like Figure 8 As shown, when there is no photomask 91, the receiving platform 71 is located at the bottom position P4.

[0067] like Figure 9As shown, when a photomask 91 needs to be supported, the receiving platform 71 is first moved up to the receiving position P1. At this time, the four receiving frames 72 are higher than the two clamping units 42. Then, as... Figure 10 As shown, a robotic arm (not shown) places a photomask 91 on the receiving platform 71 with the patterned side (not shown) facing down. At this time, the inclined walls 721 of the two receiving frames 72 receive and abut against the four sides of the bottom of the photomask 91. If the photomask 91 needs to be rotated to a certain angle, the receiving platform 71 can rotate the photomask 91 horizontally, for example, by 90 degrees or 270 degrees.

[0068] like Figure 11 As shown, the receiving platform 71 is moved down to the clamping position P2. For example... Figure 12 As shown, the pushing unit 56 drives the pushing block 57 to push the photomask 91 against the stationary unit 52, thus completing the positioning. Then, as... Figure 13 As shown, the clamping driver 43 of the two clamping units 42 drives the two clamping jaws 44 to move towards each other, thereby causing the opening 443 between the upper clamping piece 441 and the lower clamping piece 442 of each clamping jaw 44 to be contained within the edge of the photomask 91, so that the upper clamping piece 441 and the lower clamping piece 442 clamp the photomask 91. At this time, the photomask 91 is clamped and fixed on all four sides, presenting a stable clamping state.

[0069] like Figure 14 As shown, if the photomask 91 needs to be detected at a lower position, it can be placed at the lower clamping position P3 instead of clamping at the clamping position P2. In this case, the pushing unit 56 drives the pushing block 57 to push the photomask 91 against the stationary unit 52 to complete the positioning (shown in...). Figure 12 Each clamping unit 42 has two low-level grippers 46 that can approach and clamp or release the photomask 91. The low-level clamping position P3 allows the photomask 91 to be clamped at different heights for detection, which is convenient for detection devices (not shown in the figure) with different viewing distances or focal lengths.

[0070] like Figure 15 As shown, when the photomask 91 is clamped, the receiving stage 71 no longer serves to support the photomask 91, and therefore the receiving stage 71 can be moved down to the bottom position P4. At this time, the photomask 91 is clamped without being interfered with by the receiving stage 71, and the X-axis moving stage 21 and the Y-axis moving stage 31 can be controlled to move the photomask 91 to the corresponding detection position.

[0071] When the inspection is completed and the photomask 91 is to be removed, the above operations can be reversed to release the photomask 91 by the two clamping units 42, and then the receiving platform 71 is moved to the receiving position P1, and the photomask 91 is removed by the robotic arm (not shown in the figure).

[0072] As can be seen from the above, the technology disclosed in this first embodiment allows the photomask 91 to be fixed from its side by the push positioning assembly 51 and the gripper assembly 41, without requiring any support or contact on the patterned surface of the bottom of the photomask 91, thus enabling transfer. In other words, this first embodiment does not require any components that would obstruct detection at the bottom of the photomask 91, yet still achieves the effect of transferring the photomask 91 with its patterned surface facing down, thereby avoiding potential contamination from dust falling from above. Furthermore, the structure of this first embodiment differs from the prior art, offering simple operation and stable clamping.

[0073] like Figure 16 As shown, the present invention describes a photomask transfer device 10' with the photomask pattern facing down through a second preferred embodiment, which is mainly the same as the first embodiment described above, except that:

[0074] The receiving platform 71' is missing the lower clamping position P3 in the first embodiment and the two lower clamping claws 46 in the first embodiment when it moves up and down.

[0075] This structure allows the photomask 91 (shown in) to be used. Figure 10 The height detected is only at the clamping position P2 of the first embodiment described above (shown in...). Figure 11 However, provided that the user's needs are met, it is still covered by the patent scope of this invention.

[0076] The remaining structure and effects of this second embodiment are the same as those of the aforementioned first embodiment, and will not be described again.

[0077] The above description is merely illustrative of the present invention through embodiments and should not be construed as limiting the scope of the claims of the present invention. Any simple variations or equivalent implementations made in accordance with the scope of the claims of the present invention and the contents of the patent specification should be covered by the scope of the claims of the present invention.

[0078] Of course, the present invention may have other various embodiments. Without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and modifications according to the present invention, but these corresponding changes and modifications should all fall within the protection scope of the claims of the present invention.

Claims

1. A photomask transfer device with the patterned side facing down, characterized in that, Includes: A base; An X-axis moving stage is located on the base and is driven to move in the X direction of the base; A Y-axis moving stage is located on the X-axis moving stage and is driven to move in the Y direction of the X-axis moving stage; A gripper assembly has two opposing gripping units disposed on the Y-axis moving stage. The two gripping units are capable of gripping two opposite sides of a rectangular photomask, thereby holding the photomask in place. A push positioning group has a stationary unit and a push unit disposed on the Y-axis moving stage. The push unit has a push block to push the photomask so that it abuts against the stationary unit for positioning. A lifting and rotating platform is disposed on the base and is driven to move in the Z direction of the base; and A receiving platform is provided on the lifting and rotating platform, and moves up and down or rotates horizontally in the Z direction with the lifting and rotating platform. The receiving platform has four receiving frames. The receiving platform can be used to place the photomask. The surface of the photomask has a patterned side and faces downward. The four receiving frames respectively support and abut against the four sides of the bottom of the photomask. Among the positions where the receiving platform moves up and down, there is a receiving position, a clamping position, and a bottom position. When the receiving platform is in the receiving position, the four receiving frames are higher than the two clamping units. When the receiving platform is in the clamping position, the photomask is located between the two clamping units. The two clamping units can clamp or release the photomask located on the receiving platform, and the pushing unit can push or not push the photomask. When the receiving platform is in the bottom position, the four receiving frames are lower than the two clamping units.

2. The photomask transfer device with the patterned surface facing down according to claim 1, characterized in that: Each clamping unit has a clamping driver and two jaws. The clamping driver drives the two jaws to move forward or backward toward another clamping unit, and the two jaws of one clamping unit face each other with the two jaws of the other clamping unit.

3. The photomask transfer device with the patterned surface facing down according to claim 2, characterized in that: The two grippers of each clamping unit will not interfere with the receiving frame of the receiving platform.

4. The photomask transfer device with the patterned surface facing down according to claim 3, characterized in that: When the receiving platform is in the clamping position, the two grippers of each clamping unit are located on both sides of the receiving frame.

5. The photomask transfer device with the patterned surface facing down according to claim 2, characterized in that: Each gripper has an upper gripper and a lower gripper, the upper gripper and the lower gripper are opposite each other, and an opening that gradually widens outwards is formed between the upper gripper and the lower gripper.

6. The photomask transfer device with the patterned surface facing down according to claim 2, characterized in that: In the position where the receiving platform moves up and down, there is a lower clamping position. Each clamping unit has two lower jaws. The two lower jaws are lower than the two clamping claws. The two lower jaws of one clamping unit face each other. When the receiving platform is in the lower clamping position, the two clamping units can clamp or release the photomask located on the receiving platform.

7. The photomask transfer device with the patterned surface facing down according to claim 6, characterized in that: The two lower grippers on each clamping unit do not overlap with the two grippers above them in terms of vertical relationship. When the receiving platform is in the lower clamping position, the two lower grippers of each clamping unit are located on both sides of the receiving frame.

8. The photomask transfer device with the patterned surface facing down according to claim 1, characterized in that: The pushing unit has a pushing driver that drives the pusher to push against the photomask.

9. The photomask transfer device with the patterned surface facing down according to claim 1, characterized in that: The receiving platform has a sloping wall opposite to the receiving frame, and the sloping wall receives and abuts against an edge of the bottom of the photomask.

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