Preparation method of high dispersibility metal oxide polishing solution

Abstract

The application relates to the fine chemical and surface treatment technical field, and particularly discloses a preparation method of high-dispersibility metal oxide polishing liquid, which comprises the following steps: mixing and curing metal oxide abrasive and one or more modifiers at a certain temperature to form a firm coating layer; adding the coated abrasive into a high-concentration surfactant solution to perform secondary coating, construct a composite coating layer, and change the surface properties of the abrasive; and preparing the high-dispersibility metal oxide polishing liquid through multiple dispersion means. The high-dispersibility metal oxide polishing liquid prepared by the application has uniformly dispersed abrasive particles, no visible settlement after long-term standing, can effectively prevent scratching caused by particle agglomeration during polishing, and guarantees the consistency of the polished surface quality.

Description

Technical Field

[0001] This invention relates to the fields of fine chemicals and surface treatment technology, specifically to a method for preparing a highly dispersible metal oxide polishing slurry. Background Technology

[0002] With the rapid development of precision manufacturing technology, polishing slurries, as key functional materials for achieving ultra-precision machining, are experiencing continuous market demand growth. This is particularly true in fields such as semiconductor manufacturing, optical component processing, and precision metal parts, where the performance requirements for polishing slurries are becoming increasingly stringent. The core performance indicators of polishing slurries include polishing efficiency, surface quality, and long-term storage stability, all of which largely depend on the dispersion state of abrasive particles in the liquid medium.

[0003] Currently, the commonly used method for preparing polishing slurries in industrial production involves simply mixing abrasive powder with dispersion media and additives, followed by mechanical stirring or grinding to create the slurry. While the process is simple, it's difficult to obtain a uniform and stable dispersion system. Generally, before use, the slurry requires vigorous mechanical stirring or prolonged ultrasonic treatment to break down abrasive particle agglomerates formed during storage and ensure system homogeneity. The pH is then adjusted to a specified range, and the slurry is pumped at a constant flow rate onto a rotating polishing pad for processing. In the field of metal polishing slurries, traditional preparation methods often require the addition of large amounts of organic solvents or strong acids and alkalis as dispersion media, which not only pollutes the environment but also poses safety hazards. For example, stainless steel polishing slurries often contain strong acids such as nitric acid and phosphoric acid, while aluminum alloy polishing slurries frequently use strong alkali systems such as sodium hydroxide. Although these systems provide good polishing results, they are highly corrosive, require sophisticated equipment, and incur high wastewater treatment costs.

[0004] In metal polishing slurries, abrasive particles are prone to agglomeration and sedimentation under acidic or alkaline conditions, leading to slurry stratification and failure. In the field of optical polishing slurries, cerium oxide slurries are widely used due to their high efficiency in removing silica and their excellent surface smoothness. However, cerium oxide particles have a high density and specific surface area, making them highly susceptible to agglomeration and sedimentation. Zhang et al. improved dispersion stability by adding polymeric dispersants, but these dispersants are often expensive, and excessive addition can affect the chemical activity of the polishing slurry, reducing polishing efficiency.

[0005] To address these issues, researchers have proposed several improvement schemes. Liu et al. used surface modification technology to pretreat cerium oxide particles, improving their compatibility with the dispersion medium; Huang et al. improved the dispersion effect by optimizing dispersion process parameters. However, these methods are either complex and costly, or have limited effectiveness, requiring vigorous stirring or ultrasonic treatment before use, making it difficult to simultaneously meet the requirements of excellent performance, simple process, low cost, and suitability for large-scale production.

[0006] Therefore, developing a method for preparing a highly dispersible metal oxide polishing slurry that is simple in process, low in cost, has excellent dispersion stability, and is suitable for industrial production is of great significance for promoting the advancement of polishing slurry technology and reducing the cost of precision manufacturing. Summary of the Invention

[0007] To address the shortcomings of the prior art, this invention provides a method for preparing a highly dispersible metal oxide polishing slurry. This method employs an efficient and green process, simplifies the preparation steps, adapts to industrial production, and reduces production costs. This invention is suitable for preparing highly stable polishing slurries for fine surface processing. The liquid phase maintains a long-term uniform dispersion, and only gentle shaking is required to restore its uniform state during use, avoiding decreased polishing efficiency and surface scratches caused by agglomeration and sedimentation. This invention uses a controllable polishing slurry preparation method, solving the problems mentioned in the background art.

[0008] To achieve the above objectives, the present invention provides the following technical solution:

[0009] A method for preparing a highly dispersible metal oxide includes the following steps: mixing a surface modifier with water in a certain proportion to obtain a surface-modified mixed solution; preparing a mixed slurry by mixing metal oxide abrasive with the surface-modified mixed solution in a certain proportion; thoroughly mixing the mixed slurry and then sealing and curing it at a certain temperature; separating the solid and liquid components of the cured mixed slurry, and then freezing and drying the solid product at a certain temperature to obtain surface-modified oxide abrasive; mixing a surfactant with water in a certain proportion and stirring vigorously to obtain a surfactant mixed solution; mixing the surface-modified oxide abrasive into the surfactant mixed solution and continuously stirring and dispersing it at a certain temperature to obtain a highly dispersible metal oxide polishing slurry.

[0010] The surface modifier is selected from any one or more of polymethylhydrosiloxane (PMHs), polyacrylic acid (PAA), ammonium polyacrylate (NH4-PAA), polyaspartic acid (PASP), polyvinylpyrrolidone (PVP), polymaleic acid (PMA), polyethylene glycol (PEG), and sodium alginate (SA); the surfactant is selected from any one or more of sodium dodecyl sulfate (SDS), sodium dodecylbenzene sulfonate (SDBS), hexadecyltrimethylammonium bromide (CTAB), dodecyltrimethylammonium bromide (DTAB), alkyl glycoside (APG), Tween 80, and Span 80.

[0011] Furthermore, the metal oxide abrasive includes cerium oxide abrasive and aluminum oxide abrasive.

[0012] Furthermore, the particle size of the metal oxide abrasive is <300μm; the proportion of the surface modifier in the mixed solution is 0.02% to 40wt%; and the solid content of the mixed slurry is 0.1% to 100wt%.

[0013] Furthermore, the curing temperature is 30–180℃, and the curing time is 0.2–72 hours.

[0014] Furthermore, the freezing temperature is -40°C, and the drying time is 2 to 6 hours.

[0015] Furthermore, the drying temperature is 30–120°C, the drying time is 0.2–72 h, and the drying method includes one of high-temperature oven drying, vacuum dryer drying, and freeze dryer drying.

[0016] Furthermore, the proportion of the surfactant in the mixed solution is 0.02% to 40 wt%.

[0017] Furthermore, the solid content of the highly dispersible metal oxide polishing slurry is 0.1% to 100 wt%.

[0018] Furthermore, the dispersion method is to use one or more of the following: a magnetic stirrer, a shaker, and an ultrasonic machine; the magnetic stirring speed is 200–2000 rpm, the heating temperature is 40–70°C, and the stirring time is 0.2–72 h; the ultrasonic machine time is 0.5–20 h, and the dispersion temperature is 20–40°C; the shaker speed is 200–500 rpm, and the dispersion time is 10–120 min.

[0019] The present invention has the following beneficial effects:

[0020] (1) This invention employs a step-by-step, controllable surface modification process to mix, cure, and dry metal oxide abrasives with specific polymer surface modifiers in a solution. This ensures that the modifier molecules form a firm and complete adsorption or coating layer on the surface of the abrasive particles, fundamentally inhibiting hard agglomeration between particles. The pre-modified abrasives are dispersed in an aqueous solution containing hydrophilic surfactants. Through the synergistic effect of the surfactants, a dual stabilization mechanism of "steric hindrance-electrostatic repulsion" is constructed.

[0021] (2) A unique surface modification process was adopted to optimize the addition method of the modifier and the stirring kinetics during the reaction process, ensuring that the modifier achieves a dense and uniform monolayer coating on the surface of micro-nano metal oxide powder, thereby significantly improving the dispersion stability and compatibility of the modified micro-nano powder.

[0022] (3) The polishing fluid prepared by this invention has a simple process, mild conditions, and strong versatility, making it suitable for large-scale industrial production. The modifiers and surfactants have a wide range of choices, low cost, and significant synergistic effects. The entire process is carried out in an aqueous system at normal pressure and medium to low temperature, avoiding the harsh conditions often required by existing technologies, such as the use of large amounts of organic solvents, high temperature and high pressure, or inert gas protection, thus significantly reducing equipment investment, energy consumption, and production safety risks. Attached Figure Description

[0023] Figure 1 The graphs show the changes in suspension rate of samples over time: (a) suspension rate of Al2O3-PAA & SDBS polishing solution over time; (b) suspension rate of Al2O3-PAA & SDS polishing solution over time; (c) suspension rate of Al2O3-PAA & CTAB polishing solution over time; (d) suspension rate of CeO2-PEG & SDBS polishing solution over time; (e) suspension rate of CeO2-PEG & SDS polishing solution over time; (f) suspension rate of CeO2-PEG & CTAB polishing solution over time; (g) suspension rate of CeO2-PMHs & Tween polishing solution over time; (h) suspension rate of the sample in Comparative Example 1 over time; and (i) suspension rate of the sample in Comparative Example 2 over time. Detailed Implementation

[0024] The technical solution of the present invention will now be clearly and completely described in conjunction with the embodiments and accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] Example 1

[0026] (1) Weigh 3.4g of polyacrylic acid (PAA) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically at 600rpm for 4h to obtain a mixed solution;

[0027] (2) Add 2g of alumina abrasive to the beaker in step (1), continue stirring for 4 hours, then place it in an oven at 80℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 6 hours.

[0028] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PAA-modified alumina (Al2O3-PAA) abrasive;

[0029] (4) Take 2.2g of sodium dodecylbenzenesulfonate (SDBS) and 12g of water, and stir magnetically at 600rpm for 20min;

[0030] (5) Add 2g of alumina (Al2O3-PAA) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersed alumina (Al2O3-PAA & SDBS) polishing slurry.

[0031] The highly dispersible Al2O3-PAA & SDBS polishing slurry obtained in Example 1 was tested, and the suspension rate test graph of the obtained Al2O3-PAA & SDBS polishing slurry is shown in the figure. Figure 1 As shown in (a), PAA forms a stable pre-coating layer through strong anchoring and steric hindrance. SDBS, as an anionic surfactant, further provides electrostatic repulsion, forming a dual stabilizing mechanism of "steric hindrance + electrostatic". The prepared polishing slurry has good stability and is not prone to sedimentation.

[0032] Example 2

[0033] (1) Weigh 3.4g of polyacrylic acid (PAA) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically at 600rpm for 4h to obtain a mixed solution;

[0034] (2) Add 2g of alumina abrasive to the beaker in step (1), continue stirring for 4 hours, then place it in an oven at 90℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 6 hours.

[0035] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PAA-modified alumina (Al2O3-PAA) abrasive;

[0036] (4) Take 0.5g of sodium dodecyl sulfate (SDS) and 12g of water, and stir magnetically at 600rpm for 20min;

[0037] (5) Add 2g of alumina (Al2O3-PAA) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersed alumina (Al2O3-PAA&SDS) polishing slurry.

[0038] The highly dispersible Al2O3-PAA&SDS polishing slurry obtained in Example 2 was tested, and the suspension rate test graph of the obtained Al2O3-PAA&SDS polishing slurry is shown in the figure. Figure 1 As shown in (b). Similar to Example 1, PAA provides a strong main dispersion layer, while the linear alkyl chain of SDS makes its adsorption layer more compliant. Moreover, SDS can effectively reduce surface tension and improve the wettability of the slurry on the polished surface, which is beneficial to obtaining a more uniform polishing effect.

[0039] Example 3

[0040] (1) Weigh 3.4g of polyacrylic acid (PAA) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically at 600rpm for 4h to obtain a mixed solution;

[0041] (2) Add 6g of alumina abrasive to the beaker in step (1), continue stirring for 4 hours, then place it in an oven at 80℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 6 hours.

[0042] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PAA-modified alumina (Al2O3-PAA) abrasive;

[0043] (4) Take 1.2g of hexadecyltrimethylammonium bromide (CTAB) and 12g of water, and stir magnetically at 600rpm for 20min;

[0044] (5) Add 2g of alumina (Al2O3-PAA) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersed alumina (Al2O3-PAA&CTAB) polishing slurry.

[0045] The highly dispersible Al2O3-PAA&CTAB polishing slurry obtained in Example 3 was tested, and the suspension rate test graph of the obtained Al2O3-PAA&CTAB polishing slurry is shown in the figure. Figure 1 As shown in (c). Similar to Examples 1 and 2, PAA forms a robust coating layer on the abrasive surface through strong anchoring. However, PAA is an anionic polyelectrolyte, which forms a negatively charged coating layer on the abrasive surface. CTAB, on the other hand, is a cationic surfactant. The mixture of the two readily undergoes electrostatic complexation, leading to polymer chain collapse, precipitation, or the formation of large flocs, thus severely disrupting the dispersion system. Therefore, as shown in (c), Figure 1 As shown in (c), the significant reduction in the suspension rate of the sample also proves this point.

[0046] Example 4

[0047] (1) Weigh 1.8g of polyethylene glycol (PEG) and 38g of water, place them in a 100ml glass beaker, and stir magnetically for 2h at 600rpm to obtain a mixed solution;

[0048] (2) Add 10g of cerium oxide abrasive to the beaker in step (1), continue stirring for 2 hours, then place it in an oven at 80℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 2 hours.

[0049] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PEG-modified cerium oxide (CeO2-PEG) abrasive;

[0050] (4) Take 1.8g of sodium dodecylbenzenesulfonate (SDBS) and 10.6g of water, and stir magnetically at 600rpm for 20min;

[0051] (5) Add 6g of cerium oxide (CeO2-PEG) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain a highly dispersible (CeO2-PEG&SDBS) polishing slurry.

[0052] The highly dispersible CeO2-PEG & SDBS polishing slurry obtained in Example 4 was tested, and the suspension rate test chart of the obtained CeO2-PEG & SDBS polishing slurry is shown in the figure below. Figure 1 As shown in (d), compared to PAA, PEG has a weaker anchoring ability on alumina and cerium oxide surfaces, mainly relying on hydrogen bonds and weak van der Waals forces for adsorption. It is prone to desorption during stirring and storage, resulting in a weak coating layer. Figure 1 (d) can also be seen.

[0053] Example 5

[0054] (1) Weigh 1.8g of polyethylene glycol (PEG) and 38g of water, place them in a 100ml glass beaker, and stir magnetically for 2h at 600rpm to obtain a mixed solution;

[0055] (2) Add 2g of cerium oxide abrasive to the beaker in step (1), continue stirring for 2 hours, then place it in an oven at 100℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 2 hours.

[0056] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PEG-modified cerium oxide (CeO2-PEG) abrasive;

[0057] (4) Take 0.7g of sodium dodecyl sulfate (SDS) and 10.6g of water, and stir magnetically at 600rpm for 20min;

[0058] (5) Add 4g of (CeO2-PEG) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain a highly dispersible (CeO2-PEG&SDS) polishing slurry.

[0059] The highly dispersible CeO2-PEG&SDS polishing slurry obtained in Example 5 was tested, and the suspension rate test chart of the obtained CeO2-PEG&SDS polishing slurry is shown in the figure below. Figure 1 As shown in (e), the weak anchoring force of PEG is the main bottleneck. While the electrostatic effect of SDS may be slightly better than that of SDBS, it cannot fundamentally solve the problem of the weak PEG coating. This also illustrates the importance of modifiers in the preparation of polishing fluids using this method.

[0060] Example 6

[0061] (1) Weigh 1.8g of polyethylene glycol (PEG) and 38g of water, place them in a 100ml glass beaker, and stir magnetically for 2h at 600rpm to obtain a mixed solution;

[0062] (2) Add 2g of cerium oxide abrasive to the beaker in step (1), continue stirring for 2 hours, then place it in an oven at 80°C and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40°C for 2 hours.

[0063] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PEG-modified cerium oxide (CeO2-PEG) abrasive;

[0064] (4) Take 1g of hexadecyltrimethylammonium bromide (CTAB) and 10.6g of water, and stir magnetically at 600rpm for 20min;

[0065] (5) Add 5g of cerium oxide (CeO2-PEG) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain a highly dispersible (CeO2-PEG&CTAB) polishing slurry.

[0066] The highly dispersible CeO2-PEG&CTAB polishing slurry obtained in Example 6 was tested, and the suspension rate test graph of the obtained CeO2-PEG&CTAB polishing slurry is shown in the figure. Figure 1 As shown in (f).

[0067] Example 7

[0068] (1) Weigh 3.4g of polymethylhydrosiloxane (PMHs) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically for 2h at 600rpm to obtain a mixed solution;

[0069] (2) Add 2g of cerium oxide abrasive to the beaker in step (1), continue stirring for 2 hours, then place it in an oven at 80℃ and seal for 4 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 2 hours.

[0070] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PMHs modified cerium oxide (CeO2-PMHs) abrasive;

[0071] (4) Take 3.4g of Tween 80 and 10.6g of water, and stir magnetically at 600rpm for 20min;

[0072] (5) Add 2g of (CeO2-PMHs) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersible (CeO2-PMHs&Tween) polishing slurry.

[0073] The highly dispersible CeO2-PMHs & Tween polishing slurry obtained in Example 7 was tested, and the suspension rate test graph of the obtained CeO2-PMHs & Tween polishing slurry is shown in the figure below. Figure 1 As shown in (g). After PMHs modification, the abrasive surface will change from hydrophilic to hydrophobic. Then, when mixed into a high concentration of Tween 80 solution, the Tween molecules will form a stable structure with the hydrogen-containing silicone oil due to the hydrophobic effect, which will significantly improve the performance of the polishing fluid.

[0074] Comparative Example 1

[0075] (1) Weigh 3.4g of polyacrylic acid (PAA) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically at 600rpm for 4h to obtain a mixed solution;

[0076] (2) Add 2g of alumina abrasive to the beaker in step (1), continue stirring for 4 hours, then place it in an oven at 40°C and seal for 1 hour to separate the solid and liquid, and freeze the solid product at -40°C for 6 hours.

[0077] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PAA-modified alumina (Al2O3-PAA) abrasive;

[0078] (4) Take 2.2g of sodium dodecylbenzenesulfonate (SDBS) and 12g of water, and stir magnetically at 600rpm for 20min;

[0079] (5) Add 2g of alumina (Al2O3-PAA) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersed alumina (Al2O3-PAA&SDBS) polishing slurry.

[0080] The highly dispersible Al2O3-PAA & SDBS polishing slurry obtained in Comparative Example 1 was tested, and the suspension rate test graph of the obtained Al2O3-PAA & SDBS polishing slurry is shown in the figure below. Figure 1 As shown in (h). Relative to Figure 1 (a) The suspension rate of the polishing slurry decreased significantly. This is because the optimal temperature for the reaction between PAA and Al2O3 is between 80℃ and 100℃. When the curing temperature is insufficient or the curing time is not long enough, the PAA modification is uneven and the coating layer is unstable, which will lead to a significant decrease in the suspension rate of the polishing slurry.

[0081] Comparative Example 2

[0082] (1) Weigh 3.4g of polyacrylic acid (PAA) and 10.6g of water, place them in a 100ml glass beaker, and stir magnetically at 600rpm for 4h to obtain a mixed solution;

[0083] (2) Add 2g of alumina abrasive to the beaker in step (1), continue stirring for 4 hours, then place it in an oven at 80℃ and seal for 5 hours to separate the solid and liquid, and freeze the solid product at -40℃ for 6 hours.

[0084] (3) The frozen solid product was vacuum dried at 40°C for 24 hours in a vacuum drying oven to obtain PAA-modified alumina (Al2O3-PAA) abrasive;

[0085] (4) Take 2.2g of polyvinylpyrrolidone (PVP) and 12g of water, and stir magnetically at 600rpm for 20min;

[0086] (5) Add 2g of alumina (Al2O3-PAA) abrasive, stir magnetically at 600rpm for 2h, and sonicate for 5h to obtain highly dispersed alumina (Al2O3-PAA & PVP) polishing slurry.

[0087] The highly dispersible Al2O3-PAA&PVP polishing slurry obtained in Comparative Example 2 was tested, and the suspension rate test graph of the obtained Al2O3-PAA&PVP polishing slurry is shown in the figure. Figure 1 As shown in (i). Relative to Figure 1 (a) The suspension rate of the polishing slurry decreased significantly. This may be because PAA is adsorbed on the surface by electrostatic attraction, making its surface potential negative. The introduction of neutral PVP shields some of the negative charge, reduces the electrostatic repulsion between particles, and triggers secondary agglomeration.

[0088] In summary, this invention addresses the preparation of highly dispersible polishing slurries by developing a method for producing highly dispersible metal oxide polishing slurries. The method involves mixing and curing metal oxide abrasives with one or more modifiers at a specific temperature to form a robust coating layer. The coated abrasive is then added to a high-concentration surfactant solution for a secondary coating, constructing a composite coating layer and altering the surface properties of the abrasive. Through multiple mixing and dispersion methods, a highly dispersible metal oxide polishing slurry is produced. The highly dispersible oxide polishing slurry prepared by this invention exhibits uniform abrasive particle dispersion, with no visible sedimentation even after long-term standing. This effectively prevents scratches caused by particle agglomeration during polishing, ensuring consistent polished surface quality.

[0089] Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and improvements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be defined by the claims.

Claims

1. A method for preparing a highly dispersible metal oxide polishing slurry, comprising the following steps: preparing a surface modifier with water to form a surface-modified mixed solution; mixing metal oxide abrasive with the surface-modified mixed solution to form a mixed slurry; sealing and curing the mixed slurry and then performing solid-liquid separation; freezing and drying the separated solid product to obtain surface-modified oxide abrasive; mixing a surfactant with water to obtain a surfactant mixed solution; mixing the surface-modified oxide abrasive into the surfactant mixed solution, stirring and dispersing to obtain a highly dispersible metal oxide polishing slurry; The surface modifier is selected from any one or more of polymethylhydrosiloxane, polyacrylic acid, ammonium polyacrylate, polyaspartic acid, polyvinylpyrrolidone, polymaleic acid, polyethylene glycol, and sodium alginate; the surfactant is selected from any one or more of sodium dodecyl sulfate, sodium dodecylbenzenesulfonate, hexadecyltrimethylammonium bromide, alkyl glycoside, dodecyltrimethylammonium bromide, Tween 80, and Span 80.

2. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The metal oxide abrasives include cerium oxide abrasives and aluminum oxide abrasives.

3. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The particle size of the metal oxide abrasive is <300μm; the proportion of the surface modifier in the surface modification mixture is 0.02% to 40wt%; and the solid content of the mixed slurry is 0.1% to 100wt%.

4. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The curing temperature is 30–180℃, and the curing time is 0.2–72 hours.

5. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The freezing temperature is -40℃, and the drying time is 2 to 6 hours.

6. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The drying temperature is 30–120°C, the drying time is 0.2–72 h, and the drying methods include oven drying, vacuum drying, and freeze drying.

7. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The surfactant is present in a surfactant mixture at a concentration of 0.02% to 40 wt%.

8. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The solid content of the highly dispersed metal oxide polishing slurry is 0.1% to 100 wt%.

9. The method for preparing the highly dispersible metal oxide polishing slurry according to claim 1, characterized in that: The mixing and dispersion method is to use one or more of the following: magnetic stirrer, shaker, and ultrasonic machine; the magnetic stirring speed is 200-2000 rpm, the heating temperature is 40-70℃, and the stirring time is 0.2-72 h; the ultrasonic machine time is 0.5-20 h, and the dispersion temperature is 20-40℃; the shaker speed is 200-500 rpm, and the dispersion time is 10-120 min.

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