A method and system for cleaning yttria-coated spare parts

Abstract

The application provides a yttria coating spare part cleaning method and system, the method comprises the following steps: S1, a first soaking step: the yttria coating spare part to be cleaned is soaked in a first mixed solvent containing a ketone solvent and water; S2, a second soaking step: the spare part treated in step S1 is soaked in a second mixed solvent containing an alcohol solvent and water; S3, an ultrasonic cleaning step: the spare part soaked in step S2 is ultrasonically cleaned in the second mixed solvent; S4, a third soaking step: the spare part treated in step S3 is soaked in a third mixed solvent containing a polar aprotic solvent and water; S5, a mechanical wiping step: the surface of the spare part treated in step S3 is mechanically wiped; S6, a rinsing and drying step: the spare part treated in step S4 is rinsed and dried.

Description

Technical Field

[0001] This application relates to the field of surface cleaning technology for semiconductor equipment spare parts, and in particular to a cleaning method and system for yttrium oxide coated spare parts. Background Technology

[0002] In semiconductor manufacturing processes, such as etching, components within the process chamber, like spray heads and electrostatic chucks, are typically coated with yttrium oxide to improve their resistance to plasma corrosion. However, over long-term use, these coatings inevitably accumulate complex contaminants composed of process byproducts, organic matter, and metal ions. These contaminants not only affect the performance of the components but may also detach during subsequent processes, contaminating the wafer and ultimately impacting chip yield.

[0003] To address the aforementioned contamination issues, these spare parts with yttrium oxide coatings require regular cleaning. Existing cleaning technologies typically employ single physical or chemical methods. For example, some methods use only deionized water or dilute acid solutions, combined with ultrasonic cleaning. These methods are effective for simple, loosely attached contaminants; however, they suffer from incomplete cleaning and failure to completely remove organic residues when dealing with stubborn contaminants embedded in the micro-nano pore structure of the coating. Using strong acids or increasing mechanical force to enhance cleaning can easily cause irreversible chemical corrosion or physical damage to the delicate and expensive yttrium oxide coating, thereby shortening the spare parts' lifespan and increasing production costs.

[0004] Semiconductor manufacturing has extremely stringent requirements for the precision of spare parts cleaning: organic contaminant residues must be controlled at the ppb level (10-9), particles with a surface diameter greater than 0.1μm must be zero, metal ion residues must be less than 0.01μg / cm², and pore cleanliness must reach more than 95%.

[0005] In the existing technology, the cleaning methods for yttrium oxide coated spare parts mainly include the following categories:

[0006] 1. Single-aqueous cleaning method: This method uses deionized water or an aqueous solution with a small amount of surfactant, combined with ultrasonic cleaning. While effective for water-soluble contaminants and loose surface deposits, it has limited ability to remove hydrophobic organic matter (such as etching gas residue) embedded in micro- and nano-pores and sparingly soluble inorganic salts (such as yttrium fluoride). Furthermore, it cannot effectively dissolve metal ion complexes, and the organic residues after cleaning are typically still at the ppm level, failing to meet ppb requirements.

[0007] 2. Single chemical solvent cleaning method: Immersion or spray cleaning is performed using dilute acids (such as dilute nitric acid, dilute hydrochloric acid) or single organic solvents (such as acetone, isopropanol). Although acid solutions can dissolve some metal oxides and inorganic salts, they have poor selectivity for dissolving organic polymers, and the acidic environment may cause lattice corrosion of the yttrium oxide coating, leading to an increase in the surface roughness of the coating; while single organic solvents are often only effective against specific types of contaminants (e.g., acetone is effective against etching gases but ineffective against fluorides), and are not thorough for cleaning complex contaminants.

[0008] 3. Enhanced physical cleaning methods: These methods employ physical means such as high-pressure water jetting, dry ice blasting, or mechanical polishing. While these methods can remove surface deposits, they are ineffective against contaminants embedded deep within pores. Furthermore, high-pressure impacts or mechanical friction can easily cause micro-cracks, peeling, or surface damage to the yttrium oxide coating, significantly shortening the lifespan of spare parts (which are typically worth tens of thousands of US dollars) and leading to a sharp increase in production costs.

[0009] 4. High-temperature calcination method: Organic matter is removed by carbonization through high-temperature calcination (usually >500℃). This method is energy-intensive and time-consuming. Furthermore, the high temperature may cause a phase transformation of the yttrium oxide coating (such as from cubic phase to monoclinic phase), leading to stress cracking of the coating or thermal expansion mismatch with the substrate, resulting in irreversible structural damage.

[0010] Therefore, developing a cleaning technology that can thoroughly remove complex contaminants while fully protecting the yttrium oxide coating is of great significance for ensuring the stability and economy of semiconductor manufacturing processes. Summary of the Invention

[0011] The purpose of this application is to provide a cleaning method and system for yttrium oxide coated spare parts, aiming to solve the technical problems of incomplete cleaning of yttrium oxide coatings and easy damage to the coating in the prior art.

[0012] To achieve the above objectives, this application provides a cleaning method for yttrium oxide coated spare parts, comprising the following steps: S1. First soaking step: The yttrium oxide coated spare parts to be cleaned are soaked in a first mixed solvent containing ketone solvent and water. S2, Second soaking step: The spare parts treated in step S1 are soaked in a second mixed solvent containing alcohol solvent and water; S3. Ultrasonic cleaning step: The spare parts that have been soaked in step S2 are ultrasonically cleaned in the second mixed solvent. S4. Third soaking step: The spare parts treated in step S3 are soaked in a third mixed solvent containing a polar aprotic solvent and water. S5. Mechanical wiping step: Mechanically wipe the surface of the spare parts that have been treated in step S4; S6. Rinsing and Drying Steps: Rinsing and drying the spare parts that have been treated in step S5.

[0013] Furthermore, the ketone solvent is acetone, the alcohol solvent is isopropanol, and the polar aprotic solvent is N-methylpyrrolidone or dimethylformamide.

[0014] Further, the first soaking step is performed at 15-30°C; the second soaking step and the ultrasonic cleaning step are performed at 60-80°C. Preferably, the first soaking step is performed at 25±2°C.

[0015] Furthermore, the yttrium oxide coating spare part is an aluminum-based yttrium oxide coating spare part.

[0016] Furthermore, in the first mixed solvent, the second mixed solvent, and the third mixed solvent, the volume percentage of the organic solvent constituting the mixed solvent is independently 50% to 90%.

[0017] Furthermore, the soaking time for the first soaking step is 5-15 hours; the soaking time for the second soaking step is 3-7 hours.

[0018] Furthermore, the ultrasonic cleaning frequency is 100-120 kHz, and the duration is 0.5-2 hours. Preferably, the ultrasonic cleaning frequency is 120 kHz.

[0019] Furthermore, the mechanical wiping is performed using at least one tool selected from rubber, non-woven fabric, and scouring pad, with a wiping pressure of 4-6 N and a speed of 2-3 mm / s. Preferably, the scouring pad is a 400# scouring pad.

[0020] As one embodiment of the present invention, the cleaning method for the yttrium oxide coated spare parts includes the following steps: S1. First Immersion Step (Low-Temperature Dissolution): The yttrium oxide coated spare parts to be cleaned are immersed in a first mixed solvent containing ketone solvent and water at a temperature of 15-30°C for 5-15 hours; the ketone solvent is preferably acetone, and the volume percentage of organic solvent in the first mixed solvent is 50%-90%; S2. Second Immersion Step (Medium-Temperature Permeation): The spare parts treated in step S1 are immersed in a second mixed solvent containing an alcohol solvent and water at a temperature of 60-80°C for 3-7 hours; the alcohol solvent is preferably isopropanol, and the volume percentage of organic solvent in the second mixed solvent is 50%-90%. S3, Ultrasonic cleaning step (thermal-acoustic coupling cavitation): The spare parts that have been soaked in step S2 are ultrasonically cleaned in the second mixed solvent, with the temperature maintained at 60-80℃, the ultrasonic frequency at 100-120kHz, and the time at 0.5-2 hours. S4. Third Immersion Step (Deep Replacement): The spare parts treated in step S3 are immersed in a third mixed solvent containing a polar aprotic solvent and water; the polar aprotic solvent is preferably N-methylpyrrolidone (NMP) or dimethylformamide (DMF), and the volume percentage of organic solvent in the third mixed solvent is 50%-90%; S5. Mechanical wiping step (force-chemical synergistic peeling): Mechanically wipe the surface of the spare parts treated in step S4, using at least one tool selected from rubber, non-woven fabric and scouring pad, with a wiping pressure of 4-6N and a wiping speed of 2-3mm / s. S6. Rinsing and Drying Steps (Function Restoration): The spare parts treated in step S5 are rinsed in multiple stages with ultrapure water and then dried to restore the hydroxylation state of the coating surface.

[0021] This application also provides a yttrium oxide coated spare parts cleaning system for performing any of the above methods, comprising: A first immersion apparatus is used to immerse the yttrium oxide coated spare parts in a first mixed solvent containing ketone solvents and water; The second soaking device is used to soak the spare parts that have been treated by the first soaking device in a second mixed solvent containing an alcohol solvent and water. An ultrasonic cleaning apparatus is used to perform ultrasonic cleaning on spare parts that have been treated by the second immersion apparatus in the second mixed solvent; The third soaking device is used to soak the spare parts treated by the ultrasonic cleaning device in a third mixed solvent containing a polar aprotic solvent and water. A mechanical wiping device is used to mechanically wipe the surface of the spare parts that have been treated by the third soaking device; A rinsing and drying device is used to rinse spare parts that have been treated by the mechanical wiping device with water and to dry the rinsed spare parts.

[0022] Furthermore, the mechanical wiping device includes a pressure-speed coupling feedback mechanism, which controls the pressure and moving speed of the wiping tool applied to the surface of the spare part. Preferably, the pressure-speed coupling feedback mechanism controls the wiping pressure to be 4-6 N and the wiping speed to be 1-3 mm / s.

[0023] The key features of this invention are: The first level is solvent design: constructing a three-tiered solvent system of ketones (acetone) → alcohols (isopropanol) → polar aprotic solvents (NMP / DMF); acetone preferentially dissolves nonpolar etching gas residues and low-polarity organic matter; isopropanol permeates micropores under heating conditions and dissolves medium-polarity fluoropolymers; NMP / DMF, with its strong polarity and high boiling point, deeply replaces metal ion complexes embedded in the pores and high-polarity byproducts.

[0024] The second level involves the synergistic effect of chemical softening and physical stripping in decontamination: Thermo-acoustic coupling: Step S2 involves heating to reduce solvent viscosity and enhance penetration; Step S3 involves high-frequency ultrasound (100-120kHz) to generate microjets (velocity ~400m / s) that precisely target deep within the pores. Mechanical-chemical synergy: Step S5 is performed after chemical softening (S4 NMP swelling) and mechanically peels off the surface micro-areas with controlled pressure below the coating hardness threshold, achieving synergistic decontamination through "chemical softening-physical peeling".

[0025] The third level involves the functional restoration of porous structures: Achieve the following through ultrapure water gradient rinsing and controlled drying: 1) Complete replacement of pore solvent: Utilizing the miscibility of water and polar aprotic solvents, secondary pollution caused by high-boiling-point solvent residues is avoided; 2) Surface hydroxylation recovery: After cleaning, the yttrium oxide surface is exposed with fresh crystal faces, forming γ-OH hydrophilic groups and restoring the original surface energy of the coating.

[0026] Compared with the prior art, the technical solution provided in this application has the following beneficial effects: 1. Thorough cleaning and remarkable results. This application utilizes the sequential action of various organic solvents with different properties, such as acetone, isopropanol, and N-methylpyrrolidone, combined with the physical assistance of high and low temperature immersion and ultrasonic vibration, to target and dissolve and peel off different types of organic matter, metal ions, and other complex contaminants, achieving deep cleaning of the coating surface and internal micropores, and effectively removing stubborn residues.

[0027] 2. Minimal damage, protective coating. This application uses a mild chemical solvent sequence to avoid corrosion of the coating by strong acids, and by precisely controlling the pressure and speed of key mechanical wiping steps, it effectively avoids physical damage to the yttrium oxide coating and substrate, significantly extending the service life of spare parts.

[0028] 3. Functional restoration and avoidance of secondary contamination. The cleaning process of this application can effectively restore the hydrophilicity and other functional properties of the coating surface. At the same time, the final ultrapure water rinsing and drying steps ensure the complete removal of chemical solvents and avoid secondary contamination of spare parts. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below. It should be understood that the specific embodiments described herein are merely illustrative of this application and are not intended to limit this application.

[0030] Example 1 This embodiment provides a cleaning method and system for yttrium oxide coated spare parts. In this embodiment, the object to be cleaned is an aluminum-based yttrium oxide coated spare part from a Naura 508M machine that has been subjected to 1200 hours of machine operation for cleaning. Specifically, after prolonged use in a plasma environment, the surface of the yttrium oxide coating and its micro-nano porous structure accumulate composite contaminants composed of process byproducts, organic polymer residues, and metal ions (such as iron ions), leading to a decline in the spare part's performance. The technical solution of this embodiment aims to thoroughly and efficiently remove the aforementioned contaminants without damaging the aluminum substrate and yttrium oxide coating.

[0031] Cleaning system configuration: First soaking tank: 50L stainless steel tank, equipped with a 25±2℃ temperature control system; Second soaking tank: 50L stainless steel tank, equipped with a 65±2℃ heating system; Ultrasonic cleaning tank: equipped with a 120kHz high-frequency ultrasonic generator and temperature control system; Third soaking tank: 50L stainless steel tank, room temperature operation; Mechanical wiping device: 5-inch pneumatic polisher with heat-treated alloy rotor (model B9205-5A), with integrated pressure-speed coupling feedback mechanism; Rinsing and drying equipment: Equipped with an 18MΩ·cm ultrapure water system and an 80-100℃ hot air drying system.

[0032] The yttrium oxide coated spare parts to be cleaned will be processed sequentially in these devices.

[0033] The specific steps of this cleaning method are as follows: Step S1, Low-Temperature Static Dissolution. The yttrium oxide coated spare part to be cleaned is placed intact in a first immersion tank, which is pre-filled with a first mixed solvent. The first mixed solvent is acetone and water in a volume ratio of 75:25. This step is carried out at room temperature, with the temperature controlled between 15-30℃ (25℃ in this embodiment), and the immersion time is 10 hours. This duration ensures that the first mixed solvent fully penetrates into the micro-nano pore structure inside the yttrium oxide coating, effectively swelling and initially dissolving non-polar organic contaminants, such as vacuum grease, pump oil, and other residues, adhering to the coating surface and pores.

[0034] Step S2, medium-temperature static infiltration. The spare part is removed from the first immersion tank and transferred to the second immersion tank. The second immersion tank contains a second mixed solvent (isopropanol and ultrapure water mixed at a volume ratio of 80:20). This step is carried out at a high temperature of 65°C (generally 60°C-80°C), which significantly enhances the mobility and dissolution efficiency of solvent molecules without causing thermal damage to the coating. At this temperature, the spare part is immersed for 5 hours.

[0035] Step S3, thermo-acoustic coupled cavitation. Subsequently, the spare parts treated in step S2, along with the second mixed solvent, are placed in an ultrasonic cleaning tank integrating heating and an ultrasonic generator. The cleaning temperature is maintained at 65°C, and the ultrasonic generator is activated to perform ultrasonic vibration cleaning on the spare parts. The ultrasonic frequency is set to 120 kHz. Ultrasonic cleaning lasts for 1 hour.

[0036] Step S4, Deep Chemical Replacement. The ultrasonically cleaned spare parts are removed from the ultrasonic cleaning tank and placed in a third immersion tank. This tank contains a third mixed solvent, which is a mixture of a highly polar aprotic solvent and water. In this embodiment, the selected highly polar aprotic solvent is N-methylpyrrolidone, and the water is ultrapure water, with a volume ratio of 70:30. This step is carried out at room temperature (e.g., 25°C) for 10 hours. N-methylpyrrolidone, with its strong polarity and high boiling point, deeply replaces the metal ion complexes embedded in the pores and the highly polar byproducts, while simultaneously chemically softening the coating surface.

[0037] Step S5, Mechanical-Chemical Coordinated Stripping. The deeply soaked spare parts are removed from the third soaking tank and transferred to the mechanical wiping device. At this point, most of the contaminants have been chemically dissolved, but a small amount of residue that has been loosened by the chemical action but not completely detached may still adhere to the surface. The purpose of mechanical wiping is to physically remove these last residues. In this embodiment, a soft and lint-free non-woven fabric is used as the wiping tool. To avoid scratching or excessively abrading the delicate yttrium oxide coating, the mechanical wiping device integrates a pressure-speed coupling feedback mechanism (5-inch pneumatic polisher B9205-5A with heat-treated alloy rotor). This mechanism can monitor and control the pressure and movement speed of the wiping head on the surface of the spare parts in real time, ensuring that the wiping pressure does not exceed 6N and the wiping speed does not exceed 3mm / s.

[0038] Step S6: Rinsing and Drying. Finally, the mechanically wiped spare parts are sent to the rinsing and drying unit. First, they are thoroughly rinsed with high-purity deionized water (i.e., ultrapure water) to completely wash away all residual chemical solvents and stripped contaminants from the surface and pores of the spare parts, avoiding secondary contamination. After rinsing, the spare parts are dried (e.g., at 80-100℃) or blow-dried using clean air filtered through a high-efficiency filter. This completes the entire cleaning process. After cleaning, the yttrium oxide surface exposes fresh γ-OH hydrophilic groups, allowing the surface to return to its original state and ensuring uniform distribution of process gases in subsequent processes.

[0039] Example 2 As an optional implementation, this embodiment optimizes the mechanical wiping step S5 in Example 1 to target different types of contaminants. In this embodiment, except for the mechanical wiping step, the solvents, equipment, process parameters, and operating methods used in the remaining steps are the same as in Example 1.

[0040] In this embodiment, it is assumed that in addition to conventional organic contaminants, the surface of the yttrium oxide coated spare part to be cleaned also contains some tiny hard particles that have been sintered onto the surface due to long-term high-temperature use. These hard particles are firmly bonded to the coating and may be difficult to completely remove using only the non-woven fabric described in Example 1.

[0041] In the mechanical wiping step S5 of this embodiment, the wiping tool used by the mechanical wiping device is changed to a 400# scouring pad. Compared with non-woven fabric, the 400# scouring pad has a certain abrasive ability, and its fiber structure is harder, which can more effectively "scrape off" or "polish" away these attached hard particles.

[0042] Despite the replacement of the tools with more abrasive ones, this embodiment still emphasizes precise control of the wiping process to protect the yttrium oxide coating from damage. The pressure-speed coupling feedback mechanism of the mechanical wiping device is still activated, and the wiping pressure and wiping speed are strictly controlled within a range of no more than 6 N and no more than 3 mm / s, respectively.

[0043] Comparative Example 1 omits high-temperature ultrasound The difference between this comparative example and Example 1 lies in the following specific operation: Perform steps S1 and S2 of Example 1; step S3 is omitted.

[0044] Proceed directly to steps S4, S5, and S6 of Example 1.

[0045] Comparative Example 2: Immersion in polar aprotic solvent omitted Operating steps: Perform the same steps as in Example 1, S1; Perform step S2 exactly the same as in Example 1; Perform step S3 exactly the same as in Example 1; Step S4 omitted Steps S5 and S6 are performed directly on the spare parts that have undergone ultrasonic cleaning.

[0046] Comparative Example 3: Room Temperature Ultrasound Replacing High Temperature Ultrasound Operating steps: Perform the same steps as in Example 1, S1; Perform step S2 exactly the same as in Example 1; Modify step S3: Place the spare parts in the second mixed solvent (isopropanol / water), but perform ultrasonic cleaning at room temperature (25°C) (120KHz, 1h).

[0047] Perform the same steps S4, S5, and S6 as in Example 1.

[0048] Performance test examples Table 1 compares the cleaning effects of the cleaning methods in each embodiment and comparative example.

[0049] Table 1

[0050] The results show that Example 2 is more effective than Example 1 in removing tiny hard particles sintered on the surface, achieving a higher surface cleanliness. Meanwhile, because the wiping force and speed are strictly controlled, the mechanical damage to the coating remains at an extremely low level. Example 2 demonstrates that by selecting different wiping tools, different types of stubborn contaminants can be flexibly addressed, thereby improving the versatility of this cleaning method.

[0051] In Comparative Example 1, omitting the high-temperature ultrasonic step reduced the organic residue removal rate from ≥99.8% to 98.8%, and the pore cleanliness from >95% to >90%. In semiconductor manufacturing, the residual amount of organic contaminants (such as etching gas residues) needs to be controlled at the ppb level (10). -9The 99.8% removal rate in Example 1 corresponds to approximately 0.02 μg of residue per square centimeter, while the 98.8% removal rate in Comparative Example 1 corresponds to 0.2 μg, a tenfold difference in residue. This difference may lead to an increase in wafer surface defect density, directly affecting chip yield. The micro- and nano-pores (typically <1 μm in diameter) of the yttrium oxide coating are key areas for contaminant concealment. A decrease in pore cleanliness from 95% (Example 1) to 90% (Comparative Example 1) means that for every 100 pores, 5 new "potential sites" for residual contaminants are added, which may become sources of particulate contamination in a plasma etching environment, leading to an increase in wafer defect rate of approximately 20% or more.

[0052] The organic residue removal rate of Example 1 (≥99.8%) was also significantly higher than that of Comparative Example 2 (98.5%), which omitted immersion in polar aprotic solvent. In Comparative Example 3, replacing high-temperature ultrasound with room-temperature ultrasound reduced the removal rate of hard particles on the surface from ≥99.8% to 95.8%.

[0053] Semiconductor processes require zero particles with a diameter greater than 0.1 μm on the surface. The 95.8% removal rate in Comparative Example 3 means that there may still be 4.2 hard particles (such as metal oxides) remaining per square centimeter. These particles will detach in subsequent processes and directly cause fatal scratches on the wafer.

[0054] The above description is merely a preferred embodiment of this application and is not intended to limit the scope of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A cleaning method for yttrium oxide coated spare parts, characterized in that, Includes the following steps: S1. First soaking step: The yttrium oxide coated spare parts to be cleaned are soaked in a first mixed solvent containing ketone solvent and water. S2, Second soaking step: The spare parts treated in step S1 are soaked in a second mixed solvent containing alcohol solvent and water; S3. Ultrasonic cleaning step: The spare parts that have been soaked in step S2 are ultrasonically cleaned in the second mixed solvent. S4. Third soaking step: The spare parts treated in step S3 are soaked in a third mixed solvent containing a polar aprotic solvent and water. S5. Mechanical wiping step: Mechanically wipe the surface of the spare part that has been treated in step S4; S6. Rinsing and Drying Steps: Rinsing and drying the spare parts that have been treated in step S5.

2. The method according to claim 1, characterized in that, The ketone solvent is acetone, the alcohol solvent is isopropanol, and the polar aprotic solvent is N-methylpyrrolidone or dimethylformamide; And / or, the first soaking step is performed at 15-30°C; the second soaking step and the ultrasonic cleaning step are performed at 60-80°C.

3. The method according to claim 1 or 2, characterized in that, The yttrium oxide coating spare part is an aluminum-based yttrium oxide coating spare part.

4. The method according to claim 1 or 2, characterized in that, In the first mixed solvent, the second mixed solvent, and the third mixed solvent, the volume percentage of the organic solvent constituting the mixed solvent is independently 50% to 90%.

5. The method according to claim 1 or 2, characterized in that, The soaking time for the first soaking step is 5-15 hours; the soaking time for the second soaking step is 3-7 hours.

6. The method according to claim 1 or 2, characterized in that, The ultrasonic cleaning frequency is 100-120kHz, and the time is 0.5-2 hours.

7. The method according to claim 1 or 2, characterized in that, The mechanical wiping is performed using at least one tool selected from rubber, non-woven fabric and scouring pad, with a wiping pressure of 4-6N and a speed of 2-3mm / s.

8. A cleaning system for yttrium oxide coated spare parts for performing the method according to any one of claims 1-7, characterized in that, include: A first immersion apparatus is used to immerse the yttrium oxide coated spare parts in a first mixed solvent containing ketone solvents and water; The second soaking device is used to soak the spare parts that have been treated by the first soaking device in a second mixed solvent containing an alcohol solvent and water. An ultrasonic cleaning apparatus is used to perform ultrasonic cleaning on spare parts that have been treated by the second immersion apparatus in the second mixed solvent; The third soaking device is used to soak the spare parts treated by the ultrasonic cleaning device in a third mixed solvent containing a polar aprotic solvent and water. A mechanical wiping device is used to mechanically wipe the surface of the spare parts that have been treated by the third soaking device; A rinsing and drying device is used to rinse and dry spare parts that have been treated by the mechanical wiping device.

9. The system according to claim 8, characterized in that, The mechanical wiping device includes a pressure-speed coupling feedback mechanism, which is used to control the pressure and moving speed of the wiping tool on the surface of the spare part.

10. The system according to claim 9, characterized in that, The pressure-speed coupling feedback mechanism controls the wiping pressure to be 4-6N and the wiping speed to be 1-3mm / s.

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