Method for positioning an elevator and positioning device for an elevator

Abstract

This disclosure provides an elevator positioning method and an elevator positioning device that can suppress the reduction in positioning accuracy of the landing sills of each floor. In the elevator positioning method, in the target floor setting step (S5), the floor immediately above the reference floor where the positioned landing sill is located is set as the target floor. In the sill positioning step (S6), the target sill (3b) of the target floor is positioned with reference to the reference sill (3a) of the reference floor. The sill positioning step (S6) includes a light emitter step, a light receiver step, and an adjustment step. In the light emitter step, a light emitter (51) is installed on the reference sill (3a), and in the light receiver step, a light receiver (52) is installed on the target sill (3b). In the adjustment step, after the light emitter step and the light receiver step, the position of the target sill (3b) relative to the reference sill (3a) is adjusted based on the amount of light received by the light receiver (52) that receives the laser emitted from the light emitter (51).

Description

Technical Field

[0001] This disclosure relates to elevator positioning methods and elevator positioning devices. Background Technology

[0002] When installing an elevator, the piano wire stretched vertically along the shaft is used as a reference to position the landing sills, tracks, etc. within the shaft. If positioning work is performed with the piano wire stretched along the shaft, the piano wire may obstruct the positioning operation.

[0003] Patent document 1 discloses a method for installing a sill. To avoid adverse situations caused by piano wires during positioning operations, a vertical laser is emitted from a pair of laser plumb bobs located at the bottom of the shaft, and the sill is positioned using the vertical laser as a reference.

[0004] Existing technical documents

[0005] Patent documents

[0006] Patent Document 1: Japanese Patent Application Publication No. 2022-76535 Summary of the Invention

[0007] The problem that the invention aims to solve

[0008] In the conventional elevator sill installation method disclosed in Patent Document 1, the positioning of all floor sills on each floor is based on a laser emitted from a laser plumb bob installed at the bottom of the shaft. The distance from the laser plumb bob to each floor sill increases as the floor with the floor sill is closer to the top floor.

[0009] The longer the laser beam travels, the more diffused it becomes. Furthermore, depending on the accuracy of the angle at which the laser beam is emitted from the laser plumb bob, the horizontal deviation of the laser beam relative to the plumb line referenced by the laser plumb bob increases with the distance traveled. Therefore, the positioning accuracy of the level sill, based on the laser beam emitted from the laser plumb bob, decreases as it approaches the uppermost level.

[0010] This disclosure is intended to solve the aforementioned problems, and its purpose is to provide an elevator positioning method and an elevator positioning device that can suppress the reduction of positioning accuracy of the landing sill.

[0011] Methods for solving problems

[0012] The elevator positioning method disclosed herein includes: a reference floor setting step, in which a floor with a positioned landing sill is set as a reference floor, and a landing sill located on the reference floor is set as a reference sill; an object floor setting step, after the reference floor setting step, in which the floor immediately above the reference floor is set as an object floor, and a landing sill located on the object floor is set as an object sill; and a sill positioning step, after the object floor setting step, positioning the object sill with the reference sill as a reference, thereby making the object sill a positioned landing sill, the sill positioning step including: a light emitter step, in which a light emitter emitting laser light is installed facing upward on the reference sill; a light receiver step, in which a light receiver capable of receiving laser light is installed facing downward on the object sill; and an adjustment step, after the light emitter step and the light receiver step, adjusting the position of the object sill relative to the reference sill based on the amount of light received by the light receiver receiving laser light emitted from the light emitter along the vertical direction.

[0013] Furthermore, the elevator positioning device disclosed herein includes a sill positioning device. This sill positioning device is used to position an object sill, which is a landing sill located immediately above the reference floor, using a reference sill as a reference for a landing sill located on a reference floor. The sill positioning device includes: a light emitter that emits laser light; a light receiver capable of receiving laser light; a light emitter mounting member that detachably mounts the light emitter upwards to the reference sill; and a light receiver mounting member that detachably mounts the light receiver downwards to the object sill. When the light emitter is mounted to the reference floor via the light emitter mounting member and the light receiver is mounted to the object sill via the light receiver mounting member, the amount of light received by the light receiver that receives laser light emitted from the light emitter along the vertical direction changes by adjusting the position of the object sill relative to the reference sill.

[0014] Invention Effects

[0015] According to the elevator positioning method and elevator positioning device disclosed herein, it is possible to suppress the reduction in the positioning accuracy of the landing sill. Attached Figure Description

[0016] Figure 1 This is a partial cross-sectional perspective view showing the state of the landing sill and track in the hoistway when the elevator is positioned using the positioning method of Embodiment 1.

[0017] Figure 2 It means that it is in progress Figure 1 A three-dimensional diagram of the sill positioning equipment used for positioning the sill of the station and the track positioning components used for positioning each track.

[0018] Figure 3 It means installed in Figure 2 A three-dimensional view of the light emitter on the reference sill.

[0019] Figure 4 It means installed in Figure 2 A three-dimensional view of the light receiver on the sill of the object.

[0020] Figure 5 It means Figure 2 A 3D view of the track positioning component.

[0021] Figure 6 This is an explanation of the process. Figure 1 A flowchart showing the steps involved in positioning each level of the station sill and each track.

[0022] Figure 7 It means in Figure 6 A three-dimensional view of the state of a pair of light emitters installed at the bottom of the shaft during the lowest level sill positioning process S1.

[0023] Figure 8 It means in Figure 6 A three-dimensional diagram showing the state of the lowest level sill positioning process S1, in which the position of the lowest level sill is adjusted based on the laser of each emitter.

[0024] Figure 9 It means in Figure 6 A three-dimensional diagram showing the state of each track during the positioning process S3 using track positioning components.

[0025] Label Explanation

[0026] 1: Shaft, 3: Floor sill, 3a: Reference sill, 3b: Object sill, 4: Track, 5: Sill positioning device, 6: Track positioning component, 51: Light emitter, 52: Light receiver, 53: Light emitter mounting component, 54: Light receiver mounting component, 61: Positioning component body, 62: Body mounting component. Detailed Implementation

[0027] The embodiments of the present disclosure will be described with reference to the accompanying drawings. In the drawings, identical or equivalent parts are labeled with the same reference numerals, and repeated descriptions are appropriately simplified or omitted. Furthermore, the present disclosure is not limited to the following embodiments; any modifications or omissions of any constituent elements of the embodiments are permitted without departing from the spirit of the present disclosure.

[0028] Implementation method 1.

[0029] Figure 1This is a partial cross-sectional perspective view showing the configuration of the landing sill and rails in the elevator shaft during positioning using the elevator positioning method of Embodiment 1. In the view, a shaft 1 is provided in the building. Landing entrances / exits 2 are provided on each floor of the building. On each floor, the space within the shaft 1 is open to the landing through the landing entrances / exits 2. The width direction of each landing entrance / exit 2 is consistent with the width direction of the shaft 1.

[0030] Each floor is equipped with a landing sill 3. The landing sill 3 on each floor is located below the landing entrance / exit 2. Each landing sill 3 is installed on the inner wall of the hoistway 1. Each landing sill 3 is arranged along the width direction of the hoistway 1.

[0031] A sill groove is provided on the upper surface of each floor sill 3 along the length of the floor sill 3. A floor door (not shown) is provided at each floor entrance / exit 2. When the floor door is located at the floor entrance / exit 2, the floor door moves along the sill groove, thereby opening and closing the floor entrance / exit 2.

[0032] A pair of tracks 4 are arranged within the hoistway 1. Each track 4 is constructed by continuously joining multiple unit track components. The pair of tracks 4 are arranged opposite each other in the width direction of the hoistway 1. The pair of tracks 4 serve, for example, as car guides to guide a car (not shown) to move vertically.

[0033] In each floor, the landing sills 3 are positioned horizontally such that all landing sills 3 on each floor are arranged vertically. Additionally, in each floor, the tracks 4 are positioned horizontally such that each track 4 is arranged vertically at predetermined track positions.

[0034] When locating the landing sills 3 configured on each floor, the landing sill 3 configured on the lowest floor is located first. Once the landing sill 3 is located on the lowest floor, the landing sill 3 configured on the lowest floor becomes the located landing sill 3.

[0035] The positioning of the floor sill 3, which is located on the floor immediately above the lowest level, is based on the already positioned floor sill 3 located on the lowest level, and is performed using a floor sill positioning device.

[0036] The layers for positioning each track 4 change sequentially from the lowest layer to the highest layer. Within each layer, the track positioning device is used to position each track 4, with the already positioned floor sill 3 as a reference.

[0037] Figure 2 It means that it is in progress Figure 1A perspective view of the sill positioning equipment used for positioning the sill 3 of the station and the track positioning components used for positioning each track 4. In the shaft 1, a pair of imaginary vertical reference lines A are pre-set along the vertical direction. The pair of imaginary vertical reference lines A are set at positions that are separated from each other in the width direction of the shaft 1.

[0038] A pair of first installation reference lines (not shown) and a pair of second installation reference lines (not shown) are pre-defined on the sills 3 of each floor. Each first installation reference line and each second installation reference line is an imaginary line along the thickness direction of the sill 3.

[0039] In each floor sill 3, the positions of a pair of first installation reference lines are separated from each other along the length of the floor sill 3. When the positioning of all floor sills 3 on each floor is completed and all floor sills 3 on each floor are arranged in the vertical direction, the pair of first installation reference lines set on each floor sill 3 are consistent with a pair of imaginary vertical reference lines A.

[0040] In each floor sill 3, the position of a pair of second installation reference lines becomes the position between a pair of first installation reference lines. The pair of second installation reference lines become the reference for the installation position of the track positioning element 6 relative to the floor sill 3, as described later. The positional relationship between the pair of first installation reference lines and the pair of second installation reference lines is the same in each floor sill 3.

[0041] Each floor sill 3 is provided with a pair of first mounting holes (not shown) centered on a pair of first mounting reference lines and a pair of second mounting holes (not shown) centered on a pair of second mounting reference lines. In each floor sill 3, each first mounting hole and each second mounting hole penetrates the floor sill 3 along its thickness direction.

[0042] When locating the landing sill 3 located immediately above the lowest level, the lowest level with the located landing sill 3 is designated as the reference level, and the layer immediately above the lowest level designated as the reference level is designated as the target level. Furthermore, the landing sill 3 located on the reference level is designated as reference sill 3a, and the landing sill 3 located on the target level is designated as target sill 3b.

[0043] The positioning of the object sill 3b is based on the reference sill 3a. When positioning the object sill 3b based on the reference sill 3a, a sill positioning device 5 is used. The sill positioning device 5 has a pair of light emitters 51 and a pair of light receivers 52.

[0044] A pair of light emitters 51 are mounted upwards on the upper surface of the reference sill 3a. The position of each light emitter 51 relative to the reference sill 3a is determined with reference to each of the first mounting reference lines of the reference sill 3a. With each light emitter 51 mounted on the reference sill 3a, the position of each light emitter 51 is its position on each of the first mounting reference lines of the reference sill 3a.

[0045] Each emitter 51 emits a laser beam. Thus, with each emitter 51 installed on the reference sill 3a, each emitter 51 emits a laser beam that passes along each first installation reference line. Since the reference sill 3a is a pre-positioned landing sill 3, with each emitter 51 installed on the reference sill 3a, each emitter 51 emits a laser beam upwards that passes along each reference imaginary vertical line A.

[0046] A pair of light receivers 52 are mounted downwards on the lower surface of the target sill 3b. The position of each light receiver 52 relative to the target sill 3b is determined with reference to each of the first mounting reference lines of the target sill 3b. With each light receiver 52 mounted on the target sill 3b, the position of each light receiver 52 is its position on each of the first mounting reference lines of the target sill 3b.

[0047] Each light receiver 52 is capable of receiving laser light from each light emitter 51. Each light receiver 52 determines whether laser light is detected based on the amount of light received by the light receiver 52. That is, each light receiver 52 detects laser light when the amount of light received by the light receiver 52 exceeds a threshold, and does not detect laser light when the amount of light received by the light receiver 52 is below the threshold.

[0048] The greater the offset of each light receiver 52 from the position of each reference vertical imaginary line A, the less light each light receiver 52 receives from the laser light from each emitter 51. If the position of the light receiver 52 is consistent with the position on the reference vertical imaginary line A, the amount of light received by the light receiver 52 exceeds the threshold, and the light receiver 52 detects the laser light. In this embodiment, when the light receiver 52 detects the laser light, the detection lamp provided on the light receiver 52 is lit.

[0049] The positioning of the target sill 3b is achieved by adjusting its position relative to the reference sill 3a in the horizontal direction. With each emitter 51 mounted on the reference sill 3a and each receiver 52 mounted on the target sill 3b, the amount of light received by each receiver 52 receiving laser light from each emitter 51 changes as the position of the target sill 3b relative to the reference sill 3a is adjusted. Therefore, the position of the target sill 3b relative to the reference sill 3a is adjusted based on the amount of light received by each receiver 52 receiving laser light from each emitter 51.

[0050] The position of the target sill 3b relative to the reference sill 3a is adjusted so that the light received by each light receiver 52 exceeds a threshold. That is, the position of the target sill 3b relative to the reference sill 3a is adjusted so that each light receiver 52 detects laser light. When the light received by each light receiver 52 exceeds the threshold and each light receiver 52 detects laser light, the position of each light receiver 52 is consistent with the position on each reference imaginary vertical line A, and the position of the target sill 3b becomes the position aligned with the reference sill 3a in the vertical direction. Thus, the positioning of the target sill 3b is completed, and the target sill 3b becomes the positioned floor sill 3.

[0051] The position of each light emitter 51 relative to the reference sill 3a is determined with reference to each of the first mounting reference lines of the reference sill 3a. The position of each light receiver 52 relative to the target sill 3b is determined with reference to each of the first mounting reference lines of the target sill 3b. Therefore, the positioning of the target sill 3b is performed with reference to the reference sill 3a by adjusting the position of each light receiver 52 relative to each light emitter 51.

[0052] Here, Figure 3 This indicates that it is installed at Figure 2 A three-dimensional view of the light emitter 51 of the reference sill 3a. Figure 4 This indicates that it is installed at Figure 2 A perspective view of the light receiver 52 of the target sill 3b. The sill positioning device 5 also has a pair of light emitter mounting parts 53 and a pair of light receiver mounting parts 54.

[0053] like Figure 3 As shown, a pair of light emitter mounting members 53 detachably mount a pair of light emitters 51 to the reference sill 3a with the latter facing upwards. Each light emitter mounting member 53 uses pins, bolts, or the like. Each light emitter mounting member 53 mounts the light emitter 51 to the reference sill 3a in a manner that allows it to protrude upwards from below through first mounting holes in the reference sill 3a.

[0054] like Figure 4 As shown, a pair of receiver mounting members 54 detachably mount a pair of receivers 52 to the target sill 3b, with the receivers facing downwards. Each receiver mounting member 54 uses pins, bolts, or the like. Each receiver mounting member 54 mounts the receiver 52 to the target sill 3b in a manner that allows it to protrude downwards from the top of the target sill 3b through each of the first mounting holes in the target sill 3b.

[0055] When positioning each of the four orbitals, such as Figure 2 As shown, track positioning components 6 are installed on the pre-positioned landing sill 3, and then installed on each track 4. Thus, the position of each track 4 relative to the pre-positioned landing sill 3 becomes a predetermined track setting position in the horizontal direction. Figure 2 In the middle, a track positioning component 6 is installed on the target sill 3b, which has become the positioned sill 3 of the floor station sill 3 by positioning with the reference sill 3a as the reference.

[0056] Figure 5 It means Figure 2 A perspective view of the track positioning component 6. The track positioning component 6 has a positioning component body 61 and a pair of body mounting components 62.

[0057] A pair of main mounting members 62 detachably mount the positioning member body 61 to the positioned landing sill 3. Each main mounting member 62 uses pins, bolts, etc. Each main mounting member 62 is mounted to the positioned landing sill 3 by being inserted from below into each of the second mounting holes. Thus, with each main mounting member 62 mounted to the positioned landing sill 3, the position of each main mounting member 62 is determined relative to each of the second mounting reference lines of the positioned landing sill 3. The position of each main mounting member 62 relative to the positioned landing sill 3 is determined with reference to each of the second mounting reference lines of the positioned landing sill 3. With each main mounting member 62 mounted to the positioned landing sill 3, each main mounting member 62 protrudes upwards from the positioned landing sill 3.

[0058] The positioning component body 61 is installed on the pre-positioned landing sill 3 via each main mounting component 62. Additionally, the positioning component body 61 can be installed on each track 4. The positioning component body 61 is installed on each track 4 by holding it in place.

[0059] The positioning component 61 is installed on the pre-positioned landing sill 3 via the various main mounting components 62, and is also installed on each track 4, thereby mechanically positioning each track 4 with the pre-positioned landing sill 3 as a reference.

[0060] The positioning component body 61 has a main gauge 611 and multiple auxiliary gauges 612. The main gauge 611 is mounted on each rail 4 by holding each rail 4. The position of a pair of rails 4 relative to the main gauge 611 is determined by mounting the main gauge 611 on each rail 4.

[0061] Multiple auxiliary gauges 612 are gauges that connect the main gauge 611 to the positioned landing sill 3. Each auxiliary gauge 612 is mounted on the positioned landing sill 3 via any one of a pair of main mounting members 62. In this embodiment, the main gauge 611 is connected to the positioned landing sill 3 by three auxiliary gauges 612. The position of the main gauge 611 relative to the positioned landing sill 3 is determined by connecting the main gauge 611 to the positioned landing sill 3 using multiple auxiliary gauges 612. In this way, the position of the main gauge 611 relative to the positioned landing sill 3 is determined, and the position of each track 4 relative to the main gauge 611 is determined, thereby determining the position of a pair of tracks 4 as track setting positions with reference to the positioned landing sill 3.

[0062] Next, the positioning method for the elevator, which positions the landing sills 3 on each floor of the building and the pair of tracks 4 in the hoistway 1, will be explained. Figure 6 This is an explanation of the process. Figure 1 The flowchart illustrates the steps involved in positioning each floor sill 3 and each track 4. The elevator positioning method includes the following steps: lowest floor sill positioning procedure S1, initial reference floor setting procedure S2, track positioning procedure S3, immediate upper floor determination procedure S4, target floor setting procedure S5, sill positioning procedure S6, and updated reference floor setting procedure S7. The operator performs the following steps to position each floor sill 3 and each track 4: lowest floor sill positioning procedure S1, initial reference floor setting procedure S2, track positioning procedure S3, immediate upper floor determination procedure S4, target floor setting procedure S5, sill positioning procedure S6, and updated reference floor setting procedure S7. When positioning each floor sill 3 and each track 4, the lowest floor sill positioning procedure S1 is performed first.

[0063] <Lowest Sill Positioning Procedure S1>

[0064] In the lowest sill positioning process S1, the lowest sill 3 is positioned. In this embodiment, a sill positioning device 5 is used when positioning the lowest sill 3. In the lowest sill positioning process S1, when positioning the lowest sill 3, firstly, a pair of light emitters 51 are installed at the bottom of the shaft 1 facing upwards.

[0065] Here, Figure 7 It means in Figure 6This is a perspective view of the state where a pair of light emitters 51 are installed at the bottom of the shaft 1 during the lowest level sill positioning process S1. The positions of the light emitters 51 at the bottom of the shaft 1 are determined based on the building reference line 10, which is pre-shown as the building reference line at the lowest floor of the building. For example, each light emitter 51 is installed at a position at the bottom of the shaft 1, a distance L away from the building reference line 10 in the depth direction of the shaft 1. Thus, the positions of the pair of light emitters 51 at the bottom of the shaft 1 become positions on a pair of reference imaginary vertical lines A. Laser light is emitted upwards from each light emitter 51, passing along each reference imaginary vertical line A.

[0066] Then, using the laser emitted from each emitter 51 as a reference, the position of the bottommost floor sill 3 is adjusted.

[0067] Figure 8 It means in Figure 6 This is a perspective view of the state during the lowest-level sill positioning process S1, where the position of the lowest-level sill 3 is adjusted using the lasers of each emitter 51 as a reference. When adjusting the position of the lowest-level sill 3, a pair of light receivers 52 are installed downwards on the lowest-level sill 3. Thus, the position of each light receiver 52 relative to the sill 3 becomes its position on each of the first mounting reference lines of the sill 3.

[0068] The adjustment of the position of the lowest-level landing sill 3 is based on the amount of light received by each light receiver 52, which receives laser light emitted from each emitter 51 along the vertical direction, and is performed horizontally with each laser light as a reference. When the amount of light received by each light receiver 52 exceeds a threshold and each light receiver 52 detects each laser light, the position of each light receiver 52 is aligned with the position on each reference vertical imaginary line A. In this state, the position of the lowest-level landing sill 3 is fixed. Therefore, the position of the landing sill 3 becomes the sill setting position with each reference vertical imaginary line A as a reference, and the positioning of the lowest-level landing sill 3 is completed. Thus, the lowest-level landing sill 3 becomes the positioned landing sill 3.

[0069] <Initial reference layer setting procedure S2>

[0070] After the lowest sill positioning process S1, the initial reference layer setting process S2 is performed. In the initial reference layer setting process S2, the lowest layer with the positioned landing sill 3 is set as the reference layer. At this time, the positioned landing sill 3 located at the lowest layer set as the reference layer is set as the reference sill 3a.

[0071] <Track positioning process S3>

[0072] Following the initial reference layer setting process S2, the track positioning process S3 is performed. In the track positioning process S3, each track 4 is positioned using the already positioned landing sill 3, i.e., the reference sill 3a, as a reference. The positioning of each track 4 is carried out in the reference layer where the reference sill 3a is located. Furthermore, the positioning of each track 4 is performed using a track positioning component 6.

[0073] Figure 9 It means in Figure 6 The image shows a perspective view of the track positioning process S3, in which track positioning components 6 are used to position each track 4. During the positioning of each track 4 in track positioning process S3, the positioning component body 61 is mounted on the reference sill 3a using a pair of main mounting components 62, and then mounted on each track 4. This achieves positioning of each track 4 relative to the reference sill 3a.

[0074] <Upper Layer Judgment Process S4>

[0075] Following track positioning step S3, the immediate superstructure determination step S4 is performed. In step S4, it is determined whether there is an immediate superstructure above the reference layer (i.e., the layer above the reference layer). Since there are multiple layers in a building, if the reference layer is the lowest layer, then there is an immediate superstructure above the lowest layer. If the reference layer is the highest layer and there is no immediate superstructure above it, the positioning operations for each floor's sill 3 and each track 4 are completed.

[0076] <Object layer setting process S5>

[0077] Following the immediate upper layer determination step S4, if an immediate upper layer of the reference layer exists, the object layer setting step S5 is performed. In the object layer setting step S5, the immediate upper layer of the reference layer is set as the object layer. The object layer is the layer that becomes the object for positioning the landing sill 3. Furthermore, in the object layer setting step S5, the landing sill 3 located on the object layer is set as the object sill 3b.

[0078] <Positioning process between sills S6>

[0079] After the object layer setting process S5, the sill positioning process S6 is performed. In the sill positioning process S6, the object sill 3b is positioned using the reference sill 3a as a reference. The positioning of the object sill 3b using the reference sill 3a as a reference is performed using the sill positioning device 5. Through the positioning of the object sill 3b, the object sill 3b becomes the positioned floor sill 3.

[0080] The positioning process between sills, S6, includes a light emitter process, a light receiver process, and an adjustment process. In the positioning process between sills, the adjustment process is performed after the light emitter process and the light receiver process. The light emitter process can be performed before or after the light receiver process.

[0081] In the process of producing light emitters, such as Figure 2 As shown, a pair of light emitters 51 are mounted upwards on the reference sill 3a. At this time, as... Figure 3 As shown, each emitter 51 is detachably mounted to the reference sill 3a via a emitter mounting bracket 53. Thus, the position of each emitter 51 coincides with its position on each reference imaginary vertical line A. Therefore, laser light is emitted from each emitter 51 upwards along the vertical direction, passing along each reference imaginary vertical line A.

[0082] In the light receiver process, such as Figure 2 As shown, a pair of light receivers 52 are mounted downwards on the object's sill 3b. At this time, as... Figure 4 As shown, each light receiver 52 is mounted to the target sill 3b via a light receiver mounting bracket 54. Therefore, the position of each light receiver 52 is consistent with the position of the target sill 3b on each first mounting reference line.

[0083] In the adjustment process, based on the amount of light received by each light receiver 52 that receives laser light emitted from each emitter 51 along the vertical direction, the position of the target sill 3b relative to the reference sill 3a is adjusted in the horizontal direction. During the adjustment process, the position of the target sill 3b relative to the reference sill 3a is adjusted so that the amount of light received by each light receiver 52 exceeds a threshold, and each light receiver 52 detects the laser light. When each light receiver 52 detects the laser light, its position aligns with its position on each reference imaginary vertical line A, thus positioning the target sill 3b. Therefore, the target sill 3b becomes the positioned floor sill 3.

[0084] <Update Baseline Setting Procedure S7>

[0085] Following the sill positioning process S6, the reference floor setting update process S7 is performed. In the reference floor setting update process S7, the target floor where the previously positioned landing sill 3 was newly configured in the sill positioning process S6 is set as the new reference floor. That is, in the reference floor setting update process S7, the floor set as the reference floor is updated. At this time, the previously positioned landing sill 3 configured on the updated new reference floor is set as the new reference sill 3a. The initial reference floor setting process S2 and the reference floor setting update process S7 are respectively considered reference floor setting processes in the elevator positioning method.

[0086] After the baseline setting process S7, the track positioning process S3 is performed on the updated new baseline. At this time, each track 4 is positioned using the new reference sill 3a located on the new baseline as a reference. Therefore, the track positioning component 6 is removed from the previous baseline and installed on the new reference sill 3a located on the updated new baseline.

[0087] Next, in the immediate superimposed layer determination step S4, it is determined whether a new immediate superimposed layer of the reference layer exists. If a new immediate superimposed layer of the reference layer exists, in the object layer setting step S5, the immediate superimposed layer of the new reference layer is set as the new object layer. At this time, in the object layer setting step S5, the floor sill 3 configured on the new object layer is set as the new object sill 3b.

[0088] After the immediate upper layer determination process S4, the unit positioning operations of the following steps are repeatedly performed in sequence: the object layer setting process S5, the sill positioning process S6, the updated reference layer setting process S7, the track positioning process S3, and the immediate upper layer determination process S4, until it is determined in the immediate upper layer determination process S4 that there is no new reference layer immediately above the current reference layer.

[0089] In the sill positioning process S6, performed after the baseline setting process S7, for each unit positioning operation, each light emitter 51 is removed from the baseline before the update, and each light emitter 51 is installed on the new baseline sill 3a located on the new baseline after the update. Additionally, in the sill positioning process S6, performed after the baseline setting process S7, for each unit positioning operation, each light receiver 52 is removed from the object layer before the update, and each light receiver 52 is installed on the new object sill 3b located on the new object layer after the update.

[0090] When it is determined in the uppermost layer determination process S4 that there is no new uppermost layer of the reference layer, the positioning operations of each level station sill 3 and each track 4 are completed.

[0091] Therefore, when positioning the sills 3 of each level, the reference layers are updated sequentially from the bottom to the upper layers one by one, and the object sill 3b of the object layer, which is immediately above the reference layer, is positioned using the reference sill 3a located on the reference layer as a reference. Similarly, when positioning each track 4, the reference layers are updated sequentially from the bottom to the upper layers one by one, and the track 4 is positioned using the reference sill 3a located on the reference layer as a reference. In this embodiment, the track positioning members 6 are moved sequentially from the bottom to the upper layers while engaging the unit track components from the bottom of the shaft 1, thereby positioning each track 4.

[0092] In this elevator positioning method, in either the initial reference floor setting step S2 or the updated reference floor setting step S7, the floor with the positioned landing sill 3 is set as the reference floor. After either the initial reference floor setting step S2 or the updated reference floor setting step S7, in the target floor setting step S5, the floor immediately above the reference floor is set as the target floor. After the target floor setting step S5, in the sill positioning step S6, the target sill 3b is positioned with reference to the reference sill 3a. In the sill positioning step S6, in the emitter step, the emitter 51 is installed on the reference sill 3a, and in the receiver step, the receiver 52 is installed on the target sill 3b. Furthermore, in the sill positioning step S6, after the emitter and receiver steps, based on the amount of light received by the receiver 52, which receives laser light emitted from the emitter 51 along the vertical direction, the position of the target sill 3b relative to the reference sill 3a is adjusted.

[0093] Therefore, the distance of the laser from the emitter 51 installed on the reference sill 3a to the receiver 52 installed on the target sill 3b can be limited to the height range from the reference layer to the layer immediately above the reference layer. This shortens the distance of the laser from the emitter 51 to the receiver 52, suppressing the expansion of laser divergence. Furthermore, it also suppresses the horizontal expansion of the laser's offset relative to the emitter 51 before it reaches the receiver 52. Therefore, the position of the reference sill 3a in the horizontal direction can be more accurately reflected in the position of the target sill 3b, suppressing the decrease in the positioning accuracy of the floor sills 3 on each layer. Furthermore, since the receiver 52 receives the laser from the emitter 51, it can suppress the decrease in the adjustment accuracy of the target sill 3b caused by individual operator differences, further reliably suppressing the decrease in the positioning accuracy of the floor sills 3 on each layer.

[0094] Furthermore, in the track positioning process S3, track positioning components 6 are installed on the already positioned landing sill 3, and then the track positioning components 6 are installed on each track 4, thereby positioning each track 4 relative to the already positioned landing sill 3. Therefore, each track 4 can be positioned using the already positioned landing sill 3 as a reference. Consequently, it is unnecessary to lay the piano wire, which will serve as the positioning reference for each track 4, along the vertical direction in the shaft 1, thus reducing the workload when positioning each track 4.

[0095] Furthermore, in the baseline setting process S7, after the sill positioning process S6, the object layer with the newly positioned landing sill 3 is set as the new baseline layer, and the positioned landing sill 3 on the new baseline layer is set as the new baseline sill 3a. Therefore, by setting the layer immediately above the new baseline layer as the new object layer and setting the landing sill 3 on the new object layer as the new object sill 3b, the new object sill 3b can be positioned with the new baseline sill 3a as the reference. Thus, while updating the baseline layers one by one from the bottom layer to the layers above, the positioning of the object sill 3b on the object layer immediately above the baseline layer can be performed with the baseline sill 3a on the baseline layer as the reference. Therefore, the positioning of the landing sill 3 on each layer can be performed efficiently.

[0096] Furthermore, in this elevator positioning device, the emitter 51 of the sill positioning device 5 is detachably mounted to the reference sill 3a, facing upwards, via the emitter mounting bracket 53. The receiver 52 of the sill positioning device 5 is detachably mounted to the target sill 3b, facing downwards, via the receiver mounting bracket 54. The amount of light received by the receiver 52, which receives laser light emitted vertically from the emitter 51, varies by adjusting the position of the target sill 3b relative to the reference sill 3a. Therefore, by adjusting the position of the target sill 3b relative to the reference sill 3a based on the amount of light received by the receiver 52, the target sill 3b can be easily positioned. Additionally, the distance of the laser light from the emitter 51 to the receiver 52 can be limited to the floor height from the reference floor to the floor immediately above the reference floor. This suppresses the reduction in positioning accuracy of the sills 3 on each floor. Furthermore, the light receiver 52 receives the laser light from the light emitter 51, thus suppressing the reduction in the adjustment accuracy of the object sill 3b caused by the operator's individual differences, and further reliably suppressing the reduction in the positioning accuracy of the floor sill 3 of each layer.

[0097] Furthermore, the positioning component 61 of the track positioning component 6 is installed on the already positioned landing sill 3 via the main mounting component 62, and is also installed on each track 4, thereby positioning each track 4 with the already positioned landing sill 3 as a reference. Therefore, positioning each track 4 can be performed with the already positioned landing sill 3 as a reference. This reduces the workload when positioning each track 4.

[0098] Furthermore, in the above embodiment, in the lowest sill positioning process S1, the sill positioning device 5 is used to position the lowest sill 3. However, the positioning of the lowest sill 3 may also be performed without using the sill positioning device 5. For example, the positioning of the lowest sill 3 may be performed while directly measuring the distance from the building reference line 10 to the sill 3 using a distance measuring device or the like at the lowest level.

[0099] In addition, in the above embodiment, during the adjustment process of the sill positioning process S6, the operator adjusts the position of the target sill 3b relative to the reference sill 3a. However, during the adjustment process of the sill positioning process S6, the position of the target sill 3b relative to the reference sill 3a can also be automatically adjusted by a sill adjustment device. In this case, the sill positioning process S6 includes an adjustment device setting process. The adjustment device setting process is a process of setting a sill adjustment device with a movable part on the target layer and installing the movable part on the target sill 3b before the adjustment process. The sill adjustment device can, for example, be set on the ground of the target layer's station. Furthermore, the movable part of the sill adjustment device can, for example, be a movable arm that can move while holding the target sill 3b. During the adjustment device setting process, the sill adjustment device is connected to the light receiver 52 in a manner that allows for wired or wireless communication. Thus, during the adjustment process, a signal corresponding to the amount of light received by the light receiver 52, which receives the laser emitted from the emitter 51, is sent to the sill adjustment device. Furthermore, in this case, during the adjustment process, the sill adjustment device controls the movement of the movable part based on the amount of light received by the light receiver 52, thereby adjusting the position of the target sill 3b relative to the reference sill 3a. This allows for automatic adjustment of the position of the target sill 3b relative to the reference sill 3a during the adjustment process, making it easier to position the target sill 3b.

[0100] Furthermore, in the above embodiment, the track positioning process S3 is performed whenever a layer designated as a reference layer is updated in the reference layer setting process S7. However, for example, the track positioning process S3 can also be performed on each layer after all the landing sills 3 have been positioned, that is, after all the landing sills 3 located on each layer have become positioned landing sills 3. In this case, while moving the layer on which the track positioning process S3 is performed from the bottom layer to the top layer one by one upwards, the positioning of each track 4 is performed based on the positioned landing sills 3 in each layer. In this way, it is not necessary to stretch the piano wire that will become the positioning reference of each track 4 in the vertical direction in the shaft 1, which can reduce the workload when positioning each track 4.

[0101] The above-described embodiments represent one example of the content of this disclosure. These embodiments can be combined with other known technologies. Without departing from the spirit of this disclosure, parts of the structure of the embodiments can be omitted or modified.

[0102] Hereinafter, examples of the modes that may be included in this disclosure are explicitly described as appendices.

[0103] (Postscript 1)

[0104] A method for positioning an elevator, comprising:

[0105] The reference layer setting process involves setting the layer with the pre-positioned landing sill as the reference layer, and setting the landing sill located on the reference layer as the reference sill.

[0106] The object layer setting process, after the reference layer setting process, sets the layer immediately above the reference layer as the object layer, and sets the floor sill configured on the object layer as the object sill; and

[0107] The sill positioning process, following the object layer setting process, involves positioning the object sill using the reference sill as a reference, thereby making the object sill a positioned floor sill.

[0108] The positioning process between the sills includes:

[0109] In the process of emitting laser light, the laser light emitter is installed facing upwards on the reference sill.

[0110] In the laser receiver process, a laser receiver capable of receiving laser light is installed downwards on the sill of the object; and

[0111] In the adjustment process, after the light emitter process and the light receiver process, the position of the object sill relative to the reference sill is adjusted based on the amount of light received by the light receiver from the laser emitted from the light emitter along the vertical direction.

[0112] (Postscript 2)

[0113] According to the elevator positioning method described in Appendix 1, wherein,

[0114] The elevator positioning method includes the following track positioning process: using the already positioned landing sill as a reference, positioning the track arranged vertically in the shaft.

[0115] In the track positioning process, the track positioning component is installed on the already positioned landing sill, and the track positioning component is installed on the track, thereby positioning the track relative to the already positioned landing sill.

[0116] (Note 3)

[0117] According to the elevator positioning method described in Appendix 1 or 2, wherein,

[0118] The positioning process between sills includes the following adjustment device setting process: before the adjustment process, a sill adjustment device with a movable part is set on the object layer, and the movable part is installed on the object sill.

[0119] In the adjustment process, based on the amount of light received by the light receiver from the laser emitted from the light emitter, the sill adjustment device controls the movement of the movable part, thereby adjusting the position of the target sill relative to the reference sill.

[0120] (Postscript 4)

[0121] According to any one of the appendices 1 to 3, the elevator positioning method, wherein,

[0122] The reference layer setting process is performed after the positioning process between the sills. The object layer with the newly configured sill of the already positioned station is set as the new reference layer, and the station sill configured on the new reference layer is set as the new reference sill.

[0123] (Note 5)

[0124] An elevator positioning device includes a sill positioning device for positioning an object sill based on a reference sill, wherein the reference sill is a landing sill located on a reference floor, and the object sill is a landing sill located on the floor immediately above the reference floor.

[0125] The sill positioning device has the following features:

[0126] A light emitter that emits laser light;

[0127] A light receiver, capable of receiving laser light;

[0128] A mounting bracket for a light emitter, which detachably mounts the light emitter upwards onto the reference sill; and

[0129] A mounting bracket for a light receiver, which allows the light receiver to be detachably mounted to the sill of the object with the light receiver facing downwards.

[0130] With the emitter mounted on the reference sill via the emitter mounting bracket and the receiver mounted on the target sill via the receiver mounting bracket, by adjusting the position of the target sill relative to the reference sill, the amount of light received by the receiver that receives laser light emitted from the emitter along the vertical direction changes.

[0131] (Note 6)

[0132] According to the elevator positioning device described in Appendix 5, wherein,

[0133] The elevator positioning device includes a track positioning element used for positioning a track arranged vertically in the hoistway, with the pre-positioned landing sill as a reference.

[0134] The track positioning component has:

[0135] The positioning component body is capable of being mounted on the track; and

[0136] The main mounting component detachably mounts the positioning component to the pre-positioned floor sill.

[0137] The positioning component is installed on the pre-positioned landing sill via the main mounting component and on the track, thereby positioning the track with the pre-positioned landing sill as a reference.

Claims

1. A method for positioning an elevator, comprising: The reference layer setting process involves setting the layer with the pre-positioned landing sill as the reference layer, and setting the landing sill located on the reference layer as the reference sill. In the object layer setting process, after the reference layer setting process, the layer immediately above the reference layer is set as the object layer, and the floor threshold configured in the object layer is set as the object threshold. as well as The sill positioning process, following the object layer setting process, involves positioning the object sill using the reference sill as a reference, thereby making the object sill a positioned floor sill. The positioning process between the sills includes: In the process of emitting laser light, the laser light emitter is installed facing upwards on the reference sill. In the laser receiver process, a laser receiver capable of receiving laser light is installed downwards on the sill of the object; and In the adjustment process, after the light emitter process and the light receiver process, the position of the object sill relative to the reference sill is adjusted based on the amount of light received by the light receiver from the laser emitted from the light emitter along the vertical direction.

2. The elevator positioning method according to claim 1, wherein, The elevator positioning method includes the following track positioning process: using the already positioned landing sill as a reference, positioning the track arranged vertically in the shaft. In the track positioning process, the track positioning component is installed on the already positioned landing sill, and the track positioning component is installed on the track, thereby positioning the track relative to the already positioned landing sill.

3. The elevator positioning method according to claim 1 or 2, wherein, The positioning process between sills includes the following adjustment device setting process: before the adjustment process, a sill adjustment device with a movable part is set on the object layer, and the movable part is installed on the object sill. In the adjustment process, based on the amount of light received by the light receiver from the laser emitted from the light emitter, the sill adjustment device controls the movement of the movable part, thereby adjusting the position of the target sill relative to the reference sill.

4. The elevator positioning method according to any one of claims 1 to 3, wherein, The reference layer setting process is performed after the positioning process between the sills. The object layer with the newly configured sill of the already positioned station is set as the new reference layer, and the station sill configured on the new reference layer is set as the new reference sill.

5. A positioning device for an elevator, comprising a sill positioning device for positioning an object sill based on a reference sill, wherein the reference sill is a landing sill disposed on a reference floor, and the object sill is a landing sill disposed on the floor immediately above the reference floor. The sill positioning device has the following features: A light emitter that emits laser light; A light receiver, capable of receiving laser light; A mounting bracket for a light emitter, which detachably mounts the light emitter upwards onto the reference sill; and A mounting bracket for a light receiver, which allows the light receiver to be detachably mounted to the sill of the object with the light receiver facing downwards. With the emitter mounted on the reference sill via the emitter mounting bracket and the receiver mounted on the target sill via the receiver mounting bracket, by adjusting the position of the target sill relative to the reference sill, the amount of light received by the receiver that receives laser light emitted from the emitter along the vertical direction changes.

6. The elevator positioning device according to claim 5, wherein, The elevator positioning device includes a track positioning element used for positioning a track arranged vertically in the hoistway, with the pre-positioned landing sill as a reference. The track positioning component has: The positioning component body is capable of being mounted on the track; and The main mounting component detachably mounts the positioning component to the pre-positioned floor sill. The positioning component is installed on the pre-positioned landing sill via the main mounting component and on the track, thereby positioning the track with the pre-positioned landing sill as a reference.

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