A TP cover plate glass cleaning agent and a preparation method thereof

Abstract

This invention relates to the field of cleaning agent technology and discloses a TP cover glass cleaning agent and its preparation method, comprising: an interface modifier, a targeted dispersant, triisopropanolamine, and deionized water; wherein the mass ratio of the interface modifier to the targeted dispersant is strictly limited to the range of 1.5:1 to 2.5:1; under this mass ratio range and laminar shear conditions, the cationic center of the interface modifier and the anionic group of the targeted dispersant self-assemble in an aqueous medium to form a vesicular micelle structure, physically confining the targeted dispersant to the hydrophilic core region of the micelle. This invention utilizes the self-assembly between components to construct vesicular micelles with a core-shell structure, encapsulating a highly active chelating agent inside the micelles. While blocking the corrosion path of the chelating agent on the glass substrate, it achieves targeted removal of contaminants through a response release mechanism targeting the Zeta potential of cerium oxide particles.

Description

Technical Field

[0001] This invention relates to a TP cover glass cleaning agent and its preparation method, belonging to the field of cleaning agent technology. Background Technology

[0002] High-alumina silicon cover glass is currently widely used in OLED and Micro-LED display modules. After cold processing, cerium oxide particles, cutting fluid oil, and fine glass shavings remain on the surface. This type of glass has extremely high requirements for surface roughness and cleanliness. Existing cleaning processes mostly use strongly alkaline inorganic compound solutions combined with ultrasound, utilizing the electrostatic repulsion and surface micro-etching effect generated by the high-concentration alkaline environment to remove contaminants. The cleaning process of high-alumina glass is to remove strongly adsorbed cerium oxide particles. Conventional formulas need to increase the concentration of organophosphonate chelating agents. In weakly alkaline aqueous solutions, free phosphonate ions have a non-specific binding ability to metal cations. Before capturing trace amounts of cerium oxide particles, they preferentially coordinate with aluminum ions on the glass surface. This non-selective chemical reaction leads to aluminum depletion on the glass surface, resulting in increased micro-roughness and surface energy attenuation. The change in surface state reduces the nucleation density of anti-fingerprint or anti-reflective coatings in subsequent vacuum evaporation processes, leading to decreased film-substrate adhesion and failure of wear resistance.

[0003] To resolve the contradiction between cleaning residue and substrate damage, the industry has attempted to optimize cleaning systems by compounding specific surfactants. For example, Chinese invention patent CN114015514A discloses an alkaline polishing cleaning agent for TP cover glass, which uses anionic fatty alcohol ether gemini surfactants combined with inorganic alkalis and chelating agents to solve the problems of silicone adhesive residue and silicone oil residue on the glass surface. Although this solution utilizes the solubilizing and emulsifying properties of gemini surfactants to improve the removal effect of organic oil stains, the chelating agents such as EDTA or phosphates in the system still exist in the solution in the form of freely diffused molecules at the microscopic level. Traditional compounding systems have not established a physical isolation or screening mechanism for active components, and cannot thermodynamically block the attack path of chelating agents on aluminum ions on the glass surface. When dealing with high-end cover glass that is sensitive to surface energy, such cleaning agents cannot avoid the attenuation of substrate surface energy due to non-specific corrosion of active components. In order to reduce substrate corrosion, existing technologies adjust the pH value of the cleaning solution to neutral or weakly alkaline, which weakens the zeta potential repulsion and cannot remove cerium oxide particles. Simply adjusting the component concentration or pH value is difficult to simultaneously meet the requirements of high cleanliness and low surface damage.

[0004] Therefore, how to construct a cleaning system that specifically identifies and removes cerium oxide particles under weakly alkaline conditions and blocks the corrosion of glass substrates by active components has become the technical problem to be solved by this invention. Summary of the Invention

[0005] To address the problems mentioned in the background art, the technical solution of the present invention is as follows: A TP cover glass cleaning agent, which is a homogeneous water-based dispersion system exhibiting Tyndall effect characteristics, prepared from the following components under mixing conditions that maintain laminar shear:

[0006] 5.0% to 15.0% by weight of an interface modifier, wherein the interface modifier is selected from sodium lauryl iminodipropionate or caprylate-decanoic acid-amidopropyl betaine.

[0007] 2.0% to 8.0% by weight of a targeted dispersant, wherein the targeted dispersant is selected from the alkali metal salt of 1-hydroxyethylidene-1,1-diphosphonic acid or the alkali metal salt of 2-phosphonobutane-1,2,4-tricarboxylic acid;

[0008] 3.0% to 10.0% by weight of triisopropanolamine;

[0009] The remaining amount is deionized water; wherein the mass ratio of the interface modifier to the targeted dispersant is limited to the range of 1.5:1 to 2.5:1; under this mass ratio range and laminar shear conditions, the cationic centers in the interface modifier molecule structure are directionally adsorbed and three-dimensionally encapsulated by electrostatic guidance, forming vesicular micelle structures with a particle size distribution in the range of 50 nm to 200 nm in the aqueous medium; the vesicular micelle structure has a hydrophilic core region, and the targeted dispersant is physically confined inside the hydrophilic core region, thereby blocking the direct contact path between the targeted dispersant and the aluminum ion sites on the surface of the glass substrate when the cleaning agent comes into contact with the glass substrate.

[0010] Preferably, the cleaning agent is obtained through the following preparation steps: under a stirring speed of 300 to 400 rpm, the targeted dispersant and triisopropanolamine are dissolved in deionized water to form a base solution; while maintaining the stirring speed, the interface modifier is continuously added dropwise to the base solution at a rate not exceeding 5 liters per minute until the system produces a blue opalescence; wherein the dropwise addition of the interface modifier continues until the mass ratio of the interface modifier to the targeted dispersant reaches the range of 1.5:1 to 2.5:1, thereby locking the thermodynamic metastable state of the vesicular micelle structure.

[0011] Preferably, the interface modifier is sodium lauryl iminodipropionate, the targeted dispersant is tetrasodium 1-hydroxyethylidene-1,1-bisphosphonate, and the mass ratio of the interface modifier to the targeted dispersant is 1.8:1 to 2.2:1; under this ratio, the dynamic light scattering test spectrum of the cleaning agent shows a single-peak distribution and the polydispersity index is less than 0.2.

[0012] Preferably, the content of triisopropanolamine is 5.0% to 8.0% by weight, and the pH value of the cleaning agent is 8.5 to 10.5; triisopropanolamine forms a synergistic buffer system with the interface modifier within the pH range to maintain the stability of the surface charge density of the vesicular micelle structure.

[0013] Preferably, the proportions of each component in the cleaning agent meet the following stability index. Relationship: ,in, This refers to the mass percentage concentration of the interface modifier. This refers to the mass percentage concentration of the targeted dispersant. The mass percentage concentration of triisopropanolamine, stability index The value is controlled between 0.6 and 0.9 to ensure that the micelle wall layer formed by the interface modifier has sufficient mechanical strength to resist Brownian motion impacts.

[0014] Preferably, the conductivity of the deionized water is less than or equal to 1 microsiemens per centimeter; the kinematic viscosity of the cleaning agent at 25 degrees Celsius is 1.2 mm² / s to 2.5 mm² / s, a viscosity range that ensures the cleaning agent can generate a cavitation effect in the ultrasonic cleaning tank, and the cleaning agent has a stripping characteristic for cerium oxide particles based on the difference in zeta potential; when the cleaning agent contacts cerium oxide particles with a surface zeta potential greater than 10 mV, the vesicular micelle structure is induced by interfacial electrostatic attraction to undergo local disintegration, releasing a targeted dispersant to complex cerium ions on the surface of the cerium oxide particles; while when the cleaning agent contacts a glass substrate with a surface zeta potential greater than 50 mV, the vesicular micelle structure remains intact, using the steric hindrance effect to repel the glass substrate.

[0015] Preferably, the cleaning agent does not contain any organic solvents or inorganic strong base components other than interface modifiers, targeted dispersants, triisopropanolamine and deionized water, which limits the amount of chemical oxygen demand in the waste liquid after use to ensure that the chemical oxygen demand is at a low level.

[0016] Preferably, the interface modifier is caprylate-decanoic acid ammonium betaine, and the targeted dispersant is tetrasodium 2-phosphonobutane-1,2,4-tricarboxylate; under this combination, the cleaning agent retains the Tyndall effect characteristics at an operating temperature of 60 degrees Celsius.

[0017] Preferably, the cleaning agent is used in the precision cleaning process of TP cover glass, the process including: immersing the TP cover glass to be cleaned in an ultrasonic bath containing the cleaning agent, cleaning for 30 to 180 seconds under the action of ultrasonic waves with a frequency of 40 kHz to 120 kHz; removing the TP cover glass and rinsing it with pure water.

[0018] A method for preparing a TP cover glass cleaner, wherein the TP cover glass cleaner is prepared by the aforementioned TP cover glass cleaner.

[0019] Compared with the prior art, the beneficial effects of the present invention are:

[0020] 1. In TP cover glass cleaning agent, the mass ratio of interface modifier and targeted dispersant is limited, and micelle assembly structure is induced in the aqueous system. This allows the highly active dispersant component to be three-dimensionally encapsulated in the micelle core by the long chains of interface modifier molecules. The microstructure changes the state of the active component solution, transforming it from a free diffusion state to a shielded latent state. Thermodynamically, it blocks the direct contact path between phosphate ions and aluminum ions in the glass network. The component ratio locking phase control mechanism eliminates the non-specific chemical etching of the high-alumina glass substrate by the free chelating agent in the weakly alkaline cleaning solution, maintains the chemical activity of the cleaning system, and inhibits aluminum depletion and microstructure damage on the glass surface.

[0021] 2. The cleaning system utilizes the difference in zeta potential between the surface of cerium oxide particles and the surface potential of the glass substrate to establish a differentiated triggering release mechanism. The micelle structure remains stable during fluid transport in the encapsulated state. When it comes into contact with cerium oxide particles with a specific surface charge density, it is induced by interfacial electrostatic attraction and coordination field effect to undergo local demulsification and structural disintegration. In this process, a high concentration of dispersant is released directionally to the surface of the contaminant, achieving targeted chelation and removal of particles. The mechanism restricts the chemical action of the cleaning agent to the contaminant attachment site, avoiding ineffective consumption of active components in the cleaning area and accidental damage to the substrate, thus achieving decoupling of the decontamination efficiency and substrate protection kinetics.

[0022] 3. The selective cleaning mechanism preserves the original atomic-level morphology of the substrate. After cleaning, the surface of the glass cover exhibits a uniform chemical composition distribution and stable high surface energy characteristics. The surface state is not affected by chemical etching, avoiding the surface energy decay and increase of defect sites caused by conventional cleaning. This provides a dense and uniform nucleation growth substrate for subsequent anti-fingerprint or anti-reflective film vacuum evaporation processes. The properties enhance the interfacial bonding strength between the film and the glass substrate, solving the problem of reduced wear resistance and peeling of the film caused by substrate surface damage. This meets the dual requirements of cleanliness and surface integrity in high-end display module manufacturing processes. Attached Figure Description

[0023] Figure 1 This is a schematic diagram illustrating the preparation process of the cleaning agent and the response mechanism of the vesicular micelles of the present invention.

[0024] Figure 2 This is a comparison diagram of micelle size distribution under different component mass ratios according to the present invention;

[0025] Figure 3 This is a block diagram of the intelligent manufacturing hardware system architecture and process control module of the present invention. Detailed Implementation

[0026] The technical solutions of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0027] This invention provides a TP cover glass cleaning agent and its preparation method. The cleaning agent is a homogeneous aqueous dispersion system, mainly composed of an interface modifier, a targeted dispersant, a pH buffer, and deionized water. It utilizes the electrostatic association between an amphoteric surfactant and an organophosphonate within a specific mass ratio range to construct core-shell vesicular micelles in an aqueous medium. The vesicular micelle structure physically confines the chelating components to the hydrophilic core region, blocking the non-specific corrosion pathway of the chelating agent on the aluminum ion sites on the glass surface. This micelle structure utilizes its response to interfacial charge density, undergoing directional disintegration and release upon contact with cerium oxide particles with low absolute values ​​of surface zeta potential, achieving targeted removal of contaminants. This addresses the issue that in existing weakly alkaline cleaning technologies, free phosphonate ions preferentially corrode high-alumina glass surfaces. The inherent limitations of bonding in substrate surface energy attenuation in application layers present an objective obstacle. This invention addresses this by constructing a thermodynamically metastable system that strictly controls the component ratios and phase structure, rigorously limiting the mass ratio of the interface modifier to the targeted dispersant. to Within this range, under these mass ratio ranges and laminar shear mixing conditions, the intermolecular forces within the system are dominated by ordered self-assembly behavior; the interface modifier is selected from sodium lauryl iminodipropionate or caprylic / decanoic acid amamidopropyl betaine. These substances are amphoteric surfactants, whose molecular structures simultaneously contain long-chain hydrophobic groups and charged hydrophilic head groups. At a pH value of [missing value], ... to In a weakly alkaline working environment, the interface modifier molecules exhibit specific dipole characteristics. The cationic center, namely the quaternary ammonium nitrogen or imine positively charged center, provides an electrostatic attraction field. The content of the interface modifier in the cleaning agent is... weight % to The targeted dispersant is selected from the alkali metal salt of 1-hydroxyethylidene-1,1-bisphosphonic acid or the alkali metal salt of 2-phosphonobutane-1,2,4-tricarboxylic acid, preferably tetrasodium 1-hydroxyethylidene-1,1-bisphosphonate. This component dissociates in water to release polyvalently negatively charged phosphonate anions. The content of the targeted dispersant in the cleaning agent is... weight % to weight%.

[0028] To construct the aforementioned vesicular micelle structure and shield the active component, this embodiment executes the following deterministic phase control procedure: when the mass ratio of the interface modifier to the targeted dispersant is at... to At a specific window, the cationic head groups of the interface modifier molecule are directionally adsorbed around the anionic groups of the targeted dispersant molecule through electrostatic interactions. Simultaneously, the long-chain alkyl groups of the interface modifier form a dense bilayer or multilayer film wall on the outside through hydrophobic effects. During this process, the targeted dispersant, originally in a freely diffused state, is stereoencapsulated within the hydrophilic core of the micelles, forming a hydrodynamically distributed diameter distribution. nanometer to Nanovesicles, if the mass ratio is lower than Insufficient amount of interface modifier to form a complete coating layer results in some of the targeted dispersant being exposed and attacking the glass substrate; if the mass ratio is higher than Excessively thick micelle walls lead to excessive steric hindrance, hindering their adsorption and disintegration on the contaminant surface. This specific microstructure, while maintaining the chemical potential energy of the cleaning agent, kinetically suppresses its corrosion rate on the glass substrate. Triisopropanolamine is selected as the pH buffer, with a content of [missing information]. weight % to The percentage by weight is %, and triisopropanolamine is chosen based on its excellent buffering capacity under weakly alkaline conditions and the auxiliary masking effect of the amine groups in its molecular structure on aluminum ions. This component is used to stabilize the pH of the cleaning agent system at a certain level. to Within this pH range, this pH range is a necessary environmental condition to ensure that the interface modifier exhibits amphoteric charge characteristics and maintains the surface charge density of the micelle structure; deionized water is used as the carrier, and the conductivity is controlled to be less than or equal to Micro Siemens per centimeter ( (This is used to eliminate the electrostatic interference of impurity ions in water on the micelle self-assembly process.)

[0029] Based on the above components and structure, the preparation method of the cleaning agent of the present invention follows the following standardized operating procedures to ensure the reproducibility of the microscopic phase: Step 1, preparation of the base solution and environmental calibration: Add the prescribed amount of deionized water to a reaction vessel equipped with speed control, turn on mechanical stirring, and set the speed to [missing information]. RPM to At rpm, add the measured amounts of targeted dispersant and pH buffer sequentially to the water, maintaining stirring until the solid particles are completely dissolved and the solution is clear. At this point, use a calibrated pH meter to measure the pH value of the solution to ensure it is within acceptable limits. to Within the preset range, ensuring the targeted dispersant is fully dissociated into anionic form, the second step, critical assembly and shear control, maintains the above stirring speed, using a metering pump at a speed not exceeding... The interface modifier was continuously added dropwise to the substrate at a rate of L / min, with strict control of the dropwise rate to maintain laminar shear and prevent micelle structure defects caused by excessively high local concentrations. The third step involved phase locking and endpoint determination. As the interface modifier was added, the optical state of the reaction system was continuously monitored. The system was considered closed when it changed from a colorless, transparent liquid to exhibiting a characteristic blue opalescence, indicating an enhanced Tyndall effect. The calculated mass ratio of the added interface modifier to the targeted dispersant was precisely within the specified range. to When the vesicular micelle structure is within the specified range, the addition is stopped and stirring continues. minutes to After stabilizing the system for a few minutes, allow it to stand to defoam and filter to obtain the finished cleaning agent.

[0030] The working mechanism of this cleaning agent is based on the differentiated response of micelle structure to the Zeta potential of different substrate surfaces. In actual cleaning operations, when the cleaning agent comes into contact with the TP cover glass substrate, the absolute value of its Zeta potential is usually greater than that of the substrate due to the high negative charge on the glass surface in a weakly alkaline environment. At millivolt levels, the electrostatic repulsion between the outer electric double layer of the micelles and the glass surface, coupled with the steric hindrance effect of the micelle wall layers, prevents the encapsulated targeted dispersant from contacting the aluminum oxide sites on the glass surface. When the cleaning agent collides with residual cerium oxide particles during fluid movement, the low absolute value of the zeta potential on the cerium oxide surface typically... millivolts Between millivolts, and with cerium ions exhibiting extremely strong ligand field attraction to phosphonate ions, the interfacial interaction energy exceeds the electrostatic association energy maintaining the micelle structure, inducing local disintegration of micelles on the particle surface. The high-concentration targeted dispersant released after micelle rupture rapidly complexes cerium ions on the surface of cerium oxide particles, disrupting the bonding force between the particles and the glass, thereby peeling contaminants off the substrate surface. The cleaning agent of this invention is applied in the precision cleaning process of TP cover glass, specifically including: immersing the TP cover glass to be cleaned in an ultrasonic cleaning tank containing the cleaning agent, at a frequency of [frequency missing]. kilohertz (kHz) to Cleaning under the action of kHz ultrasonic waves Instant Seconds; Remove the TP cover glass and rinse with pure water and dry. The cleaning agent is in The kinematic viscosity at 100 degrees Celsius is square millimeters per second ( )to This viscosity range is conducive to the generation of ultrasonic cavitation effect and the penetration and mass transfer of cleaning agent in microstructure.

[0031] Example 1: In the precision cleaning process of high-aluminum cover glass for high-end smartphone OLED display modules, there is a physical constraint between removing strongly adsorbed cerium oxide particles and maintaining the atomic-level integrity of the glass surface. When traditional weakly alkaline cleaning solutions use high-concentration organophosphonates to remove particles, the non-specific dissolution effect of free phosphonate ions on aluminum ions on the glass surface leads to a low root mean square roughness of the surface. Value from the original Nanodegradation to Above the nanometer level, this surface energy decay phenomenon reduces the adhesion and wear resistance of the subsequent anti-fingerprint film layer. In this embodiment, the TP cover glass cleaning agent prepared in the aforementioned specific embodiment is used for the operation. The cleaning agent system locks the mass ratio of sodium lauryl iminodipropionate interface modifier to tetrasodium 1-hydroxyethylidene-1,1-bisphosphonate targeted dispersant at a certain value. At this ratio, the molecular self-assembly behavior within the system constructs a vesicular micelle structure with shielding function. When the cleaning agent comes into contact with a negatively charged high-alumina glass substrate, the double-layer repulsion and steric hindrance effect of the outer layer of the micelle work together to block the direct contact between the phosphonate ions encapsulated in the micelle core and the aluminum sites on the glass surface, thus suppressing the chemical corrosion of the substrate to a trace level.

[0032] When the cleaning agent comes into contact with residual cerium oxide particles, the absolute value of the zeta potential on the cerium oxide surface is lower than that of the glass substrate, and cerium ions have a coordination-inducing ability for phosphonate ions. This interfacial environment triggers the directional disintegration of vesicular micelles. The high concentration of targeted dispersant released by the micelle rupture complexes the cerium ions on the particle surface, destroying their bonding force with the glass substrate and stripping away contaminants. Utilizing the synergistic effect between the interface modifier and the targeted dispersant—that is, the micelle structure constructed by the interface modifier provides a carrier function for the targeted dispersant, and the specific complexing ability of the targeted dispersant drives the responsive disintegration of micelles at a specific interface—the residual cerium oxide particles on the surface of the high-alumina cover glass treated with this cleaning agent are reduced to less than [amount missing] per square centimeter. One, at the same time surface The value remains at Below the nanometer level, the original atomic-level flatness of glass is preserved. By constructing supramolecular assemblies that respond to interfacial charge density, the technical contradiction between detergency and substrate damage in weakly alkaline cleaning is resolved, enabling precise cleaning of sensitive optical substrates.

[0033] Example 2: This example verifies the synergistic effect of the cleaning agent of the present invention in achieving high cleanliness and low substrate damage under weakly alkaline conditions through a systematic gradient control experiment, and demonstrates the engineering rationality of the key numerical ranges in the claims. To ensure the statistical significance and engineering feasibility of the test results, all tests were conducted on a simulated cleaning platform with a high-alumina-silicon cover glass. The glass substrate used in the test was pre-treated with standardized grinding and polishing, and the initial root mean square roughness of the surface was... Controlled Within the nanometer range, and with the artificial introduction of a quantitative amount of cerium oxide particles, the average particle size... Micrometers, as a standard pollutant, have an initial particle density of approximately [missing information]. Units / cm²; Experimental setup and parameter calibration: To verify the effect of the mass ratio of interface modifier to targeted dispersant on cleaning performance and to determine the optimal working window, a gradient experimental scheme was designed, including the sample group of this invention and multiple control groups. The basic formulations of the cleaning agents in each group were kept consistent except for the mass ratio: the triisopropanolamine content was constant. % by weight, adjust the pH of the system to Deionized water has a conductivity of less than The cleaning process parameters are set as follows: cleaning temperature Celsius, ultrasonic frequency kHz, cleaning time Seconds; the test groups and key parameters are shown in Table 1 below. The interface modifier of the present invention, sodium lauryl iminodipropionate, and the targeted dispersant, HEDP-4Na, are set at a mass ratio of [missing information]. Located within the core region defined by the claims; control group A is set as , representing the boundary condition of insufficient interface modifier; control group B was set as , representing the boundary condition of excessive interface modifier; control group C is a single targeted dispersant system without any interface modifier, used to verify the synergistic effect.

[0034] Table 1: Cleaning Agent Composition Ratio and Performance Test Results

[0035]

[0036] Data Phenomenon and Mechanism Analysis: See Table 1. The experimental data exhibit a non-linear pattern. Substrate Protection and Corrosion Inhibition: Data from control group C show that although the particle removal ability is strong, the residue is less than [missing information]. One, but surface roughness Rising sharply to nm, and the amount of aluminum ions dissolved in the detection solution is as high as mg / L, this confirms that in the absence of interfacial modifier protection, free phosphonate ions preferentially react non-specifically with aluminum sites on the glass surface, leading to severe aluminum-depleted corrosion of the substrate. The sample group of this invention maintains extremely low particle residue, less than mg / L. At the same time, The value remains at nm, the aluminum leaching amount is below the detection limit, proving that at a specific mass ratio Below, the interface modifier successfully constructed a dense vesicular micelle structure, physically shielding the highly active targeted dispersant within the core and blocking its contact path with the glass substrate. Data from control group A showed that when the proportion of the interface modifier was too low, a complete coating layer could not be formed, resulting in partial exposure of the dispersant. Value deteriorated to nm, substrate damage was not effectively suppressed; particle removal and targeted release: data from control group B showed that when the proportion of interface modifier was too high, although the substrate was protected, for nm, but the number of residual particles after washing is as high as 100 nm. With more than one particle, the cleaning ability decreases because the excessively thick micelle wall layer creates excessive steric hindrance, making it difficult for the micelles to responsively disintegrate upon contact with cerium oxide particles. This results in the ineffective release and complexation of the targeted dispersant by the micelles. Data from the sample group of this invention, however, shows that... to Within a certain mass ratio range, the micelle structure exists in a delicate thermodynamic metastable state. It can maintain shielding of the substrate during fluid transport, and upon encountering cerium oxide particles with a specific zeta potential, it undergoes targeted explosive disintegration and release induced by interfacial electrostatic attraction, thus achieving a baseline balance between detergency and protective properties. This embodiment objectively verifies the critical value of the specific ratio of interfacial modifier and targeted dispersant in the technical solution of this invention through multi-dimensional comparative experiments. to Only within the specified mixing window can the system form an intelligent micelle structure that combines shielding protection with targeted release.

[0037] Example 3: This example combines Figures 1 to 3 This document describes a TP cover glass cleaning agent and its preparation method, as follows: Figure 1 As shown, in the basic solution preparation stage, the targeted dispersant and pH buffer are dissolved and the pH value is controlled between 9.0 and 10.0. Entering the process control stage, the interface modifier is continuously added dropwise at a rate less than or equal to 5 L / min under laminar shear mixing conditions. This process is controlled by phase locking and endpoint determination mechanisms. The mass ratio of the interface modifier to the targeted dispersant must be strictly limited to the range of 1.5:1 to 2.5:1, and the stability index (Smicelle) must be controlled between 0.6 and 0.9. Based on the concentration of the interface modifier Targeted dispersant concentration and triisopropanolamine concentration Dimensionless empirical parameters were constructed to characterize the molar volume balance between the amphiphilic molecular density of the micelle wall layer and the encapsulated core and buffer medium. Values ​​controlled between 0.6 and 0.9 corresponded to an elastic modulus of the micelle bilayer interfacial film ranging from 10 mN / m to 30 mN / m. Within this range, the micelle wall layer exhibits mechanical rigidity resisting Brownian motion and thermal impact, while retaining flexibility in response to anisotropic deformation at high potential difference interfaces. In engineering preparation, until the system produced a blue opalescence endpoint, the scattering turbidity value of the reaction system stabilized within the range of 15 NTU to 40 NTU. The value was read by an online optical turbidity sensor on the sidewall of the reactor. Maintaining laminar shear mixing conditions was indicated by… The variable frequency motor adjusts the speed to keep the blade tip linear velocity within the range of 0.5 m / s to 3.0 m / s. The fluid dynamic boundary conditions limit the shear stress in the flow field to below the mechanical strength threshold of the vesicular micelle membrane wall, preventing the physical shearing of the high Reynolds number turbulent eddies from destroying the self-assembled structure. This completes the structural verification and realizes the construction of vesicular micelles, forming a bilayer core-shell structure that physically confines the active components. Finally, a homogeneous water-based dispersion system cleaning agent exhibiting the Tyndall effect is obtained. In the application, this product blocks the corrosion of glass Al ions through the steric hindrance shielding effect, and at the same time, it utilizes the Zeta potential response mechanism to directionally disintegrate upon contact with cerium oxide.

[0038] like Figure 2 As shown, this particle size distribution map uses particle size in nanometers (nm) as the abscissa and relative intensity as the ordinate, visually presenting the micelle size differences between the interface modifier and the targeted dispersant at different mass ratios. The dashed line represents the distribution at a mass ratio of 1.0:1, with peaks appearing in the smaller particle size range. The solid line represents the distribution at a mass ratio of 2.0:1, showing a concentrated distribution and the highest relative intensity of a single peak. The dotted line represents the distribution at a mass ratio of 3.5:1, with its distribution range shifting towards larger particle sizes and widening. Figure 3 As shown, the system mainly includes a base liquid preparation module with a built-in premixing tank for targeted dissolution of dispersants. It is connected to a precision speed-regulating reactor, which serves as the core execution environment and has a laminar shear field, through a base environment inlet. The reactor also receives input from an intelligent dripping control module, which is equipped with a precision metering pump to control the flow rate of the interface modifier and form rate feedback. The output of the reactor is connected to an optical state sensing module, which uses turbidity or optical sensors to monitor the Tyndall effect endpoint and feed back the phase state signal. Finally, the reactor outputs the prepared product to the application terminal, namely an ultrasonic cleaning tank for degreasing and removing particles from TP cover glass.

[0039] Example 4: This example provides a systematic structural verification and parameter boundary testing procedure for the vesicular micelle structure and its targeted release mechanism in the cleaning agent of the present invention. Since the formation and disintegration of the micelle structure directly determine the substrate protection and detergency of the cleaning agent, and this microscopic phase is difficult to directly observe through cleaning effect, this example constructs a microstructure characterization system based on dynamic light scattering and transmission electron microscopy to transform the phase control mechanism from theoretical description to visualized engineering facts. Structural verification and phase characterization: To confirm the formation of vesicular micelles at a specific mass ratio, a series of model solutions with different mass ratios of the interface modifier sodium lauryl iminodipropionate and the targeted dispersant HEDP-4Na were prepared. The concentrations of other components remained consistent with the previous examples. Particle size distribution testing: The hydrodynamic diameter of each model solution was measured using a dynamic light scattering instrument. When the mass ratio was within a certain range... to When the range is reached, the autocorrelation function of the scattered light intensity of the solution exhibits a single-peak decay characteristic, and the calculated average hydrated particle size distribution is within the range of... nanometer to Between nanometers, and polydispersity index Below This indicates that the system forms a uniform assembly structure. In contrast, when the mass ratio is lower than [a certain value], [the structure becomes more uniform]. When the detected average particle size is less than Nanometers correspond to single molecules or small molecule clusters; while when the mass ratio is higher than... At that time, the particle size distribution showed multiple peaks, and the average particle size exceeded [a certain value]. Nanoparticles suggest micelle aggregation or structural transformation. Morphological observation: Cryo-transmission electron microscopy was used to observe micelles with a mass ratio of [missing information]. Direct imaging of the preferred sample group revealed in the micrographs a large number of spherical vesicles with hollow structures in the solution, with a wall thickness of approximately [missing information]. to The nanometer size, consistent with the theoretical thickness of the bilayer of amphoteric surfactants, confirms the structural hypothesis that the targeted dispersant is encapsulated within a micelle hydrophilic core.

[0040] Response release mechanism verification: To verify the responsive disintegration of micelles upon contact with cerium oxide particles, the following simulated release experiment was designed, inducing disintegration test: [The experiment involved introducing micelles with a mass ratio of...] A measured amount of high-purity nano-cerium oxide powder was added to a stable micelle solution and stirred to mix. After a few seconds, the supernatant was rapidly centrifuged and subjected to DLS testing. Compared with the initial solution, the intensity of the nano-sized micelle peaks in the supernatant decreased, and small-diameter peaks corresponding to free surfactant micelles appeared, with a particle size of approximately [missing information]. to The nanoscale change confirms that the addition of cerium oxide particles disrupts the original vesicle structure and induces micelle disintegration. Mechanism investigation: As a control, silica powder with the same specific surface area was added to the same batch of micelle solution to simulate the surface of a glass substrate. DLS test results showed that the micelle peak intensity and particle size distribution in the supernatant did not change, indicating that the micelle structure remained stable on the silica surface.

[0041] Example 5: In large-scale industrial cleaning scenarios for high-alumina-silicon cover glass, batch fluctuations in raw materials and changes in ambient temperature and humidity may lead to microscopic phase deviations. To ensure the accurate reconstruction of vesicular micelle structures during continuous operations, this example constructs a pre-deployment calibration procedure based on dual monitoring of critical turbidity point and pH drift rate. This procedure locks the thermodynamic stability and buffering capacity of the cleaning agent within a preset engineering window. The procedure performs a thermodynamic stability boundary scan on the finished cleaning agent. Specifically, a sample of the newly prepared cleaning agent is taken. Milliliters, placed in a transparent container with precise temperature control, to... The temperature is increased by degrees Celsius per minute, while the transmittance of the solution is monitored in real time using a laser transmission meter. When the transmittance suddenly drops, indicating that phase separation has occurred in the system, the turbidity point deviates from the preset standard value. Temperatures exceeding 100 degrees Celsius At 100 degrees Celsius, the system triggers a component fine-tuning procedure, adding trace amounts of interface modifier or deionized water to bring the cloud point back to the standard range. This step ensures the micelle structure operates within the standard temperature range. At a temperature of 100 degrees Celsius, it is at a balance point between thermodynamic metastable and kinetic stable states, preventing substrate corrosion caused by premature micelle demulsification or decreased detergency due to excessive micelle stability.

[0042] In addition, to address pH drift caused by prolonged ultrasonic operation, the procedure includes a dynamic buffer capacity verification step, which involves adding a measured amount of standard acid solution to the cleaning agent. Record the pH decrease per mole per liter of hydrochloric acid. If the acid consumption per unit is lower than the preset buffer threshold, the system prompts for the addition of triisopropanolamine. This calibration mechanism ensures that the cleaning agent can maintain the pH value even when faced with interference from carbon dioxide absorption or acidic dissociation of contaminants in the air. to Within the window, the charge characteristics of the interface modifier and the electrostatic shielding effectiveness of the micelle structure are maintained.

[0043] Example 6: This example provides a set of component compatibility verification and process scaling procedures for the production process of the cleaning agent of the present invention. This procedure is used to transform laboratory-scale formulations into industrial-scale production processes and ensure the consistency of microstructure between different batches of raw materials in scale-up production. Given that the formation of vesicular micelles is highly sensitive to the system's shear history and mixing path, direct linear scale-up may lead to phase structure defects. Therefore, this example sets the following standardized process calibration procedure; this procedure first performs a shear rate sensitivity scan. In the pilot-scale reactor, the range of coverage was adjusted by changing the linear velocity of the stirring blades. meters per second to The effect of different shear intensities on micelle size distribution was investigated at meters per second. The changes in the average particle size and PDI value of the system were monitored in real time using an online particle size analyzer. A shear rate versus particle size distribution response curve was plotted, and the steady-state shear window was determined based on this curve. Within this shear rate range, the average particle size of the micelles fluctuated less than [value missing]. Nanoparticles and PDI maintained at The following section converts the linear velocity corresponding to this steady-state window to that of an industrial-grade reactor, such as... The required stirring speed is the core control parameter for mass production processes.

[0044] Secondly, the feeding sequence and concentration gradient were verified to simulate the phenomenon of localized excessively high concentrations that may occur during mass production. The final phase differences between two feeding methods—instantaneous injection of high concentration and continuous dripping of low concentration—were compared. When the interface modifier was at a concentration lower than... To avoid the formation of irreversible lamellar liquid phases or large aggregates, a step-by-step dropping strategy based on mass flow meter feedback control is adopted. The drop is introduced at a low flow rate in the early stage of the reaction, and the flow rate is gradually increased to a steady state value after the system shows a characteristic blue opalescence.

[0045] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention.

[0046] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.

Claims

1. A TP cover glass cleaner, characterized in that, This cleaning agent is prepared from the following components under mixing conditions that maintain laminar shear: 5.0% to 15.0% by weight of an interface modifier, wherein the interface modifier is selected from sodium lauryl iminodipropionate or caprylate-decanoic acid-amidopropyl betaine. 2.0% to 8.0% by weight of a targeted dispersant, wherein the targeted dispersant is selected from the alkali metal salt of 1-hydroxyethylidene-1,1-diphosphonic acid or the alkali metal salt of 2-phosphonobutane-1,2,4-tricarboxylic acid; 3.0% to 10.0% by weight of triisopropanolamine; The remaining amount is deionized water; wherein the mass ratio of the interface modifier to the targeted dispersant is limited to the range of 1.5:1 to 2.5:1; under this mass ratio range and laminar shear conditions, the cationic centers in the interface modifier molecule structure are directionally adsorbed and three-dimensionally encapsulated by electrostatic guidance, forming vesicular micelle structures with a particle size distribution in the range of 50 nm to 200 nm in the aqueous medium; the vesicular micelle structure has a hydrophilic core region, and the targeted dispersant is physically confined inside the hydrophilic core region, thereby blocking the direct contact path between the targeted dispersant and the aluminum ion sites on the surface of the glass substrate when the cleaning agent comes into contact with the glass substrate.

2. The TP cover glass cleaner according to claim 1, characterized in that, The cleaning agent is obtained through the following preparation steps: under the condition of stirring speed of 300 to 400 rpm, the targeted dispersant and triisopropanolamine are dissolved in deionized water to form a base solution; while maintaining the stirring speed, the interface modifier is continuously added dropwise to the base solution at a rate not exceeding 5 liters per minute until the system produces a blue opalescence. The dripping process of the interface modifier continues until the mass ratio of the interface modifier to the targeted dispersant reaches the range of 1.5:1 to 2.5:1, thereby locking in the thermodynamic metastable state of the vesicular micelle structure.

3. The TP cover glass cleaner according to claim 1, characterized in that, The interface modifier is sodium lauryl iminodipropionate, and the targeted dispersant is tetrasodium 1-hydroxyethylidene-1,1-bisphosphonate, with a mass ratio of interface modifier to targeted dispersant of 1.8:1 to 2.2:

1. Under this ratio, the dynamic light scattering test spectrum of the cleaning agent shows a single-peak distribution and a polydispersity index of less than 0.

2.

4. The TP cover glass cleaner according to claim 1, characterized in that, The content of triisopropanolamine is 5.0% to 8.0% by weight, and the pH value of the cleaning agent is 8.5 to 10.

5. Triisopropanolamine forms a synergistic buffer system with the interface modifier within the pH range, maintaining the stability of the surface charge density of the vesicular micelle structure.

5. The TP cover glass cleaner according to claim 1, characterized in that, The proportions of each component in the cleaning agent meet the following stability index requirements. Relationship: ,in, This refers to the mass percentage concentration of the interface modifier. This refers to the mass percentage concentration of the targeted dispersant. The mass percentage concentration of triisopropanolamine, stability index The value is controlled between 0.6 and 0.

9.

6. The TP cover glass cleaner according to claim 1, characterized in that, The conductivity of deionized water is less than or equal to 1 microsiemens per centimeter; the kinematic viscosity of the cleaning agent at 25 degrees Celsius is 1.2 mm² / s to 2.5 mm² / s, a viscosity range that ensures the cleaning agent can generate cavitation effect in the ultrasonic cleaning tank. The cleaning agent has a stripping characteristic for cerium oxide particles based on the difference in zeta potential. When the cleaning agent contacts cerium oxide particles with a surface zeta potential greater than 10 mV, the vesicular micelle structure is induced to locally disintegrate by interfacial electrostatic attraction, releasing a targeted dispersant to complex cerium ions on the surface of the cerium oxide particles; while when the cleaning agent contacts a glass substrate with a surface zeta potential greater than 50 mV, the vesicular micelle structure remains intact, using the steric hindrance effect to repel the glass substrate.

7. The TP cover glass cleaner according to claim 1, characterized in that, The cleaning agent does not contain any organic solvents or inorganic strong base components other than interface modifiers, targeted dispersants, triisopropanolamine, and deionized water. The inorganic strong base components are limited to ensure that the chemical oxygen demand of the waste liquid after use is at a low level.

8. The TP cover glass cleaner according to claim 1, characterized in that, The interface modifier is caprylic / decanoic acid ammonium betaine, and the targeted dispersant is tetrasodium 2-phosphonobutane-1,2,4-tricarboxylate; under this combination, the cleaning agent retains the Tyndall effect characteristics at an operating temperature of 60 degrees Celsius.

9. The TP cover glass cleaner according to claim 1, characterized in that, The cleaning agent is used in the precision cleaning process of TP cover glass. The process includes: immersing the TP cover glass to be cleaned in an ultrasonic bath containing the cleaning agent, and cleaning it for 30 to 180 seconds under the action of ultrasonic waves with a frequency of 40 kHz to 120 kHz; removing the TP cover glass and rinsing it with pure water.

10. A method for preparing a TP cover glass cleaning agent, characterized in that, The TP cover glass cleaner is prepared by means of the TP cover glass cleaner described in claim 1.

Images