A novel method for preparing AG glass based on nano-island mask

Abstract

This invention relates to the field of glass surface treatment technology and discloses a novel AG glass preparation method based on nano-island masks. The method includes glass substrate pretreatment, PVD coating to form nano-islands, hydrofluoric acid etching, mask removal, and post-treatment. Specifically, it includes the following steps: Step 1: Glass substrate pretreatment: Clean the glass substrate to remove surface grease and contaminants; Step 2: PVD coating to form nano-islands: Place the glass substrate in a vacuum environment and use physical vapor deposition (PVD) to form uniformly distributed nano-islands on the surface of the pretreated glass substrate. The nano-islands have a size of 50-100 nanometers and a spacing of 200-500 nanometers. This novel AG glass preparation method based on nano-island masks uses nano-islands as the mask material, replacing the organic masks or random particle masks used in traditional processes. The nano-islands form a CrF₃ passivation layer in hydrofluoric acid, exhibiting higher corrosion resistance and stability, and ensuring precise control of the etching process.