Dual-frequency grating manufacturing method based on multi-physical field coupling effect and dual-frequency grating

Abstract

This invention discloses a method for manufacturing dual-frequency gratings based on multi-physics coupling effects and the dual-frequency grating itself, belonging to the field of micro-nano manufacturing technology. It solves the problem that existing dual-frequency grating manufacturing methods cannot guarantee the consistency of diffraction efficiency between the two sets of gratings. The method includes: S1, preparing a master template containing two types of groove array structures and subjecting the master template to polarization treatment to obtain a treated master template; S2, coating a photoresist onto a substrate and leveling the treated master template and the substrate; S3, applying mechanical force to the treated master template and heating the substrate to allow the photoresist on the substrate to enter the micro-nano cavity of the treated master template; S4, applying a structured electric field to the treated master template and the substrate to allow the photoresist on the substrate to fill the micro-nano cavity of the treated master template; S5, curing and demolding the imprinted structure formed by the photoresist on the substrate to obtain the dual-frequency grating. This invention is used for the manufacture of dual-frequency gratings.

Description

TECHNICAL FIELD

[0001] The present application relates to a kind of dual-frequency grating manufacturing method and dual-frequency grating based on multi-physical field coupling effect, belong to micro-nano manufacturing technical field. BACKGROUND

[0002] Dual-frequency composite two-dimensional grating is the key component in the field of high-precision machining equipment (such as machine tool, photoetching machine) and high-precision detection equipment (such as profilometer, spectrometer), wherein the manufacturing of high-precision dual-frequency composite two-dimensional grating line structure usually needs extremely precise special equipment, and its manufacturing technology level seriously restricts the development level of high-end equipment in China.

[0003] The main quality indicators of dual-frequency composite two-dimensional grating are usually grating pitch uniformity, grating diffraction efficiency and stray light.For grating sensor, any defect on the grating surface will affect its signal-to-noise ratio, cause signal loss, and seriously affect its sensor accuracy.

[0004] Traditional dual-frequency composite two-dimensional grating manufacturing technology is mainly manufactured by holographic exposure technology, and the characteristics of this method are to use twice holographic exposure method to make photoresist mask, and then use plasma etching to make dual-frequency grating.Usually, holographic exposure is directly used to obtain photoresist mask of dual-frequency grating, and the exposure degree of photoresist has great influence on the shape, groove depth and duty cycle of grating line, and the precision of photoresist mask is limited by the exposure degree of photoresist.When manufacturing dual-frequency grating with large difference in groove depth and duty cycle, it is difficult to use holographic exposure, and it is difficult to ensure the consistency of diffraction efficiency of two groups of gratings in dual-frequency grating, so it is difficult to realize high-precision measurement. SUMMARY

[0005] The present application provides a kind of dual-frequency grating manufacturing method and dual-frequency grating based on multi-physical field coupling effect, which can solve the problem that the existing dual-frequency grating manufacturing method cannot guarantee the consistency of diffraction efficiency of two groups of gratings, thereby leading to the problem that dual-frequency grating is difficult to realize high-precision measurement.

[0006] In one aspect, the present application provides a kind of dual-frequency grating manufacturing method based on multi-physical field coupling effect, and the method comprises: S1, a master plate containing two groove array structures is prepared, and the master plate is subjected to electrode polarization treatment to obtain a treated master plate; S2, resist glue is coated on the substrate, and the treated master plate and the substrate are leveled; S3, mechanical force is applied to the treated master plate, and the substrate is heated, so that the resist glue on the substrate enters the micro-nano cavity of the treated master plate; S4, structured electric field is applied to the treated master plate and the substrate, so that the resist glue on the substrate fills the micro-nano cavity of the treated master plate; S5, curing and demolding the imprinted structure formed by the resist glue on the substrate to obtain the dual-frequency grating.

[0007] Optionally, the resist glue is doped with a low-dimensional material.

[0008] Optionally, the leveling of the processed master and the substrate in S2 specifically comprises: leveling the processed master and the substrate by using a capacitive sensor.

[0009] Optionally, the electrodeposition treatment of the master in S1 to obtain the processed master specifically comprises: sputtering and depositing a conductive layer on the surface of the master; depositing a dielectric layer on the conductive layer to obtain the processed master.

[0010] Optionally, before S2, the method further comprises: hydrophobic treatment of the processed master and the substrate.

[0011] Optionally, S5 specifically comprises: heating and drying or ultraviolet curing the imprinted structure formed by the resist glue on the substrate; applying a polar electric field to the processed master and the substrate to demold the imprinted structure to obtain the dual-frequency grating.

[0012] Optionally, the mechanical force is 1N / cm 2 ~100N / cm 2 , and the application time is 1min~10min.

[0013] Optionally, the voltage of the structured electric field is 50V~5000V, and the application time is 1min~10min.

[0014] Optionally, the low-dimensional material is a quantum dot, silver or graphene.

[0015] In another aspect, the application provides a dual-frequency grating manufactured by any one of the dual-frequency grating manufacturing methods based on the multi-physical field coupling effect. The beneficial effects that can be produced by the application include: The dual-frequency grating manufacturing method based on the multi-physical field coupling effect provided by the application realizes single-time high-precision synchronous replication of two groups of different frequency grating groove structures on the same optical substrate by applying mechanical force and structured electric field, auxiliary heating temperature field synergistic effect, breaking through the technical bottleneck of uneven material filling caused by period and groove difference in traditional process.

[0016] This invention provides a dual-frequency grating manufacturing method based on multi-physics coupling effects. By optimizing material rheological behavior through multi-field coupling effects, it solves the process compatibility problem in the synchronous manufacturing of dual-frequency gratings. Simultaneously, it integrates in-situ monitoring and adaptive displacement compensation technologies to correct deformation errors during the imprinting process in real time, ensuring the consistency of grating surface accuracy and groove contour. Furthermore, it innovates a time-series coupling method between nanoimprinting and magnetron sputtering coating, achieving sub-micron level uniformity control of large-format grating structures. This invention significantly improves the manufacturing accuracy and efficiency of dual-frequency composite gratings, providing key technical support for high-precision grating measurement systems and possessing significant application value in fields such as micro-nano optics and quantum metrology. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the electron beam fabrication master provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of the master plate undergoing polarization treatment according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the leveling of the processed master plate and substrate provided in an embodiment of the present invention; Figure 4 A schematic diagram of the application of mechanical force and structured electric field provided for embodiments of the present invention. Figure 1 ; Figure 5 A schematic diagram of the application of mechanical force and structured electric field provided for embodiments of the present invention. Figure 2 ; Figure 6 This is a schematic diagram of curing and demolding provided in an embodiment of the present invention. Figure label: 10. Master plate; 11. Slot array structure; 12. Micro-nano cavity; 20. Substrate; 21. Resistant adhesive; 22. Dual-frequency grating; 30. Capacitive sensor. Detailed Implementation

[0018] In the following description, specific details such as particular system architectures and techniques are set forth for illustrative purposes and not for limitation, in order to provide a thorough understanding of the embodiments of the invention. However, those skilled in the art will understand that the invention can be implemented in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, apparatuses, circuits, and methods are omitted so as not to obscure the description of the invention with unnecessary detail.

[0019] This invention provides a method for manufacturing a dual-frequency grating based on multi-physics coupling effects, such as... Figures 1 to 6 As shown, the method includes: S1. Prepare a master template 10 containing two types of slot array structures 11, and perform polarization treatment on the master template 10 to obtain the treated master template.

[0020] Specifically, it includes: A master template 10 with different groove array structures 11 was designed and prepared using electron beam lithography. A conductive layer was then sputtered and deposited on the surface of the master template 10. A dielectric layer was then deposited on the conductive layer to obtain the processed master template.

[0021] The slot period of the slot array structure 11 is 300nm~50μm, and the depth is 1um~200μm. The duty cycle accuracy of each group of slot array structures 11 can be controlled to 10%, and the slot depth accuracy can be controlled to 1nm~2nm.

[0022] The conductive layer is a metal conductive layer or an ITO conductive layer with a thickness of about 50 nm, and the dielectric layer is a silicon dioxide or silicon nitride dielectric layer with a thickness of about 100 nm.

[0023] The method further includes: The processed master and substrate 20 are subjected to hydrophobic treatment.

[0024] The hydrophobic material can be fluorosilane or sulfur hexafluoride.

[0025] S2. Apply etching resist 21 to substrate 20 and level the treated master and substrate 20.

[0026] The corrosion inhibitor 21 contains low-dimensional materials. These low-dimensional materials can be quantum dots, silver, or graphene, etc.

[0027] A photoresist 21 is spin-coated onto a substrate 20 (such as quartz, metal, stone, etc.) with a surface shape better than 1 / 5 wavelength and a surface roughness better than 10 nm. The thickness of the photoresist 21 can be 100 nm to 100 μm (the specific value can be determined by the grating periodic groove type, etc.).

[0028] This invention improves grating signal contrast by doping low-dimensional materials into the resist 21, thereby constructing composite material systems with different morphologies (low-dimensional material bulk concentration, low-dimensional material orientation, etc.) at the grating lines and substrate 20. This increases the difference in reflectivity between the grating lines and the substrate 20. For example, the resist 21 may contain 0.1% to 10% quantum dots or other nanomaterials.

[0029] In S2, the processed master plate and substrate 20 are leveled, specifically by using the capacitive sensor 30 to level the processed master plate and substrate 20.

[0030] Capacitive sensors 30 are deployed at multiple locations on the master plate 10 and the substrate 20 for real-time distance measurement. During the adjustment process, combined with the preset target position, the capacitive sensors 30 continuously monitor the distance change between the master plate 10 and the substrate 20 in real time and feed the monitoring results back to the intelligent control system. The control system continuously adjusts the control signal based on the comparison between the feedback data and the target value, forming a closed-loop feedback control loop to ensure the accuracy and stability of the adjustment process, so that the distance and posture of the master plate 10 and the substrate 20 gradually approach the ideal state, realizing intelligent leveling.

[0031] S3. Apply mechanical force to the processed master and heat the substrate 20 so that the resist 21 on the substrate 20 enters the micro-nano cavity 12 of the processed master.

[0032] The mechanical force is 1 N / cm. 2 ~100N / cm 2 The application time is 1 min to 10 min.

[0033] This invention uses a dedicated pressure device to apply a stable and controllable mechanical force to the master plate 10. The magnitude of the force is determined by the properties of the corrosion inhibitor 21 and the size and structure of the micro-nano cavity 12. Under the mechanical force, the corrosion inhibitor 21 gradually enters the micro-nano cavity 12 on the master plate 10. Its flow process is affected by factors such as the viscosity of the adhesive and the surface tension. The pressure and time need to be reasonably controlled to ensure uniform filling without air bubbles.

[0034] S4. Apply a structured electric field to the processed master and substrate 20 so that the resist 21 on the substrate 20 fills the micro-nano cavity 12 of the processed master.

[0035] The voltage of the structured electric field can be 50V to 5000V, and the application time can be 1min to 10min.

[0036] After mechanical filling is completed, a voltage of 50V~5000V is applied to the master plate 10 and the substrate 20. Under the action of the structured conductive layer and dielectric layer, a structured electric field is formed, thereby driving the etching resist 21 to rheologically change and form under the constraint of the master plate 10 and the electric field regulation, and continuing to fill the micro-nano cavity 12 on the master plate 10.

[0037] S5. The imprinted structure formed by the resist 21 on the substrate 20 is cured and demolded to obtain the dual-frequency grating 22.

[0038] Specifically, it includes: The imprinted structure formed by the resist 21 on the substrate 20 is heated and dried or cured under ultraviolet light. A polar electric field is applied to the processed master and substrate 20 to demold the imprinted structure, resulting in a dual-frequency grating 22.

[0039] After the corrosion inhibitor 21 fills the micro-nano cavity 12 on the master plate 10, it is heated and dried (temperature 60℃~190℃) or cured by ultraviolet light (10s~40min). After complete curing, it is demolded. A polar electric field is applied during demolding, and the applied voltage is 0.1V / um~50V / um. The pattern of the dual-frequency grating 22 is obtained by demolding using the principle of repulsion of the same polarity charge.

[0040] The dual-frequency grating 22 consists of two different groove gratings etched on the same substrate 20, with the two groove gratings superimposed on each other on the plane.

[0041] The groove depth and duty cycle of the two sets of gratings in the dual-frequency grating 22 are adjustable. The grating lines are parallel, the included angle of the grating lines is less than 0.005°, and the period can be any value from 0.5μm to 1000μm. The period ratio of the two gratings is within 0.9 to 11.

[0042] The grating groove shape of the dual-frequency grating 22 can be rectangular, triangular, trapezoidal, etc. The duty cycle and height of the grating lines can be precisely controlled, with the duty cycle accuracy controlled within 5% and the groove depth accuracy controlled within 1nm~2nm, thus meeting the accuracy requirements of high-precision measurement for the grating structure.

[0043] Another embodiment of the present invention provides a method for manufacturing a dual-frequency grating based on multi-physics coupling effect, specifically including: 1), reference Figure 1 The master 10 is manufactured by using electron beam lithography to prepare a master 10 with two types of groove array structures 11, namely rectangular grid lines and triangular grid lines.

[0044] 2), reference Figure 2 Electrode polarization treatment of master plate 10: First, a 50nm ITO conductive layer is sputtered and deposited on the surface of master plate 10, then a 100nm silicon dioxide dielectric layer is deposited, and finally the surfaces of master plate 10 and substrate 20 are subjected to fluorine-containing hydrophobic treatment for 1 minute using plasma.

[0045] 3) A 4µm thick photoresist 21 is spin-coated onto a quartz substrate 20 with a surface profile better than 1 / 5 wavelength and a surface roughness better than 10nm; the photoresist 21 is doped with quantum dots.

[0046] 4), reference Figure 3 Dynamic leveling of master plate 10 and substrate 20. A capacitive sensor 30 is added between master plate 10 and substrate 20. The distance between master plate 10 and substrate 20 is adjusted by regulating the capacitance, thereby controlling the orientation of master plate 10 and ensuring the surface shape of the replicated grating.

[0047] 5), reference Figure 4Mechanical force drives the filling. Mechanical force is applied to drive the master plate 10 to act on the substrate 20 coated with photoresist 21. The photoresist 21 flows and fills the micro-nano cavity 12 on the master plate 10. The mechanical force is maintained and pressed continuously for 1 min to 10 min.

[0048] 6), reference Figure 5 The filling is driven by a structured electric field. After mechanical filling is completed, a 100V voltage is applied to the master plate 10 and the substrate 20. Under the action of the structured conductive layer and dielectric layer, a structured electric field is formed, thereby driving the etching resist 21 to rheologically transform and form under the constraint of the master plate 10 and the control of the electric field, and continuing to fill the micro-nano cavity 12 on the master plate 10. The voltage is applied and maintained for 1 min to 10 min.

[0049] 7), reference Figure 6 Curing and demolding: After the corrosion inhibitor 21 fills the micro-nano cavity 12 on the master plate 10, heat and dry (temperature 60℃~190℃) or cure with ultraviolet light (10s~40min); after complete curing, demold to obtain the pattern of two-dimensional composite grating (i.e. dual-frequency grating 22).

[0050] Another embodiment of the present invention provides a dual-frequency grating, wherein the dual-frequency grating 22 is manufactured using any of the dual-frequency grating manufacturing methods based on multi-physics coupling effect described above.

[0051] Compared with the prior art, the beneficial effects achieved by the present invention include: 1. The dual-frequency grating structure of this invention adopts a structure field constraint forming method, which can accurately control the groove structure of each grating. The groove depth control accuracy of each grating can reach 1nm ~ 2nm, ensuring that the diffraction intensity of the two gratings is equal (deviation less than 10%).

[0052] 2. The present invention uses a corrosion inhibitor 21 doped with low-dimensional nanomaterials to fabricate a grating. Composite material systems with different morphologies (low-dimensional material bulk distribution concentration, low-dimensional material orientation, etc.) are constructed at the grating ruler, grating lines and substrate positions respectively to increase the difference between the grating line reflectivity and the substrate reflectivity, thereby improving the grating signal contrast.

[0053] 3. The structure and fabrication method of this invention for dual-frequency gratings are not only applicable to the fabrication of two-dimensional composite structures of dual-frequency gratings, but can also be applied to the fabrication of micro-nano structures of other composite materials.

[0054] The above descriptions are merely a few embodiments of the present invention and are not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any modifications or alterations made by those skilled in the art without departing from the scope of the technical solution of the present invention using the disclosed technical content are equivalent to equivalent implementation cases and fall within the scope of the technical solution.

Claims

1. A method for manufacturing a dual-frequency grating based on multi-physics coupling effect, characterized in that, The method includes: S1. Prepare a master plate containing two types of slot array structures, and perform polarization treatment on the master plate to obtain the treated master plate; S2. Apply a corrosion inhibitor to the substrate and level the treated master and the substrate. S3. Apply mechanical force to the processed master plate and heat the substrate to allow the resist on the substrate to enter the micro-nano cavity of the processed master plate; S4. Apply a structured electric field to the processed master and the substrate to make the resist on the substrate fill the micro-nano cavity of the processed master. S5. The embossed structure formed by the resist adhesive on the substrate is cured and demolded to obtain a dual-frequency grating.

2. The method according to claim 1, characterized in that, The corrosion inhibitor is doped with low-dimensional materials.

3. The method according to claim 1, characterized in that, The leveling of the processed master plate and the substrate in step S2 specifically includes: The processed master plate and the substrate are leveled using a capacitive sensor.

4. The method according to claim 1, characterized in that, The step S1, which involves polarizing the master plate to obtain the processed master plate, specifically includes: A conductive layer is sputtered and deposited on the surface of the master plate. A dielectric layer is deposited on the conductive layer to obtain the processed master template.

5. The method according to claim 1, characterized in that, Prior to S2, the method further includes: The master mold and the substrate are subjected to hydrophobic treatment after the treatment.

6. The method according to claim 1, characterized in that, S5 specifically includes: The imprinted structure formed by the resist on the substrate is heated and dried or cured under ultraviolet light. A polar electric field is applied to the processed master and the substrate to demold the imprinted structure, thereby obtaining a dual-frequency grating.

7. The method according to claim 1, characterized in that, The mechanical force is 1 N / cm. 2 ~100N / cm 2 The application time is 1 min to 10 min.

8. The method according to claim 1, characterized in that, The voltage of the structured electric field is 50V~5000V, and the application time is 1min~10min.

9. The method according to claim 2, characterized in that, The low-dimensional material is quantum dot, silver, or graphene.

10. A dual-frequency grating, characterized in that, The dual-frequency grating is manufactured using the dual-frequency grating manufacturing method based on multi-physics coupling effect as described in any one of claims 1 to 9.

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