Film forming apparatus and deposition equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- WUXI LEADPRO TECH CO LTD
- Filing Date
- 2024-12-31
- Publication Date
- 2026-06-30
AI Technical Summary
In the prior art, when multiple substrates rotate, the airflow field between adjacent substrates is disturbed, resulting in poor airflow uniformity and affecting the uniformity of film formation.
The film-forming device uses a fixed base, with the mounting sections arranged at intervals along a first direction and rotatable. Adjacent mounting sections are separated by partitions, and the air intake assembly is designed in a zoned manner to control the airflow and ensure that each mounting section is in uniform contact with the reaction gas.
This achieves consistent substrate film quality on each mounting section, reduces airflow disturbance, and improves the stability of the airflow field and the uniformity of film formation.
Smart Images

Figure CN122303849A_ABST