A calibration device and method for a two-stage attitude adjustment platform for a white light interferometer

Abstract

This invention belongs to the field of optical precision measurement and calibration technology, specifically disclosing a dual-stage attitude adjustment platform calibration device and method for a white light interferometer. The device includes a base, a first-stage attitude adjustment mechanism, an XY displacement platform, a second-stage attitude adjustment mechanism, an optical calibration reference unit, and an interferometric objective lens. The first-stage attitude adjustment mechanism is used to adjust the overall attitude of the XY displacement platform, and the second-stage attitude adjustment mechanism is used to independently adjust the attitude of the sample under test after the mounting cover is installed, thereby achieving dual-stage independent calibration of the attitude of the moving plane and the attitude of the sample surface. This invention enables independent adjustment of the attitude of the moving plane normal and the attitude of the sample surface normal, reducing the Z-axis scanning stroke of the objective lens along the optical axis during large-area scanning and stitching measurements of the white light interferometer, improving measurement efficiency, and maintaining the overall rigidity and attitude stability of the optical measurement system.

Description

Technical Field

[0001] This invention relates to the field of optical precision measurement and calibration technology, and in particular to a two-stage attitude adjustment platform calibration device and method for white light interferometers. Background Technology

[0002] A white-light interferometer is a high-precision instrument for measuring three-dimensional surface topography based on the principle of optical interference. It is widely used in surface topography inspection in fields such as semiconductors, microelectromechanical systems (MEMS), and ultra-precision machining. Because the single field of view of a white-light interferometer is limited, multi-field scanning and image stitching are typically required when measuring the topography of large areas.

[0003] Existing white-light interferometers typically have an attitude adjustment mechanism above or below the XY displacement platform to ensure that the normal to the sample surface is parallel to the optical axis of the interferometer objective, thus meeting the measurement requirements for a single field of view. However, when the normal to the XY axis motion plane of the displacement platform is not parallel to the optical axis of the interferometer objective, the height variation of the sample surface relative to the optical axis of the interferometer objective increases as the XY displacement platform moves the sample between different positions. This leads to an increase in the Z-axis scanning stroke of the objective along the optical axis, reducing the measurement efficiency of large-area scanning and stitching, and affecting the stability of the stitched measurement.

[0004] For example, Chinese Patent Publication No. CN222848974U discloses a three-dimensional adjustment structure for a white light interferometer. This structure adjusts the attitude of the white light interferometer by setting multiple attitude adjustment components between the XYZ axis motion platform and the interferometer. While this scheme can adjust the attitude of the interferometer objective's optical axis, making the normal of the stage surface parallel to the interferometer objective's optical axis, it cannot simultaneously guarantee that the sample surface normal is parallel to the interferometer objective's optical axis. In actual measurement, the sample often has wedge angles, clamping errors, or warping, causing a deviation between the sample surface normal and the stage surface normal. Furthermore, if the attitude adjustment mechanism is placed on the interferometer probe, it may introduce additional flexible connection links, thus affecting the overall rigidity and attitude stability of the optical measurement system.

[0005] Therefore, in view of the technical problems of existing XY displacement platform motion plane attitude and sample surface attitude being difficult to calibrate independently, low measurement efficiency and easy to affect system stability when large area scanning is stitched, there is an urgent need to develop a two-stage attitude adjustment platform calibration device and method for white light interferometer. Summary of the Invention

[0006] To address the aforementioned technical problems, this invention provides a dual-stage attitude adjustment platform calibration device and method for a white light interferometer, enabling independent adjustment of the normal attitude of the moving plane and the normal attitude of the sample surface under test. This reduces the Z-axis scanning stroke of the objective lens along the optical axis during large-area scanning and stitching measurements of the white light interferometer, improves measurement efficiency, and maintains the overall rigidity and attitude stability of the optical measurement system.

[0007] To achieve the above objectives, the present invention is implemented according to the following technical solution: One objective of this invention is to provide a two-stage attitude adjustment platform calibration device for a white light interferometer, comprising a base; and further comprising: The first-stage attitude adjustment mechanism, which is set on the base, is used to adjust the overall attitude of the XY displacement platform. The XY displacement platform set on the first-stage attitude adjustment mechanism is used to adjust the displacement of the first-stage attitude adjustment mechanism along the X-axis and Y-axis directions. The second-stage attitude adjustment mechanism is provided on the XY displacement platform. The second-stage attitude adjustment mechanism has a through hole at its center, and a light path conduction area is formed in the through hole for the optical path of the interference lens to pass through. The top of the second-stage attitude adjustment mechanism is provided with a detachable object carrier cover plate. The upper surface of the object carrier cover plate is used to install the sample to be tested. The second-stage attitude adjustment mechanism is used to independently adjust the attitude of the sample to be tested after the object carrier cover plate is installed. An optical calibration reference unit is set on the XY displacement platform. The optical calibration reference unit is located in the hollow structure of the second-stage attitude adjustment mechanism. The standard reflective surface of the optical calibration reference unit serves as the observation reference surface when calibrating the attitude of the XY displacement platform. An interference objective lens is fixedly positioned above the second-stage attitude adjustment mechanism, with the normal of the standard reflective surface of the optical calibration reference unit parallel to the optical axis of the interference objective lens; this is used to calibrate the attitude of the motion plane of the XY displacement platform and the attitude of the surface of the sample under test.

[0008] Furthermore, the second-stage attitude adjustment mechanism includes: The base of the second attitude adjustment mechanism, fixed on the XY displacement platform, has a through hole in the center. The upper support plate of the second attitude adjustment mechanism, which is located above the base of the second attitude adjustment mechanism, has a through hole in the center. An adjustment support assembly connected between the base of the second attitude adjustment mechanism and the upper support plate of the second attitude adjustment mechanism is used to adjust the tilt attitude of the upper support plate of the second attitude adjustment mechanism relative to the base of the second attitude adjustment mechanism. The cargo cover plate is detachably installed above the through hole in the center of the support plate of the second attitude adjustment mechanism.

[0009] Furthermore, the second-stage attitude adjustment mechanism also includes a quick-locking component for detachably locking the cargo cover to the upper support plate of the second attitude adjustment mechanism.

[0010] Furthermore, the adjustment support assembly includes a plurality of spherical hinges connecting the base of the second attitude adjustment mechanism and the upper support plate of the second attitude adjustment mechanism, and an adjustment roller 320 is threadedly connected to the spherical hinge.

[0011] Furthermore, the first-stage attitude adjustment mechanism is an electric tilting stage.

[0012] Furthermore, the quick-locking assembly includes a quick-locking device base mounted on a support plate of the second attitude adjustment mechanism, and a quick-locking device lock head mounted on the loading cover plate that matches the quick-locking device base.

[0013] Furthermore, the optical calibration reference unit is a high-flatness optical planar flat crystal, and the optical calibration reference unit is embedded on the top surface of the XY displacement platform.

[0014] The second objective of this invention is to provide a method for calibrating a two-stage attitude adjustment platform using the aforementioned two-stage attitude adjustment platform calibration device for a white light interferometer, comprising the following steps: S100. Remove the object cover plate so that the optical calibration reference unit set on the XY displacement platform is within the optical path range of the interference lens. S200. Adjust the first-stage attitude adjustment mechanism so that the normal of the standard reflective surface of the optical calibration reference unit is parallel to the optical axis of the interference lens. S300. Install the sample carrier cover plate, place the sample to be tested on the sample carrier cover plate, and ensure that the sample to be tested is within the optical path range of the interference lens. S400, Adjust the second-stage attitude adjustment mechanism to make the surface normal of the sample to be tested parallel to the optical axis of the interference lens.

[0015] Compared with the prior art, the present invention has the following beneficial effects: 1. Achieve dual-stage independent calibration: By setting up a first-stage attitude adjustment mechanism and a second-stage attitude adjustment mechanism, the motion plane attitude of the XY displacement platform and the surface attitude of the sample under test are independently adjusted and calibrated, which solves the problem of the difficulty in decoupling the two in the existing technology.

[0016] 2. Improve measurement efficiency and stability: First, calibrate the XY displacement platform so that the normal of its motion plane is parallel to the optical axis. Then, independently calibrate the sample posture on this basis. This effectively reduces the cumulative height change along the displacement direction caused by the platform posture deviation during large-area scanning and stitching, thereby reducing the Z-axis scanning stroke of the objective lens along the optical axis and improving the efficiency of interference signal acquisition and stitching measurement.

[0017] 3. Maintaining the rigidity of the optical system: The probe end where the interference objective is located remains fixed and only scans along the optical axis. There is no need to set an additional attitude adjustment mechanism on the probe, which avoids the introduction of flexible links and helps to maintain the overall rigidity and long-term attitude stability of the optical measurement system.

[0018] 4. Compact structure and easy operation: The second-stage attitude adjustment mechanism adopts a hollow structure design, which provides space for optical path calibration. At the same time, with the quick locking component, it realizes the quick disassembly and assembly of the load cover, simplifying the calibration process. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structure of the two-stage attitude adjustment platform calibration device for a white light interferometer according to the present invention. Figure 2 This is a schematic diagram of the structure after removing the loading cover plate in this invention; Figure 3 This is a schematic diagram of the structure after removing the second-stage attitude adjustment mechanism and the optical calibration reference unit in this invention; Figure 4 This is a flowchart of a two-stage attitude adjustment platform calibration method for a white light interferometer according to the present invention; In the figure, the following labels are used: 100, interference objective lens; 200, sample to be tested; 300, second-stage attitude adjustment mechanism; 310, loading cover plate; 320, adjusting roller; 330, quick-locking device lock head; 340, quick-locking device base; 350, upper support plate of the second attitude adjustment mechanism; 360, base of the second attitude adjustment mechanism; 400, XY displacement platform; 410, optical plane flat crystal; 420, optical plane flat crystal groove; 500, first-stage attitude adjustment mechanism; 600, base. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to embodiments. The specific embodiments described herein are for illustrative purposes only and are not intended to limit the invention.

[0021] In the following embodiments, for ease of description, the coordinate relationship of the device is established as follows: the optical path direction of the interference objective 100 is taken as the Z-axis direction, and the two mutually orthogonal motion directions of the XY displacement platform 400 are defined as the X-axis direction and the Y-axis direction, respectively. For details, please refer to [link to relevant documentation]. Figures 1-3 The XYZ coordinate system is used in the specification. The descriptions of "parallel" and "perpendicular" in the specification are based on the above directional relationships. These directional relationships are only used to describe the technical solution of the present invention and do not constitute a limitation on the installation orientation of the present invention.

[0022] Example 1: As Figures 1-3 As shown in the figure, this embodiment exemplarily illustrates a two-stage attitude adjustment platform calibration device for a white light interferometer, including a base 600; and further including: The first-stage attitude adjustment mechanism 500, which is disposed on the base 600, is used to adjust the overall attitude of the XY displacement platform 400. The XY displacement platform 400, which is set on the first-stage attitude adjustment mechanism 500, is used to adjust the displacement of the first-stage attitude adjustment mechanism 500 along the X-axis and Y-axis directions. A second-stage attitude adjustment mechanism 300 is provided on the XY displacement platform 400. The second-stage attitude adjustment mechanism 300 has a square through hole at its center (of course, it can also be set to other shapes). The square through hole forms an optical path conduction area for the interference lens to pass through. The top of the second-stage attitude adjustment mechanism 300 is provided with a detachable object carrier cover plate 310. The upper end surface of the object carrier cover plate 310 is used to install the sample to be tested 200. The second-stage attitude adjustment mechanism 300 is used to independently adjust the attitude of the sample to be tested 200 after the object carrier cover plate 310 is installed. An optical calibration reference unit is set on the XY displacement platform 400. The optical calibration reference unit is located in the hollow structure of the second-stage attitude adjustment mechanism. The standard reflective surface of the optical calibration reference unit serves as the observation reference surface when calibrating the attitude of the XY displacement platform 400. The interference objective 100 is fixedly positioned above the second-stage attitude adjustment mechanism 300, with the normal of the standard reflective surface of the optical calibration reference unit parallel to the optical axis of the interference objective 100; this is used to calibrate the motion plane attitude of the XY displacement platform 400 and the surface attitude of the sample 200 under test.

[0023] The base 600 is used to support the entire device and can be fixedly connected to the white light interferometer frame, vibration isolation platform or other mounting base to provide a stable mounting reference.

[0024] The first-stage attitude adjustment mechanism 500 is disposed between the base 600 and the XY displacement platform 400, and is used to adjust the overall attitude of the XY displacement platform 400 so that the normal of its motion plane is parallel to the optical axis of the interference objective lens 100. Exemplarily, the first-stage attitude adjustment mechanism 500 can be an electric tilting stage (commercially available), or a manual dual-axis tilting mechanism, or other structural forms capable of fine adjustment around two mutually orthogonal axes; this embodiment does not limit this approach.

[0025] The XY displacement platform 400 is mounted on the first-stage attitude adjustment mechanism 500 and provides scanning displacement along the X-axis and Y-axis directions to drive the sample 200 under test to perform multi-position scanning, thereby achieving large-area stitched measurement. For example, the XY displacement platform 400 can be constructed by stacking a lower slide table that moves along a first direction and an upper slide table that moves along a second direction, with the first and second directions being orthogonal to each other. The XY displacement platform can be commercially available.

[0026] like Figure 1 and Figure 2 As shown, the second-stage attitude adjustment mechanism 300 is mounted on the XY displacement platform 400 and is used to independently adjust the attitude of the sample 200 to be tested after the attitude calibration of the XY displacement platform 400 is completed. The second-stage attitude adjustment mechanism 300 includes a detachable loading cover plate 310, a quick-locking device lock head 330, a quick-locking device base 340, an upper support plate 350 of the second attitude adjustment mechanism, a base 360 ​​of the second attitude adjustment mechanism, and an adjustment support assembly disposed between the upper support plate 350 and the base 360 ​​of the second attitude adjustment mechanism. The adjustment support assembly includes multiple spherical hinges connected between the base of the second attitude adjustment mechanism and the upper support plate of the second attitude adjustment mechanism. Adjustment rollers 320 are threaded onto the spherical hinges. The spherical hinges and preload springs are not shown in the attached drawings (the spherical hinges with adjustment rollers and preload springs can be purchased commercially).

[0027] The second attitude adjustment mechanism base 360 ​​is connected to the top surface of the XY displacement platform 400. For example, as shown... Figure 2 As shown, the upper support plate 350 of the second attitude adjustment mechanism is supported above the base 360 ​​of the second attitude adjustment mechanism via a spherical hinge and two adjusting rollers 320. The spherical hinge and the two adjusting rollers 320 together form the support and adjustment structure of the upper support plate 350 of the second attitude adjustment mechanism. A preload spring (not shown in the figure) is also provided between the upper support plate 350 and the base 360 ​​of the second attitude adjustment mechanism to ensure that the upper support plate 350 continuously presses against the spherical hinge and the adjusting rollers 320, thereby ensuring the fit and stability of the support structure.

[0028] The object carrier cover 310 can be removed and installed on the support plate 350 of the second attitude adjustment mechanism. When the object carrier cover 310 is removed, the optical path of the interferometer objective 100 can pass through the optical path conduction area to observe the optical calibration reference unit set on the XY displacement platform 400; when the object carrier cover 310 is installed on the second-stage attitude adjustment mechanism 300 and carries the sample 200 to be tested, the sample 200 to be tested is within the optical path range of the interferometer objective 100, and further sample attitude adjustment and measurement can be performed.

[0029] like Figure 1 and Figure 2 As shown, two adjusting rollers 320 are spaced apart at the edge of the second-stage attitude adjustment mechanism 300, used to adjust the local support height of the upper support plate 350 of the second attitude adjustment mechanism relative to the base 360 ​​of the second attitude adjustment mechanism. By adjusting the two adjusting rollers 320 respectively, the upper support plate 350 of the second attitude adjustment mechanism can be tilted slightly relative to the base 360 ​​of the second attitude adjustment mechanism, which will cause the detachable loading cover plate 310 and the sample 200 under test to change their tilt angle in two mutually orthogonal directions. Thus, without changing the attitude of the XY displacement platform 400, the surface normal of the sample 200 under test relative to the optical axis of the interference lens 100 can be independently adjusted and calibrated.

[0030] like Figure 1 and Figure 2 As shown, the second-stage attitude adjustment mechanism 300 is also equipped with a quick-locking assembly for quick assembly, disassembly, and locking between the detachable cargo cover 310 and the second-stage attitude adjustment mechanism 300. The quick-locking assembly includes a quick-locking device lock head 330 and a quick-locking device base 340. The quick-locking device base 340 is used for installation and support, and for supporting and transmitting the locking force. The quick-locking device lock head 330 cooperates with the quick-locking device base 340 to quickly fix the detachable cargo cover 310 onto the upper support plate 350 of the second attitude adjustment mechanism in the locked state, thereby achieving quick disassembly and installation of the detachable cargo cover 310 and ensuring connection stability and repeatability accuracy after locking. For example, the quick-locking device lock head 330 can be a knob type, which is a common structure in the art and can be directly purchased commercially.

[0031] like Figure 2 and Figure 3As shown, an optical calibration reference unit is provided on the XY displacement platform 400. In this embodiment, the optical calibration reference unit is an optical planar flat crystal 410 with high flatness. The optical planar flat crystal 410 is embedded in an optical planar flat crystal groove 420 on the top surface of the XY displacement platform 400. The optical planar flat crystal groove 420 is used to accommodate and position the optical planar flat crystal 410 to improve the stability of the installation position of the optical planar flat crystal 410 and the repeatability of the calibration process. The standard reflecting surface of the optical planar flat crystal 410 serves as the observation reference surface during the attitude calibration of the XY displacement platform 400, and is used to establish the geometric relationship between its normal and the optical axis of the interference lens 100.

[0032] Furthermore, the optical planar flat 410 is at least partially located within the corresponding optical path conduction area of ​​the square through-hole in the second-stage attitude adjustment mechanism 300. Thus, when the object cover 310 is removed, the optical path of the interference lens 100 can directly pass through the square through-hole of the second-stage attitude adjustment mechanism 300 to reach the optical planar flat 410 for attitude calibration of the XY displacement platform; when the object cover 310 is installed and locked, the sample 200 is in the measurement position, and the attitude of the sample 200 can be independently fine-tuned by adjusting the roller 320.

[0033] In this embodiment, the interferometer objective 100 maintains a fixed mounting posture during the measurement process, without any additional posture adjustment mechanism at the interferometer probe end. By arranging the posture adjustment function on the platform side, it is possible to avoid superimposing additional rotating joints, locking interfaces, or flexible connection links at the interferometer probe end, which is beneficial to maintaining the overall rigidity and posture stability of the optical measurement system.

[0034] Meanwhile, this invention uses the optical axis direction of the interferometer objective 100 as a unified reference. First, the orientation of the XY displacement platform 400 is calibrated using the optical plane flat 410. Then, without changing the calibration state of the XY displacement platform 400, the orientation of the sample 200 under test is adjusted through the second-stage orientation adjustment mechanism 300. This reduces the height variation of the sample surface along the optical axis direction caused by the non-parallelism between the normal of the moving plane and the optical axis of the interferometer objective 100 during large-area scanning and stitching measurements, thereby reducing the Z-axis scanning stroke of the objective along the optical axis direction and improving measurement efficiency and stitching measurement stability.

[0035] Example 2: Figures 1-4 As shown, this embodiment, based on the aforementioned two-stage attitude adjustment platform calibration device for white light interferometers, exemplarily demonstrates a two-stage attitude adjustment platform calibration method for white light interferometers, including the following steps: S100: Remove the object cover plate 310 so that the optical calibration reference unit is within the optical path range of the interference lens 100.

[0036] Specifically, by releasing the locking engagement between the quick-locking device lock head 330 and the quick-locking device base 340, the loading cover 310 is removed, so that the hollow structure of the second-stage attitude adjustment mechanism 300 forms an optical path conduction area, and the optical path of the interference lens 100 can pass through this optical path conduction area and illuminate the reflective surface of the optical plane flat crystal 410.

[0037] S200, Adjust the first-stage attitude adjustment mechanism 500 so that the normal of the standard reflective surface of the optical calibration reference unit is parallel to the optical axis of the interference lens 100.

[0038] Specifically, under the condition that the interferometer 100 can observe the optical plane flat 410, the first-stage attitude adjustment mechanism 500 is adjusted so that the normal of the standard reflection surface of the optical plane flat 410 is parallel to the optical axis of the interferometer 100, thereby completing the calibration of the attitude of the corresponding motion plane of the XY displacement platform 400.

[0039] S300, Install the object carrier cover plate 310 and place the sample to be tested 200 on the detachable object carrier cover plate 310 so that the sample to be tested 200 is within the optical path range of the interference lens 100.

[0040] Specifically, the sample cover 310 is installed and locked to the quick-locking device base 340 via the quick-locking device lock head 330, and then the sample to be tested 200 is placed on the detachable sample cover 310 so that the sample to be tested 200 is located in the measurable position of the interference objective lens 100.

[0041] S400, Adjust the second-stage attitude adjustment mechanism 300 so that the surface normal of the sample 200 to be tested is parallel to the optical axis of the interference lens 100.

[0042] Specifically, by adjusting the roller 320, the cover plate 310 is tilted slightly until the surface normal of the sample 200 is parallel to the optical axis of the interference lens 100, thereby completing the adjustment and calibration of the attitude of the sample 200.

[0043] Using the above method, this embodiment uses the optical axis direction of the interferometer objective 100 as a unified reference. First, the orientation of the XY displacement platform 400 is calibrated using the optical plane flat 410. Then, without changing the calibration state of the XY displacement platform 400, the orientation of the sample 200 under test is independently adjusted by the second-stage orientation adjustment mechanism 300, thereby achieving independent calibration of the motion plane normal and the sample surface normal relative to the optical axis of the interferometer objective 100. Compared to existing methods that adjust the orientation of the interferometer probe, this invention maintains a stable orientation at the probe end where the interferometer objective 100 is located, performing scanning motion only along the optical axis direction. This is beneficial for maintaining the overall rigidity and long-term stability of the optical measurement system. Simultaneously, it reduces the cumulative height change along the displacement direction caused by platform orientation deviation during large-area scanning and stitching, reduces the Z-axis scanning stroke of the objective along the optical axis direction, and improves the efficiency of interferometric signal acquisition and stitching measurement.

[0044] The technical solutions of the present invention are not limited to the specific embodiments described above. Any technical modifications made in accordance with the technical solutions of the present invention fall within the protection scope of the present invention.

Claims

1. A two-stage attitude adjustment platform calibration device for a white light interferometer, comprising a base; characterized in that, Also includes: The first-stage attitude adjustment mechanism, which is set on the base, is used to adjust the overall attitude of the XY displacement platform. The XY displacement platform set on the first-stage attitude adjustment mechanism is used to adjust the displacement of the first-stage attitude adjustment mechanism along the X-axis and Y-axis directions. The second-stage attitude adjustment mechanism is provided on the XY displacement platform. The second-stage attitude adjustment mechanism has a through hole at its center, and a light path conduction area is formed in the through hole for the optical path of the interference lens to pass through. The top of the second-stage attitude adjustment mechanism is provided with a detachable object carrier cover plate. The upper surface of the object carrier cover plate is used to install the sample to be tested. The second-stage attitude adjustment mechanism is used to independently adjust the attitude of the sample to be tested after the object carrier cover plate is installed. An optical calibration reference unit is set on the XY displacement platform. The optical calibration reference unit is located in the hollow structure of the second-stage attitude adjustment mechanism. The standard reflective surface of the optical calibration reference unit serves as the observation reference surface when calibrating the attitude of the XY displacement platform. An interference objective lens is fixedly positioned above the second-stage attitude adjustment mechanism, with the normal of the standard reflective surface of the optical calibration reference unit parallel to the optical axis of the interference objective lens; this is used to calibrate the attitude of the motion plane of the XY displacement platform and the attitude of the surface of the sample under test.

2. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 1, characterized in that: The second-stage attitude adjustment mechanism includes: The base of the second attitude adjustment mechanism, fixed on the XY displacement platform, has a through hole in the center. The upper support plate of the second attitude adjustment mechanism, which is located above the base of the second attitude adjustment mechanism, has a through hole in the center. An adjustment support assembly connected between the base of the second attitude adjustment mechanism and the upper support plate of the second attitude adjustment mechanism is used to adjust the tilt attitude of the upper support plate of the second attitude adjustment mechanism relative to the base of the second attitude adjustment mechanism. The cargo cover plate is detachably installed above the through hole in the center of the support plate of the second attitude adjustment mechanism.

3. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 2, characterized in that: The second-stage attitude adjustment mechanism also includes a quick-locking component for detachably locking the cargo cover to the support plate of the second attitude adjustment mechanism.

4. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 2, characterized in that: The adjustment support assembly includes multiple spherical hinges connecting the base of the second attitude adjustment mechanism and the upper support plate of the second attitude adjustment mechanism, with adjustment rollers threaded onto the spherical hinges.

5. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 1, characterized in that: The first-stage attitude adjustment mechanism is an electric tilting stage.

6. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 3, characterized in that: The quick-locking assembly includes a quick-locking device base mounted on a support plate of the second attitude adjustment mechanism, and a quick-locking device lock head mounted on the loading cover plate that matches the quick-locking device base 340.

7. The calibration device for a two-stage attitude adjustment platform for a white light interferometer according to claim 1, characterized in that: The optical calibration reference unit is a high-flatness optical planar flat crystal, and the optical calibration reference unit is embedded on the top surface of the XY displacement platform.

8. A method for calibrating a two-stage attitude adjustment platform using the two-stage attitude adjustment platform calibration device for a white light interferometer as described in any one of claims 1-7, characterized in that, Includes the following steps: S100. Remove the object cover plate so that the optical calibration reference unit set on the XY displacement platform is within the optical path range of the interference lens. S200. Adjust the first-stage attitude adjustment mechanism so that the normal of the standard reflective surface of the optical calibration reference unit is parallel to the optical axis of the interference lens. S300. Install the sample carrier cover plate, place the sample to be tested on the sample carrier cover plate, and ensure that the sample to be tested is within the optical path range of the interference lens. S400, Adjust the second-stage attitude adjustment mechanism to make the surface normal of the sample to be tested parallel to the optical axis of the interference lens.

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