Uniform polishing process and equipment for large-size optical flat plate
By pre-correcting the polishing pad, controlling the zoned pressure, and polishing with a composite motion trajectory, the problem of poor surface uniformity of large-diameter optical flats was solved, achieving high-precision, uniform, and consistent optical flat processing and improving the yield rate.
Patent Information
- Application Number
- CN202610748014.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-28
- Publication Date
- 2026-07-10
AI Technical Summary
In existing large-aperture optical flat plate polishing processes, uneven wear of the polishing pad and uneven distribution of the polishing fluid lead to inconsistent material removal rates on the optical flat plate surface and poor surface shape consistency, which cannot meet the high performance requirements of military, scientific research, and high-end imaging equipment.
By pre-correcting the polishing pad, controlling the pressure in the center and edge areas, supplying polishing fluid with a multi-point uniform spray method, and moving the polishing disk with a composite motion trajectory, the polishing parameters are dynamically adjusted in conjunction with real-time surface shape error to achieve uniform polishing of the optical flat plate.
It improves the surface accuracy and uniformity of large-size optical flat panels, reduces edge collapse depth, and significantly improves the consistency and yield of mass production, meeting the needs of high-precision industrial and military equipment.