Topdressing-free fertilizing method capable of increasing wheat yield
By using a three-layer compound fertilizer and dynamic adjustment technology, the problems of weather-dependent timing of topdressing and low nitrogen fertilizer utilization in wheat fertilization have been solved. This has enabled the matching of nitrogen supply throughout the entire growth period of wheat, improving yield and quality, and reducing production costs and environmental pollution.
Patent Information
- Application Number
- CN202610656320.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-13
- Publication Date
- 2026-07-17
AI Technical Summary
Existing wheat fertilization methods suffer from weather-dependent timing of topdressing, short operating windows, high production costs, low nitrogen fertilizer utilization, and difficulty in meeting nitrogen requirements throughout the entire growth cycle, thus affecting yield and quality.
This compound fertilizer uses a three-layer structure: the inner layer contains fast-acting nitrogen fertilizer and inhibitors, the middle layer contains slow-release nitrogen fertilizer and enzyme activators, and the outer layer contains controlled-release nitrogen fertilizer and sugar synergists. Through a functional spatiotemporal coupling structure, it achieves matching of nitrogen release with the nitrogen requirements of wheat during its growth period. Combined with dynamic adjustment of inhibitor dosage, it achieves one-time basal application without the need for topdressing throughout the entire growth period.
It significantly extends the fertilizer's effective period, improves nitrogen fertilizer utilization, increases yield and quality, reduces labor costs, minimizes ammonia volatilization losses, and improves environmental benefits.