Improved method and system for measuring high precision surface reconstruction with discontinuous interfaces
By combining phase shift, radial basis function, and global least squares stitching method with residual-driven iterative optimization strategy, the error problem in the reconstruction of discontinuous interface surfaces is solved, and high-precision surface reconstruction effect is achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU RUIFEI PHOTOELECTRIC TECH CO LTD
- Filing Date
- 2026-04-07
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies suffer from large surface reconstruction errors or failures when dealing with discontinuous interfaces in semiconductor packaging, especially when using least squares solutions, which cannot achieve high-precision reconstruction.
The phase value of the wrapping of discontinuous interfaces is obtained by phase shifting, the continuous phase gradient is recovered by radial basis function, the mapping relationship between gradient and phase is constructed, the discontinuity between local sub-faces is minimized by global least squares stitching method, and the surface is reconstructed by residual-driven iterative optimization strategy.
It achieves high-precision reconstruction of discontinuous interface surfaces, effectively suppresses error propagation, and improves reconstruction accuracy, especially in the presence of noise and mesh distortion.
Smart Images

Figure CN122415702A_ABST