Metallic microparticle synergistic inhibition structure for DC GIL
By combining particle trapping and dielectric film technology in the GIL, the movement of metal particles is captured and suppressed, thus solving the risk of metal particles moving to the vicinity of the insulator in the GIL and improving operational stability and safety.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-30
- Publication Date
- 2026-07-17
AI Technical Summary
In gas-insulated metal-enclosed transmission lines (GILs), free metal particles may move around the insulators under the influence of electric field force and gravity, increasing the risk of short circuits and long-term operational instability.
A metal particle synergistic suppression structure is adopted, which combines particle trap and dielectric film technology. After the particle trap captures the metal particles, the electric field distribution is changed by the dielectric film to suppress their movement. The dielectric film is located below the particle trap to increase the jumping voltage.
It effectively suppresses the movement of metal particles to the vicinity of the insulator, improves the long-term operational stability of GIL, and avoids the risk of short circuit.
Smart Images
Figure CN122417508A_ABST