Copper structure with two-step structure and method for manufacturing the same

By fabricating bosses on copper foil and setting dry film protection areas, combined with controlled-depth etching to form recessed grooves, the corrosion problem at the root of the bosses was solved, improving the bonding strength between the bosses and the substrate, as well as the structural integrity and yield of the product.

CN122421218APending Publication Date: 2026-07-17TAISHAN JINGCHENGDA CIRCUIT TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TAISHAN JINGCHENGDA CIRCUIT TECH CO LTD
Filing Date
2026-04-10
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In the existing technology for manufacturing copper structural parts with bosses and recesses, the root of the boss is easily corroded, which leads to a decrease in connection strength and dimensional deviation from design tolerances, affecting the structural integrity and yield of the product.

Method used

A boss is prepared on a copper foil and a completely covered dry film protection area is set. A recessed groove is formed by controlled-depth etching to form a copper structural component with a two-stage step structure. The dry film protection area is used to tightly wrap the root of the boss without gaps to avoid the risk of side etching.

Benefits of technology

This improves the bonding strength between the boss and the copper foil substrate, ensures that the root of the boss is not corroded, enhances the structural integrity and processing yield of the product, and achieves precise positional consistency between the boss and the recessed groove.

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Abstract

本发明公开了一种具有二级台阶结构的铜质结构件及其制备方法。所述制备方法包括:获取铜箔,并在所述铜箔的表面形成凸台;在所述铜箔具有凸台的表面制备干膜保护区域,以得到半成品;其中,所述干膜保护区域包括完全包覆所述凸台的第一保护区域,所述凸台在所述铜箔上的正投影位于所述第一保护区域在所述铜箔上的正投影内;对所述半成品进行控深蚀刻以形成凹陷槽,并进行外形冲切以得到具有二级台阶结构的铜质结构件。在本发明中,由于可以通过干膜保护区域对凸台根部形成紧密包裹,可以有效解决凸台根部在深蚀刻过程中的侧蚀风险,提高凸台与铜箔基材的结合强度。
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