Charged particle optical module, charged particle optical device, and method using a charged particle device

By using charged particle optical modules, multiple sub-beams are formed and manipulated, solving the problems of pattern defects and beam loss in semiconductor chip manufacturing, and improving evaluation efficiency and yield.

CN122422973APending Publication Date: 2026-07-17ASML NETHERLANDS BV
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Patent Information

Application Number
CN202480080076.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2023-12-18
Filing Date
2024-11-27
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing charged particle beam devices are prone to unwanted pattern defects during semiconductor chip manufacturing, leading to reduced yield. Furthermore, existing multi-beam evaluation devices are inadequate in controlling beam loss.

Method used

The system employs charged particle optical modules, including an electron source, beam limiter, condenser lens array, and macro-correction system, to reduce beam loss by forming and manipulating multiple sub-beams.

Benefits of technology

It improves the efficiency and yield of pattern evaluation in the semiconductor chip manufacturing process, reduces unwanted beam loss, and enhances high-throughput detection capabilities.

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Abstract

一种用于从电子的源束202生成多个子束211‑213的带电粒子光学模块，该模块用于在带电粒子光学器件中使用，用于朝向样品投射多个子束211‑213。带电粒子模块包括：电子源201，包括被配置为沿发散路径发射源束202的发射器63；束限制器236，限定孔径阵列232并且被定位在发散路径中从而从源束形成子束的网格；聚光透镜231，被配置为对子束进行操作；以及宏校正器系统60，被配置为作用于子束。该宏校正器系统至少部分地被包括在束限制器与聚光透镜阵列之间。
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Citation Information

Patent Citations

  • Apparatus for generating a plurality of beamlets

    EP1602121A2

  • Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams

    EP2702595A1

  • Charged particle multi-beamlet apparatus

    EP2715768A2

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    US20100276606A1

  • Charged particle system, method of processing a sample using a multi-beam of charged particles

    WO2022128392A1