A multifunctional micro-nano manipulation system

Abstract

The multifunctional micro-nano manipulation system comprises a first position fine adjustment device, a second position fine adjustment device, a vertical microscope device, a horizontal microscope device and a computer; the first position fine adjustment device is used for adjusting the position of the objective table; the second position fine adjustment device is used for adjusting the position of the slide; the vertical microscope device is located above the objective table and is used for acquiring image information in a first to-be-imaged area; the horizontal microscope device is used for acquiring image information in a second to-be-imaged area; the second to-be-imaged area overlaps with the first to-be-imaged area; adjusting the relative positions of the objective table and the slide can make the to-be-transferred article on the slide and the sample on the objective table contact and transfer in the overlapping area; adjusting the position of the objective table can make the sample on the objective table be in the second to-be-imaged area, so as to complete lateral observation and measurement of the sample; the system integrates multiple functions and effectively overcomes the shortage that the user needs to be equipped with multiple single-function devices.

Description

Technical Field

[0001] This invention relates to the field of micromaterial testing and application technology, and in particular to a multifunctional micro-nano manipulation system capable of contact angle measurement, microsphere probe preparation, probe preparation encapsulated in two-dimensional materials, and heterojunction preparation. Background Technology

[0002] With the rapid development of science and technology, the size of materials and devices involved in production and scientific research has entered the nanoscale. In particular, two-dimensional materials, represented by graphene, possess great application potential due to their excellent electrical, optical, and mechanical properties. To better utilize various two-dimensional materials, it is necessary to study their surface properties and interfacial interactions. Common research areas include frictional force studies, adhesion force studies, and hydrophilic / hydrophobicity studies. Among these, frictional force studies require the preparation of microsphere probes and probes encapsulated in two-dimensional materials; the core of hydrophilic / hydrophobicity studies is the measurement of contact angles. Currently, the preparation of various probes and the measurement of contact angles use different devices, which not only increases the purchase and maintenance costs of the devices but also increases the space required, hindering widespread application.

[0003] In view of the above situation, there is an urgent need to develop a highly integrated multifunctional micro-nano manipulation system to meet the diverse needs of users in two-dimensional material research. Summary of the Invention

[0004] In view of the shortcomings of the prior art described above, the purpose of this invention is to provide a multifunctional micro-nano manipulation system that can not only complete the fabrication of microsphere probes and heterojunctions, but also realize the measurement of contact angle, effectively improving the versatility and utilization of the system.

[0005] To achieve the above objectives, the present invention provides a multifunctional micro / nano manipulation system, including a stage, a glass slide, a first position fine-tuning device, a second position fine-tuning device, a vertical microscope device, a horizontal microscope device, and a computer; the vertical microscope device and the horizontal microscope device are both communicatively connected to the computer; the first position fine-tuning device is used to adjust the position of the stage; the second position fine-tuning device is located to one side of the first position fine-tuning device and is used to adjust the position of the glass slide; the vertical microscope device is located above the stage and is used to acquire image information in a first imaging area; the horizontal microscope device and the second position fine-tuning device are located on different sides of the first position fine-tuning device, and the horizontal microscope device is used to acquire image information in a second imaging area. Image information; the second imaging area overlaps with the first imaging area; adjusting the relative position of the stage and the slide allows the sample on the stage and the item to be transferred on the slide to contact and transfer within the overlapping area; adjusting the position of the stage allows the sample on the stage to be placed within the second imaging area; thus, the contact angle of the sample (such as two-dimensional materials and other solids) on the stage can be observed and obtained using a horizontal microscope; the relative position of the stage and the slide can also be adjusted using various position fine-tuning devices to allow the item to be transferred on the slide and the sample on the stage to contact and transfer within the overlapping area, so as to achieve precise preparation of microsphere probes or heterostructures under the coordinated observation of vertical and horizontal microscopes, thereby improving the preparation success rate.

[0006] Preferably, the first position fine-tuning device includes a Z-axis moving mechanism; the second position fine-tuning device includes an XY-axis moving platform and a Z-axis moving mechanism.

[0007] Preferably, the first position fine-tuning device includes an XY-axis moving platform to facilitate the preparation of a probe encapsulating two-dimensional material by swiping.

[0008] Preferably, the first position fine-tuning device includes a θ-axis rotation platform and / or an α-axis tilting platform; the θ-axis rotation platform is used to adjust the Z-axis rotation angle of the stage; the rotation center line of the α-axis tilting platform is parallel to the center line of the horizontal microscope device; the θ-axis rotation platform facilitates adjustment of the horizontal angle of the sample on the stage; the α-axis tilting platform facilitates adjustment of the tilt angle of the sample on the stage.

[0009] Preferably, the slide has a clearance hole near the free end so that when the probe scratches the two-dimensional material at the clearance hole, the two-dimensional material has enough deformation space to ensure that the two-dimensional material and the probe have sufficient contact area during the scratching process, thereby facilitating the smooth wrapping of the two-dimensional material on the probe.

[0010] Preferably, the vertical microscope device includes a first optical microscope and a first CCD camera; the horizontal microscope device includes a second CCD camera; the arrangement of the first optical microscope and the first CCD camera facilitates real-time observation and recording of the probe and heterojunction preparation process; the second CCD camera not only facilitates lateral observation during the probe and heterojunction preparation process to improve the preparation success rate, but also facilitates obtaining lateral image information of the sample on the stage, laying the foundation for accurate acquisition of the contact angle and roll angle.

[0011] Preferably, the first optical microscope includes a continuous zoom microscope and an apochromatic objective lens, so that the operator can flexibly adjust the magnification as needed during probe preparation and heterojunction preparation to obtain bright and clear images, thereby helping the operator to accurately identify various details and avoid misoperation caused by image blurring.

[0012] Preferably, the second CCD camera is equipped with a distortion-resistant telecentric lens to eliminate or improve image distortion caused by lens distortion and ensure the accuracy of lateral measurements.

[0013] Preferably, both the first position fine-tuning device and the second position fine-tuning device are mounted on the substrate; the vertical microscope device is mounted on the substrate via the first support frame, and the horizontal microscope device is mounted on the substrate via the second support frame; the second position fine-tuning device, the first support frame, and the second support frame are located on different sides of the first position fine-tuning device.

[0014] Preferably, the second support frame is a height-adjustable support frame to meet the image acquisition needs at different heights.

[0015] As described above, the multifunctional micro / nano manipulation system of the present invention has the following beneficial effects:

[0016] This application utilizes a vertical microscope, a horizontal microscope, a stage, a slide, a first position fine-tuning device, and a second position fine-tuning device to construct a low-cost, high-precision multifunctional micro-nano manipulation system. This multifunctional micro-nano manipulation system can measure contact angle and roll-off angle, as well as prepare heterojunctions and various types of probes, achieving a high degree of integration of multiple functions. This effectively overcomes the shortcomings of previous systems where users needed to equip themselves with multiple single-function devices, greatly reducing the number of devices required and the purchase and maintenance costs, saving users significant funds and space. In addition, the horizontal microscope used for contact angle and roll-off angle measurement can also provide lateral observation during heterojunction and probe preparation, allowing users to accurately control the relative position of the items to be transferred and the samples in the vertical direction, effectively avoiding preparation failures caused by excessive contact between the two and improving the preparation success rate. Attached Figure Description

[0017] Figure 1 This is a perspective view of the multifunctional micro / nano manipulation system involved in this application.

[0018] Figure 2 for Figure 1 Top view.

[0019] Figure 3 for Figure 1 The main view.

[0020] Figure 4 for Figure 3 A schematic diagram of the structure of the XY-axis mobile platform.

[0021] Figure 5 This is a schematic diagram of the structure of the directional movement mechanism.

[0022] Figure 6 This is a top view of the θ-axis rotating platform.

[0023] Figure 7 This is a top view of the glass slide.

[0024] Explanation of reference numerals in the attached figures:

[0025] Stage 10, slide 20, clearance hole 20a, adapter 21, first position fine adjustment device 30a, second position fine adjustment device 30b, XY axis moving platform 31, X axis moving mechanism 31a, Y axis moving mechanism 31b, Z axis moving mechanism 32, fixed seat 311, movable seat 312, connecting block 3121, guide rail 313, micrometer head 314, θ axis rotating platform 33, base 331, turntable 332, connecting handle 3321, threaded seat 333, fine adjustment screw 334, α axis yaw platform 34, vertical microscope device 40, first optical microscope 41, first CCD camera 42, horizontal microscope device 50, second CCD camera 51, telecentric lens 52, first support frame 60a, second support frame 60b, third support frame 60c, substrate 70. Detailed Implementation

[0026] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0027] It should be understood that the structures, proportions, sizes, etc., depicted in the accompanying drawings are merely for illustrative purposes to aid those skilled in the art and to facilitate understanding. They are not intended to limit the scope of the invention and therefore have no substantial technical significance. Any modifications to the structure, changes in proportions, or adjustments to size, without affecting the effectiveness and objectives of the invention, should still fall within the scope of the technical content disclosed herein. Furthermore, the terms "upper," "lower," "left," "right," "middle," and "one" used in this specification are merely for clarity and not intended to limit the scope of the invention. Changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered within the scope of the invention's implementation.

[0028] In the field of materials science, it is frequently necessary to study the properties of micron-sized materials (such as two-dimensional materials like graphene), including their friction, adhesion, hydrophilicity, and hydrophobicity. Research on friction and adhesion involves the fabrication of microsphere probes, probes encapsulated in two-dimensional materials, and heterojunctions; research on hydrophilicity and hydrophobicity involves the measurement of contact angles and roll-off angles. However, currently, the fabrication of various probes, the fabrication of heterojunctions, and the measurement of contact angles are performed using different devices, significantly increasing the purchase and maintenance costs for users.

[0029] Based on this, this application provides a highly integrated multifunctional micro-nano manipulation system that can not only complete the fabrication of various probes and heterojunctions, but also measure contact angle, roll-off angle and size, effectively overcoming the shortcomings of the past where users needed to equip themselves with multiple single-function devices.

[0030] For ease of description, in the following embodiments, the height direction (i.e., the vertical direction) of the multifunctional micro-nano manipulation system is defined as the up-down direction, the length direction is defined as the left-right direction, and the width direction is defined as the front-back direction. Based on this, in Figure 2 In the diagram, the left side of the paper is the left direction, the right side is the right direction, the bottom of the paper is the front direction, the top of the paper is the back direction, the inside of the paper is the bottom direction, and the outside of the paper is the top direction.

[0031] like Figures 1 to 3 As shown, the multifunctional micro-nano manipulation system includes a stage 10, a glass slide 20, a first position fine adjustment device 30a, a second position fine adjustment device 30b, a vertical microscope device 40, a horizontal microscope device 50, and a computer. The vertical microscope device 40 and the horizontal microscope device 50 are connected to the computer for communication. The communication connection method is a wired communication connection such as RS485 or a wireless communication connection such as 5G or Wifi.

[0032] Specifically, such as Figures 1 to 3As shown, the first position fine-tuning device 30a is used to adjust the position of the stage 10; the second position fine-tuning device 30b is located on one side of the first position fine-tuning device 30a and is used to adjust the position of the slide 20; the vertical microscope device 40 is located above the stage 10 and is used to acquire image information in the first imaging area; the horizontal microscope device 50 and the second position fine-tuning device 30b are located on different sides of the first position fine-tuning device 30a, and the horizontal microscope device 50 is used to acquire image information in the second imaging area; wherein, the second imaging area and the first There is an overlapping area in the imaging area; by adjusting the relative position of the stage 10 and the slide 20, the sample on the stage 10 and the item to be transferred on the slide 20 can be made to contact in the overlapping area, so as to realize the precise preparation of the probe or heterojunction under the coordinated observation of the vertical microscope device 40 and the horizontal microscope device 50; by adjusting the position of the stage 10, the sample on the stage 10 can be placed in the second imaging area, so as to use the horizontal microscope device 50 to obtain the outer contour information of the sample on the stage 10 and complete the measurement of the sample contact angle, roll angle and size (such as thread size).

[0033] It should be noted that, in order to realize real-time observation and recording of the preparation and measurement processes, the vertical microscope device 40 includes a first optical microscope 41 and a first CCD camera 42, and the horizontal microscope device 50 includes a second CCD camera 51.

[0034] Optionally, in order to ensure that the operator can obtain bright and clear images during probe preparation, heterojunction preparation, and contact angle measurement, the first optical microscope 41 includes a continuous zoom microscope and an apochromatic objective lens; to avoid image distortion affecting accurate measurement, the second CCD camera 51 is equipped with a distortion-resistant telecentric lens 52.

[0035] In this embodiment, as Figure 3 As shown, the first position fine-tuning device 30a includes a Z-axis moving mechanism 32; the second position fine-tuning device 30b includes an XY-axis moving platform 31 and a Z-axis moving mechanism 32. The two Z-axis moving mechanisms 32 are used to adjust the height of the stage 10 and the slide 20, respectively, while the XY-axis moving platform 31 is used to adjust the horizontal position of the slide 20. The adjustment accuracy of the XY-axis moving platform 31 and the Z-axis moving mechanism 32 is no greater than 0.01 mm, and the specific adjustment accuracy can be determined according to the actual situation. Furthermore, to ensure the stability of the slide 20's movement, the slide 20 is preferably mounted on the movable part of the first position fine-tuning device 30a via an adapter 21.

[0036] At this point, the operating modes of the multifunctional micro / nano manipulation system include, but are not limited to, the following four:

[0037] Working Method 1: Preparation of microsphere probes, the specific steps of which include:

[0038] A1. Disperse multiple UV adhesive droplets and multiple microspheres at the bottom of the slide 20 (the UV adhesive droplets and microspheres are adhered to the bottom of the slide 20 by van der Waals forces), and install the probe cantilever on the stage 10 with the front facing upward.

[0039] A2. By using the first position fine-tuning device 30a and the second position fine-tuning device 30b, the relative positions of the slide 20 and the stage 10 are adjusted so that the tip of the probe cantilever contacts the UV adhesive droplet on the bottom of the slide 20 in the overlapping area, thus completing the adhesive application. During this process, the vertical microscope device 40 allows the user to accurately control the relative position of the UV adhesive droplet on the slide 20 and the probe cantilever in the horizontal direction, and the horizontal microscope device 50 allows the user to accurately control the relative position of the UV adhesive droplet on the slide 20 and the probe cantilever in the vertical direction. This not only allows for accurate control of the amount and position of adhesive application, but also prevents the probe cantilever from excessively contacting the slide 20 and failing.

[0040] A3. Separate the probe cantilever from the slide 20 and readjust the relative positions of the slide 20 and the probe cantilever so that the adhesive on the probe cantilever contacts the individual microspheres at the bottom of the slide 20 in the overlapping area.

[0041] A4. Separate the probe cantilever from the glass slide 20 and determine whether the microspheres have been successfully adhered. If yes, solidify the UC adhesive to complete the preparation of the microsphere probe. If no, return to step A3.

[0042] Method 2: Fabrication of microsphere probes encapsulated with two-dimensional materials. This involves simply attaching the two-dimensional material to the microsphere probe and then curing it with UV adhesive. Specific steps include:

[0043] B1. Place a PDMS substrate (the two-dimensional material is adhered to the bottom of the PDMS substrate by van der Waals forces) and a UV droplet on the bottom of the slide 20, and install the microsphere probe on the stage 10 with the front facing upward.

[0044] B2. The relative positions of the slide 20 and the stage 10 are adjusted by the first position fine adjustment device 30a and the second position fine adjustment device 30b so that the microspheres of the microsphere probe contact the UV adhesive droplets on the bottom of the slide 20 in the overlapping area to complete the adhesive application. In this process, the vertical microscope device 40 allows the user to accurately control the relative position of the UV adhesive droplets on the slide 20 and the microsphere probe in the horizontal direction, and the horizontal microscope device 50 allows the user to accurately control the relative position of the UV adhesive droplets on the slide 20 and the microsphere probe in the vertical direction. This not only allows for accurate control of the amount and position of adhesive application, but also avoids excessive contact between the microsphere probe and the slide 20, which could lead to failure.

[0045] B3. Separate the microsphere probe from the glass slide 20 and readjust the relative positions of the glass slide 20 and the microsphere probe so that the adhesive on the microsphere probe contacts the single two-dimensional material at the bottom of the glass slide 20 in the overlapping area.

[0046] B4. Separate the microsphere probe from the glass slide 20 and determine whether the microsphere has been successfully adhered. If so, cure the UV adhesive to complete the preparation of the microsphere probe encapsulating the two-dimensional material. If not, return to step B3.

[0047] It should be noted that in the above-mentioned working mode one and working mode two, the probe cantilever and microsphere probe can be installed on the stage 10 by various probe fixing devices such as probe clips. The specific probe fixing device used can be determined according to the actual situation and is not limited thereto.

[0048] Method 3: Preparation of heterojunctions, including the following steps:

[0049] A PDMS substrate for supporting two-dimensional materials is placed at the bottom of the glass slide 20 (the two-dimensional materials are adhered to the bottom of the PDMS substrate by van der Waals forces), and a substrate for supporting the two-dimensional materials is placed on the stage 10.

[0050] The relative positions of the slide 20 and the stage 10 are adjusted by the first position fine adjustment device 30a and the second position fine adjustment device 30b, so that the two-dimensional material at the bottom of the slide 20 and the target area of ​​the substrate come into contact and adhere in the overlapping area, thereby transferring and assembling the two-dimensional material on the target area of ​​the substrate to complete the preparation of the heterojunction. In this process, the vertical microscope device 40 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the substrate in the horizontal direction, and the horizontal microscope device 50 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the substrate in the vertical direction, so as to accurately control the docking position of the two and ensure the docking accuracy of the two.

[0051] Working Method Four: Conduct contact angle measurement, the specific steps of which include:

[0052] The sample is mounted on the stage 10, and the liquid to be tested is dropped onto the sample to form a droplet. The position of the stage 10 is adjusted by the first position fine adjustment device 30a so that the sample on the stage 10 is in the second imaging area. At this time, the horizontal microscope device 50 can acquire the outer contour image of the sample and the droplet on the sample, and send the acquired image information to the computer so that the computer can process and obtain the contact angle of the sample.

[0053] Therefore, the multifunctional micro-nano manipulation system of this application effectively overcomes the shortcomings of previous methods that required users to equip multiple single-function devices by integrating probe preparation, heterojunction preparation and contact angle measurement functions, thereby significantly reducing the purchase and maintenance costs of the device and improving the utilization rate of the entire system.

[0054] In a preferred embodiment, such as Figure 3 As shown, the first position fine-tuning device 30a also includes an XY-axis moving platform 31, which allows the two-dimensional material on the glass slide 20 to be transferred to the microsphere probe or the probe cantilever by a frictional transfer method, thereby enabling the preparation of other types of probes.

[0055] Specifically, one method for preparing a probe encapsulated in two-dimensional materials via triboelectric transfer includes:

[0056] C1. A PDMS substrate for supporting two-dimensional materials is placed at the bottom of the slide 20 (the two-dimensional materials are adhered to the bottom of the PDMS substrate by van der Waals forces), and the probe cantilever is mounted on the stage 10 with the front facing upward.

[0057] C2. Adjust the relative positions of the slide 20 and the stage 10 using the first position fine adjustment device 30a and the second position fine adjustment device 30b, so that the tip of the probe cantilever contacts the two-dimensional material at the bottom of the slide 20 in the overlapping area.

[0058] C3. Under the first contact pressure, move the probe cantilever laterally so that the probe cantilever scrapes and rubs on the two-dimensional material;

[0059] C4. Determine whether the two-dimensional material has been transferred to the probe cantilever. If yes, complete the preparation of the probe wrapped with two-dimensional material; if no, return to step C3, adjust the pressure value of the first contact pressure, and repeat the friction transfer.

[0060] During this process, the vertical microscope device 40 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the probe cantilever in the horizontal direction, while the horizontal microscope device 50 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the probe cantilever in the vertical direction, thus achieving accurate control of the contact position and contact pressure.

[0061] Of course, in order to improve the success rate of preparing probes encapsulated in two-dimensional materials, such as Figure 7 As shown, the slide 20 has a clearance hole 20a near the free end to allow the two-dimensional material on the PDMS substrate to pass. In this way, when the probe cantilever scratches and rubs the two-dimensional material with a certain pressure, the two-dimensional material has enough deformation space to deform, thereby ensuring that the two-dimensional material and the probe cantilever have sufficient contact area during the scratching and rubbing process, and improving the success rate of the two-dimensional material wrapping around the probe body. In addition, the clearance hole 20a can also prevent the probe cantilever from bending and breaking under the stop of the slide 20, causing unnecessary losses.

[0062] Another method for preparing probes encapsulated in two-dimensional materials via triboelectric transfer includes:

[0063] D1. Plasma treatment is performed on the probe cantilever with microspheres or needle tips, and the substrate with deposited two-dimensional material is heated; the plasma treatment power is 18W, the treatment time is not less than 10 minutes, the vacuum degree of the plasma treatment chamber is about 250 mTorr; the final heating temperature is 200 degrees Celsius, and the heating rate is 1 degree Celsius / min.

[0064] D2. The heated substrate with deposited two-dimensional material is placed at the bottom of the glass slide 20, and the plasma-treated probe cantilever is tilted and mounted on the stage 10 with the front facing upward.

[0065] D3. Adjust the relative positions of the slide 20 and the stage 10 using the first position fine adjustment device 30a and the second position fine adjustment device 30b, so that the microspheres or tips of the probe cantilever contact the two-dimensional material at the bottom of the slide 20 in the overlapping area.

[0066] D4. Under the first contact pressure, the probe cantilever is rubbed back and forth on the two-dimensional material.

[0067] D5. Determine whether the two-dimensional material has been transferred to the probe cantilever. If yes, complete the preparation of the probe wrapped with two-dimensional material; if no, return to step D4, adjust the pressure value of the first contact pressure, and repeat the friction transfer.

[0068] During this process, the vertical microscope device 40 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the probe cantilever in the horizontal direction, while the horizontal microscope device 50 allows the user to accurately control the relative position of the two-dimensional material on the slide 20 and the probe cantilever in the vertical direction, thus achieving accurate control of the contact position and contact pressure.

[0069] High temperatures can reduce the mechanical strength of two-dimensional materials, making them easier to break, which is beneficial for subsequent frictional separation. Plasma treatment can increase the oxygen-containing functional groups on the probe cantilever to enhance adhesion. This not only helps to improve the success rate of two-dimensional material transfer, but also makes it easier to wrap the two-dimensional material in a capped form on the microspheres or tips of the probe cantilever, thus improving the bonding force between the two.

[0070] In addition, such as Figure 4 As shown, the XY-direction moving platform 31 mentioned above includes an X-direction moving mechanism 31a and a Y-direction moving mechanism 31b. The Y-direction moving mechanism 31b is disposed above the X-direction moving mechanism 31a, and the X-direction moving mechanism 31a is used to adjust the position of the Y-direction moving mechanism 31b in the X direction. The Y-direction moving mechanism 31b is used to adjust the position of the corresponding Z-direction moving mechanism 32 in the Y direction. The X direction and the Y direction are set at an angle. In this embodiment, the X direction and the Y direction are perpendicular.

[0071] It should be noted that the X-axis moving mechanism 31a, Y-axis moving mechanism 31b and Z-axis moving mechanism 32 are all existing mechanisms that can achieve fine adjustment of position in a specific direction, and are not limited thereto; in this embodiment, the X-axis moving mechanism 31a, Y-axis moving mechanism 31b and Z-axis moving mechanism 32 are preferably micrometer head adjustment mechanisms.

[0072] Specifically, the structure of the differential head adjustment mechanism is as follows: Figure 5 As shown, it includes a fixed base 311, a movable base 312, and a micrometer head 314; wherein, the movable base 312 is slidably mounted on the fixed base 311 via a guide rail 313; the micrometer head 314 is mounted on one side of the fixed base 311, and the movable base 312 is provided with a connecting block 3121 connected to the micrometer head 314; by simply turning the micrometer cylinder of the micrometer head 314, the movable base 312 can slide back and forth along the guide rail 313 to achieve precise adjustment of the position of the movable base 314.

[0073] In a preferred embodiment, such as Figure 3 and Figure 6As shown, the first position fine-tuning device 30a also includes an θ-axis rotation platform 33 (i.e., the first position fine-tuning device 30a belongs to a four-axis moving platform); the θ-axis rotation platform 33 includes a base 331 and a turntable 332 vertically rotatably mounted on the base 331; wherein, a connecting handle 3321 is fixed on one side of the turntable 332; two threaded seats 333 are installed on the side of the base 331, and each threaded seat 333 is threadedly connected to a fine-tuning screw 334; the two fine-tuning screws 334 cooperate to limit the position of the connecting handle 3321; thus, when it is necessary to adjust the angle of the turntable 332, it is only necessary to rotate one fine-tuning screw 334 clockwise and the other fine-tuning screw 334 counterclockwise; the setting of the θ-axis rotation platform 33 can precisely adjust the horizontal angle of the sample on the stage 10 to realize the preparation of heterojunctions at different relative angles.

[0074] To expand the angle adjustment range of the turntable 332, multiple threaded holes can be arranged at intervals on the outer circumference of the turntable 332, and the connecting handle 3321 is threadedly connected to one of the threaded holes. In this way, by simply aligning the connecting handle 3321 between the two fine-tuning screws 334 with different threaded holes on the turntable 332, a coarse adjustment of the larger angle of the turntable 332 can be completed. Subsequently, by adjusting the two fine-tuning screws 334, a fine adjustment of the angle of the turntable 332 can be completed.

[0075] In an alternative embodiment, such as Figure 3 As shown, the first position fine adjustment device 30a includes an α-axis tilting platform 34 (the first position fine adjustment device 30a belongs to a five-axis moving platform); the rotation center line of the α-axis tilting platform 34 is parallel to the center line of the horizontal microscope device 50, which not only facilitates the adjustment of the tilt angle of the probe cantilever or microsphere probe, but also facilitates the measurement of the roll angle.

[0076] Since the α-axis oscillation platform 34 is existing technology, it will not be described in detail. For specific structure, please refer to the α-axis oscillation platform of Sigma Optical Co., Ltd., such as the α-axis oscillation platform with model series GOH, G0HB, G0HT and G0HTA.

[0077] To facilitate the overall transport of the multifunctional micro / nano manipulation system, such as Figures 1 to 3 As shown, the first position fine adjustment device 30a and the second position fine adjustment device 30b are both mounted on the substrate 70, and the vertical microscope device 40 is mounted on the substrate 70 via the first support frame 60a, and the horizontal microscope device 50 is mounted on the substrate 70 via the second support frame 60b. In order to avoid interference between the devices, the second position fine adjustment device 30b, the first support frame 60a and the second support frame 60b need to be located on different sides of the first position fine adjustment device 30a.

[0078] In an alternative embodiment, such as Figure 1As shown, the second position fine adjustment device 30b is mounted on the substrate via the third support frame 60c so that the position of the glass slide 20 can always be higher than the position of the stage 10, which facilitates the preparation of heterojunctions and various probes by the inverted method.

[0079] It is understood that the first support frame 60a, the second support frame 60b, and the third support frame 60c can be height-adjustable support frames or height-fixed support frames, and there is no limitation on this. In this embodiment, the first support frame 60a, the second support frame 60b, and the third support frame 60c are preferably height-adjustable support frames. The height-adjustable support frame can be a telescopic adjustment frame or a screw adjustment frame, or any other lifting support frame that can achieve height adjustment, and there is no limitation on this.

[0080] In summary, this invention effectively overcomes the various shortcomings of the prior art and has high industrial application value.

[0081] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in the present invention should still be covered by the claims of the present invention.

Claims

1. A multifunctional micro / nano manipulation system, characterized in that, It includes a stage (10), a glass slide (20), a first position fine adjustment device (30a), a second position fine adjustment device (30b), a vertical microscope device (40), a horizontal microscope device (50), and a computer; the vertical microscope device (40) and the horizontal microscope device (50) are both connected to the computer for communication. The first position fine-tuning device (30a) is used to adjust the position of the stage (10); The second position adjustment device (30b) is located on one side of the first position adjustment device (30a), and the second position adjustment device (30b) is used to adjust the position of the slide (20); The vertical microscope device (40) is located above the stage (10) and is used to acquire image information in the first imaging area; The horizontal microscope device (50) and the second position fine adjustment device (30b) are located on different sides of the first position fine adjustment device (30a), and the horizontal microscope device (50) is used to acquire image information in the second imaging area; the second imaging area and the first imaging area have an overlapping area. Adjusting the relative positions of the stage (10) and the slide (20) allows the sample on the stage (10) and the item to be transferred on the slide (20) to contact and transfer within the overlapping area; adjusting the position of the stage (10) allows the sample on the stage (10) to be placed within the second imaging area.

2. The multifunctional micro / nano manipulation system according to claim 1, characterized in that, The first position fine adjustment device (30a) includes a Z-axis moving mechanism (32); the second position fine adjustment device (30b) includes an XY-axis moving platform (31) and a Z-axis moving mechanism (32).

3. The multifunctional micro / nano manipulation system according to claim 2, characterized in that, The first position fine-tuning device (30a) includes an XY-axis moving platform (31).

4. The multifunctional micro / nano manipulation system according to claim 2 or 3, characterized in that, The first position fine adjustment device (30a) includes an θ-axis rotation platform (33) and / or an α-axis tilting platform (34); the θ-axis rotation platform (33) is used to adjust the Z-axis rotation angle of the stage (10); the rotation center line of the α-axis tilting platform (34) is parallel to the center line of the horizontal microscope device (50).

5. The multifunctional micro / nano manipulation system according to claim 3, characterized in that, The slide (20) has a clearance hole (20a) near the free end.

6. The multifunctional micro / nano manipulation system according to claim 1, characterized in that, The vertical microscope device (40) includes a first optical microscope (41) and a first CCD camera (42); the horizontal microscope device (50) includes a second CCD camera (51).

7. The multifunctional micro / nano manipulation system according to claim 6, characterized in that, The first optical microscope (41) includes a continuous zoom microscope and an apochromatic objective.

8. The multifunctional micro / nano manipulation system according to claim 6, characterized in that, The second CCD camera (51) is equipped with a distortion-resistant telecentric lens (52).

9. The multifunctional micro / nano manipulation system according to claim 1, characterized in that, Both the first position fine adjustment device (30a) and the second position fine adjustment device (30b) are mounted on the substrate (70); the vertical microscope device (40) is mounted on the substrate (70) via the first support frame (60a), and the horizontal microscope device (50) is mounted on the substrate (70) via the second support frame (60b); the second position fine adjustment device (30b), the first support frame (60a), and the second support frame (60b) are located on different sides of the first position fine adjustment device (30a).

10. The multifunctional micro / nano manipulation system according to claim 9, characterized in that, The second support frame (60b) is a height-adjustable support frame.

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