Method for detecting defects of electrochromic assemblies

Abstract

The application provides a kind of electrochromic component defect detection method, the detection method includes the following steps: electrochromic component is carried out defect accelerated exposure processing, and then defect detection is carried out;The defect accelerated exposure processing includes: the electrochromic component is placed in the environment of first temperature, and the driving voltage of the cyclic variation voltage value is applied to the electrochromic component, the amplitude of the driving voltage is higher than the working voltage of the electrochromic component, to make electrochromic component switch between coloring state and bleaching state, the first temperature is greater than or equal to 40 DEG C.The application can efficiently and reliably expose the potential defects of electrochromic glass in a short time, and has wide application prospect.

Description

Technical Field

[0001] This invention relates to the field of analytical testing technology, and in particular to a method for detecting defects in electrochromic components. Background Technology

[0002] Electrochromic glass is a type of smart glass that reversibly changes its optical properties (such as light transmittance and color) by applying an electric field under low voltage. It is widely used in building curtain walls, car sunroofs, aircraft windows, and high-end display devices, offering advantages such as energy saving and privacy protection.

[0003] The manufacturing process of electrochromic glass is complex, and its core structure typically consists of multiple layers of thin films stacked together (e.g., a transparent conductive layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and another transparent conductive layer). During production, transportation, or installation, minute defects may be introduced into the glass.

[0004] However, there is currently a lack of methods to detect potential defects in electrochromic devices. Summary of the Invention

[0005] To address the shortcomings of existing technologies, the present invention aims to provide a method for detecting defects in electrochromic components. By constructing a stress-coupled accelerated testing environment that combines at least temperature and voltage, the method can accelerate the exposure of defects in electrochromic components, thereby achieving rapid and accurate detection of defects in electrochromic devices.

[0006] To achieve this objective, the present invention adopts the following technical solution: This invention provides a method for detecting defects in electrochromic components, the method comprising the following steps: Defects in the electrochromic components are accelerated and exposed before defect detection is performed.

[0007] The defect acceleration exposure process includes: placing the electrochromic component in an environment at a first temperature and applying a driving voltage with a cyclically changing voltage value to the electrochromic component, wherein the amplitude of the driving voltage is higher than the operating voltage of the electrochromic component, so as to switch the electrochromic component between a colored state and a faded state, wherein the first temperature is ≥40°C.

[0008] Currently, the following methods are generally used to detect defects in electrochromic devices: A. Conventional electrical tests: can only detect "hard defects" such as severe short circuits or open circuits, and are not sensitive to potential "soft defects" that will worsen after long-term use.

[0009] B. Visual inspection: Unable to detect microscopic defects inside the glass.

[0010] C. Natural aging test: The sample is placed in a natural environment to observe its performance degradation. The cycle is too long (several months or even years), which cannot meet the needs of rapid quality control, product development and factory inspection.

[0011] To address the aforementioned specific deficiencies, this invention develops a detection method capable of efficiently and reliably exposing potential defects in electrochromic glass within a short timeframe. The detection method of this invention can detect problems including microscopic pinholes generated during thin film deposition (such as...). Figure 1 As shown), halo defects (such as...) Figure 2 As shown), poor edge sealing (poor sealing of the electrolyte layer, leading to performance degradation or failure), interlayer delamination (weak bonding between functional layers), and uneven ion migration channels (resulting in uneven coloring / fading).

[0012] The method for detecting defects in electrochromic components provided by this invention cleverly utilizes a multi-stress coupling approach, which includes at least temperature and cyclic driving voltage. This allows the electrochromic device to switch rapidly and continuously between colored and faded states at a temperature of ≥40°C, thereby accelerating the exposure of defects in the electrochromic device and providing a fast and convenient testing method for detecting defects in electrochromic devices.

[0013] Preferably, the first temperature ranges from 40 to 100°C.

[0014] Preferably, the amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component.

[0015] Preferably, the operating voltage of the electrochromic component is 1~2V.

[0016] Preferably, the amplitude of the driving voltage is 1.1~2.4V.

[0017] Preferably, the duration of a single cycle in the driving voltage is 1 to 30 minutes.

[0018] Preferably, the humidity of the environment during the accelerated defect exposure treatment is 75-90%RH.

[0019] Preferably, the duration of the accelerated defect exposure treatment is 2 to 500 hours.

[0020] Preferably, the electrochromic component includes a first transparent conductive layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and a second transparent conductive layer stacked sequentially.

[0021] Preferably, the defect detection includes any one or a combination of at least two of electrical testing, appearance testing, or electrochromic performance testing, wherein typical but non-limiting combinations are a combination of electrical testing and appearance testing, a combination of electrochromic performance testing and appearance testing, or a combination of electrical testing and electrochromic performance testing.

[0022] As a preferred technical solution of the present invention, the detection method includes: The electrochromic component is cleaned to obtain the cleaned electrochromic component.

[0023] The cleaned electrochromic component was placed in a test environment with a controlled temperature of 40~100℃ and a humidity of 75~90%RH.

[0024] In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment, which includes applying a driving voltage with cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component, the duration of a single cycle is 1 to 30 minutes, and the duration of the accelerated defect exposure treatment is 2 to 500 hours.

[0025] The electrochromic component after the defect accelerated exposure treatment is then subjected to defect detection, which includes any one or a combination of at least two of electrical testing, appearance testing, or electrochromic performance testing.

[0026] Compared with the prior art, the present invention has at least the following beneficial effects: The method for detecting defects in electrochromic components provided by this invention uses a multi-stress coupling approach to enable the electrochromic component under test to switch rapidly between a colored state and a faded state, thereby accelerating the exposure of defects in the electrochromic component and achieving rapid and accurate detection of defects in the electrochromic component. Attached Figure Description

[0027] Figure 1 This is a schematic diagram of the microscopic pinholes generated during the thin film deposition process provided by the present invention.

[0028] Figure 2 This is a schematic diagram of the halo defects generated during the thin film deposition process provided by the present invention. Detailed Implementation

[0029] To facilitate understanding of the present invention, the following embodiments are provided. Those skilled in the art should understand that these embodiments are merely illustrative and should not be construed as limiting the scope of the invention.

[0030] It should be understood that in the description of this invention, the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0031] It should be noted that, in the description of this invention, unless otherwise explicitly specified and limited, the terms "set," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0032] As a specific embodiment of the present invention, a method for detecting defects in an electrochromic component is provided, the method comprising the following steps: Defects in the electrochromic components are accelerated and exposed before defect detection is performed.

[0033] The defect acceleration exposure process includes: placing the electrochromic component in an environment at a first temperature and applying a driving voltage with a cyclically changing voltage value to the electrochromic component, wherein the amplitude of the driving voltage is higher than the operating voltage of the electrochromic component, so as to switch the electrochromic component between a colored state and a faded state, wherein the first temperature is ≥40°C.

[0034] Currently, the following methods are generally used to detect defects in electrochromic devices: A. Conventional electrical tests: can only detect "hard defects" such as severe short circuits or open circuits, and are not sensitive to potential "soft defects" that will worsen after long-term use.

[0035] B. Visual inspection: Unable to detect microscopic defects inside the glass.

[0036] C. Natural aging test: The sample is placed in a natural environment to observe its performance degradation. The cycle is too long (several months or even years), which cannot meet the needs of rapid quality control, product development and factory inspection.

[0037] To address the aforementioned specific deficiencies, this invention develops a detection method capable of efficiently and reliably exposing potential defects in electrochromic glass within a short timeframe. The detection method of this invention can detect problems including microscopic pinholes generated during thin film deposition (such as...). Figure 1 As shown), halo defects (such as...) Figure 2 As shown), poor edge sealing (poor sealing of the electrolyte layer, leading to performance degradation or failure), interlayer delamination (weak bonding between functional layers), and uneven ion migration channels (resulting in uneven coloring / fading).

[0038] The method for detecting defects in electrochromic components provided by this invention cleverly utilizes a multi-stress coupling approach, which includes at least temperature and cyclic driving voltage. This allows the electrochromic device to switch rapidly and continuously between colored and faded states at a temperature of ≥40°C, thereby accelerating the exposure of defects in the electrochromic device and providing a fast and convenient testing method for detecting defects in electrochromic devices.

[0039] In some specific embodiments, the first temperature range is 40~100℃, for example, it can be 40℃, 47℃, 54℃, 60℃, 67℃, 74℃, 80℃, 87℃, 94℃ or 100℃, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0040] In some specific embodiments, the amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component, for example, it can be 1.1 times, 1.12 times, 1.13 times, 1.14 times, 1.15 times, 1.16 times, 1.17 times, 1.18 times, 1.19 times, or 1.2 times, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0041] The present invention preferably sets the amplitude of the driving voltage between 1.1 and 1.2 times the operating voltage, which can not only shorten the total test time, but also avoid the electrochromic device being damaged.

[0042] In some specific embodiments, the operating voltage of the electrochromic component is 1~2V, for example, it can be 1V, 1.2V, 1.3V, 1.4V, 1.5V, 1.6V, 1.7V, 1.8V, 1.9V or 2V, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0043] In some specific embodiments, the amplitude of the driving voltage is 1.1~2.4V, for example, it can be 1.1V, 1.3V, 1.4V, 1.6V, 1.7V, 1.9V, 2V, 2.2V, 2.3V or 2.4V, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0044] In some specific embodiments, the duration of a single cycle in the driving voltage is 1 to 30 minutes, for example, it can be 1 minute, 2 minutes, 3 minutes, 4 minutes, 5 minutes, 10 minutes, 12 minutes, 15 minutes, 20 minutes, 22 minutes, 23 minutes, 25 minutes, 28 minutes or 30 minutes, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0045] In some specific embodiments, the humidity of the environment during the accelerated exposure treatment of defects is 75-90%RH, for example, it can be 75%RH, 77%RH, 79%RH, 80%RH, 82%RH, 84%RH, 85%RH, 87%RH, 89%RH or 90%RH, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0046] Since some film layers in electrochromic devices may be sensitive to moisture, that is, defects in the film layers are more easily exposed in a high humidity environment, the present invention further optimizes the control of the environment to a higher humidity, thereby enabling better and faster defect detection of electrochromic devices.

[0047] In some specific implementations, the duration of the accelerated defect exposure treatment is 2 to 500 hours, for example, it can be 2 hours, 58 hours, 113 hours, 168 hours, 224 hours, 279 hours, 334 hours, 390 hours, 445 hours or 500 hours, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0048] In some specific embodiments, the electrochromic component includes a first transparent conductive layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and a second transparent conductive layer stacked sequentially.

[0049] The defect detection method provided by this invention generally does not impose special restrictions on the specific material or structure of the electrochromic component, and can be applied to electrochromic devices with different structures and materials. For example, the material of the first transparent conductive layer can be any one or a combination of at least two of the following: ITO (Indium Tin Oxide), FTO (Fluorine-doped Tin Oxide), AZO (Aluminum-doped Zinc Oxide), tin oxide, zinc oxide, indium gallium zinc oxide composite, fluorine-doped zinc oxide, graphene, silver nanowires, or metal mesh.

[0050] The material of the ion storage layer can be, for example, any one or a combination of at least two of nickel tungsten oxide, NiO, TiO2, lithium alloy, lithium metal oxide, Prussian blue, MoO3, or graphite.

[0051] The electrolyte layer material can be, for example, any one or a combination of at least two of the following: lithium-containing polyanionic compound, LiClO4, -PC, liquid electrolyte, PMMA-PC-LiClO4 gel polymer electrolyte, PVB electrolyte membrane, salt-in-water electrolyte, or sodium perchlorate solution.

[0052] The electrochromic layer can be made of any one or a combination of at least two of the following materials: WO3, MoO3, nickel tungsten oxide, polyaniline, polythiophene derivatives, or niobium oxide.

[0053] The material of the second transparent conductive layer can be, for example, any one or a combination of at least two of the following: ITO (Indium Tin Oxide), FTO (Fluorine-doped Tin Oxide), AZO (Aluminum-doped Zinc Oxide), tin oxide, zinc oxide, indium gallium zinc oxide composite, fluorine-doped zinc oxide, graphene, silver nanowires, or metal mesh.

[0054] In some specific embodiments, the defect detection includes any one or a combination of at least two of electrical testing, appearance testing, or electrochromic performance testing, wherein typical but non-limiting combinations are a combination of electrical testing and appearance testing, a combination of electrochromic performance testing and appearance testing, or a combination of electrical testing and electrochromic performance testing.

[0055] Electrical tests may include, for example, any one or a combination of at least two of the following: cyclic voltammetry, chronoamperometry, chronopotentialography, open-circuit potential testing, or electrochemical impedance spectroscopy.

[0056] Appearance testing may include any one or a combination of at least two of the following: optical microscopy, scanning electron microscopy, atomic force microscopy, color difference testing, transmittance distribution testing, or visual inspection.

[0057] Examples of electrochromic performance testing may include any one or a combination of at least two of the following: spectral transmittance testing, spectral absorbance testing, spectral reflectance testing, color change response time testing, tinting efficiency testing, cycle stability testing, open circuit memory testing, or weather resistance testing.

[0058] As a preferred technical solution of the present invention, the detection method includes: The electrochromic component is cleaned to obtain the cleaned electrochromic component.

[0059] The cleaned electrochromic component was placed in a test environment with a controlled temperature of 40~100℃ and a humidity of 75~90%RH.

[0060] In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment, which includes applying a driving voltage with cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component, the duration of a single cycle is 1 to 30 minutes, and the duration of the accelerated defect exposure treatment is 2 to 500 hours.

[0061] The electrochromic component after the defect accelerated exposure treatment is then subjected to defect detection, which includes any one or a combination of at least two of electrical testing, appearance testing, or electrochromic performance testing.

[0062] This invention provides a highly efficient and controllable method for accelerating the exposure of defects in electrochromic glass. This method can simulate potential failure modes of electrochromic components during long-term use within hours or days, thereby quickly identifying products with potential quality issues, and has broad application prospects.

[0063] The following detailed description uses specific embodiments.

[0064] For ease of experimentation, the electrochromic components used in the following embodiments and comparative examples are as follows: The electrochromic component comprises a first transparent conductive layer (ITO layer) with a thickness of 200 nm, an ion storage layer (Ni(OH)2) with a thickness of 150 nm, an electrolyte layer (NaTaO3) with a thickness of 400 nm, an electrochromic layer (nickel tungsten oxide with a tungsten content of 60 wt%) with a thickness of 300 nm, and a second transparent conductive layer (ITO layer) with a thickness of 180 nm, and the operating voltage is 1.5 V.

[0065] Example 1 This embodiment provides a method for detecting defects in electrochromic components, the detection method comprising: The electrochromic component is cleaned to obtain the cleaned electrochromic component.

[0066] The cleaned electrochromic component was placed in a test environment with a controlled first temperature of 80°C and a humidity of 780%RH.

[0067] In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment, which includes applying a driving voltage with a cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.15 times the operating voltage of the electrochromic component, i.e., 1.72V. The duration of a single cycle is 10 minutes, and the duration of the accelerated defect exposure treatment is 50 hours.

[0068] The electrochromic components after the defect accelerated exposure treatment are then subjected to defect detection, which includes electrical testing, appearance testing, and electrochromic performance testing.

[0069] Example 2 This embodiment provides a method for detecting defects in electrochromic components, the detection method comprising: The electrochromic component is cleaned to obtain the cleaned electrochromic component.

[0070] The cleaned electrochromic component was placed in a test environment with a controlled first temperature of 100°C and a humidity of 75%RH.

[0071] In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment, which includes applying a driving voltage with a cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.2 times the operating voltage of the electrochromic component, i.e., 1.8V. The duration of a single cycle is 20 minutes, and the duration of the accelerated defect exposure treatment is 35 hours.

[0072] The electrochromic components after the defect accelerated exposure treatment are then subjected to defect detection, which includes electrical testing, appearance testing, and electrochromic performance testing.

[0073] Example 3 This embodiment provides a method for detecting defects in electrochromic components, the detection method comprising: The electrochromic component is cleaned to obtain the cleaned electrochromic component.

[0074] The cleaned electrochromic component was placed in a test environment with a controlled first temperature of 40°C and a humidity of 90%RH.

[0075] In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment, which includes applying a driving voltage with cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.1 times the operating voltage of the electrochromic component, i.e., 1.65V, the duration of a single cycle is 5 minutes, and the duration of the accelerated defect exposure treatment is 200 hours.

[0076] The electrochromic components after the defect accelerated exposure treatment are then subjected to defect detection, which includes electrical testing, appearance testing, and electrochromic performance testing.

[0077] Example 4 This embodiment provides a method for detecting defects in electrochromic components. Except for the humidity being 60%RH, the detection method is the same as in Embodiment 1, and will not be repeated here.

[0078] Example 5 This embodiment provides a method for detecting defects in electrochromic components. The method is identical to that in Embodiment 4, except that the accelerated defect exposure treatment duration is 150 hours, and will not be repeated here. Example 6 This embodiment provides a method for detecting defects in an electrochromic component. Except for the driving voltage amplitude being 2V, the detection method is the same as in Embodiment 1, and will not be described again here.

[0079] Example 7 This embodiment provides a method for detecting defects in electrochromic components. Except for the driving voltage amplitude of 1.55V, the detection method is the same as that in Embodiment 1, and will not be described again here.

[0080] Example 8 This embodiment provides a method for detecting defects in electrochromic components. Except for the defect accelerated exposure treatment time of 400 hours, the detection method is the same as that in Embodiment 6, and will not be described again here.

[0081] Example 9 This embodiment provides a method for detecting defects in electrochromic components. Except for the defect accelerated exposure treatment time of 500 hours, the detection method is the same as that in Embodiment 6, and will not be described again here.

[0082] Example 10 This embodiment provides a method for detecting defects in electrochromic components. Except for the defect accelerated exposure treatment time of 600 hours, the detection method is the same as that in Embodiment 6, and will not be described again here.

[0083] Example 11 This embodiment provides a method for detecting defects in electrochromic components. Except for the first temperature being 110°C, the detection method is the same as in Embodiment 1, and will not be repeated here.

[0084] Comparative Example 1-1 This comparative example provides a method for detecting defects in an electrochromic component. Except for the first temperature being 30°C, the detection method is the same as in Example 1, and will not be repeated here.

[0085] Comparative Examples 1-2 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 400 hours, the detection method is the same as that in comparative examples 1-2, and will not be described again here.

[0086] Comparative Examples 1-3 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 500 hours, the detection method is the same as that in Comparative Example 1-1, and will not be described again here.

[0087] Comparative Examples 1-4 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 600 hours, the detection method is the same as that in Comparative Example 1-1, and will not be described again here.

[0088] Comparative Example 2-1 This comparative example provides a method for detecting defects in an electrochromic component. Except for the driving voltage amplitude of 1.5V, the detection method is the same as that in Example 1, and will not be described again here.

[0089] Comparative Example 2-2 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 400 hours, the detection method is the same as that in Comparative Example 2, and will not be described again here.

[0090] Comparative Examples 2-3 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 500 hours, the detection method is the same as that in Comparative Example 2, and will not be described again here.

[0091] Comparative Examples 2-4 This comparative example provides a method for detecting defects in an electrochromic component. Except for the defect accelerated exposure treatment time of 600 hours, the detection method is the same as that in Comparative Example 2, and will not be described again here.

[0092] Microscopic examination was performed on the electrochromic components after the above-mentioned accelerated exposure treatment of defects. For each method, 10 random samples were taken, and it was recorded whether the hidden microscopic pinhole defects and halo defects could be detected (if one of the 10 samples could detect the above defects, the method was considered to have achieved the exposure of the potential defects in the sample).

[0093] Table 1 As can be seen from Examples 1-3, the method for detecting defects in electrochromic components provided by the present invention can expose potential micro-defects in a short time, simulate the failure modes that electrochromic glass may experience during long-term use, and thus quickly identify products with potential quality problems.

[0094] The present invention has been illustrated with the above embodiments to illustrate its detailed features, but the present invention is not limited to the above detailed features, that is, it does not mean that the present invention must rely on the above detailed features to be implemented. Those skilled in the art should understand that any improvements to the present invention, equivalent substitutions for the selected technical features, additions of auxiliary technical features, and selection of specific methods, etc., all fall within the protection scope and disclosure scope of the present invention.

Claims

1. A method for detecting defects in an electrochromic component, characterized in that, The detection method includes the following steps: Defects in the electrochromic components are accelerated and exposed before defect detection is performed. The defect acceleration exposure process includes: placing the electrochromic component in an environment at a first temperature, and applying a driving voltage with a cyclically changing voltage value to the electrochromic component, wherein the amplitude of the driving voltage is higher than the operating voltage of the electrochromic component, so as to switch the electrochromic component between a colored state and a faded state. The first temperature is ≥40℃.

2. The detection method according to claim 1, characterized in that, The first temperature range is 40~100℃.

3. The detection method according to claim 1 or 2, characterized in that, The amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component.

4. The detection method according to any one of claims 1 to 3, characterized in that, The operating voltage of the electrochromic component is 1~2V; Preferably, the amplitude of the driving voltage is 1.1~2.4V.

5. The detection method according to any one of claims 1 to 4, characterized in that, The duration of a single cycle in the driving voltage is 1 to 30 minutes.

6. The detection method according to any one of claims 1 to 5, characterized in that, The humidity of the environment during the accelerated exposure treatment of defects is 75-90%RH.

7. The detection method according to any one of claims 1 to 6, characterized in that, The duration of the accelerated defect exposure process is 2 to 500 hours.

8. The detection method according to any one of claims 1 to 7, characterized in that, The electrochromic component includes a first transparent conductive layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and a second transparent conductive layer stacked sequentially.

9. The detection method according to any one of claims 1 to 8, characterized in that, The defect detection includes any one or a combination of at least two of the following: electrical testing, appearance testing, or electrochromic performance testing.

10. The detection method according to any one of claims 1 to 9, characterized in that, The detection method includes: The electrochromic component is cleaned to obtain a cleaned electrochromic component. The cleaned electrochromic component was placed in a test environment with a controlled first temperature of 40~100℃ and a humidity of 75~90%RH. In the test environment, the electrochromic component is subjected to accelerated defect exposure treatment. The accelerated defect exposure treatment includes applying a driving voltage with a cyclically changing voltage value to the electrochromic component to switch between a colored state and a faded state. The amplitude of the driving voltage is 1.1 to 1.2 times the operating voltage of the electrochromic component, the duration of a single cycle is 1 to 30 minutes, and the duration of the accelerated defect exposure treatment is 2 to 500 hours. The electrochromic component after the defect accelerated exposure treatment is then subjected to defect detection, which includes any one or a combination of at least two of electrical testing, appearance testing, or electrochromic performance testing.

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