A parameterized design method of a reflection system for increasing the amount of daylight
By constructing a parametric platform and dynamically adjusting the parameters of the reflectors, the problem of insufficient sunlight in the ground floor spaces of old urban areas was solved, achieving efficient and economical redistribution of sunlight resources and meeting the requirements of design specifications.
CN122452166APending Publication Date: 2026-07-24CITIC GENERAL INST OF ARCHITECTURAL DESIGN & RES
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CITIC GENERAL INST OF ARCHITECTURAL DESIGN & RES
- Filing Date
- 2026-05-28
- Publication Date
- 2026-07-24
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Figure CN122452166A_ABST
Abstract
The present application relates to a kind of improved bottom sunlight amount of reflection system parameterization design method, device, equipment and storage medium, wherein improved bottom sunlight amount of reflection system parameterization design method includes the following steps: constructing parameterization platform;Parameterization platform is based on the weather file of preestablished, and the facade of the project volume simulation model is obtained in the light-rich area and the light-scarce area;Select the preliminary parameter of reflection system;Extract the direct sunlight unit vector set in weather file, obtain the light spot area reflected to facade at any time;Based on the position and size of light spot area, parameterization platform adjusts the preliminary parameter of reflection system, obtains the optimal parameter of reflection system at any time;Based on parameterization platform and weather file, the optimal parameter of reflection system at any time can be obtained, so that machine can automatically adjust the pitch angle and horizontal azimuth angle of reflector according to optimal parameter, without real-time recalculation and manual intervention, can respond to the annual change of sunlight in real time.
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