A method for verifying the quality of cleaning cuvettes

By performing cleanliness verification and spectral analysis after cleaning the cuvettes, absorbance deviations and contamination types can be determined, and appropriate cleaning strategies can be selected. This solves the problem of difficulty in verifying the cleaning effect of cuvettes, improves detection accuracy and data reliability, and reduces the risk of cross-contamination and improper cleaning.

CN123029043APending Publication Date: 2026-11-03KECHUANG STARLIGHT (BEIJING) TECH CO LTD
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Patent Information

Application Number
CN202611241131.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-08-17
Publication Date
2026-11-03

AI Technical Summary

Technical Problem

In the fields of power plant boiler feedwater, semiconductor ultrapure water production, and pharmaceutical water, existing technologies cannot effectively verify the cleaning effect of cuvettes in silicate analysis, leading to the accumulation of trace residues that cause drift in test results and cross-contamination, affecting the accuracy of detection and the reliability of data.

Method used

After cleaning the cuvettes, cleanliness is verified by obtaining absorbance and spectral data. The absorbance deviation is determined, and the contamination deviation level and residue type are determined based on the deviation and spectral data. Appropriate cleaning strategies are then selected, including additional cleaning or targeted chemical cleaning, to ensure that the cuvettes reach a qualified state.

Benefits of technology

It effectively reduces the risk of cross-contamination between batches and drift in test results, improves the detection accuracy and data traceability of silicate analysis, reduces waste of cleaning agents and time consumption, promptly identifies irreversible contamination risks, and avoids unplanned downtime.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application relates to the technical field of cleaning quality verification, in particular to a method for verifying the cleaning quality of a cuvette, which comprises the following steps: in response to a regular cleaning completion message of the cuvette, verifying the cleanliness of the cuvette to obtain cleanliness verification data including verification absorbance and verification spectrum data; determining an absorbance deviation amount based on the verification absorbance and a preset reference absorbance, and judging whether the absorbance deviation amount is within a preset qualified threshold range; if yes, generating a corresponding release instruction of the cuvette to allow the cuvette to enter a next sample detection cycle; if not, determining a pollution deviation level and a residue type of the cuvette according to the absorbance deviation amount and the verification spectrum data; and determining a corresponding cleaning strategy of the cuvette based on the pollution deviation level and the residue type to clean the cuvette. The application has the effect of improving the detection accuracy and data reliability of silicate analysis.
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Description

Technical Field

[0001] This application relates to the technical field of cleaning quality verification, and in particular to a method for verifying the cleaning quality of cuvettes. Background Technology

[0002] In fields such as power plant boiler feedwater, semiconductor ultrapure water production, and pharmaceutical water, silicate content is one of the key indicators for water quality monitoring. Online silicate analyzers typically use the silicomolybdenum blue spectrophotometric method for detection. The cuvette, as a core optical component, directly affects the accuracy and stability of the test results due to its cleanliness. During continuous testing, the silicomolybdenum blue and other colorimetric products generated by the colorimetric reaction can adhere to the inner wall of the cuvette, forming residual contamination and leading to batch-to-batch cross-contamination and systemic bias.

[0003] Currently, after a silicate ion test, cuvettes are typically cleaned according to a pre-set, fixed cleaning procedure, including draining, rinsing with pure water, and air drying. After cleaning, they proceed to the next sample testing cycle. However, even after thorough cleaning, trace amounts of the silicomolybdenum blue chromogenic product may remain, invisible to the naked eye, adhering to the inner wall of the cuvette. Due to a lack of verification of the cleaning effectiveness, these trace residues gradually accumulate over multiple batches of testing, causing result drift and making it impossible to trace the cause. Only when the residual contamination reaches a certain level will it be discovered by operators through abnormal data or routine maintenance. By this time, the reliability of a large amount of test data has already been affected, indicating room for improvement. Summary of the Invention

[0004] To improve the detection accuracy and data reliability of silicate analysis, this application provides a method for verifying the quality of cuvette cleaning.

[0005] The above-mentioned inventive objective of this application is achieved through the following technical solutions:

[0006] A method for verifying the quality of cuvette cleaning, applied to a silicate analysis device, the method comprising:

[0007] In response to the message indicating that routine cleaning of the cuvette is complete, the cuvette is subjected to cleanliness verification to obtain cleanliness verification data, which includes at least verification absorbance and verification spectral data.

[0008] Based on the verified absorbance and the preset reference absorbance, the absorbance deviation is determined, and it is determined whether the absorbance deviation is within the preset qualified threshold range.

[0009] If the absorbance deviation is within the acceptable threshold range, a release instruction is generated for the cuvette to allow it to enter the next sample testing cycle.

[0010] If the absorbance deviation is not within the acceptable threshold range, the contamination deviation level and residue type of the cuvette are determined based on the absorbance deviation and the verification spectral data.

[0011] Based on the contamination deviation level and the residue type, a cleaning strategy is determined for the cuvette to be cleaned.

[0012] By adopting the above technical solution, after routine cleaning, the cleanliness of the cuvettes is verified and the verification absorbance is obtained. The verification absorbance is compared with the preset benchmark absorbance to obtain the absorbance deviation. When the absorbance deviation is not within the qualified threshold range, the contamination deviation level is determined based on the absorbance deviation, and the type of residue is determined by combining the verification spectral data. Then, based on the contamination deviation level and the type of residue, the corresponding cleaning strategy is automatically selected. It can decide whether to release or take targeted cleaning measures based on the actual cleanliness status of the cuvettes after cleaning, thereby reducing the risk of cross-contamination between batches and drift of test results caused by the accumulation of trace residues, and improving the detection accuracy and data traceability of silicate analysis.

[0013] In a preferred embodiment, this application can be further configured such that: the cuvette undergoes cleanliness verification to obtain cleanliness verification data for the cuvette, specifically including:

[0014] A verification reagent is injected into the cuvette, and an optical bubble detection is performed on the cuvette to detect whether there are interfering bubbles in the optical path area of ​​the cuvette, and the optical bubble detection result is obtained.

[0015] If the optical path bubble detection result indicates that there are no interfering bubbles in the optical path area of ​​the cuvette, then the temperature of the cuvette is controlled and the temperature of the cuvette is detected.

[0016] After the cuvette reaches the preset detection temperature, the transmitted light signal of the verification reagent is acquired by using the preset silicate detection characteristic wavelength, and the absorbance is calculated based on the transmitted light signal to obtain the verification absorbance.

[0017] The set broadband light source is activated to collect the continuous broadband light signal that penetrates the verification reagent, and the characteristic spectrum of the preset band range is extracted from the continuous broadband light signal as the verification spectral data;

[0018] If the optical path bubble detection result indicates that there are interfering bubbles in the optical path area of ​​the cuvette, a bubble removal operation command is triggered to remove the interfering bubbles until the optical path area of ​​the cuvette is bubble-free.

[0019] By adopting the above technical solution, after injecting the validation reagent, optical bubble detection is performed, and a bubble removal operation is triggered when a bubble is detected. The transmitted light signal is collected and converted into validation absorbance only after the temperature reaches the preset detection temperature. Then, a broadband light source is activated to collect continuous broadband light signals and extract characteristic spectra as validation spectral data. This ensures that the cleanliness validation is carried out under conditions of no bubble interference and stable temperature, so that the validation conditions are consistent with the actual silicate detection conditions. The cleanliness validation results can reflect the optical state of the cuvette during actual detection, and at the same time provide a complete spectral information basis for subsequent residue type identification, thereby improving the accuracy of identifying different types of residues.

[0020] In a preferred embodiment, this application can be further configured as follows: determining the absorbance deviation based on the verified absorbance and the preset reference absorbance, and judging whether the absorbance deviation is within a preset acceptable threshold range, specifically includes:

[0021] The difference between the verified absorbance and the preset reference absorbance is calculated to obtain the absorbance deviation.

[0022] Obtain a preset optimal cleanliness threshold and determine whether the absorbance deviation is less than or equal to the optimal cleanliness threshold;

[0023] If the absorbance deviation is less than or equal to the optimal cleanliness threshold, then the absorbance deviation is determined to be within the preset qualified threshold range.

[0024] If the absorbance deviation is greater than the optimal cleanliness threshold, then the absorbance deviation is determined to be outside the preset acceptable threshold range.

[0025] By adopting the above technical solution, the absorbance deviation is obtained by calculating the difference between the verified absorbance and the preset reference absorbance. The result of comparing the absorbance deviation with the optimal cleanliness threshold determines whether it is within the qualified threshold range. This achieves a quantitative characterization and objective quantitative assessment of the degree of deviation of the cleanliness of the cuvette from the clean state after cleaning, providing a clear basis for subsequent release or further processing.

[0026] In a preferred embodiment, this application can be further configured such that, after the step of generating a release instruction corresponding to the cuvette to allow the cuvette to enter the next sample testing cycle, the cuvette cleaning quality verification method further includes:

[0027] The absorbance of the cuvette under the current qualified state is obtained and used as the current background absorbance;

[0028] The background drift of the cuvette is obtained by calculating the difference between the current background absorbance and the preset initial background absorbance.

[0029] Obtain the current cleaning execution data of the cuvette, and calculate the life consumption index of the cuvette based on the background drift amount and the current cleaning execution data. The current cleaning execution data includes at least the total number of cumulative cleanings.

[0030] Obtain a preset lifespan warning threshold and determine whether the lifespan consumption index is greater than or equal to the lifespan warning threshold.

[0031] If the lifespan consumption index is greater than or equal to the lifespan warning threshold, a replacement warning message corresponding to the cuvette is generated.

[0032] If the lifespan consumption index is less than the lifespan warning threshold, the cuvette will maintain its current normal operating status.

[0033] By adopting the above technical solution, the background drift is calculated by obtaining the verification absorbance under the qualified state as the current background absorbance and calculating it with the preset initial background absorbance. The lifespan consumption index is calculated by combining the current cleaning execution data, including the total number of cumulative cleanings. When the lifespan consumption index reaches the warning threshold, a replacement warning message is generated. This enables continuous tracking of the long-term evolution trend of the cuvette's optical performance and comprehensive lifespan assessment of multiple factors. It can provide early warning before the cuvette's performance deteriorates and affects the detection accuracy, thereby reducing the probability of unplanned downtime and data reliability problems caused by sudden failures.

[0034] In a preferred embodiment, this application can be further configured such that: determining the contamination deviation level and residue type of the cuvette based on the absorbance deviation and the verification spectral data specifically includes:

[0035] Obtain a preset severe contamination threshold, and determine whether the absorbance deviation is greater than the severe contamination threshold, wherein the severe contamination threshold is greater than the optimal cleanliness threshold;

[0036] If the absorbance deviation is less than or equal to the severe contamination threshold, the contamination deviation level of the cuvette is determined to be a slight deviation level.

[0037] If the absorbance deviation is greater than the severe contamination threshold, the contamination deviation level of the cuvette is determined to be severe contamination level;

[0038] Obtain preset reference spectral data, and perform differential processing on the verification spectral data and the preset reference spectral data to obtain the residue absorption difference spectrum;

[0039] Peak-finding processing is performed on the absorption difference spectrum of the residue to determine at least one target absorption peak, and the peak position wavelength corresponding to the target absorption peak is obtained based on the target absorption peak.

[0040] The peak wavelength is compared with a preset spectral feature library to determine the type of residue in the cuvette.

[0041] By adopting the above technical solution, the degree of contamination is classified into slight deviation level or severe contamination level by comparing the absorbance deviation with the severe contamination threshold. The verification spectral data and the preset reference spectral data are differentially processed to obtain the residual absorption difference spectrum. Peak-finding processing is performed on the residual absorption difference spectrum to obtain the peak position wavelength of the target absorption peak and match it with the preset spectral feature library. This realizes the classification of the contamination degree of the cuvette and the identification of different types of residues such as silicomolybdenum blue, silicomolybdenum yellow and organic matter. This provides a classification basis and residue characteristic information for subsequent selection of cleaning strategies with different intensities and chemical properties, thereby reducing the low cleaning efficiency caused by using a general cleaning solution to treat all residues indiscriminately.

[0042] In a preferred embodiment, this application can be further configured such that: the step of performing feature matching and comparison between the peak wavelength and a preset spectral feature library to determine the residue type of the cuvette specifically includes:

[0043] Determine the preset characteristic range to which the peak wavelength belongs, wherein the preset characteristic range includes at least the silicomolybdenum blue characteristic region, the silicomolybdenum yellow characteristic region, and the ultraviolet organic compound characteristic region;

[0044] If the peak wavelength falls within the characteristic region of the silicomolybdenum blue, then the residue type of the cuvette is determined to be silicomolybdenum blue residue.

[0045] If the peak wavelength falls within the characteristic region of the molybdenum yellow silica, then the residue type of the cuvette is determined to be molybdenum yellow silica residue.

[0046] If the peak wavelength falls within the ultraviolet organic characteristic region, then the residue type of the cuvette is determined to be an organic residue type.

[0047] By adopting the above technical solution, the type of residue can be directly determined by judging the preset characteristic range to which the peak wavelength belongs and by the characteristic range into which the peak wavelength falls. This utilizes the differences of different residues in the spectral characteristic range, and achieves rapid determination of residue type without the need for complex pattern recognition algorithms. This provides clear guidance for selecting the corresponding chemical cleaning agent based on the type of residue.

[0048] In a preferred embodiment, this application can be further configured as follows: the peak-finding processing of the residual absorption difference spectrum to determine at least one target absorption peak, and the obtaining of the peak position wavelength corresponding to the target absorption peak based on the target absorption peak, specifically includes:

[0049] If multiple target absorption peaks are identified, the peak height value corresponding to each target absorption peak is obtained respectively;

[0050] The target absorption peak with the largest peak height value is marked as the main pollution absorption peak, and the other target absorption peaks besides the main pollution absorption peak are marked as minor pollution absorption peaks.

[0051] Based on the peak wavelengths corresponding to the main pollution absorption peaks, the main residue types of the cuvettes are determined.

[0052] Based on the peak wavelength corresponding to the absorption peak of the minor contaminant, the type of minor residue in the cuvette is determined;

[0053] When determining the cleaning strategy corresponding to the cuvette, a serial combined cleaning strategy is generated. The serial combined cleaning strategy is used to prioritize cleaning the main residue type and then clean the secondary residue type after cleaning is completed.

[0054] By adopting the above technical solution, by obtaining the peak height values ​​of multiple target absorption peaks and marking the peak with the largest peak height as the main pollution absorption peak, the main residue type and secondary residue type are determined respectively, and a serial combination cleaning strategy that prioritizes cleaning the main residue type is generated. This achieves detailed classification and step-by-step treatment of mixed residual pollution, thereby reducing the mutual interference that may occur between different cleaning agents when treating multiple residues at the same time.

[0055] In a preferred embodiment, this application can be further configured such that: determining the cleaning strategy corresponding to the cuvette based on the contamination deviation level and the residue type specifically includes:

[0056] If the contamination deviation level is the slight deviation level, an additional cleaning strategy is generated for the cuvette, and the additional cleaning strategy includes at least a preset pure water pulse rinsing operation.

[0057] If the pollution deviation level is the severe pollution level, then according to the type of residue, a target chemical cleaning formula corresponding to the type of residue is obtained from a preset targeted cleaning formula library;

[0058] If the residue type is the same as the silicomolybdenum blue residue type, then obtain the formulation containing the alkaline cleaning agent parameters as the target chemical cleaning formulation;

[0059] If the residue type is the same as the molybdenum yellow residue type, then obtain the formulation containing the acid cleaning agent parameters as the target chemical cleaning formulation;

[0060] If the type of residue is the organic residue type, then the formula containing the organic solvent cleaning agent parameters is obtained as the target chemical cleaning formula;

[0061] Based on the acquired target chemical cleaning formula and preset temperature auxiliary parameters, a targeted chemical cleaning strategy is generated for the cuvette to clean it.

[0062] By adopting the above technical solution, and by distinguishing between minor deviation and severe pollution according to the pollution deviation level, and generating additional cleaning strategies and targeted chemical cleaning strategies respectively, in the case of severe pollution, the corresponding chemical cleaning agent parameters are obtained from the targeted cleaning formula library according to the type of residue, and the targeted chemical cleaning strategy is generated by combining temperature auxiliary parameters. This achieves the matching of cleaning intensity and pollution degree and the selective dissolution of specific residues by different chemical cleaning agents. It utilizes the chemical targeting of alkaline cleaning agents to silicomolybdenum blue, acidic cleaning agents to silicomolybdenum yellow, and organic solvents to organic matter, thereby improving the cleaning success rate in the case of severe pollution and reducing the waste of reagents and time caused by over-cleaning for minor residues.

[0063] In a preferred embodiment, this application can be further configured as follows: the generation of a targeted chemical cleaning strategy corresponding to the cuvette based on the acquired target chemical cleaning formula and preset temperature auxiliary parameters specifically includes:

[0064] The cuvette was subjected to an immersion cleaning operation according to the target chemical cleaning formula and the temperature auxiliary parameters.

[0065] During the soaking and cleaning process, the dynamic absorbance of the cuvette at the peak wavelength of the target absorption peak is periodically collected at preset time intervals.

[0066] The residue decay curve of the cuvette is generated based on the dynamic absorbance, and it is determined whether the current value of the residue decay curve is less than a preset safety threshold.

[0067] If the current value of the residue decay curve is less than the preset safety threshold, an early termination cleaning command is generated to end the soaking cleaning operation and trigger a pure water rinsing and replacement operation.

[0068] If the current value of the residue decay curve is greater than or equal to the preset safety threshold, the soaking and cleaning operation will continue to be performed until the preset maximum soaking time.

[0069] By adopting the above technical solution, the dynamic absorbance at the peak wavelength of the target absorption peak is periodically collected at preset time intervals during the immersion cleaning operation, and a residue decay curve is generated. When the current value of the residue decay curve drops below the safety threshold, an early termination cleaning command is generated, which realizes quantitative evaluation of the cleaning progress and dynamic cleaning control based on real-time residue concentration. The immersion can be stopped immediately after the cleaning target is achieved and the operation is switched to pure water rinsing and replacement, thereby saving cleaning agent consumption and cleaning time, and reducing the risk of long-term exposure of chemical cleaning agents to the optical surface of the contrast cuvette.

[0070] In a preferred embodiment, this application can be further configured such that, after the step of determining the cleaning strategy corresponding to the cuvette based on the contamination deviation level and the residue type, the cuvette cleaning quality verification method further includes:

[0071] After the cleaning is completed, the cleanliness of the cuvette is verified, and the number of times the cuvette has been cleaned is obtained during each cleanliness verification. It is then determined whether the number of times the cuvette has been cleaned is less than the preset maximum number of cleaning times.

[0072] If the number of cleaning operations performed is less than the maximum number of cleaning operations, then it is determined whether the current absorbance deviation of the cuvette is within the acceptable threshold range.

[0073] If the number of cleaning operations performed is greater than or equal to the maximum number of cleaning operations, and the current absorbance deviation determined in the current cycle is still not within the acceptable threshold range, then it is determined that the cuvette has an irreversible contamination risk, and a failure lockout command and maintenance alarm information are generated simultaneously.

[0074] The failure lock command changes the operating status of the cuvette to a prohibited state.

[0075] By employing the above technical solution, after cleaning, the number of cleaning cycles performed is compared with a preset maximum cleaning limit. When the maximum number of cleaning cycles is reached and the current absorbance deviation is still not within the acceptable threshold range, an irreversible contamination risk is identified for the cuvette, generating a failure lockout command and maintenance alarm information. This identifies cleaning failures that may be caused by permanent scratches, corrosion, or strongly adsorbed contaminants on the cuvette surface. By promptly preventing cuvettes with irreversible contamination risk from continuing to participate in sample testing and changing their operating status to a prohibited-use state, the risk of inaccurate test data and quality accidents caused by using failed cuvettes is reduced.

[0076] In summary, this application includes at least one of the following beneficial technical effects:

[0077] 1. After routine cleaning, the cleanliness of the cuvettes is verified and the verification absorbance is obtained. The verification absorbance is compared with the preset benchmark absorbance to obtain the absorbance deviation. When the absorbance deviation is not within the acceptable threshold range, the contamination deviation level is determined based on the absorbance deviation and the type of residue is determined in combination with the verification spectral data. Then, the corresponding cleaning strategy is automatically selected based on the contamination deviation level and the type of residue. It can decide whether to release or take targeted cleaning measures based on the actual cleanliness status of the cuvettes after cleaning, thereby reducing the risk of cross-contamination between batches and drift of test results caused by the accumulation of trace residues, and improving the detection accuracy and data traceability of silicate analysis.

[0078] 2. By obtaining the peak height values ​​of multiple target absorption peaks and marking the peak with the largest peak height as the main pollution absorption peak, the main residue type and secondary residue type are determined respectively, and a serial combination cleaning strategy that prioritizes cleaning the main residue type is generated. This achieves detailed classification and step-by-step treatment of mixed residual pollution, thereby reducing the mutual interference that may occur between different cleaning agents when treating multiple residues at the same time.

[0079] 3. By comparing the number of cleaning cycles performed after cleaning with the preset maximum cleaning limit, if the maximum number of cleaning cycles is reached and the current absorbance deviation is still not within the acceptable threshold range, an irreversible contamination risk is identified for the cuvette. A failure lockout command and maintenance alarm are then generated, identifying cleaning failures that may be caused by permanent scratches, corrosion, or strongly adsorbed contaminants on the cuvette surface. By promptly preventing cuvettes with irreversible contamination risk from continuing to participate in sample testing and changing their operating status to a prohibited-use state, the risk of inaccurate test data and quality accidents caused by using failed cuvettes is reduced. Attached Figure Description

[0080] Figure 1 This is a flowchart illustrating the implementation of a cuvette cleaning quality verification method in one embodiment of this application.

[0081] Figure 2 This is another implementation flowchart of a cuvette cleaning quality verification method according to one embodiment of this application;

[0082] Figure 3 This is another implementation flowchart of a cuvette cleaning quality verification method in one embodiment of this application. Detailed Implementation

[0083] The following embodiments will help those skilled in the art to further understand the function of this application, but do not limit this application in any way. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of this application. These all fall within the protection scope of this application.

[0084] In the following description, specific details such as particular system architectures and techniques are set forth for illustrative purposes and not for limitation, in order to provide a thorough understanding of the embodiments of this application. However, those skilled in the art will understand that this application may also be implemented in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, apparatuses, circuits, and methods have been omitted so as not to obscure the description of this application with unnecessary detail.

[0085] It should be understood that, when used in this application specification and the appended claims, the term "comprising" indicates the presence of the described features, integrals, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components and / or a collection thereof.

[0086] The present application will be further described in detail below with reference to the accompanying drawings.

[0087] In one embodiment, such as Figure 1 As shown, this application discloses a method for verifying the quality of cuvette cleaning, applied to a silicate analysis device. The method specifically includes the following steps:

[0088] S10. In response to the message that the routine cleaning of the cuvette is completed, perform cleanliness verification on the cuvette and obtain cleanliness verification data of the cuvette. The cleanliness verification data includes at least the verification absorbance and verification spectral data.

[0089] Specifically, the "routine cuvette cleaning complete message" refers to the process status information generated after the routine cleaning action following a sample test. Cleanliness verification refers to the process of testing the current optical state of the cuvette before it enters the next sample testing cycle. Verification absorbance refers to the absorbance value measured by the verification medium after cleaning. Verification spectral data refers to the set of optical response data obtained at multiple wavelengths or continuous bands after cleaning. Upon receiving the "routine cuvette cleaning complete message," the next sample injection is paused, and the cuvette status is marked as pending verification. Subsequently, the optical measurement data of the cuvette under verification conditions is acquired, and the verification absorbance, verification spectral data, verification time, cuvette identification, and testing conditions are uniformly written into the same cleanliness verification data record. For example, after a silicate test is completed and routine cleaning is finished, the verification absorbance and corresponding spectral data for cuvette number CUV001 within the current verification cycle are obtained. This provides data input under the same time reference for subsequent deviation calculations and residue judgments.

[0090] S20. Based on the verified absorbance and the preset reference absorbance, determine the absorbance deviation and determine whether the absorbance deviation is within the preset qualified threshold range.

[0091] Specifically, the preset reference absorbance refers to the pre-established absorbance reference value when the cuvette is in a clean state that can be used as a reference. This reference value is stored in association with the cuvette label. The absorbance deviation refers to the difference between the current verified absorbance and the preset reference absorbance. The acceptable threshold range refers to the absorbance deviation range within which the cuvette is allowed to enter the next sample testing cycle. The verified absorbance is read from the cleanliness verification data, and the corresponding preset reference absorbance is retrieved according to the cuvette label. The difference between the verified absorbance and the preset reference absorbance is calculated to obtain the absorbance deviation. Then, the absorbance deviation is compared with the acceptable threshold range. If the absorbance deviation falls within the acceptable threshold range, it means that the optical deviation after cleaning is within the allowable range. If the absorbance deviation does not fall within the acceptable threshold range, it means that the optical deviation after cleaning exceeds the allowable range. For example, if the preset reference absorbance is 0.0450 and the verified absorbance is 0.0462, then the absorbance deviation is 0.0012. This value can be used to determine whether to release the sample.

[0092] S30. If the absorbance deviation is within the acceptable threshold range, a release instruction is generated for the cuvette to allow it to enter the next sample testing cycle.

[0093] Specifically, a release instruction refers to a control instruction that allows continued testing after the cuvette cleaning quality verification is passed. If the absorbance deviation obtained in step S20 is within the acceptable threshold range, the cuvette status is updated from the pending verification state to the detectable state, and a release instruction corresponding to the cuvette is generated. Subsequently, the next sample testing task is allowed to call the cuvette for sample injection and measurement. At the same time, the verification absorbance and absorbance deviation on which this release is based are recorded in the cuvette's operation record. For example, if the absorbance deviation of cuvette CUV001 is 0.0012 and is within the acceptable threshold range, a release instruction for CUV001 is generated, allowing the next batch of boiler feedwater samples to enter the testing cycle.

[0094] S40. If the absorbance deviation is not within the acceptable threshold range, the contamination deviation level and residue type of the cuvette shall be determined based on the absorbance deviation and the verification spectral data.

[0095] Specifically, the contamination deviation level refers to the classification of contamination degree determined by the magnitude of the absorbance deviation, and the residue type refers to the contaminant category determined by the spectral response characteristics reflected by the verification spectral data. If the absorbance deviation obtained in step S20 is not within the acceptable threshold range, the absorbance deviation is first compared with the preset contamination classification conditions to obtain the contamination deviation level representing the degree of contamination. Then, the verification spectral data is compared with the preset spectral reference information to obtain the residue type representing the nature of the contaminant. The contamination deviation level and the residue type are used together as inputs for subsequent cleaning strategy selection. For example, if the absorbance deviation is small but exceeds the acceptable threshold range, it can be determined as a low degree of deviation. If the verification spectral data has a response corresponding to the colorimetric product residue in a specific wavelength band, the residue type can be determined as the corresponding colorimetric residue type.

[0096] S50. Based on the contamination deviation level and residue type, determine the corresponding cleaning strategy for the cuvette and clean the cuvette accordingly.

[0097] Specifically, a cleaning strategy refers to a set of subsequent cleaning actions generated based on the degree of contamination and the properties of the residue. This set of cleaning actions may include control elements such as cleaning method, cleaning medium, cleaning duration, cleaning temperature, and whether re-verification is required. The contamination deviation level and residue type obtained in step S40 are input into the cleaning strategy matching rules. If the contamination deviation level is low, a cleaning strategy with lower intensity is prioritized. If the contamination deviation level is high, a targeted cleaning strategy is determined based on the residue type. After the cleaning strategy is determined, the cuvettes are cleaned according to the strategy, and the cleanliness verification process is repeated after cleaning. For example, when the contamination deviation level is low and the residue type does not exhibit complex contamination characteristics, an additional cleaning strategy can be determined. When the contamination deviation level is high and the residue type has clear spectral characteristics, a targeted cleaning strategy corresponding to that residue type can be determined.

[0098] In one embodiment, step S10, namely, verifying the cleanliness of the cuvettes to obtain cleanliness verification data, includes:

[0099] S11. Inject the verification reagent into the cuvette and perform optical bubble detection on the cuvette to detect whether there are interfering bubbles in the optical path area of ​​the cuvette, and obtain the optical bubble detection result.

[0100] Specifically, the verification reagent refers to the liquid medium used to verify the cleanliness of the cuvette after cleaning. It can be ultrapure water or a blank reagent adapted to the silicate detection conditions. The optical path area refers to the effective measurement area through which the detection beam passes through the cuvette. Interference bubbles refer to bubbles located within the optical path area that can change the path of transmitted light or cause light scattering. The optical path bubble detection result refers to the detection conclusion made on whether interference bubbles exist in the optical path area. First, a preset volume of verification reagent is injected into the cuvette. This preset volume can be 100%-120% of the effective volume of the cuvette, so that the verification reagent covers the detection optical path. Then, the presence of bubbles in the optical path area is determined by image acquisition, transmitted light fluctuation detection, or scattered light detection. If the detected bubble is located in the area through which the beam passes and its size reaches the preset influence range, an optical path bubble detection result indicating the presence of interference bubbles is generated. If no bubbles affecting the optical path are detected, an optical path bubble detection result indicating the absence of interference bubbles is generated. For example, if a small bubble with a diameter greater than 0.1 mm is formed on the side wall of the cuvette after the verification reagent is injected, but the bubble is not located within the detection beam area, it can be disregarded as an interference bubble.

[0101] S12. If the light path bubble detection result shows that there are no interfering bubbles in the light path area of ​​the cuvette, then the temperature of the cuvette is controlled and the temperature of the cuvette is detected.

[0102] Specifically, temperature control refers to the process of adjusting the cuvette and its internal verification reagents to near the preset detection temperature. The preset detection temperature refers to the temperature conditions that match the silicate detection conditions. Temperature detection refers to the process of acquiring the temperature sensor value near the cuvette or cuvette holder. If the optical bubble detection result obtained in step S11 indicates that there are no interfering bubbles, the temperature adjustment action is initiated, gradually bringing the cuvette temperature closer to the preset detection temperature. Temperature sensor values ​​are read at preset time intervals, and the continuously collected temperature values ​​are formed into a temperature time series. When the difference between the maximum and minimum values ​​of the temperature time series within the preset time window is less than the preset fluctuation limit, it is determined that the cuvette temperature has reached a stable state. For example, if the preset detection temperature is 25℃±0.5℃, and the temperature remains between 24.98℃ and 25.03℃ for 20 consecutive seconds, it can be determined that the temperature has reached a stable state near the preset detection temperature.

[0103] S13. After the cuvette reaches the preset detection temperature, the transmitted light signal of the verification reagent is collected through the preset silicate detection characteristic wavelength, and the absorbance is calculated based on the transmitted light signal to obtain the verification absorbance.

[0104] Specifically, the characteristic wavelength for silicate detection refers to a specific wavelength or wavelength range used for photometric measurement of silicate colorimetric products. The transmitted light signal refers to the light intensity signal received by the photodetector after the detection light passes through the cuvette and the verification reagent. The transmitted light signal includes the dark current signal, the reference light intensity signal, and the transmitted light intensity signal. The dark current signal refers to the current or voltage signal output by the photodetector, such as a photodiode or photomultiplier tube, under conditions of no light irradiation. This signal reflects the inherent noise and dark current of the detector. The reference light intensity signal refers to the light intensity signal of the light emitted by the light source reaching the detector after passing through the cuvette or a reference cuvette containing a reference solution. This signal reflects the light source intensity and optical path transmission efficiency. The transmitted light intensity signal refers to the light intensity signal of the light emitted by the light source reaching the detector after passing through the verification reagent. The attenuation of this signal reflects the absorption of light by the verification reagent and the residue on the inner wall of the cuvette. The absorbance conversion calculation refers to the calculation process of converting the transmitted light signal into an absorbance value. After the cuvette reaches the preset detection temperature, firstly, turn off all light sources and acquire the dark current signal corresponding to the current measurement conditions. Secondly, turn on the light sources and acquire the reference light intensity signal in an empty optical path or using a standard reference channel. Then, place the cuvette containing the verification reagent in the optical path or keep the cuvette in the optical path and acquire the transmitted light intensity signal. By repeating the above acquisition process, with each acquisition interval of 10-50 milliseconds, and taking the average value, the dark current signal I is obtained. dark Reference light intensity signal I ref and transmitted light intensity signal I verify According to formula T verify =(I verify-I dark ) / (I ref -I dark The verified transmittance T was calculated. verify The transmittance is defined as the ratio of the transmitted light intensity signal to the reference light intensity signal after removing the influence of the dark current signal. This ratio reflects the transmittance after light passes through the verification reagents and cuvettes. Then, according to Lambert-Beer's law, the transmittance is calculated using formula A. verify =-log 10 (T verify The verification absorbance is calculated. Verification absorbance refers to the degree to which the reagents and residues on the inner wall of the cuvette absorb light of a specific wavelength. A higher value indicates greater light attenuation. For example, if the dark signal is 100, the reference signal is 50000, and the transmitted light signal is 45000, the transmittance is first calculated as 44900 divided by 49900. This transmittance is then converted to verification absorbance, which is recorded in the cleanliness verification data.

[0105] S14. Activate the set broadband light source, collect the continuous broadband light signal that penetrates the reagent for verification, and extract the characteristic spectrum of the preset band range from the continuous broadband light signal as the verification spectral data.

[0106] Specifically, a broadband light source refers to a light source capable of outputting continuous wavelength light, such as a xenon lamp, halogen tungsten lamp, or white LED. A continuous broadband light signal refers to the collection of light intensities formed at multiple wavelengths after passing through a cuvette and the reagents used for verification. A preset wavelength range refers to a pre-defined wavelength range used to identify the spectral characteristics of different residues, represented as {(λ1, I(λ1)), (λ2, I(λ2)), ..., (λ... n ,I(λ n In this context, λ represents the wavelength, and I(λ) represents the transmitted light intensity at that wavelength. The wavelength range covers 250 nm to 800 nm, and the wavelength sampling interval can be configured to 1-10 nm. The characteristic spectrum refers to the wavelength-absorbance correspondence data extracted from the continuous broadband optical signal. After starting the broadband light source, the transmitted light intensity of the verification reagent at multiple wavelengths is collected, and dark current signal correction and reference light intensity signal correction are performed for each wavelength point. The corrected transmittance is then converted into absorbance at the corresponding wavelength, i.e., using the formula T(λ)=(I(λ)-I dark (λ)) / (I ref (λ)-I dark The transmittance at each wavelength is calculated using A(λ) = -log(λ). 10(T(λ)) calculates the absorbance at each wavelength, forming a data set with a one-to-one correspondence between wavelength and absorbance. Then, data within a preset band range is extracted from this data set as verification spectral data. For example, after collecting the optical response in the range of 250nm to 800nm, several band data related to colorimetric residues and organic residues can be extracted for subsequent residue type determination.

[0107] For example, the preset spectral bands can be set based on the spectral characteristics of known residues, and include at least three bands. The first band is the 650-750 nm characteristic region of silicomolybdenum blue. All wavelength-absorbance data pairs within this band are extracted from the full-band spectrum to form the spectral data of the silicomolybdenum blue characteristic region. The second band is the 400-450 nm characteristic region of silicomolybdenum yellow, and spectral data within this band are extracted. The third band is the 260-310 nm characteristic region of ultraviolet organic matter, and spectral data within this band are extracted. The extracted spectral data of each preset spectral band are summarized together, along with the complete full-band spectrum, acquisition timestamp, light source type, integration time, and other information, to constitute the verification spectral data.

[0108] S15. If the light path bubble detection result indicates that there are interfering bubbles in the light path area of ​​the cuvette, then trigger the bubble removal operation command to remove the interfering bubbles until the light path area of ​​the cuvette is bubble-free.

[0109] Specifically, the bubble removal operation command refers to the control command generated after detecting interfering bubbles to remove them. The bubble-free state refers to the state where there are no bubbles in the optical path area that affect the measurement of transmitted light. If the optical path bubble detection result obtained in step S11 indicates the presence of interfering bubbles, a bubble removal operation command is generated to cause a small amount of the verification reagent in the cuvette to be discharged, replenished at a low speed, or briefly disturbed, so that the bubbles leave the optical path area and are discharged with the liquid. After each bubble removal action is completed, the optical path bubble detection is repeated. If interfering bubbles are still detected, the bubble removal operation is triggered again until the optical path bubble detection result becomes that there are no interfering bubbles, or the preset upper limit of the number of bubble removals is reached. For example, if there are bubbles in the optical path after the first liquid injection, a small amount of liquid is discharged first, and then the verification reagent is slowly replenished, and the optical path area is re-detected until the bubbles no longer block the detection optical path.

[0110] In one embodiment, step S20, namely, determining the absorbance deviation based on the verified absorbance and the preset reference absorbance, and determining whether the absorbance deviation is within a preset acceptable threshold range, includes:

[0111] S21. Calculate the difference between the verified absorbance and the preset reference absorbance to obtain the absorbance deviation.

[0112] Specifically, the verified absorbance is the current absorbance measured after cleaning in step S10. The preset reference absorbance is the absorbance measured and stored in advance by the cuvette under a reference cleanliness condition. The absorbance deviation is the difference between the verified absorbance and the preset reference absorbance. The corresponding preset reference absorbance is read according to the cuvette label, and the current verified absorbance is read from the cleanliness verification data. The absorbance deviation is obtained by subtracting the preset reference absorbance from the current verified absorbance. If the difference is positive, it indicates that the current absorbance is higher than the reference state; if the difference is close to zero, it indicates that the current optical state is close to the reference state. For example, if the verified absorbance is 0.0470 and the preset reference absorbance is 0.0450, then the absorbance deviation is 0.0020.

[0113] S22. Obtain the preset optimal cleanliness threshold and determine whether the absorbance deviation is less than or equal to the optimal cleanliness threshold.

[0114] Specifically, the optimal cleanliness threshold refers to the upper limit deviation value used to determine whether the cuvette cleaning quality meets the release conditions. This threshold can be preset based on the allowable error of the detection method, the background fluctuation of the cuvette, and historical verification data. The optimal cleanliness threshold is read from the parameter configuration record, and the absorbance deviation obtained in step S21 is compared with the optimal cleanliness threshold. If the absorbance deviation is less than or equal to the optimal cleanliness threshold, the comparison result is that the release conditions are met; if the absorbance deviation is greater than the optimal cleanliness threshold, the comparison result is that the release conditions are not met. For example, if the optimal cleanliness threshold is 0.0020, the condition is met when the absorbance deviation is 0.0015, and the condition is not met when the absorbance deviation is 0.0030.

[0115] S23. If the absorbance deviation is less than or equal to the optimal cleanliness threshold, then the absorbance deviation is determined to be within the preset qualified threshold range.

[0116] Specifically, the acceptable threshold range refers to the allowable range of absorbance deviation, the upper limit of which is limited by the optimal cleanliness threshold. When the comparison result in step S22 indicates that the absorbance deviation is less than or equal to the optimal cleanliness threshold, the absorbance deviation is marked as being within the acceptable threshold range, and a cleanliness acceptance judgment result is generated. This judgment result includes the cuvette identifier, absorbance deviation, optimal cleanliness threshold, judgment time, and acceptance status. For example, if the absorbance deviation is 0.0012 and the optimal cleanliness threshold is 0.0020, then the current cuvette is determined to be ready for release.

[0117] S24. If the absorbance deviation is greater than the optimal cleanliness threshold, then the absorbance deviation is determined to be outside the preset acceptable threshold range.

[0118] Specifically, "not within the acceptable threshold range" means that the current absorbance deviation exceeds the upper limit of the allowable deviation for release. When the comparison result in step S22 shows that the absorbance deviation is greater than the optimal cleanliness threshold, the absorbance deviation is marked as unacceptable, and the subsequent contamination deviation level and residue type judgment process is triggered. At the same time, the next sample detection cycle is kept in a waiting state. For example, if the absorbance deviation is 0.0060 and the optimal cleanliness threshold is 0.0020, it means that the current optical background of the cuvette deviates from the baseline state beyond the allowable range, and it is necessary to continue to determine the degree of contamination and residue type.

[0119] In one embodiment, such as Figure 2 As shown, after step S30, i.e., after generating the release instruction corresponding to the cuvette to allow the cuvette to enter the next sample detection cycle, the following steps are also included:

[0120] S301. Obtain the verification absorbance of the cuvette under the current verification qualified state, and use it as the current background absorbance.

[0121] Specifically, the current background absorbance refers to the optical background value corresponding to the cuvette after passing this verification. This value is different from the absorbance of a single sample test, but is used to characterize the background state formed by the cuvette itself and the verification medium after cleaning. After generating the release instruction, the verification absorbance is read from the cleanliness verification data of this test and marked as the current background absorbance. Then, the current background absorbance is associated with the cuvette identification, the verification time, and the cumulative number of cleanings and stored. For example, if the verification absorbance after a successful verification is 0.0465, then 0.0465 is used as the background absorbance of the cuvette in the current period.

[0122] S302. Calculate the difference between the current background absorbance and the preset initial background absorbance to obtain the background drift of the cuvette.

[0123] Specifically, the preset initial background absorbance refers to the initial background value recorded when the cuvette is activated or during the benchmark establishment phase. The background drift refers to the change in the current background absorbance relative to the preset initial background absorbance, used to reflect the change in the optical background of the cuvette after long-term use. The current background absorbance and the preset initial background absorbance are read, and the background drift is obtained by subtracting the preset initial background absorbance from the current background absorbance. This background drift is then written into the cuvette's health record. For example, if the preset initial background absorbance is 0.0450 and the current background absorbance is 0.0480, then the background drift is 0.0030, indicating that the cuvette's background absorbance has increased by 0.0030 absorbance units compared to its initial state.

[0124] S303. Obtain the current cleaning execution data of the cuvette. Based on the background drift and the current cleaning execution data, calculate the cuvette's lifespan consumption index. The current cleaning execution data shall include at least the total number of cumulative cleanings.

[0125] Specifically, the current cleaning execution data refers to statistical data related to the history of cuvette cleaning, including at least the total number of cleanings, and may also include the total number of cleanings for different cleaning types, total cleaning time, and cleaning intensity records. The lifespan consumption index is a cuvette usage status evaluation value calculated based on background drift and cleaning execution data. The total number of cleanings corresponding to the cuvette and the background drift obtained in step S302 are read. The background drift is normalized according to a preset maximum background drift, and the total number of cleanings is normalized according to a preset maximum number of cleanings. Then, the lifespan consumption index is calculated by combining these values ​​according to preset weights, i.e., using the formula LifeIndex=w1×(N total / N totalmax )+w2×(ΔA drift / ΔA driftmax ), where w1 and w2 are weighting coefficients and w1+w2=1, LifeIndex is the lifespan depletion index, and N total To accumulate the total number of cleaning cycles, N totalmax To preset the maximum number of cleaning cycles, ΔA drift ΔA represents the background drift. driftmax The preset maximum background drift is used. For example, if the total number of cleaning cycles is 1200, the preset maximum number of cleaning cycles is 2000, the background drift is 0.0030, the preset maximum background drift is 0.0100, and w1=0.5, w2=0.5, then the lifespan consumption index calculated using the above formula is 0.45. The closer the total number of cleaning cycles is to the preset maximum number of cycles, and the closer the background drift is to the preset drift maximum, the higher the lifespan consumption index, thus reflecting the overall state of the cuvette's optical background change and usage load.

[0126] S304. Obtain the preset lifespan warning threshold and determine whether the lifespan consumption index is greater than or equal to the lifespan warning threshold.

[0127] Specifically, the lifespan warning threshold is a threshold used to determine whether a cuvette needs maintenance or replacement. The lifespan warning threshold is read from the parameter configuration record. The lifespan consumption index obtained in step S303 is compared with the lifespan warning threshold. If the lifespan consumption index is greater than or equal to the lifespan warning threshold, it indicates that the current state of the cuvette has reached the warning condition. If the lifespan consumption index is less than the lifespan warning threshold, it indicates that the current state of the cuvette has not reached the warning condition. For example, if the lifespan warning threshold is 0.70, a warning judgment is triggered when the lifespan consumption index is 0.72, and a normal operation judgment is maintained when the lifespan consumption index is 0.45.

[0128] S305. If the lifespan consumption index is greater than or equal to the lifespan warning threshold, a replacement warning message for the cuvette will be generated.

[0129] Specifically, the replacement warning message refers to maintenance prompt data generated when the cuvette's lifespan consumption index reaches the warning condition. If the judgment result of step S304 is that the lifespan consumption index is greater than or equal to the lifespan warning threshold, a replacement warning message is generated that includes the cuvette identifier, lifespan consumption index, background drift amount, total number of cumulative cleanings, and suggested handling status. This message is written to the maintenance record or pushed to the operation interface. For example, when a cuvette has a high number of cumulative cleanings and the background drift amount continues to increase, a prompt to prepare to replace the cuvette is generated, allowing maintenance personnel to arrange the handling within the planned maintenance window.

[0130] S306. If the lifespan consumption index is less than the lifespan warning threshold, then maintain the current normal operating status of the cuvette.

[0131] Specifically, the current normal operating status refers to the state where the cuvette has not reached the lifespan warning condition and can still participate in subsequent sample testing according to the release instruction. If the judgment result of step S304 is that the lifespan consumption index is less than the lifespan warning threshold, no replacement warning message will be generated, and the cuvette will continue to be kept in a usable state. At the same time, the lifespan assessment result will be recorded in the health record so as to form a record of the lifespan consumption index changing over time. For example, if the lifespan consumption index is 0.32 and the lifespan warning threshold is 0.70, the cuvette will continue to be allowed to be used in the next sample testing cycle.

[0132] In one embodiment, step S40, namely determining the contamination deviation level and residue type of the cuvette based on the absorbance deviation and verification spectral data, includes:

[0133] S41. Obtain the preset severe contamination threshold and determine whether the absorbance deviation is greater than the severe contamination threshold. If the severe contamination threshold is greater than the optimal cleanliness threshold, then...

[0134] Specifically, the severe contamination threshold is a higher-level threshold used to distinguish the level of contamination deviation. Its value is greater than the optimal cleanliness threshold. The optimal cleanliness threshold is used to determine whether to release the sample, while the severe contamination threshold is used to determine whether the degree of contamination deviation has entered a higher level. The preset severe contamination threshold is read, and the absorbance deviation obtained in step S20 is compared with the severe contamination threshold. If the absorbance deviation is greater than the severe contamination threshold, it indicates that the current degree of contamination deviation is high. If the absorbance deviation is less than or equal to the severe contamination threshold, it indicates that the current degree of contamination deviation is low. For example, if the optimal cleanliness threshold is 0.0020 and the severe contamination threshold is 0.0100, an absorbance deviation of 0.0060 does not exceed the severe contamination threshold, while an absorbance deviation of 0.0180 exceeds the severe contamination threshold.

[0135] S42. If the absorbance deviation is less than or equal to the severe contamination threshold, the contamination deviation level of the cuvette is determined to be slight deviation level.

[0136] Specifically, a slight deviation level refers to the pollution level classification when the absorbance deviation exceeds the acceptable threshold range but does not exceed the severe pollution threshold. If the judgment result of step S41 is that the absorbance deviation is less than or equal to the severe pollution threshold, and the absorbance deviation has been determined to be outside the acceptable threshold range in step S20, then the pollution deviation level is determined to be a slight deviation level, and a pollution deviation level record containing the slight deviation level, absorbance deviation amount, and threshold basis is generated. For example, if the absorbance deviation amount is 0.0060, the optimal cleanliness threshold is 0.0020, and the severe pollution threshold is 0.0100, then the deviation amount is between the two and can be determined to be a slight deviation level.

[0137] S43. If the absorbance deviation is greater than the severe contamination threshold, the contamination deviation level of the cuvette is determined to be severe contamination level.

[0138] Specifically, the severe contamination level refers to the degree of contamination when the absorbance deviation exceeds the severe contamination threshold. If the judgment result of step S41 is that the absorbance deviation is greater than the severe contamination threshold, the contamination deviation level is determined to be severe contamination level, and a contamination deviation level record containing the severe contamination level, absorbance deviation, and threshold basis is generated. This record is used to subsequently select a cleaning strategy that matches the higher degree of contamination. For example, if the absorbance deviation is 0.0180 and the severe contamination threshold is 0.0100, then the current cuvette is determined to be at the severe contamination level.

[0139] S44. Obtain preset reference spectral data, perform differential processing on the verification spectral data and the preset reference spectral data to obtain the residual absorption difference spectrum.

[0140] Specifically, the preset reference spectral data refers to the set of absorbance data for multiple wavelengths corresponding to the cuvette under a standard clean condition. The residue absorption difference spectrum refers to the difference spectrum between the verification spectral data and the preset reference spectral data, used to characterize the contribution of residues to the absorption of light at each wavelength. The preset reference spectral data is read according to the cuvette markings. The difference between the absorbance at each wavelength point in the verification spectral data and the absorbance at the same wavelength point in the preset reference spectral data is calculated, resulting in the residue absorption difference spectrum composed of the wavelength and absorbance difference. For example, after calculating the difference at wavelength points such as 420nm, 700nm, and 280nm, difference spectral data reflecting the absorption characteristics of different residues can be obtained.

[0141] S45. Perform peak-finding processing on the absorption difference spectrum of the residue to determine at least one target absorption peak, and obtain the peak position wavelength corresponding to the target absorption peak based on the target absorption peak.

[0142] Specifically, peak finding refers to the process of identifying local absorption peaks in the residual absorption difference spectrum. The target absorption peak is the absorption peak in the residual absorption difference spectrum that satisfies both the peak height condition and the local maximum condition. The peak position wavelength is the wavelength corresponding to the peak value of the target absorption peak. The absorbance difference values ​​in the residual absorption difference spectrum are scanned in wavelength order. When the absorbance difference value at a certain wavelength point is greater than that of the adjacent wavelength points and is greater than the preset peak height threshold, the peak at that wavelength point is determined as the target absorption peak. The peak position wavelength and peak height value of the target absorption peak are then recorded. For example, if the residual absorption difference spectrum has a local maximum value near 705 nm, then 705 nm can be used as the peak position wavelength of the corresponding target absorption peak.

[0143] S46. Perform feature matching and comparison between the peak wavelength and the preset spectral feature library to determine the type of residue in the cuvette.

[0144] Specifically, the spectral feature library refers to the pre-stored mapping data between residue types and corresponding spectral features. The residue type refers to the pollutant category obtained by matching peak wavelengths. The peak wavelength obtained in step S45 is compared with the various feature wavelength ranges in the spectral feature library. If the peak wavelength falls within the feature range corresponding to a certain residue type, then the residue type is determined as the current residue type of the cuvette. If the peak wavelength simultaneously satisfies multiple feature ranges or there are multiple target absorption peaks, then multiple candidate residue types are retained and the primary and secondary relationships are further determined by combining the peak height values. For example, if the peak wavelength falls within a preset range related to silicate colorimetric products, then the residue type is determined as the corresponding colorimetric residue type.

[0145] In one embodiment, step S46 involves performing feature matching and comparison between the peak wavelength and a preset spectral feature library to determine the type of residue in the cuvette, including:

[0146] S461. Determine the preset characteristic range to which the peak wavelength belongs. The preset characteristic range includes at least the silicomolybdenum blue characteristic range, the silicomolybdenum yellow characteristic range, and the ultraviolet organic compound characteristic range.

[0147] Specifically, the preset characteristic intervals refer to interval data pre-established based on the wavelength range where the residual absorption peaks may appear. The silicomolybdenum blue characteristic interval refers to the wavelength range corresponding to the residual absorption response of silicomolybdenum blue, the silicomolybdenum yellow characteristic interval refers to the wavelength range corresponding to the residual absorption response of silicomolybdenum yellow, and the ultraviolet organic compound characteristic interval refers to the ultraviolet band range corresponding to the residual absorption response of organic compounds. The peak wavelengths obtained in step S45 are compared sequentially with the upper and lower limits of each preset characteristic interval. If the peak wavelength is greater than or equal to the lower limit of a certain interval and less than or equal to the upper limit of that interval, then the peak wavelength is determined to belong to the preset characteristic interval. For example, if the peak wavelength is 705 nm and the silicomolybdenum blue characteristic interval is set to 650 nm to 750 nm, then the peak wavelength can be determined to belong to the silicomolybdenum blue characteristic interval.

[0148] S462. If the peak wavelength falls within the characteristic region of molybdenum blue, then the residue type of the cuvette is determined to be molybdenum blue residue.

[0149] Specifically, the silicomolybdenum blue residue type refers to the residue type formed after the silicomolybdenum blue colorimetric product generated during silicate detection remains on the inner wall of the cuvette or in the optical path area. If the interval judgment result of step S461 indicates that the peak wavelength falls within the silicomolybdenum blue characteristic region, the residue type field is assigned the value of silicomolybdenum blue residue type, and the identification result is associated and stored with the corresponding peak wavelength, peak height value, and cuvette identifier. For example, if the peak wavelength is 700nm or 705nm and is within the silicomolybdenum blue characteristic region, the current residue type can be determined to be the silicomolybdenum blue residue type.

[0150] S463. If the peak wavelength falls within the characteristic region of molybdenum yellow, then the residue type of the cuvette is determined to be molybdenum yellow residue.

[0151] Specifically, the silicomolybdenum yellow residue type refers to the residue type formed by the yellow complex or related intermediate products generated during the reaction of silicate and molybdate remaining in the cuvette. If the interval judgment result of step S461 indicates that the peak wavelength falls within the silicomolybdenum yellow characteristic region, the residue type field is assigned the value of silicomolybdenum yellow residue type, and the identification result is associated and stored with the corresponding peak wavelength, peak height value, and cuvette identifier. For example, if the peak wavelength is 420nm or 425nm and is within the silicomolybdenum yellow characteristic region, the current residue type can be determined to be the silicomolybdenum yellow residue type.

[0152] S464. If the peak wavelength falls within the characteristic region of ultraviolet organic matter, then the residue type of the cuvette is determined to be organic residue.

[0153] Specifically, the organic residue type refers to the type of residue formed on the inner wall of the cuvette by reducing agents, organic components in the sample, or organic matter during the cleaning process. If the interval judgment result of step S461 indicates that the peak wavelength falls within the ultraviolet organic residue characteristic region, the residue type field is assigned the value of organic residue type, and the identification result is associated and stored with the corresponding peak wavelength, peak height value, and cuvette identifier. For example, if the peak wavelength is 280nm or 285nm and is within the ultraviolet organic residue characteristic region, the current residue type can be determined to be organic residue type.

[0154] In one embodiment, step S45 involves peak-finding processing of the residual absorption difference spectrum to determine at least one target absorption peak, and obtaining the peak position wavelength corresponding to the target absorption peak based on the target absorption peak, including:

[0155] S451. If multiple target absorption peaks are identified, the peak height value corresponding to each target absorption peak is obtained respectively.

[0156] Specifically, multiple target absorption peaks refer to the presence of two or more local absorption peaks in the residual absorption difference spectrum that satisfy the peak-finding conditions. The peak height value refers to the absorbance difference between the target absorption peak and the baseline of the difference spectrum. The target absorption peak set obtained in step S45 is traversed, and the absorbance difference at the peak wavelength of each target absorption peak is read. This absorbance difference value is then used as the corresponding peak height value, thereby forming a peak information set containing the target absorption peak identifier, peak wavelength, and peak height value. For example, if the peak height of 285nm is 0.018, the peak height of 425nm is 0.003, and the peak height of 705nm is 0.005 in a single spectral identification, the peak height values ​​of the three target absorption peaks are recorded respectively.

[0157] S452. Mark the target absorption peak with the largest peak height value as the main pollution absorption peak, and mark the other target absorption peaks besides the main pollution absorption peak as minor pollution absorption peaks.

[0158] Specifically, the primary pollution absorption peak refers to the target absorption peak with the largest peak height value among multiple target absorption peaks, while the secondary pollution absorption peaks refer to other target absorption peaks besides the primary pollution absorption peak. The peak height values ​​obtained in step S451 are sorted by size, and the target absorption peak with the largest peak height value is selected and marked as the primary pollution absorption peak. The remaining target absorption peaks are marked as secondary pollution absorption peaks, and the primary and secondary markings are written into the peak information set. For example, if the peak height at 285nm is 0.018, the peak height at 705nm is 0.005, and the peak height at 425nm is 0.003, then the target absorption peak corresponding to 285nm is marked as the primary pollution absorption peak, and the other two peaks are marked as secondary pollution absorption peaks.

[0159] S453. Based on the peak wavelengths corresponding to the main pollution absorption peaks, determine the main residue types in the cuvette.

[0160] Specifically, the main residue type refers to the residue category corresponding to the main pollution absorption peak. The peak wavelength of the main pollution absorption peak is read, and the residue type corresponding to the peak wavelength is determined according to the characteristic interval judgment logic in steps S461 to S464. Then, the residue type is marked as the main residue type. For example, if the peak wavelength of the main pollution absorption peak is 285nm, and this wavelength falls within the ultraviolet organic matter characteristic region, then the main residue type is determined to be an organic residue type.

[0161] S454. Based on the peak wavelength corresponding to the minor contaminant absorption peak, determine the type of minor residue in the cuvette.

[0162] Specifically, minor residue types refer to one or more residue categories corresponding to minor contaminant absorption peaks. The peak wavelength of each minor contaminant absorption peak is read one by one, and the corresponding residue type is determined according to the characteristic interval judgment logic in steps S461 to S464. A list of minor residue types is then formed. For example, if two minor contaminant absorption peaks are located at 705 nm and 425 nm respectively, they can be identified as silicomolybdenum blue residue type and silicomolybdenum yellow residue type, respectively, and both are added to the list of minor residue types.

[0163] S455. When determining the cleaning strategy corresponding to the cuvette, a serial combination cleaning strategy is generated. The serial combination cleaning strategy is used to prioritize cleaning the main residue types and clean the secondary residue types after cleaning is completed.

[0164] Specifically, the serial combination cleaning strategy refers to a cleaning strategy that combines cleaning actions corresponding to multiple residue types in a sequential order. After determining the primary residue type in step S453 and the secondary residue type in step S454, a first cleaning action is generated first for the primary residue type. After the first cleaning action is completed, a judgment node is set to re-verify or continue cleaning. If there is still a contamination signal corresponding to the secondary residue type, subsequent cleaning actions are generated for the secondary residue type and executed in order of primary and secondary importance. For example, if the primary residue type is an organic residue type and the secondary residue type is a silicomolybdenum blue residue type, the cleaning action for the organic residue is executed first, and then the cleaning action for the silicomolybdenum blue residue is executed based on the verification result.

[0165] In one embodiment, step S50, which determines the cleaning strategy for the cuvette based on the contamination deviation level and residue type, includes:

[0166] S51. If the contamination deviation level is slightly deviated, an additional cleaning strategy corresponding to the cuvette is generated. The additional cleaning strategy includes at least a preset pure water pulse rinsing operation.

[0167] Specifically, the supplementary cleaning strategy refers to the enhanced cleaning action performed when conventional cleaning fails to bring the cuvette to the acceptable threshold range. The pure water pulse rinsing operation refers to the operation of periodically rinsing the inner wall of the cuvette with pure water in an intermittent flow manner. If step S42 determines that the contamination deviation level is a slight deviation level, an supplementary cleaning strategy including the pure water pulse rinsing operation is generated. This strategy can record the number of pulses, the duration of a single pulse, the pulse interval, and the total rinsing volume, so that the slight residue is removed from the inner wall of the cuvette under the periodic water flow impact. For example, the pure water pulse rinsing is set to 1 second per rinse, 1 second interval, and 10 cycles to handle the situation where the absorbance deviation is slightly higher than the optimal cleanliness threshold.

[0168] S52. If the pollution deviation level is severe pollution level, then according to the type of residue, obtain the target chemical cleaning formula corresponding to the type of residue from the preset targeted cleaning formula library.

[0169] Specifically, the targeted cleaning formula library refers to the pre-established correspondence data between residue types and chemical cleaning formulas, and the target chemical cleaning formula refers to the specific cleaning formula that matches the current residue type. If step S43 determines that the pollution deviation level is a severe pollution level, then the residue type obtained in step S46 is read, and a formula record suitable for that residue type is searched in the targeted cleaning formula library. The formula record may include the cleaning agent type, cleaning agent concentration, injection volume, temperature conditions, soaking time, and subsequent rinsing requirements. For example, if the residue type is a certain colorimetric residue type, then the chemical cleaning formula corresponding to that colorimetric residue type is searched as the target chemical cleaning formula.

[0170] S53. If the residue type is silicomolybdenum blue residue, then obtain the formula containing alkaline cleaning agent parameters as the target chemical cleaning formula.

[0171] Specifically, alkaline cleaning agent parameters refer to the parameters used to prepare or use alkaline cleaning media, including at least the type of alkaline cleaning agent, concentration range, action temperature, and action time. If step S46 or step S462 determines that the residue type is silicomolybdenum blue residue, then a formula containing alkaline cleaning agent parameters is obtained from the targeted cleaning formula library as the target chemical cleaning formula. This is because silicomolybdenum blue residue is more easily dispersed or desorbed under alkaline conditions, which helps it transfer from the inner wall of the cuvette to the cleaning solution. For example, formula parameters including sodium hydroxide solution concentration, surfactant addition ratio, and heating temperature can be obtained.

[0172] S54. If the residue type is silicomolybdenum yellow residue, then obtain the formula containing the acid cleaning agent parameters as the target chemical cleaning formula.

[0173] Specifically, the acid cleaning agent parameters refer to the parameters used to prepare or call the acid cleaning medium, including at least the type of acid cleaning agent, concentration range, reaction temperature, and reaction time. If step S46 or step S463 determines that the residue type is silicomolybdenum yellow residue, then a formula containing the acid cleaning agent parameters is obtained from the targeted cleaning formula library as the target chemical cleaning formula. This is because the silicomolybdenum yellow residue can reduce its adhesion state or promote its transfer to the liquid phase after reacting with the acidic medium. For example, formula parameters containing hydrochloric acid or sulfuric acid solution concentration, soaking time, and subsequent neutralization and rinsing conditions can be obtained.

[0174] S55. If the residue type is organic residue, then obtain the formula containing organic solvent cleaning agent parameters as the target chemical cleaning formula.

[0175] Specifically, the organic solvent cleaning agent parameters refer to the parameters used to configure or call the organic cleaning medium, including at least the organic solvent type, purity requirements, injection volume, contact time, and replacement rinsing requirements. If step S46 or step S464 determines that the residue type is an organic residue type, then a formulation containing organic solvent cleaning agent parameters is obtained from the targeted cleaning formulation library as the target chemical cleaning formulation. This is because organic solvents can dissolve or remove some organic residues, thereby reducing their impact on subsequent optical detection. For example, formulation parameters containing solvent types such as anhydrous ethanol, isopropanol, or acetone, as well as rinsing and replacement volumes, can be obtained.

[0176] S56. Based on the obtained target chemical cleaning formula and preset temperature auxiliary parameters, generate a targeted chemical cleaning strategy for the cuvette and clean the cuvette accordingly.

[0177] Specifically, temperature auxiliary parameters refer to parameters used to control the operating temperature of the cleaning solution during the chemical cleaning process, and the targeted chemical cleaning strategy refers to the cleaning action sequence determined by the target chemical cleaning formula and the temperature auxiliary parameters. The target chemical cleaning formula obtained in steps S52 to S55 is combined with preset temperature auxiliary parameters to generate a cleaning strategy including cleaning solution injection, temperature control, soaking, drainage, and pure water replacement. The cuvette is then cleaned according to this strategy. For example, if the target chemical cleaning formula requires the use of an alkaline cleaning agent and soaking at a certain temperature, a corresponding sequence of actions for injection, heating, timing, drainage, and rinsing is generated.

[0178] For example, the cleaning temperature setting is determined based on the type of cleaning agent and the type of residue. Generally, increasing the temperature enhances the solubility, reaction rate, and diffusion speed of the cleaning agent; however, excessively high temperatures may lead to cleaning agent decomposition, damage to the cuvette material, or increased energy consumption. For alkaline cleaning of silicomolybdenum blue, the preferred temperature setting is 50-65℃. For acidic cleaning of silicomolybdenum yellow, the preferred temperature setting is 30-45℃. For cleaning organic matter with organic solvents, the preferred temperature setting is 20-40℃, as organic solvents evaporate quickly at high temperatures, potentially reducing cleaning effectiveness and increasing safety risks. Temperature stability is required; after reaching the set temperature, temperature fluctuations should be controlled within ±2℃.

[0179] In one embodiment, step S56, namely, generating a targeted chemical cleaning strategy for the cuvette based on the acquired target chemical cleaning formula and preset temperature auxiliary parameters, includes:

[0180] S561. Perform immersion cleaning operation according to the target chemical cleaning formula and temperature auxiliary parameters, comparing the colorimetric cuvettes.

[0181] Specifically, immersion cleaning refers to the cleaning action of keeping the cleaning medium in the target chemical cleaning formula in the cuvette for a certain period of time and in contact with the residue. The type of cleaning agent, injection volume, and immersion time are determined according to the target chemical cleaning formula. The cleaning temperature is determined based on auxiliary temperature parameters. After the cleaning agent is injected into the cuvette, the liquid level is maintained to cover the light path area, allowing the cleaning agent to act on the residue on the inner wall of the cuvette under preset temperature conditions. For example, for silicomolybdenum blue residue, an alkaline cleaning agent can be used to immerse the residue for several minutes at a set temperature, allowing the residue to gradually desorb or disperse into the cleaning solution.

[0182] S562. During the soaking and cleaning process, the dynamic absorbance of the cuvette at the peak wavelength of the target absorption peak is periodically collected at preset time intervals.

[0183] Specifically, dynamic absorbance refers to the absorbance value at the peak wavelength of the target absorption peak, collected sequentially over time during the immersion cleaning process. The preset time interval refers to the time distance between two dynamic absorbance acquisitions. After the immersion cleaning operation begins, the current cleaning state is paused or maintained at the preset time interval, and the optical response at the peak wavelength of the target absorption peak is collected. The dynamic absorbance obtained each time is associated with the corresponding acquisition time and recorded to form a dynamic absorbance time series. For example, if the peak wavelength of the target absorption peak is 705nm, the dynamic absorbance at 705nm is collected every 60 seconds and recorded as the absorbance values ​​for the 1st minute, the 2nd minute, and the 3rd minute.

[0184] S563. Generate a residue decay curve for the cuvette based on dynamic absorbance, and determine whether the current value of the residue decay curve is less than a preset safety threshold.

[0185] Specifically, the residue decay curve refers to the curve formed by soaking time as the independent variable and dynamic absorbance as the dependent variable. The safety threshold is a value used to determine whether the absorption intensity of the residue has dropped to the allowable range. The dynamic absorbance time series obtained in step S562 is arranged in chronological order to generate the residue decay curve. The most recently collected dynamic absorbance is taken as the current value of the residue decay curve. This current value is compared with the preset safety threshold. If the current value is less than the safety threshold, it means that the absorption intensity of the residue corresponding to the target absorption peak has dropped to the allowable range. If the current value is greater than or equal to the safety threshold, it means that soaking and cleaning still needs to continue. For example, if the safety threshold is 0.0010 and the current dynamic absorbance is 0.0008, the early termination condition is met.

[0186] S564. If the current value of the residue decay curve is less than the preset safety threshold, an early termination cleaning command is generated to end the soaking cleaning operation and trigger the pure water rinsing and replacement operation.

[0187] Specifically, the early termination of cleaning instruction refers to the control information generated when the current value of the residue decay curve is lower than the safety threshold, indicating that soaking should be stopped and rinsing should begin. The pure water rinsing and replacement operation refers to the action of replacing the cleaning agent and dissolved residue in the cuvette with pure water. If the judgment result of step S563 is that the current value is lower than the safety threshold, the current soaking time is stopped, the chemical cleaning solution in the cuvette is drained, and then pure water is injected and multiple replacement rinsings are performed until the cleaning solution residue is reduced to a preset allowable range. For example, if the preset maximum soaking time is 10 minutes, but the current value of the residue decay curve is lower than the safety threshold at the 6th minute, the soaking can be ended early and the pure water rinsing and replacement operation can begin.

[0188] S565. If the current value of the residue decay curve is greater than or equal to the preset safety threshold, the soaking and cleaning operation will continue to be performed until the preset maximum soaking time.

[0189] Specifically, the maximum soaking time refers to the preset upper limit of soaking time to control the action time of the cleaning agent on the cuvette. If the judgment result of step S563 is that the current value of the residue decay curve is greater than or equal to the safety threshold, the soaking and cleaning operation continues, and dynamic absorbance is collected and the residue decay curve is updated at the next preset time interval until the current value is less than the safety threshold or the soaking time reaches the maximum soaking time. If the maximum soaking time is reached but the value is still not lower than the safety threshold, the current soaking and cleaning operation ends and the subsequent cleanliness verification or anomaly judgment process begins. For example, if the maximum soaking time is 10 minutes, and the dynamic absorbance is still higher than the safety threshold at the 8th minute, the soaking continues until the 10th minute and subsequent verification is performed.

[0190] In one embodiment, such as Figure 3 As shown, after step S50, i.e., after determining the cleaning strategy corresponding to the cuvette based on the contamination deviation level and residue type, the process further includes:

[0191] S60. After cleaning, the cleanliness of the cuvette is verified, and the number of times the cuvette has been cleaned is obtained during each cleanliness verification. It is then determined whether the number of times the cuvette has been cleaned is less than the preset maximum number of times it can be cleaned.

[0192] Specifically, the number of cleaning operations performed refers to the cumulative number of cleaning operations since the current cleaning quality verification failed. The maximum cleaning count limit refers to the maximum number of times that cleaning can be repeated for the same failed verification event. After the cleaning strategy determined in step S50 is completed, the cleanliness verification is re-executed, and the number of cleaning operations performed in the current verification cycle is read. This number is compared with the preset maximum cleaning count limit. If the number of cleaning operations performed is less than the maximum cleaning count limit, processing can continue based on the verification result. If the number of cleaning operations performed reaches or exceeds the maximum cleaning count limit, a failure risk judgment is entered. For example, if the maximum cleaning count limit is 5 times, and the current number of cleaning operations performed is 3 times, verification and cleaning can still continue. If the current number of cleaning operations performed is 5 times, it is necessary to determine whether to lock the cuvette.

[0193] S70. If the number of cleaning cycles performed is less than the maximum number of cleaning cycles, determine whether the current absorbance deviation of the cuvette is within the acceptable threshold range.

[0194] Specifically, the current absorbance deviation refers to the absorbance deviation calculated in this re-cleanliness verification. If the judgment result of step S60 is that the number of cleaning operations performed is less than the maximum cleaning count limit, then the verification absorbance obtained in this cleanliness verification is read, and the difference between it and the preset benchmark absorbance is calculated to obtain the current absorbance deviation. Then, it is determined whether the current absorbance deviation is within the acceptable threshold range. If it is within the acceptable threshold range, a release instruction is generated. If it is not within the acceptable threshold range, the contamination deviation level and residue type are determined based on the current absorbance deviation and verification spectral data. For example, if the current absorbance deviation drops to 0.0015 after the second cleaning and the acceptable threshold limit is 0.0020, then release is possible. If it is still 0.0040, then subsequent processing continues.

[0195] S80. If the number of cleaning operations performed is greater than or equal to the maximum number of cleaning operations, and the current absorbance deviation determined in the current cycle is still not within the acceptable threshold range, then at the same time as determining that the cuvette is at risk of irreversible contamination, a failure lock command and maintenance alarm information are generated, so as to change the cuvette's operating status to a prohibited use status through the failure lock command.

[0196] Specifically, irreversible contamination risk refers to the risk that, after a preset number of cleaning cycles, the cuvette still fails to reach the acceptable threshold range, thus potentially resulting in surface scratches, corrosion, strong adsorption residues, or difficult-to-remove deposits. The failure lockout command is a control message that switches the cuvette from a state suitable for testing to a state where it is prohibited from use. Maintenance alarm information refers to alarm records indicating the need for manual maintenance, replacement, or offline processing. If step S60 determines that the number of cleaning cycles performed is greater than or equal to the maximum cleaning cycle limit, and the current absorbance deviation obtained in step S70 is still not within the acceptable threshold range, the cuvette is marked as having irreversible contamination risk, a failure lockout command is generated, and the cuvette's operating status is changed to a state where it is prohibited from use. Simultaneously, maintenance alarm information is generated, recording the cuvette identifier, the number of cleaning cycles performed, the current absorbance deviation, the last verified spectral data, and the recommended maintenance method. For example, if a cuvette has been cleaned five times consecutively and the current absorbance deviation is still 0.0060, the cuvette is prohibited from continuing to enter the sample testing cycle, and an offline cleaning or replacement is prompted.

[0197] It should be understood that the sequence number of each step in the above embodiments does not imply the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of this application.

[0198] The above-described embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this application, and should all be included within the protection scope of this application.

Claims

1. A method for verifying the cleaning quality of cuvettes, characterized in that, The cuvette cleaning quality verification method, applied to a silicate analysis device, includes: In response to the message indicating that routine cleaning of the cuvette is complete, the cuvette is subjected to cleanliness verification to obtain cleanliness verification data, which includes at least verification absorbance and verification spectral data. Based on the verified absorbance and the preset reference absorbance, the absorbance deviation is determined, and it is determined whether the absorbance deviation is within the preset qualified threshold range. If the absorbance deviation is within the acceptable threshold range, a release instruction is generated for the cuvette to allow it to enter the next sample testing cycle. If the absorbance deviation is not within the acceptable threshold range, the contamination deviation level and residue type of the cuvette are determined based on the absorbance deviation and the verification spectral data. Based on the contamination deviation level and the residue type, a cleaning strategy is determined for the cuvette to be cleaned.

2. The method for verifying the cleaning quality of cuvettes according to claim 1, characterized in that, The cleanliness of the cuvettes is verified to obtain cleanliness verification data, specifically including: A verification reagent is injected into the cuvette, and an optical bubble detection is performed on the cuvette to detect whether there are interfering bubbles in the optical path area of ​​the cuvette, and the optical bubble detection result is obtained. If the optical path bubble detection result indicates that there are no interfering bubbles in the optical path area of ​​the cuvette, then the temperature of the cuvette is controlled and the temperature of the cuvette is detected. After the cuvette reaches the preset detection temperature, the transmitted light signal of the verification reagent is acquired by using the preset silicate detection characteristic wavelength, and the absorbance is calculated based on the transmitted light signal to obtain the verification absorbance. The set broadband light source is activated to collect the continuous broadband light signal that penetrates the verification reagent, and the characteristic spectrum of the preset band range is extracted from the continuous broadband light signal as the verification spectral data; If the optical path bubble detection result indicates that there are interfering bubbles in the optical path area of ​​the cuvette, a bubble removal operation command is triggered to remove the interfering bubbles until the optical path area of ​​the cuvette is bubble-free.

3. The method for verifying the cleaning quality of cuvettes according to claim 1, characterized in that, The step of determining the absorbance deviation based on the verified absorbance and the preset reference absorbance, and judging whether the absorbance deviation is within the preset acceptable threshold range, specifically includes: The difference between the verified absorbance and the preset reference absorbance is calculated to obtain the absorbance deviation. Obtain a preset optimal cleanliness threshold and determine whether the absorbance deviation is less than or equal to the optimal cleanliness threshold; If the absorbance deviation is less than or equal to the optimal cleanliness threshold, then the absorbance deviation is determined to be within the preset qualified threshold range. If the absorbance deviation is greater than the optimal cleanliness threshold, then the absorbance deviation is determined to be outside the preset acceptable threshold range.

4. The method for verifying the cleaning quality of cuvettes according to claim 1, characterized in that, After the step of generating the release instruction corresponding to the cuvette to allow the cuvette to enter the next sample testing cycle, the cuvette cleaning quality verification method further includes: The absorbance of the cuvette under the current qualified state is obtained and used as the current background absorbance; The background drift of the cuvette is obtained by calculating the difference between the current background absorbance and the preset initial background absorbance. Obtain the current cleaning execution data of the cuvette, and calculate the life consumption index of the cuvette based on the background drift amount and the current cleaning execution data. The current cleaning execution data includes at least the total number of cumulative cleanings. Obtain a preset lifespan warning threshold and determine whether the lifespan consumption index is greater than or equal to the lifespan warning threshold. If the lifespan consumption index is greater than or equal to the lifespan warning threshold, a replacement warning message corresponding to the cuvette is generated. If the lifespan consumption index is less than the lifespan warning threshold, the cuvette will maintain its current normal operating status.

5. The method for verifying the cleaning quality of cuvettes according to claim 3, characterized in that, The step of determining the contamination deviation level and residue type of the cuvette based on the absorbance deviation and the verification spectral data specifically includes: Obtain a preset severe contamination threshold, and determine whether the absorbance deviation is greater than the severe contamination threshold, wherein the severe contamination threshold is greater than the optimal cleanliness threshold; If the absorbance deviation is less than or equal to the severe contamination threshold, the contamination deviation level of the cuvette is determined to be a slight deviation level. If the absorbance deviation is greater than the severe contamination threshold, the contamination deviation level of the cuvette is determined to be severe contamination level; Obtain preset reference spectral data, and perform differential processing on the verification spectral data and the preset reference spectral data to obtain the residue absorption difference spectrum; Peak-finding processing is performed on the absorption difference spectrum of the residue to determine at least one target absorption peak, and the peak position wavelength corresponding to the target absorption peak is obtained based on the target absorption peak. The peak wavelength is compared with a preset spectral feature library to determine the type of residue in the cuvette.

6. The method for verifying the cleaning quality of cuvettes according to claim 5, characterized in that, The step of performing feature matching and comparison between the peak wavelength and a preset spectral feature library to determine the type of residue in the cuvette specifically includes: Determine the preset characteristic range to which the peak wavelength belongs, wherein the preset characteristic range includes at least the silicomolybdenum blue characteristic region, the silicomolybdenum yellow characteristic region, and the ultraviolet organic compound characteristic region; If the peak wavelength falls within the characteristic region of the silicomolybdenum blue, then the residue type of the cuvette is determined to be silicomolybdenum blue residue. If the peak wavelength falls within the characteristic region of the molybdenum yellow silica, then the residue type of the cuvette is determined to be molybdenum yellow silica residue. If the peak wavelength falls within the ultraviolet organic characteristic region, then the residue type of the cuvette is determined to be an organic residue type.

7. The method for verifying the cleaning quality of cuvettes according to claim 5, characterized in that, The step of performing peak-finding processing on the absorption difference spectrum of the residue to determine at least one target absorption peak, and obtaining the peak position wavelength corresponding to the target absorption peak based on the target absorption peak, specifically includes: If multiple target absorption peaks are identified, the peak height value corresponding to each target absorption peak is obtained respectively; The target absorption peak with the largest peak height value is marked as the main pollution absorption peak, and the other target absorption peaks besides the main pollution absorption peak are marked as minor pollution absorption peaks. Based on the peak wavelengths corresponding to the main pollution absorption peaks, the main residue types of the cuvettes are determined. Based on the peak wavelength corresponding to the absorption peak of the minor contaminant, the type of minor residue in the cuvette is determined; When determining the cleaning strategy corresponding to the cuvette, a serial combined cleaning strategy is generated. The serial combined cleaning strategy is used to prioritize cleaning the main residue type and then clean the secondary residue type after cleaning is completed.

8. The method for verifying the cleaning quality of cuvettes according to claim 6, characterized in that, The step of determining the cleaning strategy for the cuvette based on the contamination deviation level and the residue type specifically includes: If the contamination deviation level is the slight deviation level, an additional cleaning strategy is generated for the cuvette, and the additional cleaning strategy includes at least a preset pure water pulse rinsing operation. If the pollution deviation level is the severe pollution level, then according to the type of residue, a target chemical cleaning formula corresponding to the type of residue is obtained from a preset targeted cleaning formula library; If the residue type is the same as the silicomolybdenum blue residue type, then obtain the formulation containing the alkaline cleaning agent parameters as the target chemical cleaning formulation; If the residue type is the same as the molybdenum yellow residue type, then obtain the formulation containing the acid cleaning agent parameters as the target chemical cleaning formulation; If the type of residue is the organic residue type, then the formula containing the organic solvent cleaning agent parameters is obtained as the target chemical cleaning formula; Based on the acquired target chemical cleaning formula and preset temperature auxiliary parameters, a targeted chemical cleaning strategy is generated for the cuvette to clean it.

9. The method for verifying the cleaning quality of cuvettes according to claim 8, characterized in that, The step of generating a targeted chemical cleaning strategy for the cuvette based on the acquired target chemical cleaning formula and preset temperature auxiliary parameters specifically includes: The cuvette was subjected to an immersion cleaning operation according to the target chemical cleaning formula and the temperature auxiliary parameters. During the soaking and cleaning process, the dynamic absorbance of the cuvette at the peak wavelength of the target absorption peak is periodically collected at preset time intervals. The residue decay curve of the cuvette is generated based on the dynamic absorbance, and it is determined whether the current value of the residue decay curve is less than a preset safety threshold. If the current value of the residue decay curve is less than the preset safety threshold, an early termination cleaning command is generated to end the soaking cleaning operation and trigger a pure water rinsing and replacement operation. If the current value of the residue decay curve is greater than or equal to the preset safety threshold, the soaking and cleaning operation will continue to be performed until the preset maximum soaking time.

10. The method for verifying the cleaning quality of cuvettes according to claim 1, characterized in that, After the step of determining the cleaning strategy corresponding to the cuvette based on the contamination deviation level and the residue type, the cuvette cleaning quality verification method further includes: After the cleaning is completed, the cleanliness of the cuvette is verified, and the number of times the cuvette has been cleaned is obtained during each cleanliness verification. It is then determined whether the number of times the cuvette has been cleaned is less than the preset maximum number of cleaning times. If the number of cleaning operations performed is less than the maximum number of cleaning operations, then it is determined whether the current absorbance deviation of the cuvette is within the acceptable threshold range. If the number of cleaning operations performed is greater than or equal to the maximum number of cleaning operations, and the current absorbance deviation determined in the current cycle is still not within the acceptable threshold range, then the cuvette is determined to be at risk of irreversible contamination, and a failure lock command and maintenance alarm information are generated to change the operating status of the cuvette to a prohibited use state through the failure lock command.