Symmetrical double-telecentric large-view-field imaging system and photoetching equipment

Abstract

The utility model discloses a symmetrical double telecentric large-view-field imaging system and photoetching equipment, the system comprises a first lens group, a second lens group, a diaphragm, a third lens group and a fourth lens group which are sequentially arranged from an object plane to an image plane along an optical axis, and the first lens group and the third lens group are completely symmetrical by taking the diaphragm as a symmetry plane; the second lens group and the fourth lens group are completely symmetrical by taking the diaphragm as a symmetry plane; wherein the first lens group comprises a first lens, a second lens and a third lens; the second lens group comprises a fourth lens, a fifth lens, a sixth lens and a seventh lens; the third lens group comprises an eighth lens, a ninth lens, a tenth lens and an eleventh lens; the fourth lens group comprises a twelfth lens, a thirteenth lens and a fourteenth lens. According to the utility model, the 14 lenses symmetrical to the diaphragm are arranged, so that aberrations generated by an imaging system are mutually compensated, the imaging quality is improved, and the process difficulty and cost of processing, detecting and assembling and correcting are greatly reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of photolithography, in particular to a symmetrical double-telecentric large-field-of-view imaging system and photolithography equipment. Background Art

[0002] With the continuous development of lithography technology, the requirements for precision and production capacity are becoming more and more stringent. As the core component of lithography technology, the performance of the projection lithography objective lens directly determines the lithography level of the lithography system. In the related technology, the commonly used projection lithography objective lens has a large number of lenses and a large conjugate range, which leads to complex assembly, difficult processing, and high cost of the projection lithography objective lens. In addition, the existing technology generally has problems such as small image field of view, large distortion, and small depth of focus of the lithography system, resulting in poor final imaging effect of the lithography system. Utility Model Content

[0003] The utility model aims to solve at least one of the technical problems existing in the prior art.

[0004] To this end, one purpose of the utility model is to propose a symmetrical dual-telecentric large field of view imaging system, which, by setting 14 lenses symmetrical to the aperture, allows the aberrations produced by the imaging system to compensate for each other, thereby greatly reducing the process difficulty and cost of processing, testing and calibration while improving the imaging quality.

[0005] Therefore, a second object of the present invention is to provide a photolithography device.

[0006] To achieve the above-mentioned purpose, an embodiment of the first aspect of the utility model discloses a symmetrical double-telecentric large-field-of-view imaging system, comprising: an object plane, an aperture, a first lens group, a second lens group, a third lens group, a fourth lens group and an image plane; the first lens group, the second lens group, the aperture, the third lens group and the fourth lens group are arranged in sequence along the optical axis from the object plane to the image plane; the first lens group is located behind the object plane and in front of the second lens group, the second lens group is located behind the first lens group and in front of the aperture, the aperture is located between the second lens group and the third lens group, and the third lens group The first lens group is located behind the aperture and in front of the fourth lens group, and the fourth lens group is located behind the third lens group and in front of the image plane; the first lens group and the third lens group are completely symmetrical with the aperture as the symmetry plane, and the second lens group and the fourth lens group are completely symmetrical with the aperture as the symmetry plane; wherein the first lens group includes a first lens, a second lens, and a third lens; the second lens group includes a fourth lens, a fifth lens, a sixth lens, and a seventh lens; the third lens group includes an eighth lens, a ninth lens, a tenth lens, and an eleventh lens; and the fourth lens group includes a twelfth lens, a thirteenth lens, and a fourteenth lens.

[0007] According to the symmetrical dual-telecentric large-field-of-view imaging system of the embodiment of the utility model, by setting the first lens group, the third lens group, the second lens group and the fourth lens group that are completely symmetrical with the aperture as the symmetry plane, the aberrations of the symmetrical dual-telecentric large-field-of-view imaging system can produce effects of equal size and opposite sign, achieve mutual compensation, and then automatically correct to zero, thereby improving the quality of imaging. Furthermore, by setting 14 lenses, the structure of the symmetrical dual-telecentric large-field-of-view imaging system can be optimized while ensuring high-quality imaging, so that its structure is simple, and the manufacturing cost and the process complexity of detection and calibration are greatly reduced.

[0008] In addition, the symmetrical dual-telecentric large field of view imaging system according to the above embodiment of the utility model may also have the following additional technical features:

[0009] In some embodiments, the first lens, the third lens, the fourth lens, the fifth lens, the sixth lens, the ninth lens, the tenth lens, the eleventh lens, the twelfth lens, and the fourteenth lens are positive lenses, and the second lens, the seventh lens, the eighth lens, and the thirteenth lens are negative lenses.

[0010] In some embodiments, the first lens, the third lens, and the fifth lens are plano-convex lenses with positive optical power, and the sides of the first lens, the third lens, and the fifth lens close to the object plane are flat.

[0011] In some embodiments, the second lens is a biconcave lens having negative optical power, and a curvature radius of a side close to the object plane is smaller than a curvature radius of a side close to the image plane.

[0012] In some embodiments, the fourth lens is a biconvex lens and has positive optical power, and a curvature radius of a side close to the object plane is larger than a curvature radius of a side close to the image plane.

[0013] In some embodiments, the sixth lens is a meniscus lens and has positive optical power, and a curvature radius of a side close to the object plane is smaller than a curvature radius of a side close to the image plane.

[0014] In some embodiments, the seventh lens is a plano-concave lens with negative optical power, and a side of the seventh lens close to the object plane is a flat surface.

[0015] In some embodiments, the first to fourteenth lenses are all spherical surfaces, and the first to fourteenth lenses can correct various aberrations through a combination of positive and negative optical powers and a combination of different materials.

[0016] In some embodiments, the object-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system is less than or equal to 0.2 degrees, and the image-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system is less than or equal to 0.2 degrees.

[0017] In some embodiments, the wavelength range of the symmetrical dual telecentric large field of view imaging system is 400nm≤λ≤410nm, the object side numerical aperture range of the symmetrical dual telecentric large field of view imaging system is 0.08≤NA≤0.12, the object side linear field range of the symmetrical dual telecentric large field of view imaging system is 20mm≤Y≤30mm, and the vertical axis magnification of the symmetrical dual telecentric large field of view imaging system is -1.

[0018] In some embodiments, the yoke distance of the symmetrical dual-telecentric large-field-of-view imaging system is 650 mm, and the object distance and image distance of the symmetrical dual-telecentric large-field-of-view imaging system are in the range of 75 mm to 95 mm.

[0019] In some embodiments, the first to fourteenth lenses are all made of glass.

[0020] To achieve the above-mentioned purpose, an embodiment of the second aspect of the present utility model discloses a lithography device, including the symmetrical dual-telecentric large-field-of-view imaging system as described in the embodiment of the first aspect of the present utility model.

[0021] According to the lithography equipment of the embodiment of the utility model, by setting the first lens group, the third lens group, the second lens group and the fourth lens group that are completely symmetrical with the aperture as the symmetry plane, the aberrations of the symmetrical double telecentric large field of view imaging system can produce effects of equal size and opposite sign, achieve mutual compensation, and then automatically correct to zero, thereby improving the quality of imaging. Furthermore, by setting 14 lenses, the structure of the symmetrical double telecentric large field of view imaging system can be optimized while ensuring high-quality imaging, so that its structure is simple, and the manufacturing cost and the process complexity of detection and calibration are greatly reduced.

[0022] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0024] Figure 1 It is a structural diagram of a symmetrical dual-telecentric large-field-of-view imaging system according to an embodiment of the utility model;

[0025] Figure 2 It is a modulation transfer function curve diagram of a symmetrical dual telecentric large field of view imaging system according to an embodiment of the utility model;

[0026] Figure 3 It is a spot diagram of a symmetrical dual-telecentric large field of view imaging system according to one embodiment of the utility model;

[0027] Figure 4 This is a vertical axis chromatic aberration diagram of a symmetrical double telecentric large field of view imaging system according to an embodiment of the utility model;

[0028] Figure 5 It is a field curvature diagram and distortion diagram of a symmetrical dual telecentric large field of view imaging system according to an embodiment of the utility model;

[0029] Figure 6 It is a structural block diagram of a lithography device according to an embodiment of the utility model. DETAILED DESCRIPTION

[0030] The embodiments of the present utility model are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present utility model are described in detail below.

[0031] Reference below Figure 1-Figure 6 A symmetrical dual-telecentric large field of view imaging system 100 according to an embodiment of the present invention is described.

[0032] Figure 11 is a structural diagram of a symmetrical dual-telecentric large-field-of-view imaging system 100 according to an embodiment of the present invention.

[0033] like Figure 1 As shown, the symmetrical double telecentric large field of view imaging system 100 comprises: an object plane, an aperture, a first lens group G1, a second lens group G2, a third lens group G3, a fourth lens group G4 and an image plane; the first lens group G1, the second lens group G2, the aperture, the third lens group G3 and the fourth lens group G4 are arranged in sequence from the object plane to the image plane along the optical axis; the first lens group G1 is located behind the object plane and in front of the second lens group G2, the second lens group G2 is located behind the first lens group G1 and in front of the aperture, the aperture is located between the second lens group G2 and the third lens group G3, the third lens group G3 is located behind the aperture and in front of the fourth lens group G4, and the fourth lens group G4 is located behind the aperture. G4 is located behind the third lens group G3 and in front of the image plane; the first lens group G1 and the third lens group G3 are completely symmetrical with the aperture as the symmetry plane, and the second lens group G2 and the fourth lens group G4 are completely symmetrical with the aperture as the symmetry plane; wherein, the first lens group G1 includes a first lens L1, a second lens L2, and a third lens L3; the second lens group G2 includes a fourth lens L4, a fifth lens L5, a sixth lens L6, and a seventh lens L7; the third lens group G3 includes an eighth lens L8, a ninth lens L9, a tenth lens L10, and an eleventh lens L11; the fourth lens group G4 includes a twelfth lens L12, a thirteenth lens L13, and a fourteenth lens L14.

[0034] Specifically, the symmetrical dual-telecentric large-field-of-view imaging system 100 includes an object plane and an image plane, as well as a first lens group G1, a second lens group G2, an aperture, a third lens group G3, and a fourth lens group G4 arranged in sequence along the optical axis from the object plane to the image plane, and the first lens group G1 and the third lens group G3 are completely symmetrical with the aperture as the symmetry plane (the surface radius and interval are equal, and the optical material is consistent), and the second lens group G2 and the fourth lens group G4 are completely symmetrical with the aperture as the symmetry plane (the surface radius and interval are equal, and the optical material is consistent), so that the optical effect produced by the symmetrical dual-telecentric large-field-of-view imaging system 100 is symmetrical, so as to automatically correct aberrations, including but not limited to vertical axis aberrations, so that the generated vertical axis aberrations can be made equal in size and opposite in sign, that is, coma, distortion, and magnification chromatic aberration can be automatically corrected to zero.

[0035] Specifically, the first lens group G1 is located behind the object plane and in front of the second lens group G2, that is, along the direction of propagation of the light path, the first lens group G1 is closest to the object plane and is in the first position, for focusing and adjusting the light to achieve preliminary imaging of the object; the second lens group G2 is located behind the first lens group G1 and in front of the diaphragm, for further converging and correcting the light to optimize the imaging quality; the diaphragm is located between the second lens group G2 and the third lens group G3, for calling and adjusting the direction, range, etc. of the light; the third lens group G3 is located behind the diaphragm and in front of the fourth lens group G4, for correcting aberrations and optimizing imaging quality; the fourth lens group G4 is located behind the third lens group G3 and in front of the image plane, for finally correcting aberrations to ensure the clarity and resolution of the image plane imaging. Among them, the first lens group G1 includes a first lens L1, a second lens L2, and a third lens L3; the second lens group G2 includes a fourth lens L4, a fifth lens L5, a sixth lens L6, and a seventh lens L7; the third lens group G3 includes an eighth lens L8, a ninth lens L9, a tenth lens L10, and an eleventh lens L11; the fourth lens group G4 includes a twelfth lens L12, a thirteenth lens L13, and a fourteenth lens L14, that is, fourteen lenses are provided, and high-quality imaging effects are ensured through their specific functions and effects.

[0036] In a specific embodiment, Figure 2 As shown, it can be seen that the multi-color modulation transfer function is very close to the diffraction limit, which shows that the visual quality produced by the symmetrical double telecentric large field of view imaging system 100 is very good, and the image field radius reaches 36mm.

[0037] Therefore, the above-mentioned symmetrical double telecentric large field of view imaging system 100, by setting the first lens group G1, the third lens group G3, the second lens group G2 and the fourth lens group G4 that are completely symmetrical with the aperture as the symmetry plane, can make the aberrations of the symmetrical double telecentric large field of view imaging system 100 produce effects of equal size and opposite sign, achieve mutual compensation, and then automatically correct to zero, thereby improving the quality of imaging. Furthermore, by setting 14 lenses, the structure of the symmetrical double telecentric large field of view imaging system 100 can be optimized while ensuring high-quality imaging, making its structure simple, and greatly reducing the manufacturing cost and the process complexity of detection and calibration.

[0038] In one embodiment of the present invention, the first lens L1, the third lens L3, the fourth lens L4, the fifth lens L5, the sixth lens L6, the ninth lens L9, the tenth lens L10, the eleventh lens L11, the twelfth lens L12, and the fourteenth lens L14 are positive lenses, and the second lens L2, the seventh lens L7, the eighth lens L8, and the thirteenth lens L13 are negative lenses.

[0039] Specifically, by setting the first lens L1, the third lens L3, the fourth lens L4, the fifth lens L5, the sixth lens L6, the ninth lens L9, the tenth lens L10, the eleventh lens L11, the twelfth lens L12, and the fourteenth lens L14 as positive lenses, the light can achieve a focusing effect when passing through; by setting the second lens L2, the seventh lens L7, the eighth lens L8, and the thirteenth lens L13 as negative lenses, the light can achieve a divergence effect when passing through. Further, by combining positive lenses and negative lenses, accurate aberration correction, light focusing, and direction adjustment in the optical path of the entire symmetrical dual telecentric large field of view imaging system 100 can be achieved, ensuring the rationality of the aberration distribution of the symmetrical dual telecentric large field of view imaging system 100, balancing the sensitivity of the lens, and thus improving the imaging quality and imaging stability.

[0040] In one embodiment of the present invention, the first lens L1, the third lens L3 and the fifth lens L5 are plano-convex lenses with positive refractive power, and the sides of the first lens L1, the third lens L3 and the fifth lens L5 close to the object plane are flat.

[0041] Specifically, the first lens L1, the third lens L3 and the fifth lens L5 are all plano-convex lenses with positive optical power, which can realize the convergence of light. Specifically, the first lens L1 can preliminarily converge the light emitted from the object plane, and the third lens L3 and the fifth lens L5 can further converge and correct the propagating light; and the side of the first lens L1, the third lens L3 and the fifth lens L5 close to the object plane is set to a plane with an infinite radius of curvature, which can maintain the direction of the light and reduce aberrations, that is, when the light passes through the first lens L1, the third lens L3 and the fifth lens L5, the plane design can reduce the refraction and scattering of the light, thereby maintaining the integrity and directionality of the light and improving the stability and clarity of the imaging.

[0042] In a specific embodiment, for ease of processing, the curvature radius of the first lens L1 on the side close to the image plane may preferably be in the range of 150 mm-170 mm, the curvature radius of the third lens L3 on the side close to the image plane may preferably be in the range of 130 mm-150 mm, and the curvature radius of the fifth lens L5 on the side close to the image plane may preferably be in the range of 180 mm-200 mm.

[0043] In one embodiment of the present invention, the second lens L2 is a biconcave lens with negative optical power, and the curvature radius of the side close to the object plane is smaller than that of the side close to the image plane.

[0044] Specifically, the second lens L2 is a double concave lens with two concave surfaces and negative optical power. When the light passes through the second lens L2, it can be refracted toward the center and separated, thereby dispersing the light. The radius of curvature of the side of the second lens L2 close to the object plane is smaller than that of the side close to the image plane, so that the divergence angle and direction of the light can be more accurately controlled, further dispersing the light coming out of the first lens L1 and guiding it to the third lens L3.

[0045] In a specific embodiment, for ease of processing, the curvature radius of the second lens L2 on the side close to the object plane may preferably be in the range of 70 mm-100 mm, and the curvature radius of the side close to the image plane may preferably be in the range of 180 mm-200 mm.

[0046] In one embodiment of the present invention, the fourth lens L4 is a biconvex lens with positive optical power, and the curvature radius of the side close to the object plane is larger than the curvature radius of the side close to the image plane.

[0047] Specifically, the fourth lens L4 is a double convex lens having two convex surfaces and positive optical power. When light passes through the fourth lens L4, it can be refracted and focused toward the center, thereby converging the light. The radius of curvature of the side of the fourth lens L4 close to the object plane is larger than that of the side close to the image plane, which can more accurately control the divergence angle and direction of the light, further converge the light, and ensure that the light can be correctly transmitted to the fifth lens L5.

[0048] In a specific embodiment, for ease of processing, the curvature radius of the fourth lens L4 on the side close to the object plane may preferably be in a range of 210 mm-230 mm, and the curvature radius of the side close to the image plane may preferably be in a range of 140 mm-160 mm.

[0049] In one embodiment of the present invention, the sixth lens L6 is a meniscus lens and has positive optical power, and a curvature radius of a side close to the object plane is smaller than a curvature radius of a side close to the image plane.

[0050] Specifically, the sixth lens L6 is a meniscus lens having a concave surface and a convex surface and having positive optical power. When the light passes through the sixth lens L6, it can converge the light, and the radius of curvature of the side of the sixth lens L6 close to the object plane is smaller than the side close to the image plane, so that the divergence angle and direction of the light can be more accurately controlled, further converging the light from the fifth lens L5 and ensuring that the light can be correctly transmitted to the seventh lens L7.

[0051] In a specific embodiment, for ease of processing, the curvature radius of the side of the sixth lens L6 close to the object plane may preferably be in a range of 75 mm-89 mm, and the curvature radius of the side close to the image plane may preferably be in a range of 170 mm-190 mm.

[0052] In one embodiment of the present invention, the seventh lens L7 is a plano-concave lens with negative optical power, and a side of the lens close to the object plane is a flat surface.

[0053] Specifically, the seventh lens L7 is a plano-concave lens with negative optical power. When the light passes through the seventh lens L7, it can diverge the light. The side of the seventh lens L7 close to the object plane is a plane with an infinite radius of curvature, which can maintain the direction of the light and reduce aberrations. That is, when the light passes through the seventh lens L7, the plane design can reduce the refraction and scattering of the light, thereby maintaining the integrity and directionality of the light and improving the stability and clarity of the imaging.

[0054] In a specific embodiment, for ease of processing, the curvature radius of the side of the seventh lens L7 close to the image plane may preferably be in a range of 40 mm-60 mm.

[0055] In an embodiment of the present invention, the first lens L1 to the fourteenth lens L14 are all spherical surfaces, and the first lens L1 to the fourteenth lens L14 can correct various aberrations through a combination of positive and negative optical powers and a combination of different materials.

[0056] Specifically, the first lens L1 to the fourteenth lens L14 are all spherical, and can be used for focusing and imaging of the symmetrical double telecentric large field of view imaging system 100. Specifically, when a plurality of spherical lenses are combined together, various aberrations can be corrected by the combination of positive and negative optical focal lengths and the combination of different materials. For example, the combination of positive and negative optical focal lengths can offset or enhance the effect of focal length, thereby adjusting the focus position and focal depth of light; and the combination of different materials can achieve correction of light of different wavelengths.

[0057] In one embodiment of the present invention, the object-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system 100 is less than or equal to 0.2 degrees, and the image-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system 100 is less than or equal to 0.2 degrees.

[0058] Specifically, in the symmetrical dual-telecentric large field of view imaging system 100, the object-side telecentricity is less than or equal to 0.2 degrees, that is, the maximum angle of intersection between the object-side light and the main axis of the symmetrical dual-telecentric large field of view imaging system 100 does not exceed 0.2 degrees, so as to reduce the rotation of the image field and improve the stability of the imaging; at the same time, the image-side telecentricity is less than or equal to 0.2 degrees, that is, the maximum angle of intersection between the image-side light and the main axis of the symmetrical dual-telecentric large field of view imaging system 100 does not exceed 0.2 degrees, so as to maintain the clarity and stability of the imaging and reduce the aberration caused by the change of the light angle. In summary, the design difficulty and debugging difficulty of the front-end lighting system in the symmetrical dual-telecentric large field of view imaging system 100 can be effectively reduced.

[0059] In one embodiment of the utility model, the wavelength range of the symmetrical double telecentric large field of view imaging system 100 is 400nm≤λ≤410nm, the object side numerical aperture range of the symmetrical double telecentric large field of view imaging system 100 is 0.08≤NA≤0.12, the object side line field of view range of the symmetrical double telecentric large field of view imaging system 100 is 20mm≤Y≤30mm, and the vertical axis magnification of the symmetrical double telecentric large field of view imaging system 100 is -1.

[0060] Specifically, on the one hand, the wavelength range of the symmetrical dual telecentric large field of view imaging system 100 is 400nm≤λ≤410nm. Figure 3 As shown in the spot diagram of the symmetrical dual-telecentric large field of view imaging system 100, within the 400nm-410nm band, the geometric diameter and the root mean square diameter of the spot diagram are within the Airy disk; further, as Figure 4 As shown in the vertical axis chromatic aberration diagram, the horizontal axis represents the magnification chromatic aberration, the vertical axis represents the field of view, and the curves of different colors correspond to the chromatic aberration of different bands. In the 400nm-410nm band, the magnification chromatic aberration is basically 0. Figure 5 As shown in the field curvature diagram and distortion diagram of the symmetrical dual-telecentric large field of view imaging system 100, in the field curvature diagram, the horizontal axis represents the field curvature, the vertical axis represents the field of view, and curves of different colors correspond to the field curvature sizes of different bands. In the 400nm-410nm band range, the field curvature size is less than 25μm. In the distortion diagram, the horizontal axis represents the distortion percentage, the vertical axis represents the field of view, and curves of different colors correspond to the distortion sizes of different bands. In the 400nm-410nm band range, the distortion is 0.8 millionths, and the absolute line distortion is less than 0.3μm. In summary, in the 400nm-410nm band range, the distortion correction effect, chromatic aberration correction effect, and aberration correction effect of the symmetrical dual-telecentric large field of view imaging system 100 are all very good, and the imaging quality is high.

[0061] On the other hand, the object-side numerical aperture of the symmetrical dual-telecentric large-field-of-view imaging system 100 ranges from 0.08≤NA≤0.12. Within this range, the numerical aperture can be flexibly selected to meet the needs of different applications. The object-side linear field of view of the symmetrical dual-telecentric large-field-of-view imaging system 100 ranges from 20mm≤Y≤30mm. Within this range, the symmetrical dual-telecentric large-field-of-view imaging system provides continuous and clear images. Due to the symmetry of the symmetrical dual-telecentric large-field-of-view imaging system 100, its vertical axis magnification is -1.

[0062] In one embodiment of the present invention, the conjugate distance of the symmetrical dual-telecentric large-field-of-view imaging system 100 is 650 mm, and the object distance and image distance of the symmetrical dual-telecentric large-field-of-view imaging system 100 are in the range of 75 mm to 95 mm.

[0063] Specifically, the conjugate distance of the symmetrical dual telecentric large field of view imaging system 100 is 650mm, that is, after the light from the object side and the image side passes through the lens, they converge to their respective focal points at a distance of 650mm, respectively, to ensure that the light is correctly transmitted and imaged, while maintaining the stability of the symmetrical dual telecentric large field of view imaging system 100. Furthermore, the object distance and image distance of the symmetrical dual telecentric large field of view imaging system 100 range from 75mm to 95mm, that is, the working distance of the symmetrical dual telecentric large field of view imaging system 100 is 75mm to 95mm.

[0064] In an embodiment of the present invention, the first lens L1 to the fourteenth lens L14 are all made of glass.

[0065] Specifically, the first lens L1 to the fourteenth lens L14 are all made of glass material.

[0066] In a specific embodiment, the refractive index Nd and the Abbe number Vd of the first lens L1 to the fourteenth lens L14 satisfy the following conditions: 1.45<Nd<1.7, 35<Vd<85.

[0067] More specifically, the first lens L1 satisfies: 1.55<Nd<1.65, 30<Vd<45; the second lens L2 satisfies: 1.55<Nd<1.65, 30<Vd<45; the third lens L3 satisfies: 1.65<Nd<1.75, 50<Vd<65; the fourth lens L4 satisfies: 1.55<Nd<1.65, 50<Vd<65; the fifth lens L5 satisfies: 1.45<Nd<1.55, 70<Vd<85; the sixth lens L6 satisfies: 1.45<Nd<1.55, 60<Vd<75; the seventh lens L7 satisfies: 1.55<Nd<1.65, 30<Vd<45; the The eighth lens L8 satisfies: 1.55<Nd<1.65, 30<Vd<45; the ninth lens L9 satisfies: 1.45<Nd<1.55, 60<Vd<75; the tenth lens L10 satisfies: 1.45<Nd<1.55, 70<Vd<85; the eleventh lens L11 satisfies: 1.55<Nd<1.65, 50<Vd<65; the twelfth lens L12 satisfies: 1.65<Nd<1.75, 50<Vd<65; the thirteenth lens L13 satisfies: 1.55<Nd<1.65, 30<Vd<45; and the fourteenth lens L14 satisfies: 1.55<Nd<1.65, 30<Vd<45.

[0068] In a specific embodiment, the parameters of the lenses L1 to L14 of the symmetrical dual-telecentric large-field-of-view imaging system 100 in the embodiment of the utility model are shown in Table 1.

[0069] Table 1

[0070]

[0071]

[0072] In summary, according to the symmetrical dual-telecentric large-field-of-view imaging system 100 of the embodiment of the utility model, by setting the first lens group G1, the third lens group G3, the second lens group G2 and the fourth lens group G4 that are completely symmetrical with the aperture as the symmetry plane, the aberrations of the symmetrical dual-telecentric large-field-of-view imaging system 100 can be made equal in size and opposite in sign, and mutual compensation is achieved, and then automatically corrected to zero, thereby improving the quality of imaging. Furthermore, by setting 14 lenses, the structure of the symmetrical dual-telecentric large-field-of-view imaging system 100 is optimized to make its structure simple. While ensuring a large field of view and high resolution, the use of lenses is reduced, and the manufacturing cost and the process complexity of detection and calibration are greatly reduced.

[0073] The present invention further provides a photolithography device 200 in an embodiment.

[0074] like Figure 6 As shown, it is a structural block diagram of a lithography device 200 according to an embodiment of the present invention. The lithography device 200 includes a symmetrical dual-telecentric large field of view imaging system 100 as described in any one of the above embodiments of the present invention.

[0075] It should be noted that when the lithography device 200 performs symmetrical dual-telecentric large field of view imaging, its specific implementation method is similar to the specific implementation method of the symmetrical dual-telecentric large field of view imaging system 100 of any one of the above-mentioned embodiments of the utility model. Therefore, for a detailed exemplary description of the process of the lithography device 200 performing symmetrical dual-telecentric large field of view imaging, please refer to the aforementioned relevant description part of the symmetrical dual-telecentric large field of view imaging system 100. In order to reduce redundancy, it will not be repeated here.

[0076] According to the lithography device 200 of the embodiment of the utility model, by setting the first lens group G1, the third lens group G3, the second lens group G2 and the fourth lens group G4 that are completely symmetrical with the aperture as the symmetry plane, the aberrations of the symmetrical double telecentric large field of view imaging system 100 can be made equal in size and opposite in sign, and mutual compensation is achieved, and then automatically corrected to zero, thereby improving the quality of imaging. Furthermore, by setting 14 lenses, the structure of the symmetrical double telecentric large field of view imaging system 100 is optimized to make its structure simple. While ensuring a large field of view and high resolution, the use of lenses is reduced, thereby greatly reducing the manufacturing cost and the process complexity of detection and calibration.

[0077] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic expressions of the above terms do not necessarily refer to the same embodiment or example.

[0078] Although the embodiments of the present invention have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A symmetrical dual-telecentric large field of view imaging system, characterized in that: include: object plane, aperture, first lens group, second lens group, third lens group, fourth lens group and image plane; The first lens group, the second lens group, the aperture, the third lens group, and the fourth lens group are arranged in sequence from the object plane to the image plane along the optical axis; The first lens group is located behind the object plane and in front of the second lens group, the second lens group is located behind the first lens group and in front of the aperture, the aperture is located between the second lens group and the third lens group, the third lens group is located behind the aperture and in front of the fourth lens group, and the fourth lens group is located behind the third lens group and in front of the image plane; The first lens group and the third lens group are completely symmetrical with the aperture stop as the symmetry plane, and the second lens group and the fourth lens group are completely symmetrical with the aperture stop as the symmetry plane; Wherein, the first lens group includes a first lens, a second lens, and a third lens; The second lens group includes a fourth lens, a fifth lens, a sixth lens, and a seventh lens; The third lens group includes an eighth lens, a ninth lens, a tenth lens, and an eleventh lens; The fourth lens group includes a twelfth lens, a thirteenth lens, and a fourteenth lens.

2. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The first lens, the third lens, the fourth lens, the fifth lens, the sixth lens, the ninth lens, the tenth lens, the eleventh lens, the twelfth lens, and the fourteenth lens are positive lenses, and the second lens, the seventh lens, the eighth lens, and the thirteenth lens are negative lenses.

3. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The first lens, the third lens, and the fifth lens are plano-convex lenses with positive optical power. The sides of the first lens, the third lens, and the fifth lens close to the object plane are flat.

4. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The second lens is a biconcave lens and has negative optical power, and the curvature radius of the side close to the object plane is smaller than that of the side close to the image plane.

5. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The fourth lens is a biconvex lens and has positive optical power, and the curvature radius of the side close to the object plane is larger than that of the side close to the image plane.

6. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The sixth lens is a meniscus lens and has positive optical power, and a curvature radius of a side close to the object plane is smaller than a curvature radius of a side close to the image plane.

7. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The seventh lens is a plano-concave lens with negative optical power, and a side of the seventh lens close to the object plane is a flat surface.

8. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The first lens to the fourteenth lens are all spherical surfaces, and the first lens to the fourteenth lens can correct various aberrations through the combination of positive and negative optical powers and the combination of different materials.

9. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The object-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system is less than or equal to 0.2 degrees, and the image-side telecentricity of the symmetrical dual-telecentric large-field-of-view imaging system is less than or equal to 0.2 degrees.

10. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The wavelength range of the symmetrical double telecentric large field of view imaging system is 400nm≤λ≤410nm, the object side numerical aperture range of the symmetrical double telecentric large field of view imaging system is 0.08≤NA≤0.12, the object side line field range of the symmetrical double telecentric large field of view imaging system is 20mm≤Y≤30mm, and the vertical axis magnification of the symmetrical double telecentric large field of view imaging system is -1.

11. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The yoke distance of the symmetrical double telecentric large field of view imaging system is 650 mm, and the range of the object distance and the image distance of the symmetrical double telecentric large field of view imaging system is 75 mm-95 mm.

12. The symmetrical dual-telecentric large field of view imaging system according to claim 1, characterized in that: The first lens to the fourteenth lens are all made of glass material.

13. A lithography apparatus, characterized in that: It comprises a symmetrical dual-telecentric large-field-of-view imaging system as described in any one of claims 1 to 12.

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