Vacuum film forming equipment and battery production system

Abstract

The utility model discloses vacuum film forming equipment and a battery production system. The vacuum film forming equipment comprises a substrate, a cover body and an air exhaust assembly, a first air exhaust hole is formed in the geometric center of the base plate, a plurality of second air exhaust holes are formed in the periphery of the base plate, and the aperture of the first air exhaust hole is larger than that of the second air exhaust holes; the cover body is arranged on one side of the substrate; the cover body is matched with the substrate to form a vacuum cavity; and the first air exhaust hole and the plurality of second air exhaust holes are in fluid communication with the air exhaust assembly. The first air exhaust hole is formed in the geometric center of the substrate, and the multiple second air exhaust holes are formed in the periphery of the substrate, so that the overall air exhaust airflow in the vacuum cavity is uniform, the non-uniformity of perovskite film forming is reduced within the limited time, the uniformity of perovskite film forming is improved, and the perovskite crystal stability is improved.

Description

Technical Field

[0001] The present application relates to the field of battery production technology, and in particular to vacuum film-forming equipment and battery production systems. Background Art

[0002] During the production of solar cells, after the perovskite wet film is coated, it needs to be crystallized in a vacuum crystallization furnace. However, the existing vacuum crystallization furnace usually has only one large exhaust hole in the middle, and the exhaust is uneven, resulting in poor uniformity of perovskite film crystallization. Utility Model Content

[0003] The present application provides a vacuum film-forming device and a battery production system to improve the crystallization consistency of perovskite.

[0004] In order to solve the above-mentioned technical problems, the first aspect of the present application provides a vacuum film-forming device, including a substrate, a cover body and an exhaust assembly; a first exhaust hole is provided at the geometric center of the substrate, and a plurality of second exhaust holes are provided around the substrate, and the aperture of the first exhaust hole is larger than the aperture of the second exhaust hole; the cover body is provided on one side of the substrate; the cover body and the substrate cooperate to form a vacuum chamber; the first exhaust hole and the plurality of second exhaust holes are all fluidically connected to the exhaust assembly.

[0005] The present application sets a first exhaust hole at the geometric center of the substrate and sets multiple second exhaust holes at the periphery of the substrate to improve the uniformity of the overall exhaust airflow in the vacuum chamber, reduce the unevenness of perovskite film formation within a limited time, improve the uniformity of perovskite film formation, improve the crystallization stability of perovskite, and improve the open circuit voltage, short circuit current, fill factor, and photoelectric conversion efficiency of the battery, thereby improving the battery performance.

[0006] In one embodiment, the exhaust component includes an exhaust part and an exhaust pipe that are interconnected, and the exhaust pipe is located on the side of the substrate away from the cover body; the exhaust pipe is connected to the first exhaust hole; a connecting groove is provided on the substrate, and the connecting groove is respectively connected to the first exhaust hole and the second exhaust hole.

[0007] By performing the above-mentioned design among the first air exhaust hole, the second air exhaust hole, the connecting groove and the air exhaust component, the first air exhaust hole is directly connected to the air exhaust pipe, thereby realizing fluid connection between the first air exhaust hole and the air exhaust component; the second air exhaust hole is connected to the air exhaust pipe through the connecting groove and the first air exhaust hole, thereby realizing fluid connection between the second air exhaust hole and the air exhaust component.

[0008] In one embodiment, the substrate includes a first sub-plate and a second sub-plate which are stacked; the first sub-plate is arranged on a side of the second sub-plate close to the cover body; the first air exhaust hole and the second air exhaust hole are arranged on the first sub-plate; a connecting hole and the connecting groove are provided on the second sub-plate; the connecting hole connects the first air exhaust hole and the air exhaust pipe; the connecting groove connects the connecting hole and the second air exhaust hole.

[0009] By setting the substrate to include the first sub-plate and the second sub-plate, it is easy to form the first exhaust hole, the second exhaust hole and the connecting groove, thereby reducing the processing difficulty of the substrate. In addition, by setting the substrate to include the first sub-plate and the second sub-plate, it is easy to modify the existing vacuum crystallization equipment to form the vacuum film forming equipment of the present application. Specifically, a large exhaust hole is also provided at the geometric center of the bottom plate of the existing vacuum crystallization equipment. The large exhaust hole can be used as a connecting hole, and a connecting groove is formed by slotting the bottom plate. Then, the first sub-plate is added to the side of the bottom plate close to the cover body. The modified bottom plate and the added first sub-plate cooperate to form the substrate of the present application, thereby improving the applicability.

[0010] In one embodiment, the orthographic projection of the geometric center of the communication hole on the first sub-plate coincides with the geometric center of the first air pumping hole; the communication groove includes a first sub-groove and a second sub-groove, the first sub-groove is connected to the communication hole and the second sub-groove, the second sub-groove is connected to the second air pumping hole, and the orthographic projection of the second sub-groove on the first sub-plate covers at least a portion of the second air pumping hole. By setting the communication groove as the first sub-groove and the second sub-groove, fluid communication between the second air pumping hole and the communication hole is achieved.

[0011] In one embodiment, the substrate includes a first surface and a second surface that are arranged opposite to each other; the cover is arranged on one side of the first surface of the substrate; a connecting groove is arranged on the second surface; the connecting groove is respectively connected to the first air extraction hole and the second air extraction hole; the first air extraction hole is fluidically connected to the air extraction pipeline. By providing the connecting groove on the second surface of the substrate, the number of structural parts is reduced and the assembly process is simplified.

[0012] In one embodiment, the connecting groove includes a first sub-groove and a second sub-groove, the first sub-groove is respectively connected to the first air pumping hole and the second sub-groove, the second sub-groove is connected to the second air pumping hole, and the second sub-groove covers at least two of the second air pumping holes. By setting the connecting groove as the first sub-groove and the second sub-groove, the fluid communication between the second air pumping hole and the first air pumping hole is achieved, and then the fluid communication between the second air pumping hole and the air pumping assembly is achieved.

[0013] In one embodiment, each of the connecting grooves has the same width, and each of the connecting grooves is provided with a regulating valve. By providing the regulating valve, the air extraction speed in each connecting groove is adjusted to maintain uniform air extraction at various locations in the vacuum chamber.

[0014] In one embodiment, the vacuum film forming equipment further comprises an exhaust hood, the exhaust hood is arranged on a side of the substrate away from the cover, the exhaust hood comprises a first port and a second port, the first port covers the first exhaust hole and the plurality of second exhaust holes, and the second port is in fluid communication with the exhaust assembly. The first exhaust hole and the plurality of second exhaust holes are in fluid communication with the exhaust assembly through the exhaust hood.

[0015] In one embodiment, the cover body includes a main body portion and a connecting portion arranged on the entire circumferential edge of the main body portion; the main body portion and the substrate are spaced apart, and the connecting portion is in contact with the surface of the substrate; the vertical spacing between the second exhaust hole and the edge line of the substrate is greater than the width of the connecting portion, so that the plurality of second exhaust holes are completely located in the vacuum cavity formed by the cover body and the substrate.

[0016] In one embodiment, the vertical distance between the second exhaust hole and the edge of the substrate is greater than or equal to 100 mm and less than or equal to 140 mm, which is conducive to increasing the width of the connecting portion of the cover body and achieving a better sealing effect, thereby achieving a preset vacuum value within a predetermined time.

[0017] In one embodiment, the aperture of the first air pumping hole is 150mm-200mm; and / or, the aperture of the second air pumping hole is 20mm-40mm. By designing the aperture of the first air pumping hole as above, the processing of the first air pumping hole and the connection arrangement of the air pumping pipe and the first air pumping hole are facilitated; by designing the aperture of the second air pumping hole as above, the processing of the second air pumping hole is facilitated; the apertures of the first air pumping hole and the second air pumping hole are designed to the above sizes at the same time, which is conducive to balancing the exhaust speed and exhaust atmosphere of the entire vacuum chamber.

[0018] In one embodiment, the outline of the substrate is a rectangle; a plurality of second air extraction holes are evenly spaced along the edge of the long side of the rectangle, and a plurality of second air extraction holes are evenly spaced along the edge of the short side of the rectangle; the distance between two adjacent second air extraction holes arranged corresponding to the long side of the rectangle is greater than the distance between two adjacent second air extraction holes arranged corresponding to the short side of the rectangle.

[0019] By designing that a plurality of second exhaust holes are evenly spaced along the edges of the long sides of the rectangle, and a plurality of second exhaust holes are evenly spaced along the edges of the short sides of the rectangle, the exhaust speed at various locations in the long side direction and the exhaust speed at various locations in the short side direction are balanced, thereby achieving a balanced exhaust speed in the entire vacuum chamber and maintaining uniform exhaust.

[0020] In one embodiment, the distance between two adjacent second exhaust holes arranged corresponding to the long side of the rectangle is 280mm-320mm; and / or, the distance between two adjacent second exhaust holes arranged corresponding to the short side of the rectangle is 180mm-220mm, so as to balance the exhaust speed and exhaust atmosphere of the entire vacuum chamber and maintain uniform exhaust.

[0021] In one embodiment, the surface of the substrate facing the cover body has a plurality of support columns, the end faces of the support columns are spaced apart from the cover body, and the end faces of the support columns are configured to place the product to be processed. By providing the support columns, the product to be processed is spaced apart from the substrate, and the first and second air extraction holes on the substrate are kept unobstructed for air extraction, thereby maintaining uniform air extraction.

[0022] In one embodiment, the plurality of support columns are distributed in an array, and the vertical distance between the support column close to the edge of the substrate and the edge of the substrate is greater than the vertical distance between the second exhaust hole and the edge of the substrate, so as to facilitate the closing of the cover body and reduce the probability of damage to the product to be processed placed on the support column.

[0023] In one embodiment, the vertical distance between the support column close to the edge of the substrate and the edge of the substrate is greater than or equal to 200 mm and less than or equal to 240 mm, so that the cover body can be closed while maintaining the sealing between the cover body and the substrate.

[0024] In one embodiment, the support column includes a first column and a second column, the second column is located on a side of the first column away from the substrate; along the direction from the substrate to the cover, the cross-sectional area of ​​the second column gradually decreases. Along the direction from the substrate to the cover, the cross-sectional area of ​​the second column gradually decreases, which is beneficial to reduce the contact area between the support column and the product to be processed, reduce interference with the product to be processed, and improve the consistency of film formation at various locations of the product to be processed.

[0025] In one embodiment, the material of the end of the support column away from the substrate includes Teflon. Teflon has the characteristics of high temperature resistance and low thermal conductivity. By setting the material of the end of the support column to Teflon, the consistency of film formation at various locations of the product to be processed is improved.

[0026] In one embodiment, a third exhaust hole is further provided on the substrate, and the third exhaust hole is located in an area defined by the first exhaust hole and a plurality of the second exhaust holes to maintain uniform exhaust in the vacuum chamber.

[0027] In order to solve the above-mentioned technical problems, the second aspect of the present application provides a battery production system, including a coating device and a vacuum film-forming device; the vacuum film-forming device is arranged downstream of the coating device, and the vacuum film-forming device is configured to perform vacuum crystallization on the film layer material coated by the coating device; the vacuum film-forming device is any of the vacuum film-forming devices described above, and has at least the same advantages as the vacuum film-forming device.

[0028] In one embodiment, the coating device is configured to coat a perovskite material; and the vacuum film forming device is configured to form the coated perovskite material into a perovskite film. By using the vacuum film forming device for crystallization and film forming, the overall pumping speed in the vacuum chamber of the vacuum film forming device is kept uniform, the atmosphere in the chamber is highly uniform, the perovskite crystallization atmosphere is stable, the film formation uniformity is improved, and thus the device performance is improved.

[0029] The above description is only an overview of the technical solution of the present application. In order to more clearly understand the technical means of the present application, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0031] Figure 1a is a schematic structural diagram of a vacuum film-forming device provided in an embodiment of the present application;

[0032] Figure 1b yes Figure 1a A distribution structure diagram of the first air extraction holes and the second air extraction holes on the substrate shown;

[0033] Figure 2 yes Figure 1a A schematic cross-sectional structure diagram of an embodiment of a substrate shown;

[0034] Figure 3 yes Figure 2 A schematic diagram of the top view of the structure of the first sub-board shown;

[0035] Figure 4 yes Figure 2 A schematic diagram of the top view of the structure of the second sub-board shown;

[0036] Figure 5 yes Figure 1a A schematic structural diagram of another embodiment of the substrate shown;

[0037] Figure 6 yes Figure 5 A schematic structural diagram of the first surface of the substrate shown;

[0038] Figure 7 yes Figure 5 A schematic structural diagram of the second surface of the substrate shown;

[0039] Figure 8 yes Figure 1a A partial structural schematic diagram of an embodiment of a vacuum film forming device is shown;

[0040] Fig. 9 yes Figure 1a The structural schematic diagram of the cover body shown;

[0041] Fig.10 yes Figure 1a A schematic diagram of the structure of the support column shown;

[0042] Fig.11 This is a simulation result diagram of an existing crystallization device;

[0043] Fig.12 This is a simulation result diagram of the vacuum film-forming equipment provided in the embodiment of the present application. DETAILED DESCRIPTION

[0044] In order to make the purpose, technical solution and effect of the present application clearer and more specific, the following will describe the embodiments of the technical solution of the present application in detail with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present application, and are therefore only used as examples, and cannot be used to limit the scope of protection of the present application.

[0045] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which this application belongs; the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" in the specification and claims of this application and the above-mentioned figure descriptions and any variations thereof are intended to cover non-exclusive inclusions.

[0046] In the description of the embodiments of the present application, the technical terms "first", "second", etc. are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the term "multiple" refers to more than two (including two), and similarly, "multiple groups" refers to more than two (including two groups), and "multiple pieces" refers to more than two (including two pieces), unless otherwise clearly and specifically defined.

[0047] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0048] In the description of the embodiments of the present application, the term "and / or" is only a description of the association relationship of the associated objects, indicating that there may be three relationships. For example, A and / or B can represent: A exists alone, A and B exist at the same time, and B exists alone. In addition, the character " / " in this article generally indicates that the associated objects before and after are in an "or" relationship.

[0049] Amounts, ratios and other numerical values ​​are presented herein in a range format. It should be understood that such a range format is for convenience and brevity and should be flexibly interpreted to include not only the values ​​explicitly specified as range limits, but also all individual values ​​or sub-ranges encompassed within the range, as if each value and sub-range were explicitly specified.

[0050] If there is no special explanation, all steps of the present application can be performed sequentially, randomly, or in parallel, preferably sequentially. For example, the method includes steps (a) and (b), indicating that the method may include steps (a) and (b) performed sequentially, or may include steps (b) and (a) performed sequentially, or may be steps (a) and (b) performed simultaneously in parallel. For example, the method may also include step (c), indicating that step (c) may be added to the method in any order, for example, the method may include steps (a), (b) and (c), or may include steps (a), (c) and (b), or may include steps (c), (a) and (b), etc.

[0051] During the production of solar cells, after the perovskite wet film is coated, it needs to be crystallized in a vacuum crystallization furnace. However, the existing vacuum crystallization furnace usually has only one large exhaust hole in the middle. The exhaust flow rate near the exhaust hole is faster than the exhaust flow rate far from the exhaust hole. The perovskite wet film crystallizes faster in the area with fast exhaust speed. This uneven exhaust leads to poor uniformity of perovskite film crystallization.

[0052] In view of this, the present application provides a vacuum film-forming device and a battery production system to improve the uniformity of exhaust gas, thereby improving the uniformity of perovskite film formation. It should be noted that the vacuum film-forming device provided in the present application is not limited to perovskite wet film crystallization film formation, and other products to be processed that need to be operated under vacuum conditions can be operated and processed using the vacuum film-forming device provided in the present application.

[0053] See also Figure 1a and Figure 1b , Figure 1a is a schematic structural diagram of a vacuum film-forming device provided in an embodiment of the present application, Figure 1b yes Figure 1a The distribution structure diagram of the first air pumping holes and the second air pumping holes on the substrate is shown.

[0054] The vacuum film forming equipment 100 includes a substrate 11, a cover body 12, and an exhaust assembly 13. A first exhaust hole 111 is provided at the geometric center of the substrate 11. A plurality of second exhaust holes 112 are provided around the substrate 11. The aperture of the first exhaust hole 111 is larger than the aperture of the second exhaust hole 112. The first exhaust hole 111 and the plurality of second exhaust holes 112 are both in fluid communication with the exhaust assembly 13. The cover body 12 is provided on one side of the substrate 11. The cover body 12 cooperates with the substrate 11 to form a vacuum chamber (not shown). The exhaust assembly 13 exhausts the vacuum chamber to a preset vacuum value within a predetermined time through the first exhaust hole 111 and the second exhaust hole 112, so as to realize film forming processing in the vacuum chamber.

[0055] The vacuum assembly 13 refers to a device that uses mechanical, physical, chemical or physicochemical methods to vacuum the container to obtain a vacuum. The substrate 11 refers to a structural member that forms a part of the cavity wall of the vacuum chamber. The cover 12 refers to a structural member that forms a part of the cavity wall of the vacuum chamber.

[0056] Compared with the prior art which has only one large exhaust hole in the middle, the present application improves the uniformity of the overall exhaust airflow in the vacuum chamber by setting a first exhaust hole 111 at the geometric center of the substrate 11 and setting multiple second exhaust holes 112 around the substrate 11. When applied to film forming treatment, it can reduce the non-uniformity of perovskite film formation within a limited time, improve the uniformity of perovskite film formation, improve the crystallization stability of perovskite, and improve the open circuit voltage, short circuit current, filling factor, and photoelectric conversion efficiency of the battery, thereby improving the battery performance.

[0057] In one embodiment, the air extraction assembly 13 includes an air extraction member 131 and an air extraction pipe 132 which are connected to each other. The air extraction pipe 132 is located on the side of the substrate 11 away from the cover body 12. The air extraction pipe 132 is connected to the first air extraction hole 111. The substrate 11 is provided with a connecting groove 113 (see Figure 4 or Figure 7 The connecting groove 113 is connected to the first air extraction hole 111 and the second air extraction hole 112 respectively; in other words, the second air extraction hole 112 is connected to the first air extraction hole 111 through the connecting groove 113, and then connected to the air extraction pipe 132 through the first air extraction hole 111. The air extraction member 131 refers to a device that can extract air from the container to obtain a vacuum; the air extraction pipe 132 refers to a pipe that connects the air extraction member 131 with the first air extraction hole 111 and the second air extraction hole 112.

[0058] By performing the above-mentioned design among the first air exhaust hole 111, the second air exhaust hole 112, the connecting groove 113 and the air exhaust component 13, the first air exhaust hole 111 is directly connected with the air exhaust pipe 132, thereby realizing fluid connection between the first air exhaust hole 111 and the air exhaust component 13; the second air exhaust hole 112 is connected with the air exhaust pipe 132 through the connecting groove 113 and the first air exhaust hole 111, thereby realizing fluid connection between the second air exhaust hole 112 and the air exhaust component 13.

[0059] Optionally, the suction member 131 may be a vacuum pump.

[0060] See also Figures 2 to 4 , Figure 2 yes Figure 1a The cross-sectional structure diagram of an embodiment of the substrate shown in FIG. Figure 3 yes Figure 2 The schematic diagram of the top view of the structure of the first sub-board shown in FIG. Figure 4 yes Figure 2 A schematic diagram of the top structure of the second sub-board is shown.

[0061] In one embodiment, the substrate 11 includes a first sub-plate 11a and a second sub-plate 11b which are stacked, and the first sub-plate 11a is arranged on a side of the second sub-plate 11b close to the cover 12. The first air extraction hole 111 and the second air extraction hole 112 are arranged on the first sub-plate 11a. The second sub-plate 11b is provided with a connecting groove 113 and a connecting hole 114. The connecting hole 114 connects the first air extraction hole 111 with the air extraction pipe 132. The connecting groove 113 connects the connecting hole 114 with the second air extraction hole 112.

[0062] Among them, the first air extraction hole 111 and the second air extraction hole 112 are through holes that penetrate the first sub-plate 11a respectively; the axes of the first air extraction hole 111 and the second air extraction hole 112 are parallel to the thickness direction of the first sub-plate 11a. The connecting hole 114 is a through hole that penetrates the second sub-plate 11b, and the axis of the connecting hole 114 is parallel to the thickness direction of the second sub-plate 11b. The connecting hole 114 includes a first port and a second port relative to each other, the first port of the connecting hole 114 is connected to the first air extraction hole 111, and the second port of the connecting hole 114 is connected to the air extraction pipe 132, so that the connecting hole 114 is connected to the first air extraction hole 111 and the air extraction pipe 132 respectively. The connecting groove 113 is provided on the surface of the second sub-plate 11b facing the first sub-plate 11a. The depth of the connecting groove 113 is designed according to needs.

[0063] By configuring the substrate 11 to include the first sub-plate 11a and the second sub-plate 11b, it is easy to form the first air extraction hole 111, the second air extraction hole 112 and the connecting groove 113, thereby reducing the processing difficulty of the substrate 11. In addition, configuring the substrate 11 to include the first sub-plate 11a and the second sub-plate 11b facilitates the modification of the existing vacuum crystallization equipment to form the vacuum film forming equipment of the present application. Specifically, a large air extraction hole is also provided at the geometric center of the bottom plate of the existing vacuum crystallization equipment, and the large air extraction hole can be used as the connecting hole 114. The connecting groove 113 is formed by slotting the bottom plate, and then the first sub-plate 11a is added to the side of the bottom plate close to the cover body 12. The modified bottom plate and the added first sub-plate 11a cooperate to form the substrate 11 of the present application, thereby improving the applicability.

[0064] Optionally, the orthographic projection of the geometric center of the connecting hole 114 on the first sub-plate 11a coincides with the geometric center of the first air extraction hole 111 , so that the connecting hole 114 is aligned with the first air extraction hole 111 , thereby achieving connection between the connecting hole 114 and the first air extraction hole 111 .

[0065] The connecting groove 113 includes a first sub-groove 1131 and a second sub-groove 1132. The first sub-groove 1131 is connected to the connecting hole 114 and the second sub-groove 1132. The second sub-groove 1132 is connected to the second air extraction hole 112. The orthographic projection of the second sub-groove 1132 on the first sub-plate 11a covers at least part of the second air extraction hole 112; in other words, the second sub-groove 1132 is arranged corresponding to the second air extraction hole 112. It should be noted that the second sub-groove 1132 covers at least part of the second air extraction hole 112 means that the second sub-groove 1132 covers one or more of the plurality of second air extraction holes 112.

[0066] The fluid communication between the second air extraction hole 112 and the communication hole 114 is achieved by configuring the communication groove 113 to be a first sub-groove 1131 and a second sub-groove 1132. Exemplarily, the extension direction of the first sub-groove 1131 is perpendicular to the extension direction of the second sub-groove 1132.

[0067] The second sub-plate 11b is provided with a plurality of connecting grooves 113, and the connecting grooves 113 are independent of each other along the extension path without crossing, so as to reduce the crosstalk during the vacuuming process. The orthographic projections of the connecting grooves 113 on the first sub-plate 11a cover all the second air extraction holes 112 on the first sub-plate 11a, so that the second air extraction holes 112 are in fluid communication with the air extraction assembly 13 through the connecting grooves 113 and the connecting holes 114.

[0068] Optionally, a sealing ring is provided between the first sub-plate 11a and the second sub-plate 11b, and the first air extraction hole 111 and the second air extraction hole 112 are located in the space defined by the sealing ring; the first sub-plate 11a and the second sub-plate 11b are sealed by the sealing ring to achieve vacuum.

[0069] Optionally, the outline of the orthographic projection of the first sub-board 11a on the second sub-board 11b is located inside the first sub-board 11a; in other words, the area of ​​the second sub-board 11b is larger than that of the first sub-board 11a, which facilitates the assembly of the first sub-board 11a and reduces costs.

[0070] Optionally, the surface of the first sub-board 11a facing the cover 12 is flat. The surface of the first sub-board 11a facing the second sub-board 11b and the surface of the second sub-board 11b facing the first sub-board 11a are arranged in coordination to achieve a stacking arrangement between the first sub-board 11a and the second sub-board 11b.

[0071] Optionally, the first sub-board 11a and the second sub-board 11b are both in a plate-shaped structure.

[0072] Optionally, the outlines of the first sub-plate 11a and the second sub-plate 11b are both rectangular, in other words, the outline of the substrate 11 is rectangular. A plurality of second air extraction holes 112 are provided along the edge of the long side of the first sub-plate 11a, and a plurality of second air extraction holes 112 are provided along the edge of the short side of the first sub-plate 11a. The second sub-plate 11b is provided with a second sub-groove 1132 corresponding to the plurality of second air extraction holes 112 at the edge of the long side of the first sub-plate 11a, that is, the plurality of second air extraction holes 112 at the long side of the first sub-plate 11a are connected to the connecting hole 114 through the same connecting groove 113. The second sub-plate 11b is provided with a second sub-groove 1132 corresponding to the plurality of second air extraction holes 112 at the edge of the short side of the first sub-plate 11a, that is, the plurality of second air extraction holes 112 at the short side of the first sub-plate 11a are connected to the connecting hole 114 through the same connecting groove 113.

[0073] Optionally, each connecting groove 113 on the second sub-plate 11b has the same width, and each connecting groove 113 is provided with a regulating valve 115. Specifically, the second sub-plate 11b is provided with a plurality of first sub-grooves 1131 and a plurality of second sub-grooves 1132, the widths between each first sub-grooves 1131 are the same, the widths between each second sub-grooves 1132 are the same, and a regulating valve 115 is provided on each first sub-groove 1131. By providing the regulating valve 115, the air extraction speed in each connecting groove 113 is adjusted to maintain uniform air extraction at various locations in the vacuum chamber.

[0074] Optionally, the width of each first sub-groove 1131 on the second sub-plate 11b is different, and / or the width of each second sub-groove 1132 is different, and the regulating valve 115 structure is omitted. By designing the width of the first sub-groove 1131 and / or the second sub-groove 1132, the pumping speed in each connecting groove 113 is adjusted, thereby maintaining uniform pumping in various places in the vacuum chamber.

[0075] See also Figures 5 to 7 , Figure 5 yes Figure 1a A schematic structural diagram of another embodiment of the substrate is shown, Figure 6 yes Figure 5 The schematic structural diagram of the first surface of the substrate is shown in FIG. Figure 7 yes Figure 5 A schematic structural diagram of the second surface of the substrate is shown.

[0076] In one embodiment, the substrate 11 includes a first surface 11c and a second surface 11d disposed opposite to each other. The cover 12 is disposed on one side of the first surface 11c of the substrate 11. The second surface 11d is provided with a connecting groove 113, and the connecting groove 113 is respectively connected to the first air extraction hole 111 and the second air extraction hole 112. The first air extraction hole 111 is fluidically connected to the air extraction pipe 132. By providing the connecting groove 113 on the second surface 11d of the substrate 11, the number of structural parts is reduced and the assembly process is simplified.

[0077] The first air extraction hole 111 and the second air extraction hole 112 are through holes penetrating the substrate 11 respectively; the axes of the first air extraction hole 111 and the second air extraction hole 112 are parallel to the thickness direction of the substrate 11. The port of the first air extraction hole 111 is connected to the air extraction pipeline 132, so that the first air extraction hole 111 is fluidically connected to the air extraction pipeline 132. The depth of the connecting groove 113 is designed according to needs.

[0078] Optionally, the connecting groove 113 includes a first sub-groove 1131 and a second sub-groove 1132. The first sub-groove 1131 is connected to the first air extraction hole 111 and the second sub-groove 1132 respectively. The second sub-groove 1132 is connected to the second air extraction hole 112. The second sub-groove 1132 covers at least two second air extraction holes 112; in other words, the second sub-groove 1132 is arranged corresponding to at least two second air extraction holes 112. By setting the connecting groove 113 as the first sub-groove 1131 and the second sub-groove 1132, the fluid communication between the second air extraction hole 112 and the first air extraction hole 111 is achieved, and then the fluid communication between the second air extraction hole 112 and the air extraction component 13 is achieved. Exemplarily, the extension direction of the first sub-groove 1131 is perpendicular to the extension direction of the second sub-groove 1132.

[0079] The second surface 11d of the substrate 11 is provided with a plurality of connecting grooves 113, and the connecting grooves 113 are independent of each other along the extension path without crossing. The connecting grooves 113 cover all the second air extraction holes 112, so that the second air extraction holes 112 are fluidically connected to the air extraction assembly 13 through the connecting grooves 113 and the first air extraction holes 111.

[0080] Optionally, the surface of the substrate 11 facing the cover 12 is flat.

[0081] Optionally, the substrate 11 has a plate-shaped structure.

[0082] Optionally, the outline of the substrate 11 is a rectangle. A plurality of second air extraction holes 112 are provided along the edge of the long side of the substrate 11, and a plurality of second air extraction holes 112 are provided along the edge of the short side of the substrate 11. A second sub-groove 1132 is provided on the second surface 11d of the substrate 11 corresponding to the plurality of second air extraction holes 112 at the edge of the long side of the substrate 11, that is, the plurality of second air extraction holes 112 at the long side of the substrate 11 are connected to the first air extraction holes 111 through the same connecting groove 113. A second sub-groove 1132 is provided on the substrate 11 corresponding to the plurality of second air extraction holes 112 at the edge of the short side of the substrate 11, that is, the plurality of second air extraction holes 112 at the short side of the substrate 11 are connected to the first air extraction holes 111 through the same connecting groove 113.

[0083] Optionally, each of the connecting grooves 113 on the second surface 11d of the substrate 11 has the same width, and each of the connecting grooves 113 is provided with a regulating valve 115. Specifically, a plurality of first sub-grooves 1131 and a plurality of second sub-grooves 1132 are provided on the second surface 11d, the widths between each of the first sub-grooves 1131 are the same, the widths between each of the second sub-grooves 1132 are the same, and a regulating valve 115 is provided on each of the first sub-grooves 1131. By providing the regulating valve 115, the exhaust speed in each of the connecting grooves 113 is adjusted to maintain uniform exhaust at various locations in the vacuum chamber.

[0084] Optionally, the width of each first sub-groove 1131 on the second surface 11d is different, and / or the width of each second sub-groove 1132 is different, and the regulating valve 115 structure is omitted. By designing the width of the first sub-groove 1131 and / or the second sub-groove 1132, the pumping speed in each connecting groove 113 is adjusted, thereby maintaining uniform pumping in various parts of the vacuum chamber.

[0085] See also Figure 8 , Figure 8 yes Figure 1a A schematic diagram of the partial structure of an embodiment of a vacuum film-forming device is shown.

[0086] The vacuum film forming equipment 100 also includes an exhaust hood 14. The exhaust hood 14 is arranged on the side of the substrate 11 away from the cover body 12. The exhaust hood 14 includes a first port and a second port. The first port of the exhaust hood 14 covers the first exhaust hole 111 and the plurality of second exhaust holes 112. The second port of the exhaust hood 14 is connected to the exhaust pipe 132, that is, the second port is fluidically connected to the exhaust component 13. The first exhaust hole 111 and the plurality of second exhaust holes 112 are fluidically connected to the exhaust component 13 through the exhaust hood 14. Among them, the first exhaust hole 111 and the second exhaust hole 112 are both through holes that penetrate the substrate 11.

[0087] See also Fig. 9 , Fig. 9 yes Figure 1a The structural schematic diagram of the cover body is shown.

[0088] The cover 12 includes a body 121 and a connection portion 122 disposed on the entire periphery of the body 121. The body 121 is spaced apart from the substrate 11. The connection portion 122 is in contact with the surface of the substrate 11. The vertical spacing between the second air extraction hole 112 and the edge of the substrate 11 is greater than the width of the connection portion 122.

[0089] The width of the connecting portion 122 refers to the dimension of the connecting portion 122 in the vertical direction along the edge of the second air extraction hole 112 and the substrate 11. Along the direction in which the cover 12 points to the substrate 11, the cross-sectional shape of the main body 121 of the cover 12 can be an arc or a broken line, etc., as long as the main body 121 is spaced from the substrate 11. Optionally, Fig. 9 As shown, along the direction in which the cover body 12 points toward the substrate 11 , the cross-sectional shape of the main body portion 121 of the cover body 12 is an arc.

[0090] By designing the cover 12 to include a main body 121 and a connecting portion 122, the main body 121 cooperates with the substrate 11 to form a vacuum chamber, and the connecting portion 122 is sealed and connected to the substrate 11, so that the vacuum chamber can be evacuated. By designing the vertical spacing between the second air extraction holes 112 and the edge of the substrate 11 to be greater than the width of the connecting portion 122, the plurality of second air extraction holes 112 are completely located in the vacuum chamber formed by the cover 12 and the substrate 11.

[0091] In one embodiment, the vertical spacing between the second air extraction hole 112 and the edge of the substrate 11 is greater than or equal to 100 mm, which is conducive to increasing the width of the connecting portion 122 of the cover body 12, achieving a better sealing effect, and thus achieving a preset vacuum value (low vacuum within 10pa) within a predetermined time (for example, about 20 seconds). Optionally, the vertical spacing between the second air extraction hole 112 and the edge of the substrate 11 is greater than or equal to 100 mm and less than or equal to 140 mm, so that the second air extraction hole 112 is as close to the edge of the substrate 11 as possible, which is conducive to keeping the air extraction speed at the edge of the substrate 11 the same as the air extraction speed in the middle part of the substrate 11, and maintaining uniform air extraction.

[0092] Continue reading Fig. 9 Combined with Figure 1a A reinforcing rib 123 is provided on the surface of the cover body 12 facing away from the substrate 11 to improve the structural strength of the cover body 12 and reduce the possibility of the main body 121 of the cover body 12 being dented during the vacuuming process, thereby reducing the probability of damage to the product to be processed placed in the vacuum film forming equipment 100.

[0093] In one embodiment, the reinforcing rib 123 includes a first sub-rib 1231 and a second sub-rib 1232. The extension direction of the first sub-rib 1231 is defined as a first direction, and the extension direction of the second sub-rib 1232 is defined as a second direction, and the first direction intersects the second direction. A plurality of second sub-ribs 1232 are respectively distributed on opposite sides of the first sub-rib 1231, and the plurality of second sub-ribs 1232 are respectively connected to the first sub-rib 1231.

[0094] Optionally, the second sub-ribs 1232 on opposite sides of the first sub-rib 1231 are aligned with each other.

[0095] Optionally, the first direction is perpendicular to the second direction.

[0096] Optionally, the outline of the substrate 11 is a rectangle, and the first direction is parallel to the long side direction of the substrate 11 .

[0097] In one embodiment, the aperture of the first air pumping hole 111 is 150mm-200mm; and / or, the aperture of the second air pumping hole 112 is 20mm-40mm. By designing the aperture of the first air pumping hole 111 as above, the processing of the first air pumping hole 111 and the connection arrangement of the air pumping pipe 132 and the first air pumping hole 111 are facilitated; by designing the aperture of the second air pumping hole 112 as above, the processing of the second air pumping hole 112 is facilitated; the apertures of the first air pumping hole 111 and the second air pumping hole 112 are simultaneously designed to the above sizes, which is conducive to balancing the exhaust speed and exhaust atmosphere of the entire vacuum chamber. Among them, when the product to be processed is placed in the vacuum chamber of the vacuum film-forming equipment 100, the vacuum component 13 evacuates the air in the vacuum chamber, and within a specified time (for example, about 20 seconds), the atmosphere of the vacuum chamber changes from one atmospheric pressure to a low vacuum of less than 10Pa, that is, a low vacuum atmosphere is reached. After the vacuum speed of the vacuum component 13 stabilizes, the overall vacuum chamber pumping speed is uniform, and the atmosphere of the vacuum chamber is highly uniform.

[0098] It should be noted that the aperture of the first air extraction hole 111 can be 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, or a range consisting of any two of the above values, such as 150 mm-180 mm, 160 mm-180 mm, etc. The aperture of the second air extraction hole 112 can be 20 mm, 25 mm, 30 mm, 35 mm, 40 mm, or a range consisting of any two of the above values, such as 25 mm-35 mm, 20 mm-30 mm, etc.

[0099] In one embodiment, the outline of the substrate 11 is a rectangle; a plurality of second air extraction holes 112 are evenly spaced along the edge of the long side of the rectangle, and a plurality of second air extraction holes 112 are evenly spaced along the edge of the short side of the rectangle. The spacing between two adjacent second air extraction holes 112 arranged corresponding to the long side of the rectangle is greater than the spacing between two adjacent second air extraction holes 112 arranged corresponding to the short side of the rectangle.

[0100] By designing that a plurality of second exhaust holes 112 are evenly spaced along the edges of the long sides of the rectangle, and a plurality of second exhaust holes 112 are evenly spaced along the edges of the short sides of the rectangle, the exhaust speed at various locations in the long side direction and the exhaust speed at various locations in the short side direction are balanced, thereby achieving a balanced exhaust speed in the entire vacuum chamber and maintaining uniform exhaust.

[0101] Since the distance between the second air exhaust holes 112 and the first air exhaust holes 111 on the long side of the substrate 11 is smaller than the distance between the second air exhaust holes 112 and the first air exhaust holes 111 on the short side of the substrate 11, the spacing between two adjacent second air exhaust holes 112 arranged on the long side of the corresponding rectangle is designed to be larger than the spacing between two adjacent second air exhaust holes 112 arranged on the short side of the corresponding rectangle, so that the second air exhaust holes 112 on the short side of the substrate 11 are more densely distributed, thereby balancing the exhaust speed and exhaust atmosphere of the entire vacuum chamber.

[0102] Optionally, the spacing between two adjacent second exhaust holes 112 corresponding to the long side of the rectangle is 280mm-320mm, and / or the spacing between two adjacent second exhaust holes 112 corresponding to the short side of the rectangle is 180mm-220mm, so as to balance the exhaust speed and exhaust atmosphere of the entire vacuum chamber and maintain uniform exhaust. It should be noted that the spacing between two adjacent second exhaust holes 112 corresponding to the long side of the rectangle can be 280mm, 285mm, 290mm, 295mm, 300mm, 305mm, 310mm, 315mm, 320mm, or a range consisting of any two of the above values, such as 285mm-310mm, 290mm-315mm, etc. The spacing between two adjacent second air extraction holes 112 arranged on the short sides of the corresponding rectangle can be 180mm, 185mm, 190mm, 195mm, 200mm, 205mm, 210mm, 215mm, 220mm, or a range consisting of any two of the above values, such as 190mm-210mm, 185mm-205mm, etc.

[0103] In one embodiment, the substrate 11 has a rectangular outline and a size of 1 m*2 m.

[0104] In one embodiment, a third air pumping hole (not shown) is further provided on the substrate 11, and the third air pumping hole is located in the area defined by the first air pumping hole 111 and the plurality of second air pumping holes 112. Optionally, the aperture of the third air pumping hole is larger than the aperture of the second air pumping hole, and the aperture of the third air pumping hole is smaller than the aperture of the first air pumping hole. It should be noted that the third air pumping hole is an optional structure, and it is sufficient to achieve uniform air pumping of the entire vacuum chamber; the aperture of the third air pumping hole is designed according to needs, and it is sufficient to achieve uniform air pumping of the entire vacuum chamber.

[0105] In a specific embodiment, the outline of the substrate 11 is a rectangle. A first air extraction hole 111 is provided at the geometric center of the substrate 11, and the aperture of the first air extraction hole 111 is 150mm-200mm. A plurality of second air extraction holes 112 are evenly spaced at the edge of the long side of the substrate 11, and a plurality of second air extraction holes 112 are evenly spaced at the edge of the short side of the substrate 11; the apertures of the second air extraction holes 112 at the long side edge and the second air extraction holes 112 at the short side edge are both 20mm-40mm; the spacing between two adjacent second air extraction holes 112 at the long side edge is 300mm, and the spacing between two adjacent second air extraction holes 112 at the short side edge is 200mm; the vertical spacing between the second air extraction holes 112 at the long side edge and the second air extraction holes 112 at the short side edge and the sideline of the substrate 11 is both 100mm.

[0106] Continue reading Figure 1a A plurality of support columns 15 are provided on the surface of the substrate 11 facing the cover body 12, and the end faces of the support columns 15 are spaced apart from the cover body 12, and the end faces of the support columns 15 are configured to place the product to be processed. By providing the support columns 15, the product to be processed is spaced apart from the substrate 11, and the first exhaust hole 111 and the second exhaust hole 112 on the substrate 11 are kept unobstructed for exhaust, thereby maintaining uniform exhaust. By supporting the product to be processed by a plurality of support columns 15, compared with supporting the product to be processed by a large-area carrier, the contact area between the structural member supporting the product to be processed and the product to be processed can be reduced, which is beneficial to the consistency of crystallization film formation at various locations of the product to be processed.

[0107] In one embodiment, the plurality of support columns 15 are arranged in an array; the vertical distance between the support column 15 close to the edge of the substrate 11 and the edge of the substrate 11 is greater than the vertical distance between the second air extraction hole 112 and the edge of the substrate 11, which facilitates the closing of the cover 12 and reduces the probability of causing damage to the product to be processed placed on the support column 15. The array distribution means that the plurality of support columns 15 are arranged in multiple rows and columns, and the distance between two adjacent rows of support columns 15 is the same, and the distance between two adjacent columns of support columns 15 is the same.

[0108] In one embodiment, the vertical spacing between the support column 15 near the edge of the substrate 11 and the edge of the substrate 11 is greater than or equal to 200 mm, so that the cover 12 can be covered while maintaining the sealing between the cover 12 and the substrate 11. Optionally, the spacing between the support column 15 near the edge of the substrate 11 and the edge of the substrate 11 is greater than or equal to 200 mm and less than or equal to 240 mm, so that the support column 15 can maintain good support for the product to be processed.

[0109] In one embodiment, the vertical distance between the support column 15 close to the edge of the substrate 11 and the second exhaust hole 112 is 80 mm-120 mm, supporting the product to be processed while maintaining uniform exhaust.

[0110] See also Fig.10 , Fig.10 yes Figure 1a Schematic diagram of the structure of the support column shown.

[0111] The support column 15 includes a first column 151 and a second column 152, and the second column 152 is located on a side of the first column 151 away from the substrate 11. Along the direction from the substrate 11 to the cover 12, the cross-sectional area of ​​the second column 152 gradually decreases, which is beneficial to reduce the contact area between the support column 15 and the product to be processed, reduce interference with the product to be processed, and improve the consistency of film formation at various locations of the product to be processed.

[0112] In one embodiment, the material of the end of the support column 15 away from the substrate 11 includes Teflon. Teflon has the characteristics of high temperature resistance and low thermal conductivity. By setting the material of the end of the support column 15 to Teflon, the consistency of film formation at various locations of the product to be processed is improved. Optionally, the material of the second column 152 of the support column 15 includes Teflon.

[0113] Continue reading Figure 1a The vacuum film forming apparatus 100 further includes a fixing seat 16 and a supporting lifting member 17. The fixing seat 16 is configured to fix the substrate 11 and the supporting lifting member 17. The supporting lifting member 17 is connected to the cover 12. The supporting lifting member 17 is configured to drive the cover 12 to move in a direction close to or away from the substrate 11.

[0114] Optionally, the supporting jacking member 17 is a cylinder.

[0115] Optionally, two opposite sides of the cover body 12 are supported by two supporting jacking members 17 respectively.

[0116] The embodiment of the present application also provides a battery production system, which includes a coating device and a vacuum film forming device 100. The vacuum film forming device 100 is arranged downstream of the coating device, and the vacuum film forming device 100 is configured to perform vacuum crystallization on the film layer material coated by the coating device. The specific setting method of the vacuum film forming device 100 can refer to the relevant content introduced in the above embodiment, and will not be repeated here.

[0117] In one embodiment, the coating device is configured to coat the perovskite material. The vacuum film forming device 100 is configured to form the coated perovskite material into a perovskite thin film; that is, the coated perovskite material crystallizes under the vacuum atmosphere of the vacuum film forming device 100 to form a perovskite thin film.

[0118] By designing the exhaust holes of the vacuum film-forming equipment 100 (the exhaust holes include the first exhaust hole 111 and the second exhaust hole 112), the overall exhaust speed in the vacuum chamber of the vacuum film-forming equipment 100 is kept uniform, the atmosphere in the chamber is highly uniform, the perovskite crystallization atmosphere is stable, the film formation uniformity is improved, and the device performance is thereby improved.

[0119] See also Fig.11 and Fig.12 , Fig.11 This is the simulation result diagram of the existing crystallization equipment. Fig.12 This is a simulation result diagram of the vacuum film-forming equipment provided in the embodiment of the present application.

[0120] The present application also conducts simulation experiments on existing crystallization equipment and the vacuum film-forming equipment 100 provided in the embodiments of the present application.

[0121] The main difference between the existing crystallization equipment and the vacuum film forming equipment 100 of the present application is the arrangement of the exhaust hole. The existing crystallization equipment only has a large exhaust hole at the geometric center of the substrate. The simulation results are as follows: Fig.11 As shown in FIG. 1 , the vacuum speed gradually decreases from the center of the substrate to the edge of the substrate. Fig.12 As shown, the exhaust speed is quite high from the center of the substrate 11 to the edge of the substrate 11 and is relatively uniform in the entire cavity.

[0122] The above description is only an implementation method of the present application, and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A vacuum film forming device, characterized in that: include: A substrate, wherein a first air extraction hole is provided at the geometric center of the substrate, and a plurality of second air extraction holes are provided at the periphery of the substrate, wherein the aperture of the first air extraction hole is larger than the aperture of the second air extraction hole; A cover body is disposed on one side of the substrate; the cover body cooperates with the substrate to form a vacuum chamber; The first air suction hole and the second air suction holes are all in fluid communication with the air suction component.

2. The vacuum film forming equipment according to claim 1, characterized in that: The exhaust component includes an exhaust part and an exhaust pipe which are interconnected, and the exhaust pipe is located on the side of the substrate away from the cover body; the exhaust pipe is connected to the first exhaust hole; a connecting groove is provided on the substrate, and the connecting groove is respectively connected to the first exhaust hole and the second exhaust hole.

3. The vacuum film forming equipment according to claim 2, characterized in that: The substrate comprises a first sub-board and a second sub-board which are stacked; the first sub-board is arranged on a side of the second sub-board close to the cover; The first air extraction hole and the second air extraction hole are arranged on the first sub-plate; A connecting hole and the connecting groove are provided on the second sub-plate; the connecting hole connects the first air extraction hole and the air extraction pipe; the connecting groove connects the connecting hole and the second air extraction hole.

4. The vacuum film forming equipment according to claim 3, characterized in that: The orthographic projection of the geometric center of the communication hole on the first sub-plate coincides with the geometric center of the first air extraction hole; The connecting groove includes a first sub-groove and a second sub-groove, the first sub-groove is connected to the connecting hole and the second sub-groove, the second sub-groove is connected to the second air extraction hole, and the orthographic projection of the second sub-groove on the first sub-plate covers at least part of the second air extraction hole.

5. The vacuum film forming equipment according to claim 2, characterized in that: The substrate comprises a first surface and a second surface which are arranged opposite to each other; the cover is arranged on one side of the first surface of the substrate; The second surface is provided with a connecting groove; the connecting groove is respectively connected with the first air pumping hole and the second air pumping hole; the first air pumping hole is fluidically connected with the air pumping pipeline.

6. The vacuum film forming equipment according to claim 5, characterized in that: The connecting groove includes a first sub-groove and a second sub-groove, the first sub-groove is connected to the first air extraction hole and the second sub-groove respectively, the second sub-groove is connected to the second air extraction hole, and the second sub-groove covers at least two of the second air extraction holes.

7. The vacuum film forming equipment according to any one of claims 3 to 6, characterized in that: The width of each of the communicating grooves is the same, and each of the communicating grooves is provided with a regulating valve.

8. The vacuum film forming equipment according to claim 1, characterized in that: The vacuum film forming equipment also includes an exhaust hood, which is arranged on the side of the substrate away from the cover body. The exhaust hood includes a first port and a second port. The first port covers the first exhaust hole and multiple second exhaust holes, and the second port is fluidically connected to the exhaust component.

9. The vacuum film forming equipment according to claim 1, characterized in that: The cover body includes a main body and a connecting portion arranged on the entire circumferential edge of the main body; the main body and the substrate are spaced apart, and the connecting portion is in contact with the surface of the substrate; the vertical spacing between the second exhaust hole and the edge line of the substrate is greater than the width of the connecting portion.

10. The vacuum film forming equipment according to claim 1, characterized in that: A vertical distance between the second air extraction hole and the edge of the substrate is greater than or equal to 100 mm and less than or equal to 140 mm.

11. The vacuum film forming equipment according to claim 1, characterized in that: The aperture of the first air extraction hole is 150 mm-200 mm; and / or, The diameter of the second air extraction hole is 20 mm-40 mm.

12. The vacuum film forming equipment according to claim 1, characterized in that: The outline of the substrate is a rectangle; a plurality of the second air extraction holes are arranged at equal intervals along the edge of the long side of the rectangle, and a plurality of the second air extraction holes are arranged at equal intervals along the edge of the short side of the rectangle; The distance between two adjacent second air extraction holes arranged corresponding to the long side of the rectangle is greater than the distance between two adjacent second air extraction holes arranged corresponding to the short side of the rectangle.

13. The vacuum film forming equipment according to claim 12, characterized in that: The distance between two adjacent second air extraction holes arranged corresponding to the long side of the rectangle is 280mm-320mm; and / or, The distance between two adjacent second air extraction holes arranged corresponding to the short sides of the rectangle is 180mm-220mm.

14. The vacuum film forming equipment according to claim 1, characterized in that: A surface of the substrate facing the cover body is provided with a plurality of support columns, end surfaces of the support columns are spaced apart from the cover body, and the end surfaces of the support columns are configured to place products to be processed.

15. The vacuum film forming equipment according to claim 14, characterized in that: The plurality of support columns are distributed in an array, and a vertical distance between the support column close to the edge of the substrate and the edge of the substrate is greater than a vertical distance between the second air extraction hole and the edge of the substrate.

16. The vacuum film forming equipment according to claim 14 or 15, characterized in that: A vertical distance between the support column close to the edge of the substrate and the edge of the substrate is greater than or equal to 200 mm and less than or equal to 240 mm.

17. The vacuum film forming equipment according to claim 14, characterized in that: The support column includes a first column and a second column, wherein the second column is located at a side of the first column away from the substrate; along a direction from the substrate to the cover body, a cross-sectional area of ​​the second column gradually decreases.

18. The vacuum film forming equipment according to claim 1, characterized in that: A third air pumping hole is further provided on the substrate, and the third air pumping hole is located in an area defined by the first air pumping hole and a plurality of the second air pumping holes.

19. A battery production system, characterized in that: include: Coating equipment; A vacuum film-forming device is arranged downstream of the coating device, and is configured to perform vacuum crystallization on the film layer material coated by the coating device; the vacuum film-forming device is the vacuum film-forming device according to any one of claims 1 to 18.

20. The battery production system according to claim 19, characterized in that: The coating device is configured to coat a perovskite material; and the vacuum film-forming device is configured to form a perovskite thin film from the coated perovskite material.

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