Large-area liquid crystal panel projection photoetching lens

Abstract

The utility model discloses a large-area liquid crystal panel projection photoetching lens, and relates to the field of optical devices. The lens comprises an object plane, a first lens group, an aperture diaphragm, a second lens group and an image plane which are sequentially arranged from an object side to an image side along an optical axis direction, the first lens group has positive focal power and is used for receiving light rays emitted by an object plane and converging the light rays so as to transmit the light rays to the second lens group through the aperture diaphragm; the second lens group has positive focal power and is used for imaging the light passing through the aperture diaphragm on an image plane; the end face, away from the aperture diaphragm, of the first lens group is a concave face, the end face, close to the diaphragm, of the first lens group is a concave face, the end face, away from the aperture diaphragm, of the second lens group is a concave face, and the end face, close to the diaphragm, of the second lens group is a concave face. According to the invention, large-area, high-numerical-aperture, high-resolution, low-distortion and-1X double-telecentric imaging is realized by using a small number of lenses, and the cost is effectively reduced while the imaging quality is ensured.

Description

Technical Field

[0001] The present application belongs to the field of optical devices, and more specifically, particularly relates to a large-area liquid crystal panel projection lithography lens. Background Art

[0002] Photolithography is the most complex and critical process step in the semiconductor chip production process, which is time-consuming and costly. The difficulty and key point of semiconductor chip production lies in how to make the target circuit pattern on the silicon wafer. This process is achieved through photolithography. The process level of photolithography directly determines the process level and performance level of the chip. Generally, 20-30 times of photolithography are required in the production of chips, which takes about 50% of the time of IC production and 1 / 3 of the chip production cost. The photolithography lens is the core component required for photolithography.

[0003] In the current research on LCD panel projection lithography lenses in China, there is a lack of research on large exposure area and high numerical aperture lithography projection lenses. In order to achieve a higher exposure area and numerical aperture, the general LCD panel lithography projection lens has a large number of lenses, usually more than 25, and the numerical aperture does not exceed 0.2, with limited resolution, which cannot meet the needs of high-generation LCD panel processing. Utility Model Content

[0004] In view of the problems in the related art, the present application proposes a large-area, high numerical aperture, high resolution, low distortion, -1X imaging liquid crystal panel projection lithography lens, which has a simple structure and uses 19 lenses, including 4 aspherical lenses. The number of lenses is small and the exposure field reaches It can meet the needs of large-area exposure; the numerical aperture reaches 0.2, and a resolution of 1.5μm can still be achieved when the process factor is 0.8, which can be effectively applied to the lithography processing of high-generation LCD panels.

[0005] To solve the above technical problems, this application is implemented through the following technical solutions:

[0006] The present application is a large-area liquid crystal panel projection lithography lens, comprising an object plane, a first lens group, an aperture stop, a second lens group and an image plane, which are sequentially arranged along the optical axis direction from the object side to the image side;

[0007] The first lens group has positive power and is used for receiving light emitted from the object plane and converging the light, and then transmitting the light to the second lens group through the aperture stop;

[0008] The second lens group has positive power and is used to image the light passing through the aperture stop onto an image plane;

[0009] The end surface of the first lens group away from the aperture stop is a concave surface, and the end surface of the first lens group close to the aperture stop is a concave surface,

[0010] The end surface of the second lens group away from the aperture stop is a concave surface, and the end surface of the second lens group close to the aperture stop is a concave surface.

[0011] Furthermore, the first lens group includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, and a tenth lens arranged in sequence from the object side to the image side along the optical axis.

[0012] Furthermore, the second lens and the third lens are aspherical lenses, the object side surface of the second lens is aspherical, and the image side surface is spherical, and the object side surface of the third lens is spherical, and the image side surface is aspherical.

[0013] Furthermore, the object side surface of the first lens is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n1<1.70;

[0014] The object side surface of the second lens is concave, the image side surface is convex, and the refractive index is 1.49<n2<1.56;

[0015] The object side surface of the third lens is concave, the image side surface is convex, and the refractive index is 1.51<n3<1.70;

[0016] The object side surface of the fourth lens is a plane, the image side surface is a convex surface, and the refractive index is 1.49<n4<1.56;

[0017] The object side surface of the fifth lens is concave, the image side surface is convex, and the refractive index is 1.49<n5<1.56;

[0018] The object side surface of the sixth lens is convex, the image side surface is convex, and the refractive index is 1.49<n6<1.56;

[0019] The object side surface of the seventh lens is convex, the image side surface is convex, and the refractive index is 1.49<n7<1.56;

[0020] The object side surface of the eighth lens is convex, the image side surface is convex, and the refractive index is 1.49<n8<1.56;

[0021] The object side surface of the ninth lens is concave, the image side surface is concave, and the refractive index is 1.51<n9<1.70;

[0022] The object side surface of the tenth lens is convex, the image side surface is concave, and the refractive index is 1.43<n10<1.55.

[0023] Furthermore, the second lens group includes an eleventh lens, a twelfth lens, a thirteenth lens, a fourteenth lens, a fifteenth lens, a sixteenth lens, a seventeenth lens, an eighteenth lens, and a nineteenth lens arranged in sequence from the object side to the image side along the optical axis.

[0024] Furthermore, the seventeenth lens and the eighteenth lens are both aspherical lenses, the object side surface of the seventeenth lens is aspherical, and the image side surface is spherical, and the object side surface of the eighteenth lens is aspherical, and the image side surface is spherical.

[0025] Furthermore, the object side surface of the eleventh lens is a concave surface, the image side surface is a convex surface, and the refractive index is 1.49<n11<1.56;

[0026] The object side surface of the twelfth lens is concave, the image side surface is concave, and the refractive index is 1.51<n12<1.70;

[0027] The object side surface of the thirteenth lens is convex, the image side surface is convex, and the refractive index is 1.43<n13<1.55;

[0028] The object side surface of the fourteenth lens is convex, the image side surface is convex, and the refractive index is 1.43<n14<1.55;

[0029] The object side surface of the fifteenth lens is concave, the image side surface is convex, and the refractive index is 1.42<n15<1.50;

[0030] The object side surface of the sixteenth lens is convex, the image side surface is concave, and the refractive index is 1.42<n16<1.50;

[0031] The object side surface of the seventeenth lens is convex, the image side surface is concave, and the refractive index is 1.49<n17<1.56;

[0032] The object side surface of the eighteenth lens is convex, the image side surface is concave, and the refractive index is 1.51<n18<1.70;

[0033] The object side surface of the nineteenth lens is concave, the image side surface is concave, and the refractive index is 1.51<n19<1.70.

[0034] Furthermore, the aperture stop is arranged between the tenth lens and the eleventh lens; the aperture of the aperture stop is 48mm-53mm; the distance between the aperture stop and the image side of the tenth lens is 35mm-38mm, and the distance between the aperture stop and the object side of the eleventh lens is 6mm-8.5mm.

[0035] Furthermore, the material of the large-area liquid crystal panel projection lithography lens is a glass material with high transmittance of i-ray with a wavelength of 365nm.

[0036] Further, the focal length F1 of the first lens group and the focal length F2 of the second lens group satisfy the following relationship: 0.97<F1 / F2<1.05;

[0037] The total focal length F of the large-area liquid crystal panel projection lithography lens and the focal length F1 of the first lens group satisfy the following relationship: 0.22<F1 / F<0.25;

[0038] The total focal length F of the large-area liquid crystal panel projection lithography lens and the focal length F2 of the second lens group satisfy the following relationship: 0.22<F2 / F<0.25.

[0039] This application has the following beneficial effects:

[0040] This proposal describes a large-area, high numerical aperture, high resolution, low distortion, -1X dual telecentric imaging projection lithography lens, which can be used for the lithography processing of micro-nano optical devices such as liquid crystal panels, optical components, and photonic chips. Object and image effective field of view design It can be used for large-area graphic exposure, while the distortion is less than 1 / 10σ. This technical solution uses 4 aspherical lenses through the reasonable setting of 19 lenses, and uses a small number of lenses to achieve large-area, high numerical aperture, high resolution, low distortion, -1X double telecentric imaging, while ensuring the imaging quality, effectively reducing costs. At the same time, the small number of lenses effectively reduces the cumulative tolerance in the lens assembly and ensures the imaging effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the technical solutions of the application embodiments, the drawings required for describing the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the application. For ordinary technicians in this field, they can also obtain drawings based on these drawings without paying creative work.

[0042] Figure 1 A schematic structural diagram of a high-resolution large-area projection lithography lens provided in one embodiment of the present application;

[0043] Figure 2 This is a schematic diagram of the MTF of a high-resolution large-area projection lithography lens provided in one embodiment of the present application;

[0044] Figure 3 A schematic diagram of a spot diagram of a high-resolution large-area projection lithography lens provided in one embodiment of the present application;

[0045] Figure 4 A schematic diagram of field curvature and distortion of a high-resolution large-area projection lithography lens provided in one embodiment of the present application.

[0046] In the figure: 001-object plane; A-first lens group; B-second lens group; S-aperture stop; 1-first lens; 2-second lens; 3-third lens; 4-fourth lens; 5-fifth lens; 6-sixth lens; 7-seventh lens; 8-eighth lens; 9-ninth lens; 10-tenth lens; 11-eleventh lens; 12-twelfth lens; 13-thirteenth lens; 14-fourteenth lens; 15-fifteenth lens; 16-sixteenth lens; 17-seventeenth lens; 18-eighteenth lens; 19-nineteenth lens; 002-image plane. DETAILED DESCRIPTION

[0047] The following will be combined with the drawings in the application embodiments to clearly and completely describe the technical solutions in the application embodiments. Obviously, the described embodiments are only part of the application embodiments, not all of the embodiments. Based on the embodiments in the application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the application.

[0048] To facilitate understanding of the optical lens provided in the embodiments of the present application, the following terms are explained:

[0049] Object surface: the working surface to be detected;

[0050] Image plane: the plane where the clear image of the working surface formed by the optical lens is located;

[0051] Optical axis: It is an axis passing through the center of each optical lens.

[0052] With the lens as the boundary, the side where the object is located is called the object side, and the surface of the lens close to the object side is called the object side surface.

[0053] With the lens as the boundary, the side where the image of the object is located is called the image side, and the surface of the lens close to the image side is called the image side surface.

[0054] Positive optical power, also called positive refractive power, means that the lens has a positive focal length.

[0055] Negative optical power, also called negative refractive power, means that the lens has a negative focal length.

[0056] Focal length is a measure of the convergence or divergence of light in an optical system. It refers to the distance from the optical center of the lens to the focus of light when parallel light is incident.

[0057] In one embodiment of the present application, Figure 1 As shown, a large-area liquid crystal panel projection lithography lens is provided, comprising an object plane 001, a first lens group A, an aperture stop S, a second lens group B and an image plane 002 which are sequentially arranged along the optical axis direction from the object side to the image side;

[0058] The first lens group A has positive refractive power, and is used for receiving light emitted from the object plane 001 and converging the light, and then transmitting the light to the second lens group B through the aperture stop S;

[0059] The second lens group B has positive refractive power and is used to image the light passing through the aperture stop S onto the image plane 002;

[0060] The end surface of the first lens group A away from the aperture stop S is a concave surface, and the end surface of the first lens group A close to the stop is a concave surface,

[0061] The end surface of the second lens group B away from the aperture stop S is a concave surface, and the end surface of the second lens group B close to the stop is a concave surface.

[0062] As a preferred technical solution, the first lens group A includes a first lens 1, a second lens 2, a third lens 3, a fourth lens 4, a fifth lens 5, a sixth lens 6, a seventh lens 7, an eighth lens 8, a ninth lens 9, and a tenth lens 10, which are arranged in sequence from the object side to the image side along the optical axis.

[0063] As a preferred technical solution, the second lens 2 and the third lens 3 are aspherical lenses;

[0064] Furthermore, the object side surface of the second lens 2 is an aspherical surface, and the image side surface is a spherical surface; the object side surface of the third lens 3 is a spherical surface, and the image side surface is an aspherical surface.

[0065] Furthermore, the object side surface of the first lens 1 is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n1<1.70;

[0066] The object side surface of the second lens 2 is concave, the image side surface is convex, and the refractive index is 1.49<n2<1.56;

[0067] The object side surface of the third lens 3 is concave, the image side surface is convex, and the refractive index is 1.51<n3<1.70;

[0068] The object side surface of the fourth lens 4 is a plane, the image side surface is a convex surface, and the refractive index is 1.49<n4<1.56;

[0069] The object side surface of the fifth lens 5 is concave, the image side surface is convex, and the refractive index is 1.49<n5<1.56;

[0070] The object side surface of the sixth lens 6 is convex, the image side surface is convex, and the refractive index is 1.49<n6<1.56;

[0071] The object side surface of the seventh lens 7 is convex, the image side surface is convex, and the refractive index is 1.49<n7<1.56;

[0072] The object side surface of the eighth lens 8 is convex, the image side surface is convex, and the refractive index is 1.49<n8<1.56;

[0073] The object side surface of the ninth lens 9 is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n9<1.70;

[0074] The object side surface of the tenth lens 10 is convex, the image side surface is concave, and the refractive index is 1.43<n10<1.55;

[0075] As a preferred technical solution, the second lens group B includes an eleventh lens 11, a twelfth lens 12, a thirteenth lens 13, a fourteenth lens 14, a fifteenth lens 15, a sixteenth lens 16, a seventeenth lens 17, an eighteenth lens 18, and a nineteenth lens 19 arranged in sequence from the object side to the image side along the optical axis.

[0076] As a preferred technical solution, the seventeenth lens 17 and the eighteenth lens 18 are both aspherical lenses;

[0077] Further, the object side surface of the seventeenth lens 17 is an aspherical surface, and the image side surface is a spherical surface, and the object side surface of the eighteenth lens 18 is an aspherical surface, and the image side surface is a spherical surface;

[0078] Furthermore, the object side surface of the eleventh lens 11 is a concave surface, the image side surface is a convex surface, and the refractive index is 1.49<n11<1.56;

[0079] The object side surface of the twelfth lens 12 is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n12<1.70;

[0080] The object side surface of the thirteenth lens 13 is convex, the image side surface is convex, and the refractive index is 1.43<n13<1.55. ;

[0081] The object side surface of the fourteenth lens 14 is convex, the image side surface is convex, and the refractive index is 1.43<n14<1.55;

[0082] The object side surface of the fifteenth lens 15 is concave, the image side surface is convex, and the refractive index is 1.42<n15<1.50;

[0083] The object side surface of the sixteenth lens 16 is convex, the image side surface is concave, and the refractive index is 1.42<n16<1.50;

[0084] The object side surface of the seventeenth lens 17 is convex, the image side surface is concave, and the refractive index is 1.49<n17<1.56;

[0085] The object side surface of the eighteenth lens 18 is convex, the image side surface is concave, and the refractive index is 1.51<n18<1.70;

[0086] The object side surface of the nineteenth lens 19 is concave, the image side surface is concave, and the refractive index is 1.51<n19<1.70.

[0087] In the present application, the first lens group A and the second lens group B are distributed on both sides of the aperture stop S, and the first lens group A and the second lens group B have basically the same optical power. Such a nearly double Gaussian symmetric design is conducive to correcting the aberrations of the system, including spherical aberration and distortion. Four aspherical lenses are used to effectively correct the aberrations and chromatic aberrations of the system, ensuring that the system has high optical performance. The eighth lens 8, the ninth lens 9, the tenth lens 10 and the eleventh lens 11, the twelfth lens 12, and the thirteenth lens 13 are symmetrically distributed about the aperture stop S, effectively reducing the aberrations of the system, and the eighth lens 8, the ninth lens 9, the tenth lens 10 and the eleventh lens 11, the twelfth lens 12, and the thirteenth lens 13 adopt the optical power settings of "+, -, +", which is conducive to the aberration correction of the large aperture optical system, and at the same time realizes that the light has a smaller incident angle on the surface of each lens, effectively reducing the tolerance sensitivity of the optical system and improving the assembly yield of the optical system. This design adopts 19 lenses, using a smaller number of lenses while ensuring the parameter performance of the optical system, effectively reducing the cost.

[0088] As a preferred technical solution, all the lenses are single lenses and do not include glued lenses. Such a design is conducive to the i-line 365nm wavelength having a higher transmittance, avoiding the energy absorption caused by the introduction of adhesives, and effectively reducing the thermal expansion deformation of the system caused by the absorption of light energy, effectively ensuring the imaging quality.

[0089] As a preferred technical solution, the aperture stop S is arranged between the tenth lens 10 and the eleventh lens 11; the aperture of the aperture stop S is 48 mm to 53 mm; the distance between the aperture stop S and the image side of the tenth lens 10 is 35 mm to 38 mm, and the distance between the aperture stop S and the object side of the eleventh lens 11 is 6 mm to 8.5 mm.

[0090] Furthermore, the material of the high-resolution large-area projection lithography lens is a glass material with high transmittance of i-line 365nm wavelength. Such a design is conducive to the efficient transmission of i-line 365nm wavelength light and the effective use of light energy;

[0091] Further, the material of the first lens 1 includes flint glass, the material of the second lens 2 includes crown glass, the material of the third lens 3 includes flint glass, the material of the fourth lens 4 includes crown glass, the material of the fifth lens 5 includes crown glass, the material of the sixth lens 6 includes crown glass, the material of the seventh lens 7 includes crown glass, the material of the eighth lens 8 includes crown glass, the material of the ninth lens 9 includes flint glass, the material of the tenth lens 10 includes light crown glass, the material of the eleventh lens 11 includes crown glass, the material of the twelfth lens 12 includes flint glass, the material of the thirteenth lens 13 includes light crown glass, the material of the fourteenth lens 14 includes light crown glass, the material of the fifteenth lens 15 includes fused quartz glass, the material of the sixteenth lens 16 includes fused quartz glass, the material of the seventeenth lens 17 includes crown glass, the material of the eighteenth lens 18 includes flint glass, and the material of the nineteenth lens 19 includes flint glass.

[0092] As a preferred technical solution, the focal length F1 of the first lens group A and the focal length F2 of the second lens group B satisfy the following relationship: 0.97<F1 / F2<1.05; such a design makes the optical power of the first lens group A and the second lens group B of the system approximately symmetrical about the aperture stop S, which is conducive to correcting various aberrations including spherical aberration and distortion of the system, and ensuring the imaging quality;

[0093] Further, the total focal length F of the high-resolution large-area projection lithography lens and the focal length F1 of the first lens group A satisfy the following relationship: 0.22<F1 / F<0.25;

[0094] Furthermore, the total focal length F of the high-resolution large-area projection lithography lens and the focal length F2 of the second lens group B satisfy the following relationship: 0.22<F2 / F<0.25.

[0095] As a preferred solution, the magnification of the high-resolution large-area projection lithography lens is: β=-1X.

[0096] As a preferred solution, the high-resolution large-area projection lithography lens adopts a double telecentric design, with an object-side telecentricity of <15 mrad and an image-side telecentricity of <15 mrad.

[0097] As a preferred solution, the field of view of the high-resolution large-area projection lithography lens is

[0098] As a preferred solution, the numerical aperture of the high-resolution large-area projection lithography lens satisfies the following conditions: NA ≥ 0.2. According to the formula σ = k (λ / NA), where k is the lithography process factor, NA is the objective lens numerical aperture, and λ is the lithography wavelength, when the process factor is 0.8, the resolution of the objective lens theoretically reaches 1.5 μm.

[0099] As a preferred solution, the high-resolution large-area projection lithography lens MTF (Modulation Transfer Function) is ≥ 0.2@660lp / mm.

[0100] As a preferred solution, the distortion of the high-resolution large-area projection lithography lens is less than 0.0002%.

[0101] As a preferred solution, the field curvature of the high-resolution large-area projection lithography lens is less than 0.01 mm.

[0102] As a preferred solution, the object side working distance Lwo of the high-resolution large-area projection lithography lens satisfies the following condition: 80mm≤Lwo≤100mm; the image side working distance Lwi satisfies the following condition: 80mm≤Lwi≤100mm.

[0103] As a preferred solution, the imaging wavelength of the large-area liquid crystal panel projection lithography lens is i-line 365nm, and the set wavelength band is 365nm~367nm.

[0104] In a specific embodiment of the present application, a high-resolution large-area projection lithography lens as shown in Table 1 is provided.

[0105] Table 1 Parameters of high-resolution large-area projection lithography lenses

[0106]

[0107]

[0108]

[0109] Among them, the second lens, the third lens, the seventeenth lens and the eighteenth lens are aspherical lenses, and their parameters are shown in Table 2 below.

[0110] Table 2 Aspherical lens parameters

[0111]

[0112] Among them, the aspheric surface types are all even aspheric surfaces, and the calculation formula is as follows:

[0113]

[0114] Where, z: the surface coordinate of the even-order aspheric surface;

[0115] c: lens surface curvature;

[0116] r: radial distance from the optical axis;

[0117] k: cone coefficient;

[0118] a1, a2, a3…: 2nd, 4th, 6th… aspherical coefficients.

[0119] In a specific embodiment of the present application, a lens as shown in Table 1 is provided, wherein the focal length f1 of the first lens 1 is -266.116; the focal length f2 of the second lens 2 is 1309.9; the focal length f3 of the third lens 3 is 4005.17; the focal length f4 of the fourth lens 4 is 424.737; the focal length f5 of the fifth lens 5 is 1920.063; the focal length f6 of the sixth lens 6 is 872.474; the focal length f7 of the seventh lens 7 is 1032.378; the focal length f8 of the eighth lens 8 is 934.32; the focal length f9 of the ninth lens 9 is -278.372; the focal length f10 of the tenth lens 10 is =3671.366; the focal length f11 of the eleventh lens 11 = 6883.293; the focal length f12 of the twelfth lens 12 = -290.819; the focal length f13 of the thirteenth lens 13 = 519.668; the focal length f14 of the fourteenth lens 14 = 595.543; the focal length f15 of the fifteenth lens 15 = 2189.665; the focal length f16 of the sixteenth lens 16 = 645.088; the focal length f17 of the seventeenth lens 17 = 666.592; the focal length f18 of the eighteenth lens 18 = -11567.262; the focal length f19 of the nineteenth lens 19 = -294.853. The units are all mm.

[0120] In this embodiment, the magnification of the large-area liquid crystal panel projection lithography lens provided is β=-1X, and the effective field of view of the lens object side is It can be used for large-area graphic projection exposure, and the lens numerical aperture NA = 0.2. Due to the above parameter design, the object distance of the high-resolution large-area projection lithography lens provided by this application is 84.56mm, and the image distance is 89.927mm, which reserves sufficient space for easy lens installation.

[0121] Figure 2 This is a modulation function MTF diagram of the high-resolution large-area projection lithography lens provided in this embodiment. The MTF of each field of view is greater than 0.2@667lp / mm, which can achieve high-resolution imaging.

[0122] Figure 3 The optical dispersion pattern of the high-resolution large-area projection lithography lens provided in this embodiment is shown in the figure. The dispersion spots of the central field of view and the edge field of view are mostly within the radius of the Airy disk. The energy concentration and aberration correction of the on-axis and off-axis points are relatively good, achieving the ideal resolution.

[0123] Figure 4 The field curvature and distortion diagram of the high-resolution large-area projection lithography lens provided in this embodiment is shown in the figure. As shown in the figure, the lens distortion is less than 0.0002%, which is extremely small and effectively suppresses the distortion in the projection imaging process.

[0124] In this embodiment, the imaging wavelength adopted by the large-area liquid crystal panel projection lithography lens is 365nm, and the set band is 365nm-367nm, which is suitable for i-line 365nm ultraviolet light illumination and can be used for i-line lithography equipment.

[0125] In the description of this specification, the description with reference to the terms "one embodiment", "example", "specific example", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0126] The preferred embodiments of the application disclosed above are only used to help explain the application. The preferred embodiments do not describe all the details in detail, nor do they limit the application to the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the application, so that those skilled in the art can understand and use the application well.

Claims

1. A large-area liquid crystal panel projection lithography lens, characterized in that: It comprises an object plane (001), a first lens group (A), an aperture stop (S), a second lens group (B) and an image plane (002) which are arranged in sequence along the optical axis from the object side to the image side; The first lens group (A) has positive focal power and is used for receiving light emitted from the object plane (001) and converging the light, and then transmitting the light to the second lens group (B) through the aperture stop (S); The second lens group (B) has positive focal power and is used to image the light passing through the aperture stop (S) onto an image plane (002); The end surface of the first lens group (A) away from the aperture stop (S) is a concave surface, and the end surface of the first lens group (A) close to the aperture stop is a concave surface, The end surface of the second lens group (B) away from the aperture stop (S) is a concave surface, and the end surface of the second lens group (B) close to the stop is a concave surface.

2. The large-area liquid crystal panel projection lithography lens according to claim 1, characterized in that: The first lens group (A) comprises a first lens (1), a second lens (2), a third lens (3), a fourth lens (4), a fifth lens (5), a sixth lens (6), a seventh lens (7), an eighth lens (8), a ninth lens (9), and a tenth lens (10), which are arranged in sequence from the object side to the image side along the optical axis.

3. The large-area liquid crystal panel projection lithography lens according to claim 2, characterized in that: The second lens (2) and the third lens (3) are aspherical lenses; the object side surface of the second lens (2) is aspherical, and the image side surface is spherical; the object side surface of the third lens (3) is spherical, and the image side surface is aspherical.

4. The large-area liquid crystal panel projection lithography lens according to claim 2, characterized in that: The object side surface of the first lens (1) is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n1<1.70; The object side surface of the second lens (2) is a concave surface, the image side surface is a convex surface, and the refractive index is 1.49<n2<1.56; The object side surface of the third lens (3) is concave, the image side surface is convex, and the refractive index is 1.51<n3<1.70; The object side surface of the fourth lens (4) is a plane surface, the image side surface is a convex surface, and the refractive index is 1.49<n4<1.56; The object side surface of the fifth lens (5) is a concave surface, the image side surface is a convex surface, and the refractive index is 1.49<n5<1.56; The object side surface of the sixth lens (6) is a convex surface, the image side surface is a convex surface, and the refractive index is 1.49<n6<1.56; The object side surface of the seventh lens (7) is a convex surface, the image side surface is a convex surface, and the refractive index is 1.49<n7<1.56; The object side surface of the eighth lens (8) is a convex surface, the image side surface is a convex surface, and the refractive index is 1.49<n8<1.56; The object side surface of the ninth lens (9) is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n9<1.70; The object side surface of the tenth lens (10) is convex, the image side surface is concave, and the refractive index is 1.43<n10<1.

55.

5. The large-area liquid crystal panel projection lithography lens according to claim 2, characterized in that: The second lens group (B) comprises an eleventh lens (11), a twelfth lens (12), a thirteenth lens (13), a fourteenth lens (14), a fifteenth lens (15), a sixteenth lens (16), a seventeenth lens (17), an eighteenth lens (18) and a nineteenth lens (19), which are arranged in sequence from the object side to the image side along the optical axis.

6. The large-area liquid crystal panel projection lithography lens according to claim 5, characterized in that: The seventeenth lens (17) and the eighteenth lens (18) are both aspherical lenses. The object side surface of the seventeenth lens (17) is aspherical, and the image side surface is spherical. The object side surface of the eighteenth lens (18) is aspherical, and the image side surface is spherical.

7. The large-area liquid crystal panel projection lithography lens according to claim 5, characterized in that: The object side surface of the eleventh lens (11) is a concave surface, the image side surface is a convex surface, and the refractive index is 1.49<n11<1.56; The object side surface of the twelfth lens (12) is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n12<1.70; The object side surface of the thirteenth lens (13) is convex, the image side surface is convex, and the refractive index is 1.43<n13<1.55; The object side surface of the fourteenth lens (14) is a convex surface, the image side surface is a convex surface, and the refractive index is 1.43<n14<1.55; The object side surface of the fifteenth lens (15) is concave, the image side surface is convex, and the refractive index is 1.42<n15<1.50; The object side surface of the sixteenth lens (16) is convex, the image side surface is concave, and the refractive index is 1.42<n16<1.50; The object side surface of the seventeenth lens (17) is convex, the image side surface is concave, and the refractive index is 1.49<n17<1.56; The object side surface of the eighteenth lens (18) is convex, the image side surface is concave, and the refractive index is 1.51<n18<1.70; The object side surface of the nineteenth lens (19) is a concave surface, the image side surface is a concave surface, and the refractive index is 1.51<n19<1.

70.

8. The large-area liquid crystal panel projection lithography lens according to claim 5, characterized in that: The aperture stop (S) is arranged between the tenth lens (10) and the eleventh lens (11); the aperture of the aperture stop (S) is 48 mm to 53 mm; the distance between the aperture stop (S) and the image side of the tenth lens (10) is 35 mm to 38 mm, and the distance between the aperture stop (S) and the object side of the eleventh lens (11) is 6 mm to 8.5 mm.

9. The large-area liquid crystal panel projection lithography lens according to claim 1, characterized in that: The material of the large-area liquid crystal panel projection lithography lens is a glass material with high transmittance i-ray wavelength of 365nm.

10. The large-area liquid crystal panel projection lithography lens according to claim 1, characterized in that: The focal length F1 of the first lens group (A) and the focal length F2 of the second lens group (B) satisfy the following relationship: 0.97<F1 / F2<1.05; The total focal length F of the large-area liquid crystal panel projection lithography lens and the focal length F1 of the first lens group (A) satisfy the following relationship: 0.22<F1 / F<0.25; The total focal length F of the large-area liquid crystal panel projection lithography lens and the focal length F2 of the second lens group (B) satisfy the following relationship: 0.22<F2 / F<0.25.

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