Reaction cavity and chemical vapor deposition equipment
By designing the reaction chamber of the rotatable bracket assembly, the entire surface of the matrix is deposited in a primary furnace, solving the problem of low deposition efficiency in the prior art, improving the deposition efficiency and reducing production consumption.
Patent Information
- Application Number
- CN202421981279.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-15
- Publication Date
- 2025-06-06
- Estimated Expiration
- 2034-08-15
AI Technical Summary
In the prior art, the matrix in the reaction chamber cannot complete the entire surface deposition in a single furnace, resulting in low deposition efficiency and high production consumption.
A reaction chamber is designed, including a bracket assembly that is rotatable about the first axial direction, and the bracket assembly includes a first bracket and a second bracket, both of which are provided with arcuate grooves, and by slowly rotating the bracket assembly, the base body is alternately rolled between the first and second brackets, thereby achieving uniform deposition of the entire substrate surface.
The deposition coverage of the entire substrate surface is achieved in primary furnace deposition, avoiding deposition blind spots, improving deposition efficiency and reducing production consumption.
Smart Images
Figure CN222948471U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of chemical vapor deposition, in particular to a reaction chamber and chemical vapor deposition equipment. Background Art
[0002] Chemical Vapor Deposition (CVD) is an important material preparation technology, widely used in semiconductor, optoelectronic, thin film materials and other fields. Chemical vapor deposition is a technology that uses various energy sources such as heating, plasma excitation or light radiation to form solid deposits on the surface of a substrate (usually a disc-shaped graphite substrate) through chemical reactions in a reaction chamber. The reaction chamber is the core part of the chemical vapor deposition equipment and directly affects the performance of the entire equipment.
[0003] In the prior art, the substrate in the reaction chamber is directly placed on a fixed support seat. During the reaction process, the part of the substrate that is in direct contact with the support seat cannot contact the reaction gas to form a deposition blind area. In order to deposit uniformly on the entire substrate surface, it is necessary to turn the substrate over after stopping the furnace and restart the furnace for secondary deposition. This method is time-consuming, labor-intensive and power-consuming, and greatly reduces the deposition efficiency. Therefore, it is necessary to provide a new reaction chamber and chemical vapor deposition equipment to solve the above problems. Utility Model Content
[0004] The utility model aims to provide a reaction chamber and chemical vapor deposition equipment to solve the problem in the prior art that the deposition on the entire substrate surface cannot be completed in one furnace start.
[0005] To achieve this purpose, the utility model adopts the following technical solutions:
[0006] On the one hand, the present application provides a reaction chamber, comprising: a chamber and a support assembly disposed in the chamber, the support assembly is used to support a substrate and can be driven to rotate around a first axial direction, the support assembly comprises a first support and a second support respectively disposed on both sides of the substrate, the first support and the second support are both provided with an arc-shaped groove matching the substrate around the first axial direction;
[0007] When the first bracket is located below the substrate to support the substrate, the second bracket is located above the substrate and does not contact the substrate; when the second bracket is located below the substrate to support the substrate, the first bracket is located above the substrate and does not contact the substrate.
[0008] Preferably, the first bracket comprises two first support rods which are separately arranged, and the first support rods are provided with a plurality of first arc-shaped grooves along the first axial direction;
[0009] The second bracket includes two second support rods which are separately arranged, and a plurality of second arc-shaped grooves are arranged on the second support rods along the axial direction of the base body;
[0010] Along the first axis direction, the positions of the first arc-shaped groove and the second arc-shaped groove correspond one to one.
[0011] Preferably, the two first support rods and the two second support rods are evenly arranged around the first axial direction.
[0012] Preferably, the bracket assembly further includes two side plates, and the first bracket and the second bracket are both fixed between the two side plates;
[0013] A rotating shaft is fixed on one side of the two side plates which are opposite to each other, and at least one of the rotating shafts passes through the cavity wall of the cavity and is rotatably connected to the cavity.
[0014] Preferably, one of the rotating shafts passes through the cavity wall of the chamber and is rotatably connected to the cavity wall, and the other rotating shaft is rotatably connected to a base, and the other rotating shaft is rotatably connected to the base via a ceramic bearing.
[0015] Preferably, one end of one of the rotating shafts located outside the chamber is connected to a manual adjustment knob or is connected to the rotating shaft of the stepper motor through a coupling.
[0016] Preferably, the chamber comprises a cavity body and a top cover detachably connected to the cavity body, an air inlet is provided on the top cover, and an air outlet is provided at the bottom of the cavity body.
[0017] On the other hand, the present application provides a chemical vapor deposition device, the above-mentioned reaction chamber.
[0018] Compared with the prior art, the utility model has the following beneficial effects:
[0019] In the present technical solution, the first bracket and the second bracket are used to alternately support the substrate. In the first deposition stage, the substrate is located in the arc-shaped groove of the first bracket. When the first deposition stage is completed, the bracket assembly is slowly rotated to rotate around the first axis. As the first bracket is gradually raised and the second bracket is gradually lowered, the substrate rolls from the first bracket to the arc-shaped groove of the second bracket, and the contact portion between the substrate and the first bracket is exposed. At this time, the second deposition stage is entered. In the second deposition stage, the deposition of the contact portion between the substrate and the first bracket in the first deposition stage can be completed to form a deposition layer on all surfaces of the entire substrate. The present solution avoids the deposition blind area of the contact portion between the substrate and the bracket assembly. Only one furnace deposition is required to complete the deposition coverage of the entire substrate surface without the need for a second furnace deposition, which greatly improves the deposition efficiency and reduces production consumption. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.
[0021] The structures, proportions, sizes, etc. illustrated in the drawings of this specification are only used to match the contents disclosed in the specification so as to facilitate understanding and reading by persons familiar with this technology. They are not used to limit the conditions under which the present invention can be implemented, and therefore have no substantive technical significance. Any structural modification, change in proportion or adjustment of size, without affecting the effects and purposes that can be achieved by the present invention, should still fall within the scope of the technical contents disclosed by the present invention.
[0022] Figure 1 Schematic diagram of the structure of the reaction chamber in this embodiment;
[0023] Figure 2 is an axial schematic diagram of the bracket assembly in this embodiment;
[0024] Figure 3 Schematic diagram of the structure of the bracket assembly in this embodiment.
[0025] Description of reference numerals:
[0026] 10. chamber; 11. chamber body; 12. top cover;
[0027] 20. Bracket assembly; 21. First bracket; 21. First support rod; 22. Second bracket; 221. Second support rod; 23. Side panel; 24. Rotating shaft. DETAILED DESCRIPTION
[0028] In order to make the utility model's purpose, features, and advantages more obvious and easy to understand, the following will be combined with the drawings in the utility model embodiments to clearly and completely describe the technical solutions in the utility model embodiments. Obviously, the embodiments described below are only part of the utility model embodiments, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0029] In the description of the present invention, it should be understood that the terms "upper", "lower", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. It should be noted that when a component is considered to be "connected" to another component, it may be directly connected to the other component or there may be a centrally arranged component at the same time.
[0030] The technical solution of the utility model is further explained below with reference to the accompanying drawings and through specific implementation methods.
[0031] Reference Figures 1 to 3 The reaction chamber disclosed in this embodiment includes: a chamber 10 and a support assembly 20 disposed in the chamber 10, the support assembly 20 is used to support the substrate and can be driven to rotate around a first axial direction, the support assembly 20 includes a first support 21 and a second support 22 respectively disposed on both sides of the substrate, and the first support 21 and the second support 22 are both provided with an arc groove matching the substrate around the first axial direction;
[0032] When the first bracket 21 is located below the substrate to support the substrate, the second bracket 22 is located above the substrate and does not contact the substrate; when the second bracket 22 is located below the substrate to support the substrate, the first bracket 21 is located above the substrate and does not contact the substrate.
[0033] In the present technical solution, the first bracket 21 and the second bracket 22 are used to alternately support the substrate. In the first deposition stage, the substrate is located in the arc groove of the first bracket 21. When the first deposition stage is completed, the bracket assembly 20 is slowly rotated to rotate around the first axis. As the first bracket 21 gradually rises and the second bracket 22 gradually lowers, the substrate rolls from the first bracket 21 to the arc groove of the second bracket 22, and the contact portion between the substrate and the first bracket 21 is exposed. At this time, the second deposition stage is entered. In the second deposition stage, the deposition of the contact portion between the substrate and the first bracket 21 in the first deposition stage can be completed to achieve the formation of a deposition layer on all surfaces of the entire substrate. This solution avoids the deposition blind area of the contact portion between the substrate and the bracket assembly 20, and only one furnace deposition is required to complete the deposition coverage of the entire substrate surface without the need for a second furnace deposition, which greatly improves the deposition efficiency and reduces production consumption.
[0034] Reference Figure 1 to Figure 2The first bracket 21 includes two first support rods 211 that are separately arranged, and a plurality of first arc grooves are arranged on the first support rods 211 along the first axial direction; the second bracket 22 includes two second support rods 221 that are separately arranged, and a plurality of second arc grooves are arranged on the second support rods 221 along the axial direction of the substrate; along the first axial direction, the positions of the first arc grooves and the second arc grooves correspond one to one. Compared with setting a larger support rod, setting two smaller support rods separately is less likely to block the airflow, which helps to achieve uniform deposition on the substrate surface, so that the entire substrate surface is evenly exposed to the deposition gas, and avoids deposition blind areas.
[0035] The two first support rods 211 and the two second support rods 221 are evenly arranged around the first axial direction. The even arrangement of the support rods ensures the balance of the substrate during the rotation process, avoids vibration or tilting caused by uneven support, and thus improves the stability of the deposition process.
[0036] The support assembly 20 further includes two side plates 23, between which the first support 21 and the second support 22 are fixed; a shaft 24 is fixed on the opposite sides of the two side plates 23, and at least one shaft 24 passes through the cavity wall of the chamber 10 and is rotatably connected to the chamber 10. The first support 21 and the second support 22 are fixed by the side plates 23, and the stability of the support assembly 20 is ensured to ensure that the substrate will not be offset or shaken during the deposition process.
[0037] One of the rotating shafts 24 passes through the wall of the chamber 10 and is rotatably connected to the wall, and the other rotating shaft 24 is rotatably connected to the base, and the other rotating shaft 24 is rotatably connected to the base through a ceramic bearing. Ensure that the bracket assembly 20 can rotate smoothly and unhindered,
[0038] One end of one of the rotating shafts 24 located outside the chamber 10 is connected to a manual adjustment knob, which is convenient for the operator to manually adjust the rotation of the bracket assembly as needed; it can also be connected to the rotating shaft of the stepper motor through a coupling to achieve automatic control.
[0039] The chamber 10 includes a chamber body 11 and a top cover 12 detachably connected to the chamber body 11. The top cover 12 is provided with an air inlet, and the bottom of the chamber body 11 is provided with an air outlet. The specific preparation process is to inject vapor deposition gas from the air inlet at the top of the chamber 10, so that the vapor deposition gas is deposited on the substrate in the chamber, and then the excess gas is discharged from the air outlet at the bottom.
[0040] In addition, an embodiment of the present invention further provides a chemical vapor deposition device (not shown), which includes the reaction chamber as described above. Since the chemical vapor deposition device includes the reaction chamber as described above, the chemical vapor deposition device has all the beneficial effects of the reaction chamber, which will not be described one by one here.
[0041] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims
1. A reaction chamber, characterized in that: include: A chamber (10) and a support assembly (20) disposed in the chamber (10), the support assembly (20) being used to support a base and being driven to rotate around a first axial direction, the support assembly (20) comprising a first support (21) and a second support (22) respectively disposed on both sides of the base, the first support (21) and the second support (22) both being provided with arc-shaped grooves matching the base around the first axial direction; When the first bracket (21) is located below the substrate to support the substrate, the second bracket (22) is located above the substrate and does not contact the substrate; when the second bracket (22) is located below the substrate to support the substrate, the first bracket (21) is located above the substrate and does not contact the substrate.
2. The reaction chamber according to claim 1, characterized in that: The first bracket (21) comprises two first support rods (211) which are separately arranged, and a plurality of first arc-shaped grooves are arranged on the first support rods (211) along a first axial direction; The second bracket (22) comprises two second support rods (221) which are separately arranged, and the second support rods (221) are provided with a plurality of second arc-shaped grooves along the axial direction of the base body; Along the first axis direction, the positions of the first arc-shaped groove and the second arc-shaped groove correspond one to one.
3. The reaction chamber according to claim 2, characterized in that: The two first support rods (211) and the two second support rods (221) are evenly arranged around the first axial direction.
4. The reaction chamber according to claim 1, characterized in that: The bracket assembly (20) further comprises two side plates (23), and the first bracket (21) and the second bracket (22) are both fixed between the two side plates (23); A rotating shaft (24) is fixed to the opposite sides of the two side plates (23), and at least one of the rotating shafts (24) passes through the cavity wall of the cavity (10) and is rotatably connected to the cavity (10).
5. The reaction chamber according to claim 4, characterized in that: One of the rotating shafts (24) passes through the cavity wall of the chamber (10) and is rotatably connected to the cavity wall, another of the rotating shafts (24) is rotatably connected to a base, and another of the rotating shafts (24) is rotatably connected to the base via a ceramic bearing.
6. The reaction chamber according to claim 5, characterized in that: One end of one of the rotating shafts (24) located outside the chamber (10) is connected to a manual adjustment knob or is connected to the rotating shaft of a stepping motor via a coupling.
7. The reaction chamber according to claim 1, characterized in that: The chamber (10) comprises a chamber body (11) and a top cover (12) detachably connected to the chamber body (11); an air inlet is provided on the top cover (12); and an air outlet is provided at the bottom of the chamber body (11).
8. A chemical vapor deposition device, characterized in that: The invention comprises the reaction chamber described in any one of claims 1 to 7.