Display substrate and display device
By adopting the second conductive layer designed with a double-layer ITO in the display substrate, the problem of large square resistance of conventional OGS touch screen ITO is solved, achieving higher touch sensitivity and active pen support effect.
Patent Information
- Application Number
- CN202422138555.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-30
- Publication Date
- 2025-06-27
- Estimated Expiration
- 2034-08-30
AI Technical Summary
Due to process limitations, the ITO has a large square resistance, which cannot meet the needs of touch sensitivity and active pen.
The second conductive layer designed with a double-layer ITO is formed by stacking the two ITO coating processes to increase the thickness of the second conductive layer, reduce its square resistance, and ensure the alignment design of the conductive layer by optimizing the patterning process of the conductive layer to avoid short circuits or uneven film thickness.
The touch sensitivity of the display substrate is improved, which meets the needs of active pens, while reducing the square resistance of the second conductive layer, and improving the overall film layer quality and reliability.
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Figure CN223038388U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of displays, and particularly to a display substrate and a display device. Background Art
[0002] With the rapid development of display technology, touch screens have been widely used in electronic products such as smart phones, tablet computers, and televisions. The mutual capacitance touch screen mainly includes an OGM touch screen implemented by using metal mesh capacitance touch technology (One Glass Solution Metal Mesh, abbreviated as OGM) and an OGS touch screen implemented by using one glass full lamination technology (One Glass Solution, abbreviated as OGS). However, in a conventional OGS touch screen, due to process limitations, the thickness of the first deposition film of indium tin oxide (abbreviated as ITO) formed by magnetron sputtering does not exceed 1500 Å, resulting in a relatively large sheet resistance of ITO (for example, greater than 15 Ω / sq), which cannot meet the requirements of touch sensitivity and active pen.
[0003] It should be noted that the information disclosed in the above background art section is only used to enhance the understanding of the background of the present utility model, and thus may include information that does not constitute the prior art known to those skilled in the art. Summary of the Utility Model
[0004] In one aspect, a display substrate is provided, which includes: a substrate and a touch layer located on the substrate.
[0005] Wherein, the touch layer includes a second conductive layer, the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, and the plurality of first conductive parts and the plurality of second conductive parts are electrically connected in one-to-one correspondence.
[0006] Wherein, the orthographic projection of the first conductive part on the substrate falls within the orthographic projection of the corresponding second conductive part on the substrate; and
[0007] The edge of the orthographic projection of the first conductive part on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the substrate.
[0008] According to some exemplary embodiments, the touch layer further includes a first conductive layer and a first insulating layer, and the first insulating layer is located between the first conductive layer and the second conductive layer.
[0009] According to some exemplary embodiments, the first conductive layer is located on the side of the second conductive layer close to the substrate.
[0010] According to some exemplary embodiments, the first sub-conductive layer is located on a side of the first insulating layer away from the substrate; the second sub-conductive layer is located on a side of the first sub-conductive layer away from the substrate.
[0011] According to some exemplary embodiments, the second sub-conductive layer is located on a side of the first insulating layer away from the substrate; the first sub-conductive layer is located on a side of the second sub-conductive layer away from the substrate.
[0012] According to some exemplary embodiments, the minimum distance between two adjacent ones of the plurality of first conductive portions in the horizontal direction is a first distance, and the minimum distance between two adjacent ones of the plurality of second conductive portions in the horizontal direction is a second distance. The first distance is greater than the second distance, and the horizontal direction is parallel to the light-emitting surface of the display substrate.
[0013] According to some exemplary embodiments, at least one of the first conductive portions includes a first surface close to the substrate and a first side surface adjacent to the first surface, and there is a first slope angle between the first surface and the first side surface; at least one of the second conductive portions includes a second surface close to the substrate and a second side surface adjacent to the second surface, and there is a second slope angle between the second surface and the second side surface; and
[0014] The first slope angle is less than the second slope angle.
[0015] According to some exemplary embodiments, the difference between the first distance and the second distance is in the range of 6 microns to 14 microns.
[0016] According to some exemplary embodiments, the first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is less than the second refractive index; and / or,
[0017] The second conductive layer has a third refractive index, and the third refractive index is less than the second refractive index.
[0018] According to some exemplary embodiments, the first sub-conductive layer has a first thickness in a third direction, the second sub-conductive layer has a second thickness in the third direction, and the sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms. The third direction is perpendicular to the light-emitting surface of the display substrate.
[0019] According to some exemplary embodiments, the material of the first sub-conductive layer includes indium tin oxide; and / or, the material of the second sub-conductive layer includes indium tin oxide.
[0020] According to some exemplary embodiments, the sheet resistance of the second conductive layer is in the range of 7 Ω / square to 11 Ω / square.
[0021] According to some exemplary embodiments, the first conductive layer includes a plurality of bridging portions, and at least a part of the plurality of first conductive portions is electrically connected to the bridging portions.
[0022] According to some exemplary embodiments, the first insulating layer includes a plurality of first insulating portions, and at least a part of the first insulating portions is correspondingly disposed with at least a part of the bridging portions.
[0023] The orthographic projection of the first insulating portion on the substrate overlaps at least partially with the orthographic projection of the corresponding bridging portion on the substrate; and
[0024] The width of the first insulating portion in the first direction is greater than the width of the corresponding bridging portion in the first direction; and the width of the first insulating portion in the second direction is less than the width of the corresponding bridging portion in the second direction, where the first direction and the second direction are parallel to the horizontal direction and the first direction intersects with the second direction.
[0025] According to some exemplary embodiments, the width of the first insulating portion in the second direction is greater than the first spacing distance.
[0026] According to some exemplary embodiments, the first conductive layer includes a single-layer or multi-layer conductive layer; and / or,
[0027] The material of the first conductive layer includes indium tin oxide, metal or metal alloy.
[0028] According to some exemplary embodiments, the touch layer includes touch electrodes, the touch electrodes include a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes, the plurality of first sub-touch electrodes extend along the first direction and are spaced along the second direction, the plurality of second sub-touch electrodes extend along the second direction and are spaced along the first direction, and the first direction intersects with the second direction; the first sub-touch electrodes and the second sub-touch electrodes are insulated from each other; at least one of the first sub-touch electrodes and the second sub-touch electrodes includes a plurality of main body portions and a plurality of bridging portions, the plurality of main body portions are located on the second conductive layer, the plurality of bridging portions are located on the first conductive layer, and two adjacent main body portions are electrically connected through one bridging portion.
[0029] In another aspect, a display device is provided, where the display device includes the display substrate as described in any one of the above.
[0030] In still another aspect, a method for manufacturing a display substrate is provided, which includes:
[0031] Provide a substrate;
[0032] Form a first conductive material layer on the substrate, and perform a patterning process on the first conductive material layer to form a first conductive layer;
[0033] Form a first insulating material layer on a side of the first conductive layer away from the substrate, and perform a patterning process on the first insulating material layer to form a first insulating layer; and
[0034] Form a second conductive material layer on a side of the first insulating layer away from the substrate, and perform a patterning process on the second conductive material layer to form a second conductive layer, wherein the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive portions, the second sub-conductive layer includes a plurality of second conductive portions, and the plurality of first conductive portions and the plurality of second conductive portions are electrically connected in one-to-one correspondence,
[0035] wherein a positive projection of the first conductive portion on the substrate falls within a positive projection of the corresponding second conductive portion on the substrate; and
[0036] An edge of the positive projection of the first conductive portion on the substrate does not overlap with an edge of the positive projection of the corresponding second conductive portion on the substrate.
[0037] According to some exemplary embodiments, forming the second conductive layer includes:
[0038] Form a first sub-conductive material layer on a side of the first insulating layer away from the substrate, and perform a patterning process on the first sub-conductive material layer to form a first sub-conductive layer; and
[0039] Form a second sub-conductive material layer on a side of the first sub-conductive layer away from the substrate, and perform a patterning process on the second sub-conductive material layer to form a second sub-conductive layer,
[0040] wherein the first sub-conductive layer includes a plurality of first conductive portions, the second sub-conductive layer includes a plurality of second conductive portions, a minimum distance between two adjacent ones of the plurality of first conductive portions in a horizontal direction is a first interval distance, a minimum distance between two adjacent ones of the plurality of second conductive portions in a horizontal direction is a second interval distance, the first interval distance is greater than the second interval distance, and the horizontal direction is parallel to a light-emitting surface of the display substrate.
[0041] According to some exemplary embodiments, the patterning process for forming the first sub-conductive layer and the patterning process for forming the second sub-conductive layer share the same mask; and
[0042] The yellow light process in the patterning process for forming the first sub-conductive layer includes forming a pattern using irradiation light with a first exposure amount, and the yellow light process in the patterning process for forming the second sub-conductive layer includes forming a pattern using irradiation light with a second exposure amount, where the first exposure amount is greater than the second exposure amount. Description of the Drawings
[0043] Through the following description of the embodiments of the present invention with reference to the drawings, the above content and other objects, features, and advantages of the present invention will become clearer. In the drawings:
[0044] Figure 1 is a plan view of a display substrate according to an embodiment of the present invention;
[0045] Figure 2 is a partial plan view of some exemplary display substrates;
[0046] Figure 3 is along Figure 2 the cross-sectional view taken along the center line AA';
[0047] Figure 4 is a partial plan view of a display substrate according to an embodiment of the present invention;
[0048] Figure 5 is along Figure 4 the cross-sectional view taken along the center line BB';
[0049] Figure 6 is a partial cross-sectional view of a display substrate according to an embodiment of the present invention;
[0050] Figure 7A is a partial plan view of a display substrate according to an embodiment of the present invention, Figure 7B is Figure 7A the partial cross-sectional view of the S1 region in Figure 7C is Figure 7A the partial cross-sectional view of the S2 region in;
[0051] Figure 8 is according to Figure 1 the partially enlarged plan view of the S0 region in;
[0052] Figure 9A is a plan view of a display substrate according to an embodiment of the present invention, Figure 9B is a plan view of a display substrate according to an embodiment of the present invention, Figure 9C is Figure 9B the partial cross-sectional view taken along the center line CC';
[0053] Figure 10It is a structural block diagram of a display device according to an embodiment of the present invention;
[0054] Figure 11 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention;
[0055] Figure 12 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention;
[0056] Figure 13 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention; and
[0057] Figure 14A - 14J They are partial cross-sectional schematic diagrams of a display substrate according to an embodiment of the present invention respectively.
[0058] It should be noted that, for clarity, in the drawings used to describe the embodiments of the present invention, the dimensions of layers, structures or regions may be enlarged or reduced, that is, these drawings are not drawn to actual scale. Detailed Description of the Embodiments
[0059] To make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings of the embodiments of the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art based on the described embodiments of the present invention without creative efforts shall fall within the scope of protection of the present invention.
[0060] It should be noted that, in the drawings, for the purpose of clarity and / or description, the dimensions of elements may be enlarged and the relative dimensions may be enlarged. Thus, the dimensions and relative dimensions of each element do not have to be limited to the dimensions and relative dimensions shown in the drawings. In the description and drawings, the same or similar reference numerals indicate the same or similar components.
[0061] Unless otherwise defined, the technical terms or scientific terms used in the present invention shall have the ordinary meaning as understood by those of ordinary skill in the art. The "first", "second" and similar terms used in the present invention do not denote any order, quantity or importance, but are only used to distinguish different components. The terms such as "comprising" or "including" mean that the elements or items appearing before this term cover the elements or items listed after this term and their equivalents, without excluding other elements or items.
[0062] In this document, unless otherwise specifically stated, directional terms such as "upper", "lower", "left", "right", "inner", "outer", etc. are used to represent the orientation or positional relationship based on the orientation shown in the drawings, and are only for the convenience of describing the present utility model, rather than indicating or implying that the device, element or component referred to must have a specific orientation, be constructed or operated in a specific orientation. It should be understood that when the absolute position of the object being described changes, the relative positional relationship they represent may also change accordingly. Therefore, these directional terms should not be construed as a limitation to the present utility model.
[0063] In this document, terms such as "substantially", "about", "approximate" and other similar terms are used as approximate terms rather than terms of degree, and they are intended to explain the inherent deviation of measured or calculated values that would be recognized by a person of ordinary skill in the art. Considering factors such as process fluctuations, measurement problems, and errors associated with the measurement of a specific quantity (i.e., the limitations of the measurement system), as used herein, "about" or "approximate" includes the stated value and represents within an acceptable deviation range for a specific value determined by a person of ordinary skill in the art. For example, "about" can mean within one or more standard deviations, or within ±10% or ±5% of the stated value.
[0064] In this document, directional expressions such as "first direction" and "second direction" are used to describe different directions of the touch module or the display substrate. For example, the row direction and the column direction of the touch electrodes. It should be understood that such representations are only exemplary descriptions and not limitations to the present utility model.
[0065] In this document, unless otherwise stated, the expression "electrically connected" can mean that two components or elements are directly electrically connected. For example, component or element A is in direct contact with component or element B, and an electrical signal can be transmitted between them; it can also mean that two components or elements are electrically connected through a conductive medium such as a conductive wire. For example, component or element A is electrically connected to component or element B through a conductive wire to transmit an electrical signal between the two components or elements; it can also mean that two components or elements are electrically connected through at least one electronic component. For example, component or element A is electrically connected to component or element B through at least one thin film transistor to transmit an electrical signal between the two components or elements.
[0066] The following is a simple description of the technical terms involved in the present utility model for better understanding of the solution by relevant personnel.
[0067] OGM touch screen: refers to a touch screen in which touch electrodes including metal grids are formed on a substrate. For example, the substrate can be an encapsulation film or an encapsulation layer in the display substrate.
[0068] OGS touch screen: It refers to a touch screen in which the touch electrodes made of ITO material and the bridges made of ITO material or metal material are directly formed on the substrate.
[0069] At present, the touch modules in display devices with touch functions mainly include two categories: in-cell touch modules and on-cell touch modules. Taking a liquid crystal display device as an example, in the in-cell touch module, the touch electrodes in the touch module are arranged inside the liquid crystal cell, so that the thickness of the liquid crystal cell does not need to be increased. However, touch will occupy the display time, so it is difficult to support high-frequency products. The on-cell touch module does not occupy the display time and can support high-frequency products. For example, the refresh rate of some e-sports screens can reach more than 240Hz, which is difficult to meet by the in-cell touch technology, while the on-cell touch technology can support it.
[0070] Taking an Organic Light-Emitting Diode (OLED) display device as an example, in the on-cell touch module, the touch electrodes are made on the cover glass or the encapsulation layer to achieve the touch function.
[0071] Touch screens can be divided into mutual capacitance touch screens and self-capacitance touch screens according to the touch method. Since mutual capacitance touch screens can achieve multi-touch, they have become the mainstream in the current touch screen market and the future development trend. Among them, mutual capacitance touch screens mainly include OGM touch screens and OGS touch screens. With the continuous upgrade of the resolution of the display module, the metal grid in the OGM touch screen is likely to cause moiré, affecting the display effect. Although the conventional OGS touch screen has no moiré problem, due to process limitations, the thickness of the ITO primary deposition film formed by magnetron sputtering does not exceed 1500 Å, resulting in a relatively large sheet resistance of ITO (for example, greater than 15 Ω / sq), which cannot meet the customer's requirements for touch sensitivity and active pen. In the embodiments of the present invention, the display device may include an OLED display device, a Quantum Dot Light Emitting Diodes (QLED) display device, a Mini Light Emitting Diode (Mini LED) display device, a Micro Light Emitting Diode (Micro LED) display device, etc.
[0072] An embodiment of the present utility model provides a display substrate. Specifically, the display substrate includes: a substrate substrate and a touch control layer located on the substrate substrate; the touch control layer includes a second conductive layer. The second conductive layer includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in one-to-one correspondence. Among them, the orthographic projection of the first conductive portion on the substrate substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate substrate. And the edge of the orthographic projection of the first conductive portion on the substrate substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive portion on the substrate substrate.
[0073] With such a design, the second conductive layer can be formed by stacking two conductive layers. For example, the second conductive layer can be formed by stacking two ITO coating processes, so as to increase the thickness of the second conductive layer, reduce the sheet resistance of the second conductive layer, which is beneficial to improving the touch sensitivity of the display substrate and meeting the requirements of an active pen. In addition, the two conductive layers in the second conductive layer can be formed by using the same mask, without increasing the mask cost.
[0074] Figure 1 It is a plan view of the display substrate according to the embodiment of the present utility model.
[0075] Exemplarily, in the embodiment of the present utility model, a display substrate 100 is provided. Referring to Figure 1 , the display substrate 100 includes a substrate substrate 1 and a touch control layer 2 located on the substrate substrate 1. The touch control layer 2 may include touch electrodes 20. For example, the touch electrodes 20 include a plurality of first sub-touch electrodes 201 and a plurality of second sub-touch electrodes 202. The plurality of first sub-touch electrodes 201 extend along the first direction X and are spaced along the second direction Y. The plurality of second sub-touch electrodes 202 extend along the second direction Y and are spaced along the first direction X. The first direction X and the second direction Y intersect. The first direction X and the second direction Y are parallel to the light-emitting surface of the display substrate 100. The light emitted by the light-emitting device in the display substrate 100 is emitted out after passing through the light-emitting surface of the display substrate 100.
[0076] It should be noted that the embodiments of the present utility model do not limit the shapes and numbers of the first sub-touch electrodes 201 and the second sub-touch electrodes 202. The first sub-touch electrodes 201 and the second sub-touch electrodes 202 can select corresponding shapes and numbers according to actual needs, as long as the position of the touch point can be determined by detecting capacitance. The embodiments of the present utility model do not limit the types of the first sub-touch electrodes 201 and the second sub-touch electrodes 202. For example, the first sub-touch electrodes 201 can be driving electrodes, and the second sub-touch electrodes 202 can be sensing electrodes. Or, the first sub-touch electrodes 201 can be sensing electrodes, and the second sub-touch electrodes 202 can be driving electrodes.
[0077] It should also be noted that the first sub-touch electrode 201 and the second sub-touch electrode 202 are arranged in a cross pattern. They can be perpendicular to each other, or the included angle formed by their intersection can be an acute angle. In the embodiments of the present invention, the case where the first sub-touch electrode 201 and the second sub-touch electrode 202 are perpendicular to each other is taken as an example for illustration.
[0078] Exemplarily, the first sub-touch electrode 201 and the second sub-touch electrode 202 are insulated from each other. For example, at the cross position, the first sub-touch electrode 201 and the second sub-touch electrode 202 can be isolated by an insulating layer.
[0079] In some embodiments, the first sub-touch electrode 201 and the second sub-touch electrode 202 can be located in different conductive layers. An insulating layer is provided between the layer where the first sub-touch electrode 201 is located and the layer where the second sub-touch electrode 202 is located, so that the first sub-touch electrode 201 and the second sub-touch electrode 202 are insulated from each other at the intersection.
[0080] In some embodiments, a part of the first sub-touch electrode 201 can be in the same layer as the second sub-touch electrode 202. Or, a part of the second sub-touch electrode 202 can be in the same layer as the first sub-touch electrode 201. The first sub-touch electrode 201 and the second sub-touch electrode 202 can be cross-connected through a bridging portion.
[0081] Exemplarily, at least one of the first sub-touch electrode 201 and the second sub-touch electrode 202 includes a plurality of main body portions 230 and a plurality of bridging portions 210. For example, continuing to refer to Figure 1 , the main body portion 230 includes a second main body portion 2302, and the bridging portion 210 includes a second bridging portion 2102. The second sub-touch electrode 202 includes a plurality of second main body portions 2302 and a plurality of second bridging portions 2102. Two adjacent second main body portions 2302 can be electrically connected through a second bridging portion 2102, so as to realize the extension design of the second sub-touch electrode 202 along the second direction Y.
[0082] Exemplarily, the second main body portions 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can be in the same layer. The second bridging portions 2102 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can be in different layers. For example, at the intersection of the second bridging portions 2102 of the first sub-touch electrode 201 and the second sub-touch electrode 202, isolation can be achieved through an insulating layer.
[0083] It should be noted that in this article, "the same layer" refers to a layer structure formed by using the same film-forming process to form a film layer for forming a specific pattern, and then patterning the film layer by using the same mask through a single lithography process. Depending on the different specific patterns, the single lithography process may include multiple exposure, development, or etching processes, and the specific patterns in the formed layer structure may be continuous or discontinuous. These specific patterns may also be at different heights. Multiple elements, components, structures, and / or parts located in "the same layer" are made of the same material and are formed through the same lithography process. Generally, multiple elements, components, structures, and / or parts located in "the same layer" have substantially the same thickness.
[0084] Exemplarily, continuing to refer to Figure 1 , the touch layer 2 may further include a plurality of touch traces 241. One end of the touch trace 241 may be electrically connected to the first sub-touch electrode 201 and / or the second sub-touch electrode 202 in the touch electrode 20, and the other end of the touch trace 241 may be electrically connected to an external touch driving circuit or a touch chip, so as to realize signal transmission between the touch electrode 20 and the external touch driving circuit or the touch chip.
[0085] Figure 2 are partial plan schematic diagrams of some exemplary display substrates, Figure 3 is along Figure 2 the cross-sectional schematic diagram taken along the center line AA'.
[0086] Exemplarily, with reference to Figures 1 - 3 , the display substrate includes a substrate 1 and a touch layer 2 located on the substrate 1. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the substrate 1; a first insulating layer 22 disposed on a side of the first conductive layer 21 away from the substrate 1; and a second conductive layer 23 disposed on a side of the first insulating layer 22 away from the substrate 1.
[0087] Exemplarily, the second main portions 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer 23. The second bridging portion 2102 of the second sub-touch electrode 202 may be located in the first conductive layer 21.
[0088] Exemplarily, the touch layer 2 may include a plurality of first insulating portions 221 located in the first insulating layer 22. The second bridging portions 2102 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may be isolated through the first insulating portions 221. The second main portion 2302 of the second sub-touch electrode 202 may be electrically connected to the portion of the second bridging portion 2102 that is not covered by the first insulating portions 221.
[0089] In the related art, in order to avoid moiré patterns and affect the display effect, touch electrodes are usually made of ITO materials. For example, the material of the second conductive layer 23 includes ITO. For example, ITO is prepared by magnetron sputtering. Limited by the process, the thickness of the ITO film formed by one-time magnetron sputtering does not exceed 1500 angstroms, resulting in a relatively large sheet resistance of the ITO, and further resulting in a low signal transmission rate in the touch electrode, causing insufficient touch sensitivity of the display substrate and being unable to meet the requirements of an active pen.
[0090] In order to reduce the sheet resistance of the touch electrode, the embodiments of the present invention optimize the design of the touch layer. By adopting a stacked design, the thickness of the second conductive layer is increased, and the sheet resistance of the second conductive layer is reduced, thereby improving the touch sensitivity of the display substrate and meeting the requirements of an active pen.
[0091] Figure 4 is a partial plan schematic view of a display substrate according to an embodiment of the present invention, Figure 5 is along Figure 4 a cross-sectional schematic view taken along the center line BB'.
[0092] Exemplarily, in the embodiments of the present invention, with reference to Figure 4 and Figure 5 , the display substrate 100 may include: a substrate 1 and a touch layer 2 located on the substrate.
[0093] Exemplarily, the touch layer 2 may include a first conductive layer 21, a second conductive layer 23, and a first insulating layer 22 located between the first conductive layer 21 and the second conductive layer 23.
[0094] In some embodiments, the first sub-touch electrode 201 and the second sub-touch electrode 202 may be cross-connected through a bridging portion. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the substrate; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the substrate. The bridging portion may be located in the first conductive layer 21.
[0095] In some embodiments, the second main portions 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer 23. The second bridging portion 2102 of the second sub-touch electrode 202 may be located in the first conductive layer 21.
[0096] Exemplarily, with reference to Figure 5, the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in one-to-one correspondence, so as to form a double-layer stacked structure, increase the thickness of the second conductive layer 23, and reduce the sheet resistance of the second conductive layer 23.
[0097] Exemplarily, the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 are located in the second conductive layer 23, and the second conductive layer 23 adopts a double-layer conductive layer design. That is to say, the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 adopt a double-layer design, so as to reduce the sheet resistance of the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201.
[0098] Since the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 account for a relatively high proportion in the entire touch electrode (for example, the area ratio exceeds 80%), reducing the sheet resistance of the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 can greatly improve the signal transmission rate of the touch electrode, thereby improving the touch sensitivity of the display substrate.
[0099] Exemplarily, referring to Figure 4 , the orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.
[0100] Through such a design, the thickness of the second conductive layer 23 can be increased, the sheet resistance of the second conductive layer 23 can be reduced, and at the same time, the alignment design of the double-layer conductive layer can be facilitated, avoiding the phenomena of short circuit or uneven film thickness, which is beneficial to improving the reliability and touch effect of the display substrate.
[0101] Exemplarily, referring to Figure 5 , the first sub-conductive layer 231 is located on the side of the first insulating layer 22 away from the substrate 1. The second sub-conductive layer 232 is located on the side of the first sub-conductive layer 231 away from the substrate 1. That is to say, the orthographic projection of the second sub-conductive layer 232 located in the upper layer of the second conductive layer 23 on the substrate can cover the orthographic projection of the first sub-conductive layer 231 located in the lower layer on the substrate, so as to ensure that the second conductive portion 2321 located in the upper layer can wrap or semi-wrap the first conductive portion 2311 located in the lower layer and electrically connected thereto.
[0102] Through such a design, during the process of patterning the upper second sub-conductive layer 232, the film layer damage of the lower first sub-conductive layer 231 caused by the etching process can be minimized as much as possible, which is beneficial to improving the overall film layer quality of the second conductive layer 23, reducing the sheet resistance of the second conductive layer 23, thereby improving the touch sensitivity of the display substrate and enhancing the touch effect of the display substrate.
[0103] Exemplarily, the material of the first sub-conductive layer 231 may include indium tin oxide (ITO). And / or, the material of the second sub-conductive layer 232 may include indium tin oxide (ITO). The first sub-conductive layer 231 and the second sub-conductive layer 232 may form a grid-shaped touch electrode.
[0104] Exemplarily, the transmittance of the second conductive layer 23 to visible light is greater than or equal to 90%. For example, the transmittance of the second conductive layer 23 to visible light is approximately equal to 91.94%.
[0105] The second conductive layer adopts a double-layer ITO design. On the one hand, it can reduce the sheet resistance of the touch electrode and improve the touch sensitivity of the display substrate. On the other hand, it can ensure that most areas of the grid-shaped touch electrode have a relatively high transparency, avoiding moiré patterns and being beneficial to improving the picture quality of the display substrate.
[0106] In the related art, the second conductive layer is formed by a single ITO sputtering process. Limited by the process, the thickness of the single-layer formed ITO does not exceed 1500 Å, and the lowest sheet resistance of the ITO can reach 15 Ω / sq. The relatively large sheet resistance of the single-layer formed ITO results in a low signal transmission rate of the touch layer, unable to meet the requirements of the display device for touch sensitivity and active pen.
[0107] In some embodiments of the present invention, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be formed in two sputtering coating processes respectively, thereby overcoming the defect of the relatively thin ITO thickness prepared by single sputtering coating.
[0108] Exemplarily, the first sub-conductive layer 231 has a first thickness h1 in the third direction Z, and the second sub-conductive layer 232 has a second thickness h2 in the third direction Z. The first thickness h1 may be equal to or not equal to the second thickness h2. The third direction Z is the light-emitting direction of the display substrate. Or, the third direction Z is perpendicular to the light-emitting surface of the display substrate.
[0109] Exemplarily, the sum of the first thickness h1 and the second thickness h2 is in the range of 1500 Å to 3000 Å. The sheet resistance of the second conductive layer 23 is in the range of 7 Ω / sq to 11 Ω / sq.
[0110] It should be noted that the "first thickness" in the embodiments of the present utility model refers to the maximum thickness of the first sub-conductive layer in the overlapping region of the first sub-conductive layer and the second sub-conductive layer, and the "second thickness" refers to the maximum thickness of the second sub-conductive layer in the overlapping region of the first sub-conductive layer and the second sub-conductive layer.
[0111] It should also be noted that the sheet resistance of the second conductive layer here refers to the sheet resistance of the second conductive layer in the overlapping region of the first sub-conductive layer and the second sub-conductive layer.
[0112] Compared with the single-layer ITO used for the second conductive layer in the related art, the second conductive layer in the display substrate of the embodiments of the present utility model adopts a double-layer ITO design, and the sheet resistance can be reduced by 27% - 54%. This can greatly improve the signal transmission rate in the touch electrode, thereby improving the touch sensitivity of the display substrate and meeting the requirements of the active pen.
[0113] Exemplarily, continue to refer to Figure 5 , the minimum distance between two adjacent first conductive parts 2311 among the plurality of first conductive parts 2311 is the first interval distance d1 in the horizontal direction (such as the second direction Y). The minimum distance between two adjacent second conductive parts 2321 among the plurality of second conductive parts 2321 is the second interval distance d2 in the horizontal direction (such as the second direction Y). The horizontal direction is parallel to the light-emitting surface of the display substrate. For example, the horizontal direction can be a direction parallel to the first direction X or the second direction Y, or can be other directions at a certain angle with the first direction X or the second direction Y.
[0114] Exemplarily, the first interval distance d1 is greater than the second interval distance d2. For example, the first interval distance d1 can be approximately equal to 40 microns. For example, the first interval distance d1 is in the range of 38 microns to 42 microns. The second interval distance d2 can be approximately equal to 30 microns. For example, the second interval distance d2 is in the range of 28 microns to 32 microns.
[0115] In some embodiments, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be fabricated using the same mask. For example, during the patterning process of the first sub-conductive layer 231, a mask is used in combination with a yellow light process and an etching process to form the first sub-conductive layer 231 including a plurality of first conductive portions 2311. During the patterning process of the second sub-conductive layer 232, a mask is used in combination with a yellow light process and an etching process to form the second sub-conductive layer 232 including a plurality of second conductive portions 2321. The first sub-conductive layer 231 and the second sub-conductive layer 232 can use the same mask, and by changing the exposure amount in the yellow light process, the critical dimensions in the first sub-conductive layer 231 and the second sub-conductive layer 232 can be adjusted, so that the first spacing distance d1 is greater than the second spacing distance d2. It should be noted that the "critical dimension" here refers to the minimum spacing distance among a plurality of components or structures in the same layer.
[0116] For example, during the patterning process of the first sub-conductive layer 231, UV light with a relatively large exposure amount can be used to irradiate the photoresist. After development, a larger area of the photoresist will be removed, which can make the area of the ITO etched by the etching solution in the subsequent etching process larger, so that the minimum spacing distance between two adjacent first conductive portions 2311 in the first sub-conductive layer 231 increases. For example, the first spacing distance d1 is controlled to be approximately equal to 40 microns. For another example, during the patterning process of the second sub-conductive layer 232, UV light with a relatively small exposure amount can be used to irradiate the photoresist. After development, a smaller area of the photoresist will be removed, which can make the area of the ITO etched by the etching solution in the subsequent etching process smaller, so that the minimum spacing distance between two adjacent second conductive portions 2321 in the second sub-conductive layer 232 is relatively small. For example, the second spacing distance d2 is controlled to be approximately equal to 30 microns.
[0117] Through such a design, two different-sized patterning of the first sub-conductive layer 231 and the second sub-conductive layer 232 can be achieved without adding a mask, which is beneficial to cost reduction.
[0118] Exemplarily, the difference between the first spacing distance d1 and the second spacing distance d2 is in the range of 6 microns to 14 microns. For example, the first spacing distance d1 is in the range of 38 microns to 42 microns, and the second spacing distance d2 is in the range of 28 microns to 32 microns.
[0119] Through such a design, it can be ensured that there is a sufficient spacing distance between adjacent first conductive portions 2311 and / or adjacent second conductive portions 2321, avoiding defects such as short circuits caused by insufficient alignment accuracy.
[0120] Exemplarily, the first conductive layer 21 may include a plurality of bridging portions 210, and at least a part of the first conductive portions 2311 among the plurality of first conductive portions are electrically connected to the bridging portions 210.
[0121] Exemplarily, the first conductive layer 21 may include a single-layer or multi-layer conductive layer. For example, the first conductive layer 21 may include a single-layer ITO. Alternatively, the first conductive layer 21 may include a multi-layer conductive layer. For example, the first conductive layer 21 may include a multi-layer conductive layer formed by combining an aluminum conductive layer and a silver conductive layer.
[0122] Through such a design, parameters such as the material type, film layer structure, and thickness of the first conductive layer can be flexibly adjusted, which is beneficial to improving the conductivity of the first conductive layer, thereby improving the reliability of the bridging portions in the touch electrodes.
[0123] In the related art, in the touch layer of the display substrate, due to the patterned design, there are gaps between adjacent touch electrodes, and the optical path differences reflected by the touch electrodes and the gaps to the human eye are different, which easily form color differences, resulting in the patterns of the touch electrodes being easily perceived by the human eye and affecting the clarity of the display screen.
[0124] In some embodiments of the present invention, the refractive index of a part of the film layer adjacent to the ITO can be adjusted to change the propagation path of light in the touch electrodes and the gap region, so that the patterns of the touch electrodes are not easily perceived by the human eye, that is, the shadow elimination effect of the touch electrodes is achieved.
[0125] Exemplarily, the first conductive layer 21 has a first refractive index, the first insulating layer 22 has a second refractive index, and the first refractive index is less than the second refractive index. For example, the material of the first conductive layer 21 may include ITO, metal, or metal alloy (such as aluminum, silver, or magnesium-silver alloy). The first refractive index is less than or equal to 2.1. The material of the first insulating layer 22 may include a high-refractive-index insulating material. For example, the material of the first insulating layer 22 may include titanium dioxide. The second refractive index is greater than or equal to 2.1. For example, the second refractive index is approximately equal to 2.5.
[0126] Exemplarily, the second conductive layer 23 has a third refractive index, and the third refractive index is less than the second refractive index. For example, the material of the second conductive layer 23 may include ITO. For example, the third refractive index is in the range of 1.8 to 2.1.
[0127] Exemplarily, Table 1 shows the optical test comparison data of two different OGS touchscreens. Among them, the OGS1 touchscreen is a touchscreen in which both the first conductive layer 21 and the second conductive layer 23 in the touch layer adopt a single-layer ITO design. The OGS2 touchscreen is a touchscreen in which the first conductive layer 21 adopts a single-layer ITO design and the second conductive layer 23 adopts a double-layer ITO design. Among them, a first insulating layer 22 with a high refractive index is used between the first conductive layer 21 and the second conductive layer 23.
[0128] Table 1 Optical Test Comparison of Two Different OGS Touchscreens
[0129]
[0130] It should be noted that "Li" in Table 1 represents the result rating of the optical test. The smaller the number i (such as 2, 2.5, and 3) after "L", the better the effect of shadow elimination. "Pattern" refers to other regions with conductive structures in the touch layer except for the bridging part, and "bridge point" refers to the region where the bridging part is located in the touch layer. "Dark state shadow elimination" refers to the shadow elimination effect in the off state of the display screen, and "bright state shadow elimination" refers to the shadow elimination effect in the on state of the display screen. By comparing the two display screens OGS1 and OGS2, it can be seen that: in the off state, the shadow elimination effect at the bridge point of the OGS2 display screen is better than that at the bridge point of the GS1 display screen.
[0131] In the bridging region (the region near the bridging part 210), reflection interfaces will be generated between the bridging part 210 with different refractive indices and the first insulating part 221, and between the first insulating part 221 with different refractive indices and the first conductive part 2311 and / or the second conductive part 2321. The incident light from the outside will generate reflected light at each reflection interface. The reflected lights at different interfaces will interfere when incident on the human eye, causing the reflected lights with different vectors to superimpose and cancel each other out. As a result, the optical path difference between the reflected light in the bridging region and that in other regions tends to be the same, making the color difference between the bridging region and other regions smaller, thereby improving the shadow elimination level of the bridge point and enhancing the display effect of the display substrate. The "bridge point" here refers to the bridging part in the touch electrode.
[0132] Exemplarily, continue to refer to Figure 5 , the display substrate 100 may further include: a first shadow elimination layer IM1 located between the first conductive layer 21 and the substrate 1, and a second shadow elimination layer IM2 located on the side of the second conductive layer 23 away from the substrate 1.
[0133] Exemplarily, the refractive index of the touch electrode may be greater than the refractive index of the first shadow elimination layer IM1. And / or, the refractive index of the touch electrode may be greater than the refractive index of the second shadow elimination layer IM2.
[0134] By setting more reflective interfaces, more reflected light is generated at these interfaces, thereby achieving a greater degree of coherent cancellation of the reflected light. As a result, it is possible to better reduce the color difference of the reflected light between the touch electrodes (such as the first sub-touch electrode 201 and the second sub-touch electrode 202) and other areas outside the touch electrodes (such as the gap area between the first sub-touch electrode 201 and the second sub-touch electrode 202), and better achieve the shadow elimination of the pattern of the touch electrodes, that is, making the patterns of the first sub-touch electrode 201 and the second sub-touch electrode 202 less likely to be detected by the human eye. It should be noted that the color difference is a dispersion phenomenon caused by the optical path difference of different lights. The smaller the optical path difference, the smaller the color difference.
[0135] Exemplarily, with reference to Figure 1 、 Figure 4 and Figure 5 in the display substrate 100, the first sub-touch electrode 201 and the second sub-touch electrode 202 can be isolated by an insulating layer. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, and at least part of the first insulating portions 221 are correspondingly arranged with at least part of the bridging portions 210, so that the first sub-touch electrode 201 and the second sub-touch electrode 202 are isolated at the intersection.
[0136] Exemplarily, continuing to refer to Figure 4 , the orthographic projection of the first insulating portion 221 on the substrate substrate at least partially overlaps with the orthographic projection of the corresponding bridging portion 210 on the substrate substrate.
[0137] Exemplarily, the width d4 of the first insulating portion 221 in the first direction X is greater than the width d3 of the corresponding bridging portion 210 in the first direction X. The width d5 of the first insulating portion 221 in the second direction Y is less than the width d6 of the corresponding bridging portion 210 in the second direction Y. The first direction X and the second direction Y are parallel to the horizontal direction, and the first direction X and the second direction Y intersect.
[0138] Exemplarily, with reference to Figure 4 and Figure 5 , the width d5 of the first insulating portion 221 in the second direction Y is greater than the first spacing distance d1. The width d6 of the bridging portion 210 in the second direction Y is greater than the first spacing distance d1.
[0139] Through such a design, the bridging portion 210 can be better electrically connected to the second main body portion 2302 of the second sub-touch electrode 202, while preventing the bridging portion 210 from being short-circuited with the first sub-touch electrode 201, thereby ensuring a better insulation effect at the intersection of the first sub-touch electrode 201 and the second sub-touch electrode 202.
[0140] Exemplarily, in some embodiments of the present invention, the display substrate may include a black matrix layer BM located between the first blanking layer IM1 and the substrate 1. The black matrix layer BM can reduce the light crosstalk between adjacent pixels and improve the display effect of the display substrate.
[0141] Exemplarily, the display substrate may include a first protective layer OC on the side of the second blanking layer IM2 away from the substrate 1. For example, the first protective layer OC may include an optical adhesive layer to protect the underlying touch layer.
[0142] In some embodiments of the present invention, when the second conductive layer 23 adopts a double-layer conductive layer design, it may include not only the case where the projected area of the upper conductive layer (such as the second sub-conductive layer 232) is larger than that of the lower conductive layer (such as the first sub-conductive layer 231), but also the case where the projected area of the upper conductive layer (such as the first sub-conductive layer 231) is smaller than that of the lower conductive layer (such as the second sub-conductive layer 232).
[0143] Figure 6 It is a partial cross-sectional schematic diagram of a display substrate according to an embodiment of the present invention.
[0144] Exemplarily, in some embodiments of the present invention, referring to Figure 6 , the touch layer 2 may include: a first conductive layer 21 disposed on the substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the substrate; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the substrate. The second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in one-to-one correspondence to form a double-layer stacked structure, which can increase the thickness of the second conductive layer 23 and reduce the sheet resistance of the second conductive layer 23.
[0145] Exemplarily, the second sub-conductive layer 232 is located on the side of the first insulating layer 22 away from the substrate 1. The first sub-conductive layer 231 is located on the side of the second sub-conductive layer 232 away from the substrate 1. The orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.
[0146] Through such a design, the thickness of the second conductive layer 23 can be increased, the sheet resistance of the second conductive layer 23 can be reduced, and at the same time, the alignment design of the double-layer conductive layer is more convenient, avoiding the phenomena of short circuit or uneven film thickness, which is beneficial to improving the reliability and touch effect of the display substrate. Figure 7A is a partial plan view of a display substrate according to an embodiment of the present invention, Figure 7B is Figure 7A a partial cross-sectional view of the S1 region in Figure 7C is Figure 7A a partial cross-sectional view of the S2 region in
[0147] Exemplarily, in some embodiments of the present invention, with reference to Figures 7A - 7C , the orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The second conductive portion 2321 is located on the side of the first conductive portion 2311 away from the substrate.
[0148] Exemplarily, at least one first conductive portion 2311 includes a first surface m1 close to the substrate 1 and a first side surface m2 adjacent to the first surface m1, and there is a first slope angle α1 between the first surface m1 and the first side surface m2. At least one second conductive portion 2321 includes a second surface m3 close to the substrate 1 and a second side surface m4 adjacent to the second surface m3, and there is a second slope angle α2 between the second surface m3 and the second side surface m4. Exemplarily, the first slope angle α1 is less than the second slope angle α2. For example, the first slope angle α1 can be approximately equal to 9.39°, and the second slope angle α2 can be approximately equal to 10.51°.
[0149] Through such a design, the first slope angle α1 in the edge region of the first conductive portion 2311 located in the lower layer can be made smaller, so that the film layer of the second conductive portion 2321 located above the first conductive portion 2311 can have a more gentle transition in the edge region of the first conductive portion 2311, which is beneficial to improving the film layer quality of the second conductive portion 2321, thereby improving the overall film layer quality of the second conductive layer 23, and further improving the reliability and touch effect of the display substrate.
[0150] Figure 8 is according to Figure 1 a partially enlarged plan view of the S0 region in
[0151] Exemplarily, in some embodiments of the present invention, with reference to Figure 1 , Figure 5 and Figure 8, the display substrate 100 may include a third conductive layer 24 located on the side of the second conductive layer 23 away from the substrate 1. The third conductive layer 24 may include a plurality of touch traces 241. At least a part of the first sub-touch electrode 201 and the second sub-touch electrode 202 is electrically connected to the touch traces 241. For example, the touch traces 241 may include a first part 2411 located in the touch area TA, and the first part 2411 of the touch traces 241 may overlap with at least a part of the first sub-touch electrode 201 and / or the second sub-touch electrode 202, so as to realize the electrical connection between the touch traces 241 and the first sub-touch electrode 201 and / or the second sub-touch electrode 202. The touch traces 241 may further include a second part 2412 located in the non-touch area TN. The non-touch area TN may be an edge area surrounding the touch area TA.
[0152] In some embodiments, through the trace design of the second part 2412 of the touch traces 241, one end of the touch traces 241 connected to the grid-shaped touch electrodes can be concentrated and converged into a smaller area, which is beneficial to reducing the wiring space occupied by the touch traces and facilitating the electrical connection between the touch traces 241 and an external touch circuit or a touch chip.
[0153] Figure 9A is a schematic plan view of a display substrate according to an embodiment of the present invention. Figure 9B is a schematic plan view of a display substrate according to an embodiment of the present invention. Figure 9C is Figure 9B a partial cross-sectional schematic view taken along the center line CC'.
[0154] Exemplarily, in some embodiments of the present invention, referring to Figure 9A , the first sub-touch electrode 201 may be formed into a continuously extending structure by a main body part 230 and a bridging part 210 located in different layers. For example, the main body part 230 may include a first main body part 2301. The bridging part 210 may include a first bridging part 2101. The first sub-touch electrode 201 includes a plurality of first main body parts 2301 and a plurality of first bridging parts 2101. The first bridging part 2101 is located in the first conductive layer 21, and the first main body part 2301 is located in the second conductive layer 23. Two adjacent first main body parts 2301 may be electrically connected through a first bridging part 2101, so as to realize the extension design of the first sub-touch electrode 201 along the first direction X.
[0155] Exemplarily, the second sub-touch electrode 202 is located in the second conductive layer 23. The first main body part 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer. The first main body part 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both adopt a double-layer conductive layer design, so as to reduce the sheet resistance of the touch electrode and improve the touch sensitivity of the display substrate.
[0156] Through such a design, the touch electrodes can be arranged more flexibly, ensuring that most of the electrodes in the touch electrodes adopt a double-layer conductive layer design, which can ensure that the sheet resistance of most areas in the touch electrodes is small, thereby improving the overall conductivity of the touch electrodes and the touch sensitivity of the display substrate.
[0157] In some embodiments, referring back to Figure 1 , a touch trace 241 can be electrically connected to a first sub-touch electrode 201 or a second sub-touch electrode 202.
[0158] In some embodiments, continuing to refer to Figure 9A , a touch trace 241 can be electrically connected to multiple first sub-touch electrodes 201 or multiple second sub-touch electrodes 202. For example, a touch trace 241 can be electrically connected to two first sub-touch electrodes 201. Through such a design, the number of touch traces can be reduced, saving wiring space and facilitating the realization of a narrow border for the display substrate.
[0159] In the embodiments of the present invention, the touch layer can adopt a bridging portion design, and one of the conductive layers in the touch layer (such as the second conductive layer) can adopt a double-layer ITO design.
[0160] In other embodiments, the touch layer may not adopt a bridging portion design. For example, in combination with referring to Figure 9B and Figure 9C , the touch layer 2 may include a first conductive layer 21 and a second conductive layer 23. The first sub-touch electrode 201 is located in the first conductive layer 21, and the second sub-touch electrode 202 is located in the second conductive layer 23. Alternatively, the first sub-touch electrode 201 is located in the second conductive layer 23, and the second sub-touch electrode 202 is located in the first conductive layer 21. The first sub-touch electrode 201 and the second sub-touch electrode 202 form a grid-like touch electrode pattern.
[0161] Exemplarily, at least one of the conductive layers in the touch layer without a bridging portion design can adopt a double-layer ITO design. For example, one of the first conductive layer 21 and the second conductive layer 23 adopts a double-layer ITO design, or both the first conductive layer 21 and the second conductive layer 23 adopt a double-layer ITO design. For example, referring to Figure 9C , the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected one by one, so as to form a double-layer stacked structure, increasing the thickness of the second conductive layer 23 and reducing the sheet resistance of the second conductive layer 23.
[0162] It should be noted that in the embodiments where the bridging portion design is not adopted in the touch control layer, there is no limitation on the up-and-down relationship between the first conductive layer and the second conductive layer. For example, the first conductive layer 21 may be located on the side of the second conductive layer 23 close to the substrate 1. Alternatively, the first conductive layer 21 may be located on the side of the second conductive layer 23 away from the substrate 1.
[0163] Through such a design, the sheet resistance of at least one of the first sub-touch electrodes and the second sub-touch electrodes can be reduced, thereby improving the overall touch sensitivity of the touch control structure.
[0164] Figure 10 It is a structural block diagram of a display device according to an embodiment of the present invention.
[0165] Optionally, an embodiment of the present invention further provides a display device. Referring to Figure 10 , the display device 200 may include the above-mentioned display substrate 100. The display device may include, but is not limited to: electronic paper, mobile phone, tablet computer, display, notebook computer, digital photo frame, navigator, and any other product or component with a display function. It should be understood that the display device has the same beneficial effects as the display substrate provided in the foregoing embodiments.
[0166] Figure 11 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention; Figure 12 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention, Figure 13 It is a partial flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention, Figure 14A - 14J They are partial cross-sectional schematic diagrams of a display substrate according to an embodiment of the present invention.
[0167] Exemplarily, in an embodiment of the present invention, a method for manufacturing a display substrate is further provided. The method for manufacturing a display substrate may include the following steps S01-S04.
[0168] In step S01, referring to Figure 14A , a substrate 1 is provided. For example, the substrate 1 may include a packaging film or a packaging cover glass of the display substrate.
[0169] In step S02, referring to Figure 14D , a first conductive material layer is formed on the substrate 1, and a patterning process is performed on the first conductive material layer to form a first conductive layer 21. For example, the first conductive layer 21 may include a plurality of bridging portions 210.
[0170] In some embodiments, with reference to Figure 14B and Figure 14C, the manufacturing method further includes: before forming the first conductive layer 21, forming a black matrix layer BM and a first blanking layer IM1 on the substrate 1 on a side of the black matrix layer BM away from the substrate 1.
[0171] In step S03, referring to Figure 14E , a first insulating material layer is formed on a side of the first conductive layer 21 away from the substrate 1, and a patterning process is performed on the first insulating material layer to form a first insulating layer 22. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, and at least a part of the orthographic projection of the first insulating portions 221 on the substrate overlaps with a part of the orthographic projection of the bridging portion 210 on the substrate.
[0172] In step S04, referring to Figure 14F and Figure 14G , a second conductive material layer is formed on a side of the first insulating layer 22 away from the substrate 1, and a patterning process is performed on the second conductive material layer to form a second conductive layer 23. Among them, the second conductive layer 23 may include a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 includes a plurality of first conductive portions 2311, the second sub-conductive layer 232 includes a plurality of second conductive portions 2321, and the plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in one-to-one correspondence.
[0173] In some embodiments, by adjusting process parameters of the patterning processes of the first sub-conductive layer 231 and the second sub-conductive layer 232, for example, adjusting yellow light process parameters, it is possible to make the orthographic projection of the first conductive portion 2311 on the substrate 1 fall within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.
[0174] Exemplarily, forming the second conductive layer in step S04 may specifically include the following steps S041 - S042.
[0175] Exemplarily, in step S041, referring to Figure 14F , a first sub-conductive material layer is formed on a side of the first insulating layer 22 away from the substrate 1, and a patterning process is performed on the first sub-conductive material layer to form the first sub-conductive layer 231.
[0176] Exemplarily, in step S042, referring to Figure 14G, a second sub-conductive material layer is formed on a side of the first sub-conductive layer 231 away from the substrate 1, and a patterning process is performed on the second sub-conductive material layer to form a second sub-conductive layer 232. Among them, the first sub-conductive layer 231 includes a plurality of first conductive portions 2311, the second sub-conductive layer 232 includes a plurality of second conductive portions 2321, and the minimum distance between two adjacent first conductive portions 2311 among the plurality of first conductive portions 2311 is a first interval distance d1 in the horizontal direction. The minimum distance between two adjacent second conductive portions 2321 among the plurality of second conductive portions 2321 is a second interval distance d2 in the horizontal direction. The first interval distance d1 is greater than the second interval distance d2, and the horizontal direction is parallel to the light-emitting surface of the display substrate.
[0177] Exemplarily, the material of the first sub-conductive layer 231 may include ITO. The material of the second sub-conductive layer 232 may include ITO.
[0178] By adopting a double-layer ITO design, on the one hand, the sheet resistance of the touch electrode can be reduced, and the touch sensitivity of the display substrate can be improved. On the other hand, it can ensure that most areas of the grid-shaped touch electrode have a relatively high transparency, avoid moiré patterns, and is beneficial to improving the display effect of the display substrate.
[0179] Exemplarily, the patterning process for forming the first sub-conductive layer 231 and the patterning process for forming the second sub-conductive layer 232 can share the same mask. By adjusting the yellow light process parameters in the patterning process, such as changing the exposure amount in the yellow light process, two film layers with different shapes can be formed using the same mask. For example, the yellow light process in the patterning process for forming the first sub-conductive layer 231 includes irradiating light with a first exposure amount to form a pattern. The yellow light process in the patterning process for forming the second sub-conductive layer 232 includes irradiating light with a second exposure amount to form a pattern. Exemplarily, the first exposure amount is greater than the second exposure amount, so that the first interval distance d1 in the first sub-conductive layer 231 is greater than the second interval distance d2 in the second sub-conductive layer 232. By such a method, the mask can be saved, which is beneficial to reducing costs.
[0180] Exemplarily, the method for preparing the display substrate may further include: after forming the second conductive layer 23, continue to perform the following steps S05 - S07.
[0181] In step S05, referring to Figure 14H , a third conductive material layer is formed on a side of the second conductive layer 23 away from the substrate 1, and a patterning process is performed on the third conductive material layer to form a third conductive layer 24. Exemplarily, the touch trace 241 may be located in the third conductive layer 24.
[0182] In step S06, referring to Figure 14I, a second light-shielding layer IM2 is formed on a side of the third conductive layer 24 away from the substrate 1. Exemplarily, the first light-shielding layer IM1 and the second light-shielding layer IM2 may be respectively located on the upper and lower sides of the touch electrode to wrap the touch electrode, so that the optical path difference of different regions can be adjusted by using the interfaces between multiple layers, making the pattern of the touch electrode not easily observable by the naked eye.
[0183] In step S07, with reference to Figure 14J , a first protective layer OC is formed on a side of the second light-shielding layer IM2 away from the substrate 1. For example, the first protective layer OC may include an optical adhesive layer, which can protect the underlying touch layer.
[0184] Although some embodiments of the general inventive concept of the present utility model have been shown and described, those of ordinary skill in the art will understand that changes may be made to these embodiments without departing from the principles and spirit of the general inventive concept, and the scope of the present utility model is defined by the claims and their equivalents.
Claims
1. A display substrate, characterized in that: include: A base substrate and a touch layer located on the base substrate, The touch layer includes a second conductive layer, the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one, wherein the orthographic projection of the first conductive portion on the base substrate falls within the orthographic projection of the corresponding second conductive portion on the base substrate; and An edge of an orthographic projection of the first conductive portion on the base substrate does not overlap with an edge of an orthographic projection of the corresponding second conductive portion on the base substrate.
2. The display substrate according to claim 1, wherein: The touch control layer further includes a first conductive layer and a first insulating layer, wherein the first insulating layer is located between the first conductive layer and the second conductive layer.
3. The display substrate according to claim 2, wherein: The first conductive layer is located on a side of the second conductive layer close to the base substrate.
4. The display substrate according to claim 3, wherein: The first sub-conductive layer is located on a side of the first insulating layer away from the base substrate, and the second sub-conductive layer is located on a side of the first sub-conductive layer away from the base substrate.
5. The display substrate according to claim 3, wherein: The second sub-conductive layer is located on a side of the first insulating layer away from the base substrate, and the first sub-conductive layer is located on a side of the second sub-conductive layer away from the base substrate.
6. The display substrate according to any one of claims 3 to 5, wherein: Two adjacent first conductive portions among the plurality of first conductive portions are spaced apart by a first spacing distance at a minimum in the horizontal direction, and two adjacent second conductive portions among the plurality of second conductive portions are spaced apart by a second spacing distance at a minimum in the horizontal direction, the first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light emitting surface of the display substrate.
7. The display substrate according to claim 6, wherein: At least one of the first conductive parts includes a first surface close to the substrate and a first side surface adjacent to the first surface, and a first slope angle is formed between the first surface and the first side surface; At least one of the second conductive parts includes a second surface close to the substrate and a second side surface adjacent to the second surface, and a second slope angle is formed between the second surface and the second side surface; and The first slope angle is smaller than the second slope angle.
8. The display substrate according to claim 6, wherein: A difference between the first spacing distance and the second spacing distance is in a range of 6 micrometers to 14 micrometers.
9. The display substrate according to any one of claims 3-5, 7-8, wherein: The first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is smaller than the second refractive index; and / or, The second conductive layer has a third refractive index that is lower than the second refractive index.
10. The display substrate according to any one of claims 1 to 5, 7 to 8, wherein: The first sub-conductive layer has a first thickness in a third direction, the second sub-conductive layer has a second thickness in the third direction, the sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms, and the third direction is perpendicular to the light emitting surface of the display substrate.
11. The display substrate according to claim 1, wherein: The material of the first sub-conductive layer includes indium tin oxide; and / or the material of the second sub-conductive layer includes indium tin oxide.
12. The display substrate according to claim 1, wherein: The sheet resistance of the second conductive layer is in the range of 7Ω / □ to 11Ω / □.
13. The display substrate according to any one of claims 7 to 8, 11 to 12, wherein: The touch control layer further includes a first conductive layer and a first insulating layer. The first conductive layer includes a plurality of bridge portions. At least a portion of the plurality of first conductive portions is electrically connected to the bridge portion.
14. The display substrate according to claim 13, wherein: The first insulating layer includes a plurality of first insulating portions, at least some of the first insulating portions are arranged corresponding to at least some of the bridging portions, The orthographic projection of the first insulating portion on the substrate at least partially overlaps with the orthographic projection of the corresponding bridge portion on the substrate; as well as The width of the first insulating portion in the first direction is greater than the width of the corresponding bridge portion in the first direction; And the width of the first insulating portion in the second direction is smaller than the width of the corresponding bridging portion in the second direction, the first direction and the second direction are parallel to the horizontal direction, the first direction and the second direction intersect, and the horizontal direction is parallel to the light emitting surface of the display substrate.
15. The display substrate according to claim 14, wherein: Two adjacent first conductive portions among the plurality of first conductive portions are spaced at a minimum first spacing distance in the horizontal direction, and a width of the first insulating portion in the second direction is greater than the first spacing distance.
16. The display substrate according to claim 2, wherein: The first conductive layer includes a single layer or multiple conductive layers; and / or, The material of the first conductive layer includes indium tin oxide, metal or metal alloy.
17. The display substrate according to claim 2, wherein: The touch layer includes a touch electrode, and the touch electrode includes a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes, the plurality of first sub-touch electrodes extend along a first direction and are spaced apart along a second direction, the plurality of second sub-touch electrodes extend along a second direction and are spaced apart along the first direction, and the first direction and the second direction intersect; the first sub-touch electrodes and the second sub-touch electrodes are insulated from each other; at least one of the first sub-touch electrodes and the second sub-touch electrodes includes a plurality of main bodies and a plurality of bridging parts, the plurality of main bodies are located in the second conductive layer, the plurality of bridging parts are located in the first conductive layer, and two adjacent main bodies are electrically connected via one bridging part.
18. A display device, characterized in that: Comprising the display substrate as described in any one of claims 1-17.
Citation Information
Cited By
Display substrate and manufacturing method therefor, and display device
WO2026045668A1