Film layer structure and low-radiation coated glass

Abstract

The utility model discloses a film layer structure and low emissivity coated glass, which belongs to the technical field of glass, the film layer structure comprises a first dielectric layer, a functional layer and a second dielectric layer which are sequentially arranged along the thickness direction, and the functional layer is an aluminum layer or a copper layer. According to the utility model, the aluminum layer or the copper layer is adopted as the functional layer of the film layer structure, so that the required requirements on transmissivity, reflectivity and absorptivity can be met, the performance is stable, and the optical performance is not easily influenced by the reaction with sulfur in the environment, thereby prolonging the service life of the film layer. In addition, copper and aluminum are lower in price compared with existing silver, and the manufacturing cost can be reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of glass production, and particularly relates to a film layer structure and a low-emissivity coated glass. Background Art

[0002] Low-emissivity coated glass (Low-E glass) is a film system product coated with multiple layers of metals or other compounds on the glass surface. Low-emissivity coated glass has the characteristics of high visible light transmittance and high mid- and far-infrared reflectivity. Therefore, it has excellent heat insulation effect, sunshade performance and good light transmittance, which can not only meet the requirements of indoor lighting, but also block solar radiation from entering the room and reduce the load of indoor air conditioners.

[0003] The film layer on the surface of low-emissivity coated glass often uses metallic silver as the infrared reflection material, which not only has high cost, but also has a short service life of the silver layer, thus reducing the optical performance of the glass. Summary of the Utility Model

[0004] The main object of the utility model is to provide a film layer structure and a low-emissivity coated glass, aiming to improve the service life of the film layer of the low-emissivity coated glass.

[0005] To achieve the above object, the film layer structure proposed by the utility model includes a first dielectric layer, a functional layer and a second dielectric layer which are sequentially arranged along the thickness direction, and the functional layer is an aluminum layer or a copper layer.

[0006] In an embodiment, when the functional layer is an aluminum layer, the thickness of the functional layer is 3nm - 9nm; and / or, when the functional layer is a copper layer, the thickness of the functional layer is 15nm - 21nm.

[0007] In an embodiment, the first dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer, and / or, the second dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer.

[0008] In an embodiment, the second dielectric layer serves as the innermost layer of the film layer structure, and the second dielectric layer is a titanium oxide layer or a silicon nitride layer.

[0009] In an embodiment, the thickness of the second dielectric layer is 20nm - 40nm.

[0010] In an embodiment, the first dielectric layer serves as the outermost layer of the film layer structure, and the thickness of the first dielectric layer is 13nm - 33nm.

[0011] In an embodiment, a protective layer is further provided outside the functional layer. When the functional layer is an aluminum layer, the protective layer is an aluminum oxide protective layer; when the functional layer is a copper layer, the protective layer is a silicon nitride protective layer.

[0012] In one embodiment, the thickness of the alumina protective layer is 4 nm - 12 nm; and / or, the thickness of the silicon nitride protective layer is 6 nm - 15 nm.

[0013] The present utility model also provides a low-emissivity coated glass, which includes a glass body and the film layer structure of the present utility model, and the film layer structure is disposed on one side of the glass body.

[0014] In one embodiment, there is at least one set of the film layer structure.

[0015] The present utility model uses an aluminum layer or a copper layer as the functional layer of the film layer structure, which can not only meet the required transmittance, reflectance, and absorptance requirements, but also has stable performance and is not easily reacted with sulfur in the environment to affect its optical performance, thereby prolonging the service life of the film layer. In addition, copper and aluminum are lower in price than the existing silver, which can reduce the manufacturing cost. Description of the Drawings

[0016] In order to more clearly illustrate the embodiments of the present utility model, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on the structures shown in these drawings.

[0017] Figure 1 It is a relationship diagram of the transmittance of the aluminum layer and the copper layer versus the wavelength;

[0018] Figure 2 It is a relationship diagram of the reflectance of the aluminum layer and the copper layer versus the wavelength;

[0019] Figure 3 It is a relationship diagram of the absorptance of the aluminum layer and the copper layer versus the wavelength;

[0020] Figure 4 It is a sectional view of the low-emissivity coated glass in an embodiment of the present utility model;

[0021] Figure 5 It is a relationship diagram of the transmittance of the low-emissivity coated glass in Embodiments 1 - 3 of the present utility model versus the wavelength;

[0022] Figure 6 It is a relationship diagram of the transmittance of the low-emissivity coated glass in Embodiments 4 - 6 of the present utility model versus the wavelength;

[0023] Figure 7 It is a relationship diagram of the transmittance of the low-emissivity coated glass in Embodiments 7 - 9 of the present utility model versus the wavelength;

[0024] Figure 8 It is a relationship diagram of the transmittance of the low-emissivity coated glass in Embodiments 10 - 12 of the present utility model versus the wavelength;

[0025] Figure 9 Cross-sectional view of the low-emissivity coated glass in another embodiment of the present utility model;

[0026] Figure 10 Graph showing the relationship between the transmittance and wavelength of the low-emissivity coated glass in Embodiments 13 - 17 of the present utility model;

[0027] Figure 11 Graph showing the relationship between the transmittance and wavelength of the low-emissivity coated glass in Embodiments 13, 18 - 22 of the present utility model;

[0028] Figure 12 Graph showing the relationship between the transmittance and wavelength of the low-emissivity coated glass in Embodiments 13, 25 - 28 of the present utility model;

[0029] Figure 13 Graph showing the relationship between the transmittance and wavelength of the low-emissivity coated glass in Embodiments 13, 29 - 32 of the present utility model;

[0030] Figure 14 Cross-sectional view of the low-emissivity coated glass in still another embodiment of the present utility model;

[0031] Figure 15 Cross-sectional view of the low-emissivity coated glass in yet another embodiment of the present utility model;

[0032] Figure 16 Graph showing the relationship between the transmittance and wavelength of the glass in Embodiments 1, 13, 33 and Comparative Examples 1 - 4 of the present utility model;

[0033] Figure 17 Graph showing the relationship between the transmittance and wavelength of the glass in Embodiments 1, 23 - 24 and Comparative Examples 1, 5 - 6 of the present utility model.

[0034] Explanation of the reference numerals in the drawings

[0035] 100, film layer structure;

[0036] 1, second dielectric layer; 2, functional layer; 3, first dielectric layer; 4, protective layer;

[0037] 200, glass body. Detailed implementation manners

[0038] It should be noted that if there are descriptions involving "first", "second", etc. in the embodiments of the present utility model, the descriptions of "first", "second", etc. are only for descriptive purposes and should not be construed as indicating or implying their relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one such feature. Additionally, if "and / or" or "and / or" appears throughout the text, its meaning includes three parallel scenarios. Taking "A and / or B" as an example, it includes Scenario A, or Scenario B, or the scenario where both A and B are satisfied simultaneously. "At least one" as used in the embodiments of the present utility model refers to one or more, and "multiple" refers to two or more.

[0039] The "range" disclosed in the present utility model is defined in the form of a lower limit and an upper limit. A given range is defined by selecting a lower limit and an upper limit, and the selected lower limit and upper limit define the boundary of a particular range. The range defined in this way can include or exclude the end values and can be combined arbitrarily, that is, any lower limit can be combined with any upper limit to form a range. For example, if ranges of 60 - 120 and 80 - 110 are listed for a specific parameter, ranges of 60 - 110 and 80 - 120 are also contemplated. Additionally, if the minimum range values 1 and 2 are listed, and if the maximum range values 3, 4, and 5 are listed, the following ranges are all contemplated: 1 - 3, 1 - 4, 1 - 5, 2 - 3, 2 - 4, and 2 - 5. In the present utility model, unless otherwise stated, the numerical range "a - b" represents an abbreviated representation of any real number combination between a and b, where both a and b are real numbers. For example, the numerical range "0 - 5" represents that all real numbers between "0 - 5" have been fully listed herein, and "0 - 5" is only an abbreviated representation of these numerical combinations. Additionally, when stating that a certain parameter is an integer ≥ 2, it is equivalent to disclosing that the parameter is, for example, the integers 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, etc.

[0040] In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of those of ordinary skill in the art to implement. When the combination of technical solutions results in contradictions or is unable to be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by the present utility model.

[0041] The film layer on the surface of low-emissivity coated glass often uses metallic silver as the infrared reflection material. However, using a silver layer as the infrared reflection material has the following disadvantages. On the one hand, when exposed to a harsh environment, silver will chemically react with sulfur in the environment, reducing its optical performance, causing serious degradation of the film layer, and thus reducing its lifespan. On the other hand, silver itself is relatively expensive. And to avoid the reaction of silver with air, low-emissivity coated glass based on silver needs to be installed in a double-pane system, and it is necessary to evacuate or fill with argon to remove air, which further increases its manufacturing cost.

[0042] To this end, the present utility model proposes a film layer structure, which includes a first dielectric layer, a functional layer, and a second dielectric layer sequentially arranged along the thickness direction, and the functional layer is an aluminum layer or a copper layer.

[0043] The function of the functional layer is to reduce the emissivity, filter sunlight into a cold light source, improve the light transmission performance, and adjust the optical performance and film layer color performance.

[0044] To achieve the above functions, the present utility model tests the optical properties of the aluminum layer and the copper layer. The near-infrared band of a LAMBDA1050+ ultraviolet / visible / near-infrared spectrophotometer is used for testing, and the band range is: 185nm - 3300nm. The results are as Figures 1 - 3 shown, Figure 1 is a graph of the transmittance of the aluminum layer and the copper layer versus wavelength, Figure 2 is a graph of the reflectance of the aluminum layer and the copper layer versus wavelength, Figure 3 is a graph of the absorptance of the aluminum layer and the copper layer versus wavelength.

[0045] From Figure 1 it can be seen that the transmittance of the aluminum layer and the copper layer for visible light (390nm - 780nm) can reach up to about 46%. In this way, the entire film layer structure can achieve a transmittance of 80% in the visible light region, which can meet the requirement of high transmittance of visible light required for low-emissivity coated glass.

[0046] From Figure 2 it can be seen that the reflectance of the aluminum layer for near-infrared light (780nm - 2500nm) can reach up to 85%, and the reflectance of the copper layer for near-infrared light (780nm - 1250nm) can reach up to 96%, and the reflectance for near-infrared light (1250nm - 2500nm) can reach up to 85%. This shows that the aluminum layer and the copper layer can meet the requirement of high reflectance of infrared light required for low-emissivity coated glass.

[0047] From Figure 3 it can be seen that the absorptance of the aluminum layer and the copper layer is about 10% or so, which is beneficial for constructing low-emissivity coated glass with low heat.

[0048] In summary, the film layer structure of the present utility model uses an aluminum layer or a copper layer as the functional layer, which can not only meet the required transmittance, reflectivity and absorptivity requirements, but also has stable performance and is not easy to react with sulfur in the environment to affect its optical performance, thereby extending the service life of the film layer. In addition, copper and aluminum are lower in price than the existing silver, which can reduce the manufacturing cost.

[0049] In an embodiment of the present utility model, when the functional layer is an aluminum layer, the thickness of the functional layer is 3nm - 9nm; and / or, when the functional layer is a copper layer, the thickness of the functional layer is 15nm - 21nm.

[0050] The thickness of the functional layer will affect its optical performance. When the thickness is within this defined range, the functional layer has good optical performance. When the thickness of the functional layer continues to increase, the transmittance of the film layer structure does not change significantly.

[0051] In an embodiment of the present utility model, the first dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer; and / or, the second dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer.

[0052] The first dielectric layer and the second dielectric layer are respectively arranged on both sides of the functional layer. On the one hand, it can increase the transmittance of the entire film layer structure. On the other hand, the first dielectric layer and the second dielectric layer have high hardness and can provide protection for the functional layer.

[0053] In an embodiment of the present utility model, the second dielectric layer is the innermost layer of the film layer structure, and the second dielectric layer is titanium oxide or silicon nitride.

[0054] When the second dielectric layer is the innermost layer of the film layer structure (the layer in contact with the glass body), it can also prevent the diffusion and migration of sodium elements in the glass body from damaging the structure of the functional layer. The second dielectric layer is preferably titanium oxide or silicon nitride because it has a lower transmittance to infrared light. At 1800nm, the transmittance to infrared light is less than 15%.

[0055] In an embodiment of the present utility model, the thickness of the second dielectric layer is 20 - 40nm.

[0056] In an embodiment of the present utility model, the first dielectric layer is the outermost layer of the film layer structure, and the thickness of the first dielectric layer is 13nm - 33nm.

[0057] The first dielectric layer, as the outermost layer of the film layer structure (the layer in contact with the outside world), can also serve as an antireflection layer to improve the transmittance of visible light.

[0058] Within the above-defined thickness range, the transmittance of the entire film layer structure to visible light is about 80%, and the transmittance to infrared light is less than 15%.

[0059] In an embodiment of the present utility model, a protective layer is further provided on the outer side of the functional layer. When the functional layer is an aluminum layer, the protective layer is an aluminum oxide protective layer; when the functional layer is a copper layer, the protective layer is a silicon nitride protective layer.

[0060] Providing an aluminum oxide protective layer on the outer side of the aluminum functional layer can protect the aluminum functional layer and prevent the performance of the film layer from being affected due to oxidation of the aluminum functional layer. Adding the aluminum oxide protective layer can also play a role in film layer transition and improve the adhesion of the film layer. Providing a silicon nitride protective layer on the outer side of the copper functional layer can protect the copper functional layer.

[0061] In an embodiment of the present utility model, the thickness of the aluminum oxide protective layer is 4 nm - 12 nm; and / or, the thickness of the silicon nitride protective layer is 6 nm - 15 nm.

[0062] The present utility model also proposes a low-emissivity coated glass, which includes a glass body and the film layer structure of the present utility model, and the film layer structure is arranged on one side of the glass body. For the specific arrangement of the film layer structure, reference may be made to the above embodiments. Since the low-emissivity coated glass of the present utility model adopts all the technical solutions of the above embodiments, it has at least all the beneficial effects brought by the technical solutions of the above embodiments, which will not be elaborated herein one by one.

[0063] In an embodiment of the present utility model, there is at least one set of film layer structures. Coated glasses with different transmittance requirements can be obtained by stacking multiple sets of film layer structures on one side surface of the glass body.

[0064] The following will be described in conjunction with specific embodiments.

[0065] Embodiment 1

[0066] The low-emissivity coated glass, as shown in Figure 4 includes a film layer structure 100 and a glass body 200, and the film layer structure 100 is arranged on the outer side of the glass body 200 (i.e., Figure 4 the right side in

[0067] The film layer structure 100 includes a second dielectric layer 1, a functional layer 2, and a first dielectric layer 3 arranged in sequence from the inside to the outside (i.e., Figure 4 the left-to-right direction in

[0068] The second dielectric layer 1 is a titanium oxide layer with a thickness of 40 nm; the functional layer 2 is an aluminum layer with a thickness of 6 nm; the first dielectric layer 3 is a titanium oxide layer with a thickness of 23 nm.

[0069] The glass body 200 is white glass with a thickness of 6 mm.

[0070] Embodiment 2

[0071] Different from Example 1, the first dielectric layer in this example is a silicon nitride layer, and other structures are the same as those in Example 1.

[0072] Example 3

[0073] Different from Example 1, the first dielectric layer in this example is an alumina layer, and other structures are the same as those in Example 1.

[0074] Example 4

[0075] Different from Example 1, the second dielectric layer in this example is a silicon nitride layer, and the first dielectric layer is a titanium oxide layer, and other structures are the same as those in Example 1.

[0076] Example 5

[0077] Different from Example 4, the first dielectric layer in this example is a silicon nitride layer, and other structures are the same as those in Example 4.

[0078] Example 6

[0079] Different from Example 4, the first dielectric layer in this example is an alumina layer, and other structures are the same as those in Example 4.

[0080] Example 7

[0081] Different from Example 1, the second dielectric layer in this example is an alumina layer, and the first dielectric layer is a titanium oxide layer, and other structures are the same as those in Example 1.

[0082] Example 8

[0083] Different from Example 7, the first dielectric layer in this example is an alumina layer, and other structures are the same as those in Example 7.

[0084] Example 9

[0085] Different from Example 7, the first dielectric layer in this example is a silicon nitride layer, and other structures are the same as those in Example 7.

[0086] Example 10

[0087] Different from Example 1, the second dielectric layer in this example is a zinc oxide layer, and the first dielectric layer is a titanium oxide layer, and other structures are the same as those in Example 1.

[0088] Example 11

[0089] Different from Example 10, the first dielectric layer in this example is an alumina layer, and other structures are the same as those in Example 10.

[0090] Example 12

[0091] Different from Example 10, the first dielectric layer in this example is a zinc oxide layer, and other structures are the same as those in Example 10.

[0092] The transmittance of the low-emissivity coated glass in Examples 1-12 was measured using a Fourier transform infrared spectrometer, and the wavelength range was 300-3500 nm. The results are as Figures 5 - 8 shown. Among them, the relationship between the transmittance of the low-emissivity coated glass in Examples 1-3 and the wavelength is as Figure 5 shown, the relationship between the transmittance of the low-emissivity coated glass in Examples 4-6 and the wavelength is as Figure 6 shown, the relationship between the transmittance of the low-emissivity coated glass in Examples 7-9 and the wavelength is as Figure 7 shown, and the relationship between the transmittance of the low-emissivity coated glass in Examples 10-12 and the wavelength is as Figure 8 shown.

[0093] From Figures 5 - 8 it can be seen that the low-emissivity coated glass in Examples 1-12 has a transmittance of about 80% for visible light; the transmittance of the low-emissivity coated glass in Examples 1, 3, and 4-6 for infrared light can reach as low as below 15%, while the transmittance of the low-emissivity coated glass in Examples 7-12 for infrared light is at least between 10% and 20%, that is, using a titanium oxide layer and a silicon nitride layer as the second dielectric layer has a lower IR transmittance compared to using an aluminum oxide layer and a zinc oxide layer as the second dielectric.

[0094] Example 13

[0095] A low-emissivity coated glass, as shown in the reference Figure 9 , includes a film layer structure 100 and a glass body 200, and the film layer structure 100 is disposed on the outer side of the glass body 200.

[0096] The film layer structure 100 includes a second dielectric layer 1, a functional layer 2, a protective layer 4, and a first dielectric layer 3 that are sequentially disposed from the inside to the outside.

[0097] The second dielectric layer 1 is a titanium oxide layer with a thickness of 40 nm; the functional layer 2 is an aluminum layer with a thickness of 6 nm; the protective layer is an aluminum oxide protective layer with a thickness of 12 nm; the first dielectric layer 3 is a titanium oxide layer with a thickness of 23 nm.

[0098] The glass body 200 is white glass with a thickness of 6 mm.

[0099] Example 14

[0100] Different from Example 13, in this example, the thickness of the second dielectric layer is 35 nm, and other structures are the same as those in Example 13.

[0101] Example 15

[0102] Different from Example 13, in this example, the thickness of the second dielectric layer is 30 nm, and other structures are the same as those in Example 13.

[0103] Example 16

[0104] Different from Example 13, in this example, the thickness of the second dielectric layer is 25 nm, and other structures are the same as those in Example 13.

[0105] Example 17

[0106] Different from Example 13, in this example, the thickness of the second dielectric layer is 20 nm, and other structures are the same as those in Example 13.

[0107] Example 18

[0108] Different from Example 13, in this example, the thickness of the functional layer is 4 nm, and other structures are the same as those in Example 13.

[0109] Example 19

[0110] Different from Example 13, in this example, the thickness of the functional layer is 3 nm, and other structures are the same as those in Example 13.

[0111] Example 20

[0112] Different from Example 13, in this example, the thickness of the functional layer is 7 nm, and other structures are the same as those in Example 13.

[0113] Example 21

[0114] Different from Example 13, in this example, the thickness of the functional layer is 8 nm, and other structures are the same as those in Example 13.

[0115] Example 22

[0116] Different from Example 13, in this example, the thickness of the functional layer is 9 nm, and other structures are the same as those in Example 13.

[0117] Example 23

[0118] Different from Example 13, in this example, the thickness of the functional layer is 10 nm, and other structures are the same as those in Example 13.

[0119] Example 24

[0120] Different from Example 13, in this example, the thickness of the functional layer is 20 nm, and other structures are the same as those in Example 13.

[0121] Example 25

[0122] Different from Example 13, in this example, the thickness of the protective layer is 10 nm, and other structures are the same as those in Example 13.

[0123] Example 26

[0124] Different from Example 13, in this example, the thickness of the protective layer is 8 nm, and other structures are the same as those in Example 13.

[0125] Example 27

[0126] Different from Example 13, in this example, the thickness of the protective layer is 6 nm, and other structures are the same as those in Example 13.

[0127] Example 28

[0128] Different from Example 13, in this example, the thickness of the protective layer is 4 nm, and other structures are the same as those in Example 13.

[0129] Example 29

[0130] Different from Example 13, in this example, the thickness of the first dielectric layer is 18 nm, and other structures are the same as those in Example 13.

[0131] Example 30

[0132] Different from Example 13, in this example, the thickness of the first dielectric layer is 13 nm, and other structures are the same as those in Example 13.

[0133] Example 31

[0134] Different from Example 13, in this example, the thickness of the first dielectric layer is 28 nm, and other structures are the same as those in Example 13.

[0135] Example 32

[0136] Different from Example 13, in this example, the thickness of the first dielectric layer is 33 nm, and other structures are the same as those in Example 13.

[0137] The transmittance of the low-emissivity coated glass in Examples 13 - 22 and 25 - 32 was measured using a Fourier transform infrared spectrometer, with a wavelength range of 300 - 3500 nm. The results are as Figures 10 - 13 shown. Among them, the relationship between the transmittance of the low-emissivity coated glass in Examples 13 - 17 and the wavelength is as Figure 10 shown, the relationship between the transmittance of the low-emissivity coated glass in Examples 13 and 18 - 22 and the wavelength is as Figure 11 shown, and the relationship between the transmittance of the low-emissivity coated glass in Examples 13 and 25 - 28 and the wavelength is asFigure 12 As shown, the relationship between the transmittance and wavelength of the low-emissivity coated glass in Example 13 and Examples 29 - 32 is as Figure 13 shown.

[0138] From Figure 10 it can be seen that when the thickness of the second dielectric layer is reduced from 40 nm to 20 nm, the maximum transmittance of the low-emissivity coated glass to visible light is reduced from 82% to 76%, but the minimum transmittance to infrared light remains below 10%.

[0139] From Figure 11 it can be seen that when the thickness of the functional layer is reduced from 9 nm to 3 nm, the maximum transmittance of the low-emissivity coated glass to visible light is reduced from 89% to 74%, while the minimum transmittance to infrared light is increased from 2% to 18%. Therefore, in order to simultaneously meet the high transmittance to visible light and the low transmittance to infrared light, the thickness of the functional layer is preferably 6 nm.

[0140] From Figure 12 it can be seen that when the thickness of the protective layer is between 4 - 12 nm, the maximum transmittance of the low-emissivity coated glass to visible light remains between 82% - 85%, and the minimum transmittance to infrared light remains around 5%.

[0141] From Figure 13 it can be seen that when the thickness of the first dielectric layer is reduced from 33 nm to 13 nm, the maximum transmittance of the low-emissivity coated glass to visible light first increases from 78% to 84%, and then decreases to around 73%, while the minimum transmittance to infrared light remains at 5%. Therefore, the thickness of the first dielectric layer is preferably 23 nm.

[0142] Example 33

[0143] Different from Example 13, the second dielectric layer and the first dielectric layer in this example are both silicon nitride layers, and other structures are the same as those in Example 13.

[0144] Example 34

[0145] Low-emissivity coated glass, as shown in reference Figure 14 includes a film layer structure 100 and a glass body 200. There are two groups of the film layer structure 100 in this example, and the two groups of the film layer structure 100 are sequentially arranged on the outer side of the glass body 200.

[0146] The film layer structure 100 includes a second dielectric layer 1, a functional layer 2, a protective layer 4, and a first dielectric layer 3 arranged in sequence from the inside to the outside.

[0147] The second dielectric layer 1 is a titanium oxide layer with a thickness of 40 nm; the functional layer 2 is an aluminum layer with a thickness of 6 nm; the protective layer is an aluminum oxide protective layer with a thickness of 12 nm; the first dielectric layer 3 is a titanium oxide layer with a thickness of 23 nm.

[0148] The glass body 200 is white glass with a thickness of 6 mm.

[0149] Example 35

[0150] Low-emissivity coated glass, refer to Figure 15 As shown, different from Example 4, the film layer structure of this example has three groups, and other structures are the same as those of Example 34.

[0151] Example 36

[0152] Low-emissivity coated glass, different from Example 1, the functional layer of this example is a copper layer, and the thickness of the functional layer is 18 nm, and other structures are the same as those of Example 1.

[0153] Comparative Example 1

[0154] This Comparative Example 1 is ordinary white glass with a thickness of 6 mm.

[0155] Comparative Example 2

[0156] The low-emissivity coated glass of this comparative example is 180Cardinal. The film layer of this glass includes a first zinc oxide tin layer, a silver layer, a nickel chromium layer, and a second zinc oxide tin layer arranged in sequence. The first zinc oxide tin layer is adhered to the glass body. The thickness of the first zinc oxide tin layer is 54 nm, the thickness of the silver layer is 13 nm, the thickness of the nickel chromium layer is 3 nm, the thickness of the second zinc oxide tin layer is 46 nm, and the thickness of the glass body is 6 mm.

[0157] Comparative Example 3

[0158] The low-emissivity coated glass of this comparative example is Sun-Guard 55. The film layer of this glass includes a first silicon nitride layer, a first nickel chromium layer, a silver layer, a second nickel chromium layer, and a second silicon nitride layer arranged in sequence. The first silicon nitride layer is adhered to the glass body. The thickness of the first silicon nitride layer is 58 nm, the thickness of the first nickel chromium layer is 5 nm, the thickness of the silver layer is 11 nm, the thickness of the second nickel chromium layer is 8 nm, the thickness of the second silicon nitride layer is 16 nm, and the thickness of the glass body is 6 nm.

[0159] Comparative Example 4

[0160] The low-emissivity coated glass of this comparative example is SunGate 400. The film layer of this glass includes a first zinc oxide tin layer, a silver layer, a nickel chromium layer, a second zinc oxide tin layer, and a silicon nitride layer arranged in sequence. The first zinc oxide tin layer is attached to the glass body. The thickness of the first zinc oxide tin layer is 49 nm, the thickness of the silver layer is 13 nm, the thickness of the nickel chromium layer is 3 nm, the thickness of the second zinc oxide tin layer is 33 nm, the thickness of the silicon nitride layer is 16 nm, and the thickness of the glass body is 6 mm.

[0161] Comparative Example 5

[0162] The low-emissivity coated glass of this comparative example is Low-E 3 366. The film layer of this glass includes a first zinc oxide tin layer, a first nickel chromium layer, a first silver layer, a second nickel chromium layer, a second zinc oxide tin layer, a second silver layer, a third nickel chromium layer, a third zinc oxide tin layer, and a silicon nitride layer arranged in sequence. The first zinc oxide tin layer is attached to the glass body. The thickness of the first zinc oxide tin layer is 58 nm, the thickness of the first nickel chromium layer is 2 nm, the thickness of the first silver layer is 11 nm, the thickness of the second nickel chromium layer is 3 nm, the thickness of the second zinc oxide tin layer is 75 nm, the thickness of the second silver layer is 10 nm, the thickness of the third nickel chromium layer is 3 nm, the thickness of the third zinc oxide tin layer is 33 nm, the thickness of the silicon nitride layer is 16 nm, and the thickness of the glass body is 6 mm.

[0163] Comparative Example 6

[0164] The low-emissivity coated glass of this comparative example is Low-E 3 344. The film layer of this glass includes a first zinc oxide tin layer, a first nickel chromium layer, a first silver layer, a second nickel chromium layer, a second zinc oxide tin layer, a second silver layer, a third nickel chromium layer, a third zinc oxide tin layer, and a silicon nitride layer arranged in sequence. The first zinc oxide tin layer is attached to the glass body. The thickness of the first zinc oxide tin layer is 58 nm, the thickness of the first nickel chromium layer is 3 nm, the thickness of the first silver layer is 13 nm, the thickness of the second nickel chromium layer is 5 nm, the thickness of the second zinc oxide tin layer is 80 nm, the thickness of the second silver layer is 12 nm, the thickness of the third nickel chromium layer is 4 nm, the thickness of the third zinc oxide tin layer is 35 nm, the thickness of the silicon nitride layer is 18 nm, and the thickness of the glass body is 6 mm.

[0165] The transmittance of the low-emissivity coated glasses of Examples 1, 13, 33 and Comparative Examples 1-4 was tested using a Fourier transform infrared spectrometer, with the wavelength range: 300 - 3500 nm, and the results are as Figure 16 shown. From Figure 16It can be seen that the transmittance of the ordinary glass in Comparative Example 1 to visible light and infrared light is about 86%. The high transmittance to infrared light will cause heat loss in winter, increasing the heating cost, and will cause the indoor temperature to rise in summer, increasing the burden on the air conditioner. The glasses in Examples 1, 13 and 33 not only have a high transmittance of about 85% to visible light, but also have a transmittance of less than 10% to infrared light. Comparing Examples 1 and 13, it can be seen that although the silver-based glasses in Comparative Examples 2 and 4 have a wider high transmittance region to visible light, their transmittance to infrared light is much higher than that of the glasses in Examples 13 and 33 of the present invention. In addition, although the lowest transmittance of the silver-based glass in Comparative Example 3 can also reach below 15%, its highest transmittance to visible light is only about 63%, which is much lower than the transmittance to visible light in Examples 13 and 33 of the present invention. Thus, it can be seen that the aluminum-based glass of the present invention can simultaneously meet the requirements of high transmittance to visible light and high reflectivity to infrared light.

[0166] The Fourier transform infrared spectrometer was used to test the transmittance of the low-emissivity coated glasses in Example 1, 23 - 24 and Comparative Examples 1, 5 - 6. The wavelength range was 300 - 3500 nm, and the results are as Figure 17 shown. As Figure 17 can be seen, when the thickness of the functional layer aluminum layer increases from 6 nm to 20 nm, the highest transmittance of the glass to visible light decreases from 82% to 48%, but it has a wider low transmittance region to infrared light, and the lowest transmittance to infrared light decreases from 5% to about 1%. When the thickness of the aluminum layer is 10 nm, properties similar to those of the three-layer silver-based glass in Comparative Example 5 can be obtained, and are superior to those of the three-layer silver-based glass in Comparative Example 6. Therefore, the aluminum-based coated glass of the present invention can replace the existing silver-based coated glass. On the basis of ensuring the low-emissivity performance, it can also extend the service life and reduce the manufacturing cost.

[0167] The above are only exemplary embodiments of the present invention, and do not limit the patent scope of the present invention. Any equivalent structural transformation made under the technical concept of the present invention by using the content of the specification and drawings of the present invention, or directly / indirectly applied in other related technical fields, is included in the patent protection scope of the present invention.

Claims

1. A film layer structure, characterized in that, It includes a first dielectric layer, a functional layer, and a second dielectric layer that are sequentially arranged in the thickness direction, and the functional layer is an aluminum layer or a copper layer.

2. The film layer structure according to claim 1, wherein When the functional layer is an aluminum layer, the thickness of the functional layer is 3 nm - 9 nm; And / or, when the functional layer is a copper layer, the thickness of the functional layer is 15 nm - 21 nm.

3. The film layer structure according to claim 1, characterized in that, The first dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer; And / or, the second dielectric layer is selected from one of a titanium oxide layer, a silicon nitride layer, an aluminum oxide layer, and a zinc oxide layer.

4. The film layer structure according to claim 3, characterized in that, The second dielectric layer is the innermost layer of the film layer structure, and the second dielectric layer is a titanium oxide layer or a silicon nitride layer.

5. The film layer structure according to claim 4, characterized in that, The thickness of the second dielectric layer is 20 nm - 40 nm.

6. The film layer structure according to claim 3, characterized in that, The first dielectric layer is the outermost layer of the film layer structure, and the thickness of the first dielectric layer is 13 nm - 33 nm.

7. The film layer structure according to any one of claims 1 to 6, characterized in that, A protective layer is further provided outside the functional layer; Under the condition that the functional layer is an aluminum layer, the protective layer is an aluminum oxide protective layer; Under the condition that the functional layer is a copper layer, the protective layer is a silicon nitride protective layer.

8. The film layer structure according to claim 7, characterized in that, The thickness of the aluminum oxide protective layer is 4 nm - 12 nm; and / or, the thickness of the silicon nitride protective layer is 6 nm - 15 nm.

9. A low-emissivity coated glass, characterized in that, It includes a glass body and the film layer structure according to any one of claims 1 to 8, and the film layer structure is provided on one side of the glass body.

10. The low-emissivity coated glass according to claim 9, characterized in that, At least one group of the film layer structures is provided.

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