Continuous production system for gaseous chlorine dioxide
By introducing devices such as buffer tanks and mixers into the gas chlorine dioxide production system, the pressure instability caused by the drop in the tank liquid level is solved, the continuous and stability of the reaction is achieved, and the generation efficiency and output of gas chlorine dioxide are improved.
Patent Information
- Application Number
- CN202422544389.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-21
- Publication Date
- 2025-08-19
- Estimated Expiration
- 2034-10-21
AI Technical Summary
In the prior art, the drop in the tank liquid level in the gas chlorine dioxide production system causes unstable pipeline pressure, affecting the unstable solution flow, and thus affecting the normal progress of the reaction.
The design of connecting the storage tank and the buffer tank is adopted. The raw materials are first entered into the buffer tank and then entered the reactor. Combined with the mixer, overflow tank and liquid level meter, etc., to ensure stable pressure and uniform flow, and the continuous and stable reaction is achieved through the control device.
It effectively avoids pressure instability caused by the drop in the tank liquid level, ensures the normal and stable progress of the reaction, and improves the generation efficiency and yield of gas chlorine dioxide.
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Figure CN223233776U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of inorganic chemical industry, and particularly relates to a continuous production system of chlorine dioxide gas. Background Art
[0002] Volatile organic compounds (VOCs) are a type of organic waste gas that is toxic, irritating, teratogenic, and carcinogenic. They are generally divided into several categories, including non-methane hydrocarbons (NMHCs), oxygen-containing organic compounds, halogenated hydrocarbons, nitrogen-containing organic compounds, and sulfur-containing organic compounds. VOCs organic waste gas mainly comes from processes such as coal chemical industry, petrochemical industry, fuel and paint manufacturing, and solvent manufacturing and use. VOCs participate in the formation of ozone and secondary aerosols in the atmospheric environment, and have a significant impact on regional atmospheric ozone pollution and PM2.5 pollution. VOCs can cause harm to human health and the environment. Under ultraviolet radiation, highly oxidizing VOCs react photochemically with NOx in the atmosphere to produce secondary pollutants such as O3. At the same time, VOCs react with particulate matter in the atmosphere to form secondary organic aerosols, which are the source of photochemical pollution and haze pollution.
[0003] Common methods for treating organic waste gas include thermal destruction, adsorption, biological treatment, pressure swing adsorption separation and purification technology, oxidation, liquid absorption, and condensation recovery. A more cost-effective method involves using strong oxidizing compounds, such as ozone, chlorine dioxide (ClO2), and hypochlorous acid (HClO), to decompose VOCs and odors by contacting them with them. This requires the on-site production of large quantities of chlorine dioxide (ClO2) gas.
[0004] To address the above-mentioned issues, in the prior art, Chinese invention patent application number CN202210843321.2 discloses a continuous production system and method for chlorine dioxide gas. The specific method comprises providing a first reactor, a second reactor, and a third reactor. A raw material mixture consisting of a chlorite solution, a hypochlorite solution, and a hydrochloric acid solution first undergoes a first-stage reaction in the first reactor, followed by a second-stage reaction and a third-stage reaction in the second and third reactors, respectively. The first storage tank is used to store the chlorite solution, the second storage tank is used to store the hypochlorite solution, and the third storage tank is used to store the dilute hydrochloric acid solution. While this solution achieves continuous production of chlorine dioxide gas and effectively improves the generation efficiency and yield of chlorine dioxide gas, it was found in actual production processes that as the reaction proceeds, the liquid levels in the first, second, and third storage tanks drop, causing unstable pressure in the pipeline and, consequently, unstable flow of the solution into the first reactor, which has a certain impact on the normal progress of the reaction. Summary of the Invention
[0005] Based on this, the present application provides a continuous production system for gaseous chlorine dioxide to solve the technical problem in the prior art that the pressure in the pipeline is unstable, thereby causing unstable solution flow into the first reactor, which has a certain impact on the normal progress of the reaction.
[0006] The technical solutions of this application to solve the above technical problems are as follows:
[0007] A continuous production system for chlorine dioxide gas, comprising:
[0008] At least one storage tank, at least one cache tank and a first reactor, wherein the at least one storage tank corresponds to the at least one cache tank one-to-one, and the outlet of the storage tank is connected to the inlet of the cache tank, and the outlet of the cache tank is connected to the inlet of the first reactor; the first reactor is used to carry out a first-stage reaction with a raw material mixture of a predetermined ratio as raw material to generate a first-stage gas-phase product and a first-stage liquid-phase product; wherein the first reactor is provided with a first-stage gas-phase product discharge pipe and a first-stage liquid-phase product discharge pipe.
[0009] Preferably, the above-mentioned continuous production system of gaseous chlorine dioxide further includes a mixer, the outlet of the at least one buffer tank is connected to the inlet of the mixer, and the outlet of the mixer is connected to the inlet of the first reactor.
[0010] Preferably, the above-mentioned gaseous chlorine dioxide continuous production system further includes at least one overflow tank, the at least one buffer tank corresponds to the at least one overflow tank one-to-one, and the buffer tank is provided with an overflow pipe, the outlet of the overflow pipe is connected to the overflow tank, and the outlet of the overflow tank is connected to the inlet of the buffer tank.
[0011] Preferably, in the above-mentioned gaseous chlorine dioxide continuous production system, a distributor is provided in the buffer tank.
[0012] Preferably, in the above-mentioned gaseous chlorine dioxide continuous production system, a ventilation pipe is provided on the buffer tank.
[0013] Preferably, in the above-mentioned gaseous chlorine dioxide continuous production system, a liquid level gauge is provided on the overflow tank, an electric valve is provided at the inlet of the buffer tank, and the liquid level gauge is electrically connected to the electric valve.
[0014] Preferably, the above-mentioned continuous production system of gaseous chlorine dioxide further includes a second reactor for carrying out a second-stage reaction using the first-stage liquid-phase product as a raw material to generate a second-stage gas-phase product and a second-stage liquid-phase product; wherein the second reactor is connected to the first-stage liquid-phase product discharge pipe and the first-stage gas-phase product discharge pipe, respectively; the second reactor is also provided with a second-stage gas-phase product discharge pipe and a second-stage liquid-phase product discharge pipe;
[0015] a third reactor for carrying out a third-stage reaction using the second-stage liquid-phase product as a raw material to generate a third-stage gas-phase product and a third-stage liquid-phase product; wherein the third reactor is connected to the second-stage liquid-phase product discharge pipe, and the third reactor is further provided with a third-stage gas-phase product discharge pipe and a third-stage liquid-phase product discharge pipe;
[0016] A waste liquid tank is connected to the discharge pipe of the third stage liquid phase product.
[0017] Preferably, the above-mentioned continuous production system of gaseous chlorine dioxide further includes a control device, which is used to control the first-stage liquid product to be transferred to the second reactor, control the second-stage liquid product to be transferred to the third reactor, control the third-stage liquid product to be transferred to the waste liquid tank, and control the feed of a raw material mixture with a predetermined ratio into the first reactor according to the preset reaction time of the first-stage reaction, the reaction time of the second-stage reaction, and the reaction time of the third-stage reaction.
[0018] Preferably, in the above-mentioned continuous production system of gaseous chlorine dioxide, the first reactor, the second reactor and the third reactor are connected to an air feed pipe, the air feed pipe is used to introduce air into the first reactor, the second reactor and the third reactor, and an air feed distributor is provided at the discharge end of the air feed pipe.
[0019] Preferably, in the above-mentioned continuous production system of gaseous chlorine dioxide, a temperature controller is provided on the air feed pipe, and the temperature controller is used to adjust the temperature of the air entering the first reactor, the second reactor and the third reactor.
[0020] Compared with the prior art, the present invention has at least the following advantages:
[0021] The specific chlorine dioxide continuous production system disclosed in the present application includes at least one storage tank, at least one buffer tank and a first reactor, wherein the at least one storage tank corresponds to the at least one buffer tank one-to-one, and the outlet of the storage tank is connected to the inlet of the buffer tank, and the outlet of the buffer tank is connected to the inlet of the first reactor. The first reactor is used to mix the raw materials in the storage tank in a predetermined ratio to carry out the first stage reaction. When the raw materials in the storage tank are not directly transported into the first reactor, but first enter the buffer tank separately, after being buffered by the buffer tank, it can avoid the situation where the flow rate of the solution flowing into the first reactor is unstable due to the drop in the liquid level in the storage tank during the reaction, resulting in unstable pressure in the pipeline, thereby ensuring the normal and stable progress of the reaction. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] Figure 1FIG. 1 is a schematic diagram of an equipment flow chart of a continuous production system of chlorine dioxide gas in one embodiment.
[0023] In the figure: the first storage tank 110, the second storage tank 120, the third storage tank 130, the first buffer tank 210, the second buffer tank 220, the third buffer tank 230, the distributor 240, the mixer 300, the vent pipe 250, the first overflow tank 410, the second overflow tank 420, the third overflow tank 430, the overflow pipe 440, the liquid level meter 450, the electric valve 500, the first reactor 610, the first stage gas phase product discharge pipe 611, the first branch Pipe 6111, second branch pipe 6112, first stage liquid product discharge pipe 612, second reactor 620, second stage gas product discharge pipe 621, second stage liquid product discharge pipe 622, third reactor 630, third stage gas product discharge pipe 631, third stage liquid product discharge pipe 632, waste liquid tank 700, metering pump 800, air feed pipe 900, air feed distributor 910, temperature controller 920. DETAILED DESCRIPTION
[0024] To facilitate understanding of the present application, a more comprehensive description of the present application will be provided below with reference to the accompanying drawings. The accompanying drawings illustrate preferred embodiments of the present application. However, the present application may be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and comprehensive understanding of the disclosure of the present application.
[0025] It should be noted that when an element is referred to as being "disposed on" another element, it may be directly on the other element or there may be an intermediate element. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or there may be an intermediate element. The terms "vertical," "horizontal," "left," "right," "top," "bottom," "bottom end," "top end," and similar expressions used herein are for illustrative purposes only and do not represent the only implementation methods.
[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which this application pertains. The terms used in the specification herein are for the purpose of describing specific embodiments only and are not intended to limit this application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.
[0027] Please see Figure 1 In a specific embodiment of the present application,
[0028] A continuous production system for gaseous chlorine dioxide comprises: at least one storage tank, at least one buffer tank and a first reactor 610, wherein the at least one storage tank corresponds to the at least one buffer tank on a one-to-one basis, and the outlet of the storage tank is connected to the inlet of the buffer tank, and the outlet of the buffer tank is connected to the inlet of the first reactor 610; the first reactor 610 is used to carry out a first-stage reaction using a raw material mixture of a predetermined ratio as raw material to generate a first-stage gas-phase product and a first-stage liquid-phase product; wherein the first reactor 610 is provided with a first-stage gas-phase product discharge pipe 611 and a first-stage liquid-phase product discharge pipe 612.
[0029] The chlorine dioxide continuous production system of this solution uses chlorite solution, hypochlorite solution, and hydrochloric acid solution as reaction raw materials to generate gaseous chlorine dioxide. The storage tank is used to store these reaction raw materials. The storage tank can be one, storing a mixture of chlorite solution, hypochlorite solution, and hydrochloric acid solution prepared according to a predetermined raw material ratio. In the present application, there are preferably three storage tanks, namely a first storage tank 110, a second storage tank 120, and a third storage tank 130, which are respectively used to store chlorite solution, hypochlorite solution, and hydrochloric acid solution. Correspondingly, when there are three storage tanks, there are also three buffer tanks, namely a first buffer tank 210, a second buffer tank 220, and a third buffer tank 230. During production, chlorite solution, hypochlorite solution, and hydrochloric acid solution are fed into the first, second, and third buffer tanks 210, 220, and 230, respectively, via metering pumps 800 according to predetermined raw material ratios. The buffered chlorite, hypochlorite, and hydrochloric acid solutions are then fed into the first reactor 610. After mixing in the first reactor 610, a reaction occurs. Air is then introduced into the first reactor 610, causing gaseous chlorine dioxide to overflow and be discharged through the first-stage gaseous product discharge pipe 611 to the next process. The buffering of the chlorite, hypochlorite, and hydrochloric acid solutions in the first, second, and third buffer tanks 210, 220, and 230 prevents the liquid levels in the first, second, and third storage tanks 110, 120, and 130 from dropping during the reaction, which could lead to unstable pressure in the pipelines and thus unstable flow rates into the first reactor 610. This ensures the normal and stable progress of the reaction.
[0030] To uniformly mix the chlorite solution, hypochlorite solution, and hydrochloric acid solution in the first, second, and third buffer tanks 210, 220, and 230 before inputting them into the first reactor 610, in a preferred embodiment, the continuous gaseous chlorine dioxide production system further includes a mixer 300. The outlet of at least one of the buffer tanks is connected to the inlet of the mixer 300, which is in turn connected to the inlet of the first reactor 610. The mixer 300 functions to uniformly mix the chlorite solution, hypochlorite solution, and hydrochloric acid solution. Therefore, the specific form of the mixer is not limited, as long as it can achieve uniform mixing of the solutions. In this embodiment, a pipeline mixer is preferred. The chlorite solution, hypochlorite solution, and hydrochloric acid solution mixed in the pipeline mixer are then transferred to the first reactor 610, promoting a more complete reaction.
[0031] In the actual production process, since the chlorite solution, hypochlorite solution, and hydrochloric acid solution are respectively delivered to the first cache tank 210, the second cache tank 220, and the third cache tank 230 by the metering pump 800, the outlet of the metering pump 800 has a certain pressure, which may cause the inlet flow rate of the three cache tanks to be greater than the outlet flow rate, then there may be a phenomenon of solution overflowing from the cache tank. Therefore, the gaseous chlorine dioxide continuous production system of the present application also includes at least one overflow tank, and the at least one cache tank corresponds to the at least one overflow tank one-to-one, and the cache tank is provided with an overflow pipe 440, the outlet of the overflow pipe 440 is connected to the overflow tank, and the outlet of the overflow tank is connected to the inlet of the cache tank. In this solution, the number of cache tanks is preferably three, namely the first cache tank 210, the second cache tank 220, and the third cache tank 230, so the corresponding number of overflow tanks is also three, namely the first overflow tank 410, the second overflow tank 420, and the third overflow tank 430. The chlorite solution, hypochlorite solution and hydrochloric acid solution collected in the overflow tank are input into the buffer tank again to participate in the reaction, thus avoiding the waste of raw materials.
[0032] Furthermore, each of the buffer tanks is provided with a distributor 240. The distributor 240 can be of tubular, trough, disc, or a combination thereof. In this embodiment, a perforated plate distributor 240 is preferred. This allows the solution to be evenly distributed across the cross section of the buffer tank, thereby ensuring efficient operation.
[0033] In order to reduce the impact of changes in the pressure in the cache tank on the solution flow, a vent pipe 250 is provided on the cache tank so that the pressure in the cache tank is consistent with the external atmospheric pressure and the pressure in the cache tank does not fluctuate.
[0034] When the solution in the overflow tank overflows too much, it means that the flow of solution delivered to the buffer tank is too large and the flow needs to be adjusted. Therefore, a liquid level meter 450 is provided on the overflow tank, and an electric valve 500 is provided at the inlet of the buffer tank. The liquid level meter 450 is electrically connected to the electric valve 500. The liquid level in the overflow tank is monitored by the liquid level meter 450, and a feedback signal is given to the electric valve 500 at the same time. The flow rate flowing into the buffer tank is adjusted by adjusting the opening of the electric valve 500.
[0035] Preferably, the above-mentioned gaseous chlorine dioxide continuous production system further includes a second reactor 620, which is used to carry out a second-stage reaction using the first-stage liquid-phase product as a raw material to generate a second-stage gas-phase product and a second-stage liquid-phase product; wherein the second reactor 620 is connected to the first-stage liquid-phase product discharge pipe 612 and the first-stage gas-phase product discharge pipe 611, respectively; the second reactor 620 is also provided with a second-stage gas-phase product discharge pipe 621 and a second-stage liquid-phase product discharge pipe 622; a third reactor 630, which is used to carry out a third-stage reaction using the second-stage liquid-phase product as a raw material to generate a third-stage gas-phase product and a third-stage liquid-phase product; wherein the third reactor 630 is connected to the second-stage liquid-phase product discharge pipe 622, and the third reactor 630 is also provided with a third-stage gas-phase product discharge pipe 631 and a third-stage liquid-phase product discharge pipe 632.
[0036] After the first stage reaction is completed, the raw material concentration in the first reactor 610 decreases. The material with the reduced raw material concentration is then discharged into the second reactor 620 through the first stage liquid product discharge pipe 612, thereby completely emptying the first reactor 610. Preferably, the reaction residence time is used to determine whether the first stage reaction is complete. Preferably, after the raw material in the first reactor 610 is emptied, raw material is added to the first reactor 610 to ensure the continuity of the reaction.
[0037] In the second reactor 620, the first-stage liquid product continues to react, and air is introduced, causing chlorine dioxide gas to overflow, generating a second-stage gaseous product. This product is discharged from the second-stage gaseous product discharge pipe 621 and collected as product gaseous chlorine dioxide. In the second reactor 620, due to the reduced reactant concentration, the reaction process is relatively gentle, resulting in a higher-purity gaseous chlorine dioxide product in the second stage. It is important to note that during the second-stage reaction, the first-stage reaction proceeds simultaneously, and the first-stage gaseous product is passed into the second reactor 620, allowing some of the Cl2 in the first-stage gaseous product to continue reacting with the chlorite in the feedstock to produce chlorine dioxide. Due to the higher purity of the gaseous chlorine dioxide in the second-stage gaseous product, it can be directly collected as product gaseous chlorine dioxide for use in odor and VOC treatment equipment.
[0038] Preferably, the above-mentioned gaseous chlorine dioxide continuous production system further includes a waste liquid tank 700, which is connected to the third stage liquid phase product discharge pipe 632. The reaction residence time is used to determine whether the second stage reaction is completed. In the later stage of the second stage reaction, as the raw material concentration in the material further decreases, the reaction rate decreases. At this time, the second stage liquid phase product obtained in the second reactor 620 is transferred to the third reactor 630 through the second stage liquid phase product discharge pipe 622, so that the second stage liquid phase product continues to react in the third reactor 630, thereby improving the reaction yield and generating a third stage gas phase product and a third stage liquid phase product. Among them, the third stage gas phase product is mainly gaseous chlorine dioxide, which can be discharged through the third stage gas phase product discharge pipe 631 and collected as a product. After the third stage reaction is completed, if the raw material concentration in the material is further reduced, the material is discharged from the third stage liquid phase product discharge pipe 632 to the waste liquid tank 700 for disposal as waste liquid.
[0039] After the material in the second reactor 620 is transferred to the third reactor 630, the first-stage liquid product obtained in the first reactor 610 is transferred to the second reactor 620. After the material in the third reactor 630 is transferred to the waste liquid tank 700, the second-stage liquid product obtained in the second reactor 620 is discharged into the third reactor 630.
[0040] The above process is repeated and the reaction time is controlled so that the above reaction process is seamlessly connected, that is, at least one of the first reactor 610, the second reactor 620, and the third reactor 630 is in the reaction stage, thereby realizing the continuous release of gaseous chlorine dioxide and ensuring the supply of gaseous chlorine dioxide to the user end.
[0041] In one preferred embodiment, the first-stage gas-phase product discharge pipe 611 includes a first branch pipe 6111 for connecting to the second reactor 620 and a second branch pipe 6112 for withdrawing the product gaseous chlorine dioxide. The first reaction stage includes a front-end reaction section and a back-end reaction section. When in the front-end reaction section, the second reactor 620 must be in the second-stage reaction to introduce the first-stage gas-phase product containing some Cl2 into the second reactor 620 for purification. When the first-stage reaction is in the back-end reaction section, the Cl2 content in the first-stage gas-phase product decreases, and the first-stage gas-phase product can be collected and utilized as the product gaseous chlorine dioxide. At this time, the second reactor 620 can be in an empty state. After the first-stage reaction is completed, the obtained first-stage liquid-phase product is transferred to the second reactor 620.
[0042] Preferably, the above-mentioned continuous production system of chlorine dioxide gas further includes a control device, which is used to control the transfer of the first-stage liquid phase product to the second reactor 620, the transfer of the second-stage liquid phase product to the third reactor 630, the transfer of the third-stage liquid phase product to the waste liquid tank 700, and the feeding of a raw material mixture with a predetermined ratio into the first reactor 610 based on the preset reaction time of the first-stage reaction, the reaction time of the second-stage reaction, and the reaction time of the third-stage reaction. The control device can realize automated control of the chlorine dioxide gas production process.
[0043] Furthermore, in the above-mentioned continuous production system of gaseous chlorine dioxide, the first reactor 610, the second reactor 620, and the third reactor 630 are connected to an air feed pipe 900, which is used to pass air into the first reactor 610, the second reactor 620, and the third reactor 630. An air feed distributor 910 is provided at the discharge end of the air feed pipe 900. Preferably, the air feed distributor 910 is a ceramic porous plate. The air feed distributor 910 evenly distributes the air entering the first reactor 610, the second reactor 620, and the third reactor 630, which can further improve the generation and emission efficiency of chlorine dioxide gas.
[0044] Furthermore, in the above-mentioned continuous production system of gaseous chlorine dioxide, the air feed pipe 900 is provided with a temperature controller 920. The temperature controller 920 is used to adjust the temperature of the air introduced into the first reactor 610, the second reactor 620, and the third reactor 630, thereby controlling the first-stage reaction, the second-stage reaction, and the third-stage reaction to proceed at an optimal reaction temperature, thereby further improving the generation and emission efficiency of chlorine dioxide gas.
[0045] The above disclosure is only a preferred embodiment of the present invention, and it is certainly not intended to limit the scope of the rights of the present invention. A person skilled in the art can understand that all or part of the processes of the above embodiment and equivalent changes made in accordance with the claims of the present invention are still within the scope of the present invention.
Claims
1. A continuous production system of chlorine dioxide gas, characterized in that: include: At least one storage tank, at least one cache tank and a first reactor, wherein the at least one storage tank corresponds to the at least one cache tank one-to-one, and the outlet of the storage tank is connected to the inlet of the cache tank, and the outlet of the cache tank is connected to the inlet of the first reactor; the first reactor is used to carry out a first-stage reaction with a raw material mixture of a predetermined ratio as raw material to generate a first-stage gas-phase product and a first-stage liquid-phase product; wherein the first reactor is provided with a first-stage gas-phase product discharge pipe and a first-stage liquid-phase product discharge pipe.
2. The continuous production system of chlorine dioxide gas according to claim 1, characterized in that: A mixer is also included, wherein the outlet of the at least one buffer tank is connected to the inlet of the mixer, and the outlet of the mixer is connected to the inlet of the first reactor.
3. The continuous production system of chlorine dioxide gas according to claim 1, characterized in that: It also includes at least one overflow tank, the at least one cache tank corresponds one-to-one to the at least one overflow tank, and the cache tank is provided with an overflow pipe, the outlet of the overflow pipe is connected to the overflow tank, and the outlet of the overflow tank is connected to the inlet of the cache tank.
4. The continuous production system of chlorine dioxide gas according to claim 1, characterized in that: A distributor is provided in the cache tank.
5. The continuous production system of chlorine dioxide gas according to claim 1, characterized in that: The cache tank is provided with a ventilation pipe.
6. The continuous production system of chlorine dioxide gas according to claim 3, characterized in that The overflow tank is provided with a liquid level gauge, the inlet of the cache tank is provided with an electric valve, and the liquid level gauge is electrically connected to the electric valve.
7. The continuous production system of chlorine dioxide gas according to claim 1, characterized in that: Also includes The second reactor is used to carry out a second-stage reaction using the first-stage liquid-phase product as a raw material to generate a second-stage gas-phase product and a second-stage liquid-phase product; wherein the second reactor is connected to the first-stage liquid-phase product discharge pipe and the first-stage gas-phase product discharge pipe respectively; the second reactor is also provided with a second-stage gas-phase product discharge pipe and a second-stage liquid-phase product discharge pipe; a third reactor for carrying out a third-stage reaction using the second-stage liquid-phase product as a raw material to generate a third-stage gas-phase product and a third-stage liquid-phase product; wherein the third reactor is connected to the second-stage liquid-phase product discharge pipe, and the third reactor is further provided with a third-stage gas-phase product discharge pipe and a third-stage liquid-phase product discharge pipe; A waste liquid tank is connected to the discharge pipe of the third stage liquid phase product.
8. The continuous production system of chlorine dioxide gas according to claim 7, characterized in that: The method further includes a control device for controlling the first-stage liquid product to be transferred to the second reactor, controlling the second-stage liquid product to be transferred to the third reactor, controlling the third-stage liquid product to be transferred to the waste liquid tank, and controlling the feed of a raw material mixture of a predetermined ratio to be fed to the first reactor according to the preset reaction time of the first-stage reaction, the reaction time of the second-stage reaction, and the reaction time of the third-stage reaction.
9. The continuous production system of chlorine dioxide gas according to claim 7, characterized in that: The first reactor, the second reactor and the third reactor are connected with air feed pipes, and the air feed pipes are used to introduce air into the first reactor, the second reactor and the third reactor. An air feed distributor is provided at the discharge end of the air feed pipe.
10. The continuous production system of chlorine dioxide gas according to claim 9, characterized in that: The air feed pipe is provided with a temperature controller, and the temperature controller is used to adjust the temperature of the air introduced into the first reactor, the second reactor and the third reactor.
Citation Information
Patent Citations
Gas chlorine dioxide continuous production system and production method
CN115010093A