Exposure equipment

Abstract

The utility model discloses exposure equipment which is characterized in that a light source module used for forming at least two paths of exposure light beams is arranged, a baffle plate and a mask plate are sequentially arranged in the transmission direction of any path of exposure light beam, at least two areas to be exposed of a waveguide plate are simultaneously exposed, and the baffle plate and the mask plate are arranged along the transmission direction of any path of exposure light beam. The projection contour of the light-transmitting area of the baffle on the plane where the waveguide sheet is located covers at least part of the corresponding to-be-exposed area, and the projection contour of the mask on the plane where the waveguide sheet is located covers the corresponding to-be-exposed area. Therefore, multiple exposure paths are arranged at the same time, multiple to-be-exposed areas on the waveguide sheet can be exposed at the same time, and the exposure efficiency is improved. Besides, each to-be-exposed area can correspond to a plurality of baffles and one mask plate, so that the utilization rate of the baffles and the mask plates is increased, and the preparation cost of the baffles and the mask plates is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor preparation, in particular to an exposure device. Background Art

[0002] Augmented Reality (AR) technology revolutionizes visual experience and human-computer interaction, seamlessly integrating real-world and virtual-world information. The optical display system of an AR device typically consists of a microdisplay and optical components. Head-up displays (HUDs) are currently very popular in the market. Automotive HUDs that utilize AR technology offer a wider field of view and a longer imaging distance, resulting in a wider field of view, superior imaging quality, and improved user interactivity.

[0003] At present, the waveguide sheets in AR-HUD are generally volume holographic waveguides or surface relief waveguides. Volume holographic waveguides are widely used because they have relative advantages in manufacturing difficulty and cost. When a volume holographic waveguide is exposed to form a grating using a mask, it is usually necessary to form an input grating, a turning grating, and an output grating. In the related art, when exposing an optical waveguide, it is generally necessary to expose each area separately, which results in low exposure efficiency. In order to improve efficiency, when exposing three areas at the same time, a mask with exposure patterns of three areas is required, which in turn limits the reuse rate of the mask. When the area or shape of the area is different, the mask needs to be re-prepared, which increases costs and is time-consuming and labor-intensive. Utility Model Content

[0004] The utility model provides an exposure device to solve the problem of low exposure efficiency in related technologies.

[0005] To solve the above problems, an embodiment of the present invention provides an exposure device, comprising:

[0006] A light source module, configured to form at least two exposure light beams;

[0007] baffles and masks are sequentially arranged along the transmission direction of any exposure beam, wherein the baffles are provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, wherein the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path illuminates the mask and transfers the periodic grating mask structure to the waveguide to be exposed;

[0008] In which, the waveguide plate has at least two areas to be exposed. Along the transmission direction of any exposure light beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide plate is located covers at least a part of the area corresponding to the area to be exposed, and the projection contour of the mask on the plane where the waveguide plate is located covers the area corresponding to the area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

[0009] Optionally, the light source module is provided with a main light path unit, a light splitting unit and at least two light splitting path units in sequence in the light transmission direction;

[0010] The main optical path unit is provided with a laser, a first switch element, a shaping element, a first beam expansion element and a polarization element in sequence in the light transmission direction, for emitting a main laser beam;

[0011] The beam splitting unit is used to split the main laser beam;

[0012] Each of the splitting path units is provided with a light intensity control element, a second switching element, a second beam expansion element and a collimating element in sequence in the direction of light transmission, which is used to form an exposure beam from the beam after splitting the main laser beam. Each of the splitting path units is also provided with a reflection component, which is used to adjust the angle and / or position of the exposure beam of the corresponding path incident on the area to be exposed.

[0013] Optionally, the number of the light splitting path units is three, and the light splitting units include: a first light splitting prism, a second light splitting prism, a third light splitting prism, a light blocking element, and a first reflecting element;

[0014] The first beam splitter prism is used to split the main laser beam into a first beam and a second beam;

[0015] The second beam splitter prism is used to form the first light beam into a third light beam and a fourth light beam, the third light beam is the first incident light beam of the first light splitting path unit, and the fourth light beam is irradiated to the light blocking element;

[0016] The third beam splitter prism is used to form the second light beam into a fifth light beam and a sixth light beam, and the fifth light beam is the second incident light beam of the second light splitting path unit;

[0017] The first reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

[0018] Optionally, the number of the light splitting path units is three, and the light splitting units include: a fourth light splitting prism, a fifth light splitting prism, a second reflecting element, a third reflecting element, a fourth reflecting element and an optical path adjusting member;

[0019] The fourth beam splitter prism is used to split the main laser beam into a first beam and a second beam, wherein the second beam is a second incident beam of the second beam splitting path unit;

[0020] The fifth beam splitter prism is used to form the first light beam into a third light beam and a fourth light beam, and the third light beam is the first incident light beam of the first light splitting path unit;

[0021] The second reflecting element is used to reflect the fourth light beam to the third reflecting element to form a fifth light beam, the third reflecting element is used to reflect the fifth light beam to form a sixth light beam, the optical path adjusting component is used to adjust the distance between the sixth light beam and the second light beam and the third light beam, and the fourth reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

[0022] Optionally, the reflective assembly includes a fifth reflective element, configured to adjust an angle at which the exposure light beam of a corresponding path is incident on the mask.

[0023] Optionally, when the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection assembly also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and to direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

[0024] Optionally, the reflection assembly also includes a seventh reflection element and an eighth reflection element arranged in parallel, the seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element, the eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0025] Optionally, the fifth reflecting element further includes a light blocking element on a side adjacent to the waveguide plate, and the light blocking element is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to pass the exposure light beam of the corresponding path, and the light blocking element can translate in a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0026] Optionally, the exposure device further comprises: a bracket unit, the bracket unit comprising a support shaft and a plurality of support rods, one end of the support rod being connected to the support shaft, and the other end of the support rod being connected to a connecting piece for connecting the baffle and / or the mask;

[0027] Alternatively, it further comprises a plurality of support seats, wherein one end of the support rod is connected to the support shaft, and the other end is connected to the support seat;

[0028] The support rod can rotate around the support axis, and the support base can rotate on its own. The support base has a hollow receiving groove capable of accommodating the baffle, and at least two of the support bases can simultaneously support corresponding baffles in corresponding areas to be exposed;

[0029] Alternatively, it further comprises a baffle switching disc, on which a hollow receiving groove is arranged in an annular manner.

[0030] Optionally, the exposure device further includes: a workpiece stage, the workpiece stage is used to carry the waveguide plate, and the workpiece stage is capable of translation and rotation.

[0031] Optionally, the exposure device further comprises: a refractive index matching liquid spraying element, comprising a liquid spraying nozzle and a movable shaft, wherein the liquid spraying nozzle is used to spray the refractive index matching liquid onto the waveguide plate, and the movable shaft is connected to a driving device for moving the liquid spraying nozzle.

[0032] The technical solution of an embodiment of the present invention is to simultaneously expose at least two areas to be exposed on a waveguide sheet by providing a light source module for forming at least two exposure beams, and sequentially positioning a baffle and a mask in the direction of transmission of any exposure beam. The baffle is provided with a light-transmitting region, and the mask is provided with a periodic grating mask structure. The light-transmitting region is configured to transmit the corresponding exposure beam, allowing the corresponding exposure beam to illuminate the mask and transfer the periodic grating mask structure to the waveguide sheet. Furthermore, along the direction of transmission of any exposure beam, the projection of the light-transmitting region of the baffle onto the plane of the waveguide sheet covers at least a portion of the corresponding area to be exposed, and the projection of the mask onto the plane of the waveguide sheet covers the corresponding area to be exposed. Thus, by providing multiple exposure paths simultaneously, multiple areas to be exposed on the waveguide sheet can be exposed simultaneously, thereby improving exposure efficiency. Furthermore, each area to be exposed can correspond to multiple baffles and one mask, increasing the utilization rate of the baffles and masks and reducing the production costs of the baffles and masks.

[0033] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present invention, nor is it intended to limit the scope of the present invention. Other features of the present invention will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0035] Figure 1It is a structural schematic diagram of an exposure device provided by an embodiment of the present utility model;

[0036] Figure 2 Schematic diagram of a waveguide in an exposure device provided by an embodiment of the present utility model;

[0037] Figure 3 Schematic diagram of a baffle in the coupling region of an exposure device provided by an embodiment of the present utility model;

[0038] Figure 4 Schematic diagram of a baffle in the outcoupling area of ​​an exposure device provided by an embodiment of the present utility model;

[0039] Figure 5 Schematic diagram of a baffle in a turning area of ​​an exposure device provided by an embodiment of the present utility model;

[0040] Figure 6 This is a schematic diagram of a mask in an exposure device provided by an embodiment of the present utility model;

[0041] Figure 7 Schematic diagram of a light source module in an exposure device provided by an embodiment of the present utility model;

[0042] Figure 8 is a schematic diagram of a light source module in an exposure device provided by another embodiment of the present utility model;

[0043] Figure 9 This is a schematic diagram of an exposure area to be exposed in an exposure device provided by an embodiment of the present utility model;

[0044] Figure 10 This is a schematic diagram of exposure of three areas to be exposed in the exposure device provided by an embodiment of the present utility model;

[0045] Figure 11 Schematic diagram of a support unit in an exposure device provided by an embodiment of the present utility model;

[0046] Figure 12 is a schematic diagram of a bracket unit in an exposure device provided by another embodiment of the present utility model;

[0047] Figure 13 Schematic diagram of splicing the to-be-exposed area of ​​the waveguide plate in the exposure device provided by an embodiment of the present utility model;

[0048] Figure 14 It is a schematic diagram of the exposure sequence of the to-be-exposed area of ​​the waveguide plate in the exposure equipment provided by an embodiment of the present utility model. DETAILED DESCRIPTION

[0049] In order to help those skilled in the art better understand the present invention, the following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0050] It should be noted that the terms "first," "second," and the like in the specification and claims of the present invention and the accompanying drawings are used to distinguish similar items and are not necessarily used to describe a specific order or precedence. It should be understood that the terms used in this manner are interchangeable where appropriate, such that the embodiments of the present invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "including," "having," and any variations thereof are intended to cover non-exclusive inclusions.

[0051] In the related art, a volume holographic optical waveguide generally includes an input region, a turning region, and an output region. The input region is used to couple external light carrying image information into the volume holographic optical waveguide. The turning region and the output region are used to propagate and expand the coupled external light. The output region is also used to couple the light in the volume holographic optical waveguide out to form an output light field for the human eye to receive, thereby observing the relevant image information. Among them, the area of ​​the input region is generally small, and the corresponding mask and baffle can be used for exposure. However, the area of ​​the turning region and the output region is generally large. If a baffle is used for exposure, a baffle with a larger area needs to be made. Moreover, when the shape and contour of the turning region or the output region changes, the baffle cannot be reused, resulting in a waste of resources. In addition, when exposing the waveguide plate, only one area can be exposed at a time, resulting in low exposure efficiency.

[0052] In view of the above problems, an embodiment of the present invention proposes an exposure device that can simultaneously meet the two requirements of improving the utilization rate of the baffle and the mask and improving the exposure efficiency.

[0053] Specifically, Figure 1 Schematic diagram of the structure of the exposure device provided by the embodiment of the present invention. The exposure device 100 includes:

[0054] The light source module 200 is used to form at least two exposure light beams;

[0055] Along the transmission direction of any exposure beam, a baffle 300 and a mask 400 are sequentially arranged. The baffle 300 is provided with a light-transmitting area A, and the mask 400 is provided with a periodic grating mask structure. The light-transmitting area A is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path illuminates the mask 400 and transfers the periodic grating mask structure to the waveguide plate 500 to be exposed.

[0056] Among them, the waveguide plate 500 has at least two areas B to be exposed. Along the transmission direction of any exposure light beam, the projection outline of the light-transmitting area A of the baffle 300 on the plane where the waveguide plate 500 is located covers at least part of the corresponding area to be exposed, and the projection outline of the mask plate 400 on the plane where the waveguide plate 500 is located covers the corresponding area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

[0057] The light transmittance in the light-transmitting area A of the baffle 300 is 100%, and the light transmittance in the non-exposure area is 0%, thereby achieving a single exposure target pattern. The material of the baffle 300 is not limited, as long as the transmittance within the laser wavelength band is 0%. The thickness of the baffle 300 must be less than 0.1 mm to reduce the edge diffraction effect of the grating. The mask 400 has a periodic grating structure, which can expose the volume holographic material by interfering the diffracted light with the direct light. The waveguide 500 can be a HUD waveguide, which is a structure consisting of two layers of glass with the volume holographic material sandwiched between them. The HUD waveguide is larger than 15 inches.

[0058] It is understandable that Figure 2 Schematic diagram of a waveguide in an exposure device according to an embodiment of the present invention. Figure 2 As shown, at least two areas B to be exposed on the waveguide plate 500 can be exposure areas corresponding to the coupling-in area B1 and the coupling-out area B3. An coupling-in area mask and an coupling-in area baffle are provided above the exposure area corresponding to the coupling-in area B1, and an out-coupling area mask and an out-coupling area baffle are provided above the exposure area corresponding to the out-coupling area B3. The light source module 200 can emit a first exposure beam and a second exposure beam. After the first exposure beam passes through the light-transmitting area of ​​the coupling-in area baffle and the coupling-in area mask, it is used to expose the exposure area corresponding to the coupling-in area, so that the periodic mask pattern on the coupling-in area mask is transferred to the coupling-in area. After the second exposure beam passes through the out-coupling area baffle and the out-coupling area mask, it is used to expose the exposure area corresponding to the out-coupling area. So that the periodic mask pattern on the out-coupling area mask is transferred to the out-coupling area. Therefore, by emitting two exposure light beams at the same time and setting two baffles and two mask plates at the same time, two areas to be exposed on the waveguide plate 500 can be exposed at the same time, thereby improving exposure efficiency.

[0059] It should be noted that, since the area of ​​the coupling region B1 is generally small, the light-transmitting area of ​​the coupling region baffle and the coupling region on the waveguide plate 500 can cover the outline of the coupling region B1 along the direction of transmission of the exposure beam ( Figure 3 Schematic diagram of the coupling region baffle in the exposure device provided by the embodiment of the present utility model, as shown in FIG. Figure 3 As shown). Since the outcoupling area B3 is generally large, the light-transmitting area of ​​the outcoupling area baffle and the outcoupling area B3 on the waveguide plate 500 can cover part of the outline of the outcoupling area B3 along the direction of transmission of the exposure beam. In this way, by switching multiple baffles and performing multiple exposures, the outline of the outcoupling area B3 is finally spliced ​​together ( Figure 4 Schematic diagram of the outcoupling zone baffle in the exposure device provided by the embodiment of the present utility model, such as Figure 4 In other embodiments, the waveguide plate 500 further includes a turning area B2. The area of ​​the turning area B2 is generally larger. The light-transmitting area of ​​the turning area baffle and the turning area on the waveguide plate 500 can cover part of the outline of the turning area B2 along the direction of transmission of the exposure beam. In this way, by switching multiple baffles and performing multiple exposures, the outline of the turning area is finally spliced ​​together ( Figure 5 Schematic diagram of a baffle in the turning area of ​​an exposure device provided by an embodiment of the present utility model, such as Figure 5 shown).

[0060] Figure 6 Schematic diagram of the mask in the exposure device provided by the embodiment of the present utility model, such as Figure 6 As shown, the periodic grating mask structure of the mask 400 required for different exposure areas B is the same, but the angles or periods can be different. Each exposure area B only uses a mask 400 with one periodic grating mask structure, which can improve the utilization rate of the mask 400.

[0061] Thus, each baffle can be reused, and the mask only corresponds to one area to be exposed, rather than setting multiple areas on the same mask, so the mask can also be reused.

[0062] The light source module 200 in the embodiment of the present invention is described in detail below.

[0063] Optionally, Figure 7 Schematic diagram of a light source module in an exposure device provided by an embodiment of the present invention. Figure 8 FIG. 1 is a schematic diagram of a light source module in an exposure device provided by another embodiment of the present invention, as shown in FIG. Figure 7 and Figure 8 As shown, the light source module 200 is provided with a main light path unit 201, a light splitting unit 202 and at least two light splitting path units 203 in sequence in the light transmission direction;

[0064] The main optical path unit 201 is provided with a laser 2011, a first switch element 2012, a shaping element 2013, a first beam expansion element 2014 and a polarization element 2015 in sequence in the light transmission direction, for emitting a main laser beam;

[0065] The beam splitting unit 202 is used to split the main laser beam;

[0066] Each splitting path unit 203 is provided with a light intensity control element 2031, a second switching element 2032, a second beam expansion element 2033 and a collimating element 2034 in sequence in the direction of light transmission, which are used to form an exposure beam from the beam after the main laser beam is split. Each splitting path unit 203 is also provided with a reflection component 2035, which is used to adjust the angle and / or position of the exposure light beam of the corresponding path incident on the area to be exposed.

[0067] The laser 2011 emits a laser beam. The first switching element 2012 can be an electrically controlled switch for controlling the laser exposure time. The shaping element 2013 can be a flat-top beam shaper for converting a Gaussian beam into a flat-top beam, thereby homogenizing the beam. The primary beam expander 2014 initially expands the beam spot by a factor of 8-12. The polarizer 2015 adjusts the polarization direction of the polarized beam spot and can be a half-wave plate. The laser beam passes through the first switching element 2012, shaping element 2013, primary beam expander 2014, and polarizer 2015 in sequence to form the main laser beam.

[0068] The light splitting unit 202 can split the main laser beam into at least two beams, wherein the light splitting unit 202 can be a polarization beam splitter.

[0069] On the optical path unit 203, the light intensity control element 2031 can be a polarizer or attenuator, used to individually adjust the light intensity of each optical path. The second switching element 2032 can be an electrically controlled switch, used to control the exposure time of a single optical path. The secondary beam expander 2033 is used to convert the collimated beam into an expanded beam. It can be a spatial filter, a beam expander lens, a convex lens and a pinhole stop, or a concave lens and a pinhole stop. The collimating element 2034 can be a convex lens, a plano-convex lens, or a biconvex lens. Its spherical profile is not restricted and can also be an aspherical profile. Its purpose is to convert the expanded beam into a parallel collimated beam, thereby forming the exposure beam.

[0070] It is understandable that in order to better match the exposure beam on each exposure path, a reflective component 2035 is provided on each light splitting path unit 203 to adjust the position and / or angle of the exposure beam incident on the mask, thereby adapting to the exposure requirements.

[0071] Optionally, continue to refer to Figure 7 There are three splitting path units 203, and the splitting unit 202 includes: a first splitting prism 2021, a second splitting prism 2022, a third splitting prism 2023, a light-blocking element 2024 and a first reflecting element 2025; the first splitting prism 2021 is used to reflect the main laser beam into a first beam L1, and is also used to transmit the main laser beam into a second beam L2; the second splitting prism 2022 is used to reflect the first beam L1 to form a third beam L3, and is also used to transmit the first beam L1 to form a fourth beam L4. The third beam L3 is the first incident beam of the first splitting path unit, and the fourth beam L4 is irradiated to the light-blocking element 2024; the third splitting prism 2023 is used to transmit the second beam L2 to form a fifth beam L5, and is also used to reflect the second beam L2 to form a sixth beam L6; the fifth beam L5 is the second incident beam of the second splitting path unit, and the first reflecting element 2025 is used to reflect the sixth beam L6 to form the third incident beam of the third splitting path unit.

[0072] There are three optical splitter units 203: one for the incoupling region, one for the transition region, and one for the outcoupling region. The exposure spots of these three optical paths are identical in size and intensity, with a spot diameter ranging from 90 to 120 mm. The first optical splitter unit corresponds to the incoupling region, the second optical splitter unit corresponds to the transition region, and the third optical splitter unit corresponds to the outcoupling region.

[0073] The first beam splitter prism 2021, the second beam splitter prism 2022, and the third beam splitter prism 2023 can all be polarization beam splitters, or beam splitters, etc. A light path can be divided into two light paths. The light blocking element 2024 is not limited to a light trap or a light block, and the first reflective element 2025 is a reflective mirror with a fixed position and a fixed angle, which is used to turn the light path. Optionally, continue to refer to Figure 8The number of the light splitting path units 203 is three, and the light splitting unit 202 includes: a fourth light splitting prism 2201, a fifth light splitting prism 2202, a second reflecting element 2203, a third reflecting element 2204, a fourth reflecting element 2206, and an optical path adjusting member 2205; the fourth light splitting prism 2201 is used to reflect the main laser beam into a first light beam L1, and to transmit the main laser beam into a second light beam L2, and the second light beam L2 is the second incident light beam of the second light splitting path unit; the fifth light splitting prism 2202 is used to reflect the first light beam L1 to form a third light beam L3, Used to transmit the first light beam L1 to form a fourth light beam L4; the third light beam L3 is the first incident light beam of the first splitting path unit, the second reflecting element 2203 is used to reflect the fourth light beam L4 to the third reflecting element 2204 to form a fifth light beam L5, the third reflecting element 2204 is used to reflect the fifth light beam L5 to form a sixth light beam L6, the optical path adjusting component 2205 is used to adjust the distance between the sixth light beam L6 and the second light beam L2 and the third light beam L3, and the fourth reflecting element 2206 is used to reflect the sixth light beam L6 to form the third incident light beam of the third splitting path unit.

[0074] Among them, there are three light splitting path units 203, namely the coupling-in area light path, the turning area light path and the out-coupling area light path. The exposure spot sizes of the three light paths are the same, and the spot diameter size is 90-120mm. The above-mentioned first light splitting path unit corresponds to the coupling-in area light path, the second light splitting path unit corresponds to the turning area light path, and the third light splitting path unit corresponds to the out-coupling area light path. The light path adjustment part 2205 is a light path climbing frame or a light path lowering frame, the purpose of which is to adjust the height of the light path to avoid overlapping with the other two light paths. The second reflecting element 2203 and the third reflecting element 2204 are symmetrical reflectors, which can adjust the direction of the fourth light beam L4 to the reverse direction such as the sixth light beam L6.

[0075] In this embodiment, the light intensity of the three optical splitter units is consistent, the light spots of the first and third optical splitter units are consistent, and the light spot of the second optical splitter unit is different from that of the other two paths. In other words, the light spot size of the coupling-in and coupling-out paths is the same, the light intensity in the turning zone is consistent with the light intensities of the other two paths, but the light spot is 0.7 to 1.4 times larger than that of the other two paths.

[0076] Optionally, continue to refer to Figure 7 and Figure 8 The reflection component 2035 includes a fifth reflection element, which is used to adjust the angle at which the exposure light beam of the corresponding path is incident on the mask to be equal to the exposure angle.

[0077] It should be noted that the fifth reflective element is a reflector. Taking the three splitter path units as an example, the first splitter path unit corresponding to the coupling-in area includes the coupling-in fifth reflective element 011, the second splitter path unit corresponding to the turning area includes the turning fifth reflective element 012, and the third splitter path unit corresponding to the out-coupling area includes the out-coupling fifth reflective element 013.

[0078] Each fifth reflective element in the optical splitter unit (input fifth reflective element 011, deflection fifth reflective element 012, and output fifth reflective element 013) is equipped with an electrically controlled rotation stage to control the rotation angle of the optical path within the xy-z plane. The goal is to ensure that the angle at which the light spot enters the reticle is equal to the exposure angle of the area to be exposed. It also features an x-axis displacement axis that provides the same displacement as the center of the light spot shifts, and a y-axis displacement axis that adjusts the movement of the center of the light spot in the y-axis.

[0079] Optionally, continue to refer to Figure 7 and Figure 8 When the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection component 2035 also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and to direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

[0080] It should be noted that the sixth reflective element is a reflector. Still taking the three light splitting path units as an example, the first light splitting path unit corresponding to the incoupling area includes the incoupling fifth reflective element 011, the second light splitting path unit corresponding to the turning area includes the turning fifth reflective element 012, and the third light splitting path unit corresponding to the outcoupling area includes the outcoupling fifth reflective element 013. Figure 7 and Figure 8 As can be seen, the exposure beam corresponding to the second optical splitter path unit propagates in the y-direction, which is pre-set to be perpendicular to the periodic grating structure of the mask. While the exposure beams in the first and third optical splitter path units also propagate in the y-direction, they are not perpendicular to the periodic grating structure of the mask. Consequently, a sixth reflective element is required. The first optical splitter path unit includes an in-coupling sixth reflective element 021, and the third optical splitter path unit includes an out-coupling sixth reflective element 022. The in-coupling sixth reflective element 021 is fixed relative to the in-coupling fifth reflective element 011, while the out-coupling sixth reflective element 022 is fixed relative to the out-coupling fifth reflective element 013.

[0081] The sixth reflective element must be equipped with electrically controlled x-axis and y-axis displacements, as well as an electrically controlled rotation stage. The x-axis movement of the sixth reflective element controls the x-axis displacement of the light spot. The y-axis movement of the sixth reflective element controls the y-axis displacement of the light spot. Furthermore, the sixth reflective element is used to adjust the rotation angle within the xy plane, aiming to orient the light spot perpendicular to the grating strips. The sixth reflective element is fixed to the fifth reflective element, maintaining relative stationary displacement and being parallel in the xy plane.

[0082] In this embodiment, if the transmission direction of the exposure beam in the second light splitting path unit is not the y direction, the incident angle of the exposure beam in the turning area can be made perpendicular to the periodic grating structure of the mask by rotating and translating the workpiece stage 800.

[0083] Optionally, continue to refer to Figure 7 The reflection assembly 2035 also includes a seventh reflection element and an eighth reflection element arranged in parallel. The seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element. The eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0084] The seventh and eighth reflective elements are both reflectors, forming a pair of parallel reflectors. The seventh reflective element is fixed in position and at a fixed angle, while the eighth reflective element is adjustable in position and at a fixed angle. The eighth reflective element is connected to a movable axis and can move along the x-axis. Still taking the three light splitting path units as an example, the first light splitting path unit corresponding to the incoupling region includes the incoupling seventh reflective element 031, the incoupling eighth reflective element 032, and the incoupling movable axis 041. The second light splitting path unit corresponding to the turning region includes the turning seventh reflective element 033, the turning eighth reflective element 034, and the turning movable axis 042. The third light splitting path unit corresponding to the outcoupling region includes the outcoupling seventh reflective element 035, the outcoupling eighth reflective element 036, and the outcoupling movable axis 043.

[0085] exist Figure 7 In the optical path schematic diagram shown, the eighth in-coupling reflective element 032 is configured in conjunction with the sixth in-coupling reflective element 021. The movement of the sixth in-coupling reflective element 021 in the x-axis direction is performed simultaneously with the movement of the eighth in-coupling reflective element 032 in the x-axis direction. The eighth out-coupling reflective element 036 is configured in conjunction with the sixth out-coupling reflective element 022. The movement of the sixth out-coupling reflective element 022 in the x-axis direction is performed simultaneously with the movement of the eighth out-coupling reflective element 036 in the x-axis direction.

[0086] In the turning zone, the eighth reflective element 034 also adjusts the rotation angle of the exposure beam in the turning path within the xy plane, aiming to orient the beam spot perpendicular to the grating strips. In this embodiment, the arrangement of the seventh and eighth reflective elements allows the workpiece stage 800 to remain stationary while independently adjusting the exposure beam's transmission direction and angle.

[0087] Thus, through Figure 7 and Figure 8 The setting of the central light source module can control the light intensity and exposure time of the exposure beam in each splitting path unit, and can also control the angle between the exposure beam and the xy plane and the xy-z plane, and can flexibly control the transmission direction and angle of the exposure beam.

[0088] Optionally, Figure 9 Schematic diagram of an exposure area to be exposed in an exposure device provided by an embodiment of the present invention; Figure 1 and Figure 9 The fifth reflecting element further includes a light blocking element 001 on one side adjacent to the waveguide plate 500. The light blocking element 001 is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path and is used to pass the exposure light beam of the corresponding path. The light blocking element 001 can translate in a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0089] That is, the light blocking element 001 can be configured with a movable device in the xy plane, and the movement of the light spot projected onto the workpiece stage 800 can be controlled by controlling the movement of the light blocking element 001. Figure 9 The light transmittance is 0% (outlined by the thicker black line in the figure). The outer diameter of light blocking element 001 is slightly larger than the diameter of the exposure beam spot, while the inner diameter of light blocking element 001 is slightly smaller than the outer diameter of the light-blocking area of ​​reticle 400. This prevents the exposure beam from irradiating other areas, ensuring that the exposure beam reaches the light-transmitting area A of baffle 300 and the periodic grating mask structure of reticle 400. Furthermore, after the light spot passes through light blocking element 001, baffle 300, and reticle 400, the exposed pattern of waveguide plate 500 is the target pattern, eliminating any stray light exposure pattern.

[0090] Optionally, continue to refer to Figure 1 The exposure device further includes a workpiece stage 800, which is used to carry the waveguide plate 500 to be exposed, and the workpiece stage 800 can translate and rotate.

[0091] In this embodiment, the exposure device 100 further includes a light absorbing element 600 , a refractive index matching liquid spraying element 700 , a workpiece stage 800 and an alignment camera 900 , wherein the workpiece stage 800 further includes a supporting platform 801 , a connecting component 802 and a supporting base 803 .

[0092] The light-absorbing element 600 is located between the waveguide plate 500 to be exposed and the workpiece stage 800. It absorbs the exposure beam that passes through the waveguide plate 500 to prevent it from being reflected back onto the waveguide plate 500 and affecting the exposure effect. The material of the light-absorbing element 600 has an absorptivity greater than 95% within the laser wavelength range, and the size of the light-absorbing element 600 is comparable to that of the waveguide plate 500. Alternatively, a prismatic irregular glass device can be used to direct light from the bottom surface of the waveguide plate 500 to avoid reflection back onto the waveguide plate 500 and affecting the exposure.

[0093] The refractive index matching liquid spraying element 700 comprises a liquid spray nozzle and a movable axis. The refractive index matching liquid spraying element 700 is applied to the upper surface of the waveguide 500 to be exposed. Reinforced refractive index matching liquid is applied after the reticle 400 is replaced. The refractive index of the refractive index matching liquid matches the refractive index of the waveguide 500 and reticle 400 to be exposed, thus facilitating light transmission. The movable range of the fixed axis of the liquid spray nozzle is within the waveguide 500 to be exposed. The displacement target for a single exposure is the center of the reticle 400. The liquid output per single exposure is sufficient to fully cover the contact area between the reticle 400 and the waveguide 500 to be exposed. The liquid spraying method is not limited and can be either piezoelectric or pneumatic.

[0094] The alignment camera 900 is used to capture the alignment marks on the reticle 400, enabling alignment between the reticle 400 and the waveguide 500 to be exposed. It includes a set of lenses for alignment. It is movable. Once alignment is complete, the alignment camera 900 can be moved outside the operating platform to avoid affecting exposure. The movable area of ​​the alignment camera 900's movable arm is the outer ring area of ​​the reticle 400. Alignment marks are engraved on the inner edge of the reticle 400. The alignment camera 900 can capture these alignment marks and align them with the alignment marks on the waveguide 500 to achieve alignment between the reticle 400 and the waveguide 500 to be exposed.

[0095] In addition, the workpiece stage 800 is used to displace the light absorbing element 600 and the waveguide plate 500 to be exposed. The positioning block 03 ( Figure 10 Schematic diagram of three exposure areas in the exposure device provided by the embodiment of the present invention. Figure 10(as shown), used to position the waveguide 500 to be exposed. The connecting component 802 can be displaced along the x-axis, y-axis, and θ-angle. The workpiece stage 800 needs to rotate the waveguide 500 to be exposed for exposure, and the rotation angle range is [0°, 360°]. Therefore, the displacement range of the workpiece stage 800 is the circumcircle of the waveguide 500 to be exposed. During exposure, the area B to be exposed needs to be moved to the center of the light spot. With the light spot center as the reference, the center of the fixed workpiece stage 800 is coincident with the light spot center. The ±x and ±y displacement ranges of the workpiece stage 800 need to be greater than the radius of the circumcircle of the waveguide 500 to be exposed - the light spot radius.

[0096] Among them, continue to refer to Figure 1 and Figure 10 The edges of the reticle 400 are raised to prevent the refractive index matching fluid from seeping onto the top surface of the reticle 400 when the waveguide plate 500 to be exposed moves, thereby destroying the periodic structure and causing exposure failure. Two lugs, or support posts 02, are protruded from the raised portion. These support posts 02 connect to the support rods 01 and are used to move the reticle 400.

[0097] like Figure 10 As shown, there are four movable operating components above the workpiece stage 800, namely the alignment camera 900, the mask part of the coupling-in area B1, the mask part of the turning area B2, and the mask part of the coupling-out area B3. "+" alignment marks are set on each mask. The alignment marks are distributed on the surface of the waveguide plate 500 to be exposed and the surface of the mask 400. The movable area of ​​the alignment camera 900 is the entire waveguide plate 500 to be exposed. A group of alignment marks are distributed on the outer ring of the mask. The alignment camera 900 aligns with the alignment mark position. Only one alignment camera 900 is drawn in this schematic diagram. Two or three alignment cameras 900 can be set without affecting the movement of other modules. Since the three grating areas are exposed simultaneously, the workpiece stage 800 is equipped with three mask movement modules (including support columns 02 and support rods 01). During a single exposure, the mask 400 needs to be moved to the corresponding position. The turning area B2 and the outcoupling area B3 are relatively large and require multiple exposures. The pattern of each exposure is different, so the baffle 300 needs to be replaced to complete the splicing exposure. Figure 11 Schematic diagram of a bracket unit in an exposure device provided by an embodiment of the present invention, such as Figure 11 The figure shows a device for automatically replacing baffles, namely a baffle switching disk 002. It has an outer contour 003 and a hollow inner contour 004. The hollow inner contour 004 forms a hollow receiving slot for accommodating baffles 300. The number of baffles 300 varies, depending on the number of exposures in the exposure area. After each exposure, the automatic baffle replacement device rotates an angle to replace the next baffle 300.

[0098] In another embodiment, optionally, Figure 12 Schematic diagram of a bracket unit in an exposure device provided by another embodiment of the present invention, such as Figure 12 As shown, the exposure device 100 further includes:

[0099] Support unit 002, which includes a support shaft 007 and a plurality of support rods 006, one end of each support rod 006 being connected to the support shaft 007 and the other end being connected to a connector for connecting a baffle and / or a mask;

[0100] Alternatively, the bracket unit 002 further includes a plurality of support bases 005, with one end of a support rod 006 connected to a support shaft 007 and the other end connected to the support base 005. The support rod 006 is capable of rotating about the support shaft 007, and the support base 005 is capable of rotating. The support base 005 has a hollow receiving slot capable of accommodating the baffle 300. At least two support bases 005 can simultaneously support corresponding baffles 300 in corresponding areas to be exposed. Alternatively, the exposure apparatus 100 further includes a baffle switching disk having a hollow receiving slot arranged in an annular pattern therein.

[0101] Among them, each support rod 006 can rotate around the support axis 007 at the same time, or can rotate around the support axis 007 without interfering with each other; the bracket unit 002 of this embodiment is more flexible, and the angle between adjacent support seats 005 is not fixed and can be flexibly adjusted.

[0102] in, Figure 11 The bracket unit shown and Figure 12 The bracket units shown can be used interchangeably or in combination according to actual scenarios, so that the exposure device can expose two or more areas to be exposed simultaneously. Figure 11 and Figure 12 The bracket units shown can be arranged in multiple layers. Figure 11 and Figure 12 The bracket unit shown can also be used to carry masks and switch masks.

[0103] In another embodiment, Figure 12 The bracket unit shown may also be provided without the support base 005 , and directly connected to the mask 400 / baffle 300 via the support rod 006 , with a connector, such as a buckle, provided at the end of the support rod 006 that can connect to the mask 400 / baffle 300 .

[0104] The following is a specific embodiment to introduce the exposure process of a waveguide plate using the exposure device proposed in the embodiment of the present utility model.

[0105] With 15-inch HUD waveguide (such as Figure 2 As shown in the exposure example, use a 4-inch mask (as Figure 6 shown), where Figure 6 Figure (a) corresponds to the mask of the coupling area B1. Figure 6 Figure (b) corresponds to the mask of the turning area B2. Figure 6 Figure (c) corresponds to the mask of the outcoupling area B3. Each mask is provided with a "+" alignment mark. The alignment marks on the waveguide plate 500 to be exposed need to avoid the grating area, otherwise it will affect the formation of the grating during the exposure stage; at the same time, the alignment marks should be reduced to reduce the impact of the light transmission inside the waveguide glass, thereby affecting the imaging effect of the optical waveguide. The placement position of the waveguide plate 500 to be exposed on the workpiece stage 800 is as shown in the figure. Figure 13 As shown, the waveguide plate 500 to be exposed has no rotation angle. Figure 13 The figure shows the stitching method for the in-coupling region B1, the inflection region B2, and the out-coupling region B3. The in-coupling region B1 is typically small and does not require stitching exposure. The inflection region B2 and the out-coupling region B3 have larger grating areas and require multiple stitching exposures. The principle of stitching is to minimize the number of exposures. Figure 6 It is a schematic diagram of the mask, which is divided into three masks according to the three grating areas. The most basic design of a pair of alignment marks "+" on the mask 400 is to be set on the mask 400, on the outer ring of the mask 400, and symmetrical with the center of the mask 400. However, if the alignment marks of the mask 400 are all based on the basic design, the alignment marks will appear in the grating area, so the alignment marks that appear in the grating area need to be adjusted. The adjustment principle is to use the center of the circle as the rotation point, rotate to the non-grating area, and maintain a certain distance between a group of alignment marks to ensure alignment accuracy. Figure 6 As shown, different exposure areas may share the same mask alignment mark, or different exposure areas may have alignment marks designated by different masks. Figure 3 is a schematic diagram of the baffle in the coupling area, Figure 5 This is a schematic diagram of the baffle in the turning area. Figure 4 This is a schematic diagram of the outcoupling area baffle. The gray area is the opaque area, and the white area is the translucent area.

[0106] Figure 14The exposure sequence for the waveguide 500 to be exposed is shown. The number of exposures for the waveguide 500 to be exposed is equal to the maximum number of exposures for a single grating region. In this example, the turning region B2 of the waveguide 500 to be exposed requires the largest number of exposures, six exposures. Therefore, the waveguide 500 to be exposed requires six exposures. The exposure principle is based on the exposure sequence for the turning region B2. Each time a region of the turning region B2 is exposed, one of the coupling-in region B1 and the coupling-out region B3 can be simultaneously exposed. The two reticles 400 must not overlap. In this example, overlap does not occur. However, if overlap between the two reticles 400 is unavoidable during exposure, the reticles 400 must be cut to remove the overlapping portion. If the cut portion contains an alignment mark, a new alignment mark must be added to the uncut portion, but not in the grating region.

[0107] Before exposure, make sure that the three optical paths are adjusted to the correct propagation angle and exposure incident angle. Add an appropriate amount of refractive index matching liquid on the waveguide plate, and stick all three masks to the waveguide plate to be exposed 500. Assume that the exposure area of ​​the coupling area B1 is 1-1 (the baffle corresponds to Figure 3 The exposure areas of the turning area B2 are 2-1, 2-2, 2-3, 2-4, 2-5, and 2-6 (the baffles correspond to Figure 5 abcdef), the exposure areas of the outcoupling area B3 are 3-1, 3-2, 3-3, and 3-4 (the baffles correspond to Figure 4 Chinese ghij).

[0108] Among them, such as Figure 14 As shown, the first exposure area 1201 of exposure sequence 1 is exposure area 2-1 in turning area B2, and the second exposure area 1202 is exposure area 3-1 of coupling-out area B3; the first exposure area 1203 of exposure sequence 2 is exposure area 2-3 in turning area B2, and the second exposure area 1204 is exposure area 3-3 of coupling-out area B3; the first exposure area 1205 of exposure sequence 3 is exposure area 2-2 in turning area B2, and the second exposure area 1206 is exposure area 3-2 of coupling-out area B3; the first exposure area 1207 of exposure sequence 4 is exposure area 2-4 in turning area B2, and the second exposure area 1208 is exposure area 3-4 of coupling-out area B3; the first exposure area 1209 of exposure sequence 5 is exposure area 1-1 of coupling-in area B1, and the second exposure area 1210 is exposure area 2-5 of turning area B2; and the exposure area 1211 of exposure sequence 6 is exposure area 2-6 in turning area B2.

[0109] During exposure sequence 1, control the reticle fixing arm (support rod 01) to move reticle 400 to the corresponding position. The center of the light spot in the inflection zone B2 and the center of the light spot in the outcoupling zone B3 need to be moved to the center of reticle 400. Alignment camera 900 is turned on and the two areas are aligned in sequence. After alignment is complete, the inflection zone optical path switch and the outcoupling zone optical path switch are turned on, and exposure begins. After exposure is complete, the optical path switch is turned off. Continue with exposure sequence 2, replace baffle 300, control the reticle fixing arm to move reticle 400 to the corresponding position, move the center of the light spot in the inflection zone B2 and the center of the light spot in the outcoupling zone B3 to the center of reticle 400, turn on alignment camera 900, and align the two areas in sequence. After alignment is complete, the inflection zone optical path switch and the outcoupling zone optical path switch are turned on, and exposure begins. After exposure is complete, the optical path switch is turned off. According to the above operations, the exposure of exposure sequence 3, exposure sequence 4, exposure sequence 5, and exposure sequence 6 are completed, and then the exposure of the entire waveguide plate 500 is completed.

[0110] Therefore, the exposure equipment proposed in the embodiment of the present invention solves the shortcoming that HUD optical waveguide devices are difficult to manufacture. The exposure equipment is designed with a variety of movable worktables, configured with software operations, to achieve fully automated operation and mass production. The equipment adopts a top-projection exposure method, the waveguide sheet is large in size, the mask is small in size, the small size is on top, and the large size is on the bottom, which is easier to operate. In addition, the platform for placing the waveguide sheet is specially treated to make the exposure effect equivalent to the bottom-projection exposure method. The equipment is highly flexible and can be used to expose and prepare a variety of waveguide sheets. The exposure equipment has the characteristics of high-precision alignment, and the prepared optical waveguide devices have excellent imaging effects. The design of three optical paths reduces the waveguide exposure time and improves preparation efficiency.

[0111] In summary, the technical solution of the embodiments of the present invention simultaneously exposes at least two areas to be exposed on a waveguide sheet by providing a light source module for forming at least two exposure beams, and sequentially positioning a baffle and a mask in the direction of transmission of any exposure beam. The baffle is provided with a light-transmitting region, and the mask is provided with a periodic grating mask structure. The light-transmitting region is configured to transmit the corresponding exposure beam, allowing the corresponding exposure beam to illuminate the mask and transfer the periodic grating mask structure to the waveguide sheet. Furthermore, along the direction of transmission of any exposure beam, the projection of the light-transmitting region of the baffle onto the plane of the waveguide sheet covers at least a portion of the corresponding area to be exposed, and the projection of the mask onto the plane of the waveguide sheet covers the corresponding area to be exposed. Thus, by providing multiple exposure paths simultaneously, multiple areas to be exposed on the waveguide sheet can be exposed simultaneously, thereby improving exposure efficiency. Furthermore, each area to be exposed can correspond to multiple baffles and one mask, increasing the utilization rate of the baffles and masks and reducing the production costs of the baffles and masks.

[0112] It should be understood that the various forms of the processes shown above can be used to reorder, add, or delete steps. For example, the steps described in this utility model can be performed in parallel, sequentially, or in a different order, as long as the desired results of the technical solution of this utility model can be achieved. This is not limited herein.

[0113] The above specific embodiments do not limit the scope of protection of this utility model. Those skilled in the art will appreciate that various modifications, combinations, sub-combinations, and substitutions may be made based on design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model shall be included within the scope of protection of this utility model.

Claims

1. An exposure device, characterized in that: include: A light source module, configured to form at least two exposure light beams; baffles and masks are sequentially arranged along the transmission direction of any exposure beam, wherein the baffles are provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, wherein the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path illuminates the mask and transfers the periodic grating mask structure to the waveguide to be exposed; In which, the waveguide plate has at least two areas to be exposed. Along the transmission direction of any exposure light beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide plate is located covers at least a part of the area corresponding to the area to be exposed, and the projection contour of the mask on the plane where the waveguide plate is located covers the area corresponding to the area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

2. The exposure device according to claim 1, wherein The light source module is provided with a main light path unit, a light splitting unit and at least two light splitting path units in sequence in the light transmission direction; The main optical path unit is provided with a laser, a first switch element, a shaping element, a first beam expansion element and a polarization element in sequence in the light transmission direction, for emitting a main laser beam; The beam splitting unit is used to split the main laser beam; Each of the splitting path units is provided with a light intensity control element, a second switching element, a second beam expansion element and a collimating element in sequence in the direction of light transmission, which is used to form an exposure beam from the beam after splitting the main laser beam. Each of the splitting path units is also provided with a reflection component, which is used to adjust the angle and / or position of the exposure beam of the corresponding path incident on the area to be exposed.

3. The exposure device according to claim 2, wherein The number of the light splitting path units is three, and the light splitting units include: a first light splitting prism, a second light splitting prism, a third light splitting prism, a light blocking element and a first reflecting element; The first beam splitter prism is used to split the main laser beam into a first beam and a second beam; The second beam splitter prism is used to form the first light beam into a third light beam and a fourth light beam, the third light beam is the first incident light beam of the first light splitting path unit, and the fourth light beam is irradiated to the light blocking element; The third beam splitter prism is used to form the second light beam into a fifth light beam and a sixth light beam, and the fifth light beam is the second incident light beam of the second light splitting path unit; The first reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

4. The exposure device according to claim 2, wherein The number of the light splitting path units is three, and the light splitting units include: a fourth light splitting prism, a fifth light splitting prism, a second reflecting element, a third reflecting element, a fourth reflecting element and an optical path adjusting member; The fourth beam splitter prism is used to split the main laser beam into a first beam and a second beam, wherein the second beam is a second incident beam of the second beam splitting path unit; The fifth beam splitter prism is used to form the first light beam into a third light beam and a fourth light beam, and the third light beam is the first incident light beam of the first light splitting path unit; The second reflecting element is used to reflect the fourth light beam to the third reflecting element to form a fifth light beam, the third reflecting element is used to reflect the fifth light beam to form a sixth light beam, the optical path adjusting component is used to adjust the distance between the sixth light beam and the second light beam and the third light beam, and the fourth reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

5. The exposure apparatus according to claim 2, wherein The reflective assembly includes a fifth reflective element for adjusting the angle at which the exposure light beam of the corresponding path is incident on the mask.

6. The exposure apparatus according to claim 5, wherein When the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection component also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and to direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

7. The exposure apparatus according to claim 5, wherein The reflection assembly also includes a seventh reflection element and an eighth reflection element arranged in parallel, the seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element, the eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

8. The exposure apparatus according to claim 5, wherein The fifth reflecting element also includes a light blocking element on a side adjacent to the waveguide plate. The light blocking element is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path and is used to pass the exposure light beam of the corresponding path. The light blocking element can be translated in a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

9. The exposure apparatus according to claim 1, wherein Also includes: A bracket unit, the bracket unit comprising a support shaft and a plurality of support rods, one end of each support rod being connected to the support shaft and the other end being connected to a connector for connecting a baffle and / or a mask; Alternatively, the system further comprises a plurality of support bases, wherein one end of the support rod is connected to the support shaft, and the other end is connected to the support base; the support rod is capable of rotating around the support shaft, and the support base is capable of rotating on its own, and the support base has a hollow receiving groove capable of accommodating the baffle, and at least two of the support bases can simultaneously support corresponding baffles in corresponding areas to be exposed; Alternatively, it further comprises a baffle switching disc, on which a hollow receiving groove is arranged in an annular manner.

10. The exposure apparatus according to claim 1, wherein Also includes: A workpiece stage is used to carry the waveguide plate, and the workpiece stage can translate and rotate.

11. The exposure apparatus according to claim 1, wherein Also includes: The refractive index matching liquid spraying element includes a liquid spraying nozzle and a moving shaft. The liquid spraying nozzle is used to spray the refractive index matching liquid to the waveguide plate. The moving shaft is connected to a driving device for moving the liquid spraying nozzle.

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