Quartz polishing device
By adding an elastic ring buffer to the quartz polishing equipment, the problem of collision caused by the gap between the quartz product and the tooling is solved, the product quality and polishing effect are improved, and the service life of the polishing pad is extended.
Patent Information
- Application Number
- CN202422827779.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-19
- Publication Date
- 2025-10-03
- Estimated Expiration
- 2034-11-19
AI Technical Summary
During the polishing process of existing quartz polishing equipment, there is a gap between the quartz product and the tooling, which causes friction and collision between the outer diameter of the product and the tooling, resulting in scratches, cracks, and chipping.
An elastic ring is added as a buffer between the quartz product and the polishing planetary wheel to reduce the collision of the quartz product's circumferential outer diameter through the elastic ring. The elastic ring made of PU material is eccentrically set with the through hole to ensure full contact between the quartz product and the polishing pad and reduce friction.
It improves the quality of quartz products, reduces damage caused by bumps and collisions, improves the flatness and polishing effect of products, and extends the service life of polishing pads.
Smart Images
Figure CN223406703U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of polishing equipment, in particular to a quartz polishing device. Background Art
[0002] During the production process, quartz products require surface polishing to achieve a transparent finish (similar to an observation window) on both the top and bottom surfaces. This polishing is typically performed mechanically or flame polishing. Mechanical polishing offers significant advantages over flame polishing in terms of precision, applicability, environmental friendliness, operational complexity, and maintenance costs. Therefore, mechanical polishing is currently the predominant method used in quartz production.
[0003] Existing mechanical polishing of quartz is performed by workers using high-precision polishing machines. However, due to certain defects in current polishing equipment and operations, gaps can form between the quartz product and the tooling during the polishing process. This can cause friction and collisions between the product's outer diameter and the tooling, resulting in scratches, cracks, and chipping on the product's outer diameter, as well as fixture marks that affect the product's appearance. Utility Model Content
[0004] In response to the technical problems of defects in existing quartz polishing equipment, the utility model provides a quartz polishing device, which adds an elastic ring buffer between the quartz product and the polishing planetary wheel, reduces the collision of the circumferential outer diameter of the quartz product, and thus improves the quality of the quartz product.
[0005] The technical solution provided by the utility model is: a quartz polishing device, including a first polishing seat, a second polishing seat, a driving wheel, a planetary wheel and an elastic ring; the second polishing seat is located on one side of the first polishing seat, the first polishing seat is fixedly provided with a first polishing pad, the second polishing seat is fixedly provided with a second polishing pad, the driving wheel is movably provided in the middle of the first polishing seat, a plurality of planetary wheels surround the driving wheel, the driving wheel is engaged with the planetary wheels, and the planetary wheels are engaged with the edge of the first polishing seat; a through hole is provided on the planetary wheel, the outer wall of the elastic ring is used to abut against the inner wall of the through hole, and the inner wall of the elastic ring is used to be sleeved on the outer side of the quartz product.
[0006] Optionally, the elastic ring is made of PU material.
[0007] Optionally, the through hole is eccentrically arranged on the planetary wheel.
[0008] Optionally, grooves are provided on both the first polishing pad and the second polishing pad.
[0009] Optionally, the thickness of the elastic ring is greater than or equal to the depth of the through hole.
[0010] Optionally, the thickness of the elastic ring is smaller than the thickness of the quartz product.
[0011] Optionally, it further includes a lifting drive unit and a rotation drive unit, the output end of the lifting drive unit is transmission-connected to the second polishing seat, and the output end of the rotation drive unit is transmission-connected to the driving wheel.
[0012] Optionally, the lifting drive unit is an elevator, the rotation drive unit is a motor, the telescopic output end of the elevator is fixedly connected to the second polishing seat, and the output end of the motor passes through the first polishing seat and is fixedly connected to the driving wheel.
[0013] Beneficial effects
[0014] The technical solution provided by the present invention has the following beneficial effects compared with the existing technology: in response to the technical problems of defects in existing quartz polishing equipment, the present invention adds an elastic ring buffer between the quartz product and the polishing planetary wheel, thereby reducing the collision of the circumferential outer diameter of the quartz product and improving the quality of the quartz product. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] Figure 1 This is one of the structural schematic diagrams of a quartz polishing device proposed in an embodiment of the present utility model.
[0016] Figure 2 This is a second structural diagram of a quartz polishing device proposed in an embodiment of the present utility model.
[0017] Figure 3 This is a schematic diagram of the assembly of the planetary wheel and the elastic ring proposed in an embodiment of the present utility model. DETAILED DESCRIPTION
[0018] In order to further understand the content of the present invention, the present invention is described in detail with reference to the accompanying drawings and embodiments.
[0019] The present application will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific examples described herein are intended solely to illustrate the relevant utility model and are not intended to limit the utility model. It should also be noted that, for ease of description, only the relevant portions of the utility model are shown in the accompanying drawings. Terms such as "first," "second," and so on, used in the present utility model are provided for the convenience of describing the technical solution of the present utility model and do not have a specific limiting effect. They are general references and do not constitute a limitation on the technical solution of the present utility model. It should be noted that, unless conflicting, the embodiments and features within the embodiments of the present application may be combined with one another. In the description of the present utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating positions or locations, are based on the positions or locations shown in the accompanying drawings and are intended solely to facilitate the description of the present utility model and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. Unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be a communication between the internal parts of two components. For those of ordinary skill in the art, the specific meanings of the above terms in this utility model can be understood according to the specific circumstances. Multiple technical solutions in the same embodiment, as well as multiple technical solutions in different embodiments, can be arranged and combined to form new technical solutions that do not contain contradictions or conflicts, and all of these are within the scope of protection claimed by this utility model.
[0020] Combined with attachment Figure 1-3 This embodiment provides a quartz polishing device, comprising a first polishing seat 1, a second polishing seat 2, a drive wheel 3, a planetary wheel 4, and an elastic ring 5. The second polishing seat 2 is located on one side of the first polishing seat 1. A first polishing pad 6 is fixedly mounted on the first polishing seat 1, and a second polishing pad 7 is fixedly mounted on the second polishing seat 2. The drive wheel 3 is movably mounted in the middle of the first polishing seat 1. A plurality of planetary wheels 4 surround the drive wheel 3. The drive wheel 3 meshes with the planetary wheels 4, which in turn mesh with the edges of the first polishing seat 1. The planetary wheels 4 are provided with a through hole 8. The outer wall of the elastic ring 5 is configured to abut against the inner wall of the through hole 8, and the inner wall of the elastic ring 5 is configured to be sleeved onto the outer side of the quartz product.
[0021] The quartz polishing device of this embodiment has the following working principle: the elastic ring 5 is sleeved on the outside of the quartz product, and the quartz product with the elastic ring 5 is then placed in the through groove of the planetary wheel 4, so that one side of the quartz product contacts the first polishing pad 6 on the first polishing seat 1, and then the second polishing seat 2 is moved toward the first polishing pad 6 until the other side of the quartz product contacts the second polishing pad 7 on the second polishing seat 2. Then, the polishing liquid is sprayed and the driving wheel 3 is started. The driving wheel 3 will drive the planetary wheel 4 and the quartz product to move between the first polishing seat 1 and the second polishing seat 2. With the continuous friction between the quartz product and the first polishing pad 6 and the second polishing pad 7, the mechanical polishing of the quartz product can be achieved.
[0022] Obviously, since there is a buffer between the quartz product and the planetary wheel 4, the collision of the outer diameter of the quartz product is reduced, thereby improving the quality of the quartz product.
[0023] In this embodiment, the elastic ring 5 is preferably made of polyurethane (PU). The inner diameter of the elastic ring 5 can be slightly smaller than the outer diameter of the quartz product. Utilizing the excellent flexibility of polyurethane, an interference fit can be achieved between the quartz product and the elastic ring 5, ensuring no gap between them. This prevents the quartz product and the elastic ring 5 from falling off during polishing. Furthermore, the excellent flexibility of polyurethane further ensures a cushioning effect between the quartz product and the planetary wheel 4, thereby further improving the quality of the quartz product.
[0024] In a preferred embodiment, the through hole 8 is eccentrically arranged on the planetary wheel 4. The eccentric arrangement of the through hole 8 enables both sides of the quartz product to fully contact and rub with various areas of the first polishing pad 6 and the second polishing pad 7, so that the first polishing pad 6 and the second polishing pad 7 are evenly worn, which not only ensures the flatness of the quartz product, but also extends the service life of the first polishing pad 6 and the second polishing pad 7.
[0025] In another preferred embodiment, grooves 9 are provided on both the first polishing pad 6 and the second polishing pad 7. As polishing progresses, debris particles are continuously generated. The grooves 9 provided on the first polishing pad 6 and the second polishing pad 7 are used to accommodate this debris, preventing it from affecting the polishing effect. Furthermore, the grooves 9 are in contact with the outside atmosphere, preventing the formation of negative pressure between the smooth surface of the quartz product and the first polishing pad 6 or the second polishing pad 7, which could affect the movement of the quartz product during polishing and prevent the quartz product from being difficult to handle after polishing.
[0026] Furthermore, the thickness of the elastic ring 5 is preferably set to be greater than or equal to the depth of the through hole 8, in order to ensure that the elastic ring 5 can fully contact the inner wall of the through hole 8 and completely avoid contact between the outer diameter of the quartz product and the inner wall of the through hole 8.
[0027] In addition, the thickness of the elastic ring 5 is preferably designed to be smaller than the thickness of the quartz product, in order to ensure that both sides of the quartz product can fully contact the first polishing pad 6 and the second polishing pad 7 without being affected by the elastic ring 5 .
[0028] In combination with the above-mentioned embodiment, it can be seen that the polishing work requires driving the second polishing seat 2 to approach the first polishing seat 1, and requires starting the driving wheel 3. Therefore, preferably, it also includes a lifting drive unit and a rotation drive unit, the output end of the lifting drive unit is transmission-connected to the second polishing seat 2, and the output end of the rotation drive unit is transmission-connected to the driving wheel 3. Furthermore, the lifting drive unit is an elevator, and the rotation drive unit is a motor. The telescopic output end of the elevator is fixedly connected to the second polishing seat 2, and the output end of the motor passes through the first polishing seat 1 and is fixedly connected to the driving wheel 3. That is, the second polishing seat 2 can be driven to approach the first polishing seat 1 by the elevator, and the driving wheel 3 can be driven to rotate by the motor.
[0029] The above schematically describes the present invention and its embodiments, which are not restrictive. The accompanying drawings only illustrate one embodiment of the present invention, and the actual structure is not limited thereto. Therefore, if a person skilled in the art is inspired by the above and, without departing from the inventive purpose of the present invention, designs structures and embodiments similar to the technical solution without creatively designing them, they shall fall within the scope of protection of the present invention.
Claims
1. A quartz polishing device, characterized in that: It comprises a first polishing seat (1), a second polishing seat (2), a driving wheel (3), a planetary wheel (4) and an elastic ring (5); The second polishing seat (2) is located on one side of the first polishing seat (1), a first polishing pad (6) is fixedly provided on the first polishing seat (1), a second polishing pad (7) is fixedly provided on the second polishing seat (2), the driving wheel (3) is movably provided in the middle of the first polishing seat (1), a plurality of planetary wheels (4) surround the driving wheel (3), the driving wheel (3) is meshed with the planetary wheels (4), and the planetary wheels (4) are meshed with the edge of the first polishing seat (1); The planetary wheel (4) is provided with a through hole (8), the outer wall of the elastic ring (5) is used to abut against the inner wall of the through hole (8), and the inner wall of the elastic ring (5) is used to be sleeved on the outer side of the quartz product.
2. A quartz polishing device according to claim 1, characterized in that: The elastic ring (5) is made of PU material.
3. A quartz polishing device according to claim 1, characterized in that: The through hole (8) is eccentrically arranged on the planetary wheel (4).
4. A quartz polishing device according to claim 1, characterized in that: Grooves (9) are provided on both the first polishing pad (6) and the second polishing pad (7).
5. A quartz polishing device according to claim 1, characterized in that: The thickness of the elastic ring (5) is greater than or equal to the depth of the through hole (8).
6. A quartz polishing device according to claim 1 or 5, characterized in that: The thickness of the elastic ring (5) is smaller than the thickness of the quartz product.
7. A quartz polishing device according to claim 1, characterized in that: It also includes a lifting drive unit and a rotation drive unit, wherein the output end of the lifting drive unit is transmission-connected to the second polishing seat (2), and the output end of the rotation drive unit is transmission-connected to the driving wheel (3).
8. A quartz polishing device according to claim 7, characterized in that: The lifting drive unit is an elevator, the rotating drive unit is a motor, the telescopic output end of the elevator is fixedly connected to the second polishing seat (2), and the output end of the motor passes through the first polishing seat (1) and is fixedly connected to the driving wheel (3).