System for monitoring and controlling chemical processing of substrates

Abstract

The utility model relates to a system for monitoring and controlling chemical treatment of a substrate, which comprises a shell provided with at least one protective door at the front side; sealing the module door; a wet component cabinet configured between the at least one protective door and the sealing module door; a plurality of analysis modules each having a plurality of workstations and devices and configured for different types of analysis, the analysis modules being mounted on the sealed module door and components of the plurality of workstations and devices being located in the wet component cabinet; an electrical cabinet configured behind the sealing module door, the electrical cabinet configured to include electrical components for controlling operation of the workstation and equipment; one or more chemical cabinets for storing and providing chemicals required for analysis performed by the workstation; and a user interface for interfacing with one or more computing devices through which analytics can be monitored and controlled. The system is modular, flexible, and scalable.

Description

TECHNICAL FIELD

[0001] The present utility model relates to a system for monitoring and controlling chemical processing of substrates, in particular to a system for controlling the manufacturing of microelectronic substrates. In particular, the present utility model describes a system for monitoring and controlling substrate processing using electrolytic, chemical and electrochemical techniques, which is particularly suitable for application in the semiconductor industry for analyzing or controlling the concentration of process bath ingredients. BACKGROUND

[0002] Microelectronic devices are manufactured by applying and removing layers of material on a substrate, such as a silicon wafer, to generate a large number of individual devices. Thus, layers composed of photoresist, conductive material and dielectric material are, for example, placed, structured, etched, planarized, etc. to form features in and / or on the substrate. The features are provided for forming integrated circuits (ICs), microelectromechanical systems (MEMS) and other microelectronic structures.

[0003] Wet chemical processes are commonly applied for forming features on microelectronic substrates. Wet chemical processes are typically performed in a wet chemical processing tool having a plurality of process chambers for cleaning, etching, electrochemical deposition and rinsing in combination. Electrochemical deposition processes include electrolytic deposition by applying an electric current to the substrate and galvanic-free deposition by not supplying an external electric current to the substrate.

[0004] Schemes are commonly applied that include monitoring the chemical composition or chemical activity of an electrolyte used in one of the above-mentioned processes. This is done to control the concentration of the chemical composition of the electrolyte so that uniform processing of a plurality of substrates is ensured during the entire lifetime of the electrolyte. Typically, an analysis technique has to be developed specifically for each of the respective combinations and concentrations of components that are present in a particular electrolyte. Methods for monitoring the components of an electrolyte involve electroanalytical methods. A range of known methods for monitoring the components of an electrolyte involve electroanalytical methods. Titration, also known as titrimetry and volumetry, is an absolutely very common method of quantitative chemical analysis by means of which the concentration of an identified / known substance can be determined with very good accuracy. In electrochemical analysis, the potential / current is used to reduce / plating and oxidize / strip metal components of / on a rotating disk electrode (RDE). Absorption spectrophotometry makes use of the different optical physical properties of different chemical substances. By transmitting light through a sample and analyzing the intensity transmitted over a wide range of wavelengths, the concentration of a particular substance can be determined. High-performance liquid chromatography (HPLC) works by separating and verifying individual bath components. High-performance liquid chromatography analyzes organic additives, complexing agents, degradation products and stored photoresist.

[0005] Traditionally, a separate electroanalytical method is used to represent the concentration of each known component in the electrolyte. Designing analytical techniques or methods for each component of the electrolyte using electroanalytical techniques, high performance liquid chromatography techniques, titration techniques, near infrared spectroscopy techniques, etc. can be time-consuming and expensive. In addition, some commercial additives have two or more components that may not be separated without prior knowledge of the chemical substances. When the corresponding concentrations of the chemical components of the electrolyte change and when the electrolyte ages, monitoring the various chemical components of the electrolyte can be very complicated due to the various interactions that may occur between the components. Aging of the electrolyte can cause degradation of one or more of its components through oxidation, reduction or catalytic activity, or involve interactions with hardware or substrates or other impurities that come into contact with the electrolyte during its service life.

[0006] Therefore, there is a need for a device or system that can monitor and control electrochemical technology in a clean room environment and during high-volume production (HVM) within a single structure. In addition, the device or system should be adaptable to different electrochemical technologies. The utility model described herein meets the above needs. Utility Model Content

[0007] In one aspect, the present invention discloses a system for monitoring and controlling the processing of microelectronic substrates. The system is modular, flexible, and scalable, and is configured so that it can be connected with similar systems to form a larger system. The system provides full access to data collected and generated by measurement and analysis methods. This enables better identification, troubleshooting, and process improvement.

[0008] The present invention proposes a system for monitoring and controlling chemical processing of substrates, which includes a shell having at least one protective door at the front side. The system for monitoring and controlling chemical processing of substrates also includes: a sealed module door; a wet part cabinet, which is constructed between at least one of the protective doors and the sealed module door; a plurality of analysis modules, each of which has a plurality of workstations and equipment and is configured for different types of analysis, the analysis modules are installed on the sealed module door, and components of a plurality of the workstations and the equipment are located in the wet part cabinet; an electrical cabinet, which is configured behind the sealed module door and is configured to include electrical components for controlling the operation of the workstations and the equipment; one or more chemical cabinets, which are used to store and provide chemicals required for the analysis performed by the workstations; a user interface, which is used to connect to one or more computing devices and can monitor and control the analysis through the computing devices.

[0009] Further it is proposed that a negative pressure is maintained in the wet component cabinet and a positive pressure is maintained in the electrical cabinet. Further it is proposed that the system for monitoring and controlling a substrate chemical treatment further comprises one or more chemical buffer cabinets configured for controlling the amount of chemical supplied for the analysis. Further it is proposed that the wet component cabinet, the chemical cabinet and the chemical buffer cabinet are connectable to each other and have a common negative pressure environment. Further it is proposed that the chemical cabinet and the chemical buffer cabinet have one or more common or separate guard doors. Further it is proposed that one or more of the analysis modules have a predetermined configuration and / or are pre-assembled before being mounted on the sealed module door. Further it is proposed that the analysis modules comprise a lego-like structure with standard workstations and equipment mounted on the lego-like structure. Further it is proposed that each of the analysis modules comprises a sealed plate and a plurality of the workstations and the equipment are mounted on the sealed plate. Further it is proposed that the sealed plate is made of metal. Further it is proposed that the sealed module door consists of a frame and the sealed plate.

[0010] Further it is proposed that at least one of the analysis modules has one or more handles. Further it is proposed that at least a portion of the handles are configured to be detachable. Further it is proposed that electrical terminals of a plurality of the workstations and the equipment are located in the electrical cabinet. Further it is proposed that the sealed module door further has a blank plate. Further it is proposed that the blank plate has the same dimensions as the plates of the analysis modules. Further it is proposed that the blank plate is configured to be replaceable by a customized analysis module. Further it is proposed that a plurality of the workstations comprise one or more of a titration workstation, an electrochemical analysis cyclic voltammetry stripping workstation, a high pressure liquid chromatography workstation and a spectrophotometry workstation. Further it is proposed that a plurality of the equipment have one or more sampling valves configured for providing the workstations with chemical samples for performing the analysis. Further it is proposed that the sampling valves comprise switching mechanisms for switching to a required chemical source, the switching being performed automatically or manually by a trained operator. Further it is proposed that the sampling valves comprise multi-way valves configured for providing chemical samples to the workstations by means of dosing devices and / or pumps or via pressurized liquids. Further it is proposed that the multi-way valves are six-way valves.

[0011] Further it is proposed that the system for monitoring and controlling substrate chemical processes further comprises a storage unit configured for storing the configuration and parameters of the analysis performed by the workstations. Further it is proposed that the chemical buffer cabinet comprises one or more chemical buffer containers storing the chemicals, which are automatically refilled by peristaltic pumps from chemical reserve containers stored in the chemical cabinet. Further it is proposed that the chemical reserve containers are housed in a retractable rack. Further it is proposed that the system for monitoring and controlling substrate chemical processes further comprises chemical bulk containers connected with external chemical supply lines and configured for reducing temperature influences by providing freshly filled virgin constituent solutions. Further it is proposed that the electrical cabinet is further configured to provide interconnections between the workstations for performing the analysis. Further it is proposed that the workstations further comprise dosing devices configured for dispensing the chemicals required for the analysis. Further it is proposed that the dosing devices comprise bubble sensors configured for monitoring the chemicals for bubbles. Further it is proposed that each sealed module door has a sealing strip at the circumference of the frame of the sealed module door for sealing the wet components cabinet against the electrical cabinet when the sealed module door is closed. Further it is proposed that the sealing strip is configured for maintaining different pressure conditions in the wet components cabinet and in the corresponding electrical cabinet. Further it is proposed that in order to prevent leakage of chemicals from the system for monitoring and controlling substrate chemical processes and into the electrical cabinet, a negative pressure is maintained in the wet components cabinet. Further it is proposed that in order to avoid intrusion of chemical vapors and dust, a positive pressure is maintained in the electrical cabinet. Further it is proposed that the positive pressure in the electrical cabinet is maintained by a fan provided at the upper side of the system for monitoring and controlling substrate chemical processes.

[0012] Further it is proposed that the system for monitoring and controlling a substrate chemical process further comprises an exhaust device for extracting air from the wet parts cabinet and the chemical cabinet. Further it is proposed that at least one of the protective doors is equipped with a gap, which enables air circulation by suction of ambient air into the wet parts cabinet. Further it is proposed that at least one of the protective doors is transparent, translucent or opaque. Further it is proposed that the protective doors are designed as foldable two-part doors to reduce the spatial dimensions when opened. Further it is proposed that the protective doors are configured to be openable by 90 degrees. Further it is proposed that the protective doors are equipped with a stop for fixing the protective doors in the open position. Further it is proposed that the system for monitoring and controlling a substrate chemical process further comprises pressure sensors configured for detecting values of the pressure in the wet parts cabinet and the chemical cabinet. Further it is proposed that the system for monitoring and controlling a substrate chemical process further comprises a run indicator for displaying the values of the pressure sensors in a color-coded format. Further it is proposed that the wet parts cabinet comprises a leakage sensor configured for detecting a leakage of chemicals from the wet parts cabinet. Further it is proposed that the leakage condition is displayed in a color-coded format by an optical indicator on the leakage sensor. Further it is proposed that the system for monitoring and controlling a substrate chemical process further comprises a safety locking mechanism for locking different parts of the system for monitoring and controlling a substrate chemical process, including the wet parts cabinet, the electrical cabinet, the chemical buffer cabinet and the chemical cabinet. Further it is proposed that in order to provide minimal spatial dimensions during operation of the system for monitoring and controlling a substrate chemical process, the computing device comprises a foldable keyboard and a rotatable display. Further it is proposed that the system for monitoring and controlling a substrate chemical process further comprises a slipstream valve block configured for protecting the system for monitoring and controlling a substrate chemical process from the outside by adjusting and regulating the flow in the slipstream input and output lines, the slipstream valves of the slipstream valve block having a providing device for measuring the flow to ensure that a determined flow value for optimal system performance is maintained. Further it is proposed that the slipstream valve block comprises a pneumatic controller connected with an actuator line and configured for automatic shutdown in case of a stoppage of work.

[0013] In one aspect of the present utility model, the system comprises: a housing having at least one access door at a front side; a sealed module door and a wet components cabinet configured between the at least one access door and the sealed module door. The system further comprises a plurality of analysis modules each comprising a plurality of workstations and equipment and configured for different types of analysis, wherein the analysis modules are mounted at the sealed module door, and wherein components of the plurality of workstations and equipment are located in the wet components cabinet. The system further comprises an electrical cabinet configured behind the sealed module door, wherein the electrical cabinet is configured such that it comprises electrical components for controlling the operation of the workstations and equipment. The system further comprises one or more chemical cabinets for storing and providing chemicals that need to be analyzed by the workstations. A user interface is configured for connection with one or more computing devices, wherein the analysis can be monitored and controlled via the computing devices.

[0014] Optionally, a negative pressure can be maintained in the wet components cabinet and a positive pressure can be maintained in the electrical cabinet.

[0015] Optionally, the different types of analysis comprise inorganic bath component analysis and organic component analysis.

[0016] Optionally, the different types of analysis are characterized by different sampling rates.

[0017] In another aspect of the present utility model, the system further comprises one or more chemical buffer cabinets configured such that they control the amount of chemicals delivered for analysis.

[0018] Optionally, the wet components cabinet, the chemical cabinets and the chemical buffer cabinets can be interconnected and have a common negative pressure environment.

[0019] Optionally, the chemical cabinets and the chemical buffer cabinets have one or more common or separate access doors.

[0020] Optionally, the one or more analysis modules have a predetermined configuration and / or are pre-assembled at the module door before installation.

[0021] Optionally, the analysis modules comprise a Lego-like structure with standard workstations and equipment mounted on the structure.

[0022] Optionally, each analysis module comprises a sealed plate and the plurality of workstations and equipment are mounted on the sealed plate.

[0023] Optionally, the sealed plate is made of metal.

[0024] Optionally, the sealed module door is formed by a frame and a sealed plate.

[0025] Optionally, at least one of the analysis modules comprises one or more handles, wherein at least a portion of the handles are configured such that the portion can be detached.

[0026] Optionally, the electrical terminals of the plurality of workstations and devices are located in an electrical cabinet.

[0027] Optionally, the sealed module door further comprises a blanking plate, wherein the blanking plate has substantially the same dimensions as the analysis module plate and the blanking plate is configured such that the blanking plate can be replaced by a customized analysis module.

[0028] Optionally, the plurality of workstations comprises one or more of a titration workstation, an electrochemical analysis cyclic voltammetry stripping (CVS) workstation, a high pressure liquid chromatography workstation, and a spectrophotometry workstation.

[0029] According to another aspect of the present utility model, the plurality of devices further comprises one or more sampling valves configured for providing a chemical sample to the workstations for performing an analysis.

[0030] Optionally, the sampling valves comprise a switching mechanism for switching to a required source of chemicals, wherein the switching is performed automatically or manually by a trained operator.

[0031] Optionally, the sampling valves comprise a multi-way valve configured such that the multi-way valve provides a chemical sample to the workstations by means of a dosing device, a pump or via a pressurized liquid, wherein the multi-way valve is a six-way valve.

[0032] According to another aspect of the present utility model, the system further comprises a storage unit configured such that the storage unit stores configurations and parameters of analyses run by the workstations.

[0033] Optionally, the chemical buffer cabinet comprises one or more chemical buffer containers in which chemicals are stored, wherein the chemical buffer containers are automatically refilled by a peristaltic pump from a chemical reserve container stored in a chemical cabinet.

[0034] Optionally, the chemical reserve container is contained in a retractable rack.

[0035] In another aspect of the present utility model, the system further comprises a chemical bulk container connected to an external chemical supply line and configured such that the chemical bulk container reduces temperature effects by providing a freshly filled virgin makeup solution (VMS).

[0036] Optionally, the electrical cabinet is configured such that the electrical cabinet controls the power provided to the workstations to ensure that the inorganic bath component analysis and the organic component analysis are performed under control.

[0037] Optionally, the electrical cabinet is further configured for providing interconnections between the workstations to perform the analysis.

[0038] Optionally, the workstations further comprise a dosing device configured such that the dosing device dispenses small to medium quantities of chemicals required for the analysis with high precision.

[0039] Optionally, the dosing device comprises a bubble sensor configured to monitor the chemical for air bubbles.

[0040] Optionally, each sealed module door comprises a sealing strip at its frame ring circumference to seal the wet component cabinet with respect to the electrical cabinet during closing of the sealed door.

[0041] Optionally, the sealing strip is configured such that different pressure conditions are maintained in the wet component cabinet and the corresponding electrical cabinet.

[0042] Optionally, a negative pressure is maintained in the wet component cabinet to prevent leakage of chemicals into the electrical cabinet and outward from the system.

[0043] Optionally, a positive pressure is maintained in the electrical cabinet to prevent intrusion of chemical vapors and dust, wherein the positive pressure in the electrical cabinet is maintained by a fan provided at the upper side of the system.

[0044] In another aspect of the utility model, the system further comprises an exhaust device for extracting air from the wet component cabinet and the chemical cabinet.

[0045] Optionally, the at least one protective door is fitted with a gap which enables air circulation by drawing in ambient air into the wet component cabinet.

[0046] Optionally, the at least one protective door is transparent, translucent or opaque.

[0047] Optionally, the protective door is designed as a two-part door which can be folded to reduce the spatial dimensions when opened.

[0048] Optionally, the protective door is configured such that the protective door can be opened by approximately 90 degrees.

[0049] Optionally, the protective door is provided with a stopper to secure the protective door in the open position.

[0050] According to another aspect of the present application, the system further comprises a pressure sensor configured to cause the pressure sensor to detect a value of pressure in the wet parts cabinet and the chemical cabinet. The system further comprises an operational indicator for displaying the pressure sensor value in a color coded format.

[0051] Optionally, the wet parts cabinet comprises a leak sensor configured to cause the leak sensor to detect a leak of chemicals from the wet parts cabinet.

[0052] Optionally, the leak condition is indicated in a color coded format by an optical indicator on the leak sensor.

[0053] In another aspect of the present application, the system further comprises a safety locking mechanism for locking different parts of the system, the different parts comprising the wet parts cabinet, the electrical cabinet, the chemical buffer cabinet and the chemical cabinet.

[0054] Optionally, the computing device comprises a foldable keyboard and a rotatable display to provide minimum space size during operation of the system.

[0055] In another aspect of the present application, the system further comprises a slip stream valve block configured to cause the slip stream valve block to protect the system from outside, to cause the slip stream valve block to regulate and adjust the flow in the slip stream input and output lines, wherein the slip stream valve of the slip stream valve block has a provision for measuring the flow to maintain a particular flow value for optimum system performance.

[0056] Optionally, the slip stream valve block comprises a pneumatic controller connected with the actuator line and configured to cause the pneumatic controller to automatically shut down in case of stoppage of work. BRIEF DESCRIPTION OF DRAWINGS

[0057] For a better understanding of the embodiments and to show how the same can be carried into effect, there will now be described in pure example, with reference to the accompanying drawings.

[0058] With particular reference to the drawings, it is emphasized that the particulars shown are by way of example and for purposes of illustrative discussion of the embodiments and are presented in the cause of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects. In this regard, no attempt is made to show structural details of the embodiments in more detail than is necessary for a fundamental understanding of the application; the description taken with the drawings making apparent to those skilled in the art how the several selected embodiments can be embodied in practice. In the accompanying drawings:

[0059] Figure 1 shows a front view of a first system 100 for monitoring and controlling an electrochemical plant according to one aspect of the present application;

[0060] Figure 2AAn external scale of a first dual cluster device 200a according to one embodiment of the present utility model is shown;

[0061] Figure 2B A schematic diagram of a second dual cluster device 200b according to other aspects of the present utility model is shown;

[0062] Figure 2C A schematic diagram of a third dual cluster device 200c according to other aspects of the present utility model is shown;

[0063] Figure 2D A schematic diagram of a single cluster device 200d according to another aspect of the present utility model is shown;

[0064] Figure 3A An open structure diagram of a dual cluster process control device is shown, which shows a retractable shelf;

[0065] Figure 3B Different chemical reserve containers are shown;

[0066] Figure 4 An open structure diagram of a process control device with an open module door is shown;

[0067] Figure 5 A schematic front view of a fifth process control device 500 is shown, which shows different structural components;

[0068] Figure 6A A workstation in a wet component cabinet according to one embodiment of the present utility model is shown;

[0069] Figure 6B A position of a workstation sampling device at a module door in a wet component cabinet according to another embodiment of the present utility model is shown;

[0070] Figure 6C An exemplary acidic copper workstation device position at a module door in a wet component cabinet is shown;

[0071] Figure 7A A device in a drawer of a seventh chemical buffer cabinet 700 according to another embodiment of the present utility model is shown;

[0072] Figure 7B A schematic front view of a chemical buffer cabinet in a seventh process control device 710 is shown;

[0073] Figure 7C A device in a drawer of a seventh chemical buffer cabinet 700 according to another embodiment of the present utility model is shown;

[0074] Figure 8 An eighth electrical cabinet 800 behind a module door of a process control device is shown;

[0075] Figure 9A and Figure 9B A six-way valve used in a process control device according to an embodiment of the present utility model is shown;

[0076] Figure 10 An operating indicator at the process control device is shown;

[0077] Figure 11 and Figure 12 A leak sensor in a wet parts cabinet is shown;

[0078] Figure 13A A chemical batch container 1300 is shown;

[0079] Figure 13B A dosing device comprising a bubble sensor for monitoring a liquid for bubbles is shown;

[0080] Figure 14A A titration station is shown;

[0081] Figure 14B An electrochemical analysis cyclic voltammetry stripping station is shown;

[0082] Figure 14C A high pressure liquid chromatography station is shown;

[0083] Figure 15A and Figure 15B Locking of different parts of a tenth process control device 1500 is shown;

[0084] Figure 16A and Figure 16B A foldable keyboard and a rotatable human-machine interface are shown;

[0085] Figure 17A and Figure 17B A first front side 1700 and a first interface side 1710 of a slipstream valve block for protecting a process control device from the outside are shown; and

[0086] Figure 18 An exemplary system for implementing various aspects of the present utility model is shown. DETAILED DESCRIPTION

[0087] Aspects of the present disclosure relate to an apparatus or system that can monitor and control electrochemical technology within a unique structure. The system is flexible, scalable, and customized for respective applications. The system comprises a Lego-like structure on which different chemical analysis modules can be installed. Different measurement units can be installed as modular workstations for performing different electrochemical methods. Each workstation can fulfill a specific task, e.g. analysis, sampling, creating standards. Thus, the workstations can be equipped with as many identical devices and components as possible to simplify maintenance. The system can be a highly adaptable and multi-metal supporting wafer level packaging (WLP) platform.

[0088] In particular embodiments of the system, the system can implement process control through liquid replenishment, solid replenishment (direct metal replenishment), discharge, and feed to maintain degradation products and / or contaminants below a desired range and can be used for discharge and replenishment of electrochemical plating chemistry.

[0089] In other embodiments of the system, the system can include software for storing configurations and parameters of the workstations. The processes of the workstations can be synchronized according to the application. The software also enables the workstations to be updated, repaired, and maintained independently of each other without compromising the operation of other modules.

[0090] As desired, detailed embodiments of the present application are disclosed herein. It should be understood, however, that the disclosed embodiments are merely examples of the present application, which can be practiced in various and alternative forms. The attached drawings are not necessarily to scale; some features can be exaggerated or minimized in the drawin order to illustrate specified aspects of such features. Therefore, specific structural and functional details disclosed herein are not to be interpreted as limiting, but merely as a basis for the claims as a representative embodiment.

[0091] It should be noted that the systems and methods disclosed herein are not limited in their application to the details of construction and the arrangement of components or methods set forth in the following description or illustrated in the drawings and examples. The systems and methods of the present disclosure are capable of implementation in other embodiments and of being practiced or carried out in various ways.

[0092] Alternative methods and materials similar or equivalent to those described herein can be used in the practice or testing of the present disclosure. The particular methods and materials described herein are exemplary only. Materials, methods, and examples are not necessarily intended to be limiting. Thus, in different embodiments, different methods or components can be omitted, substituted, or added. For example, methods can be performed in different sequences, and different steps can be added, omitted, or combined. Also, aspects and components described with respect to particular embodiments can be combined in different other embodiments.

[0093] Reference is now made to Figure 1 which shows a front view of a first system 100 for monitoring and controlling electrochemical engineering, in particular for monitoring and controlling a substrate chemical treatment, according to an aspect of the present utility model. The first system 100 comprises a process control device having a housing 101 or frame, which is divided into multiple compartments or cabinets and comprises (analysis) clusters (in this example a dual cluster configuration). The housing 101 has a transparent, translucent or opaque (made of metal) exterior first and second safety doors 102 and 102', which can be designed as foldable two-part doors, comprising a first two-part door 102a, a second two-part door 102b, a third two-part door 102'a and a fourth two-part door 102'b, to reduce the spatial dimensions when opened. The first and second safety doors 102 and 102' are preferably not sealed and enable a limited circulation of air from the environment. The first and second safety doors 102 and 102' are equipped with a gap, which enables air circulation by sucking in ambient air into the cabinet. Each cluster is configured such that it can accommodate multiple modular workstations for performing different electrochemical methods, which are described below. The housing 101 is flexible and expandable and can accommodate fewer or greater numbers of analysis clusters (additional clusters). The safety doors can be removed from the hinges for repair or maintenance work. The safety doors can be provided with an opening detector (switch) that completely or partially shuts down system operation for safety reasons.

[0094] Figure 2A An external scale of a housing of a first dual cluster device 200a according to an embodiment of the present utility model is shown. The shown first dual cluster device 200a has a structural size of 1.27 x 0.56 m. Figure 2B and Figure 2C Schematic views of a second dual cluster device 200b and a third dual cluster device 200c with open exterior safety doors according to other aspects of the present utility model are shown. Figure 2DA schematic diagram showing a single cluster device 200d according to another aspect of the present application is shown. These cluster devices include a buffer layer configured for process control of nested processes. It should be clear that the above dimensions and structural components are exemplary in nature and are not intended to limit the scope of the present application. The cluster devices are flexible and occupy the required number of clusters depending on the application.

[0095] Returning to Figure 1 , the process control device is connected with a human machine interface 103 via a connection medium 104. The human machine interface 103 can be a communication device such as a personal computer, a laptop, a cell phone, a tablet, a paging device, etc. The communication device can be connected with the process control device via a wired or wireless connection medium 104. The wired medium can include an Ethernet cable, a glass fiber cable, etc. The wireless medium can include one or more of the Internet, a Bluetooth network, a wired LAN (Local Area Network), a wireless LAN, a WiFi network, a Zigbee network, a Z-Wave network, or an Ethernet network. The human machine interface 103 can be disposed in the vicinity of the process control device and physically secured via a pivoting handle 105 as shown in Figure 1 . Alternatively, the human machine interface 103 can be disposed at a location remote from the process control device. The human machine interface can be connected with more than one process control device so that a user can control different process control devices via the same communication device. In another embodiment, two or more human machine interfaces can be connected to a single process control device so that multiple operators can monitor and control the operation of the process control device.

[0096] Data of different electrochemical and analytical processes performed in the workstations, their chemical components and concentrations, target and actual ranges, operating conditions (including work and failure), replenishment requirements, process times (elapsed time and time remaining), analytical results, etc. are transmitted by the process control device to the communication device. The communication device can be configured to include a display that enables full access to the data collected and produced by the measurement and analytical methods running at the different workstations of the process control device for the operator. For example, the display can provide information about the liquid used in the electrochemical process including its lower and upper limits of current, deviation from the desired range, degree of contamination, etc. The communication device also enables control of the processes either directly through commands from the communication device or by accessing the workstations of the process control device. The communication device can also enable representation, troubleshooting, and process improvement.

[0097] According to one aspect of the present utility model, the first system 100 provides the advantage of a small spatial size, since the first system can be installed close to a wall and can be accessed completely from the front side during operation. All internals of the device, compartments or modules, are accessible from the front side. The rear side of the device can be closed after assembly or repair at the work station. The device can also be serviced or inspected from the front side, which provides convenient access for the operator.

[0098] Reference is made to Figure 4 which shows an open structural image 400 of a fourth process control device 401 with an open fourth module door 402. Behind the fourth module door 402, which comprises a wet part cabinet compartment of a chemical module, there is a fourth electrical cabinet 407, which mainly comprises electronic / electrical low voltage modules (controllers etc.), here shown in a partly assembled state.

[0099] The fourth module door 402 has a (rubber / silicone) sealing strip 409 at the circumference of its frame 409', which provides a sealing of the wet part cabinet against the electrical cabinet when the fourth module door 402 is closed.

[0100] The sealing strip 409 prevents contamination of the electronic or electrical modules by chemicals by creating different pressure conditions in the two compartments, i.e. a negative pressure (relative to ambient air pressure) in the wet part cabinet and a positive pressure (relative to ambient air pressure) in the electrical cabinet.

[0101] The fourth electrical cabinet 407 comprises electronic or electrical low voltage modules (controllers etc.), electrical connections in the form of copper or optical cables, voltage or current stabilizers, regulators, protection circuits, switches, temperature and pressure regulators etc. The fourth electrical cabinet 407 is configured such that it interconnects different clusters of the work station with each other. The fourth electrical cabinet 407 also provides connections between different work stations for performing an application. The fourth electrical cabinet 407 controls the power provided to the different work stations to ensure a controlled execution of the application. Electrical terminals of the different work stations and devices are located within the fourth electrical cabinet 407.

[0102] The wet part cabinet can preferably contain a negative pressure relative to the environment to avoid leakage of chemicals into the electrical cabinet and from the system into the environment. During operation, the operator is protected from chemical leakage by a supervised fifth guard door 502. In case of a leakage, the liquid is collected in a supervised secondary safety container of a fifth chemical cabinet 503 for further dispersion, as Figure 5 shown.

[0103] Air in the wet part cabinet is continuously extracted and exchanged with ambient air through an outlet present at the device. With reference to Figure 5 , an exhaust device 506 can be provided at the top of the fifth process control device 500.Figure 10 The outlet of the system can be connected to an external outlet system. The exhaust 506 is connected to the fifth wet component cabinet 501 and the fifth chemical cabinet 503. In a preferred embodiment, the air in the cabinets is exchanged at least 3 times per minute. The pressure in the outlet line of the exhaust 506 is detected by a pressure sensor. In a particular embodiment, a pressure of 75 m 3 / h - 120 m 3 / h (60 - 150 Pascal) is usually maintained at the sensor. If the pressure difference between the ambient pressure and the pressure in the outlet line of the exhaust 506 is outside the range, this is detected by the pressure sensor and displayed on the fifth operation indicator 505.

[0104] Workstations can be formed on different sub-clusters to perform different electrochemical and analytical processes, as shown in Figure 14A , Figure 14B and Figure 14C . Each workstation performs a specific task, e.g. analysis, sampling, creating standards, etc. depending on the application. For example, a titration workstation 1400A can be formed by a cluster on the module door. Titration is an absolute very common method of quantitative chemical analysis to determine the concentration of an identified or known substance with very good accuracy (25 ml). Different titration workstations can include an acid-base titration workstation, a photometric titration (PHT) workstation, a stability indicator workstation, a reduction / oxidation workstation, etc.

[0105] In an alternative embodiment, a cyclic voltammetry stripping workstation 1400B for electrochemical analysis can be formed by a cluster on the module door. In electrochemical analysis techniques, the reduction or plating and oxidation or stripping of a metal component on or from a rotating disc electrode is performed using the electric potential or current. The current versus voltage curve (NTC) is measured and evaluated to obtain the analysis result (5 ml). Different electrochemical analysis workstations can include an accelerator or smoother workstation, an inhibitor workstation, an inorganic stability workstation, etc.

[0106] In another embodiment, a high pressure liquid chromatography workstation 1400C can be formed by a cluster on the module door. The high pressure liquid chromatography workstation can be used to separate and confirm individual bath components (5 ml). The workstation analyzes organic additives, complexing agents, degradation products and stored photoresists.

[0107] During operation, depending on the work station, liquids (chemicals, water, etc.) are moved in or from the wet parts cabinet. The liquids can be temporarily stored, mixed, heated or cooled in the containers, as required. All liquids can be monitored and analyzed via different sensors in the process control device. Different work stations can be equipped with the same standard devices and components as often as possible to simplify maintenance. The process control device can also comprise software for executing, controlling and switching processes on the process control device. The device configuration or parameters are stored in the memory of the process control device. The software also synchronizes the flow in the cluster of individual work stations and between different work stations. The software also enables the operator to add, remove and modify the sequence executed in the work stations. The software can enable the operator to add, remove and modify the applications executed in the work stations.

[0108] Returning to the schematic view of the fifth process control device 500 with different structural components Figure 5 . The fifth wet parts cabinet 501 is behind the front door and comprises chemical modules (work stations), lines, etc. mounted on a frame divided into standard sub-compartments. The fifth process control device 500 comprises a fifth chemical cabinet 503 in which different chemicals required for different processes are stored, which are operated and / or refilled at the work stations. The fifth chemical cabinet 503 supplies the work stations with chemicals according to the required application and time plan. The fifth chemical cabinet 503 stores the required chemicals in fifth reserve containers 504 (e.g. containers, bottles). The fifth reserve containers can be formed of suitable materials including, but not limited to, plastic, glass, steel or other metals that do not react with or contaminate the stored chemicals. The fifth process control device 500 also comprises a fifth buffer cabinet 507 configured so that it controls the amount of chemicals delivered for the analysis of inorganic (bath) components and for the analysis of organic components. In Figure 3B an exemplary first chemical reserve container 303a, a second chemical reserve container 303b and a third chemical reserve container 303c are shown. For the sake of easy handling, the chemical cabinet is preferably equipped with one / more extendable first and second shelves 301, 302, as shown in Figure 3A . The first chemical reserve container 303a, the second chemical reserve container 303b and the third chemical reserve container 303c are located in the extendable first and second shelves 301, 302. The fifth chemical cabinet 503 and the fifth buffer cabinet 507 have one or more common or separate protective doors to prevent chemical leakage and mixing. In a particular embodiment of the application, the wet parts cabinet, the chemical cabinet and the chemical buffer cabinet can be connected to each other and have a common negative pressure environment.

[0109] In Figure 6AA workstation and equipment at the sixth module door 600 in the sixth wet component cabinet according to one embodiment of the present utility model is shown in Fig. 6. In one preferred embodiment, the sixth wet component cabinet comprises two pre-assembled fourth 604 and sixth 606 workstations for inorganic and organic analysis. A blank section 608 or blank plate 608' for user customization options can also be provided at the sixth module door 600, the options enabling the user to install additional modules out of a list of modules provided. The blank section 608 or blank plate 608' has substantially the same size as the plates of the analysis modules. Additional modules can be provided to support ongoing inorganic or organic analysis. Additionally, the additional modules can perform different applications from the inorganic and organic analysis being performed in the fourth 604 and sixth 606 workstations.

[0110] The fourth 604 and sixth 606 workstations can have a predetermined configuration (third ③ and fourth ④ connection points) and are pre-assembled and installed at the sixth module door 600. Each fourth 604 or sixth 606 workstation can have one or more chemical analysis modules 610. The division between modules is typically virtual. The sixth module door 600 can have handles 612 on both sides of the door to install the workstation modules in the door frame. After installing the chemical analysis modules 610, the handles are detached from the door and only the unique remaining handle 612 remains for opening and closing the door. The workstations and equipment can be installed on metal fourth 604' and sixth 606' sealing plates, which are cheaper than dedicated clean plastic. The fourth 604' and sixth 606' sealing plates can be made of a metal cladding. The outer door can also be made of metal, be smaller in size, and can be opened 90 degrees by means of a stopper in order to enable access to the system.

[0111] Each fourth 604 or sixth 606 workstation can comprise one or more first 614a and second 614b sampling valves configured such that they provide the chemical sample for the workstation. For sampling, the sampling valves are switched to the desired sample source. The switching of the sampling valves can be done manually by a user trained in the operation of the process control device. The switching can be done via a switch or lever provided in the workstation. Alternatively, the switching can also be done via a communication device (see Figure 1 ). Furthermore, the switching of the sampling valves can be an automatic process related to the need of the chemical sample for the application to be performed. Figure 6B A first 616a and second 616b sampling valve position for analyzing inorganic or organic additives is shown.

[0112] Figure 9A and Figure 9BA six-way valve (and nineteenth junction A and twentieth junction B) for transferring liquids by means of dosing devices, pumps or liquids under pressure is shown in the process control device. The six-way valve can be used as a sampling valve for sampling from different sources, dispensing water to different targets, etc. In one embodiment, the ninth valve 902 has a 1 / 4 port valve type in a straight stack and the tenth valve 904 has a 1 / 8 port valve type in a lateral stack. Depending on the application, the valves can be used in combination or as separate devices. Furthermore, different line and port sizes are used at the input depending on the expected flow. The output is connected via lines, e.g. 2 / 3 mm lines. The six-way valve is controlled by its own control board, which is integrated into the controller area network (CAN) bus.

[0113] Returning to Figure 6A , the chemical sample can be provided from a chemical stock container stored in a chemical cabinet. The sample can be provided at different sampling rates to the fourth workstation 604 and the sixth workstation 606 for inorganic and organic analysis. In this scenario, two separate lines can be provided from the chemical source in order to control the sample delivery to the inorganic and organic workstations. In one embodiment, the inorganic analysis is faster than the organic analysis and a sample is obtained from the source every 5 minutes. Alternatively, the organic analysis can be faster than the inorganic analysis. Furthermore, a sampling rate can be required for the inorganic and organic analysis. In this case, a single line can be directed from the chemical source to the fourth workstation 604 and the sixth workstation 606.

[0114] An exemplary acid copper workstation device location 618 on a module door in a wet parts cabinet is shown in Figure 6C . The concentration of copper (II) in the electroplating copper bath is determined by spectroscopy. The sulfuric acid concentration in the electroplating copper bath is determined by conductivity measurement. Table 1 below shows exemplary devices in the acid copper workstation:

[0115] Table 1: Acid copper workstation devices.

[0116]

[0117]

[0118] In an alternative embodiment, the workstation device can be a chlorides workstation device, an accelerator and leveler device, a suppressor device or other devices required for inorganic or organic analysis.

[0119] Figure 7AA seventh chemical buffer cabinet 700 (and first junction 1, third junction 3, fourth junction 4, sixth junction 6, twelfth junction 2a and thirteenth junction 2b, fifteenth junction 5a and sixteenth junction 5b) showing a chemical buffer controlling the amount of chemical to be delivered. The seventh chemical buffer container 702 of the seventh chemical buffer cabinet 700 is a temporary storage container for chemicals used in inorganic and organic analysis. The seventh chemical buffer container 702 is automatically filled by a peristaltic pump from a chemical reserve container in the fifth chemical cabinet 503 (see Figure 5 ). Figure 7C The eighth chemical buffer container 722 and the container pump 724 and connection line 726 for each container (and first junction 1, second junction 2 and third junction 3) are shown in

[0120] The seventh chemical buffer container 702 comprises one or more of the following features:

[0121] - an associated waste and fill port,

[0122] - a capacity of 250 ml,

[0123] - the level is monitored via an ultrasonic sensor for precise volume control,

[0124] - no stirrer.

[0125] If no chemical is available in the seventh chemical buffer container 702, the associated work station is blocked and the operator is informed by an alarm. A minimum level or minimum amount of chemical (e.g. 1000 ml or 250 ml) is created in the seventh chemical buffer container 702 to allow sufficient time to switch the container with chemical.

[0126] The chemical container 704 with magnetic stirrer can comprise one or more of the following features:

[0127] - a capacity of 1000 ml,

[0128] - filled and emptied from above via a line,

[0129] - a stirrer for homogeneous mixture, maximum 400 revolutions / minute.

[0130] Figure 7B The eighth chemical buffer cabinet 712 of the seventh process control device 710 is shown.

[0131] Figure 8The eighth electrical cabinet 800 (and the eighth contact 8, the ninth contact 9) is shown behind the module door of the process control device. The eighth electrical cabinet 800 comprises electronic or electrical low-voltage modules (regulators, etc.), electrical connections in the form of copper cables or optical cables, voltage or current stabilizers, regulating mechanisms, protection circuits, switches, temperature and pressure regulators, etc. The eighth electrical cabinet 800 is configured such that it interconnects different clusters of workstations with each other. The eighth electrical cabinet 800 also provides connections between different workstations to perform applications. The eighth electrical cabinet 800 controls the power supplied to different workstations to ensure that the applications are performed under control.

[0132] In Figure 10 the information about the outlet value on the tenth operating indicator 1001 is shown, which can display the information in a color-coded format. Outlet values that lie within the range are shown by, for example, a green display 1002, while outlet values that lie outside the range are shown by a red graphic 1003. The negative pressure monitoring 1000 is achieved by means of a pressure sensor arranged in the outlet line.

[0133] In Figure 11 a first leakage sensor 1101 in the tenth wet component cabinet 1100 is shown. The first leakage sensor 1101 detects a leakage of liquid (chemical, water, etc.) from the wet component cabinet. As long as the first leakage sensor 1101 does not detect any liquid, a green light signal is displayed. If, as shown in Figure 12 , the second leakage sensor 1200 reacts, a red light signal 1201 is displayed. When the red light signal is displayed, one or more of the following action points can be automatically performed:

[0134] - the actuator line is immediately switched off;

[0135] - no chemical is pumped into the workstations of the wet component cabinet;

[0136] - the external supply line for filling the batch containers is closed;

[0137] - all ongoing analysis and refilling tasks are interrupted;

[0138] - the signal light is on red and the horn is sounding;

[0139] - a signal output informs an external recipient that the process control device is no longer available. The signal output can be displayed on a connected communication device.

[0140] In Figure 13AA chemical bulk container 1300 is shown in Fig. 13. The chemical bulk container 1300 is a buffer container connected to an external chemical supply line 1306. The main function of the buffer container is to reduce the temperature impact by providing a freshly filled virgin constituent solution. The buffer container does not have to be filled or changed manually, but is filled via the chemical supply line 1306 provided by the operating company. The chemical bulk container 1300 is directly connected to the external plant supply via dry contact signals, including:

[0141] - Request for virgin constituent solution refill,

[0142] - Presence of external virgin constituent solution supply.

[0143] The chemical bulk container 1300 filled via a pressurized line 1308 is secured by a first valve block 1302 similar to a slip stream bypass. The chemical bulk container 1300 is permanently fixed in the process control device and cannot be removed without tools. The chemical bulk container 1300 is monitored by an ultrasonic sensor 1304 for precise volume control.

[0144] Figure 13B A first dosing device 1310 used in the process control device is shown in Fig. 14, which dispenses small to medium volumes with high precision. The first dosing device 1310 contains a first bubble sensor 1312 to monitor the liquid for air bubbles.

[0145] Figure 15A and Figure 15B Safety locking of different parts of the tenth process control device 1500 is shown. Figure 15A Access to the first chemical cabinet 1502 via a first cabinet key 1508 for changing chemicals is shown. The first cabinet key 1508 is inserted into a first key portion 1510 and / or a second key portion 1512 of the first chemical cabinet 1502 for access. A fifth key 1506 can also be provided for access and control of the operating mode of the workstations in the first wet parts cabinet 1504. The fifth key 1506 is inserted into a third key portion 1514 of the first wet parts cabinet 1504 for access. Figure 15B Access to the second wet parts cabinet 1520 and the electrical cabinet via a second cabinet key 1522 is shown. The second cabinet key 1522 is inserted (1.) into a fourth key portion 1524 of the second wet parts cabinet 1520 and / or placed (2.) into a fifth key portion 1526 for access (3.). The second cabinet key 1522 also provides access to the electrical cabinet, as the electrical cabinet is located behind the module door of the second wet parts cabinet 1520.

[0146] Figure 16AA first keyboard 1602 connected to a human-machine interface is shown. The first keyboard 1602 is configured such that it can be folded to require a minimum space dimension during system operation. A second keyboard 1604, which is folded, provides more working area for the operator. Figure 16B A human-machine interface is provided, which can be rotated, for example a desktop, a notebook, etc. The human-machine interface is shown in a first operating position 1606 with a deployed keyboard touchpad unit. The first operating position of the human-machine interface is the standard position used in different operating types. In a second operating position 1608, the human-machine interface is shown in a rest position with a folded keyboard touchpad unit. In the rest position, the human-machine interface must be placed in order to maintain a minimum working area in front of the electrical cabinet with the components of the guided voltage. For this, the keyboard touchpad unit is folded and the display arm is set such that the human-machine interface is arranged parallel to the front of the process control device. Thereby, unhindered access to the grid voltage operating panel of the process control device is ensured. In a third operating position 1610, the human-machine interface is shown in a maintenance position.

[0147] In Figure 17A and Figure 17B a first front side 1700 and a first interface side 1710 (as well as a first junction 1, a second junction 2, a third junction 3, a fourth junction 4, a fifth junction 5, a sixth junction 6, a seventh junction 7, an eighth junction 8) of a slipstream valve block for protecting a process control device by regulating and adjusting the flow in the slipstream input and output lines, wherein the slipstream valves of the slipstream valve block provide a measuring flow device to ensure that the flow value determined for optimum system performance is maintained, are shown. The slipstream valve block comprises a pneumatic controller, which is connected with an actuator line and automatically closes in case of a stoppage of work, for example in case of a leak. On the first front side 1700 a manual shut-off valve 1702 in an open posture is shown. The manual shut-off valve 1702 enables a system operator to close the valve if a part of the system fails. An external flow setting is realized by a needle valve 1704 if needed.

[0148] The first interface side 1710 comprises one or more of the following components:

[0149] a first internal interface 1712;

[0150] a second internal interface 1714;

[0151] an input side pneumatic valve 1716;

[0152] an input line 1718 from a production tool;

[0153] an output line 1720 to a production tool; and

[0154] an output side pneumatic valve 1722.

[0155] Figure 18 An exemplary second system for implementing the different aspects of the present application is shown. The second system includes a data processor 1802, a system memory 1804, and a system bus 1816. The system bus 1816 includes, but is not limited to, coupling of the system components including the system memory 1804 to the data processor 1802. The data processor 1802 can be one of a variety of available processors. The data processor 1802 involves an integrated circuit or other electronic device (or collection of devices) capable of executing a set of instructions that are read from a medium, including, but not limited to, a reduced instruction set core processor, a complex instruction set computer microprocessor, a microcontroller unit, a central processing unit based on the complex instruction set computer, and a digital signal processor. Additionally, the different functional aspects of the data processor 1802 can be implemented solely as software or firmware in combination with a processor. Dual microprocessors and other multi-processor architectures can also be used as the data processor 1802.

[0156] The system bus 1816 can be one of a variety of bus structures including a memory bus or memory controller, a peripheral bus or external bus, and / or a local bus using a variety of bus architectures known to those of ordinary skill in the art.

[0157] The system memory 1804 can include computer readable storage media that includes volatile and nonvolatile memory. The nonvolatile memory stores the basic input / output system (BIOS) containing the basic routines that help to transfer information between elements within the second system. The nonvolatile memory can include, but is not limited to, read only memory (ROM), programmable read only memory (PROM), electrically programmable read only memory (EPROM), electrically erasable programmable read only memory (EEPROM), or flash memory. The volatile memory includes random access memory (RAM) that acts as external cache memory. RAM is available in many forms such as static random access memory (SRAM), dynamic random access memory (DRAM), synchronous dynamic random access memory (SDRAM), double data rate (DDR) static random access memory (SRAM), extended data out (EDO) SRAM, synchronous link dynamic random access memory (SLDRAM), direct bus random access memory (DBRAM), and fast page mode dynamic random access memory (FPM DRAM).

[0158] The system memory 1804 contains an operating system 1806 that performs the function of managing resources of the second system, establishing user interfaces, and executing and providing services for application software. System applications 1808, system modules 1810, and system data 1812 provide different functions to the second system.

[0159] The second system also includes disk storage 1814. Disk storage 1814 includes, but is not limited to, devices such as a magnetic disk drive, floppy disk drive, tape drive, Jaz drive, Zip drive, LS-100 drive, flash memory card, or a memory stick. Further, disk storage 1814 can include a single storage medium or combination of multiple storage media such as optical disk drives, e.g., a compact disc read-only memory, a compact disc rewritable, or a digital versatile disc

[0160] A user enters commands or information into the second system through input device(s) 1824. Input device(s) 1824 includes, but is not limited to, a pointing device such as a mouse, trackball, pen, etc., a keyboard, a microphone, a joystick, a satellite dish, a scanner, a television tuner card, a digital camera, a digital video camera, a web camera, and the like. Input device(s) 1824 is connected to data processor 1802 through system bus 1816 and to one or more interface port(s) 1822. Interface port(s) 1822 includes, for example, a serial port, a parallel port, a game port, and a universal serial bus.

[0161] Output device(s) 1820, such as a monitor, speakers, and printer, are used to provide data processor 1802's output to a user. Another example, a universal serial bus port, can be used as an input device 1824 to provide input to and output information from second system to output device(s) 1820. Output device(s) 1820 is connected to data processor 1802 through an output adapter 1818 of system bus 1816. Output adapters can include, for example, video and sound cards that provide a connection between data processor 1802 and output device(s) 1820.

[0162] Second system can communicate with remote communication device 1828 to exchange information. Remote communication device 1828 can be a personal computer, a server, a router, a network personal computer, a workstation, a microprocessor-based appliance, a cellular phone, a laptop, a tablet, a paging device, a peer device, or other common network nodes, etc.

[0163] Network interface 1826 includes wired and / or wireless communication networks, such as local area networks and wide area networks. Local area networking technologies include fiber optic, copper, twisted pair, Ethernet, token ring, and the like. Wide area networking technologies include, but are not limited to, point-to-point connections, circuit-switched networks like integrated services digital networks and their variants, packet-switched networks, and digital subscriber lines.

[0164] While the preferred embodiments of the application have been disclosed in detail above, and shown in the accompanying drawings, it will be apparent to those skilled in the art that numerous variations transparent to the preferred embodiments can be made without departing from the application.

[0165] As will be apparent to those skilled in the art, the present application can be manufactured in other specific forms without departing from the essential characteristics thereof. The present embodiment should therefore be considered in all respects as illustrative only and not restrictive, and all changes coming therefrom are intended to be incorporated therein.

Claims

1. A system for monitoring and controlling chemical processing of a substrate, comprising a housing having at least one protective door at a front side, It is characterized by: The system for monitoring and controlling chemical processing of a substrate further comprises: Seal module doors; a wet parts cabinet configured between at least one of the protective doors and the sealed module door; a plurality of analytical modules, each having a plurality of workstations and devices and configured for different types of analysis, the analytical modules being mounted on the sealed module door, and an assembly of the plurality of workstations and devices being located in the wetted parts cabinet; an electrical cabinet disposed behind the sealed module door, the electrical cabinet configured to include electrical components for controlling operation of the workstation and the equipment; one or more chemical cabinets for storing and providing chemicals required for the analysis performed by the workstation; A user interface is provided for interfacing with one or more computing devices, and is capable of monitoring and controlling the analysis via the computing devices.

2. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein Negative pressure is maintained in the wet parts cabinet and positive pressure is maintained in the electrical cabinet.

3. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein The system for monitoring and controlling chemical processing of a substrate further includes one or more chemical buffer tanks configured to control the amount of chemicals supplied for the analysis.

4. The system for monitoring and controlling chemical processing of a substrate according to claim 3, wherein: The wet parts cabinet, the chemical cabinet, and the chemical buffer cabinet can be connected to each other and have a common negative pressure environment.

5. The system for monitoring and controlling chemical processing of a substrate according to claim 3, wherein: The chemical cabinet and the chemical buffer cabinet have one or more common protective doors or separate protective doors.

6. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein One or more of the analytical modules have a predetermined configuration and / or are pre-assembled prior to installation on the sealed module door.

7. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: Each of the analysis modules includes a sealing plate, and a plurality of the workstations and the devices are mounted on the sealing plate.

8. The system for monitoring and controlling chemical processing of a substrate according to claim 7, wherein: The sealing plate is made of metal.

9. The system for monitoring and controlling chemical processing of a substrate according to claim 7, wherein: The sealing module door is composed of a frame and the sealing plate.

10. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein At least one of the analysis modules has one or more handles.

11. The system for monitoring and controlling chemical processing of a substrate according to claim 10, wherein: At least a portion of the handle is configured to be detachable.

12. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein A plurality of the workstations and electrical terminals of the equipment are located in the electrical cabinet.

13. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein The sealed module door also has a blank panel.

14. The system for monitoring and controlling chemical processing of a substrate according to claim 13, wherein: The blank plate has the same size as that of the plate of the analysis module.

15. The system for monitoring and controlling chemical processing of a substrate according to claim 13, wherein: The blank plate is configured to be replaceable by a custom-based analysis module.

16. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The plurality of workstations include one or more of a titration workstation, an electrochemical analysis cyclic voltammetric stripping workstation, a high pressure liquid chromatography workstation, and a spectrophotometric workstation.

17. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: A plurality of the devices have one or more sampling valves configured to provide a chemical sample to the workstation for performing the analysis.

18. The system for monitoring and controlling chemical processing of a substrate according to claim 17, wherein: The sampling valve includes a switching mechanism for switching to the desired chemical source, either automatically or manually by a trained operator.

19. The system for monitoring and controlling chemical processing of a substrate according to claim 17, wherein: The sampling valve comprises a multi-way valve which is configured for providing the chemical sample to the workstation by means of a dosing device and / or a pump or via a pressurized liquid.

20. The system for monitoring and controlling chemical processing of a substrate according to claim 19, wherein: The multi-way valve is a six-way valve.

21. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The system for monitoring and controlling chemical processing of a substrate further includes a storage unit configured to store configurations and parameters of the analysis performed by the workstation.

22. The system for monitoring and controlling chemical processing of a substrate according to claim 3, wherein: The chemical buffer cabinet includes one or more chemical buffer containers that store the chemicals. The chemical buffer containers are automatically refilled from chemical storage containers stored in the chemical cabinet via a peristaltic pump.

23. The system for monitoring and controlling chemical processing of a substrate according to claim 22, wherein: The chemical storage containers are accommodated in telescopic shelves.

24. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The system for monitoring and controlling chemical processing of substrates further includes a chemical bulk container connected to an external chemical supply line and configured to reduce temperature effects by providing a fresh fill of an original constituent solution.

25. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein The electrical cabinet is further configured to provide interconnections between the workstations for performing the analysis.

26. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The workstation further comprises a dosing device configured to dispense chemicals required for the analysis.

27. The system for monitoring and controlling chemical processing of a substrate according to claim 26, wherein: The dosing device comprises an air bubble sensor which is configured to monitor the chemical for air bubbles.

28. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: Each sealed module door has a sealing strip at the circumference of a frame of the sealed module door, wherein the sealing strip is used to seal the wetted component cabinet relative to the electrical cabinet when the sealed module door is closed.

29. The system for monitoring and controlling chemical processing of a substrate according to claim 28, wherein: The sealing strip is configured to maintain different pressure conditions in the wetted parts cabinet and the corresponding electrical cabinet.

30. The system for monitoring and controlling chemical processing of a substrate according to claim 29, wherein: In order to prevent chemicals from leaking from the system for monitoring and controlling chemical processing of substrates and into the electrical cabinet, a negative pressure is maintained in the wetted parts cabinet.

31. The system for monitoring and controlling chemical processing of a substrate according to claim 29, wherein: In order to avoid the intrusion of chemical vapors and dust, a positive pressure is maintained in the electrical cabinet.

32. The system for monitoring and controlling chemical processing of a substrate according to claim 31, wherein: A positive pressure in the electrical cabinet is maintained by a fan provided at an upper side of the system for monitoring and controlling chemical processing of substrates.

33. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The system for monitoring and controlling chemical processing of substrates also includes an exhaust device for extracting air from the wet parts cabinet and the chemical cabinet.

34. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: At least one of the protective doors is provided with a gap which enables air circulation by suction of ambient air into the wet parts cabinet.

35. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein At least one of the protective doors is transparent, translucent or opaque.

36. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The protective door is designed as a foldable two-section door to reduce the space size when opened.

37. The system for monitoring and controlling chemical processing of a substrate according to claim 36, wherein: The protective door is configured to be able to open 90 degrees.

38. The system for monitoring and controlling chemical processing of a substrate according to claim 36, wherein: The guard door is equipped with a stopper for fixing the guard door in an open position.

39. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The system for monitoring and controlling chemical processing of substrates further includes a pressure sensor configured to detect values ​​of pressure in the wet parts cabinet and the chemical cabinet.

40. The system for monitoring and controlling chemical processing of a substrate according to claim 39, wherein: The system for monitoring and controlling chemical processing of a substrate also includes an operational indicator for displaying a value of the pressure sensor in a color-coded format.

41. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: The wet parts cabinet includes a leak sensor configured to detect a leak of chemical escaping from the wet parts cabinet.

42. The system for monitoring and controlling chemical processing of a substrate according to claim 41, wherein: Leak conditions are displayed in a color-coded format via an optical indicator on the leak sensor.

43. The system for monitoring and controlling chemical processing of a substrate according to claim 3, wherein: The system for monitoring and controlling chemical processing of substrates further includes a safety locking mechanism for locking a plurality of different portions of the system for monitoring and controlling chemical processing of substrates, the plurality of different portions including the wet parts cabinet, the electrical cabinet, the chemical buffer cabinet, and the chemical cabinet.

44. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein: In order to provide a minimum footprint during operation of the system for monitoring and controlling chemical processing of substrates, the computing device includes a foldable keyboard and a rotatable display.

45. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein The system for monitoring and controlling chemical processing of substrates further comprises a slipstream valve block configured for externally protecting the system for monitoring and controlling chemical processing of substrates by regulating and adjusting flows in slipstream input and output lines, the slipstream valves of the slipstream valve block having provision for measuring the flows to ensure that a determined flow value for optimal system performance is maintained.

46. ​​The system for monitoring and controlling chemical processing of a substrate according to claim 45, wherein: The slide flow valve block includes a pneumatic controller connected to the actuator circuit and configured to automatically close in the event of a breakdown.

Images