MEMS micromirror with electrical insulation structure
By employing a MEMS micromirror substrate and insulating plate assembly design in MEMS micromirrors and utilizing silicon dioxide material to enhance electrical insulation, the problem of poor electrical insulation in MEMS micromirrors is solved, the electrical insulation effect and equipment stability are improved, and electrostatic damage is prevented.
Patent Information
- Application Number
- CN202422837231.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-20
- Publication Date
- 2025-11-07
- Estimated Expiration
- 2034-11-20
AI Technical Summary
Poor electrical insulation of MEMS micromirrors leads to increased leakage current, excessive power consumption, and driving voltage that does not meet expectations, affecting adjustment accuracy and potentially causing electrostatic discharge that damages the micromirror structure.
The design employs a MEMS micromirror substrate and insulating plate assembly, including a fixed electrode plate, a movable electrode plate, an insulating plate assembly, and a limiting plate. Silica material is used to enhance electrical insulation, and the insulating plate assembly isolates the electrical interaction between the electrode plates. Under the action of an auxiliary spring, the plates approach each other, thereby improving the electrical insulation effect.
It improves the electrical insulation of MEMS micromirrors, reduces leakage current, ensures stable driving voltage, enhances adjustment accuracy, prevents electrostatic discharge damage, and extends equipment life.
Smart Images
Figure CN223522295U_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of MEMS micromirror technology, and specifically relates to a MEMS micromirror with an electrically insulating structure. Background Technology
[0002] MEMS micromirrors are miniaturized optical components manufactured using microelectromechanical systems (MEMS) technology. They are widely used in optical communication, laser scanning, display technology, and biomedical imaging. There are many types of MEMS micromirrors, such as electrostatically driven MEMS micromirrors, which control the angle or position of the micromirror by applying voltage. In this case, there must be good electrical insulation between the driving electrode and the micromirror itself to prevent short circuits and current leakage. Poor electrical insulation in a MEMS micromirror can lead to increased leakage current between different electrodes or between the electrode and the substrate. This leakage current consumes additional power and may cause the driving voltage to fail to reach the expected value, thus affecting the adjustment accuracy of the micromirror. Furthermore, poor electrical insulation makes the device more susceptible to electrostatic discharge (ESD), which can damage or even completely disable the microstructures inside the micromirror. This damage is usually irreversible and requires replacement of the entire micromirror. Poor electrical insulation can also cause crosstalk between signal lines.
[0003] In summary, MEMS micromirrors with poor electrical insulation properties present some problems in use. Therefore, we hope to propose a new structure to solve the aforementioned technical issues. Utility Model Content
[0004] To address the shortcomings of existing technologies, the purpose of this invention is to provide a MEMS micromirror with an electrically insulating structure, thereby resolving the problems mentioned in the background section.
[0005] This utility model is achieved through the following technical solution: A MEMS micromirror with an electrically insulating structure includes: a MEMS micromirror substrate, a movable electrode plate, and an insulating plate assembly. A substrate groove is formed at the center of the upper surface of the MEMS micromirror substrate. A fixed electrode plate for moving and adjusting the movable motor plate is fixedly connected to the lower end of the inner side of the substrate groove. Hiding grooves for hiding the insulating plate assembly are formed on the inner sides of both the left and right ends of the substrate groove. An auxiliary spring for resetting the insulating plate assembly is provided at the end of the hidden groove away from the center of the substrate groove. A set of insulating plate assemblies for increasing insulation performance is provided on the inner side of the hidden grooves on both sides. A movable electrode plate is provided at the upper end of the inner side of the substrate groove. A set of limiting plates for limiting the position is provided above the four corners of the movable electrode plate. The MEMS micromirror substrate is made of silicon dioxide material.
[0006] As a preferred implementation, the MEMS micro-mirror substrate upper surface, substrate groove four corners are provided with a set of corner groove for auxiliary moving electrode plate, each group of the corner groove inside lower end is provided with a set of reset spring for auxiliary moving electrode plate reset.
[0007] As a preferred implementation, the moving electrode plate four corners are fixedly connected with corner plate, the corner plate and the corner groove are movably embedded, the moving electrode plate upper surface is coated with a silicon dioxide layer for insulation, and the corner plate moves in the corner groove to assist the adjustment of the moving electrode plate.
[0008] As a preferred implementation, the silicon dioxide layer is fixedly connected with a mirror seat above, the mirror seat is made of silicon dioxide material, and the inside of the mirror seat is provided with a mirror, which can strengthen the electrical insulation protection of the mirror through the mirror seat supported by silicon dioxide.
[0009] As a preferred implementation, the left and right ends of the hidden groove are provided with guide sliding grooves for assisting linear movement of the insulation plate assembly, the insulation plate assembly is provided with an insulation plate body at the middle position of the internal composition, and the left and right sides of the insulation plate body are fixedly connected with guide sliding blocks away from the center of the substrate groove.
[0010] As a preferred implementation, the guide sliding blocks and the guide sliding grooves are movably embedded, and the insulation layer is coated on the upper and lower sides of the insulation plate body.
[0011] The insulation layer is made of a kind of silicon dioxide material, the insulation plate body is provided with an electrode slot near the center of the substrate groove, the inside of the electrode slot is provided with an auxiliary electrode, and the electrodes of the two groups of insulation plate assemblies generate the same force when working, the insulation plate assemblies are close to each other under the action of the elastic force of the auxiliary spring when the auxiliary electrode has no electrical effect, which can improve the electrical insulation protection of the mirror.
[0012] As a preferred implementation, the MEMS micro-mirror substrate upper surface and the corner groove are provided with an installation groove for embedding and installing a limiting plate, the limiting plate and the installation groove are embedded and fixed by welding, the limiting plate can be individually and destructively removed after welding and fixing, and the moving electrode plate can be disassembled.
[0013] The beneficial effects of the MEMS micromirror with the electric insulation structure are as follows: the MEMS micromirror base plate and the insulating plate assembly are added, the attractive force of the fixed electrode plate is used to control the movement of the movable electrode plate, the movable electrode plate drives the mirror surface above it to move and adjust, the electric insulating material is laid between the movable electrode plate and the mirror surface, the mirror surface is wrapped by the mirror surface seat to improve the electric insulation effect, the movable electrode plate and the fixed electrode plate are separated by the two groups of insulating plate assemblies, the same force of the auxiliary electrode generates repulsion to make the movable electrode plate in the open and closed structure, and the movable electrode plate is attached under the action of the auxiliary spring when the electrode force is removed, the electric property influence of the movable electrode plate is reduced, the electric insulation effect is improved, the MEMS micromirror base plate and the limiting plate are added, and the movable electrode plate can be disassembled. BRIEF DESCRIPTION OF DRAWINGS
[0014] In order to more clearly illustrate the technical solutions of the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiment or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor under the premise of not paying.
[0015] Fig. 1 It is a whole structure schematic diagram of the MEMS micromirror with the electric insulation structure.
[0016] Fig. 2 It is a structure schematic diagram of the MEMS micromirror with the electric insulation structure removing the movable electrode plate.
[0017] Fig. 3 It is a structure schematic diagram of the MEMS micromirror base plate in the MEMS micromirror with the electric insulation structure.
[0018] Fig. 4 It is a structure schematic diagram of the MEMS micromirror base plate removing the movable electrode plate in the MEMS micromirror with the electric insulation structure.
[0019] Fig. 5 It is a local sectional view schematic diagram of the MEMS micromirror base plate in the MEMS micromirror with the electric insulation structure.
[0020] Fig. 6 It is a structure schematic diagram of the insulating plate assembly in the MEMS micromirror with the electric insulation structure.
[0021] In the figure, 100-MEMS micro mirror substrate, 101-substrate groove, 102-fixed electrode plate, 103-corner groove, 104-reset spring, 105-mounting groove, 106-hidden groove, 107-assistant spring, 108-moving electrode plate, 109-corner plate, 110-mirror seat, 111-mirror, 112-guiding chute;
[0022] 200-insulating plate assembly, 201-insulating plate body, 202-guiding slider, 203-insulating layer, 204-electrode groove, 205-assistant electrode;
[0023] 300-limiting plate. DETAILED DESCRIPTION
[0024] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.
[0025] Please refer to Figs. 1-6 The present application provides a technical solution: a MEMS micro mirror with an electrically insulating structure, comprising: a MEMS micro mirror substrate 100, a moving electrode plate 108, and an insulating plate assembly 200, a substrate groove 101 is formed in the center of the upper surface of the MEMS micro mirror substrate 100;
[0026] The fixed electrode plate 102 is fixedly connected to the inner lower end of the substrate groove 101 for moving and adjusting the moving electrode plate 108, and the hidden grooves 106 are formed in the inner sides of the left and right ends of the substrate groove 101 for hiding the insulating plate assembly 200, and the assistant spring 107 is arranged at the inner side of the hidden groove 106 away from the center of the substrate groove 101 for resetting the insulating plate assembly 200.
[0027] A group of insulating plate assemblies 200 are arranged in the inner sides of the two hidden grooves 106 for increasing the insulation performance, the moving electrode plate 108 is arranged at the inner upper end of the substrate groove 101, a group of limiting plates 300 are arranged above the four corners of the moving electrode plate 108 for limiting use, and the MEMS micro mirror substrate 100 is made of silicon dioxide material.
[0028] A group of corner grooves are formed in the upper surface of the MEMS micro mirror substrate and the four corners of the substrate groove for assisting the movement of the moving electrode plate, and a group of reset springs are arranged at the inner lower end of each corner groove for resetting the moving electrode plate.
[0029] The movable electrode plate 108 is fixedly connected with the corner plate 109 at four corners, the corner plate 109 is movably embedded with the corner groove 103, the upper surface of the movable electrode plate 108 is coated with the silica layer for insulation, and the corner plate 109 moves in the corner groove 103 to assist the adjustment of the movable electrode plate 108.
[0030] The mirror seat 110 is fixedly connected above the silica layer, the mirror seat 110 is made of silica material, the inner side of the mirror seat 110 is provided with the mirror 111, and the mirror seat 110 made of silica can strengthen the electrical insulation protection of the mirror 111.
[0031] The guiding sliding grooves 112 for assisting the linear movement of the insulation plate assembly 200 are arranged on the inner sides of the left and right ends of the hidden groove 106, the insulation plate body 201 is arranged at the middle position in the inner composition of the insulation plate assembly 200, and the guiding sliding blocks 202 are fixedly connected to the left and right sides of the insulation plate body 201 away from the center of the base plate groove 101.
[0032] The guiding sliding blocks 202 are movably embedded with the guiding sliding grooves 112, and the insulation layer 203 is coated on the upper and lower sides of the insulation plate body 201.
[0033] The insulation layer 203 is made of silica material, the electrode groove 204 is arranged at the center of the insulation plate body 201 close to the base plate groove 101, the auxiliary electrode 205 is arranged in the electrode groove 204, the electrodes of the two groups of insulation plate assemblies 200 generate the same force during work, the insulation plate assemblies 200 are close to each other under the action of the auxiliary spring rebound force 107 when the auxiliary electrode 205 has no electrical effect, and the electrical insulation protection of the mirror 111 can be improved.
[0034] Please refer to Figs. 1-6 , as the first embodiment of the utility model: firstly, the fixed electrode plate 102 generates the attraction force to control the movement of the movable electrode plate 108, and then drives the movable adjustment of the mirror 111 above, and the corner plate 109 moves in the corner groove 103 to assist the adjustment of the movable electrode plate 108 during the movable adjustment, the electrical insulation material is coated between the movable electrode plate 108 and the mirror 111, and the mirror 111 is wrapped by the mirror seat 110 to improve the electrical insulation effect, secondly, the movable electrode plate 108 and the fixed electrode plate 102 are separated by the two groups of insulation plate assemblies 200, the insulation plate assemblies 200 are close to each other under the action of the auxiliary spring rebound force 107 when the auxiliary electrode 205 has no electrical effect, and the electrical insulation protection of the mirror 111 can be improved, so that the electrical insulation effect can be improved.
[0035] The upper surface of the MEMS micro-mirror substrate 100 and the upper side of the corner groove 103 are provided with an installation groove 105 for embedding and installing a limiting plate 300, the limiting plate 300 is embedded with the installation groove 105 and is fixed by welding, and the limiting plate 300 can be separately and destructively removed after being fixed by welding, so that the movable electrode plate 108 can be disassembled.
[0036] Please refer to Figs. 1-4 As a second embodiment of the present application: based on the first embodiment, the movable electrode plate 108 is fixed with the limiting plate 300 above the corner plate 109 by welding, and the limiting plate 300 is fixed in the installation groove 105, which can limit the upper limit of the movable electrode plate 108 when it is reset and adjusted, and the limiting plate 300 can be separately and destructively removed after being fixed by welding, so that the movable electrode plate 108 can be disassembled.
[0037] The above is only a preferred embodiment of the present application, and is not intended to limit the present application, and any modification, equivalent replacement, improvement, etc. within the spirit and principles of the present application shall be included in the protection scope of the present application.
Claims
1. A MEMS micromirror having an electrically insulating structure, comprising: MEMS micro-mirror substrate (100), movable electrode plate (108) and insulating plate assembly (200), characterized by: the MEMS micro-mirror substrate (100) upper surface center is provided with substrate slot (101); The inner side of the substrate slot (101) is fixedly connected with a fixed electrode plate (102) for driving the movable electrode plate (108) to move and adjust, and the inner side of the left and right ends of the substrate slot (101) is provided with a hidden groove (106) for hiding the insulating plate assembly (200), and the inner side of the hidden groove (106) away from the center of the substrate slot (101) is provided with an auxiliary spring (107) for resetting the insulating plate assembly (200). The inner side of the hidden groove (106) on both sides is provided with a group of insulating plate assemblies (200) for increasing the insulation performance, the inner side of the substrate slot (101) is provided with a movable electrode plate (108), the movable electrode plate (108) is provided with a group of limiting plates (300) above the four corners for limiting use, and the MEMS micro-mirror substrate (100) is made of silicon dioxide material.
2. The MEMS micro-mirror with an electrically insulated structure of claim 1, wherein: The upper surface of the MEMS micro-mirror substrate is provided with a group of corner grooves at the four corners of the substrate slot for assisting the movement of the movable electrode plate, and the inner side of each group of corner grooves is provided with a group of reset springs for assisting the reset of the movable electrode plate.
3. The MEMS micro-mirror with an electrically insulated structure of claim 2, wherein: The four corners of the movable electrode plate (108) are fixedly connected with corner plates (109), the corner plates (109) and the corner grooves (103) are movably embedded, and the upper surface of the movable electrode plate (108) is coated with a silicon dioxide layer for insulation.
4. The MEMS micro-mirror with an electrically insulated structure of claim 3, wherein: The upper surface of the movable electrode plate (108) is fixedly connected with a mirror seat (110), the mirror seat (110) is made of silicon dioxide material, and the inner side of the mirror seat (110) is provided with a mirror (111).
5. A MEMS micro-mirror with an electrically isolated structure as claimed in claim 4, characterized in that: The inner side of the hidden groove (106) is provided with a guide sliding groove (112) for assisting the linear movement of the insulating plate assembly (200), the inner side of the hidden groove (106) is provided with a guide sliding groove (112) for assisting the linear movement of the insulating plate assembly (200), and the inner side of the hidden groove (106) is provided with a guide sliding groove (112) for assisting the linear movement of the insulating plate assembly (200).
6. A MEMS micro-mirror with an electrically isolated structure as claimed in claim 5, characterized in that: The guide sliding block (202) and the guide sliding groove (112) are movably embedded, and the upper and lower sides of the insulating plate body (201) are coated with an insulating layer (203); The insulating layer (203) is made of a kind of silicon dioxide material, the insulating plate body (201) is provided with an electrode slot (204) near the center of the substrate slot (101), the inner side of the electrode slot (204) is provided with an auxiliary electrode (205), and the electrodes of the two groups of insulating plate assemblies (200) generate the same force when working.
7. The MEMS micro-mirror with an electrically isolated structure of claim 1, wherein: The upper surface of the MEMS micro-mirror substrate (100) and the corner groove (103) are provided with a mounting groove (105) for embedding and mounting the limiting plate (300), and the limiting plate (300) and the mounting groove (105) are embedded and fixed by welding.