Microwave jet device for preparing diamond

Abstract

The utility model relates to the field of diamond preparation, in particular to a microwave injection device for preparing diamond, which comprises a placing table, a reaction chamber arranged above the placing table, a deflation tank arranged on one side of the reaction chamber, a microwave power supply fixedly mounted above the reaction chamber through bolts, and a sample table arranged inside the reaction chamber, clamping grooves are formed in the two sides of the sample table, a fixedly-connected rack is arranged below the sample table, and a mechanical arm is further fixedly installed above the inner wall of the reaction chamber through bolts; according to the utility model, the diamond substrate is placed above the sample table, then the rack below the sample table is clamped in the sliding chute, and then the connecting rod is screwed to drive the sample table to be in contact with the arc-shaped propping block, so that the position of the sample table is precisely limited; and when the device is used for preparing the diamond, the resonant cavity can be driven to freely move in the reaction cavity by starting the mechanical arm, so that the size limitation of the diamond prepared by the original chemical vapor deposition method is broken through.

Description

Technical Field

[0001] This utility model relates to the field of diamond preparation, and in particular to a microwave jetting device for preparing diamond. Background Technology

[0002] Diamond possesses numerous superior properties, including high hardness, high thermal conductivity, strong wear resistance, good chemical stability, large bandgap, and good light transmittance. It has irreplaceable and important applications in many fields such as machining, electronics, optics, and jewelry. However, natural diamond resources are limited and scarce, making it difficult to meet the growing demand for diamonds from industries and scientific research. Therefore, the artificial preparation of diamonds has become an inevitable choice. Common diamond preparation methods include chemical vapor deposition (CVD), which involves depositing and growing diamond films on a substrate in a deposition furnace. This method can be carried out at relatively low temperatures and pressures. Currently, hot-wire CVD is commonly used, for example, using CH4, Ar, and NH3 as gas sources to grow nitrogen-doped diamond films on the surface of a treated substrate.

[0003] In the prior art, when preparing diamond using chemical vapor deposition, the diamond produced is usually limited by the inability of the resonant chamber to move, which restricts the size of the diamond during preparation. In addition, conventional sample stages are not positioned within the reaction chamber without a positioning mechanism. If the sample stage is not centered, some diamond substrates may be located at the edge of the plasma torch, thus affecting the growth rate of the diamond substrate.

[0004] To address the aforementioned technical shortcomings, a solution is proposed. Utility Model Content

[0005] The purpose of this invention is to provide a microwave jetting device for preparing diamond, thereby addressing the aforementioned technical deficiencies.

[0006] The objective of this utility model can be achieved through the following technical solutions:

[0007] A microwave jetting device for preparing diamond includes a placement stage, a reaction chamber above the placement stage, a venting tank on one side of the reaction chamber, a microwave power supply fixedly mounted above the reaction chamber by bolts, a sample stage placed inside the reaction chamber, clamping grooves on both sides of the sample stage, a rack fixedly connected below the sample stage, and a robotic arm fixedly mounted above the inner wall of the reaction chamber by bolts, with a resonant cavity fixedly clamped in the gripper of the robotic arm.

[0008] Preferably, an array of support columns is fixedly provided below the placement platform, and a fixedly connected mounting bracket is also provided below the placement platform. The reaction chamber and the venting tank are both fixed to the placement platform by bolts. A pressure gauge is installed above the venting tank, and an internally connected gas supply pipe is fixedly provided above the venting tank. A regulating valve is installed on the outside of the gas supply pipe.

[0009] Preferably, the sample inlet of the reaction chamber is provided with a rotatably connected sealing door, and an observation window is fixedly installed inside the sealing door. A threaded heat dissipation pipe is also embedded inside the reaction chamber, and connecting pipes are fixedly installed at both ends of the threaded heat dissipation pipe.

[0010] Preferably, the connecting pipe extends out of the reaction chamber, the bottom of the inner wall of the placement platform is provided with a sliding groove, and the bottom of the inner wall of the placement platform is also provided with symmetrically distributed arc-shaped blocks, the arc-shaped blocks being integrally formed with the reaction chamber.

[0011] Preferably, the interior of the reaction chamber is further provided with a rotatably connected connecting rod. One end of the connecting rod is provided with an integrally formed hand-tightening part, and the other end of the connecting rod is provided with a fixedly connected spur gear. The spur gear meshes with a rack, and the rack is inserted into a sliding groove and slidably connected to the groove.

[0012] Preferably, the microwave power supply has a fixedly connected waveguide below the microwave nozzle, the other end of the waveguide is inserted into the resonant cavity and communicates with the inside of the resonant cavity, and the other end of the gas supply pipe has a fixedly connected air inlet pipe, the other end of the air inlet pipe is inserted into the resonant cavity and communicates with the inside of the resonant cavity.

[0013] Preferably, the bottom of the reaction chamber is also provided with a gas outlet pipe that is fixedly connected and internally connected. One end of the gas outlet pipe passes through the placement platform and a pressure regulating valve is fixedly provided on the outside. The other end of the gas outlet pipe is provided with a vacuum pump that is fixedly connected. The vacuum pump is installed inside the mounting frame by bolts.

[0014] The beneficial effects of this utility model are as follows:

[0015] This invention places a diamond substrate above a sample stage, then engages a rack below the sample stage in a groove, and rotates a connecting rod to bring the sample stage into contact with an arc-shaped stop block, thus precisely positioning the sample stage. The sealing door is then closed, and the pressure inside the reaction chamber is reduced to a low pressure. Reactive gas is then introduced into the reaction chamber through a venting tank, and a microwave power supply is turned on, creating plasma within the resonant chamber. The plasma, under the high-speed impact of the airflow, is ejected from a nozzle to form a plasma torch, which reacts on the sample surface to generate diamond. Furthermore, the resonant chamber can be moved freely within the reaction chamber by activating a robotic arm, thus overcoming the size limitations of traditional chemical vapor deposition methods for diamond preparation. Attached Figure Description

[0016] The present invention will be further described below with reference to the accompanying drawings;

[0017] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0018] Figure 2 This is a schematic diagram of the connection structure between the reaction chamber and the venting tank in this utility model;

[0019] Figure 3 This is a cross-sectional view of the lower end of the reaction chamber in this utility model;

[0020] Figure 4 This is a schematic diagram of the connection structure between the sample stage and the connecting rod in this utility model;

[0021] Figure 5 This is a cross-sectional schematic diagram of the internal structure of the reaction chamber in this utility model.

[0022] Legend: 1. Placement stage; 11. Mounting frame; 12. Reaction chamber; 13. Sealed door; 14. Observation window; 15. Venting tank; 16. Gas supply pipe; 17. Regulating valve; 18. Microwave power supply; 19. Connecting pipe; 20. Threaded heat dissipation pipe; 21. Arc-shaped stop block; 22. Slide groove; 23. Sample stage; 24. Clamping groove; 25. Rack; 26. Connecting rod; 27. Spur gear; 28. Waveguide; 29. ​​Inlet pipe; 30. Robotic arm; 31. Resonant chamber; 32. Outlet pipe; 33. Pressure regulating valve; 34. Vacuum pump. Detailed Implementation

[0023] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0024] Please see Figure 1 - Figure 5As shown, this utility model is a microwave jetting device for preparing diamond, including a placement stage 1. An array of support columns is fixedly arranged below the placement stage 1. A mounting bracket 11 is also fixedly connected below the placement stage 1. A reaction chamber 12 is located above the placement stage 1. A temperature sensor is installed on the outside of the reaction chamber 12. A venting tank 15 is located on one side of the reaction chamber 12. Both the reaction chamber 12 and the venting tank 15 are fixed to the placement stage 1 by bolts. A pressure gauge is installed above the venting tank 15. An internally connected gas supply pipe 16 is also fixed above the venting tank 15. A regulating valve 17 is installed on the outside of the gas supply pipe 16.

[0025] The sample inlet of the reaction chamber 12 is provided with a rotating sealing door 13. An observation window 14 is fixedly installed inside the sealing door 13. A microwave power supply 18 is also fixedly installed above the reaction chamber 12 by bolts. A threaded heat dissipation pipe 20 is also embedded inside the reaction chamber 12. Both ends of the threaded heat dissipation pipe 20 are fixedly provided with connecting pipes 19. The connecting pipes 19 extend out of the outside of the reaction chamber 12 and are connected to the water pipe. A sliding groove 22 is opened at the bottom of the inner wall of the placement platform 1. A symmetrically distributed arc-shaped abutment 21 is also provided at the bottom of the inner wall of the placement platform 1. The arc-shaped abutment 21 is integrally formed with the reaction chamber 12.

[0026] The reaction chamber 12 also contains a sample stage 23. The sample stage 23 has clamping grooves 24 on both sides. The sample stage 23 is fixedly connected to a rack 25 below it. The reaction chamber 12 also contains a rotatably connected connecting rod 26. One end of the connecting rod 26 has an integrally formed hand-tightening part, and the other end of the connecting rod 26 has a fixedly connected spur gear 27. The spur gear 27 meshes with the rack 25, and the rack 25 is inserted into the slide groove 22 and slidably connected to the slide groove 22.

[0027] Below the microwave nozzle of the microwave power supply 18, a waveguide 28 is fixedly connected. A robotic arm 30 is also fixedly installed on the inner wall of the reaction chamber 12 by bolts. The gripper of the robotic arm 30 is fixedly clamped in the resonant chamber 31. When the robotic arm 30 is started, it drives the resonant chamber 31 to move in the reaction chamber 12. The other end of the waveguide 28 is inserted into the resonant chamber 31 and communicates with the inside of the resonant chamber 31. The other end of the gas supply pipe 16 is provided with a fixedly connected air inlet pipe 29. The other end of the air inlet pipe 29 is inserted into the resonant chamber 31 and communicates with the inside of the resonant chamber 31.

[0028] The bottom of the reaction chamber 12 is also provided with a fixedly connected and internally connected air outlet pipe 32. One end of the air outlet pipe 32 passes through the placement platform 1 and a pressure regulating valve 33 is fixedly installed on the outside. The other end of the air outlet pipe 32 is provided with a fixedly connected vacuum pump 34. The vacuum pump 34 is installed inside the mounting bracket 11 by bolts. When the vacuum pump 34 is started, air is drawn out from the reaction chamber 12 through the air outlet pipe 32.

[0029] The working process and principle of this utility model are as follows:

[0030] In use, first, the sample stage 23 is removed by clamping it in the clamping groove 24, or by turning the connecting rod 26. The connecting rod 26 drives the rack 25 and the sample stage 23 on it to move towards the sample inlet of the reaction chamber 12 through the spur gear 27. After removing the sample stage 23, the diamond substrate is placed on top of the sample stage 23. Then, the rack 25 below the sample stage 23 is locked in the sliding groove 22. Then, the connecting rod 26 is turned to move the sample stage 23 towards the position close to the arc-shaped abutment 21 until the outer side of the sample stage 23 contacts the arc-shaped abutment 21. Then, the sealing door 13 is closed, and the pressure regulating valve 33 is opened and the vacuum pump 34 is started. When the vacuum pump 34 is started, the gas pressure in the reaction chamber 12 is drawn to a low pressure through the gas outlet pipe 32.

[0031] Then, open the regulating valve 17 to allow the reaction gas in the venting tank 15 to flow into the resonant chamber 31 in the reaction chamber 12 through the gas supply pipe 16. Then, turn on the microwave power supply 18. When the connecting pipe 19 is started, microwaves are transmitted to the resonant chamber 31 to form plasma. Under the high-speed impact of the reaction gas flow, the plasma is ejected from the resonant chamber 31 to form a plasma torch. After reacting on the sample substrate surface, diamond is generated. When in use, the resonant chamber 31 can be moved freely in the reaction chamber 12 by starting the robotic arm 30, thereby breaking through the size limitation of the original chemical vapor deposition method for diamond preparation. During diamond preparation, the outer surface of the reaction chamber 12 can be cooled by introducing an external water source through the connecting pipe 19.

[0032] In the description of this specification, references to terms such as "an embodiment," "example," and "specific example" indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0033] The preferred embodiments of this utility model disclosed above are merely illustrative of the present utility model. These preferred embodiments do not exhaustively describe all details, nor do they limit the utility model to any specific implementation. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of this utility model, thereby enabling those skilled in the art to better understand and utilize it. This utility model is limited only by the claims and their full scope and equivalents.

Claims

1. A microwave jetting apparatus for preparing diamond, comprising a stage (1), characterized in that, A reaction chamber (12) is provided above the placement platform (1). A venting tank (15) is provided on one side of the reaction chamber (12). A microwave power supply (18) is also fixedly installed above the reaction chamber (12) by bolts. A sample stage (23) is also placed inside the reaction chamber (12). A clamping groove (24) is provided on both sides of the sample stage (23). A rack (25) is fixedly connected below the sample stage (23). A robotic arm (30) is also fixedly installed above the inner wall of the reaction chamber (12) by bolts. A resonant cavity (31) is fixedly clamped in the gripper of the robotic arm (30).

2. The microwave jetting apparatus for preparing diamond according to claim 1, characterized in that, Below the placement platform (1), there are arrayed support columns. Below the placement platform (1), there is also a fixedly connected mounting bracket (11). The reaction chamber (12) and the venting tank (15) are both fixed to the placement platform (1) by bolts. A pressure gauge is installed above the venting tank (15). Above the venting tank (15), there is also a gas supply pipe (16) with internal communication. A regulating valve (17) is installed on the outside of the gas supply pipe (16).

3. The microwave jetting apparatus for preparing diamond according to claim 1, characterized in that, The reaction chamber (12) is provided with a rotating sealing door (13) at the sample inlet. An observation window (14) is fixedly installed inside the sealing door (13). A threaded heat dissipation pipe (20) is also embedded inside the reaction chamber (12). Both ends of the threaded heat dissipation pipe (20) are fixedly provided with connecting pipes (19).

4. The microwave jetting apparatus for preparing diamond according to claim 3, characterized in that, The connecting pipe (19) extends out of the outside of the reaction chamber (12). The bottom of the inner wall of the placement platform (1) is provided with a sliding groove (22). The bottom of the inner wall of the placement platform (1) is also provided with symmetrically distributed arc-shaped blocks (21). The arc-shaped blocks (21) and the reaction chamber (12) are integrally formed.

5. The microwave jetting apparatus for preparing diamond according to claim 1, characterized in that, The reaction chamber (12) is also provided with a rotatably connected connecting rod (26). One end of the connecting rod (26) is provided with an integrally formed hand-tightening part, and the other end of the connecting rod (26) is provided with a fixedly connected spur gear (27). The spur gear (27) meshes with a rack (25), and the rack (25) is inserted into a sliding groove (22) and slidably connected to the sliding groove (22).

6. The microwave jetting apparatus for preparing diamond according to claim 2, characterized in that, The microwave power supply (18) has a fixedly connected waveguide (28) below the microwave nozzle. The other end of the waveguide (28) is inserted into the resonant cavity (31) and communicates with the inside of the resonant cavity (31). The other end of the gas supply pipe (16) has a fixedly connected air inlet pipe (29). The other end of the air inlet pipe (29) is inserted into the resonant cavity (31) and communicates with the inside of the resonant cavity (31).

7. The microwave jetting apparatus for preparing diamond according to claim 1, characterized in that, The bottom of the reaction chamber (12) is also provided with a fixedly connected and internally connected gas outlet pipe (32). One end of the gas outlet pipe (32) passes through the placement platform (1) and a pressure regulating valve (33) is fixedly provided on the outside. The other end of the gas outlet pipe (32) is provided with a fixedly connected vacuum pump (34). The vacuum pump (34) is installed inside the mounting bracket (11) by bolts.

Images