Protection device for evacuating pipeline or valve and chemical vapor deposition equipment

Abstract

The utility model discloses a protection device for evacuating a pipeline or a valve and chemical vapor deposition equipment. The evacuation pipeline is communicated with the high-temperature reaction chamber, a heating device is wound on the outer wall of the evacuation pipeline and / or the valve, and the heating device is wound on the outer wall of the evacuation pipeline or the valve and is subjected to temperature control, so that different temperatures can be adjusted according to different gas reactants in the high-temperature reaction chamber; therefore, the generation of dust or solid reactants on the inner wall of the evacuation pipeline or the inner wall of the valve is effectively reduced. Therefore, the problems of pipeline blockage and valve failure caused by dust accumulation are greatly reduced. Due to the fact that the heating device can effectively reduce dust accumulation, the maintenance period of the evacuation pipeline and the valve is prolonged. Therefore, the maintenance cost of the equipment is reduced, and the reliability and stability of the equipment are improved. The design of the utility model does not need to change the original arrangement of the evacuation pipeline and the valve, so that the device can be conveniently applied to the existing equipment, and large-scale equipment transformation or reconstruction does not need to be carried out.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition equipment, and in particular to a protective device for a vacuum pipe or valve and a chemical vapor deposition equipment. Background Technology

[0002] With the continuous development of the photovoltaic industry and the continuous upgrading of solar cell technology, equipment such as PECVD, PEALD, ALD, LPCVD, and PE-ploy are being used more and more widely in the production process of solar cells. At the same time, the requirements for equipment capacity are increasing, and the equipment maintenance cycle is becoming shorter, leading to a greater need to extend maintenance cycles, increase production capacity, and reduce the cost of solar cells. The proper functioning of the evacuation valve and exhaust valve can affect the length of the process run time; therefore, the length of the valve maintenance cycle determines a significant portion of the overall capacity. Internal leakage in the valves prolongs the evacuation time in the reaction chamber and results in the loss of a large amount of evacuated gas, leading to increased energy consumption.

[0003] In PECVD, PEALD, ALD, LPCVD, and PE-ploy equipment, process gases flow from the high-temperature reaction chamber (200-800℃) into the low-temperature evacuation pipeline (15-75℃). Some characteristic chemical gases in the reaction chamber may deposit or remain in the pipeline after cooling, further reacting to generate dust or other substances, causing valves to fail to seal properly or clogging the pipeline. Therefore, due to the characteristics of the process gases, existing PECVD, PEALD, ALD, LPCVD, and PE-ploy equipment cause dust accumulation in the evacuation pipeline and valves, resulting in the removal of air-purifying gases, unnecessary increase in energy consumption, cost, and process time, and reduced production capacity. Utility Model Content

[0004] In order to solve the technical problem of dust accumulation and blockage in the vacuum pipeline and valves of the prior art, this utility model proposes a protective device for the vacuum pipeline or valve and a chemical vapor deposition equipment.

[0005] The technical solution adopted in this utility model is:

[0006] This utility model proposes a protective device for a vacuum pipe or valve, wherein the vacuum pipe is connected to a high-temperature reaction chamber, and a heating device is wound around the outer wall of the vacuum pipe and / or valve.

[0007] Furthermore, the heating device is a heating wire.

[0008] Furthermore, the heating device is a heating belt.

[0009] Furthermore, the heating device also includes a temperature controller for adjusting the temperature of the heating device.

[0010] Furthermore, the valve is an air extraction valve.

[0011] Furthermore, the valve is an exhaust valve.

[0012] This utility model also proposes a chemical vapor deposition apparatus, including a protection device for the evacuation pipe or valve as described in any one of the claims.

[0013] Furthermore, the chemical vapor deposition equipment is a low-pressure chemical vapor deposition equipment.

[0014] Furthermore, the chemical vapor deposition equipment is a plasma-enhanced chemical vapor deposition equipment. Furthermore, the chemical vapor deposition equipment is an atomic layer deposition equipment.

[0015] Compared with existing technologies, this utility model discloses a protective device for a vacuum pipe or valve and a chemical vapor deposition (CVD) apparatus. The vacuum pipe connects to a high-temperature reaction chamber, and a heating device is wound around the outer wall of the vacuum pipe and / or valve. By winding the heating device around the outer wall of the vacuum pipe or valve and controlling its temperature, different temperatures can be adjusted for different gaseous reactants in the high-temperature reaction chamber, thereby effectively reducing the generation of dust or solid reactants on the inner wall of the vacuum pipe or valve. This significantly reduces pipe blockage and valve failure caused by dust accumulation. Because the heating device effectively reduces dust accumulation, the maintenance cycle of the vacuum pipe and valve is extended. This reduces equipment maintenance costs and improves equipment reliability and stability. The design of this utility model does not require changes to the original layout of the vacuum pipe and valve, therefore it can be easily applied to existing equipment without large-scale equipment modification or reconstruction. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the structure of an embodiment of the vacuum pipe of this utility model;

[0018] Figure 2 This is a schematic diagram of the structure of an embodiment of the vacuum valve of this utility model;

[0019] 1. Heating device; 2. Vacuuming pipe; 3. Vacuuming valve. Detailed Implementation

[0020] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0021] The principle and structure of this utility model will be described in detail below with reference to the accompanying drawings and embodiments.

[0022] With the continuous development of the photovoltaic industry and the continuous upgrading of solar cell technology, equipment such as PECVD, PEALD, ALD, LPCVD, and PE-ploy are being used more and more widely in the production process of solar cells. At the same time, the requirements for equipment capacity are increasing, and the equipment maintenance cycle is becoming shorter, leading to a greater need to extend maintenance cycles, increase production capacity, and reduce the cost of solar cells. The proper functioning of the evacuation valve and exhaust valve can affect the length of the process run time; therefore, the length of the valve maintenance cycle determines a significant portion of the overall capacity. Internal leakage in the valves prolongs the evacuation time in the reaction chamber and results in the loss of a large amount of evacuated gas, leading to increased energy consumption.

[0023] In PECVD, PEALD, ALD, LPCVD, and PE-ploy equipment, process gases flow from the high-temperature reaction chamber (200-800℃) into the low-temperature evacuation pipeline (15-75℃). Some characteristic chemical gases in the reaction chamber may deposit or remain in the pipeline after cooling, further reacting to generate dust or other substances, causing valves to fail to seal properly or clogging the pipeline. Therefore, due to the characteristics of the process gases, existing PECVD, PEALD, ALD, LPCVD, and PE-ploy equipment cause dust accumulation in the evacuation pipeline and valves, resulting in the removal of air-purifying gases, unnecessary increase in energy consumption, cost, and process time, and reduced production capacity.

[0024] like Figure 1-2 As shown, this utility model proposes a protective device for a vacuum pipe or valve. The vacuum pipe 2 connects to a high-temperature reaction chamber. A heating device 1 is wound around the outer wall of the vacuum pipe 2 and / or the valve. The heating device 1 is installed on the vacuum pipe 2 and / or the valve to heat it, ensuring that the heat can effectively act on the vacuum pipe 2 and / or the valve. Different temperatures are adjusted for different gaseous reactants in the high-temperature reaction chamber, effectively reducing the generation of dust or solid reactants on the outer wall of the vacuum pipe and / or the heating device. This heating device can effectively reduce the dust accumulation in the vacuum pipe without changing the arrangement of the vacuum pipe and valve, thereby improving maintenance cycles, increasing equipment utilization, and enhancing equipment productivity.

[0025] In this embodiment, the heating device 1 is a heating wire.

[0026] In another embodiment, the heating device 1 is a heating belt.

[0027] The heating device also includes a temperature controller for regulating the temperature of heating device 1. The temperature of heating device 1 can be adjusted to accommodate different gaseous reactants in the high-temperature reaction chamber, effectively reducing the generation of dust or solid reactants on the inner wall of the evacuation pipe or the inner wall of the main extraction valve.

[0028] In this embodiment, the temperature of the heating device 1 can be adjusted between 30-200°C. Different temperatures can be adjusted for different reactants in the high-temperature reaction chamber to effectively reduce the generation of dust or solid reactants on the inner wall of the evacuation pipe or the inner wall of the main extraction valve.

[0029] In this embodiment, the valve is a vacuum valve 3. In another embodiment, the valve is a vent valve.

[0030] This invention also proposes a chemical vapor deposition apparatus, including the protective device for the evacuation pipe 2 or valve of this invention.

[0031] In another embodiment, the chemical vapor deposition apparatus is a low-pressure chemical vapor deposition apparatus.

[0032] In another embodiment, the chemical vapor deposition apparatus is a plasma-enhanced chemical vapor deposition apparatus.

[0033] In another embodiment, the chemical vapor deposition apparatus is an atomic layer deposition apparatus.

[0034] Compared with existing technologies, this invention, by wrapping a heating device around the outer wall of the evacuation pipe or valve and controlling the temperature of the heating device, can adjust different temperatures for different gaseous reactants in the high-temperature reaction chamber, thereby effectively reducing the generation of dust or solid reactants on the inner wall of the evacuation pipe or valve. This greatly reduces pipe blockage and valve failure caused by dust accumulation. Because the heating device effectively reduces dust accumulation, it extends the maintenance cycle of the evacuation pipe and valve. This reduces equipment maintenance costs and improves equipment reliability and stability. The design of this invention does not require changes to the original layout of the evacuation pipe and valve, therefore it can be easily applied to existing equipment without large-scale equipment modification or reconstruction.

[0035] It should be noted that the terminology used above is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this utility model. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0036] Furthermore, it should be noted that the use of terms such as "first" and "second" to define components is merely for the purpose of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore cannot be construed as limiting the scope of protection of this utility model.

[0037] The above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A protection device for an evacuation conduit or valve, said evacuation conduit communicating a high temperature reaction chamber, characterized in that, The heating device is wound around the outer wall of the evacuation pipe and / or valve.

2. A protector for a vacuum line or valve as claimed in claim 1, characterised in that, The heating device is a heating wire.

3. A protector for a vacuum line or valve as claimed in claim 1, characterised in that, The heating device is a heating tape.

4. The protector for a vacuum conduit or valve as set forth in claim 1, wherein, The heating device further comprises a temperature controller for adjusting the temperature of the heating device.

5. The protector for a vacuum conduit or valve as set forth in claim 1, wherein, The valve is an evacuation valve.

6. The protector for a vacuum line or valve as set forth in claim 1, wherein The valve is an exhaust valve.

7. A chemical vapor deposition apparatus characterized by comprising: A protection device comprising the evacuation pipe or valve according to any one of claims 1-6.

8. The chemical vapor deposition apparatus of claim 7, wherein the substrate is a semiconductor wafer. The chemical vapor deposition apparatus is a low pressure chemical vapor deposition apparatus.

9. The chemical vapor deposition apparatus of claim 7, wherein the substrate is a semiconductor wafer. The chemical vapor deposition apparatus is a plasma enhanced chemical vapor deposition apparatus.

10. The chemical vapor deposition apparatus of claim 7, wherein the substrate is a semiconductor wafer. The chemical vapor deposition apparatus is an atomic layer deposition apparatus.

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