Storage rack for wiping and cleaning substrates
By designing an adjustable substrate holder with adjustable angles and distances, the problem of wiping large substrates was solved, enabling multi-angle cleaning confirmation and stable clamping, thus improving the substrate cleaning effect.
Patent Information
- Application Number
- CN202520395076.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-07
- Publication Date
- 2026-01-09
- Estimated Expiration
- 2035-03-07
AI Technical Summary
In existing technologies, when the substrate diameter is greater than 130mm, it is difficult to hold and wipe it by hand, making it impossible to confirm the cleaning effect from different angles, and large substrates are prone to dust accumulation when placed horizontally.
A mounting rack for wiping and cleaning substrates was designed. The clamping plate is slidably connected by an adjustment groove and an adjustment rod, which allows for adjustment of the angle and distance of the clamping plate to accommodate substrates of different sizes. It is fixed by locking bolts to ensure stable clamping.
It enables multi-angle cleaning confirmation, prevents dust from falling back onto wiped areas, adapts to stable clamping of substrates of different sizes, and improves substrate cleaning efficiency.
Smart Images
Figure CN223777154U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of optical component processing technology, specifically, it relates to a holder for wiping and cleaning substrates. Background Technology
[0002] Before applying adhesive and other subsequent processes, the substrate needs to be manually wiped clean to remove dust, fingerprints and other marks from the surface.
[0003] When wiping a standard-sized substrate, you usually hold the top and bottom edges of the substrate with your fingers to hold it at a certain angle for wiping. When the substrate diameter is greater than 130mm, it is difficult or even impossible to hold the substrate completely with your hand. The substrate can only be placed horizontally for wiping. Therefore, it is impossible to check from different angles whether the substrate has been completely wiped clean during the wiping process.
[0004] To address the aforementioned issues, this application proposes a holder for wiping and cleaning substrates. Utility Model Content
[0005] In view of the problems in the related technologies, this utility model proposes a placement rack for wiping and cleaning substrates, so as to overcome the above-mentioned technical problems existing in the existing related technologies.
[0006] To achieve the above objectives, the present invention adopts the following technical solution:
[0007] A holder for wiping and cleaning substrates includes a vertical rod, a horizontal rod fixedly connected to the bottom of the vertical rod, a connecting rod fixedly connected to the outer side wall of the horizontal rod, and adjustment grooves provided on the outer side walls of both the vertical rod and the horizontal rod. A first adjustment rod is slidably connected to the vertical rod through the adjustment groove, and a second adjustment rod is slidably connected to the horizontal rod through the adjustment groove. A left clamping plate and a right clamping plate are sleeved on the outer side wall of the first adjustment rod, and a support plate is sleeved on the outer side wall of the second adjustment rod.
[0008] Preferably, the adjusting groove is a long rectangular through hole or a long elliptical through hole, and both ends of the first adjusting rod and the second adjusting rod are provided with locking bolts.
[0009] Preferably, the outer wall of the first adjusting rod is provided with a bidirectional threaded groove, and the first adjusting rod is threadedly connected to the left clamping plate and the right clamping plate through the bidirectional threaded groove.
[0010] Preferably, the outer side walls of the left clamping plate and the right clamping plate are provided with limiting grooves, and the outer side wall of the support plate is provided with a support groove.
[0011] Preferably, both sides of the tray are fixedly connected to shrink columns, and the ends of the two shrink columns away from the tray are fixedly connected to the left clamping plate and the right clamping plate near the tray, respectively.
[0012] Preferably, the tray has a rotating groove inside, and the tray has a positioning groove through the rotating groove. A positioning ring is fixedly connected to the center of the outer side wall of the second adjusting rod.
[0013] In summary, the technical effects and advantages of this utility model are as follows: This mounting rack for wiping and cleaning substrates, through the arrangement of a first adjusting rod, an adjusting groove, a left clamping plate, a right clamping plate, a support plate, and a second adjusting rod, allows for adjustment of the tilt angle of the left and right clamping plates when the first and second adjusting rods slide within the adjusting groove. This enables adjustment of the substrate angle within a certain range, facilitating multi-angle confirmation of substrate cleanliness and significantly preventing dust from re-accumulating on wiped areas. Furthermore, by adjusting the distance between the left and right clamping plates, it can be adapted to substrates of different sizes. Attached Figure Description
[0014] Figure 1 This is a three-dimensional structural diagram of the present invention;
[0015] Figure 2 This is a schematic diagram of the positioning ring and related structures of this utility model;
[0016] Figure 3 This is a schematic diagram of the rotating groove and related structures of this utility model.
[0017] In the diagram: 1. Vertical rod; 2. Horizontal rod; 3. First adjusting rod; 4. Adjusting groove; 5. Locking bolt; 6. Connecting rod; 7. Left clamping plate; 8. Right clamping plate; 9. Support plate; 10. Bidirectional threaded groove; 11. Limiting groove; 12. Support groove; 13. Contraction column; 14. Rotation groove; 15. Positioning groove; 16. Positioning ring; 17. Second adjusting rod. Detailed Implementation
[0018] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.
[0019] Reference Figure 1-3A holder for wiping and cleaning substrates includes a vertical rod 1, a horizontal rod 2 fixedly connected to the bottom of the vertical rod 1, and a connecting rod 6 fixedly connected to the outer side wall of the horizontal rod 2. Adjustment grooves 4 are provided on the outer side walls of both the vertical rod 1 and the horizontal rod 2. A first adjusting rod 3 is slidably connected to the vertical rod 1 through the adjustment grooves 4, and a second adjusting rod 17 is slidably connected to the horizontal rod 2 through the adjustment grooves 4. A left clamping plate 7 and a right clamping plate 8 are sleeved on the outer side wall of the first adjusting rod 3, and a support plate 9 is sleeved on the outer side wall of the second adjusting rod 17. The first adjusting rod 3 and the second adjusting rod 17 are connected by adjusting the first adjusting rod 3 and the second adjusting rod 17. The adjusting rod 17 moves inside the adjusting groove 4, thereby adjusting the tilt angle of the left clamping plate 7 and the right clamping plate 8. The movement of the left clamping plate 7 and the right clamping plate 8 on the outer walls of the first adjusting rod 3 and the second adjusting rod 17 can adjust the distance between the left clamping plate 7 and the right clamping plate 8, which can be adapted to substrates of different sizes. The left clamping plate 7, the right clamping plate 8 and the support plate 9 can better clamp and fix the substrate, thereby effectively wiping and cleaning the substrate, and allowing for comprehensive confirmation of the substrate's cleaning degree.
[0020] Reference Figure 1-2 The adjusting groove 4 is a long rectangular or long elliptical through hole. Both ends of the first adjusting rod 3 and the second adjusting rod 17 are provided with locking bolts 5. The locking bolts 5 can limit and fix the ends of the first adjusting rod 3 and the second adjusting rod 17 to prevent them from loosening. By making the adjusting groove 4 a long through hole, the first adjusting rod 3 and the second adjusting rod 17 can slide inside the adjusting groove 4, thereby adjusting the angle of the left clamping plate 7 and the right clamping plate 8. Furthermore, by adapting the width of the adjusting groove 4 to the outer wall of the first adjusting rod 3 and the second adjusting rod 17, the first adjusting rod 3 and the second adjusting rod 17 can move linearly, preventing them from shaking during movement.
[0021] Reference Figure 1-2 The outer side wall of the first adjusting rod 3 is provided with a bidirectional threaded groove 10. The first adjusting rod 3 is threadedly connected to the left clamping plate 7 and the right clamping plate 8 through the bidirectional threaded groove 10. The bidirectional threaded groove 10 on the outer side wall of the first adjusting rod 3 can make the support plate 9 located between the left clamping plate 7 and the right clamping plate 8 when the distance is adjusted, so that the left clamping plate 7 and the right clamping plate 8 can move in opposite directions at the same time, which makes it easier to fix the substrate in the middle part of the device.
[0022] Reference Figure 1-2The outer side walls of the left clamping plate 7 and the right clamping plate 8 are provided with limiting grooves 11, and the outer side wall of the tray 9 is provided with a tray groove 12. The limiting grooves 11 on the outer side walls of the left clamping plate 7 and the right clamping plate 8 and the tray groove 12 on the outer side wall of the tray 9 are located on the same plane, so that the substrate can remain stable when placed inside the limiting grooves 11 and the tray groove 12, and prevent the substrate from shaking during wiping.
[0023] Reference Figure 3 Both sides of the support plate 9 are fixedly connected with retractable columns 13. The ends of the two retractable columns 13 away from the support plate 9 are fixedly connected to the sides of the left clamping plate 7 and the right clamping plate 8 that are close to the support plate 9, respectively. The retractable columns 13 installed on both sides of the support plate 9 are connected to the left clamping plate 7 and the right clamping plate 8, respectively, so that when the left clamping plate 7 and the right clamping plate 8 are adjusted, the angle of the support plate 9 can be adjusted synchronously, so that the limiting groove 11 and the support groove 12 are always located on the same plane. The retractable columns 13 can extend and retract when the left clamping plate 7 and the right clamping plate 8 are moved.
[0024] Reference Figure 2-3 The tray 9 has a rotating groove 14 inside, and a positioning groove 15 is formed in the tray 9 through the rotating groove 14. A positioning ring 16 is fixedly connected to the center of the outer wall of the second adjusting rod 17. The rotating groove 14 inside the tray 9 is adapted to the outer wall of the second adjusting rod 17, so that the tray 9 can rotate around the second adjusting rod 17. By adapting the positioning ring 16 fixedly installed on the outer wall of the second adjusting rod 17 to the positioning groove 15, the tray 9 can be limited, so that the tray 9 is always located at the center of the outer wall of the second adjusting rod 17.
[0025] Working principle: By rotating the first adjusting rod 3, the left clamping plate 7 and the right clamping plate 8 move in opposite directions, adjusting the distance between the left clamping plate 7 and the right clamping plate 8 so that the substrate can be placed inside the limiting groove 11 opened on the outer side wall of the left clamping plate 7 and the right clamping plate 8, and the left clamping plate 7 and the right clamping plate 8 can clamp and fix the substrate. By sliding the first adjusting rod 3 and the second adjusting rod 17 inside the adjusting groove 4, the angle of the left clamping plate 7 and the right clamping plate 8 can be adjusted, thereby adjusting the angle of the substrate. After the angle is adjusted, the first adjusting rod 3 and the second adjusting rod 17 are fixed by the locking bolt 5 to prevent the first adjusting rod 3 and the second adjusting rod 17 from loosening, thereby effectively wiping and cleaning the substrate.
[0026] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A holder for wiping and cleaning substrates, comprising a vertical rod (1), characterized in that, The bottom of the vertical rod (1) is fixedly connected to a horizontal rod (2), and the outer side wall of the horizontal rod (2) is fixedly connected to a connecting rod (6). The outer side walls of both the vertical rod (1) and the horizontal rod (2) are provided with adjustment grooves (4). The vertical rod (1) is slidably connected to a first adjustment rod (3) through the adjustment grooves (4), and the horizontal rod (2) is slidably connected to a second adjustment rod (17) through the adjustment grooves (4). The outer side wall of the first adjustment rod (3) is fitted with a left clamping plate (7) and a right clamping plate (8), and the outer side wall of the second adjustment rod (17) is fitted with a support plate (9).
2. The holder for wiping and cleaning substrates according to claim 1, characterized in that, The adjustment groove (4) is a long rectangular through hole or a long elliptical through hole, and locking bolts (5) are provided at both ends of the first adjustment rod (3) and the second adjustment rod (17).
3. The holder for wiping and cleaning substrates according to claim 1, characterized in that, The outer side wall of the first adjusting rod (3) is provided with a bidirectional threaded groove (10), and the first adjusting rod (3) is threadedly connected to the left clamping plate (7) and the right clamping plate (8) through the bidirectional threaded groove (10).
4. The holder for wiping and cleaning substrates according to claim 1, characterized in that, The outer side walls of the left clamping plate (7) and the right clamping plate (8) are provided with limiting grooves (11), and the outer side wall of the support plate (9) is provided with a support groove (12).
5. A holder for wiping and cleaning substrates according to claim 1, characterized in that, Both sides of the tray (9) are fixedly connected with shrink columns (13), and the ends of the two shrink columns (13) away from the tray (9) are fixedly connected to the left clamping plate (7) and the right clamping plate (8) near the tray (9), respectively.
6. The holder for wiping and cleaning substrates according to claim 1, characterized in that, The tray (9) has a rotating groove (14) inside, and the tray (9) has a positioning groove (15) through the rotating groove (14). A positioning ring (16) is fixedly connected to the center of the outer side wall of the second adjusting rod (17).