Lens structure of display device

Abstract

The utility model discloses a display device lens structure which comprises a bottom layer TFE structure, a color filter, a high refractive index film layer and a lens body which are sequentially arranged from bottom to top. The color filter, the high-refractive-index film layer and the lens body form a stepped optical structure. The display device lens is reasonable in structural design, under the condition that the general structure is not changed, the high-refractive-index material is deposited on the CF in an evaporation mode to form the step bottom layer, then the step lens is manufactured on the basis, the light emitting efficiency can be improved through the structure, and the light emitting loss is effectively reduced.

Description

Technical Field

[0001] This utility model relates to the field of display device technology, and in particular to a lens structure for a display device. Background Technology

[0002] With the continuous maturation of OLED (Organic Light Emitting Diode) technology, OLED displays, based on the principle of self-emission, possess significant advantages in display effect, response speed, and thinness, and are applied in smartphones, televisions, laptops, and smart wearable devices. Compared to traditional AMOLED display technology, micro-OLED is widely used in the VR and AR fields, and currently, mainstream VR and AR products all use micro-OLED displays.

[0003] Especially for color displays, it's difficult to achieve high-resolution screen manufacturing using traditional FMM technology. Currently, high-resolution and color displays are mainly achieved through white OLEDs paired with color filters. However, in this method, over 50% of the light emitted by the OLED is lost after passing through the color filter, making it difficult to achieve high brightness. For the panel industry (such as mobile phones), a PPI of around 500 is sufficient, and FMM manufacturing is feasible and mass-producible at this PPI. However, for silicon-based OLEDs, a minimum PPI of 2000 or higher is required, making FMM manufacturing extremely difficult and impossible to produce. Figure 9 As shown, existing display lens structures are made of relatively thick materials, the light-emitting position is far from the light-emitting point, and the light loss is relatively high.

[0004] For example, patent CN101211934A discloses an image sensor including a filter layer with red, green, and blue filters; a planarization layer formed on the filter layer and having grooves corresponding to the boundary regions between the filters; and a microlens array located on the planarization layer; its optical path and Figure 9 Similar to the example shown, the light loss is relatively greater. Utility Model Content

[0005] To address the shortcomings of existing technologies, this utility model provides a lens structure for a display device, aiming to effectively reduce light loss.

[0006] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows:

[0007] The lens structure of this display device includes a bottom TFE structure, a color filter, a high refractive index film, and a lens body. The bottom TFE structure, color filter, high refractive index film, and lens body are arranged sequentially from bottom to top, and the color filter, high refractive index film, and lens body form a stepped optical structure.

[0008] Further or preferred:

[0009] The color filter includes a blue filter, a green filter, and a red filter, which are arranged in a stepped manner.

[0010] A lower photoresist layer is provided between the bottom TFE structure and the color filter, and an upper photoresist layer is provided on the lens body.

[0011] The refractive index of the high refractive index film ranges from 1.8 to 2.3.

[0012] The high refractive index film is a silicon nitride layer, a silicon oxide layer, or an indium tin oxide layer.

[0013] The thickness of the high refractive index film ranges from 1 to 3 μm.

[0014] The high refractive index films on the blue, green, and red filters are arranged in a stepped manner.

[0015] The thickness of the lower photoresist layer is less than the thickness of the upper photoresist layer.

[0016] The lens bodies corresponding to the blue filter, green filter and red filter are each provided with an independent lens body at intervals.

[0017] Each of the individual lens bodies is arranged in a stepped manner.

[0018] Compared with the prior art, this utility model has the following advantages:

[0019] The display device has a reasonable lens structure design. Without changing the overall structure, a stepped bottom layer is formed by evaporating and depositing a high-refractive-index material on the CF, and then a stepped lens is made on this basis. This structure can improve the light extraction efficiency and effectively reduce light loss. Attached Figure Description

[0020] The following is a brief explanation of the contents of each of the accompanying drawings and the markings in the drawings:

[0021] Figure 1 This is a schematic diagram of the encapsulation structure of this utility model after the adhesive has been applied and cured.

[0022] Figure 2 In order to be in Figure 1 A schematic diagram of the solidified state after the B-pixel is created.

[0023] Figure 3 In order to be in Figure 2 A schematic diagram of the solidified G-pixel image based on the original image.

[0024] Figure 4 In order to be in Figure 3 A schematic diagram of the solidified R-pixel based on the original image.

[0025] Figure 5 In order to be in Figure 4 A schematic diagram of silicon nitride deposition on the substrate.

[0026] Figure 6 In order to be in Figure 5 A schematic diagram of the lens body composite based on the above.

[0027] Figure 7 In order to be in Figure 6 A schematic diagram of the photoresist after curing.

[0028] Figure 8 This is a schematic diagram of the structured light path of this utility model.

[0029] Figure 9 This is a schematic diagram of an existing structured light path. Detailed Implementation

[0030] The specific embodiments of this utility model will be further described in detail below with reference to the accompanying drawings and through the description of the examples.

[0031] like Figures 1 to 7 As shown, the lens structure of the display device includes a bottom TFE structure, a color filter, a high refractive index film layer, and a lens body, which are arranged sequentially from bottom to top; the color filter, the high refractive index film layer, and the lens body form a stepped optical structure.

[0032] This utility model presents a display device with a rationally designed lens structure. Without altering the overall structure, a stepped underlayer is formed by depositing a high-refractive-index material on the color filter (CF), and then a stepped lens is fabricated on top of this. This structure improves light extraction efficiency and effectively reduces light loss. Figure 8 As shown.

[0033] Further:

[0034] Color filters include blue filters, green filters, and red filters; the blue, green, and red filters are arranged side by side in sequence, and the blue, green, and red filters are arranged in a stepped manner.

[0035] The high refractive index film is a silicon nitride layer, a silicon oxide layer, or an indium tin oxide layer; preferably a silicon nitride layer; furthermore, the thickness of the high refractive index film ranges from 1 to 3 μm, and the refractive index of the high refractive index film ranges from 1.8 to 2.3.

[0036] The high refractive index films on the blue, green, and red filters are arranged in a stepped manner; specifically, a silicon nitride layer is deposited on the blue filter B, a silicon nitride layer is deposited on the green filter G, and a silicon nitride layer is deposited on the red filter R, with each silicon nitride layer arranged in a stepped manner.

[0037] The lens bodies corresponding to the blue filter, green filter and red filter are independent lens bodies arranged at intervals; each of the independent lens bodies is arranged in a stepped manner.

[0038] A lower photoresist layer is provided between the bottom TFE structure and the color filter, and an upper photoresist layer is provided on the lens body; the thickness of the lower photoresist layer is less than the thickness of the upper photoresist layer, which can be reduced.

[0039] This invention uses inorganic silicon nitride to be deposited on a photoresist condenser (CF). The refractive index is higher than that of a normal spin-coated photoresist. The silicon nitride layer is 2-3 μm thick, while the thickness of ordinary photoresist is only 1-2 μm, and the thickness can be reduced. Since silicon nitride does not have leveling properties, it will form a stepped morphology due to the step difference of the CF. On this basis, a lens can be made by etching or photolithography, which will be closer to the light emission point and reduce light loss. This solution can be used in the field of OLED color display, including AMOLED and micro-OLED.

[0040] The fabrication process for the lens structure of a display device is as follows:

[0041] For the incoming packaging structure, photoresist is spin-coated and then cured in an oven. Figure 1 ;

[0042] Then, spin-coating of the B-CF (blue filter) is performed, followed by exposure to leave only the B-CF on the B-pixel and its surrounding area, and then curing in an oven. Figure 2 ;

[0043] Then, G-CF (green filter) spin-coating is performed, followed by exposure to leave only the G-CF on the G pixels and the surrounding area, and then curing in an oven. Figure 3 ;

[0044] Then, spin-coating of the R-CF (red filter) is performed, followed by exposure to leave only the R-CF on the R pixels and the surrounding area, and then curing in an oven. Figure 4 ;

[0045] Then, silicon nitride is deposited by CVD vapor deposition, such as... Figure 5 ;

[0046] Then, the LENS (lens body) is fabricated onto silicon nitride using etching or photolithography techniques to form the stepped structure required in this patent, such as... Figure 6 ;

[0047] Taking advantage of the self-leveling properties of photoresist, photoresist is spin-coated and then cured in an oven. Figure 7 .

[0048] This patented technology transforms photoresist into a convex lens shape through dry etching / photolithography, and the material refractive index condition is met, which can reduce light loss to a certain extent and reduce the thickness.

[0049] The above description is only a preferred embodiment of the present utility model. The above technical features can be arbitrarily combined to form multiple embodiments of the present utility model.

[0050] The present invention has been described above with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the concept and technical solution of the present invention, or the direct application of the concept and technical solution of the present invention to other occasions without modification, are all within the protection scope of the present invention.

Claims

1. A display device lens structure comprising a bottom TFE structure, a color filter, a high refractive index film layer and a lens body, the bottom TFE structure, the color filter, the high refractive index film layer and the lens body are sequentially arranged from bottom to top, characterized in that: The color filter, the high-refractive film layer and the lens body form a stepped optical structure. ​ 2. The display device lens structure of claim 1, wherein: The color filter comprises a blue filter, a green filter and a red filter, and the blue filter, the green filter and the red filter are arranged in a stepped manner.

3. The display device lens structure of claim 1, wherein: A lower photoresist layer is arranged between the bottom TFE structure and the color filter, and an upper photoresist layer is arranged on the lens body.

4. The display device lens structure of claim 1, wherein: The refractive index of the high-refractive film layer ranges from 1.8 to 2.

3.

5. The display device lens structure as described in claim 1, characterized in that: The high-refractive film layer is a silicon nitride layer, a silicon oxide layer or an indium tin oxide layer.

6. The display device lens structure of claim 1, wherein: The thickness of the high-refractive film layer ranges from 1 to 3 micrometers.

7. The display device lens structure of claim 2, wherein: The high-refractive film layer on the blue filter, the green filter and the red filter is arranged in a stepped manner.

8. The display device lens structure of claim 3, wherein: The thickness of the lower photoresist layer is less than that of the upper photoresist layer.

9. The display device lens structure of claim 7, wherein: The lens bodies corresponding to the blue filter, the green filter and the red filter are independently arranged.

10. The display device lens structure of claim 9, wherein: Each of the independent lens bodies is arranged in a stepped manner.

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