Display panel and display device

Abstract

The utility model provides a display panel and a display device, and belongs to the technical field of display. The display panel comprises a substrate, a pixel limiting layer and a plurality of light emitting devices, wherein the pixel limiting layer and the light emitting devices are arranged on the substrate; the light-emitting device comprises a first electrode, a light-emitting function layer and a second electrode which are sequentially arranged in the direction away from the substrate. The light-emitting functional layer at least comprises a light-emitting layer and a common transmission layer; the common transmission layer of each light-emitting device is shared; the pixel defining layer comprises a plurality of pixel openings and retaining wall structures used for forming the pixel openings; at least a portion of the light emitting layer is defined within the pixel opening; at least one groove is formed in the retaining wall structure between at least part of adjacent pixel openings, the groove is located in the surface of the side, away from the substrate, of the retaining wall structure, and the public transmission layer is located in a first sub-part, away from the substrate, of the retaining wall structure and is sunken in the groove.

Description

TECHNICAL FIELD

[0001] The present disclosure belongs to the technical field of display, and particularly relates to a display panel and a display device. BACKGROUND

[0002] OLED light-emitting device is a light-emitting device that light is generated by recombination of holes generated by an anode and electrons generated by a cathode in an organic light-emitting material between the two. The common transport layer in different color light-emitting devices is deposited in an integral layer, and the common transport layer greatly promotes the transport of electrons and / or holes, which may cause lateral leakage, which may cause another color OLED device to emit light when driving a certain color OLED device, so that the final single color displayed by the display panel is not pure enough, and further causes partial white balance deviation, affecting the display effect. CONTENT OF THE UTILITY MODEL

[0003] The present disclosure aims to at least solve one of the technical problems existing in the prior art, and provide a display panel and a display device.

[0004] In a first aspect, a display panel is provided to solve the technical problems of the present disclosure. The display panel comprises a substrate, a pixel definition layer disposed on the substrate, and a plurality of light-emitting devices; the light-emitting device comprises a first electrode, a light-emitting functional layer, and a second electrode disposed in sequence away from the substrate; the light-emitting functional layer comprises at least a light-emitting layer and a common transport layer; the common transport layer of each light-emitting device is shared.

[0005] The pixel definition layer comprises a plurality of pixel openings and a barrier structure for forming the pixel openings; at least part of the light-emitting layer is defined within the pixel opening; at least one groove is provided in the barrier structure between at least part of the adjacent pixel openings, the groove is located on the surface of the barrier structure away from the substrate, and the common transport layer is recessed in the groove in the first subpart of the barrier structure away from the substrate.

[0006] In some embodiments, the groove comprises a first sidewall and a bottom wall, the first subpart comprises a first subpart covering the first sidewall and a second subpart covering the bottom wall, and the first subpart and the second subpart are an integral structure.

[0007] In some embodiments, the dihedral angle formed between the first surface where the first sidewall is located and the second surface where the bottom wall is located is greater than 90°.

[0008] In some embodiments, the height of the barrier structure is greater than the thickness of the common transport layer; and the depth of the groove is greater than the thickness of at least one sub-film layer in the common transport layer.

[0009] In some embodiments, the depth of the recess is less than the thickness of the light-emitting functional layer.

[0010] In some embodiments, the projection on the substrate of any adjacent center line of the pixel openings passes through the projection on the substrate of at least one of the recesses.

[0011] In some embodiments, any two adjacent recesses are spaced apart.

[0012] In some embodiments, the projection on the substrate of the recesses surrounds the projection on the substrate of the light-emitting device.

[0013] In some embodiments, the first subpart is interrupted by the recess in at least a partial thickness.

[0014] In some embodiments, the recess comprises a first sidewall and a bottom wall, and a dihedral angle between a first surface on which the first sidewall is located and a second surface on which the bottom wall is located is less than 85°.

[0015] In some embodiments, a part of the projection on the substrate of the center line of adjacent pixel openings passes through the projection on the substrate of at least one of the recesses, and a part of the projection on the substrate of the center line of adjacent pixel openings does not overlap with the projection on the substrate of the recess.

[0016] In some embodiments, each of the recesses on the barrier structure is spaced apart.

[0017] In some embodiments, a second sidewall in the barrier structure for defining the pixel opening interrupts at least a partial thickness of the common transport layer.

[0018] In some embodiments, the second sidewall comprises a side surface close to the pixel opening, and a part of the side surface is a concave surface.

[0019] In some embodiments, the side surface of the second sidewall close to the pixel opening is a flat third surface, and a dihedral angle between the third surface and a fourth surface parallel to the substrate is less than 85°.

[0020] In some embodiments, the second electrodes of each of the light-emitting devices are connected as an integral structure.

[0021] In a second aspect, the display panel in any one of the first aspect is also provided in the embodiments of the present disclosure. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1aA schematic diagram of a display panel according to an embodiment of the present disclosure.

[0023] Figure 1b A schematic diagram of a display panel according to an embodiment of the present disclosure. Figure 1a A luminescence spectrum diagram of the display panel according to an embodiment of the present disclosure.

[0024] Figure 2a A schematic diagram of a display panel according to an embodiment of the present disclosure.

[0025] Figure 2b A schematic diagram of a display panel according to an embodiment of the present disclosure. Figure 2a A partial enlarged view of the Q1 region in the display panel according to an embodiment of the present disclosure.

[0026] Figure 3 A schematic diagram of a recess according to an embodiment of the present disclosure.

[0027] Figure 4 A schematic diagram of a single-layer light-emitting device according to an embodiment of the present disclosure.

[0028] Figure 5 A schematic diagram of a series light-emitting device according to an embodiment of the present disclosure.

[0029] Figure 6 A planar schematic diagram of a recess distribution according to an embodiment of the present disclosure.

[0030] Figure 7 A planar schematic diagram of another recess distribution according to an embodiment of the present disclosure.

[0031] Figure 8a A schematic diagram of a display panel according to an embodiment of the present disclosure.

[0032] Figure 8b A schematic diagram of a display panel according to an embodiment of the present disclosure. Figure 8a A partial enlarged view of the Q2 region in the display panel according to an embodiment of the present disclosure.

[0033] Figure 9 A planar schematic diagram of a luminescent functional layer in a display panel according to an embodiment of the present disclosure.

[0034] Figure 10 A planar schematic diagram of another recess distribution according to an embodiment of the present disclosure.

[0035] Figure 11 A schematic diagram of a display panel according to an embodiment of the present disclosure.

[0036] Figure 12 A schematic diagram of a barrier structure in a display panel according to an embodiment of the present disclosure.

[0037] Figure 13 A luminescence spectrum diagram of the display panel according to an embodiment of the present disclosure.

[0038] Figure 14 A schematic diagram of a display panel under Example 4 provided by an embodiment of the present disclosure.

[0039] Figure 15 A schematic diagram of a barrier structure in a display panel under Example 4 improved by an embodiment of the present disclosure.

[0040] Figure 16 A schematic diagram of a display panel under Example 5 provided by an embodiment of the present disclosure.

[0041] Figure 17 A schematic diagram of a display panel under Example 6 provided by an embodiment of the present disclosure.

[0042] Figure 18 A schematic diagram of a display panel under Example 7 provided by an embodiment of the present disclosure.

[0043] Figures 19a to 19f A process flow diagram of an undercut structure provided by an embodiment of the present disclosure. DETAILED DESCRIPTION

[0044] In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions in the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only a part of the embodiments of the present disclosure, rather than all the embodiments. The components of the embodiments of the present disclosure described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present disclosure provided in the drawings is not intended to limit the scope of the claimed present disclosure, but only represents selected embodiments of the present disclosure. Based on the embodiments of the present disclosure, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present disclosure.

[0045] Unless otherwise defined, technical terms or scientific terms used in the present disclosure shall have the ordinary meaning as understood by a person having ordinary skill in the art to which the present disclosure pertains. The terms "first", "second", and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. Similarly, the terms "one", "a", or "the" and similar terms do not denote a quantity of any number, but mean the existence of at least one. The terms "include", "comprise", and similar terms mean that the elements or objects before the term encompass the elements or objects listed after the term and equivalents thereof, and do not exclude other elements or objects. The terms "connected" or "linked" and similar terms do not mean only physical or mechanical connections, but can include electrical connections, whether direct or indirect. The terms "upper", "lower", "left", "right", and the like are used only to indicate relative positional relationships, and when the absolute positions of the described objects are changed, the relative positional relationships can also be changed accordingly.

[0046] In the present disclosure, "a plurality of or several" means two or more. The term "and / or" describes an association relationship between associated objects, which means that there can be three relationships, for example, A and / or B can mean that A exists alone, A and B exist together, and B exists alone. The character " / " generally represents an "or" relationship between the associated objects before and after it.

[0047] In the related art, as shown in Figure 1a The light-emitting device 2 includes an anode AND, a light-emitting layer EML, and a cathode CTD. In order to improve the carrier (hole and / or electron) transport efficiency and thus improve the light-emitting efficiency, the light-emitting device 2 further includes a common transport layer 24 for assisting the transport of holes and / or electrons, such as a hole transport layer (HTL, not shown in the figure) and an electron transport layer (ETL, not shown in the figure). Among them, the hole transport layer (HTL) has a great promoting effect on the transport of holes, and the electron transport layer (ETL) has a great promoting effect on the transport of electrons. As a result, it may cause lateral leakage between adjacent light-emitting devices 2, so that when driving a light-emitting device 2 of a certain color, a light-emitting device 2 of another color also emits light, causing the single-color display to be not pure enough, and thus causing partial white balance to deviate, affecting the display effect. Moreover, when the light-emitting layers EML of adjacent light-emitting devices 2 overlap due to process fluctuations, lateral leakage may also occur, causing color mixing, as shown in Figure 1b When the green light-emitting device G is turned on, the red light-emitting device R is also turned on, causing red-green color mixing. Among them, the abscissa represents the wavelength, and the ordinate represents the luminous intensity.

[0048] In view of this, the display panel provided by the embodiments of the present disclosure substantially reduces the transport efficiency of carriers (holes and / or electrons) by increasing the resistance of the common transport layer 24 shared by each light emitting device 2, thereby reducing the lateral leakage and improving the display effect.

[0049] Specifically, Figure 2a A schematic diagram of the display panel under Example 1 provided by the embodiments of the present disclosure is shown in FIG. 1. Figure 2b For Figure 2a A partial enlarged view of the Q1 region is shown in FIG. 2. Figure 2a As shown in FIG. 1, the display panel includes a substrate 1, a pixel definition layer PDL disposed on the substrate 1, and a plurality of light emitting devices 2. The light emitting device 2 includes a first electrode 21, a light emitting functional layer 23, and a second electrode 22 disposed in sequence in a direction away from the substrate 1. One of the first electrode 21 and the second electrode 22 is an anode AND, and the other is a cathode CTD. For ease of understanding, the embodiments of the present disclosure take the first electrode 21 as the anode AND and the second electrode 22 as the cathode CTD as an example for description. The light emitting functional layer 23 includes at least a light emitting layer EML and a common transport layer 24. The common transport layer 24 of each light emitting device 2 is shared.

[0050] Optionally, the plurality of light emitting devices 2 includes a red light emitting device R, a green light emitting device G, and a blue light emitting device B. The common transport layer 24 of the red light emitting device R, the common transport layer 24 of the green light emitting device G, and the common transport layer 24 of the blue light emitting device B are shared. The red light emitting layer R-EML in the red light emitting device R, the green light emitting layer G-EML in the green light emitting device G, and the blue light emitting layer B-EML in the blue light emitting device B are arranged with a spacing therebetween or partially overlap due to process effects.

[0051] Optionally, the common transport layer 24 includes at least one of a hole injection layer HIL, a hole transport layer HTL, an electron blocking layer EBL, an electron injection layer EIL, an electron transport layer ETL, and a hole blocking layer HBL. The hole injection layer HIL is mainly used to improve the hole injection efficiency, the hole transport layer HTL is mainly used to improve the hole transport efficiency, the electron blocking layer EBL is mainly used to block the electron transport, the electron injection layer EIL is mainly used to improve the electron injection efficiency, the electron transport layer ETL is mainly used to improve the electron transport efficiency, and the hole blocking layer HBL is mainly used to block the hole. Optionally, for the tandem light emitting device 2, the common transport layer 24 further includes a charge generation and separation unit CGL. The charge generation and separation unit CGL includes a first charge generation and separation layer N-CGL and a second charge generation and separation layer P-CGL. The first charge generation and separation layer N-CGL is used to generate electrons and serves as an auxiliary cathode, and the second charge generation and separation layer P-CGL is used to generate holes and serves as an auxiliary anode.

[0052] The pixel definition layer PDL includes a plurality of pixel openings V and a barrier structure 3 for forming the pixel openings V. At least part of the light-emitting layer EML is defined within the pixel openings V, for example, the light-emitting layer EML extends from the pixel openings V to the surrounding barrier structure 3. Alternatively, the light-emitting layer EML is defined within the pixel openings V. The pixel definition layer PDL is an integral layer structure, which has a plurality of pixel openings V arranged one-to-one with the light-emitting devices 2 for defining the light-emitting areas of the light-emitting devices 2. The light-emitting device 2 referred to in the embodiments of the present disclosure refers to a light-emitting unit composed of the first electrode 21 exposed by the pixel opening V, the light-emitting layer EML defined within the pixel opening V, and the second electrode 22.

[0053] As shown in Figure 2b At least one groove 4 is arranged in the barrier structure 3 between at least part of the adjacent pixel openings V, the groove 4 is located on the surface of the barrier structure 3 away from the substrate 1, and the common transport layer 24 is recessed into the groove 4 in the first sub-part 241 of the barrier structure 3 away from the substrate 1. Optionally, the light-emitting layer EML is recessed into the groove 4 in the second sub-part 242 of the barrier structure 3 away from the substrate 1.

[0054] It should be noted that for a large-size display panel, the resistivity of the common transport layer 24 is related to the carrier concentration and the carrier mobility, that is, ρ = 1 / (n × q × μ), where ρ represents the resistivity, n represents the carrier concentration, q represents the electronic charge, and μ represents the carrier mobility. The resistance of the common transport layer 24 is related to the material resistivity, the outer shape size, and the cross-sectional area, that is, R = ρ × L / S, where R represents the resistance, ρ represents the material resistivity, L represents the resistance length, and S represents the resistance cross-sectional area. Based on this, the greater the resistance, the smaller the carrier mobility, and the greater the hindering effect on the carrier, thereby reducing the lateral leakage. The common transport layer 24 of the embodiments of the present disclosure extends from the pixel opening V to the surrounding barrier structure 3, passes through the groove 4 on the barrier structure 3 and is recessed, so that the first sub-part 241 is no longer a flat structure, but a recessed structure. Compared with the flat structure scheme as shown in Figure 1a The embodiments of the present disclosure increase the leakage path of the common transport layer 24, which is equivalent to increasing the length L of the common transport layer 24, or the recessed first sub-part 241 may be blocked by the groove 4, which is equivalent to reducing the area S of the common transport layer 24. In this way, the resistance of the common transport layer 24 can be improved, thereby reducing the lateral leakage.

[0055] In some embodiments, the second electrodes 22 of the respective light-emitting devices 2 are connected as an integral structure, that is, the second electrodes 22 of the respective light-emitting devices 2 are shared. The second electrodes 22 can be integrally formed through an integral evaporation process, which can simplify the process flow and circuit layout design while ensuring low cost.

[0056] In some embodiments, the groove 4 may be a through groove or a blind groove. The design of the groove 4 depth needs to ensure that the second electrode 22 is not interrupted, so as to ensure the continuity of the second electrode 22 deposited over the entire surface. The specific value of the groove 4 depth is not limited in this disclosure.

[0057] In some embodiments, such as Figure 2b As shown, this illustrates the case where the groove 4 does not separate the first sub-part 241. The groove 4 includes a first sidewall 41 and a bottom wall 42, and a portion of the structure in the first sub-part 241 fills the groove 4 continuously. Specifically, the first sub-part 241 includes a first sub-section 2411 covering the first sidewall 41 and a second sub-section 2412 covering the bottom wall 42. The first sub-section 2411 and the second sub-section 2412 are an integral structure. Here, "integral structure" means that they are connected in the same layer as an integral structure. For example, the first sub-part 241 includes a hole injection layer HIL, a hole transport layer HTL, an electron blocking layer EBL, an electron injection layer EIL, an electron transport layer ETL, and a hole blocking layer HBL, which are sequentially disposed along the direction away from the substrate 1. The first sub-part 2411 and the second sub-part 2412 are an integral structure, meaning that the hole injection layer HIL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure; similarly, the hole transport layer HTL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure; the electron blocking layer EBL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure; the electron injection layer EIL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure; the electron transport layer ETL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure; and the hole blocking layer HBL, which covers the first sidewall 41 and the bottom wall 42 and is of the same layer, is connected as an integral structure.

[0058] Specifically, Figure 3 This is a schematic diagram of the groove in Example 1 provided in the embodiments of this disclosure, as shown below. Figure 3 As shown, in the design of the groove 4 in this embodiment, the leakage path L of the common transmission layer 24 is L = 2 × k × h / sin(β) + W × k + L1 + L2 + ... . Where k represents the number of grooves 4 between two adjacent light-emitting devices 2; W represents the maximum lateral dimension of the bottom wall 42; h represents the depth of the groove 4; β represents the slope angle of the groove 4, i.e., the dihedral angle formed between the first surface where the first sidewall 41 is located and the second surface where the bottom wall 42 is located; h / sin(β) represents the oblique dimension of the first sidewall 41; L1 and L2, ..., sequentially represent the lateral dimensions of the barrier structure 3 that the common transmission layer 24 passes through on the side facing away from the substrate 1. Thus, compared to the prior art where the leakage path is the width W' of the barrier structure 3 between two adjacent light-emitting devices 2 in the horizontal direction, the leakage path L of the common transmission layer 24 in this embodiment is greater than W'. Therefore, this embodiment increases the leakage path compared to the prior art, improving the poor lateral leakage.

[0059] Optionally, such as Figure 3 As shown, the dihedral angle β formed between the first surface where the first sidewall 41 is located and the second surface where the bottom wall 42 is located is greater than 90°, ensuring that the first sub-part 241 is both recessed into the groove 4 and can be continuous. Optionally, the dihedral angle β is an obtuse angle, for example, β is greater than 95°, forming a gentle slope surface, which is beneficial to ensuring the continuity of the second electrodes 22 of each light-emitting device 2.

[0060] In this embodiment, the first sub-part 2411 is inclined, which increases the leakage path of the common transmission layer 24 compared to the horizontal setting. This is equivalent to increasing the length L of the common transmission layer 24, thus increasing the resistance of the common transmission layer 24 and reducing lateral leakage.

[0061] It should be noted that the width of the groove 4, such as the width W of the bottom wall 42, depends on the number k of the grooves 4 and the slope angle β of the grooves 4. In this disclosure, the number k of the grooves 4 can be determined comprehensively based on the characteristics of the OLED organic material and the performance of the product, and is not limited here.

[0062] In some embodiments, such as Figure 3 As shown, the height H of the barrier structure 3 is greater than the thickness of the common transport layer 24, ensuring that the groove 4 provided on the barrier structure 3 can effectively recess the common transport layer 24. The depth h of the groove 4 is greater than the thickness of at least one sub-film layer in the common transport layer 24. For example, the common transport layer 24 includes at least one of a hole injection layer HIL, a hole transport layer HTL, an electron blocking layer EBL, an electron injection layer EIL, an electron transport layer ETL, and a hole blocking layer HBL. The depth of the groove 4 is greater than the thickness of any one of the hole injection layer HIL, the hole transport layer HTL, the electron blocking layer EBL, the electron injection layer EIL, the electron transport layer ETL, and the hole blocking layer HBL.

[0063] Optionally, such as Figure 4 As shown, for the light-emitting device 2 with a single-layer light-emitting layer EML, the common transport layer 24 includes a hole transport layer HTL and an electron transport layer ETL. The depth h of the groove 4 is at least greater than the thickness of the hole transport layer HTL, so as to extend the leakage path of the hole transport layer HTL after the groove is recessed, thereby reducing lateral leakage.

[0064] Optionally, such as Figure 5As shown, for the tandem light-emitting device 2, a plurality of light-emitting layers EMLs are included, and taking two light-emitting layers EMLs as an example, they are respectively denoted as a first light-emitting layer EML1 and a second light-emitting layer EML2. The common transport layer 24 includes a hole injection layer HIL, a first hole transport layer HTL1, a first hole blocking layer HBL1, a first charge generation layer N-CGL, a second charge generation layer P-CGL, a second hole transport layer HTL2, a second hole blocking layer HBL2, an electron transport layer ETL, and an electron injection layer EIL. The tandem light-emitting device 2 includes, in sequence from the direction away from the substrate 1, the first electrode 21, the hole injection layer HIL, the first hole transport layer HTL1, the electron blocking layer EBL, the first light-emitting layer EML1, the first hole blocking layer HBL1, the first charge generation layer N-CGL, the second charge generation layer P-CGL, the second hole transport layer HTL2, the second light-emitting layer EML2, the second hole blocking layer HBL2, the electron transport layer ETL, the electron injection layer EIL, and the second electrode 22. The depth h of the groove 4 is at least greater than the total thickness of the hole injection layer HIL, the first hole transport layer HTL1, the first hole blocking layer HBL1, the first light-emitting layer EML1, the first charge generation layer N-CGL, and the second charge generation layer P-CGL, so as to prolong the leakage path of the carriers after being sunken, and reduce the lateral leakage.

[0065] In some embodiments, the depth h of the groove 4 is less than the thickness of the light-emitting functional layer 23, so as to ensure that the second electrode 22 located on the side of the light-emitting functional layer 23 away from the substrate 1 can be continuous.

[0066] In some embodiments, Figure 6 A planar schematic diagram of the groove distribution provided by the embodiments of the present disclosure is shown in Figure 7 Another planar schematic diagram of the groove distribution provided by the embodiments of the present disclosure is shown in. For the display panel under the above example 1, the groove 4 distribution manner can be as shown in Figure 6 and Figure 7 As shown, the normal projection of the center connecting line of any two adjacent pixel openings V on the substrate 1 passes through the normal projection of at least one groove 4 on the substrate 1, which means that the leakage path is prolonged by the groove 4 between any two adjacent light-emitting devices 2, so as to reduce the lateral leakage.

[0067] Optionally, as shown in Figure 6 Any two adjacent grooves 4 are arranged with a spacing. For example, a plurality of grooves 4 are arranged around each pixel opening V, and the plurality of grooves 4 are uniformly distributed, and adjacent grooves 4 are arranged with a spacing, so as to ensure the continuity of the second electrode 22.

[0068] Optionally, as shown in Figure 7 The normal projection of the groove 4 on the substrate 1 surrounds the normal projection of the light-emitting device 2 on the substrate 1, and is arranged with a spacing compared withFigure 6 The structure further extends the leakage path to reduce lateral leakage. For example, one or two grooves 4 are provided between adjacent light-emitting devices 2.

[0069] In some embodiments, Figure 8a This is a schematic diagram of the display panel in Example 2 provided in the embodiments of this disclosure. Figure 8b for Figure 8a A magnified view of the Q2 region, as shown below. Figure 8a and Figure 8b As shown, the first sub-part 241 is at least partially separated by a recess 4. Specifically, the first sub-part 241 is separated by a recess 4, and at the separated location, the common transmission layer 24 forms an opening 25 opposite to the recess 4, as shown. Figure 9 As shown, different grooves 4 are spaced apart from each other, and therefore different openings 25 are spaced apart from each other, which is equivalent to reducing the area S of the common transmission layer 24. This can increase the resistance of the common transmission layer 24, thereby reducing lateral leakage.

[0070] Optionally, the light-emitting layer EML is located in the second sub-part 242 of the barrier structure 3 away from the substrate 1 and is separated by the groove 4.

[0071] Optionally, such as Figure 8b As shown, the groove 4 includes a first sidewall 41 and a bottom wall 42. The dihedral angle α formed between the first surface where the first sidewall 41 is located and the second surface where the bottom wall 42 is located is less than 85°, forming an undercut structure for cutting off the first sub-part 241 that falls into the groove 4.

[0072] Optionally, for the light-emitting device 2 with a single-layer light-emitting layer EML, the common transmission layer 24 includes a first transmission unit 231 located on the side of the light-emitting layer EML near the first electrode 21 and a second transmission unit 232 located on the side of the light-emitting layer EML near the second electrode 22. For example, as shown... Figure 4 As shown, the first transmission unit 231 includes at least a hole transport layer (HTL), and the second transmission unit 232 includes at least an electron transport layer (ETL). The first sub-part 241 is completely separated by the groove 4, that is, the groove 4 separates the hole transport layer (HTL) and the electron transport layer (ETL).

[0073] It should be noted that if the light-emitting layer EML extends to the side of the barrier structure 3 away from the substrate 1, the groove 4 will simultaneously block the light-emitting layer EML.

[0074] Optionally, for the tandem light-emitting device 2, the first sub-part 241 includes multiple sub-film layers, and the groove 4 at least isolates the charge generation separation unit CGL and the sub-film layers between it and the first electrode 21. Specifically, as Figure 5As shown, the common transport layer 24 includes a charge generation and separation unit CGL, a first transport unit 231 and a second transport unit 232 located on the side of the charge generation and separation unit CGL close to the first electrode 21, and a third transport unit 233 and a fourth transport unit 234 located on the side of the charge generation and separation unit CGL close to the second electrode 22; a first light-emitting layer EML1 is arranged between the first transport unit 231 and the second transport unit 232, and a second light-emitting layer EML2 is arranged between the third transport unit 233 and the fourth transport unit 234; the first transport unit 231 is closer to the first electrode 21 than the second transport unit 232, and the third transport unit 233 is closer to the first electrode 21 than the fourth transport unit 234; the first transport unit 231, the second transport unit 232, and the charge generation and separation unit CGL in the first sub-part 241 are separated by the groove 4. The sub-film layer between the charge generation and separation unit CGL and the second electrode 22 is not separated, thereby ensuring the continuity of the second electrode 22. For example, as shown in Figure 5 As shown, the groove 4 separates the hole injection layer HIL, the first hole transport layer HTL1, the electron blocking layer EBL, the first light-emitting layer EML1, the first charge generation and separation layer N-CGL, the second charge generation and separation layer P-CGL, and the second hole transport layer HTL2, while at least part of the second light-emitting layer EML2, the second hole blocking layer HBL2, the electron transport layer ETL, and the electron injection layer EIL are not separated to ensure the continuity of the second electrode 22.

[0075] It should be noted that, due to the depth and undercut morphology of the groove 4, it is easy to separate the second electrode 22 and the light-emitting functional layer 23 thereunder, so the distribution of the groove 4 can be improved to further ensure that the second electrodes 22 of adjacent light-emitting devices 2 are electrically connected to each other. In some embodiments, Figure 10 Another planar schematic diagram of the distribution of the groove is provided for the display panel in Example 2 above. As shown in Figure 10 As shown, the central line of a part of the adjacent pixel openings V is projected on the substrate 1, and the projection passes through the projection of at least one groove 4 on the substrate 1; the central line of a part of the adjacent pixel openings V is projected on the substrate 1, and the projection does not overlap with the projection of the groove 4 on the substrate 1, which means that the first sub-part 241 in the non-overlapping area is not separated, and thus the second electrode 22 thereon is also not separated and extends flat to avoid the second electrodes 22 of adjacent light-emitting devices 2 being disconnected from each other.

[0076] Optionally, the cavity lengths of different color light-emitting devices 2 are different, the cavity length of the red light-emitting device R is greater than that of the green light-emitting device G, and the cavity length of the green light-emitting device G is greater than that of the blue light-emitting device B. Therefore, in order to avoid the second electrode 22 of the blue light-emitting device B being separated, as shown inFigure 10 As shown, the normal projection of the center line of the pixel opening V of the red light emitting device R and the pixel opening V of the green light emitting device G on the substrate 1 passes through the normal projection of the at least one groove 4 on the substrate 1; the normal projection of the center line of the pixel opening V of the blue light emitting device B and the pixel opening V of the red light emitting device R on the substrate 1 has no overlap with the normal projection of the groove 4 on the substrate 1; the normal projection of the center line of the pixel opening V of the blue light emitting device B and the pixel opening V of the green light emitting device G on the substrate 1 has no overlap with the normal projection of the groove 4 on the substrate 1.

[0077] Optionally, each of the grooves on the barrier structure is arranged at intervals. As shown in Figure 10 As shown, the grooves 4 arranged around the red light emitting device R are spaced apart from each other and uniformly distributed, and the number of grooves is not limited. The grooves 4 arranged around the green light emitting device G are spaced apart from each other and uniformly distributed, and the number of grooves is not limited.

[0078] In some embodiments, the second side wall in the barrier structure 3 for defining the pixel opening V blocks at least part of the thickness of the common transport layer 24.

[0079] In a possible implementation manner, Figure 11 The schematic diagram of the display panel under Example 3 provided by the embodiments of the present disclosure is as shown in Figure 11 As shown, the second side wall includes a side surface close to the pixel opening V, and part of the area in the side surface is a concave surface. Specifically, the concave surface is concave to the side away from the pixel opening V, so that the side wall of the barrier structure 3 close to the pixel opening V forms an undercut structure for blocking at least part of the thickness of the common transport layer 24.

[0080] Optionally, as shown in Figure 11As shown, the barrier wall structure 3 includes a first sub-layer 31, a second sub-layer 32 and a third sub-layer 33 arranged in sequence in the direction away from the substrate base plate 1; the first sub-layer 31 is used to define one side of the pixel opening V protruding from the second sub-layer 32 used to define one side of the pixel opening V, and the third sub-layer 33 is used to define one side of the pixel opening V protruding from the second sub-layer 32 used to define one side of the pixel opening V, and the common transport layer 24 is interrupted by the third sub-layer 33 at least partially in thickness. The interruption principle is that the third sub-layer 33 protrudes from the second sub-layer 32, so that a difference is formed between the third sub-layer 33 and the second sub-layer 32, and the difference with a suitable distance can cut off at least part of the thickness of the common transport layer 24. That is, by setting the difference distance between the surface of the third sub-layer 33 close to the substrate base plate 1 and the surface of the first sub-layer 31 away from the substrate base plate 1, the thickness of the common transport layer 24 can be selectively interrupted. Here, the design of the difference height needs to meet the condition that the second electrode 22 cannot be interrupted, so as to ensure the continuity of the second electrode 22 evaporated on the whole surface. The specific value of the difference height can be designed according to the structure data of the actual product, and the present disclosure is not limited.

[0081] Figure 12 The schematic diagram of the barrier wall structure in the display panel under Example 3 improved by the embodiment of the present disclosure is as shown in Figure 12 As shown, the first sub-layer 31 includes a first sub-surface 311 away from the substrate base plate 1, the second sub-layer 32 includes a second sub-surface 321 close to the pixel opening V, and the third sub-layer 33 includes a third sub-surface 331 close to the substrate base plate 1, and the first sub-surface 311, the second sub-surface 321 and the third sub-surface 331 are connected to form a concave surface.

[0082] In order to avoid the second electrodes 22 of the adjacent light emitting devices 2 from being disconnected with each other, optionally, as shown in Figure 11 and Figure 12 As shown, the difference height h' is less than the sum of the thicknesses of the common transport layer 24 and the light emitting layer EML. On this basis, by reasonably setting the difference height h', part of the thickness of the common transport layer 24 is interrupted by the third sub-layer 33.

[0083] Optionally, since the cavity lengths of the light emitting devices 2 of different colors are different, the second side wall of the barrier wall structure 3 around the part of the light emitting devices 2 with longer cavity length can be undercut designed; and the second side wall of the barrier wall structure 3 around the part of the light emitting devices 2 with shorter cavity length is not undercut designed. Since the cavity length is longer, the thickness between the first electrode 21 and the second electrode 22 is thicker, so the second side wall will only interrupt part of the thickness of the common transport layer 24, but will not cut off the second electrode 22 evaporated on the whole surface, thereby ensuring the electrical connection. In addition, by using the feature of longer cavity length, therefore, the difference distance can be appropriately greater than 20 nm to provide convenience for process preparation.

[0084] Optionally, the undercut distance of the second sidewall of the surrounding barrier structure 3 corresponding to the light-emitting device 2 with longer cavity length is greater than the undercut distance of the second sidewall of the surrounding barrier structure 3 corresponding to the light-emitting device 2 with shorter cavity length. For example, the undercut distance of the second sidewall of the surrounding barrier structure 3 corresponding to the light-emitting device 2 with longer cavity length can be greater than 20 nm. For the light-emitting device 2 with shorter cavity length, the undercut distance of the second sidewall of the surrounding barrier structure 3 is less than 20 nm to avoid isolating the second electrode 22 and to improve the lateral leakage problem, as shown in FIG. 8, which is the light-emitting spectrum of the light-emitting device under the isolation structure design. The green light-emitting device G is turned on, and the pure green display effect is good without obvious color mixing compared with the prior art. Figure 13

[0085] For example, it is known that the cavity length of the red light-emitting device R is greater than the cavity length of the green light-emitting device G, and the cavity length of the green light-emitting device G is greater than the cavity length of the blue light-emitting device B. Therefore, the second sidewall of the surrounding barrier structure 3 corresponding to the red light-emitting device R and the green light-emitting device G isolates part of the thickness of the common transport layer 24; the second sidewall of the surrounding barrier structure 3 corresponding to the blue light-emitting device B is not undercut designed, or the undercut distance is small, and only part of the film layer of the common transport layer 24 is isolated, thereby ensuring the electrical connection of the second electrode 22 evaporated on the front surface.

[0086] For the isolation case, for example, for the light-emitting device 2 with a single light-emitting layer EML, the third sublayer 33 can be used to isolate the first transport unit 231 and the light-emitting layer EML; the remaining second transport unit 232 is not isolated. For example, as shown in FIG. 9, the third sublayer 33 is used to isolate the hole transport layer HTL and the light-emitting layer EML to improve the electrical connection stability and continuity between the second electrodes 22 of adjacent light-emitting devices 2. Figure 4 Figure 5 For example, for the light-emitting device 2 in series, the third sublayer 33 can be used to isolate the first transport unit 231, the first light-emitting layer EML1, the second transport unit 232, and the charge generation and separation unit CGL; the remaining third transport unit 233, the second light-emitting layer EML2, and the fourth transport unit 234 are not isolated. For example, as shown in FIG. 10, the third sublayer 33 is used to isolate the hole injection layer HIL, the first hole transport layer HTL1, the electron blocking layer EBL, the first light-emitting layer EML1, the first charge generation and separation layer N-CGL, and the second charge generation and separation layer P-CGL to improve the electrical connection stability and continuity between the second electrodes 22 of adjacent light-emitting devices 2.

[0087] Optionally, as shown in FIG. 11, the third sublayer 33 is used to isolate the first transport unit 231, the first light-emitting layer EML1, the second transport unit 232, and the charge generation and separation unit CGL to improve the electrical connection stability and continuity between the second electrodes 22 of adjacent light-emitting devices 2. Figure 11 ​​As shown, the material of the first sub-layer 31, the second sub-layer 32 and the third sub-layer 33 can be selected from inorganic, organic and inorganic laminated materials, or multi-layer inorganic laminated materials, such as laminated materials of silicon dioxide (SiO2), silicon oxynitride (SiNx) and silicon dioxide (SiO2).

[0088] Optionally, for Figure 11 As shown in the three-layer undercut design, the preparation process includes: first, sequentially coating the first sub-layer material, the second sub-layer material and the third sub-layer material; then, coating photoresist and exposing and developing to expose the area to be etched, and etching the second sub-layer material and the third sub-layer material in the area to be etched once to form the third sub-layer 33; then, etching the second sub-layer material again to form the concave surface and obtain the second sub-layer 32; then, etching the first sub-layer material again to form the first sub-layer 31; then, removing the photoresist to obtain the barrier wall structure 3 with the blocking capability.

[0089] Optionally, Figure 14 The schematic diagram of the display panel under Example 4 provided by the embodiment of the present disclosure is as shown in Figure 14 As shown, the barrier wall structure 3 includes the fourth sub-layer 34 and the fifth sub-layer 35 arranged in sequence in the direction away from the substrate substrate 1; the fifth sub-layer 35 is used to define one side of the pixel opening V protruding from the fourth sub-layer 34 for defining one side of the pixel opening V; the common transport layer 24 is blocked by the fifth sub-layer 35 at least partially in thickness. The blocking principle is that the fifth sub-layer 35 protrudes from the fourth sub-layer 34, so that a difference is formed between the first sub-layer 31 and the second sub-layer 32, and a suitable distance difference can cut off at least part of the thickness of the common transport layer 24. That is, by setting the difference distance between the surface of the fifth sub-layer 35 close to the substrate substrate 1 and the surface of the fourth sub-layer 34 close to the substrate substrate 1, the thickness of the common transport layer 24 can be selectively blocked. Here, the design of the difference height h' needs to meet the condition of not blocking the second electrode 22 to ensure the continuity of the second electrode 22 coated on the whole surface. The specific value of the difference height can be designed according to the structure data of the actual product, which is not limited by the present disclosure.

[0090] Figure 15 The schematic diagram of the barrier wall structure in the display panel under Example 4 improved by the embodiment of the present disclosure is as shown in Figure 15 As shown, the fourth sub-layer 34 includes a fourth sub-surface 341 close to the pixel opening V, and the fifth sub-layer 35 includes a fifth sub-surface 351 close to the substrate substrate 1, and the fourth sub-surface 341 and the fifth sub-surface 351 are connected to form the concave surface.

[0091] In order to avoid the second electrodes 22 of adjacent light emitting devices 2 from being disconnected with each other, optionally, as shown in Figure 14 and Figure 15As shown, the height difference h' is less than the sum of the thicknesses of the common transport layer 24 and the light-emitting layer EML. On this basis, by reasonably setting the height difference h', the fifth sub-layer 35 is used to block part of the thickness of the common transport layer 24.

[0092] For example, for the light-emitting device 2 with a single-layer light-emitting layer EML, the fifth sub-layer 35 can be used to block the first transport unit 231 and the light-emitting layer EML; the remaining second transport unit 232 is not blocked. For example, as shown in FIG. 6A, the fifth sub-layer 35 is used to block the hole transport layer HTL and the light-emitting layer EML. Figure 4 As shown, the fifth sub-layer 35 is used to block the hole injection layer HIL, the first hole transport layer HTL1, the electron blocking layer EBL, the first light-emitting layer EML1, the first charge generation and separation layer N-CGL, and the second charge generation and separation layer P-CGL, to improve the electrical connection stability and continuity between the second electrodes 22 of adjacent light-emitting devices 2.

[0093] For example, for the light-emitting device 2 with a single-layer light-emitting layer EML, the fifth sub-layer 35 can be used to block the first transport unit 231 and the light-emitting layer EML; the remaining second transport unit 232 is not blocked. For example, as shown in FIG. 6A, the fifth sub-layer 35 is used to block the hole transport layer HTL and the light-emitting layer EML. Figure 5 As shown, the fifth sub-layer 35 is used to block the hole injection layer HIL, the first hole transport layer HTL1, the electron blocking layer EBL, the first light-emitting layer EML1, the first charge generation and separation layer N-CGL, and the second charge generation and separation layer P-CGL, to improve the electrical connection stability and continuity between the second electrodes 22 of adjacent light-emitting devices 2.

[0094] For example, for the light-emitting device 2 with a single-layer light-emitting layer EML, the fifth sub-layer 35 can be used to block the first transport unit 231 and the light-emitting layer EML; the remaining second transport unit 232 is not blocked. For example, as shown in FIG. 6A, the fifth sub-layer 35 is used to block the hole transport layer HTL and the light-emitting layer EML. Figure 15 As shown, the materials of the fourth sub-layer 34 and the fifth sub-layer 35 can be selected as organic and inorganic stacked materials, or multi-layer inorganic stacked materials, such as stacked materials of silicon oxynitride (SiNx) and silicon dioxide (SiO2).

[0095] In another possible implementation, Figure 16 For example, for the light-emitting device 2 with a single-layer light-emitting layer EML, the fifth sub-layer 35 can be used to block the first transport unit 231 and the light-emitting layer EML; the remaining second transport unit 232 is not blocked. For example, as shown in FIG. 6A, the fifth sub-layer 35 is used to block the hole transport layer HTL and the light-emitting layer EML. Figure 16 As shown, the thickness of the barrier structure 3 is less than the sum of the thicknesses of the common transport layer 24 and the light-emitting layer EML. Optionally, the second side wall is a flat third surface S3 close to the side surface of the pixel opening V, and the dihedral angle γ between the third surface S3 and the fourth surface parallel to the substrate 1 is less than 85°, forming an undercut structure to cut off part of the thickness of the common transport layer 24 falling into the pixel opening V, thereby avoiding the second electrodes 22 of adjacent light-emitting devices 2 from being disconnected with each other, and improving the electrical connection stability and continuity between the second electrodes 22 of each light-emitting device 2.

[0096] Optionally, the material of the barrier structure 3 can be selected as a negative photoresist material, so that the undercut structure can be formed by one etching process, thereby simplifying the process and reducing the cost.

[0097] In some embodiments, Figure 17 A schematic diagram of the display panel under Example 6 is provided for the embodiments of the present disclosure. The partition design of the barrier wall structure 3 of Example 3 can be combined with the groove 4 structure of Example 1, as shown in Figure 17 The combination of partition and elongated leakage path comprehensively improves the lateral leakage failure.

[0098] In some embodiments, Figure 18 A schematic diagram of the display panel under Example 7 is provided for the embodiments of the present disclosure. The partition design of the barrier wall structure 3 of Example 3 can be combined with the groove 4 structure of Example 2, as shown in Figure 18 The combination of partition and reduced leakage area comprehensively improves the lateral leakage failure.

[0099] Similarly, the partition design of the barrier wall structure 3 of Example 4 can also be combined with the groove 4 structure of Example 1 or Example 2, and the repeated parts will not be described again. The partition design of the barrier wall structure 3 of Example 5 can also be combined with the groove 4 structure of Example 1 or Example 2, and the repeated parts will not be described again.

[0100] Of course, the undercut structure shown in Figure 12 , Figure 15 and Figure 16 can also be provided as an independent partition structure on the side of the pixel definition layer PDL close to the substrate 1, and the pixel opening V corresponds to the opening of the undercut structure one by one.

[0101] Figures 19a to 19f A process flow chart of the undercut structure provided for the embodiments of the present disclosure is provided. For the design of the three-layer undercut structure shown in Figure 11 and Figure 12 , the preparation process is as follows: S11, providing an intermediate substrate, which can be a semi-finished product at an intermediate preparation stage, for example, including the above-mentioned substrate 1, and the driving layer 5 and the planarization layer PLN arranged on the substrate 1 in sequence; wherein the driving layer 5 at least includes a pixel driving circuit (not shown in the figure) for driving the light emitting device 2. The pixel driving circuit at least includes a transistor TFT. S12, as shown in Figure 19a , the first sub-layer material 3101, the second sub-layer material 3201 and the third sub-layer material 3301, such as the laminated material of silicon dioxide (SiO2), silicon oxynitride (SiNx) and silicon dioxide (SiO2), are sequentially and uniformly evaporated on the intermediate substrate. S13, as shown in Figure 19b , a photoresist (such as PR glue) is coated on the side of the third sub-layer material 3301 away from the planarization layer PLN, and then exposed and developed to obtain a photoresist pattern 71. The photoresist pattern at least includes an opaque area and a transparent area; the part of the photoresist pattern located in the opaque area is used to shield the non-etching part of the laminated material, and the transparent area is used to expose the part of the laminated material to be etched. S14, as shown inFigure 19c As shown, the third sub-layer material 3301 and the second sub-layer material 3201 exposed by the photoresist pattern are subjected to a first etching to form the third sub-layer 33 and the intermediate section second sub-layer material 3201. S15, as shown, Figure 19d As shown, the intermediate section second sub-layer material 3201 is subjected to a second etching to form a concave surface and obtain the second sub-layer 32. S17, as shown, Figure 19e As shown, the first sub-layer material 3101 exposed by the photoresist pattern is subjected to a third etching to form the first sub-layer 31. S18, as shown, Figure 19f As shown, the photoresist pattern is removed to obtain the barrier wall structure 3 with the blocking capability.

[0102] The display device may, for example, be a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a vehicle-mounted device, or any product with a display function. Other essential components of the display device are understood by those skilled in the art and are not described here in detail, nor should they be considered as limiting the present disclosure.

[0103] It can be understood that the above embodiments are only exemplary embodiments for illustrating the principles of the present disclosure, and the present disclosure is not limited thereto. Various modifications and improvements can be made by those skilled in the art without departing from the spirit and essence of the present disclosure, and these modifications and improvements are also considered within the protection scope of the present disclosure.

Claims

1. A display panel, characterized in that, The device includes a substrate, a pixel defining layer disposed on the substrate, and a plurality of light-emitting devices; each light-emitting device includes a first electrode, a light-emitting functional layer, and a second electrode disposed sequentially in a direction away from the substrate; the light-emitting functional layer includes at least a light-emitting layer and a common transport layer; the common transport layer is shared by all the light-emitting devices. The pixel defining layer includes a plurality of pixel openings and a barrier structure for forming the pixel openings; at least a portion of the light-emitting layer is defined within the pixel openings; At least a portion of the barrier structure between adjacent pixel openings is provided with at least one groove, the groove being located on the surface of the barrier structure facing away from the substrate, and the common transport layer being recessed in the groove in a first sub-part of the barrier structure facing away from the substrate.

2. The display panel according to claim 1, characterized in that, The groove includes a first sidewall and a bottom wall. The first sub-part includes a first sub-section covering the first sidewall and a second sub-section covering the bottom wall. The first sub-section and the second sub-section are an integral structure.

3. The display panel according to claim 2, characterized in that, The dihedral angle formed between the first surface where the first sidewall is located and the second surface where the bottom wall is located is greater than 90°.

4. The display panel according to claim 2, characterized in that, The height of the retaining wall structure is greater than the thickness of the common transmission layer; the depth of the groove is greater than the thickness of at least one sub-film layer in the common transmission layer.

5. The display panel according to claim 2, characterized in that, The depth of the groove is less than the thickness of the light-emitting functional layer.

6. The display panel according to any one of claims 1 to 5, characterized in that, The orthographic projection of the center line connecting any two adjacent pixel openings onto the substrate passes through the orthographic projection of at least one of the grooves onto the substrate.

7. The display panel according to claim 6, characterized in that, The grooves are spaced apart from any two adjacent grooves.

8. The display panel according to claim 6, characterized in that, The orthogonal projection of the groove on the substrate surrounds the orthogonal projection of the light-emitting device on the substrate.

9. The display panel according to claim 1, characterized in that, The first sub-part is separated by the groove at least partially by its thickness.

10. The display panel according to claim 9, characterized in that, The groove includes a first sidewall and a bottom wall, and the dihedral angle formed between the first surface where the first sidewall is located and the second surface where the bottom wall is located is less than 85°.

11. The display panel according to claim 2 or 9, characterized in that, A portion of the orthographic projection of the center line connecting adjacent pixel openings on the substrate passes through the orthographic projection of at least one groove on the substrate; a portion of the orthographic projection of the center line connecting adjacent pixel openings on the substrate does not overlap with the orthographic projection of the groove on the substrate.

12. The display panel according to claim 11, characterized in that, The grooves on the retaining wall structure are spaced apart.

13. The display panel according to claim 2 or 9, characterized in that, The second sidewall in the retaining wall structure, which defines the pixel opening, blocks at least a portion of the thickness of the common transport layer.

14. The display panel according to claim 13, characterized in that, The second sidewall includes a side surface near the pixel opening, a portion of which is a concave surface.

15. The display panel according to claim 13, characterized in that, The side surface of the second sidewall near the pixel opening is a flat third surface, and the dihedral angle formed between the third surface and the fourth surface parallel to the substrate is less than 85°.

16. The display panel according to claim 1, characterized in that, The second electrodes of each of the light-emitting devices are connected as a single structure.

17. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 16.

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