Variable-depth photoelectron spectroscopy device and control system

Abstract

The utility model discloses a variable-depth photoelectron spectroscopy device and a control system. The variable-depth photoelectron spectroscopy device comprises a vacuum mechanism used for realizing a vacuum environment; the monochromatic mechanism is used for adjusting the light emitted by the light source and providing synchrotron radiation beams with continuously adjustable energy; the light intensity monitoring mechanism is used for monitoring the intensity of the synchrotron radiation beam; the sample support is used for placing a sample; the four-axis sample frame is used for bearing the sample support and can provide translation in X, Y and Z directions and rotation around the Z axis; and the photoelectron energy analysis mechanism is used for analyzing a photoelectron signal generated after the sample is irradiated by the synchrotron radiation beam. According to the utility model, element electronic structure and chemical state information of a material at different depths is obtained by setting synchrotron radiation photon energy, and photoelectron signals emitted from the surface of a sample at different angles are received by adjusting the energy analysis mechanism, so that the photoelectron signals at different depths are detected; and thus, lossless variable-depth photoelectron spectroscopy detection is realized.

Description

TECHNICAL FIELD

[0001] The utility model relates to photoelectron spectroscopy experimental equipment technical field especially, relates to a variable depth photoelectron spectroscopy device and control system. BACKGROUND

[0002] Photoelectron spectroscopy is one of the effective means to study the electronic structure of materials. Its principle is that when photons are irradiated to the surface of the sample, if the energy of the photons is high enough (exceeding the work function of the material), it can excite electrons from the material. These excited electrons are called photoelectrons, which have a certain kinetic energy. By analyzing the kinetic energy of these photoelectrons, information about the electronic structure of the material surface can be obtained, including the chemical state of the element, the electronic state density, etc. Due to its powerful surface analysis function, it has been widely used in energy science, catalytic conversion, biological medicine, semiconductor and other fields in recent years, and has very important scientific significance.

[0003] Photoelectron spectroscopy experimental device usually includes vacuum device, light gun and energy analyzer, in the vacuum cavity, the characteristic X-ray emitted by the light gun is used to irradiate the sample, and then the energy analyzer is used to collect and analyze the photoelectron signal emitted by the sample to obtain the photoelectron spectrum of the sample. This kind of detection method has simple structure and is easy to debug, and has been widely used in domestic scientific research platforms at present. However, since the energy of the characteristic X-ray emitted by the light gun is fixed, the escape depth of the photoelectron is relatively fixed. If different depth detection is needed, argon ion etching means is often used, which will damage the material. With the development of scientific research, the demand for exploration of electronic structure at material interface is increasing, and it is of great significance to develop a variable depth photoelectron spectroscopy device and control system. SUMMARY

[0004] The utility model aims at solving one of the technical problems in the related art at least to some extent. Therefore, one purpose of the utility model is to provide a variable depth photoelectron spectroscopy device to realize nondestructive variable depth photoelectron spectroscopy detection.

[0005] In the first aspect, the utility model provides a variable depth photoelectron spectroscopy device, which comprises:

[0006] Vacuum mechanism: used for realizing vacuum environment;

[0007] Monochromatic mechanism: adjusting the light emitted by the light source, used for providing energy continuous adjustable synchrotron radiation beam;

[0008] Light intensity monitoring mechanism: used for monitoring the intensity of synchrotron radiation beam;

[0009] Sample holder: used for placing sample;

[0010] Four-axis sample holder: used to carry the sample holder, which can provide translation in X, Y, Z directions and rotation around Z axis;

[0011] Photoelectron energy analysis mechanism: used to analyze the photoelectron signal generated by the sample after being irradiated by the synchrotron beam;

[0012] The vacuum mechanism is internally provided with a monochromatic mechanism cavity for installing the monochromatic mechanism, a light intensity monitoring mechanism cavity for installing the light intensity monitoring mechanism, and a test cavity for installing the four-axis sample holder and the photoelectron energy analysis mechanism. The synchrotron beam outlet of the monochromatic mechanism cavity is connected with the synchrotron beam inlet of the light intensity monitoring mechanism cavity, and the synchrotron beam outlet of the light intensity monitoring mechanism cavity is connected with the synchrotron beam inlet of the test cavity.

[0013] Preferably, the vacuum mechanism is also provided with a rapid sample feeding cavity, the outlet of which is connected with the sample feeding port of the test cavity, and the inlet of the rapid sample feeding cavity is provided with a sample transfer rod for transferring the sample.

[0014] Preferably, the monochromatic mechanism is internally provided with a grating and a plane mirror rotating at a fixed point to ensure that the position of the light spot emitted through the grating is fixed.

[0015] Preferably, the light intensity monitoring mechanism comprises a vacuum electrode, a microammeter, a gold mesh, and a linear driver for driving the displacement of the gold mesh to the synchrotron beam light path. The gold mesh is installed inside the light intensity monitoring mechanism cavity near the synchrotron beam inlet position. The displacement end of the linear driver is connected with the gold mesh, one end of the vacuum electrode is connected with the gold mesh, and the other end of the vacuum electrode is connected with the microammeter through a wire.

[0016] Preferably, the photoelectron energy analysis mechanism comprises:

[0017] Deceleration mirror assembly: used to collect the photoelectron signal emitted by the sample, while performing deceleration and focusing processing;

[0018] Energy screening assembly: used to screen the photoelectrons that meet the energy according to the set parameters;

[0019] Detection assembly: used to detect the screened photoelectron signal;

[0020] The photoelectron input port of the deceleration mirror assembly is installed inside the test cavity near one side of the sample installation position. The photoelectron output port of the deceleration mirror assembly is connected with the photoelectron input port of the energy screening assembly, and the photoelectron output port of the energy screening assembly is connected with the photoelectron input port of the detection assembly.

[0021] Preferably, ion pumps for realizing vacuum are installed in the monochromatic mechanism cavity and the light intensity monitoring mechanism cavity, dry pumps, molecular pumps and ion pumps for realizing vacuum are installed in the test cavity, dry pumps and molecular pumps for realizing vacuum are installed in the fast sampling cavity, and vacuum gauges for measuring vacuum degree are installed in the monochromatic mechanism cavity, the light intensity monitoring mechanism cavity, the test cavity and the fast sampling cavity.

[0022] Preferably, gate valves are arranged at the connection between the monochromatic mechanism cavity and the light intensity monitoring mechanism cavity, the connection between the light intensity monitoring mechanism cavity and the test cavity and the connection between the fast sampling cavity and the test cavity.

[0023] In a second aspect, the utility model provides a kind of control system, containing any one of above-mentioned variable depth photoelectron spectrometer scheme, still include data acquisition and control module;

[0024] The data acquisition and control module are connected with the monochromatic mechanism, the light intensity monitoring mechanism, the four-axis sample holder and photoelectron energy analysis mechanism respectively;

[0025] The data acquisition and control module are used to control the monochromatic mechanism to obtain target synchrotron beam current, for obtaining the synchrotron beam current intensity monitored by the light intensity monitoring mechanism;For controlling the four-axis sample holder to move to target position;For controlling the photoelectron energy analysis mechanism to analyze sample emergent photoelectron signal and output photoelectron spectrogram.

[0026] The utility model has the beneficial effects that:

[0027] (1) the synchrotron photon energy of monochromatic mechanism is set to obtain the element electron structure and chemical state information of material at different depths, and to avoid the influence of synchrotron beam intensity on spectrogram, light intensity monitoring mechanism is arranged to record the beam intensity under different synchrotron photon energy, so as to realize accurate and non-destructive variable depth photoelectron spectroscopy detection;

[0028] (2) four-axis sample holder is arranged to drive sample on sample holder to adjust angle, so that photoelectron energy analysis mechanism can receive photoelectron signal emitted from sample surface at different angles, and these photoelectron signals come from different depths, so as to realize non-destructive variable depth photoelectron spectroscopy detection. BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 The utility model provides a kind of variable depth photoelectron spectrometer device structure schematic view.

[0030] Figure 2 The utility model provides a kind of vacuum mechanism structure schematic view.

[0031] Figure 3 The structural schematic view of the monochromatic mechanism is provided for the utility model.

[0032] Figure 4 The variable depth photoelectron energy spectrum diagram of the lithium lanthanum tantalum chloride solid electrolyte with the surface modified by pentafluoropropyl acrylate after the charge-discharge cycle obtained in the embodiment of the utility model.

[0033] Figure 5 The variable depth photoelectron energy spectrum diagram of the SnO2 / CdS laminated film structure obtained in the embodiment of the utility model is changed.

[0034] In the figure: 1, vacuum mechanism, 2, monochromatic mechanism, 3, light intensity monitoring mechanism, 4, sample holder, 5, four-axis sample holder, 6, photoelectron energy analysis mechanism, 7, data acquisition and control module, 8, sample, 9, synchrotron radiation beam, 10, photoelectron, 11, light source; 1-1, monochromatic mechanism cavity, 1-2, light intensity monitoring mechanism cavity, 1-3, test cavity, 1-4, rapid sample cavity, 1-5 sample transfer rod; 6-1, deceleration mirror assembly, 6-2, energy screening assembly, 6-3, detection assembly. DETAILED DESCRIPTION

[0035] Referring to Figure 1 A variable depth photoelectron energy spectrum device, comprising:

[0036] Vacuum mechanism 1: for realizing vacuum environment;

[0037] Monochromatic mechanism 2: adjusting the light emitted by light source 11, providing energy continuous adjustable synchrotron radiation beam;

[0038] Light intensity monitoring mechanism 3: for monitoring the intensity of synchrotron radiation beam;

[0039] Sample holder 4: for placing sample;

[0040] Four-axis sample holder 5: for bearing sample holder 4, can provide translation in X, Y, Z three directions and rotation around Z axis;

[0041] Photoelectron energy analysis mechanism 6: for analyzing the photoelectron signal generated after sample is irradiated by synchrotron radiation beam;

[0042] Referring to Figure 2The vacuum mechanism 1 is internally provided with a monochromatic mechanism cavity 1-1 for installing the monochromatic mechanism 2, a light intensity monitoring mechanism cavity 1-2 for installing the light intensity monitoring mechanism 3, and a test cavity 1-3 for installing the four-axis sample holder 5 and the photoelectron energy analysis mechanism 6. The synchrotron radiation beam outlet of the monochromatic mechanism cavity 1-1 is connected with the synchrotron radiation beam inlet of the light intensity monitoring mechanism cavity 1-2. The synchrotron radiation beam outlet of the light intensity monitoring mechanism cavity 1-2 is connected with the synchrotron radiation beam inlet of the test cavity 1-3.

[0043] Obviously, based on the above, the synchrotron radiation beam with continuously adjustable energy is provided by the monochromatic mechanism 2 in the application, and the intensity of the synchrotron radiation beam is monitored by the light intensity monitoring mechanism 3, so that the orbital electrons of the element to be measured are emitted with a set kinetic energy, thereby the photoelectron energy spectrum information of different depths can be fed back. The angle of the sample can also be adjusted by the four-axis sample holder 5, so that the photoelectron energy analysis mechanism 6 can receive the photoelectron signals emitted from the sample surface at different angles and capable of feeding back the photoelectron energy spectrum information of different depths, thereby the non-destructive depth-variable photoelectron energy spectrum detection can be realized.

[0044] Specifically, the bottom of the sample holder 4 and the four-axis sample holder 5 are both provided with corresponding electrodes, and the sample holder is grounded by electrical connection through the electrodes.

[0045] The four-axis sample holder 5 is manufactured by Feimeng, and the model is MBE high-low temperature sample holder-4-axis.

[0046] The stroke of the X and Y axes of the four-axis sample holder 5 is 15 mm, the stroke of the Z axis is 300 mm, and the rotation angle around the Z axis is ±179 ° .

[0047] In the embodiment, the vacuum mechanism 1 is also provided with a rapid sample feeding cavity 1-4. The outlet of the rapid sample feeding cavity 1-4 is connected with the sample inlet of the test cavity 1-3, and the inlet of the rapid sample feeding cavity 1-4 is provided with a sample transfer rod 1-5 for transferring the sample.

[0048] Obviously, based on the above, the rapid feeding can be realized by the sample transfer rod 1-5.

[0049] In the embodiment, referring to Figure 3 The grating and a plane mirror rotating around a fixed point to ensure that the position of the light spot emitted through the grating is fixed are installed in the monochromatic mechanism 2.

[0050] Obviously, based on the above, the grating utilizes the principle of multi-slit diffraction to cause the dispersion of light, thereby adjusting the photon energy of the synchrotron radiation beam.

[0051] The adjustment range of the photon energy of the synchrotron radiation beam in the monochromatic mechanism 2 is 100-1000 eV.

[0052] The grating uses the principle of multi-slit diffraction to disperse light, and the plane mirror is used for synchrotron radiation beam transmission to ensure that the position of the output synchrotron radiation beam spot is fixed.

[0053] The grating surface has scribe lines, and the dispersion effect of the grating is described by the grating equation: d(sinθ+sinα)=mλ

[0054] d: Grating constant (distance between adjacent gratings).

[0055] θ: Angle of incidence (the angle between the ray and the normal to the grating).

[0056] α: Diffraction angle (the angle between the diffracted light and the normal).

[0057] m: Diffraction order (integer, such as ±1, ±2).

[0058] λ: Wavelength of light.

[0059] When the grating rotates, α changes, and light of different wavelengths passes through the exit slit in sequence, thus achieving wavelength selection.

[0060] Reference Figure 3 The plane mirror rotates around point M at a vertical distance of 31.2 mm. During this rotation, the grating rotates accordingly. A coordinate system is established with the center of the plane grating as the origin O, the emitted light as the x-axis, and the vertical direction as the y-axis. The coordinates of point M are Xm = 0 mm and Ym = −15.7 mm.

[0061] In this embodiment, the light intensity monitoring mechanism 3 includes a vacuum electrode, a micro-galvanometer, a gold mesh, and a linear driver that drives the gold mesh to move along the optical path of the synchrotron radiation beam. The gold mesh is installed inside the cavity 1-2 of the light intensity monitoring mechanism near the synchrotron radiation beam inlet. The displacement end of the linear driver is connected to the gold mesh. One end of the vacuum electrode is connected to the gold mesh, and the other end of the vacuum electrode is connected to the micro-galvanometer via a wire.

[0062] Obviously, based on the above, when the gold mesh is irradiated by a synchrotron radiation beam, electrons will escape, and the intensity of the escape is positively correlated with the intensity of the synchrotron radiation beam. The intensity of the synchrotron radiation beam can be determined by detecting the loss current of the gold mesh using a micro-ammeter.

[0063] Specifically, the micro-ammeter used in this application is manufactured by KEITHLEY and is model number 6517A.

[0064] The gold mesh used is from Precisioneforming, model MG49 117.6LPI Au Mesh 11”x11”.

[0065] The linear driver is manufactured by Fei Mian and is model LTM35L200M.

[0066] The energy resolution of the synchrotron radiation beam in the light intensity monitoring mechanism 3 is 5000@244eV.

[0067] In this embodiment, the photoelectron energy analysis mechanism 6 comprises:

[0068] The deceleration mirror assembly 6-1 is used to collect the photoelectron signals emitted by the sample while performing deceleration and focusing processing.

[0069] The energy screening assembly 6-2 is used to screen the photoelectrons passing according to the set parameters.

[0070] The detection assembly 6-3 is used to detect the screened photoelectron signals.

[0071] The photoelectron input port of the deceleration mirror assembly 6-1 is installed inside the test cavity 1-3 near the side of the sample installation, the photoelectron output port of the deceleration mirror assembly 6-1 is connected with the photoelectron input port of the energy screening assembly 6-2, and the photoelectron output port of the energy screening assembly 6-2 is connected with the photoelectron input port of the detection assembly 6-3.

[0072] Obviously, based on the above, the photoelectron energy analysis mechanism 6 can realize the collection, screening and detection of the photoelectron signals generated by the sample after being irradiated by the synchrotron radiation beam.

[0073] Specifically, in this application, the photoelectron energy analysis mechanism 6 adopts the model EW4000 from the manufacturer Scienta Omicron, has an electron acceptance angle of 60°, and a resolution of 5meV@20eV.

[0074] In this embodiment, ion pumps for realizing vacuum are installed inside the monochromatic mechanism cavity 1-1 and the light intensity monitoring mechanism cavity 1-2, a dry pump, a molecular pump and an ion pump for realizing vacuum are installed inside the test cavity 1-3, and dry pumps and molecular pumps for realizing vacuum are installed inside the rapid sampling cavity 1-4. Vacuum gauges for measuring vacuum degree are installed inside the monochromatic mechanism cavity 1-1, the light intensity monitoring mechanism cavity 1-2, the test cavity 1-3 and the rapid sampling cavity 1-4.

[0075] Specifically, the vacuum degree of each cavity is maintained at 1×10 -9 to 1×10 -10 millibar.

[0076] In this embodiment, gate valves are arranged at the connection between the monochromatic mechanism cavity 1-1 and the light intensity monitoring mechanism cavity 1-2, at the connection between the light intensity monitoring mechanism cavity 1-2 and the test cavity 1-3, and at the connection between the rapid sampling cavity 1-4 and the test cavity 1-3.

[0077] Obviously, based on the above, the vacuum degree in each cavity can be further ensured by the arrangement of the gate valves.

[0078] As another embodiment of the present application, the embodiment proposes a control system, comprising any one of the above variable depth photoelectron spectrometer schemes, and further comprising a data acquisition and control module;

[0079] The data acquisition and control module 7 is connected to the monochromatic mechanism 2, the light intensity monitoring mechanism 3, the four-axis sample holder 5, and the photoelectron energy analysis mechanism 6, respectively.

[0080] The data acquisition and control module 7 is used to control the monochromatic mechanism 2 to obtain the target synchrotron beam, to obtain the synchrotron beam intensity monitored by the light intensity monitoring mechanism 3, to control the four-axis sample holder 5 to move to the target position, and to control the photoelectron energy analysis mechanism 6 to analyze the sample outgoing photoelectron signal and output the photoelectron spectrum.

[0081] In order to more clearly illustrate the embodiments and effects of the present application, examples are combined with the accompanying drawings as follows:

[0082] The method steps for obtaining the variable depth photoelectron spectrum by changing the synchrotron radiation energy using the monochromatic mechanism 2 are as follows:

[0083] S1: The sample holder 4 carrying the sample to be tested is transferred to the four-axis sample holder 5 in the test cavity 1-3.

[0084] S2: The four-axis sample holder 5 is controlled to move to the target position.

[0085] S3: The appropriate synchrotron radiation energy is selected according to the element to be tested of the sample to be tested for testing, the synchrotron photon energy is set to the synchrotron radiation energy that can make the corresponding orbital electron of the element to be tested exit with a kinetic energy of 100 eV, the scanning parameters of the photoelectron energy analysis mechanism 6 are set, and the photoelectron energy analysis mechanism 6 collects the photoelectron spectrum with the shallowest depth.

[0086] S4: The appropriate synchrotron radiation energy is selected according to the element to be tested of the sample to be tested for testing, the synchrotron photon energy is set to the synchrotron radiation energy that can make the corresponding orbital electron of the element to be tested exit with a kinetic energy of 300 eV, the scanning parameters of the photoelectron energy analysis mechanism 6 are set, and the photoelectron energy analysis mechanism 6 collects the photoelectron spectrum with the medium depth.

[0087] S5: The appropriate synchrotron radiation energy is selected according to the element to be tested of the sample to be tested for testing, the synchrotron photon energy is set to the synchrotron radiation energy that can make the corresponding orbital electron of the element to be tested exit with a kinetic energy of 500 eV, the scanning parameters of the photoelectron energy analysis mechanism 6 are set, and the photoelectron energy analysis mechanism 6 collects the photoelectron spectrum with the deepest depth.

[0088] S6: In order to avoid the influence of the intensity of the synchrotron radiation beam, the spectrum is calibrated by the intensity of the synchrotron radiation beam detected by the light intensity monitoring mechanism 3.

[0089] It should be noted that the orbital electrons of the element to be tested are emitted at kinetic energies of 100 eV-500 eV to feedback the photoelectron energy spectrum information at different depths, and the kinetic energy value is positively correlated with the feedback depth of the photoelectron energy spectrum information, which is well known in the industry. The present application selects the synchrotron radiation energy of 100 eV, 300 eV and 500 eV of the corresponding orbital electrons of the element to be tested, respectively, to define the photoelectron energy spectrum at the shallowest depth, the medium depth and the deepest depth for illustration.

[0090] More specifically, referring to Figure 4 , the test sample is a lithium lanthanum tantalum chloride solid-state electrolyte with a five-fluoropropyl acrylate modified surface after charge and discharge cycles, and the synchrotron radiation beam with energy of 784 eV, 984 eV and 1184 eV is used for testing, and the test results are shown in Figure 4 As the test energy gradually increases, the test depth gradually increases, therefore, analyzing the variable depth photoelectron energy spectrum obtained under different energy synchrotron radiation beam can obtain material structure information. With the increase of the energy of the synchrotron radiation beam, the peak area attributed to the bonding of fluorine and lithium gradually increases, proving that the lithium fluoride composition in the sample gradually increases with the increase of the depth, confirming that the test device is working properly.

[0091] The method steps for obtaining variable depth photoelectron energy spectrum by adjusting the angle of the sample on the sample holder 5 driven by the four-axis sample holder 5 are as follows: (specifically, the direction perpendicular to the surface of the sample is taken as the normal direction)

[0092] A1: transferring the sample holder 4 carrying the sample to be tested to the four-axis sample holder 5 in the test cavity;

[0093] A2: setting the synchrotron photon energy to the target position;

[0094] A3: controlling the four-axis sample holder 5 to move to the target position, so that the sample emitted photoelectrons are collected by the photoelectron energy analysis mechanism 6 at 0° (with respect to the normal angle), and the photoelectron energy analysis mechanism 6 collects the deepest depth photoelectron energy spectrum;

[0095] A4: controlling the four-axis sample holder 5 to move to the target position, so that the sample emitted photoelectrons are collected by the photoelectron energy analysis mechanism 6 at 30° (with respect to the normal angle), and the photoelectron energy analysis mechanism 6 collects the medium depth photoelectron energy spectrum;

[0096] A5: Control the four-axis sample holder 5 to move to the target position, so that the sample outcoming photoelectrons are collected by the photoelectron energy analyzer 6 at an angle of 45° (with respect to the normal angle), and the photoelectron energy spectrum of the shallowest depth is collected.

[0097] It should be noted that the sample outcoming photoelectron angle collected at 0-80° (with respect to the normal angle) can feedback photoelectron energy spectrum information of different depths, and the angle value is negatively correlated with the feedback depth of the photoelectron energy spectrum information, which is well known in the industry. The present application selects the sample outcoming photoelectron angles of 0°, 30° and 45°, respectively, to define the deepest depth, the medium depth and the shallowest depth of the photoelectron energy spectrum for illustration.

[0098] More specifically, referring to Figure 5 , the test sample is a SnO2 / CdS laminated film structure, and the test results are shown in Figure 4 . When the test angle is gradually rotated from near the vertical outcoming (TOA = 5°) to the outcoming angle of 45° (TOA = 45°), the test depth is gradually reduced from 10 nm to 7.07 nm closer to the interface position. Therefore, analyzing the variable depth photoelectron energy spectrum obtained at different test angles can obtain the bonding information at the interface. With the increase of the test angle, the Sn3d orbital peak position shows obvious shift phenomenon, which indicates that there are different bonding information of Sn at the bulk and the interface. Further analysis when TOA = 5°, according to the literature report, the Sn3d orbital peak can be divided into Sn-O bond and Sn-S bond, the peak positions are 495.09 eV, 486.80 eV and 494.04 eV, 485.69 eV. When the outcoming angle TOA = 45°, the Sn-O bond and Sn-S bond of Sn3d orbital are obviously changed. Through peak area calculation, the corresponding relative content can be obtained, that is, when TOA = 5°, = 0.2476; and when TOA = 45°, = 0.4438, that is, with the rotation of the outcoming angle from 5° to 45°, the detection depth gradually moves towards the surface, and the proportion of Sn-S bond also gradually increases. This significant content change proves that there are a large number of Sn-S bonds at the SnO2-CdS interface. It is confirmed that the test device is working properly.

Claims

1. A variable depth photoelectron spectrometer apparatus, characterized by, The application relates to a vacuum mechanism (1) for realizing a vacuum environment, a monochromatic mechanism (2) for adjusting light emitted by a light source (11) to provide a continuously adjustable synchronous radiation beam, a light intensity monitoring mechanism (3) for monitoring the intensity of the synchronous radiation beam, a sample holder (4) for placing a sample, a four-axis sample holder (5) for bearing the sample holder (4) and providing translation in X, Y and Z directions and rotation around the Z axis, a photoelectron energy analysis mechanism (6) for analyzing photoelectron signals generated by the sample after irradiation by the synchronous radiation beam. The vacuum mechanism (1) is internally provided with a monochromatic mechanism cavity (1-1) for mounting the monochromatic mechanism (2), a light intensity monitoring mechanism cavity (1-2) for mounting the light intensity monitoring mechanism (3) and a test cavity (1-3) for mounting the four-axis sample holder (5) and the photoelectron energy analysis mechanism (6), the synchronous radiation beam outlet of the monochromatic mechanism cavity (1-1) is connected with the synchronous radiation beam inlet of the light intensity monitoring mechanism cavity (1-2), and the synchronous radiation beam outlet of the light intensity monitoring mechanism cavity (1-2) is connected with the synchronous radiation beam inlet of the test cavity (1-3). The vacuum mechanism (1) is further provided with a rapid sample feeding cavity (1-4), the outlet of the rapid sample feeding cavity (1-4) is connected with the sample feeding inlet of the test cavity (1-3), and the inlet of the rapid sample feeding cavity (1-4) is provided with a sample transmission rod (1-5) for transmitting the sample. The monochromatic mechanism (2) is internally provided with a grating and a plane mirror rotating at a fixed point to ensure that the position of a light spot emitted through the grating is fixed. The light intensity monitoring mechanism (3) comprises a vacuum electrode, a microammeter, a gold mesh and a linear driver for driving the gold mesh to displace to the light path of the synchronous radiation beam, the gold mesh is arranged at a position close to the synchronous radiation beam inlet in the light intensity monitoring mechanism cavity (1-2), the displacement end of the linear driver is connected with the gold mesh, one end of the vacuum electrode is connected with the gold mesh, and the other end of the vacuum electrode is connected with the microammeter through a wire. The photoelectron energy analysis mechanism (6) comprises: a deceleration mirror assembly (6-1) for collecting photoelectron signals emitted by the sample and simultaneously performing deceleration and focusing treatment; an energy screening assembly (6-2) for screening photoelectrons with energy according to set parameters; 2. A variable depth photoelectron spectrometer according to claim 1, wherein: a detection assembly (6-3) for detecting the screened photoelectron signals.

3. A variable depth photoelectron spectrometer according to claim 1, wherein: The photoelectron input port of the deceleration mirror assembly (6-1) is arranged at one side of the test cavity (1-3) close to the sample mounting position, the photoelectron output port of the deceleration mirror assembly (6-1) is connected with the photoelectron input port of the energy screening assembly (6-2), and the photoelectron output port of the energy screening assembly (6-2) is connected with the photoelectron input port of the detection assembly (6-3).

4. A variable depth photoelectron spectrometer according to claim 1, wherein: ​ 5. A variable depth photoelectron spectrometer according to claim 1, wherein ​ ​ ​ ​ ​ 6. A variable depth photoelectron spectrometer according to claim 2, wherein: The monochromatic mechanism cavity (1-1) and the light intensity monitoring mechanism cavity (1-2) are internally provided with ion pumps for realizing vacuum, the test cavity (1-3) is internally provided with a dry pump, a molecular pump and an ion pump for realizing vacuum, the rapid sampling cavity (1-4) is internally provided with a dry pump and a molecular pump for realizing vacuum, and the monochromatic mechanism cavity (1-1), the light intensity monitoring mechanism cavity (1-2), the test cavity (1-3) and the rapid sampling cavity (1-4) are internally provided with vacuum gauges for measuring vacuum degree.

7. A variable depth photoelectron spectrometer according to claim 2, wherein: The monochromatic mechanism cavity (1-1) and the light intensity monitoring mechanism cavity (1-2) are internally provided with ion pumps for realizing vacuum, the test cavity (1-3) is internally provided with a dry pump, a molecular pump and an ion pump for realizing vacuum, the rapid sampling cavity (1-4) is internally provided with a dry pump and a molecular pump for realizing vacuum, and the monochromatic mechanism cavity (1-1), the light intensity monitoring mechanism cavity (1-2), the test cavity (1-3) and the rapid sampling cavity (1-4) are internally provided with vacuum gauges for measuring vacuum degree.

8. A control system characterized by: The monochromatic mechanism cavity (1-1) and the light intensity monitoring mechanism cavity (1-2) are internally provided with ion pumps for realizing vacuum, the test cavity (1-3) is internally provided with a dry pump, a molecular pump and an ion pump for realizing vacuum, the rapid sampling cavity (1-4) is internally provided with a dry pump and a molecular pump for realizing vacuum, and the monochromatic mechanism cavity (1-1), the light intensity monitoring mechanism cavity (1-2), the test cavity (1-3) and the rapid sampling cavity (1-4) are internally provided with vacuum gauges for measuring vacuum degree. The monochromatic mechanism cavity (1-1) and the light intensity monitoring mechanism cavity (1-2) are internally provided with ion pumps for realizing vacuum, the test cavity (1-3) is internally provided with a dry pump, a molecular pump and an ion pump for realizing vacuum, the rapid sampling cavity (1-4) is internally provided with a dry pump and a molecular pump for realizing vacuum, and the monochromatic mechanism cavity (1-1), the light intensity monitoring mechanism cavity (1-2), the test cavity (1-3) and the rapid sampling cavity (1-4) are internally provided with vacuum gauges for measuring vacuum degree. The data acquisition and control module (7) is connected with the monochromatic mechanism (2), the light intensity monitoring mechanism (3), the four-axis sample holder (5) and the photoelectron energy analysis mechanism (6) respectively. The data acquisition and control module (7) is used for controlling the monochromatic mechanism (2) to obtain a target synchrotron beam, controlling the light intensity monitoring mechanism (3) to monitor the intensity of the synchrotron beam, controlling the four-axis sample holder (5) to move to a target position, and controlling the photoelectron energy analysis mechanism (6) to analyze the photoelectron signal emitted by the sample and output a photoelectron spectrum.

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