Imprint master mask and diffraction optical waveguide

Abstract

The utility model provides an imprint master mask. The imprint master mask comprises at least one imprint structure area, at least one imprinting structure region comprises a first structure region and a second structure region; the first periodic imprinting units in the first structural area are used for forming periodic micro-nano optical units, and the second imprinting units in the second structural area are used for forming imprinting auxiliary units. During imprinting, a plurality of second imprinting units in a second structure area in the imprinting mother set can orderly control the flowing direction or the array arrangement mode of imprinting glue overflowing during imprinting in the imprinting process, and the problem of an'glue overflowing ring 'formed by whole glue overflowing in an existing imprinting mode is solved; according to the invention, the glue overflow problem is improved in a step-type or ring-type glue overflow control mode, the defect problem caused by glue overflow is reduced, and the imprinting quality is improved; the formed diffraction optical waveguide can improve the trailing condition to a certain extent, and the imaging quality of the diffraction optical waveguide is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to nanometer imprinting technical field especially, relate to a kind of imprinting master and diffractive optical waveguide. BACKGROUND

[0002] In the existing nanometer imprinting technology, since master is pressed, it is easy to make that imprinting glue is extruded to the direction of imprinting advance, make in different structure edge position appear overflow glue condition. For this phenomenon, the person skilled in the art aims to change the structure of imprinting master to improve the overflow glue condition, such as the public number CN221427010U discloses a kind of imprinting master, compensation structure is arranged in imprinting master to accommodate overflowed imprinting material, such as Figure 1 As shown in the patent disclosed two different compensation structures, based on the imprinting master, the person skilled in the art can alleviate the overflow glue condition to some extent when imprinting, but cannot effectively solve the problem of "overflow glue ring" formed by the entire overflow glue outside grating structure area, and the trailing condition of image blur effect formed in image when waveguide based on the master is imprinted, which is unacceptable to the person skilled in the art.

[0003] Therefore, on the basis of prior art, how to improve the structure of existing imprinting master to reduce the problem of "overflow glue ring" outside grating structure area and the trailing condition of image blur effect is urgently needed to be solved. CONTENT OF THE UTILITY MODEL

[0004] The utility model provides a kind of imprinting master and diffractive optical waveguide, it is proposed to solve the technical problem in prior art.

[0005] A kind of imprinting master, including substrate, at least one imprinting structure area is provided on any surface of the substrate;At least one the imprinting structure area includes first structure area and second structure area;The second structure area is configured to be arranged around the first structure area;The first structure area includes several periodic imprinting units one, and the second structure area includes several imprinting units two, the periodic imprinting unit one in the first structure area is used to form periodic micro-nano optical unit, and the several imprinting units two in the second structure area are used to form imprinting auxiliary unit.

[0006] Further, in some embodiments, several the imprinting units two in the second structure area are arranged in periodic structure.

[0007] Further, in some embodiments, the periodic imprinting unit one in the first structure area is same with the periodicity of the several periodic imprinting units two in the second structure area.

[0008] Further, in some embodiments, the periodic micro-nano optical unit and the imprinting auxiliary unit are both diffraction grating units.

[0009] Further, in some embodiments, the heights of the second plurality of imprinting units in the second structure region decrease successively in a direction away from the center of the first structure region, and the heights of the second plurality of imprinting units in the second structure region are less than or equal to the heights of the first plurality of periodic imprinting units in the first structure region.

[0010] Further, in some embodiments, the heights of the second plurality of imprinting units in the second structure region are the same as the heights of the first plurality of periodic imprinting units in the first structure region.

[0011] Further, in some embodiments, the heights of the second plurality of imprinting units in the second structure region are less than the heights of the first plurality of periodic imprinting units in the first structure region; and the heights of the second plurality of imprinting units in the second structure region are uniform.

[0012] Further, in some embodiments, the heights of the second plurality of imprinting units in the second structure region are greater than the heights of the first plurality of periodic imprinting units in the first structure region.

[0013] Further, in some embodiments, the duty cycles of the second plurality of imprinting units in the second structure region are different from the duty cycles of the first plurality of periodic imprinting units in the first structure region.

[0014] Further, the imprinting master further comprises at least one first structure region.

[0015] Meanwhile, the present application provides a diffraction optical waveguide based on the imprinting master according to any one of the above embodiments.

[0016] The imprinting master provided by the application comprises at least one imprinting structure area; at least one of the imprinting structure areas comprises a first structure area and a second structure area; periodic imprinting units one in the first structure area are used to form periodic micro-nano optical units, and a plurality of imprinting units two in the second structure area are used to form imprinting auxiliary units; during imprinting, the plurality of imprinting units two in the second structure area of the imprinting master can orderly control the flow direction or array arrangement mode of the overflowed imprinting glue in the imprinting process, thereby avoiding the problem of the "overflow glue ring" formed by the entire overflow glue in the existing imprinting mode; the application uses the "step" type or "annular" type control overflow glue form to improve the overflow glue problem, reduce the defect problem caused by the overflow glue, and improve the imprinting quality; the formed diffractive optical waveguide can improve the tailing condition as indicated in the background part to some extent, improve the imaging quality of the diffractive optical waveguide, make the imaging clearer and more accurate, and meet the high-resolution imaging requirement. Compared with the prior art, the application has beneficial technical effects. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0018] Figure 1 It is a schematic diagram of the imprinting master structure in the prior art.

[0019] Figures 2-1~2-6 It is a structural schematic diagram of the imprinting master provided by the present application.

[0020] Figures 3-1~3-2 It is a structural schematic diagram of the imprinting master provided by the present application.

[0021] Figure 4 It is a schematic diagram of the imprinting process of the imprinting master provided by the present application.

[0022] Figures 5-1~5-2 It is a schematic diagram of the imprinting process of the imprinting master provided by the present application. DETAILED DESCRIPTION

[0023] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0024] like Figure 1 As shown, there are two structures of an imprint master provided in the prior art. A compensation structure is set outside the grating structure to accommodate the overflow of imprint material. As pointed out in the background section, it still has the problem of imprint defects. This application aims to solve the problem of this defect.

[0025] This application provides a new printing master 10, such as Figures 2-1~2-6 As shown, and in combination Figure 4 The imprint master 10 includes a substrate, and at least one imprint structure region is provided on any surface of the substrate; the at least one imprint structure region includes a first structure region 101 and a second structure region 102, the second structure region 102 is configured to surround the first structure region 101, the first structure region 101 includes a plurality of periodic imprint units one, the second structure region 102 includes a plurality of imprint units two, the periodic imprint units one in the first structure region 101 is used to form periodic micro-nano optical units 1011, and the plurality of imprint units two in the second structure region 102 is used to form imprint auxiliary units 1021.

[0026] The second imprinting units 2 in the second structural region 102 are arranged in a periodic structure; furthermore, the period of the periodic imprinting units 1 in the first structural region 101 is the same as that of the periodic imprinting units 2 in the second structural region 102.

[0027] In one embodiment, both the micro-nano optical unit 1011 and the imprinting auxiliary unit 1021 are diffraction grating units.

[0028] In one embodiment, such as Figure 2-1 As shown, the heights of the plurality of imprinting units 2 within the second structural region 102 decrease sequentially in the direction away from the center of the first structural region 101, and the heights of the plurality of imprinting units 2 within the second structural region 102 are less than or equal to the heights of the plurality of periodic imprinting units 1 within the first structural region 101; and the duty cycle of the plurality of imprinting units 2 within the second structural region 102 is equal to the duty cycle of the plurality of periodic imprinting units 1 within the first structural region 101. The period of the plurality of imprinting units 2 is the same as that of the plurality of periodic imprinting units 1.

[0029] In another embodiment, such asFigure 2-2 As shown, the height of several imprinting units 2 in the second structural region 102 is the same as that of several periodic imprinting units 1 in the first structural region 101; and the duty cycle of several imprinting units 2 in the second structural region 102 is equal to the duty cycle of several periodic imprinting units 1 in the first structural region 101. The period of several imprinting units 2 is the same as that of several periodic imprinting units 1.

[0030] In another embodiment, such as Figure 2-3 As shown, the height of several imprinting units 2 in the second structural region 102 is the same as that of several periodic imprinting units 1 in the first structural region 101; and the duty cycle of several imprinting units 2 in the second structural region 102 is not equal to the duty cycle of several periodic imprinting units 1 in the first structural region 101. The period of several imprinting units 2 is the same as that of several periodic imprinting units 1.

[0031] In another embodiment, such as Figure 2-4 As shown, the height of several imprinting units 2 within the second structural region 102 is less than the height of several periodic imprinting units 1 within the first structural region 101; and the height of several imprinting units 2 within the second structural region 102 is uniform; and the duty cycle of several imprinting units 2 within the second structural region 102 is equal to the duty cycle of several periodic imprinting units 1 within the first structural region 101. The period of several imprinting units 2 is the same as that of several periodic imprinting units 1.

[0032] In another embodiment, such as Figure 2-5 As shown, the height of several imprinting units 2 in the second structural region 102 is greater than the height of several periodic imprinting units 1 in the first structural region 101; and the duty cycle of several imprinting units 2 in the second structural region 102 is less than the duty cycle of several periodic imprinting units 1 in the first structural region 101. The period of several imprinting units 2 is the same as that of several periodic imprinting units 1.

[0033] In another embodiment, such as Figure 2-6 As shown, the height of several imprinting units 2 in the second structural region 102 is less than the height of several periodic imprinting units 1 in the first structural region 101; and the duty cycle of several imprinting units 2 in the second structural region 102 is not equal to the duty cycle of several periodic imprinting units 1 in the first structural region 101. The period of several imprinting units 2 is the same as that of several periodic imprinting units 1.

[0034] Of course, in the above embodiments, the height and duty cycle of the several periodic imprinting units one in the first structural region 101 and the several imprinting units two in the second structural region 102 are only schematic and do not represent the actual structure of the imprinting units. For example, the imprinting units can be inclined structures, and their height and duty cycle can be changed according to the specific optical design. Any changes to the structure of the imprinting units within the scope of the inventive concept of this application are adjustments made by those skilled in the art based on this application and are all within the protection scope of this application.

[0035] Meanwhile, in the above embodiments, the micro-nano units within the first structural region 101 and the second structural region 102 can form imprinted diffraction grating units. Figures 2-1~2-6 In the example, the spacing between the first structural region 101 and the second structural region 102 in the printing master is based on meeting the optical design requirements of the diffractive waveguide. The spacing in the figure is only an example and does not represent the actual spacing between the first structural region 101 and the second structural region 102 in the printing master. Those skilled in the art define the spacing between the two regions according to the requirements of total internal reflection.

[0036] In one embodiment, the first structural region 101 is disposed adjacent to and surrounding the second structural region 102, such as Figure 5-1 As shown.

[0037] Furthermore, combined with Figure 3-1 , Figure 3-2 As shown, Figures 2-1~2-6 The embossing master structure shown only represents the structure of the first structural region 101 and the second structural region 102 within a certain embossing structural region; it can be understood that, for example, for an embossing master for fabricating a diffractive optical waveguide, it includes at least two embossing structural regions, such as... Figure 3-1 , Figure 3-2 As shown, the printing master includes three printing structure regions, each of which includes a first structure region 101 and a second structure region 102.

[0038] It is known, of course, that the imprinting master includes at least two imprinting structural regions, each imprinting structural region including a first structural region 101 and a second structural region 102; such as Figure 3-1 As shown, the printing master includes three imprinted structural regions, which may optionally include an inset structural region, a transition structural region, and an outset structural region. In some other embodiments, the printing master includes at least four imprinted structural regions, including an inset structural region, a transition structural region, an outset structural region, and a recovery structural region. Of course, the present invention does not limit the number of imprinted structural regions in the printing master, such as 2, 3, 4, etc. The number of structural regions determined by those skilled in the art in optical design is within the scope defined in this application.

[0039] like Figure 3-1 , Figure 3-2 As shown, an imprint master 10 comprising three imprinted structural regions is formed on a substrate. The distance between each adjacent imprinted structural region is determined according to a design value. Based on this imprint master 10, micro-nano optical units, including a plurality of imprinted units complementary to the imprinted units within the three imprinted structural regions, are formed on a wafer 30. Examples include the micro-nano optical unit 1011 corresponding to the first structural region 101 and the imprinted auxiliary unit 1021 corresponding to the second structure 102, distinguishing it from existing imprint master technologies. In this embodiment, the micro-nano optical unit 1011 and the imprinted auxiliary unit 1021 are imprinted diffraction grating units. In this application, the micro-nano optical unit corresponding to the first structural region 101 of the imprint master 10 is formed by imprinting, and a plurality of imprinted auxiliary units 1021 are simultaneously formed around the micro-nano optical unit.

[0040] Wafer 30 can be made of silicon, glass, resin, lithium niobate, magnesium fluoride, zinc sulfide, gallium arsenide, silicon dioxide, silicon nitride, silicon carbide, gallium nitride, or indium phosphide, etc.

[0041] In another embodiment, such as Figures 5-1~5-2 As shown, an imprinting master includes a substrate, on which at least one imprinted structural region is formed. Each imprinted structural region includes a first structural region 101 and a second structural region 102. The imprinting master also includes at least one first structural region 101, meaning it comprises multiple first structural regions 101 and a second structural region 102 corresponding to a specific first structural region 101. Specifically, the diffractive waveguide formed by the imprinting master includes a micro / nano optical unit 1011 and an imprinting auxiliary unit 1021 only within a specific imprinted structural region, while other grating structural regions do not include the imprinting auxiliary unit 1021. Figure 5-2 The embossing master shown includes an embossing structure region having a first structure region 101 and a second structure region 102, and multiple other first structure regions 101. Based on the embossing master, within the corresponding multiple embossing structure regions, only the region corresponding to a certain embossing structure region is formed with micro-nano optical units 1011 and embossing auxiliary units 1021, while other regions only include micro-nano optical units 1011 and do not include embossing auxiliary units 1021.

[0042] Based on the above embodiments, further, a plurality of imprinting auxiliary units 1021 are arranged periodically.

[0043] Furthermore, based on the above embodiments, a plurality of imprinting auxiliary units 1021 are arranged periodically, and the period of the plurality of imprinting auxiliary units 1021 is the same as the period of the micro-nano optical unit 1011.

[0044] In conjunction with the above embodiments, Figure 4 This application provides further details, such as Figure 2-1 In the illustrated embodiment, the heights of the plurality of imprinting units 2 within the second structural region 102 decrease sequentially in the direction away from the first structural region 101, and the heights of the plurality of imprinting units 2 within the second structural region 102 are less than or equal to the heights of the plurality of periodic imprinting units 1 within the first structural region 101; and the duty cycle of the plurality of imprinting units 2 within the second structural region 102 is equal to the duty cycle of the plurality of periodic imprinting units 1 within the first structural region 101. Taking the imprinting master 10 as an example, a flexible film sub-plate is used, and a flexible film sub-plate imprinting structure 20 complementary to the structure of the imprinting master 10 is formed on the flexible film sub-plate. The imprinting adhesive located on the surface of the wafer 30 is imprinted through the flexible film sub-plate imprinting structure 20, and a plurality of imprinting units complementary to the flexible film sub-plate imprinting structure 20 are formed on the surface of the wafer 30.

[0045] The imprint master of this structure forms micro-nano optical units 1011 and imprint auxiliary units 1021 on the surface of wafer 30. Figure 4 Only one schematic diagram of the process of forming an imprinting unit from an imprinting master with one structure is shown. For Figures 2-2~2-6 In the embodiment, based on the same imprinting process as described above, a plurality of imprinting units are formed on the surface of wafer 30, which will not be described in detail here.

[0046] Of course, further on, Figure 4 The diagram only shows the process of forming imprinting units on the surface of wafer 30 through a structural region of the imprinting master. It can be understood that, for example... Figure 3-1 As shown, this essentially includes the process of forming multiple imprinted cells on wafer 30. Figure 4 The imprinting process is not limited to a single structural region, as those skilled in the art will clearly understand. For example, based on... Figure 3-2 The embossing master shown includes an embossing process in which multiple embossing units are formed on the surface of wafer 30 based on the multiple embossing structure regions.

[0047] Several imprinting auxiliary units 1021 are diffraction grating structures. Micro-nano optical units 1011 are diffraction grating structures.

[0048] In accordance with the above embodiments, a plurality of imprinting units are formed on the surface of wafer 10, including an imprinting auxiliary unit 1021 and a micro-nano optical unit 1011.

[0049] Meanwhile, this application provides a diffractive waveguide, which is obtained by imprinting based on the imprinting master 10 in the aforementioned embodiment.

[0050] The diffractive waveguide obtained by imprinting with the master plate 10 provided in this application allows for the orderly control of the flow direction or array arrangement of the overflowing imprinting adhesive within the second structural region 102 of the master plate 10 during imprinting. This avoids the problem of "overflowing adhesive rings" formed by the overflowing adhesive in existing imprinting methods. This application improves the overflowing adhesive problem by controlling the overflowing adhesive in a "stepped" or "ring-shaped" manner. The resulting diffractive waveguide can, to a certain extent, improve the trailing phenomenon as pointed out in the background section and enhance the imaging quality of the diffractive waveguide. Compared with the prior art, it has beneficial technical effects.

[0051] The specific embodiments described above do not constitute a limitation on the scope of protection of this utility model. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the scope of protection of this utility model.

Claims

1. An embossing master, characterized in that, The system includes a substrate, on any surface of which at least one imprinted structure region is formed; at least one imprinted structure region includes a first structure region and a second structure region; the second structure region is configured to surround the first structure region; the first structure region includes a plurality of periodic imprinting units I, and the second structure region includes a plurality of imprinting units II, wherein the periodic imprinting units I in the first structure region are used to form periodic micro / nano optical units, and the plurality of imprinting units II in the second structure region are used to form imprinting auxiliary units.

2. The printing master according to claim 1, characterized in that, The imprinting units 2 within the second structural region are arranged in a periodic structure.

3. The printing master according to claim 2, characterized in that, The periodic imprinting units one in the first structural region have the same period as the periodic imprinting units two in the second structural region.

4. The printing master according to claim 3, characterized in that, Both the periodic micro / nano optical unit and the imprinting auxiliary unit are diffraction grating units.

5. The printing master according to claim 3, characterized in that, The height of the plurality of imprinting units 2 in the second structural region decreases sequentially in the direction away from the center of the first structural region, and the height of the plurality of imprinting units 2 in the second structural region is less than or equal to the height of the periodic imprinting unit 1 in the first structural region.

6. The printing master according to claim 3, characterized in that, The height of several imprinting units 2 in the second structural region is the same as that of several periodic imprinting units 1 in the first structural region.

7. The printing master according to claim 3, characterized in that, The height of several imprinting units 2 in the second structural region is less than the height of several periodic imprinting units 1 in the first structural region; and the height of several imprinting units 2 in the second structural region is uniform.

8. The printing master according to claim 3, characterized in that, The height of several imprinting units 2 in the second structural region is greater than the height of several periodic imprinting units 1 in the first structural region.

9. A printing master according to any one of claims 5 to 8, characterized in that, The duty cycle of several imprinting units 2 in the second structural region is different from the duty cycle of several periodic imprinting units 1 in the first structural region; the imprinting master also includes at least one of the first structural regions.

10. A diffractive optical waveguide, characterized in that, The diffractive waveguide is based on an imprinting master as described in any one of claims 1 to 9.

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