Electron purification device and electron emission device

Abstract

The utility model provides an electron purification device which comprises a cavity, an inlet and an outlet, and electrons to be purified enter the cavity through the inlet; and the plurality of electrodes are arranged in the cavity and are used for generating a deflection electric field, so that the electrons are deflected at a preset angle and leave the cavity from the outlet of the cavity. The utility model further provides an electron emission device. According to the electron purification device and the electron emission device provided by the invention, the separation of electrons and impurity particles can be realized, and the electrons are purified.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, and particularly relates to an electron purification device and an electron emission device. BACKGROUND

[0002] In traditional semiconductor device manufacturing, ion implantation is an indispensable step for electrical regulation of logic devices. A Pierce gun (PFG) as an important component of an ion implanter provides a large number of electrons for ion beam current, neutralizes positive ions in the beam current, and shapes the ion beam current.

[0003] Generally, the Pierce gun generates a large number of electrons by heating a tungsten filament, and introduces xenon (Xeon) gas to ionize the xenon gas under the action of the electrons to form more electrons. However, in the process of generating electrons, there are cations, xenon molecular products, and a large number of tungsten ions generated by the tungsten filament in the process of generating electrons. The above impurity particles are emitted together with the electrons and mixed into the ion beam, and finally injected together into the wafer surface, causing dose error and metal contamination, especially for CMOS image sensors (CIS), which may cause device failure in severe cases.

[0004] Therefore, it is necessary to develop an electron purification device and an electron emission device to remove impurity particles in the electron beam. CONTENT OF THE INVENTION

[0005] The purpose of the present application is to provide an electron purification device to remove impurity particles in the electron beam.

[0006] In a first aspect, the embodiments of the present application provide an electron purification device, comprising: a cavity comprising an inlet and an outlet, wherein electrons to be purified enter the cavity through the inlet; a plurality of electrodes arranged in the cavity, for generating a deflection electric field to cause the electrons to be deflected by a preset angle, so as to exit the cavity from the outlet of the cavity.

[0007] In some embodiments of the present application, the plurality of electrodes comprises a first electrode and a second electrode arranged oppositely, and a gap is arranged between the first electrode and the second electrode for the electrons to be purified to pass through.

[0008] In some embodiments of the present application, the plurality of electrodes further comprises: a third electrode and a fourth electrode oppositely arranged, the third electrode is located on a side of the first electrode away from the inlet, and the distance between the third electrode and the first electrode is 0.8-1.2 cm; the fourth electrode is located on a side of the second electrode away from the inlet, and the distance between the fourth electrode and the second electrode is 0.3-0.7 cm; a fifth electrode and a sixth electrode oppositely arranged, the fifth electrode is located on a side of the third electrode away from the first electrode, and the distance between the fifth electrode and the third electrode is 1.8-2.2 cm; the sixth electrode is located on a side of the fourth electrode away from the second electrode, and the distance between the sixth electrode and the fourth electrode is 1.1-1.5 cm.

[0009] In some embodiments of the present application, the plurality of electrodes further comprises: a seventh electrode and an eighth electrode oppositely arranged, the seventh electrode is located on a side of the fifth electrode away from the third electrode, and the distance between the seventh electrode and the fifth electrode is 1.8-2.2 cm; the eighth electrode is located on a side of the sixth electrode away from the fourth electrode, and the distance between the eighth electrode and the sixth electrode is 1.5-1.8 cm; a ninth electrode and a tenth electrode oppositely arranged, the ninth electrode is located on a side of the seventh electrode away from the fifth electrode, and the distance between the ninth electrode and the seventh electrode is 1.8-2.2 cm; and the tenth electrode is located on a side of the eighth electrode away from the sixth electrode, and the distance between the tenth electrode and the eighth electrode is 0.8-1.2 cm.

[0010] In some embodiments of the present application, the inlet is arranged on a top plate of the cavity, and the outlet is arranged on a bottom plate of the cavity.

[0011] In some embodiments, the bottom plate and one side plate of the cavity form an acute angle.

[0012] In some embodiments, the surfaces of the plurality of electrodes are provided with a graphite coating.

[0013] In a second aspect, the embodiments of the present application further provide an electron emitting device, comprising: an electron generator for generating electrons and impurity particles; and an electron purification device as described in the first aspect of the present application.

[0014] In some embodiments, the electron emitting device further comprises a transmission cavity, which is arranged outside the electron purification device and is used for transmitting the purified electrons.

[0015] In some embodiments, the electron emitting device further comprises an emitted electron monitor electrically connected to the plurality of electrodes and the transmission cavity, respectively, for monitoring the current generated by the electrons received by the plurality of electrodes and the transmission cavity.

[0016] The electron purification device and the electron emitting device provided by the present application have the following advantages, but are not limited to the following:

[0017] The electron purification device provided by the present application comprises a cavity and a plurality of electrodes arranged in the cavity, and the plurality of electrodes generate a potential difference, so that the electrons and impurity particles entering the cavity generate different motion directions, thereby realizing the separation of the electrons and the impurity particles.

[0018] The electron emitting device provided by the present application realizes the purification of the electron beam generated by the electron generator by configuring the electron purification device. In addition, by electrically connecting the emitted electron monitor to the plurality of electrodes of the electron purification device, the stability of the emitted current of the electron generator is monitored. In addition, by electrically connecting the emitted electron monitor to the transmission cavity arranged outside the electron purification device, the current generated by the effective electron beam generated by the electron emitting device is further monitored in real time. BRIEF DESCRIPTION OF DRAWINGS

[0019] The following drawings describe the exemplary embodiments disclosed in the present application in detail. The same reference numerals in the several views of the drawings represent similar structures. Those skilled in the art will understand that these embodiments are non-limiting, exemplary embodiments, and the drawings are only for the purpose of illustration and description, and are not intended to limit the scope of the present application, and other embodiments can also achieve the same purpose. It should be understood that the drawings are not drawn to scale.

[0020] Wherein:

[0021] Figure 1 FIG. 1 is a structural schematic diagram of an electron purification device according to some embodiments of the present application; and

[0022] Figure 2 FIG. 2 is a structural schematic diagram of an electron emitting device according to some embodiments of the present application. DETAILED DESCRIPTION

[0023] The following description provides specific application scenarios and requirements of the present application, which is intended to enable those skilled in the art to manufacture and use the content of the present application. Various local modifications of the disclosed embodiments are obvious to those skilled in the art, and the general principles defined herein can be applied to other embodiments and applications without departing from the spirit and scope of the present application. Therefore, the present application is not limited to the shown embodiments, but is consistent with the widest scope of the claims.

[0024] The application provides an electron purification device, comprising a cavity, the cavity comprising an inlet and an outlet, electrons to be purified entering the cavity through the inlet; a plurality of electrodes for generating a deflection electric field to cause the electrons to be deflected by a preset angle, so as to exit the cavity from the outlet of the cavity.

[0025] The electron purification device provided by the application comprises a cavity and a plurality of electrodes arranged in the cavity, the plurality of electrodes generating a deflection electric field to cause the electrons entering the cavity to be deflected by a preset angle, separate from impurity particles in the electron beam, and exit the cavity from the outlet of the cavity, thereby achieving purification of the electrons.

[0026] The electron purification device provided by the application will be described in detail below in combination with specific embodiments and drawings.

[0027] Reference Figure 1 The application provides an electron purification device.

[0028] Electrons are generally generated by an electron generator, however, the electron beam generated by the electron generator comprises electrons and impurity particles, and therefore the electron beam needs to be purified by using the electron purification device to remove the impurity particles in the electron beam. It should be noted that the impurity particles in the application are ions or particles with electric neutrality.

[0029] The electron purification device in the embodiments of the application comprises a cavity 100 and a plurality of electrodes arranged in the cavity 100.

[0030] The cavity 100 comprises an inlet 110 and an outlet 120. The inlet 110 is used to make the electrons and the impurity particles enter the cavity 100, and the outlet 120 is configured to make only the electrons pass through and exit the cavity 100.

[0031] The electrons and the impurity particles enter the cavity 100 from the inlet 110, the electrons are deflected by a preset angle under the action of the deflection electric field generated by the plurality of electrodes, and are separated from the impurity particles, wherein the impurity particles adhere to the electrodes or the inner wall of the cavity 100 under the action of the deflection electric field, and the electrons exit the cavity 100 from the outlet 120, thereby purifying the electron beam.

[0032] In some embodiments, the inlet 110 is arranged on a top plate 111 of the cavity 100, and the outlet 120 is arranged on a bottom plate 112 of the cavity 100.

[0033] In some embodiments, the top plate 111 is perpendicular to a side plate 113 of the cavity 100.

[0034] In some embodiments, the width (i.e. the length in the X direction as shown) of the top plate 111 is 14-16 cm, for example, 14 cm, 15 cm or 16 cm. Figure 1

[0035] In some embodiments, the angle θ between the bottom plate 112 and one side plate 113 of the cavity 100 is an acute angle, for example, 60°, 65°, 70°, 75° or 80°.

[0036] In some embodiments, the length (i.e. the length in the Y direction as shown) of the longest side plate 113 of the cavity 100 is 8-12 cm, for example, 8 cm, 9 cm, 10 cm, 11 cm or 12 cm. Figure 2

[0037] In the embodiments of the present application, the plurality of electrodes are used to generate a deflection electric field to cause the electrons to be deflected by a preset angle, separate from the impurity particles, and exit the cavity 100 through the outlet 120. Specifically, under the action of the deflection electric field, the electrons are deflected towards the direction of high electric potential, the ions in the impurity particles are deflected towards the direction of low electric potential, and the neutral particles in the impurity particles do not deflect, thereby achieving the separation of the electrons from the impurity particles.

[0038] In some embodiments, the plurality of electrodes include a first electrode 210b and a second electrode 210a arranged oppositely, and a gap is arranged between the first electrode 210b and the second electrode 210a for the passage of the electrons to be purified, i.e. the electron beam. The electrons and the impurity particles pass through the gap between the first electrode 210b and the second electrode 210a and are separated due to the difference in their movement directions.

[0039] When the electric potential applied to the first electrode 210b is less than the electric potential applied to the second electrode 210a, for example, 0-1.5 V (e.g. 0 V, 1.0 V or 1.5 V) is applied to the first electrode 210b, and 1.8-2.3 V (e.g. 1.8 V, 2.0 V or 2.3 V) is applied to the second electrode 210a, the movement direction of the electrons is deflected towards the second electrode 210a, the movement direction of the ions is deflected towards the first electrode 210b, and the movement direction of the neutral particles is not deflected. Figure 1 When the electrons and the impurity particles move along the Y direction, the electrons in the electron beam are deflected counterclockwise towards the X direction; the ions in the electron beam are deflected clockwise away from the X direction; and the neutral particles in the electron beam are not deflected.

[0040] ​​In some embodiments, the plurality of electrodes further comprises a third electrode 220b, a fourth electrode 220a, a fifth electrode 230b and a sixth electrode 230a.

[0041] The third electrode 220b is disposed opposite to the fourth electrode 220a.

[0042] The third electrode 220b is located on a side of the first electrode 210b away from the inlet 110, and the distance between the third electrode 220b and the first electrode 210b is 0.8-1.2 cm, for example, 0.8 cm, 0.95 cm, 1.09 cm, 1.13 cm or 1.2 cm. It should be noted that the distance between adjacent electrodes referred to in the present specification refers to the distance between the ends of adjacent electrodes close to the gap for the electron beam to pass through.

[0043] In some embodiments, the voltage applied to the third electrode 220b is 3-7 V, for example, 3 V, 5 V or 7 V.

[0044] In some embodiments, the third electrode 220b has a first inclination angle with the first electrode 210b. It should be noted that the size of the first inclination angle referred to in the present specification is defined as the angle between the plane of the first electrode 210b and the plane on which the third electrode 220b is located, which is less than 90°. The following description of the inclination angle can be referred to for reference, and for the sake of brevity, the description will not be repeated.

[0045] The fourth electrode 220a is located on a side of the second electrode 210a away from the inlet 110, and the distance between the fourth electrode 220a and the second electrode 210a is 0.3-0.7 cm, for example, 0.3 cm, 0.42 cm, 0.5 cm, 0.63 cm or 0.7 cm.

[0046] In some embodiments, the voltage applied to the fourth electrode 220a is 6-8 V, for example, 6 V, 7 V or 8 V.

[0047] In some embodiments, the fourth electrode 220a has a second inclination angle with the second electrode 210a. It can be understood that the size of the second inclination angle is equal to that of the first inclination angle.

[0048] The fifth electrode 230b is disposed opposite to the sixth electrode 230a.

[0049] The fifth electrode 230b is located on the side of the third electrode 220b away from the first electrode 210b, and the distance between the fifth electrode 230b and the third electrode 220b is 1.8-2.2 cm, for example, 1.8 cm, 1.9 cm, 2.0 cm, 2.1 cm, or 2.2 cm.

[0050] In some embodiments, the voltage applied to the fifth electrode 230b is 7-9 V, for example, 7 V, 8 V, or 9 V.

[0051] In some examples, the fifth electrode 230b has a third inclination angle with the first electrode 210b.

[0052] The sixth electrode 230a is located on the side of the fourth electrode 220a away from the second electrode 210a, and the distance between the sixth electrode 230a and the fourth electrode 220a is 1.1-1.5 cm, for example, 1.1 cm, 1.23 cm, 1.35 cm, 1.44 cm, or 1.5 cm.

[0053] In some embodiments, the voltage applied to the sixth electrode 230a is 9-11 V, for example, 9 V, 10 V, or 11 V.

[0054] In some examples, the sixth electrode 230a has a fourth inclination angle with the second electrode 210a. It can be understood that the fourth inclination angle is equal in size to the second inclination angle.

[0055] The third electrode 220b, the fourth electrode 220a, the fifth electrode 230b, and the sixth electrode 230a are arranged for two purposes:

[0056] First, with reference to the first electrode 210b and the second electrode 210a, when the electrons pass through the gap between the third electrode 220b and the fourth electrode 220a and the gap between the fifth electrode 230b and the sixth electrode 230a, the direction of movement of the electrons can differ under the action of the potential difference, facilitating the separation of the electrons and the impurity particles.

[0057] On the other hand, by setting the potential, a potential difference can be generated between the first electrode 210b and the third electrode 220b, between the third electrode 220b and the fifth electrode 230b, between the second electrode 210a and the fourth electrode 220a, and between the fourth electrode 220a and the sixth electrode 230a, so that the electrons and the impurity particles generate a speed difference during movement, further realizing the separation of the electrons and the impurity particles.

[0058] For example, when there is a positive potential difference in the direction of motion, i.e. from the electrode with higher potential to the electrode with lower potential, the ions are accelerated, the neutral particles remain at constant speed, and the electrons are decelerated, thus further separating the electrons from the impurity particles.

[0059] In addition, the potential between the electrodes can be set so that the kinetic energy of the electrons entering and leaving the cavity 100 does not change, for example, the electrons are accelerated between the first electrode 210b and the third electrode 220b and between the second electrode 210a and the fourth electrode 220a; the electrons are decelerated between the third electrode 220b and the fifth electrode 230b and between the fourth electrode 220a and the sixth electrode 230a, so as to ensure that the overall kinetic energy of the electrons does not change after passing through the plurality of electrodes.

[0060] Referring to the above principle, more electrodes can be provided to separate the electrons and the impurity particles. For example, in some embodiments, the electron purification device further comprises a seventh electrode 240b, an eighth electrode 240a, a ninth electrode 250b and a tenth electrode 250a.

[0061] The seventh electrode 240b and the eighth electrode 240a are oppositely arranged.

[0062] The seventh electrode 240b is located on the side of the fifth electrode 230b away from the third electrode 220b, and the distance between the seventh electrode 240b and the fifth electrode 230b is 1.8cm-2.2cm, for example, 1.8cm, 1.9cm, 2.0cm, 2.1cm or 2.2cm.

[0063] In some embodiments, the voltage applied to the seventh electrode 240b is 4-6V, for example, 4V, 5V or 6V.

[0064] In some examples, the seventh electrode 240b and the first electrode 210b have a fifth inclination angle.

[0065] The eighth electrode 240a is located on the side of the sixth electrode 230a away from the fourth electrode 220a, and the distance between the eighth electrode 240a and the sixth electrode 230a is 1.5cm-1.8cm, for example, 1.5cm, 1.65cm, 1.73cm or 1.8cm.

[0066] In some embodiments, the voltage applied to the eighth electrode 240a is 0-2V, for example, 0V, 1V or 2V.

[0067] In some examples, the eighth electrode 240a has a sixth inclination angle with the second electrode 210a. It can be appreciated that the sixth inclination angle is equal to the fifth inclination angle.

[0068] The ninth electrode 250b and the tenth electrode 250a are oppositely arranged.

[0069] The ninth electrode 250b is located on a side of the seventh electrode 240b away from the fifth electrode 230b, and the distance between the ninth electrode 250b and the seventh electrode 240b is 1.8-2.2 cm, for example, 1.8 cm, 1.93 cm, 2.02 cm, 2.18 cm or 2.2 cm.

[0070] In some examples, the voltage applied to the ninth electrode 250b is 1.5-3.5 V, for example, 1.5 V, 2.5 V or 3.5 V.

[0071] In some examples, the ninth electrode 250b has a seventh inclination angle with the first electrode 210b.

[0072] The tenth electrode 250a is located on a side of the eighth electrode 240a away from the sixth electrode 230a, and the distance between the tenth electrode 250a and the eighth electrode 240a is 0.8-1.2 cm, for example, 0.8 cm, 1.0 cm or 1.2 cm.

[0073] In some examples, the voltage applied to the tenth electrode 250 is 4-6 V, for example, 4 V, 5 V or 6 V.

[0074] In some examples, the tenth electrode 250a has an eighth inclination angle with the second electrode 210a.

[0075] In some embodiments, the fifth inclination angle is greater than or equal to the third inclination angle; and / or the seventh inclination angle is greater than or equal to the fifth inclination angle.

[0076] The design principle of setting the number of the plurality of electrodes to the above-mentioned ten is similar to the design principle of setting the number of the plurality of electrodes to the above-mentioned six, and the difference lies in that setting the number of the plurality of electrodes to ten can accelerate or decelerate the electrons in stages, further promoting the separation of the electrons from the impurity particles. For example, the first acceleration of the electrons is completed between the first electrode 210b and the third electrode 220b, and between the second electrode 210a and the fourth electrode 220a; the second acceleration of the electrons is completed between the third electrode 220b and the fifth electrode 230b, and between the fourth electrode 220a and the sixth electrode 230a; the first deceleration of the electrons is completed between the fifth electrode 230b and the seventh electrode 240b, and between the sixth electrode 230a and the eighth electrode 240a; and the second deceleration of the electrons is completed between the seventh electrode 240b and the ninth electrode 250b, and between the eighth electrode 240a and the tenth electrode 250a. During the process of accelerating the electrons, the process is a process of decelerating ions in the impurity particles. During the process of decelerating the electrons, the process is a process of accelerating ions in the impurity particles.

[0077] In some embodiments, the plurality of electrodes are metal electrodes.

[0078] In some embodiments, the plurality of electrodes are provided with a graphite coating on the surface to avoid introducing metal contamination.

[0079] In some embodiments, the material of the cavity 100 includes a conductive material to realize the electrical connection of the cavity 100 with other devices, such as a monitoring device.

[0080] The embodiments of the present application also provide an electron emitting device, referring to Figure 2 , the electron emitting device includes an electron generator 400 and an electron purification device provided by the embodiments of the present application. The electron generator 400 is used to generate an electron beam, and the electron beam includes electrons and impurity particles. The electron purification device is used to purify the electron beam.

[0081] The electron generator 400 is a common generator for generating electrons using a tungsten filament, for example, an electron gun. In order to make the description simple, the structural description of the electron generator 400 is omitted here.

[0082] The electron purification device is arranged close to the outlet of the electron beam of the electron generator 400, so that the electron beam can enter the cavity 100.

[0083] In some embodiments, the electron emitting device further includes a transmission cavity 500, which is arranged outside the electron purification device and is used to transmit the electrons purified by the electron purification device.

[0084] In some embodiments, the transmission cavity 500 is provided with a first opening 510 and a second opening 520. The first opening 510 is disposed toward the electron generator 400 and matches the inlet 110 of the cavity 100 of the electron purification device. The electron beam enters the transmission cavity 500 through the first opening 510 and enters the electron purification device. The electron beam purified by the electron purification device exits the transmission cavity 500 through the second opening 520, which matches the electron inlet of other devices that need to use electron beams.

[0085] In some embodiments, the cavity 100 of the transmission cavity 500 is made of a conductive material to enable electrical connection between the transmission cavity 500 and other devices, such as monitoring devices.

[0086] In some embodiments, the outer wall of the transmission cavity 500 is grounded.

[0087] In some embodiments, the electron emission device further includes an electron emission monitor 600 (ECM), which is connected to the plurality of electrodes of the electron purification device and the transmission cavity 500, respectively, for monitoring the current generated by the electrons received by the plurality of electrodes and the transmission cavity 500.

[0088] In some embodiments, the transmitting electronics monitor 600 is grounded.

[0089] In some embodiments, the transmitting electron monitor 600 is also electrically connected to the electron generator 400.

[0090] When it is necessary to statistically analyze the current generated by the electron beam emitted by the electron generator 400, i.e., the current generated by the electron beam entering the electron purification device, the voltages of the plurality of electrodes are adjusted to apply a potential opposite to that used during electron beam purification to the oppositely positioned electrodes, causing all electrons to strike the electrode surfaces. For example, during electron beam purification, the potential of the first electrode 210b is set to be less than that of the second electrode 210a; while when it is necessary to statistically analyze the current generated by the electron beam entering the electron purification device, the potential of the first electrode 210b is set to be greater than that of the second electrode 210a. The other electrodes are similarly configured, causing electrons to be deflected in different directions during purification and all falling onto the surfaces of the plurality of electrodes.

[0091] The electron emission monitor 600 is configured to monitor the total current I generated when electrons fall onto the surfaces of the plurality of electrodes. total The total current I total This refers to the current generated by the electron beam entering the electron purification device.

[0092] In some embodiments, for example, in the beam adjustment stage, the stability of the current generated by the electron beam emitted by the electron generator 400 can be monitored by taking values at intervals within a set time period, so as to determine the health of the electron generator 400. For example, the set time period is 5s, and 10 values of I total are obtained per second, and the stability of the current generated by the electron beam emitted by the electron generator 400 can be determined by the fluctuation of the values.

[0093] When it is necessary to count the current generated by the electron beam leaving the transmission cavity 500, i.e., the current of the effective electron beam generated by the electron emission device, the voltage of the electrode group is adjusted to the voltage setting for the purified electron beam. During this period, the electrons that do not leave the transmission cavity 500 will hit the surface of the transmission cavity 500, and the emission electron monitor 600 obtains the electric current I rest generated by the hitting of the electrons to the surface of the transmission cavity 500. The current I e of the effective electron beam generated by the electron emission device is I total -I rest .

[0094] When the electron emission device is working, for example, in the process stage, the current I rest generated by the hitting of the electrons to the surface of the transmission cavity 500 is monitored in real time by the emission electron monitor 600, so as to realize the real-time monitoring of the current I e of the effective electron beam in situ.

[0095] The beneficial effects of the electron purification device and the electron emission device provided in the present application include but are not limited to the following:

[0096] The electron purification device provided in the present application comprises a cavity and a plurality of electrodes arranged in the cavity, and the plurality of electrodes generate a potential difference, so that the electrons and impurity particles entering the cavity generate different movement directions, thereby realizing the separation of the electrons and the impurity particles.

[0097] The electron emission device provided in the present application realizes the purification of the electron beam generated by the electron generator by configuring the electron purification device. In addition, the stability of the emission current of the electron generator is monitored by electrically connecting the emission electron monitor and the plurality of electrodes of the electron purification device. In addition, the real-time monitoring of the current generated by the effective electron beam generated by the electron emission device is further realized by electrically connecting the emission electron monitor and the transmission cavity arranged outside the electron purification device.

[0098] It is to be explained that different embodiments can produce different beneficial effects, and in different embodiments, the beneficial effects that can be produced can be any one or a combination of the above, or any other beneficial effect that can be obtained.

[0099] The foregoing description has been set forth merely to illustrate the general principles of the exemplary embodiments. It is apparent that various modifications, improvements, and changes can be made to the exemplary embodiments disclosed in the foregoing description without departing from the spirit and scope of the exemplary embodiments. Accordingly, the exemplary embodiments disclosed in the foregoing description are to be considered in all respects as illustrative and not restrictive, and the scope of the exemplary embodiments should be determined not with reference to the foregoing description, but should be given to the appended claims and equivalents thereof.

[0100] It should be noted that, in the description of the present application, unless specifically defined and limited otherwise, the terms "mounting", "connection", "connecting", "fixed", should be understood broadly, for example, can be fixed connection, can also be detachable connection, or integral; can be mechanical connection, can also be electrical connection; can be rotary connection, can also be sliding connection; can be direct connection, can also be indirect connection through intermediate medium, can be internal communication of two elements or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood in combination with the specific circumstances.

[0101] In addition, when the terms "first", "second", "third" and the like are used in the description of the present application to describe various features, these terms are only used to distinguish these features, and cannot be understood as indicating or implying the relevance, relative importance or implicitly indicating the number of the indicated features between the features.

[0102] In addition, the present application describes the exemplary embodiments by referring to idealized exemplary sectional views and / or plan views and / or perspective views. Therefore, the differences from the illustrated shapes due to, for example, manufacturing technology and / or tolerance are foreseeable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but should include deviations in the shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are substantially schematic, and the shapes thereof are not intended to show the actual shape of the regions of the device nor to limit the scope of the exemplary embodiments.

[0103] Also, certain terminology has been used in the description for the purpose of reference only. As is apparent to one skilled in the art, any specific reference to one implementation does not limit the application to such implementation. The words "comprising," "having," "containing," and variations thereof do not limit the various claims to the components or activities supplied with such terms. Additionally, the terms "a" and "one" are open-ended, meaning one or more than one.

[0104] Similarly, it is to be noticed that the term "comprising", used in the description, can "consist of" and its variants can mean "consist of" in the claims. As such, the term "comprising" as used throughout the specification, including the claims and the specification, should be interpreted as "consist of" and its variants.

[0105] Finally, it should be noted that the language used in the specification has been principally selected for readability and instructional purposes and can not have been selected to delineate or circumscribe the inventive subject matter, resorting as it can to a degree of abstraction. Accordingly, the disclosures herein are to be interpreted in the attainments consistent with the principles of the application.

Claims

1. An electronic purification device, characterized in that, The electron purification device comprises: a cavity comprising an inlet and an outlet, through which electrons to be purified enter the cavity; a plurality of electrodes arranged in the cavity for generating a deflection electric field to cause the electrons to be deflected at a preset angle so as to exit the cavity from the outlet of the cavity.

2. The electronic purification device of claim 1, wherein, The plurality of electrodes comprises a first electrode and a second electrode arranged oppositely, and a gap is arranged between the first electrode and the second electrode for the electrons to be purified to pass through.

3. The electronic purification device of claim 2, wherein, The plurality of electrodes further comprises: a third electrode and a fourth electrode arranged oppositely, the third electrode is located on a side of the first electrode away from the inlet, and the distance between the third electrode and the first electrode is 0.8-1.2 cm; the fourth electrode is located on a side of the second electrode away from the inlet, and the distance between the fourth electrode and the second electrode is 0.3-0.7 cm; a fifth electrode and a sixth electrode arranged oppositely, the fifth electrode is located on a side of the third electrode away from the first electrode, and the distance between the fifth electrode and the third electrode is 1.8-2.2 cm; the sixth electrode is located on a side of the fourth electrode away from the second electrode, and the distance between the sixth electrode and the fourth electrode is 1.1-1.5 cm.

4. The electronic purification device of claim 3, wherein, The electron purification device further comprises: a seventh electrode and an eighth electrode arranged oppositely, the seventh electrode is located on a side of the fifth electrode away from the third electrode, and the distance between the seventh electrode and the fifth electrode is 1.8-2.2 cm; the eighth electrode is located on a side of the sixth electrode away from the fourth electrode, and the distance between the eighth electrode and the sixth electrode is 1.5-1.8 cm; a ninth electrode and a tenth electrode arranged oppositely, the ninth electrode is located on a side of the seventh electrode away from the fifth electrode, and the distance between the ninth electrode and the seventh electrode is 1.8-2.2 cm; and the tenth electrode is located on a side of the eighth electrode away from the sixth electrode, and the distance between the tenth electrode and the eighth electrode is 0.8-1.2 cm.

5. The electronic purification device of claim 1, wherein, The inlet is arranged on a top plate of the cavity, and the outlet is arranged on a bottom plate of the cavity.

6. The electronic purification device of claim 5, wherein, The bottom plate and one side plate of the cavity form an acute angle.

7. The electronic purification device of claim 1, wherein, The surfaces of the plurality of electrodes are provided with a graphite coating.

8. An electron emitting device, characterized by, The electron purification device comprises: an electron generator for generating electrons and impurity particles; and an electron purification device according to any one of claims 1-7. The electron purification device further comprises a transmission cavity, which is arranged outside the electron purification device and is used for transmitting the purified electrons.

9. The electron emitting device of claim 8, wherein The electron purification device further comprises an emitted electron monitor, which is electrically connected to the plurality of electrodes and the transmission cavity, respectively, and is used for monitoring the current generated by the electrons received by the plurality of electrodes and the transmission cavity.

10. The electron emitting device of claim 9, wherein ​

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