Polishing solution filtering device
By using a high-speed rotating disc to generate centrifugal force to separate impurities from the polishing fluid, and by utilizing a multi-stage filtration system, the problems of low impurity recovery and utilization rate and low filtration efficiency in existing devices are solved, achieving efficient and environmentally friendly impurity separation and recovery.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-25
- Publication Date
- 2026-03-27
AI Technical Summary
Existing polishing fluid filtration devices have low utilization rates and low filtration efficiency, making it difficult to specifically recover impurities of different particle sizes, resulting in resource waste and environmental pollution.
A high-speed rotating disc generates a centrifugal effect, using density differences to separate impurities in the polishing fluid, and a multi-stage filtration system is used to separate and recover different substances.
It improves the recovery efficiency of polishing fluid, reduces the difficulty of impurity recovery, enhances environmental friendliness, and extends the service life of the filter screen.
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Figure CN224040296U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to polishing liquid filtration technical field especially, relates to a polishing liquid filtering device. BACKGROUND
[0002] Polishing liquid is a kind of chemical mixed liquid for surface precision machining, mainly through the synergistic effect of chemical corrosion and physical grinding, remove the micro concave-convex, scratch or oxide layer on the surface of material, to obtain the surface of super smooth, high flatness, in semiconductor, optical device and precision machining industry, polishing liquid is the key consumable of surface precision machining.
[0003] Polishing liquid will mix in material debris, abrasive particles and chemical reaction by-products in the use process, these impurities can cause polishing surface defect and equipment wear and tear. Therefore, polishing liquid needs to be filtered after being used for a period of time to remove impurities and recycle.
[0004] The existing polishing liquid filtering device mostly adopts single-stage filter screen structure, and the following problems exist:
[0005] 1) Low utilization rate: industrial impurities in polishing liquid usually include metal particles, non-metal particles, organic matter and the like, and the components are complex and the particle size distribution is extensive, so that different components of impurities are mixed together, targeted recycling and reuse are difficult, a large amount of valuable resources is wasted, raw material cost is increased, and improper treatment of mixed impurities can cause environmental pollution, which does not meet the environmental protection requirements;
[0006] 2) Low filtering efficiency: single-layer filter screen usually has only one fixed pore size, cannot adapt to the filtering requirements of particles of different particle sizes, large particles and small particles pass through the same filter screen at the same time, the filter screen is easily clogged, the filtering efficiency is reduced, the load of the filter screen is increased, and the service life thereof is shortened.
[0007] Therefore, the polishing liquid filtering device is proposed to solve the problems in the above background. INVENTION CONTENTS
[0008] The utility model discloses a kind of polishing liquid filtering devices, by the centrifugal effect generated by high-speed rotating turntable, complete polishing liquid continuous fling off, and according to the mass difference of solid in liquid, the moving distance of different substances also exist big difference, and corresponding stagnate to corresponding independent area, reach the purpose of different material separation, to solve the problems in the above background.
[0009] In order to achieve the above purpose, the utility model adopts the following technical scheme: a kind of polishing liquid filtering device, including filter box, the inside of the filter box is separately provided with separation assembly and filtering device, the separation assembly is located above filtering device;
[0010] The separation assembly includes a fixed frame connected with the inner wall of the filter box body, an inner wall of the fixed frame is provided with a primary sieve plate, a center of the primary sieve plate is provided with a circular hole, an inner surface wall of the circular hole is covered with a sealing ring, an inside of the sealing ring is movably provided with a rotating disc, an outer wall of the rotating disc is in contact with the inner wall of the sealing ring, the sealing ring is externally provided with a first isolation plate and a second isolation plate from inside to outside, the first isolation plate and the second isolation plate are both fixedly embedded in the inside of the primary sieve plate, the inner surface wall of the filter box body is additionally provided with a group of fixing frames, a waterproof cover is sleeved between outer surface walls of the group of fixing frames, the inside of the waterproof cover is fixedly connected with a motor, an output shaft of the motor can penetrate through the top of the waterproof cover, and the shaft end of the motor is connected with the bottom of the rotating disc.
[0011] Preferably, the sealing ring, the first isolation plate and the second isolation plate can divide the upper part of the primary sieve plate into three independent areas with the rotating disc as the center, the filter device includes a first filter plate and a second filter plate, the second filter plate is below the first filter plate, the inner wall of the filter box body is provided with a group of grooves on both sides, and the first shell sleeve and the second shell sleeve are respectively arranged between the inner surface walls of the two grooves, the first filter plate and the second filter plate are respectively locked into the inside of the first shell sleeve and the second shell sleeve, the outer surfaces of the first shell sleeve and the second shell sleeve are additionally provided with handles, and the filter holes of the first filter plate are larger than the filter holes of the second filter plate.
[0012] Preferably, the filter box body can be divided into two sections to realize the separation of the upper and lower sections, a fixed strip is sleeved at the junction of the two sections, and a group of fixed bolts are rotatably connected in the inside of the fixed strip, and the group of fixed bolts are rotatably connected with the outer wall of the lower section of the filter box body.
[0013] Preferably, the bottom of the filter box body is provided with a water storage assembly, the water storage assembly includes an access door and a water storage tank, the upper end of the access door is connected with the lower end of the filter box body, a conical filter is additionally provided on the top of the access door, the water storage tank is embedded on one side of the access door, one side of the access door is communicated with a liquid outlet pipe, and the discharge end of the liquid outlet pipe is communicated with a second valve through a flange.
[0014] Preferably, the inside of the filter box body is provided with a water collecting groove, the water collecting groove is above the separation assembly, a top cover is detachably installed on the upper end of the filter box body, and a group of buckles are symmetrically installed at the joint of the top cover and the filter box body.
[0015] A liquid inlet pipe is communicated with the circumferential surface of the filter box body, one end of the liquid inlet pipe is above the water collecting groove, and the liquid inlet end of the liquid inlet pipe is communicated with a first valve through a flange.
[0016] Compared with the prior art, the filter box body has the advantages and positive effects that:
[0017] 1. The utility model discloses a polishing liquid enters the filter box through the liquid inlet pipe, is gathered above the carousel through the water collecting groove, starts the motor and drives the carousel rotation, and the polishing liquid in the carousel interior is driven under the carousel rotation, and the different inertias of different impurities under the centrifugal force make the different impurities be separated to the different interval primary sieve plate that first isolation board and second isolation board are separated, thereby realize the effective separation of the different density impurities in polishing liquid, realize the separation of different component impurities, realize the preliminary filtration, reduce the difficulty of impurity recovery, increase the recovery efficiency, improve the environmental protection of the device.
[0018] 2. The utility model discloses a polishing liquid passes through the primary sieve plate and flows down first filter board, second filter board and conical filter, and the solid impurities of different diameters in the polishing liquid are isolated on first filter board, second filter board and conical filter of different aperture size respectively, and through multistage filtration system, effectively reduce the filter screen load. DRAWINGS
[0019] Figure 1 A kind of main view structure perspective drawing in polishing liquid filtration device is proposed for the utility model;
[0020] Figure 2 A kind of internal structure perspective drawing in polishing liquid filtration device is proposed for the utility model;
[0021] Figure 3 A kind of separation device section structure perspective drawing in polishing liquid filtration device is proposed for the utility model;
[0022] Figure 4 A kind of filtration device structure perspective drawing in polishing liquid filtration device is proposed for the utility model.
[0023] Legend: 1, filter box;2, separation assembly;201, carousel;202, sealing ring;203, first isolation board;204, second isolation board;205, primary sieve plate;206, fixed frame;207, motor;208, waterproof cover;209, fixed frame;3, filtration device;301, first filter board;302, second filter board;303, conical filter;304, first shell sleeve;305, second shell sleeve;4, fixed bolt;5, fixed strip;6, water storage assembly;601, access door;602, water storage tank;7, water collecting groove;8, buckle;9, top cover;10, liquid inlet pipe;11, first valve;12, liquid outlet pipe;13, second valve. DETAILED DESCRIPTION
[0024] To better understand the above-mentioned objectives, features, and advantages of this utility model, the present utility model will be further described below with reference to the accompanying drawings and embodiments. It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments can be combined with each other.
[0025] Many specific details are set forth in the following description in order to provide a full understanding of the present invention. However, the present invention can also be implemented in other ways than those described herein, and therefore the present invention is not limited to the specific embodiments disclosed in the following specification.
[0026] Example 1, as Figures 1-3 As shown, a polishing fluid filtration device includes a filter housing 1. The filter housing 1 has a separation component 2 and a filter device 3 disposed inside it. The separation component 2 is located above the filter device 3. The separation component 2 includes a fixing frame 206 connected to the inner wall of the filter housing 1. A primary sieve plate 205 is installed on the inner wall of the fixing frame 206. A circular hole is formed at the center of the primary sieve plate 205, and a sealing ring 202 covers the inner surface of the circular hole. A rotating disk 201 is movably disposed inside the sealing ring 202. The outer wall of the rotating disk 201 can contact the inner wall of the sealing ring 202. A first isolation layer is installed sequentially from the inside to the outside of the sealing ring 202. Plate 203 and second isolation plate 204 are fixedly embedded inside the primary sieve plate 205. A set of fixing brackets 209 are installed on the inner surface of the filter box 1. A waterproof cover 208 is sleeved between the outer surface of the set of fixing brackets 209. A motor 207 is fixedly connected inside the waterproof cover 208. The output shaft of the motor 207 can pass through the top of the waterproof cover 208, and the shaft end of the motor 207 is connected to the bottom of the turntable 201. The sealing ring 202, the first isolation plate 203 and the second isolation plate 204 can divide the upper part of the primary sieve plate 205 into three independent areas with the turntable 201 as the center.
[0027] The effect achieved by the whole embodiment 1 is that the polishing liquid enters the filter box 1 through the liquid inlet pipe 10, is collected above the rotating disc 201 through the water collecting groove 7, the polishing liquid in the rotating disc 201 is driven to rotate by the rotating disc 201, and is affected by the centrifugal force to flow from the periphery to the primary sieve plate 205. Because the industrial impurity particles in the polishing liquid have different densities, different impurities have different inertias caused by the centrifugal force, and because of the isolation effect of the first isolation plate 203 and the second isolation plate 204, the industrial impurities with different particle densities are separated to the primary sieve plate 205 in different intervals separated by the first isolation plate 203 and the second isolation plate 204, so that effective separation of impurities with different densities in the polishing liquid is realized, both separation of impurities with different components and preliminary filtration are realized, the difficulty of impurity recovery is reduced, the recovery efficiency is increased, and the environmental protection of the device is improved.
[0028] Embodiment 2, as shown in Figures 1-2 and Figure 4 The filter device 3 includes a first filter plate 301 and a second filter plate 302, the second filter plate 302 is located below the first filter plate 301, a group of grooves are formed on both sides of the inner wall of the filter box 1, and first and second shell sleeves 304 and 305 are respectively arranged between the inner walls of the two grooves, the first and second filter plates 301 and 302 are respectively locked into the interiors of the first and second shell sleeves 304 and 305, handles are additionally arranged on the outer surfaces of the first and second shell sleeves 304 and 305, the filter holes of the first filter plate 301 are larger than those of the second filter plate 302, a water storage assembly 6 is arranged at the bottom of the filter box 1, the water storage assembly 6 includes an access door 601 and a water storage tank 602, the upper end of the access door 601 is connected with the lower end of the filter box 1, a conical filter 303 is additionally arranged on the top of the access door 601,
[0029] The effect achieved by the whole embodiment 2 is that the polishing liquid passes through the primary sieve plate 205, the first filter plate 301, the second filter plate 302 and the conical filter 303, and the solid impurities with different diameters in the polishing liquid are respectively isolated on the first filter plate 301, the second filter plate 302 and the conical filter 303 with different hole diameters, and the filter screen load is effectively reduced through the multi-stage filtration system.
[0030] Embodiment 3, as shown in Figures 1-2As shown, the filter box 1 can be divided into two sections, for realizing the split of the upper and lower two sections, the junction is sleeved with a fixed bar 5, the inside of the fixed bar 5 is rotatably connected with a group of fixed bolts 4, a group of the fixed bolts 4 are rotatably connected with the outer wall of the lower section filter box 1, the water storage tank 602 is embedded on one side of the access door 601, one side of the access door 601 is communicated with a liquid outlet pipe 12, the discharge end of the liquid outlet pipe 12 is communicated with a second valve 13 through a flange, the inside of the filter box 1 is provided with a water collecting groove 7, the water collecting groove 7 is located above the separation assembly 2, the upper end of the filter box 1 is detachably provided with a top cover 9, a group of buckles 8 are symmetrically installed at the joint of the filter box 1 and the top cover 9, the circumferential surface of the filter box 1 is communicated with a liquid inlet pipe 10, one end of the liquid inlet pipe 10 is located above the water collecting groove 7, the liquid inlet end of the liquid inlet pipe 10 is communicated with a first valve 11 through a flange.
[0031] The effect achieved by the whole embodiment 3 is that the filter box 1 can be divided into two parts, and a group of grooves are formed on both sides of the inner wall of the filter box 1, and a first shell sleeve 304 and a second shell sleeve 305 are respectively placed between the inner surfaces of the two grooves, the first filter plate 301 and the second filter plate 302 are respectively locked into the interiors of the first shell sleeve 304 and the second shell sleeve 305, and handles are additionally installed on the outer surfaces of the first shell sleeve 304 and the second shell sleeve 305, facilitating disassembly and allowing timely cleaning and replacement of the filter device.
[0032] The working principle of the whole device is as follows: preparation stage: first, install each structure in the embodiment completely, open the first valve 11, and pour the polishing liquid into the filter box 1 through the liquid inlet pipe 10 to enter the primary screening stage;
[0033] Primary screening stage: the polishing liquid enters the filter box 1, and is collected above the rotating disc 201 through the water collecting groove 7, at this time, the rotating disc 201 is driven to rotate by the motor 207, the polishing liquid above the rotating disc 201 is driven to flow from the periphery to the primary sieve plate 205 under the rotation of the rotating disc 201, due to the different densities of the industrial impurity particles in the polishing liquid, the different impurities are affected by different inertias caused by the centrifugal force, and due to the isolation effect of the first isolation plate 203 and the second isolation plate 204, the industrial impurities with different particle densities are separated to the different intervals of the primary sieve plate 205 separated by the first isolation plate 203 and the second isolation plate 204, at this time, the polishing liquid is screened to the lower part of the separation assembly 2 through the primary sieve plate 205 for secondary filtration;
[0034] Secondary filtration stage: the polishing liquid flows downward through the first filter plate 301, the second filter plate 302 and the conical filter 303 from the primary sieve plate 205, the solid impurities with different diameters in the polishing liquid are separated on the first filter plate 301, the second filter plate 302 and the conical filter 303 respectively, and the clean polishing liquid is filtered to the water storage assembly 6 through the conical filter 303, at this time, the second valve 13 is opened, and the filtered polishing liquid is output through the liquid outlet pipe 12 for recycling;
[0035] Finishing stage: the fixing bolt 4 and the fixing strip 5 are loosened, the filter box 1 is opened up and down, the separation assembly 2 is taken out, different kinds of impurities are respectively recycled to different vessels for secondary recycling and processing, the buckle 8 and the top cover 9 are opened, the water collecting tank 7 is cleaned or replaced, the first shell sleeve 304 and the second shell sleeve 305 are respectively pulled out by the handle to take out the first filter plate 301 and the second filter plate 302 for cleaning or replacement, and the water storage tank 602 is opened to clean or replace the conical filter 303.
[0036] The above is only a preferred embodiment of the present application, and does not limit the present application in other forms. Any skilled person in the art can modify or change the above disclosed technical content to equivalent embodiments applied to other fields, but any simple modification, equivalent change and modification of the above embodiments according to the technical essence of the present application still belong to the protection scope of the technical scheme of the present application.
Claims
1. A polishing liquid filtering device comprising a filtering tank (1), characterized in that: The inner part of the filter box (1) is respectively provided with a separation assembly (2) and a filter device (3), and the separation assembly (2) is located above the filter device (3); The separation assembly (2) comprises a fixed frame (206) connected with the inner wall of the filter box (1), the inner wall of the fixed frame (206) is provided with a primary sieve plate (205), a circular hole is formed in the center of the primary sieve plate (205), the inner surface wall of the circular hole is covered with a sealing ring (202), the inside of the sealing ring (202) movably provided with a rotating disc (201), the outer wall of the rotating disc (201) can be in contact with the inner wall of the sealing ring (202), the outer part of the sealing ring (202) is sequentially provided with a first isolation plate (203) and a second isolation plate (204) from inside to outside, the first isolation plate (203) and the second isolation plate (204) are both fixedly embedded in the inside of the primary sieve plate (205), a set of fixed frames (209) are additionally provided on the inner surface wall of the filter box (1), a waterproof cover (208) is sleeved between the outer surface walls of a set of the fixed frames (209), the inside of the waterproof cover (208) is fixedly connected with a motor (207), the output shaft of the motor (207) can penetrate through the top of the waterproof cover (208), and the shaft end of the motor (207) is connected with the bottom of the rotating disc (201).
2. The polishing fluid filtration device of claim 1, wherein: The sealing ring (202), the first isolation plate (203) and the second isolation plate (204) can divide the upper part of the primary sieve plate (205) into three independent areas with the rotating disc (201) as the center.
3. The polishing fluid filtration device of claim 1, wherein: The filter device (3) comprises a first filter plate (301) and a second filter plate (302), the second filter plate (302) is located below the first filter plate (301), a set of grooves are formed on both sides of the inner wall of the filter box (1), and a first shell sleeve (304) and a second shell sleeve (305) are respectively placed between the inner surface walls of the two grooves, the first filter plate (301) and the second filter plate (302) are respectively locked into the inside of the first shell sleeve (304) and the second shell sleeve (305), handles are additionally provided on the outer surfaces of the first shell sleeve (304) and the second shell sleeve (305), and the filter hole of the first filter plate (301) is larger than that of the second filter plate (302).
4. The polishing fluid filtration device of claim 1, wherein: The filter box (1) can be divided into two sections to realize the disassembly of the upper and lower sections, a fixed strip (5) is sleeved at the junction, a set of fixed bolts (4) are rotatably connected in the inside of the fixed strip (5), and a set of the fixed bolts (4) are rotatably connected with the outer wall of the lower filter box (1).
5. The polishing fluid filtration device of claim 1, wherein: The bottom of the filter box (1) is provided with a water storage assembly (6), the water storage assembly (6) comprises an access door (601) and a water storage tank (602), the upper end of the access door (601) is connected with the lower end of the filter box (1), the top of the access door (601) is additionally provided with a conical filter (303), the water storage tank (602) is embedded in one side of the access door (601), one side of the access door (601) is communicated with a liquid outlet pipe (12), and the discharge end of the liquid outlet pipe (12) is communicated with a second valve (13) through a flange.
6. The polishing fluid filtration device of claim 1, wherein: The inside of the filter box (1) is provided with a water collecting groove (7), the water collecting groove (7) is located above the separation assembly (2), and the upper end of the filter box (1) is detachably provided with a top cover (9); a plurality of buckles (8) are symmetrically installed at the joint between the top cover (9) and the filter box (1).
7. A polishing fluid filtration device according to claim 6, wherein: The circumferential surface of the filter box (1) is communicated with a liquid inlet pipe (10), one end of the liquid inlet pipe (10) is located above the water collecting groove (7), and the liquid inlet end of the liquid inlet pipe (10) is communicated with a first valve (11) through a flange.